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JPH0648872B2 - Vibration plate for electro-acoustic transducer - Google Patents
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JPH0648872B2 - Vibration plate for electro-acoustic transducer - Google Patents

Vibration plate for electro-acoustic transducer

Info

Publication number
JPH0648872B2
JPH0648872B2 JP62189563A JP18956387A JPH0648872B2 JP H0648872 B2 JPH0648872 B2 JP H0648872B2 JP 62189563 A JP62189563 A JP 62189563A JP 18956387 A JP18956387 A JP 18956387A JP H0648872 B2 JPH0648872 B2 JP H0648872B2
Authority
JP
Japan
Prior art keywords
diaphragm
boron nitride
film
nitride film
amorphous boron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62189563A
Other languages
Japanese (ja)
Other versions
JPS6432799A (en
Inventor
哲郎 川井
三千三 佐伯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Onkyo Corp
Proterial Ltd
Original Assignee
Onkyo Corp
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Onkyo Corp, Hitachi Metals Ltd filed Critical Onkyo Corp
Priority to JP62189563A priority Critical patent/JPH0648872B2/en
Publication of JPS6432799A publication Critical patent/JPS6432799A/en
Publication of JPH0648872B2 publication Critical patent/JPH0648872B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Diaphragms For Electromechanical Transducers (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、スピーカ,マイクロホン,その他の電気音響
変換器に使用される振動板に関するものである。
TECHNICAL FIELD The present invention relates to a diaphragm used for a speaker, a microphone, and other electroacoustic transducers.

[従来の技術] 電気音響変換器に用いられる振動板には、ピストン領域
や高域限界周波数(fH)の拡大、耐入力の増大等が求
められており、このため、軽量で高いヤング率を持つ材
料、例えばチタン,アルミニウムなどの軽量金属が用い
られている。しかし、単体材料のみで前記特性等を全て
満足するのは極めて困難である。
[Prior Art] A diaphragm used in an electroacoustic transducer is required to have an increased piston region, a high limit frequency (fH), and an increased input resistance. Therefore, it is lightweight and has a high Young's modulus. A material that has, for example, a lightweight metal such as titanium or aluminum is used. However, it is extremely difficult to satisfy all the above characteristics and the like with only a single material.

このため、チタン基材中にボロンを熱拡散した振動板
(特公昭55−15913号公報)や、BN溶液をチタン基材
上に塗布し約900℃の加熱処理によりBN層を形成し
た振動板(特公昭55−7757号公報)などが提案されてい
る。
Therefore, a diaphragm in which boron is thermally diffused in a titanium substrate (Japanese Patent Publication No. 55-15913) or a diaphragm in which a BN solution is applied on a titanium substrate and a BN layer is formed by heat treatment at about 900 ° C. (Japanese Patent Publication No. 55-7757) and the like have been proposed.

しかしながら、これら熱処理によって化合物層を形成す
るものは、振動板基体のチタンが変形しやすい温度であ
る550〜700℃程度の加熱温度で熱処理して製造された
り、体心立方構造から面心立方構造に変化して変形が生
じやすい変態点温度の885℃以上の温度で加熱処理され
るので、振動板状に成形する時に生じた残留応力が開放
されたり結晶の析出などが生じるなどして、振動板状基
材が熱変形して、ボイスコイルボビンとフリーエッジの
接合部分において寸法的に正常でなくなり、電気音響変
換特性に悪影響を及ぼす場合があった。
However, those that form the compound layer by these heat treatments are manufactured by heat treatment at a heating temperature of about 550 to 700 ° C., which is the temperature at which titanium of the diaphragm base easily deforms, or from the body-centered cubic structure to the face-centered cubic structure. Since the heat treatment is performed at a temperature of 885 ° C or higher, which is a transformation temperature that easily causes deformation, the residual stress generated when forming into a vibration plate is released, and crystal precipitation occurs. In some cases, the plate-shaped base material is thermally deformed and becomes abnormal in dimension at the joint between the voice coil bobbin and the free edge, which adversely affects the electroacoustic conversion characteristics.

このため、熱変形しにくい形状や材質のものにするな
ど、設計上での制約があった。
For this reason, there are restrictions in design such as using a shape and material that are not easily deformed by heat.

さらに、熱拡散層を形成した場合には、振動板基体の金
属組織内の不均一性が生じて振動板全体の物理特性が不
均一になり、品質が安定しないという問題点もあった。
Further, when the thermal diffusion layer is formed, there is a problem in that the nonuniformity of the metal structure of the vibration plate substrate causes nonuniformity of the physical properties of the entire vibration plate, resulting in unstable quality.

[発明が解決しようとする問題点] また、化学気相析出法あるいは電子ビーム法を用いてチ
タン箔の片面あるいは両面にボロンカーバイド(B
C)層を形成させたスピーカ用振動板も提案されてい
る(特公昭53−45136号公報)。
[Problems to be Solved by the Invention] Further, by using the chemical vapor deposition method or electron beam method, boron carbide (B
A diaphragm for a speaker in which a 4C) layer is formed has also been proposed (Japanese Patent Publication No. 53-45136).

しかし、この振動板は、チタン箔とボロンカーバイト層
との密着性が悪く、ボロンカーバイト層がはがれ易いた
め耐久性が悪いという問題点のあることを出願人自らが
後日指摘している(特公昭56−33919号公報参照)。
However, the applicant himself later pointed out that this diaphragm had a problem that the adhesion between the titanium foil and the boron carbide layer was poor and the boron carbide layer was easily peeled off, resulting in poor durability. (See Japanese Patent Publication No. 56-33919).

本発明は上述の点に鑑みてなされたものであり、品質の
安定した、軽量、高ヤング率、高剛性な電気音響変換器
用振動板を提供することを目的とするものである。
The present invention has been made in view of the above points, and an object of the present invention is to provide a diaphragm for electroacoustic transducers with stable quality, light weight, high Young's modulus, and high rigidity.

[問題点を解決するための手段] 本発明は、あらかじめ所望の形状に成形された振動板基
体上に、減圧CVD法により基体が熱変形しないような
低温度で、高ヤング率なアモルファス窒化ボロン膜を形
成したことを特徴とするものである。
[Means for Solving the Problems] The present invention provides an amorphous boron nitride having a high Young's modulus at a low temperature such that the substrate is not thermally deformed by the low pressure CVD method on a vibration plate substrate which is formed in a desired shape in advance. It is characterized in that a film is formed.

本発明において、上記振動板基体としては、チタン,ア
ルミニウム,その他の軽量金属が使用される。また、場
合によっては、これら軽量金属を主成分とする合金、ま
たはこれら軽量金属の窒化物,炭化物,若しくは炭窒化
物等の化合物等を用いて構成しても良い。
In the present invention, titanium, aluminum, or other lightweight metal is used as the diaphragm substrate. In some cases, an alloy containing these lightweight metals as a main component, or a compound such as a nitride, a carbide, or a carbonitride of these lightweight metals may be used.

また、本発明において、振動板基体表面にアモルファス
窒化ボロン膜を形成するに際しては、残留応力が残らな
いような温度で成膜することが望ましい。すなわち、本
発明等は前述したBC硬質膜を形成した場合における
膜の密着性が弱い原因を追究し、硬質膜形成時に発生す
る残留応力の存在が影響していることをつきとめ、残留
応力を発生させることなく硬質膜を形成する方法を種々
検討した結果、減圧CVD法でアモルファス窒化ボロン
膜を形成すれば好ましい結果が得られることを見出した
ものである。第1図は、アモルファス窒化ボロン膜の成
膜速度と残留応力の関係について実測した結果の一例を
示す図である。この図から明らかなようにアモルファス
窒化ボロン膜の形成に際しては、成膜条件を適当に選べ
ば、残留応力を殆どなくすことが可能であり、密着性の
良い膜が得られるのである。
Further, in the present invention, when forming the amorphous boron nitride film on the surface of the diaphragm substrate, it is desirable to form the amorphous boron nitride film at a temperature at which residual stress does not remain. That is, the present invention investigates the cause of the poor adhesion of the film when the above-mentioned B 4 C hard film is formed, and finds that the presence of residual stress generated during the formation of the hard film has an effect. As a result of various studies on a method of forming a hard film without generating the above, it was found that a preferable result can be obtained by forming an amorphous boron nitride film by a low pressure CVD method. FIG. 1 is a diagram showing an example of the results of actual measurement of the relationship between the deposition rate of an amorphous boron nitride film and the residual stress. As is clear from this figure, when the amorphous boron nitride film is formed, if the film forming conditions are appropriately selected, the residual stress can be almost eliminated, and a film having good adhesion can be obtained.

また、本発明におけるアモルファス窒化ボロン膜の硬さ
は、低すぎると適正なヤング率が得られなくなり、一
方、硬すぎると成膜時の残留応力が大きくなり剥離が生
じ易くなるので、ビッカース硬度(Hv)で1000〜3500の
硬さ程度であることが望ましい。
Further, the hardness of the amorphous boron nitride film in the present invention is too low to obtain a proper Young's modulus, while if too hard, the residual stress during film formation becomes large and peeling easily occurs, so Vickers hardness ( It is desirable that the hardness is about 1000 to 3500 in Hv).

また、アモルファス窒化ボロン膜の厚さは必要に応じて
適当な厚さにすれば良いが、膜の厚さが0.1μm未満と
薄くなりすぎると高音の伸びの改善効果があまり良くな
らないので、少なくとも膜の厚さは0.1μm以上あるこ
とが望ましい。一方、膜の厚さが数10μm以上程度に
厚くなっても電気音響変換作用上は特に大きな問題は生
じないので、任意の厚さに設計しても良い。但し、膜厚
が5μmを越えると剥離が生じ易くなるので、好ましく
は5μm以下とするのが良い。
Further, the thickness of the amorphous boron nitride film may be set to an appropriate thickness as necessary, but if the thickness of the film is less than 0.1 μm, the improvement effect of high-pitched sound does not improve so much. The thickness of the film is preferably 0.1 μm or more. On the other hand, even if the thickness of the film is increased to several tens of μm or more, there is no particular problem in terms of electroacoustic conversion action, so that the film may be designed to have an arbitrary thickness. However, if the film thickness exceeds 5 μm, peeling is likely to occur, so the film thickness is preferably 5 μm or less.

〔実施例〕〔Example〕

以下、本発明を実施例に基づき、より詳細に説明する。 Hereinafter, the present invention will be described in more detail based on examples.

(実施例1) 20μm厚さのチタン箔を用いて、常法により成形し
て、ドームの高さ6.5mm、直径25mmのドーム状成形品
と成し、次に両面に約2μmの深さまでイオン窒化処理
を施したドーム状の振動板基体を作製した。この基体を
減圧CVD装置内に入れ、反応温度を450℃、反応圧力
を0.5Torrとし、反応ガスとしては5%B2H6(H2稀釈)
およびNH3を、キャリヤガスとしてはH2を夫々使用し、N
H3/B2H6=5の条件で1.5時間成膜して、基体の表面お
よび裏面に3μ厚さのアモルファス窒化ボロン膜が形成
された振動板を得た。次に、そのフランジ部を切り取
り、振動リード法により、ヤング率(E)を測定したと
ころ、1.16×1012dyn/cm2であった。また、水置換
法により比重(ρ)を測定したところ3.8g/cm3であっ
た。ビッカース硬度計による硬度(Hv)の測定の結果
は、3500であった。
(Example 1) Using a titanium foil having a thickness of 20 μm, a dome-shaped molded product having a dome height of 6.5 mm and a diameter of 25 mm was formed by a conventional method, and then ion-formed to a depth of about 2 μm on both sides. A dome-shaped diaphragm substrate that was subjected to a nitriding treatment was manufactured. This substrate was placed in a low pressure CVD apparatus, the reaction temperature was 450 ° C., the reaction pressure was 0.5 Torr, and the reaction gas was 5% B 2 H 6 (H 2 dilution).
And NH 3 and H 2 as a carrier gas, respectively.
Film formation was carried out under the condition of H 3 / B 2 H 6 = 5 for 1.5 hours to obtain a vibration plate having an amorphous boron nitride film of 3 μ thickness formed on the front and back surfaces of the substrate. Next, the flange portion was cut off, and the Young's modulus (E) was measured by the vibration lead method, and it was 1.16 × 10 12 dyn / cm 2 . The specific gravity (ρ) measured by the water displacement method was 3.8 g / cm 3 . The result of measuring the hardness (Hv) with a Vickers hardness meter was 3,500.

なお、振動板基体のヤング率(E)は0.89×1012dy
n/cm2であった。また比重(ρ)は4.51であった。また
硬度(Hv)は1,100であった。
The Young's modulus (E) of the diaphragm base is 0.89 × 10 12 dy
It was n / cm 2 . The specific gravity (ρ) was 4.51. The hardness (Hv) was 1,100.

尚、上記振動板を作製するに際して、減圧CVD処理中の
振動板表面の温度を赤外線温度計で測定したところ、約
450℃に維持されたままであり、振動板基体に熱変形
が生じる恐れのある温度(約550℃)以下に維持され
ており、得られた振動板は寸法精度の良いものであっ
た。
In producing the above-mentioned diaphragm, the temperature of the surface of the diaphragm during the low pressure CVD treatment was measured with an infrared thermometer, and it was maintained at about 450 ° C., which may cause thermal deformation of the diaphragm substrate. The temperature was maintained below the temperature (about 550 ° C.), and the obtained diaphragm had good dimensional accuracy.

この振動板に、ポリエステル繊維布にアクリル樹脂をコ
ーティングした同一のエッジを貼付け、ボイスコイルを
接着して、常法のムービングコイル型ドームスピーカの
磁気回路に組込み、ドーム型音響用スピーカユニットを
形成して、音圧周波数特性を測定した。その結果を第2
図に示す。
The same edge of polyester fiber cloth coated with acrylic resin was attached to this diaphragm, the voice coil was adhered, and incorporated in the magnetic circuit of a conventional moving coil type dome speaker to form a dome type speaker unit. Then, the sound pressure frequency characteristic was measured. The result is the second
Shown in the figure.

本発明のアモルファス窒化ボロン膜を形成した振動板を
用いたスピーカは、低音共振周波数(f0)が約1100Hz、
高域限界周波数(fH)が約31,200Hzの周波数特性が得ら
れている。また、ハードドームとしては異例の低歪率で
あり、fH近辺で基本音圧に対して−50dBの優れた特性
である。
The speaker using the diaphragm having the amorphous boron nitride film of the present invention has a low resonance frequency (f 0 ) of about 1100 Hz,
The high frequency limit frequency (fH) is about 31,200Hz. Further, it has an unusually low distortion rate as a hard dome, and has an excellent characteristic of -50 dB with respect to the basic sound pressure in the vicinity of fH.

一方、比較のために、アモルファス窒化ボロン膜を形成
していない振動板基体を用い、上記と同様にしてドーム
型音響用スピーカユニットを形成し、その音圧周波数特
性を測定した。その結果を第3図に示す。アモルファス
窒化ボロン膜を形成していない比較例の振動板を用いた
スピーカにおいては、f0が約1,260Hz、fHが約28,500Hz
の周波数特性である。
On the other hand, for comparison, a diaphragm base for which an amorphous boron nitride film was not formed was used to form a speaker unit for dome-type sound in the same manner as above, and the sound pressure frequency characteristics were measured. The results are shown in FIG. In the speaker using the diaphragm of the comparative example in which the amorphous boron nitride film is not formed, f 0 is about 1,260 Hz and fH is about 28,500 Hz.
Is the frequency characteristic of.

第2図および第3図を比較すれば明らかなように、本発
明のアモルファス窒化ボロン膜を形成した振動板を用い
たものは、BN膜による重量増加にもかかわらず比較例の
ものに比べて約2,700Hzも高域が伸びている。また、f0
も重量増加分が寄与して約160Hzも低減が伸びてお
り、再生周波数範囲の拡大が著しく大きいことがわか
る。
As is clear from a comparison of FIGS. 2 and 3, the one using the diaphragm having the amorphous boron nitride film of the present invention, compared with the one of the comparative example, despite the weight increase due to the BN film. The high frequency range has been extended to about 2,700 Hz. Also, f 0
The increase in weight also contributes to the reduction of about 160 Hz, which indicates that the expansion of the reproduction frequency range is extremely large.

(実施例2) 成膜時間を5分としたほかは実施例1と同じ条件で、0.
1μm厚さのアモルファス窒化ボロン膜が形成された振
動板を作製した。実施例1と同様にして物性を測定した
結果、E=0.95×1012dyn/cm2、ρ=4.50g/c
m3、Hv=3500であった。
(Example 2) Under the same conditions as in Example 1 except that the film formation time was 5 minutes,
A diaphragm having an amorphous boron nitride film with a thickness of 1 μm was manufactured. As a result of measuring physical properties in the same manner as in Example 1, E = 0.95 × 10 12 dyn / cm 2 , ρ = 4.50 g / c
m 3 and Hv = 3500.

尚、減圧CVD処理中の振動板表面の温度を測定したとこ
ろ、実施例1と同様に約450℃に維持されたままであ
り、得られた振動板は寸法精度の良いものであった。
When the temperature of the surface of the diaphragm during the low pressure CVD treatment was measured, it remained at about 450 ° C. as in Example 1, and the obtained diaphragm had good dimensional accuracy.

この振動板を用い、実施例1と同様にしてドーム型音響
用スピーカユニットを形成して、音圧周波数特性を測定
した結果、f0が約1260Hz、fHが約28,700Hzであった。
Using this diaphragm, a dome-type acoustic speaker unit was formed in the same manner as in Example 1, and sound pressure frequency characteristics were measured. As a result, f 0 was about 1260 Hz and fH was about 28,700 Hz.

(実施例3) 減圧CVD法の処理方法を調整し、反応温度550℃、反応圧
力0.5Torrとし、反応ガスとして5%B2H6(H2希釈)お
よびNH3を、キャリアガスとしてH2を夫々使用し、NH3
B2H6=10の条件で1時間成膜し、基体表面に3μm厚
さのアモルファス窒化ボロン膜が形成された振動板を作
製した。実施例1と同じ方法で物性を測定したところ、
E=1.15×1012dyn/cm2、ρ=3.75g/cm3、Hv=1
000であった。また、減圧CVD処理中の振動板表面の温度
は約550℃に維持されていたが、振動板基材に熱変形
は生ぜず、得られた振動板は実用上問題のない寸法精度
の良いものであった。
(Example 3) By adjusting the treatment method of the low pressure CVD method, the reaction temperature was 550 ° C, the reaction pressure was 0.5 Torr, 5% B 2 H 6 (H 2 dilution) and NH 3 were used as the reaction gas, and H 2 was used as the carrier gas. , NH 3 /
Film formation was carried out for 1 hour under the condition of B 2 H 6 = 10 to produce a vibration plate having an amorphous boron nitride film with a thickness of 3 μm formed on the surface of the substrate. When the physical properties were measured by the same method as in Example 1,
E = 1.15 × 10 12 dyn / cm 2 , ρ = 3.75 g / cm 3 , Hv = 1
It was 000. The temperature of the diaphragm surface was maintained at about 550 ° C during the reduced pressure CVD treatment, but the diaphragm base material did not undergo thermal deformation, and the resulting diaphragm had good dimensional accuracy with no practical problems. Met.

次に、この振動板を用い、実施例1と同様にしてドーム
型音響用スピーカユニットを形成し、その音圧周波数特
性を測定した。
Next, using this diaphragm, a dome-type speaker unit for acoustics was formed in the same manner as in Example 1, and the sound pressure frequency characteristics thereof were measured.

測定結果は、f0が約1,100Hz、fHが約32,100Hzであっ
た。
The measurement results were f 0 of about 1,100 Hz and fH of about 32,100 Hz.

〔発明の効果〕〔The invention's effect〕

以上詳述したように、アモルファス窒化ボロン層を形成
した本発明の振動板は、アモルファス窒化ボロン膜を減
圧CVD法により振動板基体上に基体が熱変形しない低温
度処理により所望の膜厚さと硬さを調節して容易に得る
ことが出来るものであり、品質が安定で、高音限界周波
数(fH)が高いため高音域の伸びが良く、かつ、音圧再
生範囲が広い優れた特性の電気音響変換機が実現できる
利点がある。
As described in detail above, the diaphragm of the present invention in which the amorphous boron nitride layer is formed has a desired film thickness and hardness of the amorphous boron nitride film by the low temperature treatment which does not cause the substrate to be thermally deformed on the diaphragm substrate by the low pressure CVD method. The electroacoustic sound has excellent characteristics because the quality is stable, the treble limit frequency (fH) is high, the treble range is wide, and the sound pressure reproduction range is wide. There is an advantage that a converter can be realized.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明アモルファス窒化ボロン膜を形成する際
の成膜温度と残留応力の関係を示す図、第2図は本発明
による振動板を用いた電気音響変換器の音圧周波数特性
測定結果を示す図、第3図は被膜を施していない比較例
振動板を用いた電気音響変化器の音圧周波数特性測定結
果を示す図である。
FIG. 1 is a diagram showing a relationship between a film forming temperature and a residual stress when forming an amorphous boron nitride film of the present invention, and FIG. 2 is a result of measuring a sound pressure frequency characteristic of an electroacoustic transducer using a diaphragm according to the present invention. FIG. 3 and FIG. 3 are diagrams showing the results of measuring the sound pressure frequency characteristics of the electroacoustic transformer using the comparative diaphragm without coating.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】振動板基体上にアモルファス窒化ボロン膜
を形成したことを特徴とする電気音響変換器用振動板。
1. A diaphragm for an electroacoustic transducer, comprising an amorphous boron nitride film formed on a diaphragm base.
【請求項2】上記振動板基体が、チタン、アルミニウ
ム、その他の軽量金属、これら軽量金属の合金、または
これら軽量金属の化合物からなることを特徴とする特許
請求の範囲第1項記載の電気音響変換器用振動板。
2. The electroacoustic apparatus according to claim 1, wherein the diaphragm substrate is made of titanium, aluminum, other lightweight metals, alloys of these lightweight metals, or compounds of these lightweight metals. Vibration plate for converter.
【請求項3】上記アモルファス窒化ボロン膜がビッカー
ス硬度1000〜3500の硬さであることを特徴とする特許請
求の範囲第1項または第2項記載の音響変換器用振動
板。
3. The diaphragm for an acoustic transducer according to claim 1 or 2, wherein the amorphous boron nitride film has a Vickers hardness of 1000 to 3500.
【請求項4】上記アモルファス窒化ボロン膜の厚さが0.
1μm以上であることを特徴とする特許請の範囲第1項
乃至第3項のいずれかに記載の電気音響変換器用振動
板。
4. The thickness of the amorphous boron nitride film is 0.
The diaphragm for an electroacoustic transducer according to any one of claims 1 to 3 of the patent contract, which is 1 μm or more.
JP62189563A 1987-07-29 1987-07-29 Vibration plate for electro-acoustic transducer Expired - Lifetime JPH0648872B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62189563A JPH0648872B2 (en) 1987-07-29 1987-07-29 Vibration plate for electro-acoustic transducer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62189563A JPH0648872B2 (en) 1987-07-29 1987-07-29 Vibration plate for electro-acoustic transducer

Publications (2)

Publication Number Publication Date
JPS6432799A JPS6432799A (en) 1989-02-02
JPH0648872B2 true JPH0648872B2 (en) 1994-06-22

Family

ID=16243427

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62189563A Expired - Lifetime JPH0648872B2 (en) 1987-07-29 1987-07-29 Vibration plate for electro-acoustic transducer

Country Status (1)

Country Link
JP (1) JPH0648872B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7047028B2 (en) 2002-11-15 2006-05-16 Telefonaktiebolaget Lm Ericsson (Publ) Optical fiber coupling configurations for a main-remote radio base station and a hybrid radio base station

Also Published As

Publication number Publication date
JPS6432799A (en) 1989-02-02

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