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JPH064515B2 - High toughness silicon nitride sintered body and manufacturing method thereof - Google Patents
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JPH064515B2 - High toughness silicon nitride sintered body and manufacturing method thereof - Google Patents

High toughness silicon nitride sintered body and manufacturing method thereof

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Publication number
JPH064515B2
JPH064515B2 JP60074262A JP7426285A JPH064515B2 JP H064515 B2 JPH064515 B2 JP H064515B2 JP 60074262 A JP60074262 A JP 60074262A JP 7426285 A JP7426285 A JP 7426285A JP H064515 B2 JPH064515 B2 JP H064515B2
Authority
JP
Japan
Prior art keywords
vol
silicon nitride
sintered body
metal silicide
phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60074262A
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Japanese (ja)
Other versions
JPS61236654A (en
Inventor
広志 坂本
忠彦 三▲吉▼
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Hitachi Ltd
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Hitachi Ltd
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Filing date
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Priority to JP60074262A priority Critical patent/JPH064515B2/en
Publication of JPS61236654A publication Critical patent/JPS61236654A/en
Publication of JPH064515B2 publication Critical patent/JPH064515B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は、ガスタービンブレードや各種エンジン部品等
に用いるのに適した高靭性窒化珪素複合焼結体に関す
る。
TECHNICAL FIELD The present invention relates to a high-toughness silicon nitride composite sintered body suitable for use in gas turbine blades, various engine parts, and the like.

〔発明の背景〕[Background of the Invention]

ガスタービンブレード等、高温あるいは悪環境にさらさ
れる部分には従来より耐熱合金が用いられてきた。しか
し、近年高性能化のために、その使用温度が耐熱合金の
使用限界温度に達しつつある。そこでこれらの耐熱合金
に代る材料として、耐熱、耐酸化性および耐熱衝撃性の
大きい窒化珪素焼結体が注目され始めた。しかし、窒化
珪素セラミツクスは周知のごとく脆いという欠点があ
り、いまだに本格的実用化に至つていない。
Conventionally, heat-resistant alloys have been used for parts exposed to high temperatures or adverse environments such as gas turbine blades. However, in recent years, the operating temperature of the heat-resistant alloy has reached the critical temperature for use due to higher performance. Therefore, as a material replacing these heat-resistant alloys, attention has been paid to a silicon nitride sintered body having high heat resistance, oxidation resistance and heat shock resistance. However, as is well known, silicon nitride ceramics have the drawback of being brittle, and have not yet been put to practical use in earnest.

セラミツクス強靭化材料としては、金属を結合層として
各種炭化物、酸化物を加えた、例えば特公昭59-26977の
切削工具用のサーメツトが良く知られている。これらサ
ーメツトは、セラミツクスをCoやNi等の金属相で結
合したものである。セラミツクスの脆さを金属相でカバ
ーしているため、常温における強度や靭性は改善される
が、高温では金属相を含むために耐熱性が悪く、かつ高
温域での強度および硬度が低下する。そのため高温にお
いてもすぐれた耐酸化性、および強度を維持することの
できるセラミツクスのウイスカーまたはフアイバーの分
散させた複合セラミツクスの研究が活発に行われてい
る。すなわちセラミツクスにクラツクが生じた場合にウ
イスカーまたはフアイバーにより、その進行を阻止する
ためである。例えば特開昭59-54680においてはSicウ
イスカーを分散し、強化した窒化珪素セラミツクス焼結
体が報告されている。しかし、ウイスカーを分散添加す
るだけでは、セラミツクスの靭性を大幅に改善すること
は困難である。その理由は、窒化珪素とSiCウイスカ
ーは焼結時の高温下でもあまり反応せず、ウイスカーの
ままで窒化珪素マトリツクス中に分散状態で存在してい
るが、焼結体が外力を受けてクラツクが発生してもその
分散状のウイスカーの直径が0.5〜1.0μm(一般に入手
できる気相法合成によるもの)と細く、クラツクの進行
を阻止する能力が小さいためと考えられる。ウイスカー
を多量に添加することも考えられるが、焼結密度が低下
しかえつて好ましくない。
As a ceramic toughening material, for example, a cermet for a cutting tool disclosed in Japanese Examined Patent Publication No. 59-26977, in which various carbides and oxides are added to a metal as a bonding layer, is well known. These thermites are ceramics bonded with a metal phase such as Co or Ni. Since the brittleness of the ceramic is covered with the metal phase, the strength and toughness at room temperature are improved, but the heat resistance is poor at high temperatures because the metal phase is contained, and the strength and hardness at high temperatures are reduced. Therefore, active research has been conducted on composite ceramics in which whiskers or fibers of ceramics, which can maintain excellent oxidation resistance and strength even at high temperatures, are dispersed. That is, when cracks occur in the ceramics, the progress thereof is blocked by whiskers or fibers. For example, in JP-A-59-54680, a silicon nitride ceramics sintered body in which Sic whiskers are dispersed and reinforced is reported. However, it is difficult to significantly improve the toughness of the ceramics by only adding the whiskers in a dispersed manner. The reason is that silicon nitride and SiC whiskers do not react much even at high temperatures during sintering, and they exist in the silicon nitride matrix as whiskers in a dispersed state, but the sintered body receives cracks due to external force. Even if it occurs, the diameter of the dispersed whiskers is as thin as 0.5 to 1.0 μm (according to commonly available gas phase method synthesis), and it is considered that the ability to prevent the progress of cracks is small. It is possible to add a large amount of whiskers, but this is not preferable because the sintered density decreases only.

一方、特開昭58-41770においては5重量%以下の各種珪
化物を窒化珪素に添加し、耐熱衝撃性を向上して高温の
機械強度を改善しようとしてるが、まだ充分とは云い難
い。これは、例えば、CrSi2を添加したSi34
結体のX線回折ではCrSi,Cr3Si,Cr2N,C
rNが検出され、第2図に示す様な2,3種の異なる相
の粒子から形成されている。クラツクを発生させて検鏡
した結果、クラツク1は、粒子2,3の粒界を容易に進
行して焼結体の割れるのを阻止できなかつた。
On the other hand, in JP-A-58-41770, various kinds of silicides of 5% by weight or less are added to silicon nitride to improve thermal shock resistance and improve mechanical strength at high temperature, but it is still not sufficient. This is, for example, in X-ray diffraction of a Si 3 N 4 sintered body to which CrSi 2 is added, CrSi, Cr 3 Si, Cr 2 N, C
rN was detected and formed from particles of a few different phases as shown in FIG. As a result of cracking and microscopic examination, the crack 1 could not easily progress through the grain boundaries of the grains 2 and 3 and prevent the sintered body from cracking.

〔発明の目的〕[Object of the Invention]

発明の目的は、窒化珪素を主成分とするセラミツクスの
靭性を大幅に改善した窒化珪素焼結体およびその製法を
提供することにある。
It is an object of the invention to provide a silicon nitride sintered body in which the toughness of a ceramic containing silicon nitride as a main component is significantly improved, and a method for producing the same.

〔発明の概要〕[Outline of Invention]

本発明者らは、窒化珪素とSiCウイスカーは反応し難
いが、SiCウイスカーと金属珪化物は反応し易いこと
に着目し、窒化珪素にSiCウイスカーと金属珪化物を
一緒に添加し焼結を行えば、窒化珪素、SiCウイスカ
ーおよび金属珪化物が強固に一体できるのではないかと
考えた。
The present inventors have noticed that silicon nitride and SiC whiskers are difficult to react with each other, but SiC whiskers and metal silicide are easily reacted with each other. Then, it was thought that silicon nitride, SiC whiskers and metal silicide could be firmly integrated.

実施してみたところ予想以上に靭性の優れた窒化珪素系
焼結体を得ることができた。この焼結体を検鏡した結
果、第1図に示す様な構造のものであることが判つた。
As a result of conducting the test, it was possible to obtain a silicon nitride-based sintered body having excellent toughness than expected. As a result of a microscopic examination of this sintered body, it was found that it had a structure as shown in FIG.

即ち、窒化珪素マトリツクス5中に、金属珪化物2とS
iCウイスカー6との反応相7が形成されている。ま
た、場合によつては、金属珪化物2と窒化珪素とが反応
してできた金属室化物4を含む場合がある。これらは互
に密接して形成されている。なお、図に示す様に、クラ
ツク1の進行は前記反応相7に当ると迂回して進行して
いる この反応相の効果は、 (1) 反応相を介して金属珪化物の粒子とSiCウイス
カーが強く接着し、これが母材の窒化珪素とが強固に接
着されるため結果としてSiCウイスカーと窒化珪素が
強固に結びつけられ、ウイスカー自体も強化されること
になり、靭性が向上する、 (2) 反応相を介して、SiCウイスカーによつて金属
珪化物相が結びつけられるため、これらの相の集合体で
ある粒子の強度が増し、粒界をクラツクが貫通しにくく
なる、 (3) 反応相は機械的強度が大きく、これによつてクラ
ツクの進行が阻止される などが考えられる。
That is, in the silicon nitride matrix 5, the metal silicide 2 and S
A reaction phase 7 with the iC whiskers 6 is formed. In some cases, the metal silicide 4 may be formed by reacting the metal silicide 2 with silicon nitride. These are formed close to each other. As shown in the figure, the progress of the crack 1 bypasses when it hits the reaction phase 7, and the effects of this reaction phase are as follows: (1) The particles of the metal silicide and the SiC whiskers pass through the reaction phase. Strongly adheres to the base material silicon nitride, which results in a strong bond between the SiC whisker and silicon nitride, and also strengthens the whisker itself, improving toughness, (2) Since the SiC silicide whiskers bind the metal silicide phase through the reaction phase, the strength of the particles that are aggregates of these phases increases and it becomes difficult for the cracks to penetrate grain boundaries. (3) The reaction phase The mechanical strength is high, which may prevent the progress of cracking.

以上のことから、反応相は機械的強度の大きな相である
ことが特に望ましく、具体的にSiCと金属炭化物との
固溶体であることが好ましい。
From the above, the reaction phase is particularly preferably a phase having a large mechanical strength, and specifically a solid solution of SiC and a metal carbide is preferable.

一般的にセラミツクスにクラツクが発生したとき、強固
な粒子が存在するとそのクラツクの進行が妨げられるた
めクラツクは迂回し、それによつてエネルギーが消耗さ
れるので靭性向上になる。本発明の効果もこの理論に近
いものである。第1図に示す様にクラツク1は反応相7
に衝突するとエネルギーが吸収されるためクラツクが止
まる。なお、金属珪化物に遭遇しないSiCウイスカー
は、窒化珪素中にそのままの形で存在する。同様なこと
が金属珪化物についても云える。
Generally, when a crack is generated in a ceramic, the existence of strong particles hinders the progress of the crack, so that the crack bypasses and energy is consumed thereby, which improves the toughness. The effect of the present invention is also close to this theory. As shown in Fig. 1, the crack 1 is the reaction phase 7
When it hits, the energy is absorbed and the crack stops. The SiC whiskers that do not encounter the metal silicide exist in the silicon nitride as they are. The same applies to metal silicides.

本発明においてSiCウイスカーの添加量は、5〜25
vol%が好ましい。これより少なくとも多くても充分な
靭性が得られない。とくに25vol%を越えると急激に
密度が低下し、焼結体としても好ましくない。
In the present invention, the amount of SiC whiskers added is 5 to 25.
Vol% is preferred. Even if it is more than this, sufficient toughness cannot be obtained. Particularly, when it exceeds 25 vol%, the density is drastically reduced, which is not preferable as a sintered body.

本発明の金属珪化物は炭素と親和力の強いものであるこ
とが望ましい。この場合、SiCウイスカーと金属珪化
物または金属窒化物との間にSiの一部を金属で置換し
たSiCと金属珪化物との固溶体から成る反応相が生成
し易い。こうしたものとしては、Ti,Zr,Hf,
V,Nb,Ta,Cr,Mo,Wの珪化物があり、とく
にTi,V,Crの珪化物は高温における耐酸化性に優
れているので望ましい。
The metal silicide of the present invention preferably has a strong affinity with carbon. In this case, a reaction phase composed of a solid solution of SiC in which a part of Si is replaced with a metal and a metal silicide is easily generated between the SiC whiskers and the metal silicide or the metal nitride. These include Ti, Zr, Hf,
There are V, Nb, Ta, Cr, Mo, and W silicides, and Ti, V, and Cr silicides are particularly preferable because they have excellent oxidation resistance at high temperatures.

Zr,Hfの珪化物は焼結時に窒化物に変化し易いが、
本発明の目的を達成する点では変らない。
Zr and Hf silicides easily change to nitrides during sintering,
There is no change in achieving the object of the present invention.

なお、本発明において窒化珪素は60vol%以上である
ことが望ましい。
In the present invention, the silicon nitride content is preferably 60 vol% or more.

また、焼結助剤としては一般に用いられているMgO,
Al23,Sc23,Y23、希土類酸化物から選ばれ
る少なくとも1種を0.1〜20vol%添加するのが良
い。
Further, as a sintering aid, MgO, which is generally used,
It is preferable to add 0.1 to 20 vol% of at least one selected from Al 2 O 3 , Sc 2 O 3 , Y 2 O 3 and rare earth oxides.

次に、本発明の高靭性窒化珪素焼結体の製法について述
べる。
Next, a method for manufacturing the high toughness silicon nitride sintered body of the present invention will be described.

窒化珪素60vol%以上とSiCウイスカー5〜25vo
l%、前記金属珪化物5〜25vol%、前記焼結助剤0.
1〜20vol%をミキサーで混合し、成形して真空中ま
たは不活性ガス中で1600℃〜1900℃でホツトプレスする
ことにより得られる。
Silicon nitride 60vol% or more and SiC whiskers 5 to 25vo
1%, the metal silicide 5 to 25% by volume, the sintering aid 0.
It is obtained by mixing 1 to 20 vol% in a mixer, molding, and hot-pressing in vacuum or in an inert gas at 1600 ° C to 1900 ° C.

〔発明の実施例〕Example of Invention

以下本発明の実施例について述べる。 Examples of the present invention will be described below.

実施例1 Si34(粒径:1〜3μm)粉末と金属珪化物(粒
径:530μm)粉末に焼結助剤を所定量添加し、らい
かい機にて十分混合した。焼結助剤は種々あるが、Al
23及びY23の0.1〜20vol%の範囲が適量であ
る。この場合には特に高温強度の多きいセラミツクスが
得られることを確認している。本実施例をAl23を2
vol%、Y23を3vol%としたが前記0.1〜20vol
%の添加範囲では同様な結果が得られることを確認して
いる。
Example 1 A predetermined amount of a sintering aid was added to Si 3 N 4 (particle size: 1 to 3 μm) powder and metal silicide (particle size: 530 μm) powder, and they were sufficiently mixed with a raker machine. There are various sintering aids, but Al
A suitable range is 0.1 to 20 vol% of 2 O 3 and Y 2 O 3 . In this case, it has been confirmed that particularly high-temperature strength ceramics can be obtained. In this example, 2 Al 2 O 3 was used.
vol% and Y 2 O 3 were 3 vol%, but 0.1 to 20 vol
It has been confirmed that similar results are obtained in the addition range of%.

SiCウイスカーはお互に絡みあつているので、最終焼
結体で所定のvol%になるよう秤量しエチルアルコール
中で超音波を照射し分散させた。なお、本実施例で用い
たSiCウイスカーは太さ0.3〜1.0μm、長さ20〜5
0μmである。次いで均一分散をするためスタラーで攪
拌しながら前記混合物粉末を徐々に添加した。その後ら
いかい機を用いて再度混合したのち16メツシユのふる
いで整粒し、プレスで400kg/cm2に加圧し厚さ6m
mt、直径60mmφのグリンボデイを作製した。これを黒
鉛ダイスを用いたホツトプレスにセツトしてN2ガス中
300kg/cm2の加圧下で最高加熱温度1800℃で焼結し
た。
Since the SiC whiskers are entwined with each other, they were weighed so that the final sintered body would have a predetermined vol%, and ultrasonic waves were applied to disperse the whiskers in ethyl alcohol. The SiC whiskers used in this example have a thickness of 0.3 to 1.0 μm and a length of 20 to 5
It is 0 μm. Then, the mixture powder was gradually added while stirring with a stirrer for uniform dispersion. After that, the mixture is mixed again using a ladle machine, and then the particles are sized by a 16-mesh sieve and pressed to 400 kg / cm 2 with a press to a thickness of 6 m.
A grimbody with m t and a diameter of 60 mm was produced. This was set in a hot press using a graphite die and sintered in N 2 gas under a pressure of 300 kg / cm 2 at a maximum heating temperature of 1800 ° C.

上記の方法によりまずSi34を母相としSicウイスカ
ーを10vol%一定として、TiSi2を0,2.5,5,
10,20,25,30および35vol%添加した焼結
体を作成した。この焼結体より3mm×4mm×36mmの試
験片を採取した。これを研磨したのち中心部に幅0.01m
m、深さ0.3mmの切り込みを入れて、SENB方(Single Ed
ge Notched Beam)も試験片を作製し破壊靭性値K1C
求めた。
According to the above method, first, Si 3 N 4 is used as a mother phase, Sic whiskers are kept at 10 vol% and TiSi 2 is 0, 2.5, 5, 5.
Sintered bodies added with 10, 20, 25, 30 and 35 vol% were prepared. A test piece of 3 mm × 4 mm × 36 mm was sampled from this sintered body. After polishing this, 0.01m wide in the center
Make a notch with a depth of 0.3 mm and a depth of 0.3 mm, and
Ge Notched Beam), a test piece was prepared and the fracture toughness value K 1C was determined.

その結果を第3図に示す。単体のSi34値も併記して
あるがウイスカーのみの添加でのK1Cは7.3MN/m3/2
でその増加は小さい。しかし、さらにTiSi2を添加
することによりK1Cは増加し、特に5〜25vol%の範
囲の増加が著しい。しかし30vol%以上添加するとK
1Cは減少する。これは焼結体の密度に起因する。25vo
l%以下の焼結体の相対密度が99%以上であるのに対
し、30vol%以上添加焼結体では相対密度が95%以
下に低下してしまうためである。また2.5vol%までは
1cもあまり増加しないためTiSi2添加の適量は5
〜25vol%である。一方20vol%添加試料を鏡面研
磨して光学顕微鏡および走査電子顕微鏡で観察した。
The results are shown in FIG. The Si 3 N 4 value of the simple substance is also shown, but K 1C with addition of whiskers is 7.3 MN / m 3/2
And the increase is small. However, the addition of TiSi 2 further increases K 1C , especially in the range of 5 to 25 vol%. However, if 30vol% or more is added, K
1C decreases. This is due to the density of the sintered body. 25 vo
This is because the relative density of the sintered body of 1% or less is 99% or more, whereas the relative density of the sintered body added of 30 vol% or more is reduced to 95% or less. Moreover, since K 1c does not increase so much up to 2.5 vol%, the appropriate amount of TiSi 2 addition is 5
~ 25 vol%. On the other hand, the 20 vol% added sample was mirror-polished and observed with an optical microscope and a scanning electron microscope.

添加したTiSi2粒子はSi34および雰囲気中のN2
ガスと反応し、TiN,Ti2NおよびTiとSiの固
溶体とが混在した粒子となつていることを確認した。既
述した様に、異なつた相の集合体で、従来の方法である
珪化物のみ単独添加したものではその異相界面はクラツ
クの進行を容量にし、K1cの向上と認められなかつた。
しかし、本実施例で明らかな様にその粒子界面の一部に
SiCウイスカーと金属珪化物が反応して生成した反応
相(Si,Ti)Cが認められた。この反応相はTi
N,Ti2NおよびTi,Siの固溶体とも良く密着し
て、これら粒子とSicウイスカーを強固に接着してい
た。
The added TiSi 2 particles are Si 3 N 4 and N 2 in the atmosphere.
It was confirmed that the particles reacted with the gas to form particles in which TiN, Ti 2 N and a solid solution of Ti and Si were mixed. As described above, in the aggregate of different phases, which is the conventional method in which only the silicide is added, the interface of the different phases makes the progress of cracking a capacity and is not recognized as an improvement in K 1c .
However, as is clear in this example, a reaction phase (Si, Ti) C formed by the reaction between the SiC whiskers and the metal silicide was recognized at a part of the grain interface. This reaction phase is Ti
The particles were firmly adhered to the solid solution of N, Ti 2 N and Ti, Si, and the particles and Sic whiskers were firmly adhered.

ビツカース硬度計によりクラツクを発生させたところ、
クラツクはこれら反応相で進行が妨げられ屈曲しながら
進行することが判つた。これによりK1cは向上したもの
推定される。
When a crack was generated by a Vickers hardness tester,
It was found that the cracks progressed while curving because their progress was hindered in these reaction phases. Due to this, it is estimated that K 1c has improved.

実施例2 実施例1と同じ方法で母相Si34にTiSi2量を2
0vol%一定として、SiCウイスカーを0,2.5,
5,10,20,25および30vol%の焼結体を作製
した。実施例1と同様にSENB法にてK1Cを測定した結果
を第4図に示す。SiCウイスカーが2.5vol%では添
加による効果が少なくK1Cの増加は少ない。また30vo
l%以上添加すると密度が低下するためK1Cは減少す
る。これらの結果からSi34−TiSi2焼結体のK
1C向上には5〜25vol%のSiCウイスカーが適量で
あり、特に約10vol%添加が、その効果が一番大き
い。
Example 2 By the same method as in Example 1, the amount of TiSi 2 was set to 2 in the mother phase Si 3 N 4.
SiC whiskers at 0, 2.5,
Sintered bodies of 5, 10, 20, 25 and 30 vol% were produced. The result of measuring K 1C by the SENB method in the same manner as in Example 1 is shown in FIG. When the SiC whiskers are 2.5 vol%, the effect by addition is small and the increase of K 1C is small. Again 30 vo
If 1% or more is added, the density decreases and K 1C decreases. From these results, K of the Si 3 N 4 —TiSi 2 sintered body was measured.
5 to 25 vol% of SiC whiskers is suitable for improving 1C , and the addition of about 10 vol% has the greatest effect.

比較例 実施例2と同様な方法で、母相Si34にTiSi2
を20vol%一定として、粒径0.5〜10μmのSiC
粒子を5〜25vol%加えた焼結体を作製した。これら
の焼結体のK1Cは7〜8MN/m3/2と上述のSiCウ
イスカーの添加の場合よりも小さかつた。これは、用い
たSiC粒子のアスペクト比が1〜3程度であるため、
ウイスカーを用いた場合に比べて、金属珪化物相または
/および金属窒化物相との集合体の強度が小さく、クラ
ツク防止の効果が小さいことによるものと考えられる。
Comparative Example In the same manner as in Example 2, with the amount of TiSi 2 in the mother phase Si 3 N 4 being constant at 20 vol%, SiC having a particle size of 0.5 to 10 μm was used.
A sintered body was prepared by adding 5 to 25 vol% of particles. The K 1C of these sintered bodies was 7 to 8 MN / m 3/2, which was smaller than that of the above-mentioned addition of SiC whiskers. This is because the used SiC particles have an aspect ratio of about 1 to 3,
It is considered that this is because the strength of the aggregate with the metal silicide phase and / or the metal nitride phase is small and the effect of preventing cracking is small as compared with the case where whiskers are used.

実施例3 実施例1と同じ方法でZrSi2,HfSi2,VS
2,NbSi2,TaSi2,CrSi2,MoSi2
WSi2を添加したSi34−金属珪化物−SiCウイ
スカー焼結体を作成した。これら焼結体についてK1C
測定した。その結果を第1表に示す。
Example 3 ZrSi 2 , HfSi 2 , VS in the same manner as in Example 1
i 2 , NbSi 2 , TaSi 2 , CrSi 2 , MoSi 2 ,
A Si 3 N 4 -metal silicide-SiC whisker sintered body containing WSi 2 was prepared. K 1C was measured for these sintered bodies. The results are shown in Table 1.

実施例4 実施例1と同じ方法でSi34にCrNを単独添加した
複合焼結体を作成し検討した。その結果、CrSi2
加と同様の結果が得られた。すなわち添加したCrNは
Si34中のSiと反応してCrSi2,Cr3Si,C
2NおよびCrNを生成し、異相が混在した粒子とな
つており、K1Cは約7MN/m3/2と小さかつた。一方
これに更にSiCウイスカーを添加すると、K1Cは約1
0MN/m3/2と著しく増加した。
Example 4 In the same manner as in Example 1, a composite sintered body in which CrN was solely added to Si 3 N 4 was prepared and studied. As a result, the same result as the addition of CrSi 2 was obtained. That is, the added CrN reacts with Si in Si 3 N 4 to produce CrSi 2 , Cr 3 Si, C
R 2 N and CrN were produced, and the particles were mixed with different phases, and K 1C was as small as about 7 MN / m 3/2 . On the other hand, if SiC whiskers are further added to this, K 1C will be about 1
It was remarkably increased to 0 MN / m 3/2 .

〔発明の効果〕〔The invention's effect〕

本発明の窒化珪素焼結体は靭性が格段に優れている。 The toughness of the silicon nitride sintered body of the present invention is remarkably excellent.

また、耐酸化性、知熱衝撃性も併せすぐれているので、
ガスタービン、各種エンジンなどの高温機器用材料とし
て好適である。
Also, because it has excellent resistance to oxidation and thermal shock,
It is suitable as a material for high temperature equipment such as gas turbines and various engines.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明による焼結体の粒子構造と破壊モードを
示す模式図、第2図は従来の焼結体の粒子構造と破壊モ
ードを示す模式図である。第3図および第4図は本発明
の焼結体の破壊靭性値の変化を示す曲線図である。 1…クラツク、2,3…金属珪化物、4…金属窒化物、
5…窒化珪素マトリツクス、6…炭化珪素ウイスカー、
7…反応相。
FIG. 1 is a schematic diagram showing a grain structure and a fracture mode of a sintered body according to the present invention, and FIG. 2 is a schematic diagram showing a grain structure and a fracture mode of a conventional sintered body. 3 and 4 are curve diagrams showing changes in the fracture toughness value of the sintered body of the present invention. 1 ... crack, 2,3 ... metal silicide, 4 ... metal nitride,
5 ... Silicon nitride matrix, 6 ... Silicon carbide whiskers,
7 ... Reaction phase.

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】窒化珪素を主成分とし、金属珪化物相と、
炭化珪素ウィスカーを含み、金属珪化物と炭化珪素ウィ
スカーとの反応相を含むことを特徴とする高靭性窒化珪
素焼結体。
1. A metal silicide phase containing silicon nitride as a main component,
A high toughness silicon nitride sintered body containing silicon carbide whiskers and containing a reaction phase of a metal silicide and silicon carbide whiskers.
【請求項2】特許請求の範囲第1項において、金属珪化
物相の金属がTi,Zr,Hf,V,Nb,Cr,Mo
及びWから選ばれる少なくとも1種であることを特徴と
する高靭性窒化珪素焼結体。
2. The metal of the metal silicide phase according to claim 1, wherein the metal of the metal silicide phase is Ti, Zr, Hf, V, Nb, Cr, Mo.
And at least one selected from W, a high-toughness silicon nitride sintered body.
【請求項3】特許請求の範囲第2項において、反応相が
Ti,Zr,Hf,V,Nb,Cr,Mo及びWから選
ばれる少なくとも1種の金属により炭化珪素ウィスカー
のSiの一部が置換されているものと金属珪化物との固
溶相であり、前記反応相は金属珪化物相と溶接している
ことを特徴とする高靭性窒化珪素焼結体。
3. The silicon carbide whiskers according to claim 2, wherein the reaction phase comprises at least one metal selected from the group consisting of Ti, Zr, Hf, V, Nb, Cr, Mo and W, so that a part of Si in the silicon carbide whiskers is A high toughness silicon nitride sintered body, which is a solid solution phase of a substituted one and a metal silicide, and the reaction phase is welded to the metal silicide phase.
【請求項4】特許請求の範囲第1項において、窒化珪素
60vol%以上、炭化珪素ウィスカー5〜25vol
%、金属珪化物5〜25vol%含むことを特徴とする
高靭性窒化珪素焼結体。
4. The method according to claim 1, wherein the silicon nitride is 60 vol% or more and the silicon carbide whiskers are 5 to 25 vol.
%, Metal silicide 5 to 25 vol%, a high toughness silicon nitride sintered body.
【請求項5】特許請求の範囲第2項において、窒化珪素
60vol%以上、炭化珪素ウィスカー5〜25vol
%、金属珪化物5〜25vol%含むことを特徴とする
高靭性窒化珪素焼結体。
5. The method according to claim 2, wherein the silicon nitride is 60 vol% or more and the silicon carbide whiskers are 5 to 25 vol.
%, Metal silicide 5 to 25 vol%, a high toughness silicon nitride sintered body.
【請求項6】特許請求の範囲第3項において、窒化珪素
60vol%以上、炭化珪素ウィスカー5〜25vol
%、金属珪化物5〜25vol%含むことを特徴とする
高靭性窒化珪素焼結体。
6. The method according to claim 3, wherein the silicon nitride is 60 vol% or more and the silicon carbide whiskers are 5 to 25 vol.
%, Metal silicide 5 to 25 vol%, a high toughness silicon nitride sintered body.
【請求項7】窒化珪素60vol%以上、炭化珪素ウィ
スカー5〜25vol%、Ti,Zr,Hf,V,N
b,Cr,Mo及びWから選ばれる少なくとも1種の金
属珪化物5〜25vol%、0.1〜20vol%のM
gO,Al23,Sc23,Y23および希土類酸化物
から選ばれる少なくとも1種を混合し、成形して真空中
または不活性ガス中で1600℃〜1900℃ホットプ
レス焼結することを特徴とする高靭性窒化珪素焼結体の
製法。
7. Silicon nitride 60 vol% or more, silicon carbide whiskers 5 to 25 vol%, Ti, Zr, Hf, V, N.
At least one metal silicide selected from b, Cr, Mo and W 5 to 25 vol%, M of 0.1 to 20 vol%
gO, Al 2 O 3 , Sc 2 O 3 , Y 2 O 3 and at least one kind selected from rare earth oxides are mixed and molded, and hot pressed and sintered at 1600 ° C to 1900 ° C in a vacuum or an inert gas. A method for producing a high toughness silicon nitride sintered body, which comprises:
JP60074262A 1985-04-10 1985-04-10 High toughness silicon nitride sintered body and manufacturing method thereof Expired - Lifetime JPH064515B2 (en)

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Publication Number Publication Date
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JPH064515B2 true JPH064515B2 (en) 1994-01-19

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JPS63281408A (en) * 1987-05-13 1988-11-17 Hitachi Ltd Slider for thin film magnetic head and its manufacturing method
DE3869483D1 (en) * 1987-06-09 1992-04-30 Sandvik Ab CERAMIC CUTTING TOOL REINFORCED WITH WHISKERS.
JP2556888B2 (en) * 1987-12-24 1996-11-27 日立金属株式会社 Ceramics conductive material with less variation in electrical resistivity
CN106045525B (en) * 2016-06-01 2018-12-07 中国科学院上海硅酸盐研究所 A kind of silicon nitride sinter and preparation method thereof
TW202602820A (en) * 2024-03-01 2026-01-16 日商東曹股份有限公司 Cr-Si-N sintered bodies, their manufacturing methods, sputtering targets, and methods for manufacturing nitrogen-containing chromium silicate films.

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