JPH0654265B2 - 2-axis swing X-ray stress measurement device - Google Patents
2-axis swing X-ray stress measurement deviceInfo
- Publication number
- JPH0654265B2 JPH0654265B2 JP59197713A JP19771384A JPH0654265B2 JP H0654265 B2 JPH0654265 B2 JP H0654265B2 JP 59197713 A JP59197713 A JP 59197713A JP 19771384 A JP19771384 A JP 19771384A JP H0654265 B2 JPH0654265 B2 JP H0654265B2
- Authority
- JP
- Japan
- Prior art keywords
- ray
- detector
- ray tube
- measurement
- stress
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Description
【発明の詳細な説明】 (イ) 産業上の利用分野 本発明は金属材料などの応力をX線回折によって測定す
る装置に関する。DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application The present invention relates to an apparatus for measuring stress of a metal material or the like by X-ray diffraction.
(ロ) 従来技術 この種の応力測定は,微小な結晶から成る材料に応力が
加わると結晶の格子間隔が変化することによるものであ
る。X線の材料表面に対する入射角を変え,回折角2
θを測定し,sin2 を変数としてプロットすると,2θ
とsin2 の関係は理論的に直線となり,この直線の勾配
は材料表面の応力に比例する。従来のX線応力測定装置
では,この2θ−sin2 線図(回帰直線)を得るため
に,測定する材料の表面の一点をX線ビームで照射しな
がらX線検出器の位置を走査して検出強度のピークをさ
がし,そのときの回折角2θを求め,次いでX線管又は
測定材料を動かしてX線入射角を変えて上記と同様に
して回折角2θを求め,数点のについて2θを求めて
いる。このようにして2θとの関係が求まると,sin2
を横軸,2θを縦軸としてプロットし,プロットされ
た点の中央を通る直線(回帰直線)を最少二乗法を用い
て求める。(B) Conventional technology In this type of stress measurement, stress is applied to a material consisting of minute crystals.
This is because the lattice spacing of the crystal changes when added.
It Diffraction angle 2
θ is measured and sin2 Is plotted as a variable, 2θ
And sin2 Is theoretically a straight line, and the slope of this straight line
Is proportional to the stress on the material surface. Conventional X-ray stress measurement device
Then, this 2θ-sin2 To obtain a diagram (regression line)
Do not irradiate a point on the surface of the material to be measured with an X-ray beam.
The position of the X-ray detector is scanned to find the peak of detection intensity.
Then, obtain the diffraction angle 2θ at that time, then use the X-ray tube or
Move the measurement material and change the X-ray incidence angle
Then, the diffraction angle 2θ is calculated, and 2θ is calculated for several points.
There is. When the relation with 2θ is obtained in this way, sin2
Is plotted on the horizontal axis and 2θ on the vertical axis.
Using the least squares method, a straight line (regression line) passing through the center of
Ask for.
上記のような測定を行なうに際し,測定誤差を少なくす
るため,通常一つの軸のまわりに検出器やX線管を揺動
させている。これは材料を構成する結晶粒の大きさによ
り,照射ビームを回折する格子面の数が入射角によって
ばらつき,測定値が不正確となるのを防止するためであ
る。ところがこのよう揺動を行なっても,材料が粗大結
晶粒を含む場合や圧延金属材のような集合組織の場合は
回折X線強度の低下や方位によるばらつきが大きくな
り,測定が困難となる場合があった。一般に実用材の結
晶状態は加工変質層や浸炭・脱炭層があり,結晶粒の粗
大化や集合組織を有する場合が多い。また最近では,結
晶粒の大きい焼結合金や非鉄金属,セラミックス材の応
力測定が要望されているが,前述のように従来の装置で
はこのような材料の応力測定が困難である。When performing the above-mentioned measurement, the detector and the X-ray tube are usually swung around one axis in order to reduce the measurement error. This is to prevent the number of lattice planes that diffract the irradiation beam from varying depending on the incident angle due to the size of the crystal grains that make up the material, and to prevent inaccurate measurement values. However, even if such rocking is performed, if the material contains coarse crystal grains or has a texture such as a rolled metal material, the diffraction X-ray intensity decreases and the variation due to the orientation becomes large, which makes measurement difficult. was there. Generally, the crystalline state of practical materials includes a work-affected layer and a carburized / decarburized layer, and often has coarse crystal grains and a texture. Recently, there has been a demand for stress measurement of sintered alloys, non-ferrous metals, and ceramic materials having large crystal grains, but as described above, it is difficult to measure the stress of such materials with conventional devices.
(ハ) 発明の目的 本発明は従来のX線応力測定装置を改良し,結晶粒が大
きい材料や集合組織を有する場合にも精度良く応力測定
ができる装置を提供することを目的とする。(C) Object of the present invention An object of the present invention is to improve the conventional X-ray stress measuring device and to provide a device capable of accurately measuring stress even when a material having a large crystal grain or a texture is included.
(ニ) 構 成 本発明のX線応力測定装置は測定対象の材料にX線を照
射するX線管と回折X線を検出する検出器を,材料表面
のX線入射位置を通る2つ直線(2つの軸)を中心とす
る微小角度の回転(揺動)をさせる駆動機構(以下揺動
駆動機構という)を設けたことを特徴とする。(D) Structure The X-ray stress measuring apparatus of the present invention comprises an X-ray tube for irradiating the material to be measured with X-rays and a detector for detecting diffracted X-rays, and two straight lines passing through the X-ray incident position on the material surface. It is characterized in that a drive mechanism (hereinafter referred to as a swing drive mechanism) for rotating (swinging) a small angle about (two axes) is provided.
(ホ) 実施例 以下実施例により本発明をさらに詳しく説明する。第1
図は本発明の一実施例の概略を示す構成図であり,(1)
はX線管,(2)はX線検出器,(3)は被測定材料である。
X線管(1)及び検出器(2)は材料(3)表面のX線入射位置
(4)を中心点とする円弧状の支持部材(5)に取り付けられ
ている。X線管(1)は支持部材(5)に固定され,検出器
(2)はモータ(6)によって支持部材(5)に沿って走査可能
なように設置されている。支持部材(5)はさらに支持部
材(7)に,モータ(8)によって走査可能なように設置され
ており,支持部材(7)もまたX線入射位置(4)を中心とす
る円弧状に形成されている。支持部材(7)はアーム(9)に
固定されており,アーム(9)はモータ(10)の回転軸に取
り付けられて回転可能となっている。モータ(10)の回転
軸中心線(A)の延長上にX線入射位置(4)が存在するよう
に,材料(3)は台(11)上に固定されている。モーター
(6),(8),(10)は制御装置(12)から送られるパルス信号
に従って回転し,検出器(2)の出力は制御装置(12)に送
られて処理され,表示される。(E) Examples The present invention will be described in more detail with reference to Examples below. First
FIG. 1 is a block diagram showing the outline of one embodiment of the present invention.
Is an X-ray tube, (2) is an X-ray detector, and (3) is a material to be measured.
X-ray tube (1) and detector (2) are the X-ray incident position on the surface of the material (3)
It is attached to an arcuate support member (5) whose center point is (4). The X-ray tube (1) is fixed to the support member (5) and the detector
(2) is installed so as to be able to scan along the support member (5) by the motor (6). The support member (5) is further installed on the support member (7) so that it can be scanned by the motor (8), and the support member (7) also has an arc shape centered on the X-ray incident position (4). Has been formed. The support member (7) is fixed to the arm (9), and the arm (9) is attached to the rotating shaft of the motor (10) and is rotatable. The material (3) is fixed on the base (11) so that the X-ray incidence position (4) exists on the extension of the center line (A) of the rotation axis of the motor (10). motor
(6), (8) and (10) rotate according to the pulse signal sent from the control device (12), and the output of the detector (2) is sent to the control device (12) for processing and display.
以下,第1図装置の動作を説明する。X線管(1)により
発生するX線はソーラスリット(図示せず)により細い
ビーム状となり,測定の間中常に材料(3)の表面の一定
点(4)を照射している。あるX線入射角に対する回折
角2θを求めるには,制御装置(12)によってモーター
(6)を駆動し検出される出射X線と入射X線の成す角度
2θ′を走査する必要があるが,この走査は初期位置か
ら一定微小角度毎にステップ状に行なう。2θ′の各値
について,一定時間検出器(2)からの出力値が制御装置
(12)に送られ,制御装置はこの出力値を積算する。以下
この一定時間の検出を1ステップの測定と称することと
する。なお,上記の積算は平均値を求めることと同じ意
味を有する。この1ステップの測定の間にモーター
(8),(10)による揺動が行なわれる。モーター(8)が駆動
されると,検出器,X線管及び支持部材(5)は支持部材
(7)に沿って動き,これはX線入射位置(4)を通る直線の
回りの回転となるが,この回転角度が±Δθ1の範囲で
周期的な動作を行なうよう,制御装置はモーター(8)を
制御する。モーター(8)と同時にモーター(10)も駆動さ
れ,±Δθ2の回転角度範囲で周期的な動作を行なう。
これらの動作を揺動と称する。このΔθ1,Δθ2は小
さな値であり,1ステップの測定時間内に少くとも1周
期以上がはいるが,多くの周期がはいるようにしてかつ
モーター(8)と(10)の動作の周期を異なるようにすると
結果的に検出器等はだ円等の単純な軌道をとらないので
効果的となる。The operation of the apparatus shown in FIG. 1 will be described below. The X-ray generated by the X-ray tube (1) is made into a thin beam shape by a solar slit (not shown), and the fixed point (4) on the surface of the material (3) is always irradiated during the measurement. In order to obtain the diffraction angle 2θ for a certain X-ray incident angle, the motor is controlled by the controller (12).
It is necessary to scan (6) and scan the angle 2θ 'formed by the emitted X-ray and the incident X-ray that is detected, but this scanning is performed stepwise from the initial position at a constant small angle. For each value of 2θ ', the output value from the detector (2) for a certain period of time is the control device.
It is sent to (12) and the control unit integrates this output value. Hereinafter, this detection for a certain period of time will be referred to as one-step measurement. The above integration has the same meaning as obtaining an average value. Motor during this one-step measurement
Swing is performed according to (8) and (10). When the motor (8) is driven, the detector, the X-ray tube and the support member (5) are
It moves along (7), which is a rotation around a straight line passing through the X-ray incident position (4). The control device uses a motor so that the rotation angle is within a range of ± Δθ 1. Control (8). The motor (10) is driven at the same time as the motor (8), and the periodic operation is performed within the rotation angle range of ± Δθ 2 .
These operations are called rocking. These Δθ 1 and Δθ 2 are small values, and there is at least one cycle within the measurement time of one step, but there should be many cycles and the operation of the motors (8) and (10) If the periods are made different, the detectors and the like are effective because they do not take a simple orbit such as an ellipse as a result.
第2図は揺動を説明する図であるが,簡単のため入射X
線をZ軸とし,x軸及びy軸が揺動の中心軸であること
を示している。このような揺動で回折面法線(入射X線
と回折X線の間を2等分する直線であり,回折格子面に
対する法線となる)が±Δθ1,±Δθ2の範囲で2軸
揺動を行なう。FIG. 2 is a diagram for explaining the swing, but for the sake of simplicity, the incident X
It is shown that the line is the Z axis, and the x axis and the y axis are the central axes of the swing. Due to such oscillation, the diffractive surface normal (a straight line that divides the incident X-ray and the diffracted X-ray into two equal parts and becomes a normal to the diffraction grating surface) is 2 within the range of ± Δθ 1 and ± Δθ 2. Shake the shaft.
揺動は1ステップの測定ごとに行なわれ,1ステップの
測定が終了するといったん揺動が停止されてモーター
(6)によって検出器の位置すなわち2θ′が変化し再び
揺動が開始されて次の1ステップの測定が行なわれる。
このようにして2θ′の変化に対する検出強度の変化を
求めた結果を第5図に例示する。第5図の曲線でピーク
となる角度が回折角2θである。このようにして1つの
入射角に対する回折角2θが求められ,同様の測定は
数点のについて実行される。The swing is performed for each measurement of one step, and once the measurement of one step is completed, the swing is stopped once and the motor is
By (6), the position of the detector, that is, 2θ ', is changed, the oscillation is restarted, and the next one-step measurement is performed.
FIG. 5 exemplifies the result of obtaining the change in the detected intensity with respect to the change in 2θ ′ in this way. The angle that peaks in the curve of FIG. 5 is the diffraction angle 2θ. In this way, the diffraction angle 2θ for one incident angle is obtained, and the same measurement is performed for several points.
以上のようにして2θとの関係が測定されると,最小
二乗法によって2θ−sin2回帰直線が従来と同様にし
て作成され,その傾斜から応力σが求められる。When the relationship with 2θ is measured as described above, a 2θ-sin 2 regression line is created by the method of least squares in the same manner as in the conventional case, and the stress σ is obtained from the slope.
本発明は第4図に示すとおりであるが,その構成は第1
図に限定されず,X線入射位置(4)を通る2直線の回り
に検出器及びX線管を回転揺動させる方式のものであれ
ばよい。また2直線は直交させることに限定されず,た
とえばモーター(10)の回転軸中心(A)を傾斜させてもよ
い。The present invention is as shown in FIG.
The present invention is not limited to the figure, and any method may be used as long as the detector and the X-ray tube are oscillated around two straight lines passing through the X-ray incident position (4). Further, the two straight lines are not limited to being orthogonal to each other, and for example, the center (A) of the rotation axis of the motor (10) may be inclined.
さらにX線管と検出器を揺動させる代りに材料(3)を揺
動させることも考えられるが,被測定材料は構造物であ
ったりして動かすことが困難な場合には,検出系を揺動
させる法が優れている。Furthermore, it is possible to swing the material (3) instead of swinging the X-ray tube and the detector, but if the material to be measured is a structure and it is difficult to move it, use a detection system. The method of rocking is excellent.
(ヘ) 効 果 本発明によって結晶粒が大きい材料や集合組織を有する
材料についても精度の良い応力測定が可能となる。実験
データにより,従来技術と本発明を比較するため,アル
ミニウム引き抜き材(集合組織を有する)を被測定材料
とする測定を行ない,2θとsin2の関係をプロット
し,応力σ及び測定精度(分散)を求めた。第3図は2
軸揺動法による結果であり,第4図は1軸のみの揺動に
よるものである。第3図(本発明の方法)では応力は圧
縮方向3.93kgF/cm2,分散は0.93kgF/cm2
であり,第4図では応力は引張り方向0.84kgF/cm
2,分散は8.43kg/cm2となった。分散を比較して
わかるように,従来方法では不正確で測定不可能であっ
た応力測定が本発明によって可能となるなどその効果は
顕著である。(F) Effect According to the present invention, accurate stress measurement can be performed even for a material having large crystal grains or a material having a texture. In order to compare the present invention and the present invention with the experimental data, measurements were performed using an aluminum drawn material (having a texture) as the material to be measured, the relationship between 2θ and sin 2 was plotted, and stress σ and measurement accuracy (dispersion) were measured. ) Was asked. Figure 3 is 2
The results are obtained by the shaft swing method, and FIG. 4 is based on the swing of only one axis. In FIG. 3 (method of the present invention), the stress is 3.93 kgF / cm 2 in the compression direction and the dispersion is 0.93 kgF / cm 2.
In Fig. 4, the stress is 0.84 kgF / cm in the tensile direction.
2 , the dispersion was 8.43 kg / cm 2 . As can be seen by comparing the dispersions, the present invention enables stress measurement, which is inaccurate and cannot be measured by the conventional method, and its effect is remarkable.
第1図は本発明装置構成の実施例を示す。第2図は揺動
を説明するための図である。第3図及び第4図は各々本
発明及び従来技術による測定結果を示し,第5図は回折
角2θを求める測定結果の一例を示す図である。 (1)……X線管、(2)……X線検出器 (3)……被測定材料、(4)……X線入射位置 (5),(7)……支持部材、(9)……アーム (6),(8),(10)……モーター、(11)……台 (14)……入射X線、(13)……出射X線(回折X線) (12)……制御装置FIG. 1 shows an embodiment of the device configuration of the present invention. FIG. 2 is a diagram for explaining the swing. 3 and 4 show the measurement results according to the present invention and the prior art, respectively, and FIG. 5 is a diagram showing an example of the measurement results for obtaining the diffraction angle 2θ. (1) …… X-ray tube, (2) …… X-ray detector (3) …… Measured material, (4) …… X-ray incident position (5), (7) …… Supporting member, (9 ) …… Arm (6), (8), (10) …… motor, (11) …… stand (14) …… incident X-ray, (13) …… exit X-ray (diffraction X-ray) (12) ……Control device
Claims (1)
材料面で回折したX線を検出する検出器と、前記X線管
と検出器をX線の材料への入射点のまわりに回転する回
転手段と、前記X線管及び検出器を前記入射点を通る2
直線を中心として回転揺動させる回転揺動手段と、前記
回転手段と前記回転揺動手段を制御する制御手段とを有
し、前記制御手段は、前記X線管に対して前記検出器を
移動させて回折X線を検出するとき、前記X線管及び検
出器を一定時間回転揺動させ、得られた回折X線の検出
強度を積算することを特徴とする2軸揺動X線応力測定
装置。1. An X-ray tube for introducing X-rays into a material to be measured,
A detector for detecting X-rays diffracted on the surface of the material, rotating means for rotating the X-ray tube and the detector around an incident point of the X-ray on the material, and the X-ray tube and the detector for the incident point. Passing through 2
It has a rotation oscillating means for oscillating about a straight line, and a control means for controlling the rotation means and the rotation oscillating means, and the control means moves the detector with respect to the X-ray tube. When detecting the diffracted X-rays by rotating the X-ray tube and the detector for a certain period of time, the detected intensity of the diffracted X-rays obtained is integrated, and the biaxial rocking X-ray stress measurement is performed. apparatus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59197713A JPH0654265B2 (en) | 1984-09-19 | 1984-09-19 | 2-axis swing X-ray stress measurement device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59197713A JPH0654265B2 (en) | 1984-09-19 | 1984-09-19 | 2-axis swing X-ray stress measurement device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6175243A JPS6175243A (en) | 1986-04-17 |
| JPH0654265B2 true JPH0654265B2 (en) | 1994-07-20 |
Family
ID=16379114
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59197713A Expired - Lifetime JPH0654265B2 (en) | 1984-09-19 | 1984-09-19 | 2-axis swing X-ray stress measurement device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0654265B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03225237A (en) * | 1990-01-30 | 1991-10-04 | Nippon Steel Corp | Small-sized z-ray diffraction device and method for using same |
| JP2904055B2 (en) * | 1995-05-30 | 1999-06-14 | 株式会社島津製作所 | X-ray diffractometer |
| JP3474101B2 (en) * | 1998-04-24 | 2003-12-08 | 理学電機株式会社 | Pole measurement method |
| JP2007127435A (en) * | 2005-11-01 | 2007-05-24 | Taiyo Yuden Co Ltd | Stress measuring method and device, and quality control method |
| CN114993544A (en) * | 2022-07-18 | 2022-09-02 | 安徽建筑大学 | Bridge structure stress detection device |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5588148U (en) * | 1979-12-06 | 1980-06-18 |
-
1984
- 1984-09-19 JP JP59197713A patent/JPH0654265B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6175243A (en) | 1986-04-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH08128971A (en) | Exafs measuring device | |
| JP3205402B2 (en) | Method and apparatus for determining crystal orientation | |
| JPH0654265B2 (en) | 2-axis swing X-ray stress measurement device | |
| EP1524516A1 (en) | X-ray diffractometer and method of correcting measurement position thereof | |
| US5878106A (en) | X-ray diffractometer | |
| JPH05126768A (en) | Fluorescent x-ray analyzing method | |
| JPH1137958A (en) | Method for measuring angle of inclination of crystal axis | |
| JPH0666741A (en) | X-ray diffractometer | |
| Rappaz et al. | Combined X-ray microdiffraction and topography experiment for microstructural analysis of heterogeneous materials | |
| US3816747A (en) | Method and apparatus for measuring lattice parameter | |
| JPH0933700A (en) | X-ray monochromator and x-ray diffractor using it | |
| JP2002148220A (en) | X-ray diffraction apparatus and X-ray adjustment method | |
| US3634686A (en) | X-ray stress-measuring apparatus | |
| JP2567840B2 (en) | Crystal orientation determination device | |
| JP2999272B2 (en) | Parallel beam X-ray diffractometer | |
| JP5007517B2 (en) | Radiation diffraction apparatus and radiation diffraction method | |
| JPH05288616A (en) | X-ray residual stress measuring method | |
| JPH03291555A (en) | Automatic optical axis adjusting device for sample fixing type x-ray diffraction device | |
| JP2912670B2 (en) | X-ray diffractometer | |
| JP2001336992A (en) | X-ray stress measurement method and X-ray stress measurement device | |
| JPH05283963A (en) | Inspection method and inspection device for cut surface of quartz pieces | |
| JPS62190453A (en) | Lattice parameter measuring device | |
| JPH04335147A (en) | X-ray diffractometer | |
| JPS60263841A (en) | X-ray diffraction instrument for thin film sample | |
| JPS5957145A (en) | X-ray analytical apparatus |