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JPH0653630B2 - Thin film type superconducting element - Google Patents
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JPH0653630B2 - Thin film type superconducting element - Google Patents

Thin film type superconducting element

Info

Publication number
JPH0653630B2
JPH0653630B2 JP62183215A JP18321587A JPH0653630B2 JP H0653630 B2 JPH0653630 B2 JP H0653630B2 JP 62183215 A JP62183215 A JP 62183215A JP 18321587 A JP18321587 A JP 18321587A JP H0653630 B2 JPH0653630 B2 JP H0653630B2
Authority
JP
Japan
Prior art keywords
substrate
thin film
superconductor
temperature
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62183215A
Other languages
Japanese (ja)
Other versions
JPS6427120A (en
Inventor
孝一 津田
道人 室井
裕司 鯉沼
幸則 河村
和郎 向江
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP62183215A priority Critical patent/JPH0653630B2/en
Publication of JPS6427120A publication Critical patent/JPS6427120A/en
Publication of JPH0653630B2 publication Critical patent/JPH0653630B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E40/00Technologies for an efficient electrical power generation, transmission or distribution
    • Y02E40/60Superconducting electric elements or equipment; Power systems integrating superconducting elements or equipment

Landscapes

  • Inorganic Compounds Of Heavy Metals (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は希土類元素(Ln),アルカリ土類金属元素(M),
銅(Cu),酸素(O)からなる複合酸化物超電導体を、電気
絶縁性基板上に薄膜として形成した薄膜型超電導素子に
関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention relates to rare earth elements (Ln), alkaline earth metal elements (M),
The present invention relates to a thin film type superconducting element in which a composite oxide superconductor composed of copper (Cu) and oxygen (O) is formed as a thin film on an electrically insulating substrate.

〔従来の技術〕[Conventional technology]

1986年にベドノルツらが、LA-Ba-Cu-O系複合酸化物
で、高い臨界温度(Tc)を有する超電導物質の存在を示し
て以来、Tcが急激に上昇し、1987年2月には98K
が記録された。これにより、液体窒素を冷媒とする超電
導体の実用化の可能性が出てきた。
Since Bednorz et al. In 1986 showed the existence of a superconducting material having a high critical temperature (Tc) in a LA-Ba-Cu-O system composite oxide, Tc increased sharply, and in February 1987 98K
Was recorded. As a result, there is a possibility of practical application of a superconductor using liquid nitrogen as a refrigerant.

これまでに発見されている高いTcをもつ物質としては、
Ln-M-Cu-O系複合酸化物超電導体(ただし、LnはLa,Nd,P
m,Sm,Eu,Gd,Dy,Ho,Er,Tm,Yb,Lu,Yのうちの少なくとも一
種類;MはBa,Sr,Caのうちの少なくとも一種類)が知ら
れている。例えば、LnM2Cu3O7-k(0<k≦0.5)なる組
成を有する超電導体である。
As substances with high Tc that have been discovered so far,
Ln-M-Cu-O based complex oxide superconductor (where Ln is La, Nd, P
At least one of m, Sm, Eu, Gd, Dy, Ho, Er, Tm, Yb, Lu, and Y; M is at least one of Ba, Sr, and Ca) is known. For example, it is a superconductor having a composition of LnM 2 Cu 3 O 7-k (0 <k ≦ 0.5).

Ln-M-Cu-O系複合酸化物超電導体は、焼結体,薄膜,単
結晶,線材など様々な形態で適用されており、電子デバ
イスとしてこの材料を使用する場合には、薄膜または単
結晶として用いるのが一般的である。単結晶では、高い
Tcをもつ結晶の製造が難しく、デバイス化では薄膜が先
行するものと予測される。
Ln-M-Cu-O composite oxide superconductors are applied in various forms such as sintered bodies, thin films, single crystals, and wire rods. When using this material as an electronic device, thin film or single It is generally used as a crystal. High for single crystals
The production of crystals with Tc is difficult, and it is expected that thin films will precede the deviceization.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

ところで、薄膜を作製する場合には、必ず基板が必要と
なるため、薄膜と基板との熱膨張係数が重要な因子とな
る。特に、Ln-M-Cu-O系複合酸化物を基板上に、高温下
で薄膜として形成する場合には、高基板温度下で製膜す
るか,または低基板温度下で製膜した後、高温で熱処理
する方法がとられるので、他の薄膜にまして基板と薄膜
との熱膨張係数が互いに近い値を有することが望まれ
る。本発明者らが測定したデータによると、Ln-M-Cu-O
系複合酸化物の熱膨張係数は金属の値に近く、酸化物薄
膜の基板としてよく用いられている石英ガラスの値より
一桁以上大きく、またアルミナ基板に比べても数倍大き
いことが判明した。このため、石英ガラス基板やアルミ
ナ基板上に薄膜を形成すると、製膜中,あるいは液体窒
素温度に冷却中に薄膜にクラックが発生し、超電導体の
劣化を招き易い。さらに、石英ガラス基板やアルミナ基
板はLn-M-Cu-O系複合酸化物と高温で反応し易く、この
点でも問題があった。
By the way, when a thin film is produced, a substrate is always required, so the coefficient of thermal expansion between the thin film and the substrate is an important factor. In particular, when the Ln-M-Cu-O-based composite oxide is formed as a thin film on a substrate at a high temperature, the film is formed at a high substrate temperature or after a low substrate temperature, Since the method of heat treatment at a high temperature is adopted, it is desirable that the thermal expansion coefficient of the substrate and that of the thin film are closer to each other than those of other thin films. According to the data measured by the present inventors, Ln-M-Cu-O
It has been found that the coefficient of thermal expansion of the system composite oxide is close to that of metals, an order of magnitude greater than that of silica glass, which is often used as a substrate for oxide thin films, and several times greater than that of alumina substrates. . For this reason, when a thin film is formed on a quartz glass substrate or an alumina substrate, a crack is generated in the thin film during film formation or during cooling to liquid nitrogen temperature, which easily causes deterioration of the superconductor. Furthermore, the quartz glass substrate and the alumina substrate easily react with the Ln-M-Cu-O-based composite oxide at high temperature, and there is a problem in this respect as well.

この発明の目的は、上記問題点に鑑みなされたものであ
って、熱歪による特性劣化や高温下で基板と超電導体と
の反応が生じない安定した薄膜型超電導素子を提供する
ことにある。
The present invention has been made in view of the above problems, and it is an object of the present invention to provide a stable thin film type superconducting element in which characteristic deterioration due to thermal strain and reaction between a substrate and a superconductor do not occur at high temperatures.

〔問題点を解決するための手段〕[Means for solving problems]

この発明は、Y2MCuO5なる組成を有する酸化物の基板上
に、LnM2Cu3O7-k(ただし、LnはLa,Nd,Pm,Sm,Eu,Gd,Dy,
Ho,Er,Tm,Yb,Lu,Yのうちの少なくとも一種類;MはBa,S
r,Caのうちの少なくとも一種類;kは0<k≦0.5)な
る組成を有する超電導体を薄膜として形成することによ
り、上記の目的を達成するものである。
This invention is a substrate of oxide having a composition of Y 2 MCuO 5 , LnM 2 Cu 3 O 7-k (where Ln is La, Nd, Pm, Sm, Eu, Gd, Dy,
At least one of Ho, Er, Tm, Yb, Lu, Y; M is Ba, S
At least one of r and Ca; k is a thin film of a superconductor having a composition of 0 <k ≦ 0.5), thereby achieving the above object.

〔作用〕[Action]

この発明によると、Ln-M-Cu-O系複合酸化物超電導体の
構成元素と同一か或いはよく性質の似た構成元素からな
る酸化物を基板材料としたので、超電導体と基板の両者
の熱膨張係数を極めて近い値に成し得る。これにより、
高温から低温にわたって基板〜薄膜間に熱的応力,熱的
歪がほとんど生じない。さらに、高温下で基板と超電導
体との反応が生ずる問題もなく、良好な超電導特性が安
定して得られるようになる。
According to this invention, since the oxide made of the constituent element which is the same as or similar to the constituent element of the Ln-M-Cu-O-based composite oxide superconductor is used as the substrate material, both the superconductor and the substrate are The coefficient of thermal expansion can be very close. This allows
Almost no thermal stress or strain is generated between the substrate and thin film from high temperature to low temperature. Further, there is no problem of reaction between the substrate and the superconductor at high temperature, and good superconducting characteristics can be stably obtained.

〔実施例〕〔Example〕

実施例について、図面を参照して以下に説明する。 Examples will be described below with reference to the drawings.

(実施例1) Y2O3,Ba2CO3,CuOを出発原料とし、 Y2BaCuO5となるように秤量し、ボールミルにて混合後、
仮焼し、再びボールミルにて粉砕を行いこの粉末を造粒
後、直径25mm,厚さ1.5mmの円板状ペレットに成形
し、大気中で焼成し、焼結体を得た。この焼結体を辺長
15mmの正方形,厚さ1mmに切断後、鏡面研磨を施した
ものを基板としスパッタ法により超電導体薄膜を下記の
ようにして製膜した。スパッタタゲートは膜の組成が、
LaBa2Cu3O7-kとなるように、LaBa2Cu4O6.8の組成の直径
6インチの焼結体を用いた。ここでCuは、ターゲットの
組成がそのまま成膜にとりこまれないことを考慮し、Cu
4としている。スパッタガスは、O2:Ar=1:1(体
積比)の混合ガスを使用し、そのガス圧は0.5Paであ
る。スパッタ電力は300W,基板温度は650℃,タ
ーゲットと基板との間の距離は28mmである。
(Example 1) Y 2 O 3 , Ba 2 CO 3 , CuO was used as a starting material, weighed so that Y 2 BaCuO 5 was obtained, and after mixing with a ball mill,
The powder was calcined and pulverized again with a ball mill to granulate this powder, and then it was molded into a disk-shaped pellet having a diameter of 25 mm and a thickness of 1.5 mm, and fired in the atmosphere to obtain a sintered body. This sintered body was cut into a square with a side length of 15 mm and a thickness of 1 mm, and a mirror-polished product was used as a substrate to form a superconductor thin film by the sputtering method as follows. The film composition of the sputter gate is
A sintered body having a composition of LaBa 2 Cu 4 O 6.8 and having a diameter of 6 inches so as to be LaBa 2 Cu 3 O 7-k was used. Here, Cu is Cu in consideration of the fact that the composition of the target is not directly incorporated in the film formation.
4 As the sputtering gas, a mixed gas of O 2 : Ar = 1: 1 (volume ratio) is used, and the gas pressure thereof is 0.5 Pa. The sputtering power is 300 W, the substrate temperature is 650 ° C., and the distance between the target and the substrate is 28 mm.

成膜後の基板の冷却過程で膜に十分酸素が取り込まれる
ように(k≒0.1)、スパッタ終了後すばやく1気圧の
純酸素に切り替え、その中で650℃から室温まで膜を
冷却した。このようにして製作した膜上に電極形成用マ
スクを用い、蒸着法によりAuを付け、4端子法で抵抗の
温度変化を調べた。基板,超電導体薄膜,電極の構成を
第2図に示す。第2図において、1はLa2BaCuO5から成
る基板,2はLaBa2Cu3O7-kから成る超電導体薄膜,31〜
34はそれぞれAu電極,4は定電流電源,5は電圧計を示
す。
After the sputtering, the oxygen was quickly switched to 1 atm of pure oxygen so that oxygen was sufficiently taken into the film during the cooling process of the substrate after the film formation (k≈0.1), and the film was cooled from 650 ° C. to room temperature therein. Using the mask for electrode formation on the film thus manufactured, Au was attached by the vapor deposition method, and the temperature change of the resistance was examined by the 4-terminal method. Fig. 2 shows the structure of the substrate, superconductor thin film, and electrodes. In FIG. 2, 1 is a substrate made of La 2 BaCuO 5 , 2 is a superconductor thin film made of LaBa 2 Cu 3 O 7-k , 31-
34 is an Au electrode, 4 is a constant current power source, and 5 is a voltmeter.

特性比較のために、石英ガラス基板,アルミナ基板にも
同一条件で超電導体薄膜,Au電極を形成し、上記方法に
て抵抗の温度変化を測定した。
To compare the characteristics, a superconductor thin film and an Au electrode were formed on a quartz glass substrate and an alumina substrate under the same conditions, and the temperature change of resistance was measured by the above method.

第1図はこれらの試料の抵抗を温度の関数としてプロッ
トしたものである。ただし、この図では、抵抗を直接プ
ロットする代わりに温度Tにおける抵抗R(T)と30
0Kにおける抵抗R(300K)との比で示してある。
第1図から、本発明の方法が高い臨界温度Tcをもたらす
ことがわかる。これは、石英ガラス基板,アルミナ基板
上に製膜した場合には、膜と基板の熱膨張係数が大きく
異なるため、膜に無数の小さなクラックが発生すること
による。
FIG. 1 is a plot of the resistance of these samples as a function of temperature. However, in this figure, instead of plotting the resistance directly, the resistance R (T) at temperature T and 30
It is shown as a ratio to the resistance R (300K) at 0K.
From FIG. 1 it can be seen that the method of the present invention results in a high critical temperature Tc. This is because when a film is formed on a quartz glass substrate or an alumina substrate, the film and the substrate have large thermal expansion coefficients, so that countless small cracks occur in the film.

(実施例2) 実施例1で示したY2BaCuO5基板の代わりに、Y2SrCuO5
板を用いて、実施例1と同様の手順にて製膜,電極形成
後、抵抗の温度変化を測定した。この結果を第3図に示
す。
(Example 2) Instead of the Y 2 BaCuO 5 substrate shown in Example 1, a Y 2 SrCuO 5 substrate was used, and after the film formation and the electrode formation in the same procedure as in Example 1, the temperature change of the resistance was performed. It was measured. The results are shown in FIG.

(実施例3) 実施例1で示したY2BaCuO5基板の代わりに、Y2CaCuO5
板を用いて、実施例1と同様の手順にて製膜,電極形成
後、抵抗の温度変化を測定した。この結果を第4図に示
す。
(Example 3) Instead of the Y 2 BaCuO 5 substrate shown in Example 1, a Y 2 CaCuO 5 substrate was used, and after the film formation and the electrode formation by the same procedure as in Example 1, the temperature change of the resistance was changed. It was measured. The results are shown in FIG.

第3図と第4図および後述の第1表より、実施例1と同
様に本発明の効果が認められる。
From FIGS. 3 and 4 and Table 1 described later, the effect of the present invention is recognized as in the case of the first embodiment.

(実施例4) 実施例1で示したLaBa2Cu3O7-k超電導体薄膜の代わり
に、Laをほかの希土類元素(Ln)に置き換え、基板材料の
Baをほかのアルカリ土類金属元素Sr,Caに置き換えたと
きの臨界温度Tcを第1表に示す。また、比較のためにア
ルミナ基板を用いた場合も基板Aとして示してある。
Instead of LaBa 2 Cu 3 O 7-k superconducting thin film shown in (Example 4) Example 1, replacing La in addition to the rare earth element (Ln), the substrate material
Table 1 shows the critical temperature Tc when Ba is replaced with other alkaline earth metal elements Sr and Ca. Further, the case where an alumina substrate is used is also shown as the substrate A for comparison.

なお、上記実施例では、基板材料のアルカリ土類金属元
素Mは、Ba,Sr,Caのそれぞれ単一元素について記載した
が、複数のアルカリ土類金属元素例えば一方を添加物と
して組成することも、本発明の技術思想の範囲内で適宜
採用し得る。
Although the alkaline earth metal element M of the substrate material is described as a single element of each of Ba, Sr, and Ca in the above-mentioned examples, a plurality of alkaline earth metal elements, for example, one may be added as an additive. , Can be appropriately adopted within the scope of the technical idea of the present invention.

〔発明の効果〕〔The invention's effect〕

本発明によると、Y2MCuO5なる組成を有する酸化物の基
板上に、LnM2Cu3O7-k(ただし、LnはLa,Nd,Pm,Sm,Eu,G
d,Dy,Ho,Er,Tm,Yb,Lu,Yのうちの少なくとも一種類;M
はBa,Sr,Caのうちの少なくとも一種類;kは0<k≦0.
5)なる組成を有する超電導体を薄膜として形成したの
で、超電導体と基板の両者の熱膨張係数を極めて近い値
に成し得る。これにより、高温から低温にわたって基板
〜薄膜間に熱的応力,熱的歪がほとんど生じない。さら
に、高温下で基板と超電導体との反応が生ずる問題もな
く、良好な超電導特性が安定して得られるようになる。
上記により、特性,再現性ともに優れかつ安定した薄膜
型超電導素子が提供できる。
According to the present invention, LnM 2 Cu 3 O 7-k (where Ln is La, Nd, Pm, Sm, Eu, G) on the oxide substrate having a composition of Y 2 MCuO 5.
At least one of d, Dy, Ho, Er, Tm, Yb, Lu, Y; M
Is at least one of Ba, Sr, and Ca; k is 0 <k ≦ 0.
Since the superconductor having the composition 5) is formed as a thin film, the thermal expansion coefficients of both the superconductor and the substrate can be made extremely close to each other. As a result, thermal stress and thermal strain hardly occur between the substrate and the thin film from high temperature to low temperature. Further, there is no problem of reaction between the substrate and the superconductor at high temperature, and good superconducting characteristics can be stably obtained.
As described above, it is possible to provide a thin film type superconducting element having excellent characteristics and reproducibility and stable.

【図面の簡単な説明】[Brief description of drawings]

第1図,第3図および第4図は、本発明のそれぞれ異な
る実施例における薄膜型超電導素子の温度〜抵抗比特性
曲線を示す図、第2図は、特性曲線を測定する際の概略
構成図である。図において、 1:基板,2:超電導体薄膜。
FIG. 1, FIG. 3 and FIG. 4 are diagrams showing temperature-resistance ratio characteristic curves of thin film type superconducting elements in different embodiments of the present invention, and FIG. 2 is a schematic configuration for measuring the characteristic curves. It is a figure. In the figure, 1: substrate, 2: superconductor thin film.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 H01L 39/12 ZAA C 9276−4M (72)発明者 河村 幸則 神奈川県川崎市川崎区田辺新田1番1号 富士電機株式会社内 (72)発明者 向江 和郎 神奈川県川崎市川崎区田辺新田1番1号 富士電機株式会社内─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification number Reference number within the agency FI Technical indication location H01L 39/12 ZAA C 9276-4M (72) Inventor Yukinori Kawamura Kanata Pref. Tanabe Nitta, Kawasaki-ku, Kawasaki-shi No. 1 in Fuji Electric Co., Ltd. (72) Inventor Kazuro Mukai 1-1 No. Tanabe Nitta, Kawasaki-ku, Kawasaki-shi, Kanagawa Fuji Electric Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】希土類元素(Ln),アルカリ土類金属元素
(M),銅(Cu),酸素(O)からなる複合酸化物超電導体を、
電気絶縁性基板上に薄膜として形成した薄膜型超電導素
子において、 Y2MCuO5なる組成を有する酸化物の基板上に、LnM2Cu3O
7-k(ただし、LnはLa,Nd,Pm,Sm,Eu,Gd,Dy,Ho,Er,Tm,Yb,
Lu,Yのうちの少なくとも一種類;MはBa,Sr,Caのうちの
少なくとも一種類;kは0<k≦0.5)なる組成を有す
る超電導体を薄膜として形成したことを特徴とする薄膜
型超電導素子。
1. Rare earth element (Ln), alkaline earth metal element
(M), copper (Cu), oxygen (O) complex oxide superconductor,
In a thin film type superconducting device formed as a thin film on an electrically insulating substrate, LnM 2 Cu 3 O is formed on an oxide substrate having a composition of Y 2 MCuO 5.
7-k (where Ln is La, Nd, Pm, Sm, Eu, Gd, Dy, Ho, Er, Tm, Yb,
At least one of Lu and Y; M is at least one of Ba, Sr, and Ca; k is a thin-film superconductor having a composition of 0 <k ≦ 0.5) Superconducting element.
JP62183215A 1987-07-22 1987-07-22 Thin film type superconducting element Expired - Lifetime JPH0653630B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62183215A JPH0653630B2 (en) 1987-07-22 1987-07-22 Thin film type superconducting element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62183215A JPH0653630B2 (en) 1987-07-22 1987-07-22 Thin film type superconducting element

Publications (2)

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JPS6427120A JPS6427120A (en) 1989-01-30
JPH0653630B2 true JPH0653630B2 (en) 1994-07-20

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