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JPH0646616B2 - Hanger-Continuous impregnation device with horizontal mechanism - Google Patents
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JPH0646616B2 - Hanger-Continuous impregnation device with horizontal mechanism - Google Patents

Hanger-Continuous impregnation device with horizontal mechanism

Info

Publication number
JPH0646616B2
JPH0646616B2 JP27783985A JP27783985A JPH0646616B2 JP H0646616 B2 JPH0646616 B2 JP H0646616B2 JP 27783985 A JP27783985 A JP 27783985A JP 27783985 A JP27783985 A JP 27783985A JP H0646616 B2 JPH0646616 B2 JP H0646616B2
Authority
JP
Japan
Prior art keywords
hanger
horizontal
impregnation
impregnation tank
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP27783985A
Other languages
Japanese (ja)
Other versions
JPS62137817A (en
Inventor
光昭 和田
Original Assignee
東芝ケミカル株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 東芝ケミカル株式会社 filed Critical 東芝ケミカル株式会社
Priority to JP27783985A priority Critical patent/JPH0646616B2/en
Publication of JPS62137817A publication Critical patent/JPS62137817A/en
Publication of JPH0646616B2 publication Critical patent/JPH0646616B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Insulating Of Coils (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、ハンガー水平機構付連続含浸装置に関する。TECHNICAL FIELD The present invention relates to a continuous impregnation apparatus with a hanger horizontal mechanism.

〔従来の技術とその問題点〕 トランス、ステータコイル等の電気機器コイルのワニス
含浸処理は、バッチ式含浸処理から効率の高い連続含浸
処理に移行しつつある。しかし、連続含浸処理の場合全
ての工程が自動化されているため、所謂ミリ単位の高い
含浸精度を得ることができない。このためピン付きトラ
ンスや端子付きステータコイル等のように特にワニス不
要部へのワニスの付着を嫌う電気機器コイルについて
は、高い含浸精度が要求されるため連続含浸処理が採用
されていない。この問題を解消するために連続含浸処理
装置の被処理体を保持するハンガーの形状精度を高めた
り、含浸タンクの上昇速度を調節して含浸精度を高める
試みがなされている。しかし、何れの対策の場合にも含
浸タンク内のワニス液に浸漬されるハンガーの水平状態
が失われると、ミリ単位の高い含浸精度は到底得られな
い問題があった。特にハンガーの水平状態は、ハンガー
の形状精度を高くしても、被処理体の配置状態によって
大きく左右される。しかも、ハンガーの水平状態を常に
保ちながら被処理体を配置するようにすると極めて作業
性が悪くなる問題があった。
[Prior Art and Problems Thereof] Varnish impregnation of electric equipment coils such as transformers and stator coils is shifting from batch impregnation to highly efficient continuous impregnation. However, in the case of continuous impregnation treatment, all the steps are automated, so that so-called high impregnation accuracy in millimeter units cannot be obtained. Therefore, continuous impregnation treatment is not adopted for electric equipment coils, such as transformers with pins and stator coils with terminals, which are particularly susceptible to adhesion of varnish to varnish-free portions because high impregnation accuracy is required. In order to solve this problem, attempts have been made to improve the shape accuracy of the hanger that holds the object to be processed of the continuous impregnation processing apparatus, or adjust the rising speed of the impregnation tank to increase the impregnation accuracy. However, in any case, if the hanger immersed in the varnish liquid in the impregnation tank loses the horizontal state, there is a problem that a high impregnation accuracy in millimeter units cannot be obtained at all. In particular, the horizontal state of the hanger greatly depends on the arrangement state of the object to be processed even if the shape accuracy of the hanger is increased. Moreover, if the object to be processed is arranged while always keeping the hanger in a horizontal state, there is a problem that workability is extremely deteriorated.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、上記を開口してワニス液を収容した含浸タン
クと、該含浸タンクを昇降動させる昇降器と、前記含浸
タンクの上方に設けられたハンガー係止棒と、被処理体
の載置床部を有し、該載置床部に立設された係合アーム
の係合部を前記ハンガー係止棒に係止させて吊下された
ハンガーと、前記係合アームに突設された水平板と、該
水平板の下方に昇降自在に設けられ、該水平板と衝合す
る水平度調節板と、該水平度調節板の昇降機能とを具備
するハンガー水平機構付連続含浸装置である。
The present invention relates to an impregnation tank that opens the above to accommodate a varnish solution, an elevator that moves the impregnation tank up and down, a hanger locking rod provided above the impregnation tank, and a floor on which a target object is placed. And a horizontal plate protruding from the engaging arm, the hanger being suspended by engaging the engaging part of the engaging arm erected on the mounting floor with the hanger engaging rod. The horizontal impregnation device with a hanger horizontal mechanism, which is provided below the horizontal plate so as to be able to move up and down, and has a horizontality adjusting plate that abuts against the horizontal plate, and an elevating function of the horizontality adjusting plate.

〔作用〕[Action]

本発明に係るハンガー水平機構付連続含浸装置によれ
ば、被処理体を全部載置して水平状態の失われたハンガ
ーを含浸タンクに浸漬する直前で、ハンガーに突設した
水平板に水平度調節板を衝合させることにより、ハンガ
ーの水平状態を回復させるものである。
According to the continuous impregnation apparatus with a hanger horizontal mechanism according to the present invention, just before immersing the hanger whose level is lost with all the objects to be treated placed in the impregnation tank, the horizontal level of the horizontal plate protruding from the hanger is The horizontal state of the hanger is restored by abutting the adjusting plate.

〔実施例〕〔Example〕

以下、本発明の実施例について図面を参照して説明す
る。第1図は、本発明の一実施例の正面図、第2図は、
同実施例の側面図である。図中1は、ワニス液2を満し
た含浸タンクである。含浸タンク1の上部は開口部にな
っており、被処理体3を保持したハンガー4(後述す
る)をワニス液2中に浸漬できるようになっている。含
浸タンク1には、被処理体3がワニス液2中に浸漬して
その体積分だけのオーバーフローしたワニス液2を受容
する受容部5が形成されている。含浸タンク1は、昇降
器6上に載置されて昇降動するようになっている。含浸
タンク1の上方には、被処理体3を載置床部上に保持し
たハンガー4が設けられている。ハンガー4は、載置床
部上に立設された係合アーム7の係合部をハンガー係止
棒8に係止させて吊下されている。係合アーム7の外側
面には、水平板9が突設されている。水平板9の下方に
は、これと衝合する水平度調節板10が図示しない昇降
機構によって昇降動自在に設けられている。
Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a front view of an embodiment of the present invention, and FIG.
It is a side view of the same Example. In the figure, 1 is an impregnation tank filled with the varnish solution 2. The upper part of the impregnation tank 1 has an opening so that a hanger 4 (described later) holding the object to be processed 3 can be immersed in the varnish solution 2. The impregnation tank 1 is provided with a receiving portion 5 for receiving the overflowed varnish liquid 2 by immersing the object 3 in the varnish liquid 2 and only its volume. The impregnation tank 1 is placed on an elevator 6 and is moved up and down. Above the impregnation tank 1, a hanger 4 that holds the object 3 to be processed is placed on the floor. The hanger 4 is suspended by engaging an engaging portion of an engaging arm 7 which is erected on the mounting floor with a hanger engaging rod 8. A horizontal plate 9 is provided on the outer surface of the engagement arm 7 so as to project therefrom. Below the horizontal plate 9, a horizontal degree adjusting plate 10 that abuts against the horizontal plate 9 is provided so as to be movable up and down by an elevator mechanism (not shown).

このように構成されたハンガー水平機構付連続含浸装置
20によれば、第3図(A)に示す如く、ハンガー4の載
置床部に複数個の被処理体3を載置してハンガー4が水
平状態を失っても、第3図(B)に示す如く、水平度調節
板10を上昇させて水平板9を衝合することにより、含
浸処理を施す直前でハンガー4の水平状態を正しく設定
することができる。このため被処理体3を保持したハン
ガー4を、被処理体3の配置状態域はハンガー4の形状
精度に何ら影響されずに、常に所定の水平状態を保って
ワニス液2中に浸漬させることができる。このためワニ
ス液2中に浸漬する被処理体3の割合を極めて正確に制
御して、ミリ単位の含浸処理を施すことができる。その
結果、ピンタイプトランス等の電気機器コイルにワニス
の連続含浸処理を高い精度で施し、かつ、生産性を著し
く向上させることができる。
Continuous impregnation device with hanger horizontal mechanism configured in this way
According to FIG. 20 , as shown in FIG. 3 (A), even if a plurality of objects 3 to be processed are placed on the floor of the hanger 4 and the hanger 4 loses its horizontal state, FIG. 3 (B) As shown in FIG. 6, by raising the horizontal degree adjusting plate 10 and abutting the horizontal plate 9 against each other, the horizontal state of the hanger 4 can be correctly set immediately before the impregnation process. For this reason, the hanger 4 holding the object 3 to be processed is always immersed in the varnish liquid 2 while keeping the predetermined horizontal state without the shape accuracy of the hanger 4 affecting the arrangement state area of the object 3. You can For this reason, it is possible to control the ratio of the object 3 to be dipped in the varnish liquid 2 very accurately and perform the impregnation treatment in millimeter units. As a result, it is possible to perform continuous impregnation of the varnish on the coil of electric equipment such as a pin type transformer with high accuracy and significantly improve the productivity.

〔発明の効果〕〔The invention's effect〕

以上説明した如く、本発明に係るハンガー水平機構付連
続含浸装置によれば、ハンガー上の被処理体の載置状態
に左右されずに、ミリ単位の高い含浸精度でワニス含浸
処理を施すことができるものである。
As described above, according to the continuous impregnation device with the hanger horizontal mechanism according to the present invention, the varnish impregnation treatment can be performed with a high impregnation accuracy of millimeter unit without being influenced by the mounting state of the object to be treated on the hanger. It is possible.

【図面の簡単な説明】[Brief description of drawings]

第1図は、本発明の一実施例の正面図、第2図は、同実
施例の側面図、第3図は、本発明の実施例の作用を示す
説明図である。 1……含浸タンク、2……ワニス液、3……被処理体、
4……ハンガー、5……受容部、6……昇降器、7……
係合アーム、8……ハンガー係止棒、9……水平板、1
0……水平度調節板、20……ハンガー水平機構付連続
含浸装置。
FIG. 1 is a front view of an embodiment of the present invention, FIG. 2 is a side view of the same embodiment, and FIG. 3 is an explanatory view showing the operation of the embodiment of the present invention. 1 ... Impregnation tank, 2 ... Varnish solution, 3 ... Object to be treated,
4 ... Hanger, 5 ... Receptor, 6 ... Elevator, 7 ...
Engaging arm, 8 ... Hanger locking rod, 9 ... Horizontal plate, 1
0: Horizontal leveling plate, 20: Continuous impregnation device with hanger horizontal mechanism.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】上部を開口してワニス液を収容した含浸タ
ンクと、該含浸タンクを昇降動させる昇降器と、前記含
浸タンクの上方に設けられたハンガー係止棒と、被処理
体の載置床部を有し、該載置床部に立設された係合アー
ムの係合部を前記ハンガー係止棒に係止させて吊下され
たハンガーと、前記係合アームに突設された水平板と、
該水平板の下方に昇降自在に設けられ、該水平板と衝合
する水平度調節板と、該水平度調節板の昇降機構とを具
備することを特徴とするハンガー水平機構付連続含浸装
置。
1. An impregnation tank having an upper part opened to accommodate a varnish solution, an elevator for moving the impregnation tank up and down, a hanger locking rod provided above the impregnation tank, and a substrate to be treated. A hanger that has a floor and is suspended by locking the engagement part of an engagement arm that is erected on the floor with the hanger locking rod, and a horizontal hanger that projects from the engagement arm. A board,
A continuous impregnation device with a hanger horizontal mechanism, which is provided below the horizontal plate so as to be able to move up and down, and includes a horizontal degree adjusting plate that abuts against the horizontal plate, and an elevating mechanism for the horizontal degree adjusting plate.
JP27783985A 1985-12-12 1985-12-12 Hanger-Continuous impregnation device with horizontal mechanism Expired - Lifetime JPH0646616B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27783985A JPH0646616B2 (en) 1985-12-12 1985-12-12 Hanger-Continuous impregnation device with horizontal mechanism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27783985A JPH0646616B2 (en) 1985-12-12 1985-12-12 Hanger-Continuous impregnation device with horizontal mechanism

Publications (2)

Publication Number Publication Date
JPS62137817A JPS62137817A (en) 1987-06-20
JPH0646616B2 true JPH0646616B2 (en) 1994-06-15

Family

ID=17588980

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27783985A Expired - Lifetime JPH0646616B2 (en) 1985-12-12 1985-12-12 Hanger-Continuous impregnation device with horizontal mechanism

Country Status (1)

Country Link
JP (1) JPH0646616B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0720907Y2 (en) * 1988-02-25 1995-05-15 株式会社トーキン Impregnation device for coils and transformers
JPH0652126U (en) * 1992-12-18 1994-07-15 株式会社三社電機製作所 Varnish impregnation device for transformer

Also Published As

Publication number Publication date
JPS62137817A (en) 1987-06-20

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