JPH0653784B2 - New epoxy resin - Google Patents
New epoxy resinInfo
- Publication number
- JPH0653784B2 JPH0653784B2 JP14780886A JP14780886A JPH0653784B2 JP H0653784 B2 JPH0653784 B2 JP H0653784B2 JP 14780886 A JP14780886 A JP 14780886A JP 14780886 A JP14780886 A JP 14780886A JP H0653784 B2 JPH0653784 B2 JP H0653784B2
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- reaction
- ethyl
- methyl
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000003822 epoxy resin Substances 0.000 title claims description 40
- 229920000647 polyepoxide Polymers 0.000 title claims description 40
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 3
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 18
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 239000000047 product Substances 0.000 description 11
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 8
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 7
- 239000002253 acid Substances 0.000 description 7
- 238000006266 etherification reaction Methods 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 229920003986 novolac Polymers 0.000 description 5
- 229920000768 polyamine Polymers 0.000 description 5
- JIYNFFGKZCOPKN-UHFFFAOYSA-N sbb061129 Chemical compound O=C1OC(=O)C2C1C1C=C(C)C2C1 JIYNFFGKZCOPKN-UHFFFAOYSA-N 0.000 description 5
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 4
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000012778 molding material Substances 0.000 description 4
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 238000000862 absorption spectrum Methods 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000006704 dehydrohalogenation reaction Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- -1 lithium hydroxide Chemical class 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 230000003014 reinforcing effect Effects 0.000 description 3
- 239000002966 varnish Substances 0.000 description 3
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000008346 aqueous phase Substances 0.000 description 2
- 239000010425 asbestos Substances 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910000403 monosodium phosphate Inorganic materials 0.000 description 2
- 235000019799 monosodium phosphate Nutrition 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- 239000004843 novolac epoxy resin Substances 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N phosphine group Chemical group P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 229910052895 riebeckite Inorganic materials 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- YSUQLAYJZDEMOT-UHFFFAOYSA-N 2-(butoxymethyl)oxirane Chemical compound CCCCOCC1CO1 YSUQLAYJZDEMOT-UHFFFAOYSA-N 0.000 description 1
- HJEORQYOUWYAMR-UHFFFAOYSA-N 2-[(2-butylphenoxy)methyl]oxirane Chemical compound CCCCC1=CC=CC=C1OCC1OC1 HJEORQYOUWYAMR-UHFFFAOYSA-N 0.000 description 1
- MFYSUUPKMDJYPF-UHFFFAOYSA-N 2-[(4-methyl-2-nitrophenyl)diazenyl]-3-oxo-n-phenylbutanamide Chemical compound C=1C=CC=CC=1NC(=O)C(C(=O)C)N=NC1=CC=C(C)C=C1[N+]([O-])=O MFYSUUPKMDJYPF-UHFFFAOYSA-N 0.000 description 1
- PSDRGYGYQGTMSD-UHFFFAOYSA-N 2-[[2-[1-[2-(oxiran-2-ylmethoxy)phenyl]ethyl]phenoxy]methyl]oxirane Chemical compound C=1C=CC=C(OCC2OC2)C=1C(C)C1=CC=CC=C1OCC1CO1 PSDRGYGYQGTMSD-UHFFFAOYSA-N 0.000 description 1
- 239000001763 2-hydroxyethyl(trimethyl)azanium Substances 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 235000019743 Choline chloride Nutrition 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- FQYUMYWMJTYZTK-UHFFFAOYSA-N Phenyl glycidyl ether Chemical compound C1OC1COC1=CC=CC=C1 FQYUMYWMJTYZTK-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 238000010533 azeotropic distillation Methods 0.000 description 1
- KDKFPGKZEKRKEE-UHFFFAOYSA-M benzyl(dibutyl)sulfanium;chloride Chemical compound [Cl-].CCCC[S+](CCCC)CC1=CC=CC=C1 KDKFPGKZEKRKEE-UHFFFAOYSA-M 0.000 description 1
- XLRCXWHGTFHOKU-UHFFFAOYSA-M benzyl(dimethyl)sulfanium;chloride Chemical compound [Cl-].C[S+](C)CC1=CC=CC=C1 XLRCXWHGTFHOKU-UHFFFAOYSA-M 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- ZLFVRXUOSPRRKQ-UHFFFAOYSA-N chembl2138372 Chemical compound [O-][N+](=O)C1=CC(C)=CC=C1N=NC1=C(O)C=CC2=CC=CC=C12 ZLFVRXUOSPRRKQ-UHFFFAOYSA-N 0.000 description 1
- SGMZJAMFUVOLNK-UHFFFAOYSA-M choline chloride Chemical compound [Cl-].C[N+](C)(C)CCO SGMZJAMFUVOLNK-UHFFFAOYSA-M 0.000 description 1
- 229960003178 choline chloride Drugs 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- 238000007033 dehydrochlorination reaction Methods 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 150000003944 halohydrins Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- KNRCVAANTQNTPT-UHFFFAOYSA-N methyl-5-norbornene-2,3-dicarboxylic anhydride Chemical compound O=C1OC(=O)C2C1C1(C)C=CC2C1 KNRCVAANTQNTPT-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 150000003021 phthalic acid derivatives Chemical class 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229920000962 poly(amidoamine) Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium group Chemical group [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- HWCKGOZZJDHMNC-UHFFFAOYSA-M tetraethylammonium bromide Chemical compound [Br-].CC[N+](CC)(CC)CC HWCKGOZZJDHMNC-UHFFFAOYSA-M 0.000 description 1
- YMBCJWGVCUEGHA-UHFFFAOYSA-M tetraethylammonium chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC YMBCJWGVCUEGHA-UHFFFAOYSA-M 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- ZTXFOCMYRCGSMU-UHFFFAOYSA-M tetramethylphosphanium;bromide Chemical compound [Br-].C[P+](C)(C)C ZTXFOCMYRCGSMU-UHFFFAOYSA-M 0.000 description 1
- TVVPMLFGPYQGTG-UHFFFAOYSA-M tetramethylphosphanium;iodide Chemical compound [I-].C[P+](C)(C)C TVVPMLFGPYQGTG-UHFFFAOYSA-M 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- XMQSELBBYSAURN-UHFFFAOYSA-M triphenyl(propyl)phosphanium;bromide Chemical compound [Br-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CCC)C1=CC=CC=C1 XMQSELBBYSAURN-UHFFFAOYSA-M 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Epoxy Compounds (AREA)
- Epoxy Resins (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は、新規エポキシ樹脂に関する。更に詳しくは、
耐熱性、機械的特性などにすぐれた新規エポキシ樹脂に
関する。TECHNICAL FIELD The present invention relates to a novel epoxy resin. For more details,
The present invention relates to a new epoxy resin having excellent heat resistance and mechanical properties.
〔従来の技術〕および〔発明が解決しようとする問題
点〕 エポキシ樹脂に芳香族ポリアミン、脂肪族ポリアミン、
ポリアミドアミン、アミンアダクト、ジシアンジアミ
ド、酸無水物、フェノールノボラック樹脂系などの各種
硬化剤を配合したものが、接着剤、塗料、成形材料、注
型材料などとして用いられておりまたかかる配合物を溶
剤でワニス化し、これを補強用基材に含浸、塗布させ、
積層板成形用として用いられることも従来から周知であ
る。[Prior Art] and [Problems to be Solved by the Invention] Epoxy resin containing an aromatic polyamine, an aliphatic polyamine,
Polyamine amine, amine adduct, dicyandiamide, acid anhydride, phenol novolac resin-based compounding various curing agents are used as adhesives, paints, molding materials, casting materials, etc. Varnish with, and impregnate and apply this to the reinforcing base material,
It is also well known in the past to be used for forming laminated plates.
ところで、近年特に電気・電子分野における小型化、精
密化に伴ない、電子部品の接着剤、絶縁塗料、封止材、
積層板などの用途においては、高温使用時の信頼性を高
めるために、耐熱性の向上が強く求められている。即
ち、従来市販されているビスフェノールA型エポキシ樹
脂を用いて調製された接着剤、塗料、封止材、積層板な
どは、熱変形温度もしくは電気絶縁性の低下を招き、そ
の結果として信頼性に欠けるという問題がみられた。By the way, in recent years, especially with miniaturization and refinement in the electric and electronic fields, adhesives for electronic parts, insulating paints, sealing materials,
In applications such as laminates, there is a strong demand for improved heat resistance in order to increase reliability during high temperature use. That is, adhesives, paints, encapsulants, laminates, etc. prepared using bisphenol A type epoxy resins that have been commercially available in the past cause a decrease in heat distortion temperature or electrical insulation, resulting in reliability. There was a problem of chipping.
一方、耐熱性の向上という目的には、フェノールノボラ
ックエポキシ樹脂、o−クレゾールノボラックエポキシ
樹脂などの多官能性エポキシ樹脂が使用されるが、これ
らの硬化物は耐熱性の点ではすぐれているものの、弾性
率が高いので硬くて脆く、ヒートショットによるクラッ
クが発生し易く、また樹脂の硬化収縮などに起因する内
部応力の増加に阻まれて、電子部品の小型化、精密化に
対する要求を満足させるに至っていない。On the other hand, for the purpose of improving heat resistance, polyfunctional epoxy resins such as phenol novolac epoxy resin and o-cresol novolac epoxy resin are used. However, although these cured products are excellent in heat resistance, Due to its high elasticity, it is hard and brittle, cracks easily occur due to heat shots, and it is prevented from increasing internal stress due to curing shrinkage of resin, etc., to satisfy the requirements for miniaturization and precision of electronic parts. I haven't arrived.
そのため、耐熱性および機械的特性にすぐれたエポキシ
樹脂が強く望まれているが、下記の如き新規エポキシ樹
脂がかかる要求を十分に満足せしめるものであることを
見出した。Therefore, an epoxy resin excellent in heat resistance and mechanical properties is strongly desired, but it has been found that the following new epoxy resins can sufficiently satisfy such requirements.
従って、本発明は新規エポキシ樹脂に係り、この新規エ
ポキシ樹脂は、次の一般式で表わされる。Therefore, the present invention relates to a novel epoxy resin, which is represented by the following general formula.
ここで、 R:水素原子またはメチル基 R ′、R ″:水素原子、ハロゲン原子、低級アルキル基
または低級アルコキシ基であり、R1 〜R3 の各R′、
R″は互いに同一または異なり得る 上記一般式〔I〕で表わされる新規エポキシ樹脂は、次
の一般式で表わされるトリスフェノール類 ここで、 R ′、R ″:前記と同じである。 here, R: hydrogen atom or methyl group R ′, R ″: hydrogen atom, halogen atom, lower alkyl group or lower alkoxy group, each R ′ of R 1 to R 3 ,
R ″ may be the same or different from each other. The novel epoxy resin represented by the above general formula [I] is a trisphenol compound represented by the following general formula. here, R ′, R ″: The same as above.
を、エピハロヒドリンまたはβ−メチルエピハロヒドリ
ン、好ましくはエピクロルヒドリンの約3〜30倍モルと
反応させることにより合成される。Is reacted with epihalohydrin or β-methylepihalohydrin, preferably with about 3 to 30 times the molar amount of epichlorohydrin.
この反応は、従来公知のこの種の反応にならって種々の
方法で行なうことができる。その一つの方法は、アルカ
リ化合物、例えば水酸化ナトリウム、水酸化カリウム、
水酸化リチウムなどのアルカリ金属水酸化物、好ましく
は水酸化ナトリウムをトリスフェノール類のフェノール
性水酸基1当量に対して1倍モル量以上、好ましくは1.
02〜1.05倍モルを用いて、エーテル化工程と脱ハロゲン
化水素化工程とを同時に、水の存在下において約60〜90
℃の温度で反応させ、反応終了後反応混合物から未反応
のハロヒドリン類、水および生成した塩を除去し、反応
生成物たるエポキシ樹脂を乾燥し、取得する方法であ
る。This reaction can be carried out in various ways following the conventionally known reaction of this type. One method is to use alkaline compounds such as sodium hydroxide, potassium hydroxide,
An alkali metal hydroxide such as lithium hydroxide, preferably sodium hydroxide, is used in a molar amount 1 time or more, preferably 1.
02 to 1.05 times the molar amount of the etherification step and the dehydrohalogenation step at the same time in the presence of water to about 60 to 90
The reaction is carried out at a temperature of ℃, after the reaction is completed, the unreacted halohydrins, water and salts formed are removed, and the epoxy resin as the reaction product is dried and obtained.
しかしながら、エーテル化工程と脱ハロゲン化水素工程
とを順次行なう方法を採用すると、安定した品質のエポ
キシ樹脂を得ることができるので、より好ましい方法と
いえる。However, if a method in which the etherification step and the dehydrohalogenation step are sequentially performed is adopted, an epoxy resin of stable quality can be obtained, and therefore, it is a more preferable method.
エーテル化工程は、トリスフェノール類のフェノール性
水酸基1当量に対して約0.005〜5モル%のエーテル化
触媒、例えばトリメチルアミン、トリエチルアミンなど
の第3アミン、トリフェニルホスフィン、トリブチルホ
スフィンなどの第3ホスフィン、テトラメチルアンモニ
ウムクロライド、テトラメチルアンモニウムブロマイ
ド、テトラエチルアンモニウムクロライド、テトラエチ
ルアンモニウムブロマイド、塩化コリンなどの第4アン
モニウム塩、テトラメチルホスホニウムブロマイド、テ
トラメチルホスホニウムアイオタイド、トリフェニルプ
ロピルホスホニウムブロマイドなどの第4ホスホニウム
塩、ベンジルジブチルスルホニウムクロライド、ベンジ
ルジメチルスルホニウムクロライドなどの第3スルホニ
ウム塩など、好ましくは第4アンモニウム塩の存在下で
反応が行われる。In the etherification step, about 0.005 to 5 mol% of an etherification catalyst, for example, a tertiary amine such as trimethylamine or triethylamine, a tertiary phosphine such as triphenylphosphine, or tributylphosphine, is used with respect to 1 equivalent of the phenolic hydroxyl group of trisphenol. Tetramethylammonium chloride, tetramethylammonium bromide, tetraethylammonium chloride, tetraethylammonium bromide, fourth ammonium salt such as choline chloride, tetramethylphosphonium bromide, tetramethylphosphonium iodide, fourth phosphonium salt such as triphenylpropylphosphonium bromide, Tertiary sulfonium salts such as benzyldibutylsulfonium chloride and benzyldimethylsulfonium chloride are preferred. The reaction is carried out in the presence of a quaternary ammonium salt.
このエーテル化工程では、トリスフェノール類の水酸基
の少くとも約50%以上、好ましくは約80%以上がエーテ
ル化される迄反応が行われる。この反応は、一般に約60
〜110 ℃の温度で約1〜12時間行われ、この際水は存在
しない方が好ましく、存在しても3.0 重量%以下となる
ように制御される。In this etherification step, the reaction is carried out until at least about 50% or more, preferably about 80% or more of the hydroxyl groups of trisphenol are etherified. This reaction is generally about 60
It is carried out at a temperature of ~ 110 ° C for about 1 to 12 hours, in which water is preferably absent, and the presence of water is controlled to 3.0% by weight or less.
次の脱ハロゲン化水素化工程には、エーテル化工程の反
応生成物がそのまま、即ち未反応のエピハロヒドリンを
含んだまま反応に供せられる。この反応の触媒として
は、上記第1の方法で使用したのと同じアルカリ化合
物、例えばアルカリ金属水酸化物、好ましくは水酸化ナ
トリウムが、トリスフェノール類のフェノール性水酸基
1当量に対して0.5 倍モル以上、好ましくは0.8 倍モル
以上の割合で用いられる。ただし、この使用割合は、ゲ
ル化などの不都合を避けるために1倍モル以下とするこ
とが望ましい。In the subsequent dehydrohalogenation step, the reaction product of the etherification step is subjected to the reaction as it is, that is, while containing unreacted epihalohydrin. As the catalyst for this reaction, the same alkali compound as used in the above-mentioned first method, for example, an alkali metal hydroxide, preferably sodium hydroxide, is used in an amount of 0.5 times mol per 1 equivalent of phenolic hydroxyl group of trisphenol. It is used in the above proportion, preferably 0.8 times or more. However, it is desirable that the usage ratio is 1 times or less mol in order to avoid inconvenience such as gelation.
この反応は、一般に約60〜100 ℃の温度で約1〜3時間
行われ、水酸化ナトリウムが触媒として用いられた場合
には、副生した水を反応系から除去しながら行なうこと
が好ましい。反応終了後は、減圧蒸留による未反応のエ
ピハロヒドリンの除去、水洗などによる副生塩の除去お
よび必要に応じてリン酸、リン酸二水素ナトリウムなど
の弱酸による中和がそれぞれ行われ、乾燥させて目的物
たるエポキシ樹脂が取得される。This reaction is generally carried out at a temperature of about 60 to 100 ° C. for about 1 to 3 hours, and when sodium hydroxide is used as a catalyst, it is preferably carried out while removing by-produced water from the reaction system. After completion of the reaction, unreacted epihalohydrin is removed by vacuum distillation, by-product salts are removed by washing with water, and if necessary, neutralization is carried out with weak acids such as phosphoric acid and sodium dihydrogen phosphate, and dried. The target epoxy resin is obtained.
このようにして得られる新規エポキシ樹脂は、公知のエ
ポキシ樹脂用硬化剤、例えばホリアミン類、変性ポリア
ミン類、ポリアミドアミン類、多価カルボン酸類、酸無
水物類、三フッ化ホウ素−アミン錯体、イミダゾール
類、ジシアンジアミド、フェノールノボラック樹脂など
を配合することによって硬化させることができる。その
使用量は、硬化剤の種類などによって異なり、例えばポ
リアミン類が用いられる場合には、エポキシ当量と活性
水素当量との比が目安とされる。また、硬化促進剤も、
必要に応じて使用される。The novel epoxy resin thus obtained is a known curing agent for epoxy resin, for example, folinamines, modified polyamines, polyamidoamines, polycarboxylic acids, acid anhydrides, boron trifluoride-amine complex, imidazole. It can be cured by blending a compound, dicyandiamide, phenol novolac resin and the like. The amount used varies depending on the type of the curing agent, and when polyamines are used, the ratio of the epoxy equivalent to the active hydrogen equivalent is a standard. Also, the curing accelerator,
Used as needed.
本発明に係るエポキシ樹脂は、その目的を損わない範囲
内において、他のエポキシ樹脂、例えばビスフェノール
A型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、
1,1−ビス(グリシドキシフェニル)エタン、フェノ
ールノボラック型エポキシ樹脂、o−クレゾール−ノボ
ラック型エポキシ樹脂、グリシジルエステル型エポキシ
樹脂、グリシジルアミン型エポキシ樹脂、脂環式エポキ
シ樹脂などと併用することができる。また、難燃性を付
与する場合には、テトラブロムビスフェノールAのジグ
リシジルエーテルなどが併用される。The epoxy resin according to the present invention is another epoxy resin such as a bisphenol A type epoxy resin, a bisphenol F type epoxy resin, within a range that does not impair the purpose.
Use in combination with 1,1-bis (glycidoxyphenyl) ethane, phenol novolac type epoxy resin, o-cresol-novolac type epoxy resin, glycidyl ester type epoxy resin, glycidyl amine type epoxy resin, alicyclic epoxy resin, etc. You can Further, in the case of imparting flame retardancy, diglycidyl ether of tetrabromobisphenol A and the like are used together.
エポキシ樹脂配合物には、以上の各成分以外に、フタル
酸エステル、グリコール類のエーテルまたはエステル
類、フェノールなどの非反応性希釈剤、長鎖アルキレン
オキサイド、ブチルグリシジルエーテル、フェニルグリ
シジルエーテル、p−ブチルフェニルグリシジルエーテ
ルなどの反応性希釈剤、炭酸カルシウム、クレー、アス
ベスト、シリカ、マイカ、石英粉、アルミニウム粉末、
グラファイト、酸化チタン、アルミナ、酸化鉄、ガラス
粉末、ガラス戦域などの充填剤、カーボンブラック、ト
ルイジン赤、ハンザイエロー、フタロシアニンブルー、
フタロシアニングリーンなどの着色剤などが適宜配合さ
れる。In addition to the above components, the epoxy resin composition may include phthalic acid esters, ethers or esters of glycols, non-reactive diluents such as phenol, long-chain alkylene oxides, butyl glycidyl ether, phenyl glycidyl ether, p- Reactive diluent such as butylphenyl glycidyl ether, calcium carbonate, clay, asbestos, silica, mica, quartz powder, aluminum powder,
Fillers such as graphite, titanium oxide, alumina, iron oxide, glass powder, glass battlefield, carbon black, toluidine red, Hansa yellow, phthalocyanine blue,
A colorant such as phthalocyanine green is appropriately mixed.
このエポキシ樹脂を積層板などの成形材料として用いる
場合には、トルエン、キシレンなどの芳香族炭化水素
類、アセトン、メチルエチルケトン、メチルイソブチル
ケトンなどのケトン類などの溶剤を用いて液状化し、硬
化剤および必要に応じて硬化促進剤を添加することによ
りワニス化し、これをガラスクロス、グラスファイバ
ー、カーボンファイバー、紙、アスベスト、ポリエステ
ル繊維、芳香族ポリアミド繊維などの補強用基布に含浸
させ、これをプリプレグとした後、加圧加熱することに
より積層成形することができる。また、エポキシ樹脂と
硬化剤とを加熱溶融し、補強用基材に含浸させる方法を
採用することもできる。When this epoxy resin is used as a molding material for a laminated plate or the like, it is liquefied using a solvent such as toluene, aromatic hydrocarbons such as xylene, acetone, methyl ethyl ketone, ketones such as methyl isobutyl ketone, and a curing agent and If necessary, add a curing accelerator to form a varnish, and impregnate this into a reinforcing base cloth such as glass cloth, glass fiber, carbon fiber, paper, asbestos, polyester fiber, aromatic polyamide fiber, and prepreg it. After that, the laminate can be formed by heating under pressure. It is also possible to employ a method of heating and melting an epoxy resin and a curing agent and impregnating the reinforcing base material.
本発明に係る新規エポキシ樹脂は、それが硬化されたと
き、従来のエポキシ樹脂硬化物より曲げ強度が高くまた
弾性率が低く、かつ熱変形温度が230 ℃以上というすぐ
れた性質の硬化物を与える。The novel epoxy resin according to the present invention, when cured, gives a cured product having higher flexural strength and lower elastic modulus than the conventional cured epoxy resin and a heat distortion temperature of 230 ° C. or higher. .
したがって、接着剤、塗料、封止材、成形材料、ワニス
および積層板成形などの成形材料として用いた場合、高
温時においても信頼性のある硬化物を与えるエポキシ樹
脂が、本発明によって提供される。Accordingly, the present invention provides an epoxy resin that gives a cured product that is reliable even at high temperatures when used as a molding material such as an adhesive, a coating material, a sealing material, a molding material, a varnish and a laminated board molding. .
次に、実施例について本発明を説明する。 Next, the present invention will be described with reference to examples.
実施例1 エピクロルヒドリン462.5 g、1−〔α−メチル−α
(4′−ヒドロキシフェニル)エチル〕−4−〔α′,
α′−ビス(4″−ヒドロキシフェニル)エチル〕ベン
ゼン141.3 gおよびテトラメチルアンモニウムクロライ
ド2.73gを、撹拌機および還流装置を備えた容量1の
ガラス製四口フラスコに仕込み、撹拌しながら70℃で3
時間反応させた。Example 1 Epichlorohydrin 462.5 g, 1- [α-methyl-α
(4'-Hydroxyphenyl) ethyl] -4- [α ',
141.3 g of α′-bis (4 ″ -hydroxyphenyl) ethyl] benzene and 2.73 g of tetramethylammonium chloride were placed in a glass four-necked flask having a capacity of 1 equipped with a stirrer and a reflux device, and stirred at 70 ° C. Three
Reacted for hours.
その後、この温度を保ちながら、48%水酸化ナトリウム
水溶液79g(上記トリスフェノールに対するモル比2.8
5)を2時間にわたって連続的に滴下した。このとき、
系内の圧力を150 〜250 mmHgの減圧状態とし、生成した
水を系外に除去すると共に、共沸したエピクロリヒドリ
ンを系内に戻した。滴下終了後も、水の生成が認められ
なくなる迄、水を系外に除去し、引続き未反応のエピク
ロルヒドリンを系外に留去した。残渣にメチルイソブチ
ケトン230 gおよび水230 gを加えて撹拌し、生成した
食塩を水相に移行させた後静置し、分離した水相を除去
した。Then, while maintaining this temperature, 79 g of 48% aqueous sodium hydroxide solution (molar ratio to the above trisphenol of 2.8
5) was continuously added dropwise over 2 hours. At this time,
The pressure in the system was reduced to 150 to 250 mmHg, the generated water was removed to the outside of the system, and the azeotropic epichlorohydrin was returned to the system. After the dropping was completed, water was removed to the outside of the system until the generation of water was no longer observed, and then unreacted epichlorohydrin was distilled out of the system. 230 g of methyl isobutyketone and 230 g of water were added to the residue and stirred, the generated salt was transferred to the aqueous phase and then allowed to stand, and the separated aqueous phase was removed.
次いで、油相には24%水酸化ナトリウム水溶液20gを加
え、90℃で2時間撹拌し、第2回目の脱塩化水素化反応
を行なった。その後、油相を水相から分離し、そこに30
%リン酸二水素ナトリウム水溶液76gを加えて中和を行
ない、引続いて共沸蒸留による水の除去およびGグラス
フィルターによる塩の濾過を行なった。Next, 20 g of a 24% aqueous sodium hydroxide solution was added to the oil phase, and the mixture was stirred at 90 ° C. for 2 hours to carry out a second dehydrochlorination reaction. Then the oil phase is separated from the water phase and
A 76% aqueous solution of sodium dihydrogen phosphate was added for neutralization, followed by removal of water by azeotropic distillation and filtration of salt by a G glass filter.
油相から5mmHg、150 ℃の減圧下でメチルインブチルケ
トンを完全に除去し、エポキシ当量219 、軟化点63℃の
1−〔α−メチル−α−(4′−グリシドキシフェニ
ル)エチル〕−4−〔α′,α′−ビス(4″−グリシ
ドキシフェニル)エチル〕ベンゼン180 gを得た。、得
られたこのエポキシ樹脂の赤外線吸収スペクトルは第1
図に示される。1 H−NMR(プロトン核磁気共鳴;CDCl3溶液) δ=1.62,6H,s δ=3.17〜3.44,3H,m 2.07,3H,s 3.77〜4.24,6H,m 2.64〜2.94,6H,m 6.69〜7.20,16H,m 実施例2 実施例1において、トリスフェノールとして、1−〔α
−メチル−α−(3′,5′−ジメチル−4′−ヒドロ
キシフェニル)エチル〕−4−〔α′,α′−ビス
(3″,5″−ジメチル−4″−ヒドロキシフェニル)
エチル〕ベンゼン155.0 gを用い、エポキシ当量240 、
軟化点87℃の1−〔α−メチル−α−(3′,5′−ジ
メチル−4′−グリシドキシフェニル)エチル〕−4−
〔α′,α′−ビス(3″,5″−ジメチル−4″−グ
リシドキシフェニル)エチル〕ベンゼン196 gを得た。
得られたこのエポキシ樹脂の赤外線吸収スペクトルは、
第2図に示される。1 H−NMR(プロトン核磁気共鳴;CDCl3溶液) δ=1.62,6H,s δ=3.18〜3.44,3H,m 2.06,3H,s 3.60〜4.15,6H,m 2.17,12H,s 6.65,4H,s 2.21,6H,s 6.82,2H,s 2.61〜2.95,6H,m 6.95〜7.03,4H,D 応用例1 実施例1で得られたエポキシ樹脂100 部(重量、以下同
じ)、メチルナジック酸無水物(日本化薬製品カヤハー
ドMCD)78部および−エチル−4−メチルイミダゾー
ル(四国化成製品2E4MZ)1部を100 ℃、3時間−
230 ℃、2時間加熱混合し、得られた硬化物について、
次の各項目の測定を行なった。Methyl inbutyl ketone was completely removed from the oil phase under reduced pressure of 5 mmHg and 150 ° C., and 1- [α-methyl-α- (4′-glycidoxyphenyl) ethyl] having an epoxy equivalent of 219 and a softening point of 63 ° C. 180 g of -4- [α ', α'-bis (4 "-glycidoxyphenyl) ethyl] benzene was obtained. The infrared absorption spectrum of the obtained epoxy resin was 1st.
As shown in the figure. 1 H-NMR (proton nuclear magnetic resonance; CDCl 3 solution) δ = 1.62,6H, s δ = 3.17-3.44,3H, m 2.07,3H, s 3.77-4.24,6H, m 2.64-2.94,6H, m 6.69 ~ 7.20,16H, m Example 2 In Example 1, as trisphenol, 1- [α
-Methyl-α- (3 ', 5'-dimethyl-4'-hydroxyphenyl) ethyl] -4- [α', α'-bis (3 ", 5" -dimethyl-4 "-hydroxyphenyl)
Ethyl] benzene 155.0 g, epoxy equivalent 240,
1- [α-methyl-α- (3 ′, 5′-dimethyl-4′-glycidoxyphenyl) ethyl] -4- having a softening point of 87 ° C.
196 g of [α ', α'-bis (3 ", 5" -dimethyl-4 "-glycidoxyphenyl) ethyl] benzene were obtained.
The infrared absorption spectrum of the obtained epoxy resin is
It is shown in FIG. 1 H-NMR (proton nuclear magnetic resonance; CDCl 3 solution) δ = 1.62,6H, s δ = 3.18-3.44,3H, m 2.06,3H, s 3.60-4.15,6H, m 2.17,12H, s 6.65,4H , s 2.21,6H, s 6.82,2H, s 2.61 to 2.95,6H, m 6.95 to 7.03,4H, D Application Example 1 100 parts (weight, the same below) of the epoxy resin obtained in Example 1, methyl nadic acid Anhydrous (Nippon Kayaku product Kayahard MCD) (78 parts) and -ethyl-4-methylimidazole (Shikoku Kasei product 2E4MZ) (1 part) were added at 100 ° C for 3 hours.
At 230 ℃, mixed by heating for 2 hours, the cured product obtained,
The following items were measured.
熱変形温度:ASTM D−648 による 曲げ強度:JIS K−6911による 曲げ弾性率:IJS K−6911による 応用例2 実施例1で得られたエポキシ樹脂50部、ビスフェノール
A型エポキシ樹脂(三井石油化学製品EPOMIK R
−140)50部、メチルナジック酸無水物84部および2−
エチル−4−メチルイミダゾール1部を用い、応用例1
と同様に硬化および硬化物についての測定が行われた。Heat distortion temperature: According to ASTM D-648 Bending strength: According to JIS K-6911 Bending elastic modulus: According to IJS K-6911 Application example 2 50 parts of the epoxy resin obtained in Example 1, bisphenol A type epoxy resin (Mitsui Petrochemical Product EPOMIK R
-140) 50 parts, 84 parts of methyl nadic acid anhydride and 2-
Application Example 1 using 1 part of ethyl-4-methylimidazole
Curing and measurement of the cured product were performed in the same manner as in.
応用例3 実施例2で得られたエポキシ樹脂100 部、メチルナジッ
ク酸無水物71部および2−エチル−4−メチルイミダゾ
ール1部を用い、応用例1と同様に硬化および硬化物に
ついての測定が行われた。Application Example 3 Using 100 parts of the epoxy resin obtained in Example 2, 71 parts of methyl nadic acid anhydride and 1 part of 2-ethyl-4-methylimidazole, curing and measurement of the cured product were carried out in the same manner as in Application Example 1. It was conducted.
比較応用例1 ビスフェノールA型エポキシ樹脂(EPOMIK R−
140)100 部、メチルナジック酸無水物90部および2−
エチル−4−メチルイミダゾール1部を用い、応用例1
と同様に硬化および硬化物についての測定が行われた。Comparative Application Example 1 Bisphenol A type epoxy resin (EPOMIK R-
140) 100 parts, 90 parts of methyl nadic acid anhydride and 2-
Application Example 1 using 1 part of ethyl-4-methylimidazole
Curing and measurement of the cured product were performed in the same manner as in.
比較応用例2 o−クレゾールノボラック型エポキシ樹脂(日本化薬製
品EOCN102)100 部、メチルナジック酸無水物81部
および2−エチル−4−メチルイミダゾール1部を用
い、応用例1と同様に硬化および硬化物についての測定
が行われた。Comparative Application Example 2 Using 100 parts of o-cresol novolac type epoxy resin (EOCN102 manufactured by Nippon Kayaku Co., Ltd.), 81 parts of methyl nadic acid anhydride and 1 part of 2-ethyl-4-methylimidazole, curing and curing were carried out in the same manner as in Application Example 1. Measurements were performed on the cured product.
以上は各応用例および比較応用例での測定結果は、次の
表に示される。The measurement results of the above-described application examples and comparative application examples are shown in the following table.
第1〜2図は、それぞれ実施例1〜2で得られた新規エ
ポキシ樹脂の赤外線吸収スペクトルである。1 and 2 are infrared absorption spectra of the novel epoxy resins obtained in Examples 1 and 2, respectively.
Claims (1)
脂。 ここで、 R:水素原子またはメチル基 R ′、R ″:水素原子、ハロゲン原子、低級アルキル基
または低級アルコキシ基であり、R1 〜R3 の各R′、
R″は互いに同一または異なり得る1. A novel epoxy resin represented by the following general formula. here, R: hydrogen atom or methyl group R ′, R ″: hydrogen atom, halogen atom, lower alkyl group or lower alkoxy group, each R ′ of R 1 to R 3 ,
R ″ may be the same or different from each other
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14780886A JPH0653784B2 (en) | 1986-06-24 | 1986-06-24 | New epoxy resin |
| DE19873786718 DE3786718T2 (en) | 1986-06-24 | 1987-03-30 | Epoxy resin. |
| EP87302734A EP0251431B1 (en) | 1986-06-24 | 1987-03-30 | Epoxy resin |
| US07/362,289 US4954603A (en) | 1985-10-08 | 1989-06-06 | Epoxy resin |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14780886A JPH0653784B2 (en) | 1986-06-24 | 1986-06-24 | New epoxy resin |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS633015A JPS633015A (en) | 1988-01-08 |
| JPH0653784B2 true JPH0653784B2 (en) | 1994-07-20 |
Family
ID=15438681
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14780886A Expired - Lifetime JPH0653784B2 (en) | 1985-10-08 | 1986-06-24 | New epoxy resin |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0653784B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007070328A (en) * | 2005-09-09 | 2007-03-22 | Nitto Denko Corp | Tris oxetane ether compound, process for producing the same, and optical waveguide using the same |
-
1986
- 1986-06-24 JP JP14780886A patent/JPH0653784B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS633015A (en) | 1988-01-08 |
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