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JPH0649608B2 - Non-magnetic material for thin film magnetic head substrate and manufacturing method thereof - Google Patents
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JPH0649608B2 - Non-magnetic material for thin film magnetic head substrate and manufacturing method thereof - Google Patents

Non-magnetic material for thin film magnetic head substrate and manufacturing method thereof

Info

Publication number
JPH0649608B2
JPH0649608B2 JP63090544A JP9054488A JPH0649608B2 JP H0649608 B2 JPH0649608 B2 JP H0649608B2 JP 63090544 A JP63090544 A JP 63090544A JP 9054488 A JP9054488 A JP 9054488A JP H0649608 B2 JPH0649608 B2 JP H0649608B2
Authority
JP
Japan
Prior art keywords
less
crystal grain
grain size
magnetic head
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP63090544A
Other languages
Japanese (ja)
Other versions
JPH01264949A (en
Inventor
義弘 末永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Sumitomo Special Metals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Special Metals Co Ltd filed Critical Sumitomo Special Metals Co Ltd
Priority to JP63090544A priority Critical patent/JPH0649608B2/en
Publication of JPH01264949A publication Critical patent/JPH01264949A/en
Publication of JPH0649608B2 publication Critical patent/JPH0649608B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Magnetic Ceramics (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Magnetic Heads (AREA)
  • Thin Magnetic Films (AREA)

Description

【発明の詳細な説明】 利用産業分野 この発明は、薄膜磁気ヘッド基板用Znフェライトに係
り、酸化カリウム、酸化ナトリウムの添加元素により、
均一な微細結晶を有し、無孔化されすぐれた加工性を有
するZnフェライトに関する。
TECHNICAL FIELD The present invention relates to a Zn ferrite for a thin film magnetic head substrate, which includes an additive element of potassium oxide or sodium oxide,
The present invention relates to a Zn ferrite having uniform fine crystals, being non-porous and having excellent workability.

背景技術 薄膜磁気ヘッド基板は、一般に精密加工をするため、チ
ッピング発生のないすぐれた加工性を有し、かつ空孔が
少なく、均一な微細結晶からなり媒体とのなじみ性が良
好なことが要望されている。
Background Art Since a thin film magnetic head substrate is generally subjected to precision processing, it is required to have excellent workability without chipping, to have few holes, and to be made of uniform fine crystals and have good compatibility with the medium. Has been done.

従来、薄膜磁気ヘッド用基板には、ガラスやシリカ系、
アルミナ系等の非磁性材が実用化されていた。
Conventionally, glass and silica-based
Non-magnetic materials such as alumina have been put to practical use.

また、出願人は、薄膜磁気ヘッド用基板として、すぐれ
た特性を有するが、加工面に微細孔が発生するため実用
化されていなかったNi-Znフェライトに関し、加工面の
微細孔発生を防止した該フェライトを提案(特開昭61-1
11512号)した。
In addition, the applicant has excellent characteristics as a substrate for a thin film magnetic head, but with regard to Ni-Zn ferrite which has not been put into practical use because micropores are generated on the processed surface, the generation of micropores on the processed surface is prevented. Proposed the ferrite (JP-A-61-1)
No. 11512).

さらに、Zn-フェライトとして、ZnO46〜52モル%、Fe2O
348〜54モル%からなる組成のものが知られているが、
前記Znフェライトは磁気ヘッド形状にレール加工時、チ
ッピングが発生する恐れがあり、製品歩留の低下を招来
してきた。
Further, as Zn-ferrite, ZnO 46 to 52 mol%, Fe 2 O
A composition of 3 48 to 54 mol% is known,
The Zn ferrite may cause chipping when the rail is processed into a magnetic head shape, resulting in a reduction in product yield.

発明の目的 この発明は、従来の薄膜磁気ヘッド基板用Znフェライト
の欠点を除去し、空孔が少なく、かつ均一な微細結晶か
らなり、精密加工性のすぐれた薄膜磁気ヘッド基板用Zn
フェライトの提供を目的としている。
It is an object of the present invention to eliminate the drawbacks of the conventional Zn ferrite for thin film magnetic head substrates, to be formed of uniform fine crystals with few holes, and to be used for thin film magnetic head substrates with excellent precision workability.
The purpose is to provide ferrite.

発明の概要 この発明は、 ZnO46〜52モル%、 Fe2O348〜54モル%からなる基本組成に、 K2O及びNa2Oの1種または2種を0.005〜0.1wt%含有し、 気孔率0.05%以下、平均結晶粒径が10μm以下を有する
ことを特徴とする薄膜磁気ヘッド基板用非磁性材料であ
る。
SUMMARY OF THE INVENTION The present invention contains one or two kinds of K 2 O and Na 2 O in 0.005 to 0.1 wt% in a basic composition of 46 to 52 mol% of ZnO and 48 to 54 mol% of Fe 2 O 3 , It is a non-magnetic material for a thin film magnetic head substrate, which has a porosity of 0.05% or less and an average crystal grain size of 10 μm or less.

また、この発明は、 ZnO46〜52モル%、Fe2O348〜54モル%からなる基本組成
に、K2O及びNa2Oの1種または2種を0.005〜0.1wt%含有
する組成になる如く、原料粉末を配合混合したり、ある
いは共沈原料を成型後、 前記成型体を1000℃〜1300℃に予備焼結して密度が理論
密度の95%以上、平均結晶粒径を10μm以下とした後、 前記焼結体を、温度900℃〜1300℃、 600kg/cm2〜2000kg/cm2に1時間〜5時間保持した熱間
静水圧プレス処理することにより、 成品の気孔率が0.05%以下、平均結晶粒径が 10μm以下であることを特徴とする薄膜磁気ヘッド基板
用非磁性材料を得ることができる。
In addition, the present invention provides a basic composition consisting of 46 to 52 mol% ZnO and 48 to 54 mol% Fe 2 O 3 in a composition containing 0.005 to 0.1 wt% of one or two of K 2 O and Na 2 O. As described above, the raw material powders are mixed and mixed, or the coprecipitated raw material is molded, and the compact is pre-sintered at 1000 ° C to 1300 ° C to have a density of 95% or more of the theoretical density and an average crystal grain size of 10 μm or less. After that, the sintered body is hot isostatically pressed at a temperature of 900 ° C to 1300 ° C and a pressure of 600 kg / cm 2 to 2000 kg / cm 2 for 1 to 5 hours, so that the porosity of the product is 0.05 %, And the average crystal grain size is 10 μm or less, a non-magnetic material for a thin film magnetic head substrate can be obtained.

発明の効果 この発明は、Znフェライトにおいて、特定量のK2O、Na2
Oの1種または2種を含有することを特徴とし、成品中
には空孔が少なく、かつ結晶粒径が微細で均一であり、
精密加工時、チッピング等が発生せず、すぐれた加工性
を有し、記録媒体とのなじみが良好となる。
EFFECTS OF THE INVENTION The present invention relates to Zn ferrite containing a specific amount of K 2 O and Na 2
Characterized by containing one or two kinds of O, the product has few pores, and the crystal grain size is fine and uniform.
It does not cause chipping during precision processing, has excellent workability, and is well compatible with recording media.

発明の構成 この発明において、基本組成が、ZnO46〜52モル%、Fe2
O348〜54モル%の組成範囲外では、十分なる焼結性が得
られず、結晶粒径も不均一となり、薄膜磁気ヘッド基板
としては実用的ではない。
Structure of the Invention In the present invention, the basic composition is ZnO 46-52 mol%, Fe 2
Outside the composition range of O 3 48 to 54 mol%, sufficient sinterability cannot be obtained and the crystal grain size becomes nonuniform, which is not practical as a thin film magnetic head substrate.

この発明において、K2O、Na2Oの1種または2種が、0.0
05wt%未満ではその効果が十分でなく、また、0.1wt%を
超えると、焼結性が低下して、結晶粒径が不均一とな
り、緻密な焼結体が得られず、加工性も劣化するので好
ましくない。
In the present invention, one or two of K 2 O and Na 2 O is 0.0
If it is less than 05 wt%, the effect is not sufficient, and if it exceeds 0.1 wt%, the sinterability decreases, the crystal grain size becomes non-uniform, a dense sintered body cannot be obtained, and the workability also deteriorates. Is not preferred.

この発明において、成品のZnフェライトの気孔率を0.05
%以下、平均結晶粒径を10μm以下に限定した理由は、
気孔率が0.05%を超え、平均結晶粒径が10μmを超える
と、このフェライト素材を所要の磁気ヘッド形状に溝加
工する際に、チッピングが発生し易く、所定形状に加工
することはできず、また、磁性膜が加工時に剥離する恐
れがあるため好ましくない。
In the present invention, the porosity of the product Zn ferrite is 0.05
%, The reason for limiting the average crystal grain size to 10 μm or less is
If the porosity exceeds 0.05% and the average crystal grain size exceeds 10 μm, chipping tends to occur when grooving this ferrite material into the required magnetic head shape, and it cannot be processed into a predetermined shape. Further, the magnetic film may peel off during processing, which is not preferable.

この発明の予備焼結条件において、焼結温度が1000℃未
満では、緻密な焼結体が得られず、また1300℃を超える
と、焼結体の結晶粒径が不均一となり、熱間静水圧プレ
ス処理後、精密加工性の劣化を招来するため好ましくな
い。
In the pre-sintering conditions of the present invention, if the sintering temperature is less than 1000 ° C, a dense sintered body cannot be obtained, and if it exceeds 1300 ° C, the crystal grain size of the sintered body becomes non-uniform and the hot static After the hydraulic press treatment, the precision workability is deteriorated, which is not preferable.

また、予備焼結時間は、1時間未満では緻密な焼結体が
得られず、また、5時間を超えると焼結体の結晶粒径が
不均一となり、熱間静水圧プレス処理後においても空孔
がなく、結晶粒径の均一な緻密成品を得ることはでき
ず、すぐれた加工性の成品が得られない。
If the pre-sintering time is less than 1 hour, a dense sintered body cannot be obtained, and if the pre-sintering time exceeds 5 hours, the crystal grain size of the sintered body becomes nonuniform, and even after hot isostatic pressing. Since there are no pores and a dense product with a uniform crystal grain size cannot be obtained, a product with excellent workability cannot be obtained.

また、熱間静水圧プレス処理条件は、温度900℃〜1300
℃、圧力600kg/cm2〜2000kg/cm2にて、保持時間1時間
〜5時間の条件以外では、気孔率0.05%以下、平均結晶
粒径が10μm以下の緻密、かつすぐれた精密加工性を有
するZnフェライトを得ることができない。
In addition, hot isostatic press treatment conditions are temperature 900 ℃ ~ 1300
° C., at a pressure 600kg / cm 2 ~2000kg / cm 2 , except the conditions of retention time of 1 hour to 5 hours, the porosity of 0.05% or less, the average crystal grain size is less 10μm dense and excellent precision processability It is impossible to obtain Zn ferrite.

この発明において、原料として酸化物を用いてもよい
が、これら酸化物が分解によって得られる炭酸塩、水酸
化物、蓚酸塩等を用いることができる。
In the present invention, oxides may be used as raw materials, but carbonates, hydroxides, oxalates and the like obtained by decomposition of these oxides can be used.

実施例 原料として、Fe2O3、ZnO及び添加物として、K2O、Na2O
を第1表の如く配合し、ボールミル中で十分混合した
後、大気中で1000℃の仮焼きを行なった。
Examples Fe 2 O 3 , ZnO as raw materials and K 2 O, Na 2 O as additives
Were blended as shown in Table 1, thoroughly mixed in a ball mill, and then calcined at 1000 ° C. in the atmosphere.

さらに、ボールミルで粉砕して、粒径2.0μm以下とし
た。
Further, it was crushed with a ball mill to have a particle size of 2.0 μm or less.

この原料粉末にバインダーを添加し、造粒後、40mm×40
mm寸法の塊状に成型し、前記成型体を1250℃、1時間の
予備焼結を行ない、第1表の如き焼結性平均結晶粒径の
焼結体を得た。
After adding a binder to this raw material powder and granulating, 40 mm x 40
It was molded into a lump having a size of mm, and the molded body was presintered at 1250 ° C. for 1 hour to obtain a sintered body having a sinterable average crystal grain size as shown in Table 1.

次いで、この焼結体を熱間静水圧プレス装置にて、保持
温度1200℃、保持時間2時間、圧力1000kg/cm2の条件に
て処理した。
Next, this sintered body was treated with a hot isostatic press under the conditions of a holding temperature of 1200 ° C., a holding time of 2 hours, and a pressure of 1000 kg / cm 2 .

熱間静水圧プレス処理した試験片の気孔率、平均粒径、
及び切削機を使用して切断加工した場合、試験片に発生
する大きさ5μm以上のチッピングの有無状況を第1表
に表す。
Porosity, average particle size, of hot isostatic pressed test pieces
Table 1 shows the presence / absence of chipping having a size of 5 μm or more generated in the test piece when cut and processed using a cutting machine.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】ZnO46〜52モル%、Fe2O348〜54モル%から
なる基本組成に、K2O及びNa2Oの1種または2種を0.005
〜0.1wt%含有し、気孔率0.05%以下、平均結晶粒径が10
μm以下を有することを特徴とする薄膜磁気ヘッド基板
用非磁性材料。
1. A basic composition comprising 46 to 52 mol% of ZnO and 48 to 54 mol% of Fe 2 O 3 and 0.005 of one or two of K 2 O and Na 2 O.
~ 0.1wt% content, porosity 0.05% or less, average crystal grain size 10
A non-magnetic material for a thin-film magnetic head substrate, which has a thickness of μm or less.
【請求項2】ZnO46〜52モル%、Fe2O348〜54モル%から
なる基本組成に、K2O及びNa2Oの1種または2種を0.005
〜0.1wt%含有の組成が得られるよう配合された成形体
を、1000℃〜1300℃に予備焼結して、密度が理論密度の
95%以上、平均結晶粒径を10μm以下とした後、前記焼
結体を熱間静水圧プレス処理して、気孔率0.05%以下、
平均結晶粒径が10μm以下の成品を得ることを特徴とす
る薄膜磁気ヘッド基板用非磁性材料の製造方法。
2. A basic composition comprising 46 to 52 mol% of ZnO and 48 to 54 mol% of Fe 2 O 3 and 0.005 of one or two of K 2 O and Na 2 O.
The molded product blended to obtain a composition containing ~ 0.1wt% is pre-sintered at 1000 ℃ ~ 1300 ℃,
After the average crystal grain size is 95% or more and the average crystal grain size is 10 μm or less, the sintered body is subjected to hot isostatic pressing to obtain a porosity of 0.05% or less,
A method for producing a non-magnetic material for a thin-film magnetic head substrate, characterized in that a product having an average crystal grain size of 10 μm or less is obtained.
JP63090544A 1988-04-13 1988-04-13 Non-magnetic material for thin film magnetic head substrate and manufacturing method thereof Expired - Fee Related JPH0649608B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63090544A JPH0649608B2 (en) 1988-04-13 1988-04-13 Non-magnetic material for thin film magnetic head substrate and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63090544A JPH0649608B2 (en) 1988-04-13 1988-04-13 Non-magnetic material for thin film magnetic head substrate and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JPH01264949A JPH01264949A (en) 1989-10-23
JPH0649608B2 true JPH0649608B2 (en) 1994-06-29

Family

ID=14001358

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63090544A Expired - Fee Related JPH0649608B2 (en) 1988-04-13 1988-04-13 Non-magnetic material for thin film magnetic head substrate and manufacturing method thereof

Country Status (1)

Country Link
JP (1) JPH0649608B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2570891B2 (en) * 1990-06-20 1997-01-16 日本ビクター株式会社 Substrate for magnetic head

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58185437A (en) * 1982-04-24 1983-10-29 Tohoku Metal Ind Ltd Nonmagnetic zinc ferrite and preparation thereof

Also Published As

Publication number Publication date
JPH01264949A (en) 1989-10-23

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