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JPH0646624B2 - Heat treatment equipment - Google Patents
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JPH0646624B2 - Heat treatment equipment - Google Patents

Heat treatment equipment

Info

Publication number
JPH0646624B2
JPH0646624B2 JP59049062A JP4906284A JPH0646624B2 JP H0646624 B2 JPH0646624 B2 JP H0646624B2 JP 59049062 A JP59049062 A JP 59049062A JP 4906284 A JP4906284 A JP 4906284A JP H0646624 B2 JPH0646624 B2 JP H0646624B2
Authority
JP
Japan
Prior art keywords
core tube
furnace core
furnace
heat treatment
cylinder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59049062A
Other languages
Japanese (ja)
Other versions
JPS60194527A (en
Inventor
博 田村
邦博 矢木
正実 小沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59049062A priority Critical patent/JPH0646624B2/en
Publication of JPS60194527A publication Critical patent/JPS60194527A/en
Publication of JPH0646624B2 publication Critical patent/JPH0646624B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60Formation of materials, e.g. in the shape of layers or pillars of insulating materials

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は熱処理装置に係り、特に電気炉を用いた熱処理
(酸化・拡散・アニール等)において、炉芯管高温部へ
空気が侵入することを低減するのに好適な熱処理装置に
関する。
Description: FIELD OF THE INVENTION The present invention relates to a heat treatment apparatus, and particularly to a heat treatment apparatus (oxidation / diffusion / annealing) using an electric furnace to prevent air from entering a high temperature portion of a furnace core tube. The present invention relates to a heat treatment apparatus suitable for reduction.

〔発明の背景〕[Background of the Invention]

従来の例えばソフトランデイング機構を備えた横形電気
炉を第1図に示す。本装置を用いてウエーハの熱処理を
行う場合、第1図に示すようにウエーハ1を乗せたサセ
プタ2をソフトランデイング架台3に固定したフオーク
4にセツトし、搬送機構5により横形電気炉(ヒータ
6,均熱管7)炉芯管9内へ挿入する。所定時間熱処理
した後ウエーハ1を架台3やフオーク4とともに引き出
す。このとき、フオークは、高純度石英で、熱処理ウエ
ーハと同径又はそれ以上の径を有する管を使用してい
る。フオーク管内へ挿入するときは炉口に蓋を設けるこ
とができず、そのため、炉芯管内へは多量の空気が侵入
する。管内、特に炉口付近では雰囲気ガスが不均一とな
り、例えば薄い酸化膜を形成する場合、ウエーハ面内の
膜厚分布が10%以上不均一となる原因となつていた。
FIG. 1 shows a conventional horizontal electric furnace equipped with, for example, a soft landing mechanism. When heat-treating a wafer using this apparatus, as shown in FIG. 1, a susceptor 2 on which a wafer 1 is placed is set on a fork 4 fixed to a soft landing frame 3, and a horizontal electric furnace (heater 6 , Soaking tube 7) Insert into the furnace core tube 9. After heat treatment for a predetermined time, the wafer 1 is pulled out together with the pedestal 3 and the forks 4. At this time, the fork is made of high-purity quartz and uses a tube having a diameter equal to or larger than that of the heat-treated wafer. When inserting into the fork pipe, a lid cannot be provided at the furnace opening, so that a large amount of air enters the furnace core pipe. Atmosphere gas becomes non-uniform in the tube, especially near the furnace opening, which is a cause of non-uniform film thickness distribution in the wafer surface of 10% or more when a thin oxide film is formed, for example.

〔発明の目的〕[Object of the Invention]

本発明の目的は、上記従来の問題を解決し、熱処理炉を
用いた熱処理工程において、周辺の空気が炉芯管内へ侵
入することを防止して、熱処理を均一に行うとともに、
炉芯管や熱処理ウエーハの汚染を低減することのできる
熱処理装置を提供することにある。
The object of the present invention is to solve the above conventional problems, in the heat treatment process using a heat treatment furnace, prevent the surrounding air from entering the furnace core tube, and perform the heat treatment uniformly,
An object of the present invention is to provide a heat treatment apparatus capable of reducing contamination of a furnace core tube and a heat treatment wafer.

〔発明の概要〕[Outline of Invention]

本発明者は、炉芯管内への空気の侵入について詳細に検
討した結果以下のような新規な知見を得た。(1)空気は
炉口に蓋がない状態では炉芯管中央部まで希釈されるこ
となく侵入する、(2)炉口に蓋を設けることにより、侵
入空気の濃度を低下し、侵入深さは浅くなる。従つて、
炉芯管内への空気侵入低減対策として炉口に蓋を設ける
ことが極めて有効である。一方、上記のように、ソフト
ランデイング機構を備えた電気炉では、炉口に蓋をする
ことができなかつた。そこで、特にソフトランデイング
機構を備えた炉芯管内への空気侵入対策を検討した結
果、フオーク自体の炉口蓋の機能をもたせればよいこと
を見出した。
The present inventor has obtained the following new findings as a result of detailed examination of the invasion of air into the furnace core tube. (1) When air does not have a lid at the furnace opening, it penetrates into the central part of the furnace core without being diluted. (2) By providing a lid at the furnace opening, the concentration of invading air is reduced and the penetration depth is increased. Becomes shallow. Therefore,
It is extremely effective to provide a lid on the furnace opening as a measure for reducing air intrusion into the furnace core tube. On the other hand, as described above, in the electric furnace equipped with the soft landing mechanism, the furnace opening could not be covered. Therefore, as a result of studying measures against air intrusion into the furnace core tube equipped with a soft landing mechanism, it was found that the fork itself should have the function of the furnace mouth cover.

〔発明の実施例〕Example of Invention

実施例 本発明の一実施例を第2図により説明する。第2図に示
したように外径12cmのフオーク4において、サセプタ
2をセツトする部分の前後にフオークと同径で長さ20
cmの石英製筒9,10を設けた。筒は両端を閉じ、空気
抜き用に5mmφの穴11,12を開けてある。また、筒
10に関しては、フオークを引き出した状態でも炉芯管
内に留め炉口蓋となるようにフオークの動作範囲を調整
してある。筒9に設けられた穴11は炉芯管8から遠い
端、即ちウエーハ1と反対の端に設けられており、炉芯
管8内に挿入された時に筒9内に侵入した外気が流れで
てもウエーハ1を汚染することがなく、また、筒10に
設けられた穴12は炉芯管8に近い端に設けられている
ので筒10内は炉芯管8側から送られてくるガスで満た
されており、炉芯管8内に挿入されても筒10から外気
等不純ガスが流れ出ず、試料が汚染されることがなく、
所望の雰囲気で熱処理を行うことができる。
Embodiment An embodiment of the present invention will be described with reference to FIG. As shown in FIG. 2, in a fork 4 having an outer diameter of 12 cm, the fork having the same diameter as the fork before and after the portion where the susceptor 2 is set has a length of 20 cm.
cm quartz tubes 9 and 10 were provided. Both ends of the cylinder are closed, and holes 11 and 12 having a diameter of 5 mm are opened for removing air. Further, with respect to the cylinder 10, the operation range of the forks is adjusted so that the forks are retained in the furnace core tube and serve as a furnace lid even when the forks are pulled out. The hole 11 provided in the cylinder 9 is provided at the end far from the furnace core tube 8, that is, the end opposite to the wafer 1, so that the outside air that has entered the cylinder 9 when it is inserted into the furnace core tube 8 can flow. However, since the wafer 1 is not contaminated and the hole 12 provided in the tube 10 is provided at the end close to the furnace core tube 8, the gas supplied from the furnace core tube 8 side is supplied into the tube 10. Is filled with, the impurity gas such as the outside air does not flow out from the cylinder 10 even when it is inserted into the furnace core tube 8, and the sample is not contaminated.
The heat treatment can be performed in a desired atmosphere.

上記フオークを備えたソフトランデイング機構付きの電
気炉を用いて1000℃、10分の酸化を行つたところ、酸
化膜厚の不均一性を±3%以下とすることができた。
When oxidation was performed at 1000 ° C. for 10 minutes using an electric furnace equipped with the above forks and having a soft landing mechanism, the nonuniformity of the oxide film thickness could be controlled to ± 3% or less.

なお、筒の部分をフオークと一体構造としても効果はわ
からない。
In addition, the effect is not known even if the cylinder part is integrated with the fork.

以上の実施例はソフトランデイング機構を備えた電気炉
について行つたが、第3図に示すようにソフトランデイ
ング機構を備えていない電気炉で、フオークが炉芯管と
接触する場合でも本発明の効果はかわらなつた。なお、
第3図において記号13,14はそれぞれ治具台および
引出し棒を示す。
The above embodiment was carried out with respect to an electric furnace having a soft landing mechanism. However, as shown in FIG. 3, in an electric furnace not having a soft landing mechanism, the effect of the present invention is obtained even when the fork comes into contact with the furnace core tube. It's a cute In addition,
In FIG. 3, symbols 13 and 14 indicate a jig base and a drawing bar, respectively.

以上の実施例で示したように、本発明はウエーハを支持
するフオークにふたの機能を持たせることにより、ソフ
トランデイング機構を備えた電気炉を用いた場合も、酸
化した酸化膜厚のウエーハ内分布の均一性を向上させる
効果がある。
As shown in the above embodiments, according to the present invention, by providing the fork supporting the wafer with the function of the lid, even when the electric furnace having the soft landing mechanism is used, the inside of the wafer having the oxidized film thickness is It has the effect of improving the uniformity of distribution.

〔発明の効果〕〔The invention's effect〕

本発明によれば、炉口から炉芯管内への空気の侵入を低
減できるので、 (1)炉芯管内の酸素濃度の減少に伴ない、薄い酸化膜を
均一性よく形成できる、 (2)熱アニールにおける酸素濃度低減によるウエーハの
酸化が低減される、 (3)炉周辺における塵埃や汚染が炉芯管内に侵入する量
を低減できる、 (4)炉周辺における環境(湿度等)の変化による熱処理
特性の変動を小さくできる、 などの効果がある。
According to the present invention, since it is possible to reduce the invasion of air from the furnace opening into the furnace core tube, (1) with the decrease of the oxygen concentration in the furnace core tube, it is possible to form a thin oxide film with good uniformity, (2) Oxidation of the wafer is reduced by reducing the oxygen concentration during thermal annealing, (3) The amount of dust and contamination around the furnace entering the furnace core tube can be reduced, (4) Due to changes in the environment (humidity, etc.) around the furnace This has the effect of reducing fluctuations in heat treatment characteristics.

【図面の簡単な説明】[Brief description of drawings]

第1図は従来のソフトランデイング機構を有する電気炉
を説明するための断面図、第2図および第3図はそれぞ
れ本発明の異なる実施例を示す図である。 1……ウエーハ、2……ソセプタ、3……フオーク架
台、4……フオーク、5……フオーク搬送機構、6……
ヒータ、7……均熱管、8……炉芯管、9,10……空
気侵入対策用筒、11,12……空気抜き用穴。
FIG. 1 is a sectional view for explaining an electric furnace having a conventional soft landing mechanism, and FIGS. 2 and 3 are views showing different embodiments of the present invention. 1 ... Wafer, 2 ... Soceptor, 3 ... Fork stand, 4 ... Fork, 5 ... Fork transport mechanism, 6 ...
Heater, 7 ... Soaking tube, 8 ... Furnace core tube, 9, 10 ... Tube for preventing air intrusion, 11, 12 ... Air vent hole.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】一端に開口部を有する炉芯管と、該開口部
から該炉芯管内に挿入され、熱処理される試料をのせる
サセプタと、該サセプタよりも該炉芯管に近い側に配置
された第1の筒と、該サセプタよりも該炉芯管から遠い
側に配置された第2の筒と、該サセプタと該第1の筒と
該第2の筒とを連動して該炉芯管内に挿入する制御手段
とを有する熱処理装置において、 上記第1の筒は上記炉芯管に近い端にのみ空気抜き用の
開口が設けられて他端が閉じられ、上記第2の筒は該炉
芯管から遠い端にのみ空気抜きようの開口が設けられて
他端が閉じられ、かつ、上記制御手段は上記サセプタを
該炉芯管から引き出したとき該第1の筒が該炉芯管内に
止まるように制御する機能を有することを特徴とする熱
処理装置。
1. A furnace core tube having an opening at one end, a susceptor for inserting a sample to be heat-treated inserted into the furnace core tube through the opening, and a side closer to the furnace core tube than the susceptor. The first cylinder arranged, the second cylinder arranged on the side farther from the furnace core tube than the susceptor, the susceptor, the first cylinder, and the second cylinder in cooperation with each other. In the heat treatment apparatus having a control means to be inserted into the furnace core tube, the first cylinder is provided with an air vent opening only at the end close to the furnace core tube and the other end is closed, and the second cylinder is An opening for bleeding air is provided only at the end far from the furnace core tube and the other end is closed, and the control means is arranged such that when the susceptor is pulled out from the furnace core tube, the first cylinder is inside the furnace core tube. A heat treatment apparatus having a function of controlling so that the heat treatment is stopped.
JP59049062A 1984-03-16 1984-03-16 Heat treatment equipment Expired - Lifetime JPH0646624B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59049062A JPH0646624B2 (en) 1984-03-16 1984-03-16 Heat treatment equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59049062A JPH0646624B2 (en) 1984-03-16 1984-03-16 Heat treatment equipment

Publications (2)

Publication Number Publication Date
JPS60194527A JPS60194527A (en) 1985-10-03
JPH0646624B2 true JPH0646624B2 (en) 1994-06-15

Family

ID=12820592

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59049062A Expired - Lifetime JPH0646624B2 (en) 1984-03-16 1984-03-16 Heat treatment equipment

Country Status (1)

Country Link
JP (1) JPH0646624B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2559403B2 (en) * 1987-04-15 1996-12-04 株式会社日立製作所 Vertical processing apparatus and processing method
JPH03297132A (en) * 1990-04-16 1991-12-27 Nec Corp Heat treatment furnace of semiconductor wafer
JP5326535B2 (en) * 2008-12-11 2013-10-30 信越化学工業株式会社 Diffusion furnace apparatus and diffusion method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5939020A (en) * 1982-08-27 1984-03-03 Hitachi Ltd heat treatment equipment

Also Published As

Publication number Publication date
JPS60194527A (en) 1985-10-03

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