JPH0656497B2 - Manufacturing equipment for substrate for photoconductive member - Google Patents
Manufacturing equipment for substrate for photoconductive memberInfo
- Publication number
- JPH0656497B2 JPH0656497B2 JP25166385A JP25166385A JPH0656497B2 JP H0656497 B2 JPH0656497 B2 JP H0656497B2 JP 25166385 A JP25166385 A JP 25166385A JP 25166385 A JP25166385 A JP 25166385A JP H0656497 B2 JPH0656497 B2 JP H0656497B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- coating liquid
- surface coating
- sphere
- rigid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/10—Bases for charge-receiving or other layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
Description
【発明の詳細な説明】 〔発明の属する技術分野〕 本発明は、金属体を、電気乃至電子ディバイスの構成部
材、特に電子写真感光体等の光導電部材の基体として好
適に利用できるようにする、該金属体の表面処理装置に
関する。Description: TECHNICAL FIELD The present invention enables a metal body to be suitably used as a substrate of a constituent member of electric or electronic devices, particularly a photoconductive member such as an electrophotographic photoreceptor. , A surface treatment apparatus for the metal body.
〔従来技術の説明〕 電子写真感光体等の光導電部材の基体として、板状、円
筒状、無端ベルト状等の形状の金属体が用いられるとこ
ろ、それら金属体は用途に適した表面形状を有している
ことが要求され、ためにそれら金属体の表面には各種切
削加工乃至研摩加工が施される。[Description of the Prior Art] Where a metal body having a plate shape, a cylindrical shape, an endless belt shape, or the like is used as a substrate of a photoconductive member such as an electrophotographic photoreceptor, the metal body has a surface shape suitable for the application. Since it is required to have these, various cutting or polishing processes are performed on the surfaces of the metal bodies.
そして前記金属体として、アルミ合金が至適なものとし
て一般に使用され、その表面に前述の加工を施して所望
表面のものにし、該表面上に用途に応じた光受容層が形
成される。As the metal body, an aluminum alloy is generally used as the optimum one, and the surface thereof is subjected to the above-mentioned processing to obtain a desired surface, and a light-receiving layer according to the application is formed on the surface.
ところが従来の切削加工方式乃至研摩加工方式による
と、合金組織中にSi Al-Fe系、Fe-Al系、TiB2等の金属
間化合物、Al,Mg,Ti,Si,Feの酸化物等が介在してしまっ
たり、H2による空孔が存在してしまうことの他、結晶方
位の異る近隣Al組織間で生起する粒界段差といった表面
欠陥が生起することがある。However, according to the conventional cutting processing method or polishing processing method, Si Al-Fe-based, Fe-Al-based, intermetallic compounds such as TiB 2 and oxides of Al, Mg, Ti, Si, Fe, etc. are contained in the alloy structure. In addition to intervening or the presence of vacancies due to H 2 , surface defects such as grain boundary step differences that occur between neighboring Al structures with different crystal orientations may occur.
また、アルミ合金を基体に適用する場合極めて高清浄度
表面のものが使用されるところ、そうした表面状態のア
ルミ合金は、10-9mmHgといった超高真空の下でも、その
表面は活性であるために、〜30Å程度厚の酸化膜が形
成されてしまう。Also, when an aluminum alloy is applied to a substrate, a surface with an extremely high cleanliness is used.The surface of such an aluminum alloy is active even under an ultrahigh vacuum of 10 -9 mmHg. Then, an oxide film with a thickness of about 30Å is formed.
こうした問題のあるところで従来の切削加工方式又は研
摩加工方式により表面加工して得られる基体は、結局は
それを使用して製造される光導電部材の機能に各種の問
題や欠陥を惹起するところとなる。A substrate obtained by subjecting a surface to a conventional cutting method or a polishing method in such a problem eventually causes various problems and defects in the function of a photoconductive member manufactured using the same. Become.
即ち、例えばそれが電子写真感光体である場合、基体上
に形成される光受容層が均一性、均質性に乏しいものに
なってしまったり、電気的、光学的、または/及び光導
電的特性が不均一なものになってしまったりして、画像
に欠陥をもたらすところとなり、結局は実用に価しない
ものになってしまうことが往々にしてある。そしてこの
点は、シリコン又はシリコンを主体とする非単結晶材料
で光受容層を形成する場合には顕著である。That is, for example, when it is an electrophotographic photoreceptor, the light-receiving layer formed on the substrate becomes poor in uniformity and homogeneity, or has electrical, optical, and / or photoconductive properties. The image becomes non-uniform, which causes a defect in the image, and is often not practical. This point is remarkable when the light receiving layer is formed of silicon or a non-single crystal material containing silicon as a main component.
本発明の主たる目的は、上述の従来の加工方式に基因す
る各種の物理的問題点及び基体表面に酸化膜が形成され
てしまう問題点を排除して金属体を表面加工し、電気乃
至電子デバイスの構成部材、特に電子写真感光体等用に
至適な基体を製造する装置を提供することにある。The main object of the present invention is to eliminate the various physical problems caused by the above-mentioned conventional processing methods and the problem that an oxide film is formed on the surface of a substrate, thereby processing the surface of a metal body to produce an electrical or electronic device. An object of the present invention is to provide an apparatus for manufacturing a substrate which is optimal for the constituent members, especially for electrophotographic photoreceptors.
本発明の他の目的は、前述の方法により得られた基体を
使用し、その加工表面に所望の光受容層を形成せしめ
て、電気的、光学的、光導電的特性が実質的に常時安定
しており、耐光疲労に優れ、繰返し使用に際しても劣化
現象を起こさず耐久性、耐湿性に優れ、残留電位が全く
又は殆んど観測されない、必要に応じて水素原子(H)
又は/及びハロゲン原子(X)を含有するアモルファス
シリコンa-Si(H,X)で構成された光受容層を有する光受
容部材を製造するに適した基体の製造装置を提供するこ
とにある。Another object of the present invention is to use the substrate obtained by the above method and form a desired photoreceptive layer on the processed surface thereof so that the electrical, optical and photoconductive properties are substantially always stable. It has excellent light fatigue resistance, does not deteriorate even after repeated use, has excellent durability and moisture resistance, and has no or almost no residual potential observed. If necessary, hydrogen atoms (H)
Another object of the present invention is to provide a substrate manufacturing apparatus suitable for manufacturing a light receiving member having a light receiving layer composed of amorphous silicon a-Si (H, X) containing a halogen atom (X).
本発明者らは、電気乃至電子デバイス、特に電子写真感
光体等用の基体について至適な表面形状を有し、且つ上
述の従来の表面加工方式によりもたらされるような問題
のないものとすべく鋭意研究を重ねた結果、剛体真球を
使用してそれらを所定の金属体の表面に落下せしめる
と、例えば金属体がアルミ合金である場合、該合金組織
中に何らの金属間化合物、金属酸化物等の介在、そして
空孔の存在がなく、且つまた粒界段差といった表面欠陥
の生起もなくして該金属体の表面を好ましい表面形状に
することができ、その表面加工を長鎖状炭化水素を含有
する液体の存在下で行うと、常圧条件下であっても酸化
膜の生成は起らず、かくして得られる基体の加工表面に
グロー放電法により主としてa-Si(H,X)で構成される光
受容層を形成せしめると、形成される光受容層は均一に
して均質なものとなり、そしてその光受容部材は、使用
にあってその光受容層を通過した光が層界面、基体表面
に反射し、それらが干渉するところとなって、形成され
る画像についてそれが縞模様になることを効率的に防止
し、出力される画像を極めて優れた質のものにするもの
である知見を得、該知見に基づいて本発明を完成せしめ
た。The inventors of the present invention should have an optimum surface shape for a substrate for electric or electronic devices, particularly for electrophotographic photoreceptors, and to avoid the problems brought about by the conventional surface processing method described above. As a result of earnest studies, when using a rigid spherical body to drop them on the surface of a predetermined metal body, for example, when the metal body is an aluminum alloy, no intermetallic compound or metal oxide is present in the alloy structure. The surface of the metal body can be made into a preferable surface shape without inclusions of substances and the like, and without the presence of pores, and without the occurrence of surface defects such as grain boundary steps. When it is carried out in the presence of a liquid containing an oxide film does not occur even under normal pressure conditions, the processed surface of the substrate thus obtained is mainly a-Si (H, X) by glow discharge method. When the composed light receiving layer is formed The formed light-receptive layer becomes uniform and homogeneous, and the light-receptive member is such that, in use, light passing through the light-receptive layer is reflected at the layer interface, the substrate surface, and they interfere with each other. Then, it was found that the formed image can be efficiently prevented from becoming a striped pattern, and the image to be output has an extremely excellent quality, and the present invention is based on the finding. I completed it.
即ち、本発明は、基体表面を、ポリブテンを含有する液
体(以下、「表面被覆液」という。)で被覆した状態
で、剛体真球又は凹凸表面形状の剛体球を所定の高さか
ら落下させることにより処理することを骨子とする電気
乃至電子デバイス、特に電子写真感光体等用に至適な基
体を製造する装置に関するものである。That is, in the present invention, a rigid true sphere or a rigid sphere having an uneven surface shape is dropped from a predetermined height in a state where the surface of the substrate is coated with a liquid containing polybutene (hereinafter referred to as "surface coating liquid"). The present invention relates to an apparatus for manufacturing an optimal substrate for an electric or electronic device, particularly an electrophotographic photoreceptor, whose main point is to treat the material.
本発明の装置により表面処理するについて使用される基
体は、導電性のものであっても、或いは電気絶縁性のも
のであってもよい。The substrate used for surface treatment with the apparatus of the present invention may be electrically conductive or electrically insulating.
導電性基体としては、例えば、NiCr、ステンレス、Al、C
r、Mo、Au、Nb、Ta、V、Ti、Pt、Pb等の金属又はこれ等の合金が
挙げられる。As the conductive substrate, for example, NiCr, stainless steel, Al, C
Examples thereof include metals such as r, Mo, Au, Nb, Ta, V, Ti, Pt and Pb, and alloys thereof.
電気絶縁性支持体としては、ポリエステル、ポリエチレ
ン、ポリカーボネート、セルロース、アセテート、ポリ
プロピレン、ポリ塩化ビニル、ポリ塩化ビニリデン、ポ
リスチレン、ポリアミド等の合成樹脂のフイルム又はシ
ート、ガラス、セラミック、紙等が挙げられる。これ等
の電気絶縁性基体は、好適には少なくともその一方の表
面を導電処理し、該導電処理された表面側に光受容層を
設けるのが望ましい。Examples of the electrically insulating support include a film or sheet of synthetic resin such as polyester, polyethylene, polycarbonate, cellulose, acetate, polypropylene, polyvinyl chloride, polyvinylidene chloride, polystyrene and polyamide, glass, ceramic, paper and the like. It is desirable that at least one surface of these electrically insulating substrates is subjected to a conductive treatment, and a light receiving layer is provided on the surface side subjected to the conductive treatment.
例えば、ガラスであれば、その表面に、NiCr、Al、Cr、Mo、
Au、Ir、Nb、Ta、V、Ti、Pt、Pd、In2O3、SnO2、ITO(In2O3+SnO2)
等から成る薄膜を設けることによって導電性を付与し、
或いはポリエステルフイルム等の合成樹脂フイルムであ
れば、NiCr、Al、Ag、Pb、Zn、Ni、Au、Cr、Mo、Ir、Nb、Ta、V、Tl、P
t等の金属の薄膜を真空蒸着、電子ビーム蒸着、スパッ
タリング等でその表面に設け、又は前記金属でその表面
をラミネート処理して、その表面に導電性を付与する。
基体の形状は、円筒状、板状等任意の形状であることが
できるが、用途、所望によって、その形状は適宜に決め
ることのできるものである。例えば、光受容部材を電子
写真用像形成部材として使用するのであれば、連続高速
複写の場合には、円筒状とするのが望ましい。基体の厚
さは、所望通りの光受容部材を形成しうる様に適宜決定
するが、光受容部材として可撓性が要求される場合に
は、基体としての機能が充分発揮される範囲内で可能な
限り薄くすることができる。しかしながら、基体の製造
上及び取扱い上、機械的強度等の点から、通常は、10
μ以上とされる。For example, if it is glass, NiCr, Al, Cr, Mo,
Au, Ir, Nb, Ta, V, Ti, Pt, Pd, In 2 O 3 , SnO 2 , ITO (In 2 O 3 + SnO 2 )
Conductivity is provided by providing a thin film of
Or synthetic resin film such as polyester film, NiCr, Al, Ag, Pb, Zn, Ni, Au, Cr, Mo, Ir, Nb, Ta, V, Tl, P
A thin film of a metal such as t is provided on the surface by vacuum vapor deposition, electron beam vapor deposition, sputtering or the like, or the surface is laminated with the metal to impart conductivity to the surface.
The shape of the substrate can be any shape such as a cylindrical shape or a plate shape, but the shape can be appropriately determined depending on the application and the desire. For example, when the light receiving member is used as an electrophotographic image forming member, it is desirable to have a cylindrical shape for continuous high speed copying. The thickness of the substrate is appropriately determined so that a desired light-receiving member can be formed, but when flexibility is required as the light-receiving member, it is within a range in which the function as the substrate is sufficiently exhibited. It can be made as thin as possible. However, in view of manufacturing and handling of the substrate, mechanical strength and the like, it is usually 10
It is considered to be μ or more.
また本発明の装置において、前述の基体表面を処理、即
ち該表面に所望の凹凸形状を形成せしめるについて用い
る剛体真球又は凹凸表面形状の剛体球(通常、φ=0.4
〜2.0mm)としては、例えばステンレス、アルミニウ
ム、鋼鉄、ニッケル、真鍮等の金属、セラミックまたは
プラスチック製の各種剛体球を挙げることができる。こ
れらの中、ステンレス製及び鋼鉄製の剛体球が、耐久
性、コスト等を含めた綜合的見地からして好ましい。そ
してそうした球体の硬度は、基体の硬度より高くても、
或いは低くてもよいが、該球体を繰り返し使用する場合
には、基体の硬度よりも高いものであることが望まし
い。Further, in the apparatus of the present invention, a rigid true sphere or a rigid sphere having an uneven surface shape (usually φ = 0.4 is used for treating the above-mentioned substrate surface, that is, for forming a desired uneven shape on the surface.
Examples of the hard spheres include metal such as stainless steel, aluminum, steel, nickel, brass, etc., and ceramic or plastic. Of these, stainless steel and steel hard spheres are preferable from a comprehensive viewpoint including durability, cost and the like. And the hardness of such a sphere is higher than that of the base,
Alternatively, it may be lower, but when the sphere is repeatedly used, it is preferably higher than the hardness of the substrate.
また本発明の装置において、前述の基体表面に、前述の
剛体球を使用して所望の凹凸形状を形成せしめる際に使
用する、表面被覆液については、いずれにしても基体表
面を万遍なく一様にそして出来得る限り薄く被覆し、そ
こに形成される被覆膜は可及的速やかに固化し、固化膜
は洗浄操作によりムラを残さず洗去されると同時に基体
表面が何らの乾燥ムラ(ダレ)も残すことなく絶体クリ
ーンの状態に乾燥されることが要求される。こうしたこ
とから、前記表面被覆液は、(イ)低粘度液体であるこ
と、(ロ)除電作用を有すること、(ハ)コーティング作用を
有すること、(ニ)形成される被覆膜(コート)が容易に
洗去され得るものであること、(ホ)被覆膜(コート)洗
去後加工表面がそこに何らの乾燥ムラも残さずして絶体
クリーンの状態に乾燥されること、の(イ)乃至(ホ)の条件
を満足するものであることが必要とされる。Further, in the apparatus of the present invention, the surface coating liquid used when forming the desired uneven shape on the surface of the substrate by using the above-mentioned rigid body spheres is evenly distributed on the surface of the substrate in any case. Coating as thin as possible and the coating film formed there solidifies as quickly as possible, and the solidified film is washed away without any unevenness by the washing operation, and at the same time the substrate surface does not show any drying unevenness. It is required to be dried in an absolutely clean state without leaving any sagging. For these reasons, the surface coating liquid is (a) a low-viscosity liquid, (b) having a static elimination action, (c) a coating action, (d) a coating film (coat) formed Can be easily washed off, and (e) after the coating film (coat) is washed off, the processed surface is dried in an absolutely clean state without leaving any drying unevenness. It is necessary to satisfy the conditions (a) to (e).
したがって表面被覆液としては、長鎖状炭化水素を適当
な有機溶媒に溶解して得たものが一般に使用される。Therefore, as the surface coating liquid, a liquid obtained by dissolving a long chain hydrocarbon in an appropriate organic solvent is generally used.
そして前記長鎖状炭化水素については、代表的なものと
してポリブテンが挙げられる。ポリブテンの中で好まし
いものは下記の一般式で表わされるものである。即ち、 但し、式中のnは、3乃至40の整数を表わす。前記一
般式で表わされるポリブテンの中、nが3乃至20であ
るものが特に好ましいものである。A typical example of the long-chain hydrocarbon is polybutene. Among the polybutenes, preferred are those represented by the following general formula. That is, However, n in the formula represents an integer of 3 to 40. Among the polybutenes represented by the above general formula, those in which n is 3 to 20 are particularly preferable.
なお、前記ポリブテンの中には、それ自身前記(イ)乃至
(ホ)の条件を満足するものがあり、その場合にあって
は、表面被覆液は実質的に該ポリブテンからなるもので
あることができる。Incidentally, some of the polybutene itself (a) to
In some cases, the condition (e) is satisfied, and in that case, the surface coating liquid may consist essentially of the polybutene.
前記有機溶媒は、前記長鎖状炭化水素(ポリブテン)を
溶解して、前記(イ)乃至(ホ)の条件を満たす表面被覆液を
与える類のものならば何れのものであってもよく、それ
らの例として、エーテル、ヘプタン、トルエン、トリク
ロロエチレン、トリクロロエタン等を挙げることができ
る。しかしこれら有機溶媒の中、トリクロロエタンは以
下の理由から最も好ましいものである。The organic solvent may be any one as long as it dissolves the long-chain hydrocarbon (polybutene) and gives a surface coating solution satisfying the conditions (a) to (e), Examples thereof include ether, heptane, toluene, trichloroethylene, trichloroethane and the like. However, among these organic solvents, trichloroethane is most preferable for the following reasons.
即ち、トリクロロエタンは、前記ポリブテンを極めて効
率的に溶解し、得られる液体は程よい粘度のものであっ
て、極めて展性に富み、基体表面をムラなく一様にしか
も極めて薄い膜を形成して覆い、その薄膜は落下する剛
体球による基体表面への球状痕跡窪み形成に支障を与え
ず、そして前記球状痕跡窪み形成後に前記薄膜の速やか
な固化をもたらし、更にそれを固化膜の洗浄操作に使用
すると、該固化膜は速やかに基体の加工表面から溶離し
て洗去され、露呈される基体の加工表面は何らの洗浄ム
ラを残すことなく絶体クリーンの状態に乾燥される。That is, trichloroethane dissolves the polybutene extremely efficiently, the obtained liquid has a moderate viscosity, is extremely malleable, and covers the surface of the substrate uniformly and evenly, forming a very thin film. , The thin film does not hinder the formation of spherical trace dents on the surface of the substrate by the falling hard spheres, and causes rapid solidification of the thin film after the formation of the spherical trace dents, and when it is used for the washing operation of the solidified film, The solidified film is quickly eluted and washed away from the processed surface of the substrate, and the exposed processed surface of the substrate is dried in an absolutely clean state without leaving any cleaning unevenness.
そして、トリクロロエタンに前記ポリブテンを溶解して
なる表面被覆液は、両物質の液構成割合が重要であり、
トリクロロエタンに対し前記ポリブテンを1:4〜4:
1の範囲にするのが通常であるが、1:1であるのが最
も好ましい。Then, the surface coating liquid obtained by dissolving the polybutene in trichloroethane, the liquid composition ratio of both substances is important,
The above polybutene was added to trichloroethane at a ratio of 1: 4 to 4: 4.
It is usually in the range of 1, but is most preferably 1: 1.
ところで本発明の装置により表面加工された基体は、剛
体真球を使用した場合について説明するに、第1図に示
すような表面形状のものである。即ち、第1(A)図に示
す例は、基体101の表面102の異なる部位に向けて、ほゞ
同一径の複数の球体103,103…を、ほゞ同一の高さより
規則的に落下せしめて、前記基体の表面にほゞ同一の曲
率(R)及びほゞ同一の幅の複数の球状痕跡窪み104,104
…を互に重複し合うように万遍なく生ぜしめて規則的に
凹凸形状を形成せしめてなる支持体についてのものであ
る。なおこの場合にあっては、互に重複する窪み104,1
04…を形成せしめるについては、球体103,103…の基体
表面102への衝突時期が互にずれるようにそれらを落下
せしめる必要のあることはいうまでもない。By the way, the substrate surface-treated by the apparatus of the present invention has a surface shape as shown in FIG. 1 for explaining the case of using a rigid spherical body. That is, in the example shown in FIG. 1 (A), a plurality of spheres 103, 103 having substantially the same diameter are regularly dropped from the same height toward different parts of the surface 102 of the base 101. A plurality of spherical trace depressions 104, 104 having substantially the same curvature (R) and substantially the same width on the surface of the substrate.
The present invention relates to a support in which irregularities are regularly formed by uniformly producing ... And overlapping each other. In this case, the depressions 104 and 1 overlapping each other
It is needless to say that it is necessary to drop the spheres 103 so that the spheres 103, 103 ... Collide with the base surface 102 at mutually different timings.
第1(B)図に示す例は、基体101の表面102に向けて異な
る径を有する二種類の複数の球体103,103…及び10
3′,103′…をほゞ同一の高さか、又は異る高さから落
下せしめて、前記基体の表面に曲率と幅のそれぞれが異
る二種類の球状痕跡窪み104,104…及び104′,104′…
を互に重複し合うように万遍なく生ぜしめて不規則に凹
凸形状を形成せしめてなる基体についてのものである。In the example shown in FIG. 1 (B), a plurality of two types of spheres 103, 103 ... And 10 having different diameters toward the surface 102 of the base 101 are provided.
3 ', 103' ... are dropped from substantially the same height or different heights, and two kinds of spherical trace depressions 104, 104 ... and 104 'having different curvatures and widths are formed on the surface of the base body. , 104 ′…
The present invention relates to a base body in which irregularities are irregularly formed by uniformly producing the above-mentioned elements so as to overlap each other.
更に、第1(C)図〔基体表面の正面図(上)および断面
図(下)〕に示す例は、基体101の表面102に向けて、ほ
ゞ同一径の複数の球体104,104…をほゞ同一の高さより
不規則に落下せしめ、前記基体の表面にほゞ同一径及び
ほゞ同一幅の複数の窪み104,104…を互に重複し合うよ
うに万遍なく生ぜしめて不規則に凹凸形状を形成せしめ
てなる支持体についてのものである。Further, in the example shown in FIG. 1 (C) [front view (top) and cross-sectional view (bottom) of substrate surface], a plurality of spheres 104, 104 ... Are dropped irregularly from the same height, and a plurality of recesses 104, 104 having the same diameter and the same width are evenly formed on the surface of the base body so as to overlap each other and irregularly. The present invention relates to a support formed by forming an uneven shape on.
そして前記第1(A)乃至(C)図に図示の球状痕跡窪み形状
表面を有する基体は、本発明の装置により製造されるも
のであるが、第1(A)乃至(C)図においては簡略のため、
表面被覆液についての説明を省略した。The substrate having the spherical trace-recessed surface shown in FIGS. 1 (A) to (C) is manufactured by the apparatus of the present invention, but in FIGS. 1 (A) to (C) For brevity,
The description of the surface coating liquid is omitted.
本発明の光導電部材用基体の製造装置を、図示の実施例
により以下に説明するが、本発明の装置はこれにより限
定されるものではない。An apparatus for manufacturing a photoconductive member substrate of the present invention will be described below with reference to the illustrated embodiment, but the apparatus of the present invention is not limited thereto.
第2図は、本発明の光導電部材用基体の製造装置全体の
断面略図であり、第3図は、第2図に図示の装置の剛体
球放出・落下手段の説明図である。FIG. 2 is a schematic cross-sectional view of the entire apparatus for manufacturing a photoconductive member substrate of the present invention, and FIG. 3 is an explanatory view of a hard-sphere releasing / falling means of the apparatus shown in FIG.
図において、1、1′は、それぞれ円筒形基体であっ
て、表面が弾性体で覆われた左右可動の回転軸2上に嵌
装して固定手段3、3、…により固定されている。回転
軸の両端は適宜の支持手段(図示せず)に回転可能に支
持固定されると共に、一端は駆動手段(図示せず)に連
結されている。4は、剛体球6、6、…の放出・落下手
段であり、駆動手段(図示せず)により回転する円盤4
1上に放射状に立設された羽根42、42…を有している。
51′は、剛体球6、6、…を給送モーターにより強
制的に送る管体51の円盤41の中央開口部であり、管
体51は該開口部51′で円盤41に摺嵌支持されてい
る。54は摩耗乃至疲労剛体球の取出口であり、開閉自
在扉を有している。5は、内部にバゲットコンベア52
を内設した剛体球移送塔である。剛体球移送塔5の底部
には、剛体球6、6、…の滞溜空間55を有し、該空間
の上壁部には、剛体球供給源(図示せず)からの剛体球
供給管53が連結していて、連結部は開閉自在扉53′
により内部密封されている。56は、剛体球受けバスケ
ット7からの剛体球6、6…の移送管である。剛体球受
けバスケット7は、多穿孔部材71で形成されている。
8は、ホッパー状の表面被覆液受け容器であり底部中央
に多穿孔キャップ81を有し、表面被覆液滞溜タンク9
に管連結82している。滞溜タンク9の底側端部にはバ
ルブ10′を備えた排出管10が設けられている。ま
た、滞溜タンク9の上部には、表面被覆液供給源(図示
せず)からの表面被覆液供給管91がバルブ91′を備
えて開口している。滞溜タンク9中の表面被覆液Aは、
ポンプ手段を備えた導管11を介して噴出孔12′、
12′、…を備えた噴出管12、12に送られ、ポンプ
作用により表面被覆液Aが付勢されて噴出孔12′、
12′、…から下方に噴射される。In the figure, reference numerals 1 and 1'denote cylindrical bases, which are fitted on a left and right movable rotary shaft 2 whose surface is covered with an elastic body and fixed by fixing means 3, 3, .... Both ends of the rotary shaft are rotatably supported and fixed by appropriate supporting means (not shown), and one end is connected to a driving means (not shown). Reference numeral 4 denotes a discharging / falling means for the hard spheres 6, 6, ..., A disk 4 which is rotated by a driving means (not shown).
1 has blades 42, 42 ... Standing radially.
Reference numeral 51 'denotes a central opening of the disc 41 of the pipe 51 forcibly feeding the rigid balls 6, 6, ... By a feeding motor. The pipe 51 is slidably supported on the disc 41 by the opening 51'. ing. Reference numeral 54 denotes an outlet for a wear or fatigue rigid body ball, which has a door that can be opened and closed. 5 is a baguette conveyor 52 inside
It is a rigid sphere transfer tower in which is installed. At the bottom of the hard sphere transfer tower 5, there is a stagnant space 55 for the hard spheres 6, 6, ..., On the upper wall of the space is a hard sphere supply pipe from a hard sphere supply source (not shown). 53 is connected, and the connecting portion is a door 53 'that can be opened and closed.
Is internally sealed by. Reference numeral 56 is a transfer tube for transferring the hard spheres 6, 6, ... From the hard sphere receiving basket 7. The rigid ball receiving basket 7 is formed of a multi-perforated member 71.
Reference numeral 8 denotes a hopper-shaped surface coating liquid receiving container having a multi-perforated cap 81 at the center of the bottom,
Is connected to the pipe 82. A discharge pipe 10 having a valve 10 ′ is provided at the bottom end of the retention tank 9. Further, a surface coating liquid supply pipe 91 from a surface coating liquid supply source (not shown) is provided on the upper portion of the retention tank 9 with a valve 91 'and opened. The surface coating liquid A in the retention tank 9 is
Jetting holes 12 'through a conduit 11 provided with pumping means,
12 ', and is sent to the ejection pipes 12 and 12, and the surface coating liquid A is urged by the pump action to eject the ejection holes 12'
It is injected downward from 12 ', ....
以上説明の本発明の装置は、適宜部材のハウジング(図
示せず)内に密封収容されている。図示の本発明の装置
の操作を説明するに、図示のように2本の円筒形基体
1、1′を回転軸2上に嵌装固定し、一方、表面被覆液
〔例えばポリブテン+トリクロロエタン(1:1)液〕
を供給管91を介して滞溜タンク9に導入し、ポンプ手
段を作動させて表面被覆液を噴出管12、12に送
り、噴出孔12′、12′、…から下方噴射せしめ、円
筒形基体1の表面に供給して表面被覆液の液膜が該表面
上に形成されるようにし、回転軸2上の円筒形基体1の
左端部が剛球体放出・落下手段4からの剛体球6、6、
…の落下位置に来るように位置調節したところで、回転
軸2の回転を開始する。そうしたところで、バケットコ
ンベアを作動させて剛体球滞溜空間55中の剛体球6、
6、…を上方に移送し、管体51に放出し、モーター
によりそれら剛体球を回転している剛体球放出・落下手
段4に送り、羽根42、42、…間から剛体球6、6、
…を放出・落下せしめて下方に位置する円筒形基体表面
に衝突せしめる。剛体球6、6、…は円筒形基体表面に
衝突した後剛体受けバスケット7中に落下し、移送管5
6を通って剛体球滞溜空間55に入り、前述と同様にし
て剛体球放出・落下手段に送られる。表面被覆液は、円
筒形基体1の表面に当ってそこに液膜を形成し、その余
は落下して剛体球受けバスケット7に入り、その壁孔を
通って容器8に入り、多穿孔キャップ81で固形物が分
離されて滞溜タンク9に入り、前述と同様にして噴出管
12、12に送られる。所定時間処理後、回転軸2を左
に移動させ、上述の操作を繰返して円筒形基体1の表面
加工を終え、剛体球6、6、…の供給を停止し、回転軸
2を左に移動させて、円筒形基体1′が上述と同様に所
定位置に来たところで剛体球6、6、…の放出・落下を
開始する。その後は上述の場合と同様に処理する。かく
して、二本の円筒形基体の表面加工が連続して行われ
る。The apparatus of the present invention described above is hermetically housed in a housing (not shown) of an appropriate member. To illustrate the operation of the illustrated apparatus of the present invention, two cylindrical substrates 1, 1'are fitted and fixed on a rotary shaft 2 as shown, while a surface coating solution [eg polybutene + trichloroethane (1 1) Liquid]
Is introduced into the retention tank 9 through a supply pipe 91, the pump means is operated to send the surface coating liquid to the ejection pipes 12 and 12, and is ejected downward from the ejection holes 12 ′, 12 ′, ... 1, so that a liquid film of the surface coating liquid is formed on the surface of the cylindrical substrate 1, and the left end of the cylindrical substrate 1 on the rotating shaft 2 is a rigid sphere 6 from the hard sphere discharging / falling means 4. 6,
When the position is adjusted to reach the falling position of ..., The rotation of the rotary shaft 2 is started. At that point, the bucket conveyor is operated to operate the rigid sphere 6 in the rigid sphere retaining space 55.
6 are transferred upward and discharged to the tubular body 51, and the rigid spheres are sent by the motor to the rotating rigid sphere discharging / falling means 4, and the rigid spheres 6, 6, between the blades 42, 42 ,.
... is discharged and dropped to collide with the surface of the cylindrical substrate located below. The rigid spheres 6, 6, ... Collide with the surface of the cylindrical substrate and then drop into the rigid body receiving basket 7, where the transfer tube 5
It passes through 6 and enters the hard sphere retaining space 55, and is sent to the hard sphere discharging / falling means in the same manner as described above. The surface coating liquid hits the surface of the cylindrical substrate 1 and forms a liquid film there, and the remainder falls into the rigid ball receiving basket 7, enters the container 8 through its wall hole, and the multi-perforated cap. At 81, the solid matter is separated, enters the retention tank 9, and is sent to the ejection pipes 12 and 12 in the same manner as described above. After the processing for a predetermined time, the rotary shaft 2 is moved to the left, the above-described operation is repeated to finish the surface processing of the cylindrical substrate 1, the supply of the rigid balls 6, 6, ... Is stopped, and the rotary shaft 2 is moved to the left. Then, when the cylindrical substrate 1'has reached the predetermined position as described above, the discharging and dropping of the hard spheres 6, 6, ... Are started. After that, the same processing as described above is performed. Thus, the surface processing of the two cylindrical substrates is continuously performed.
操作中、表面被覆液を清澄に維持するために、滞溜タン
ク9で該液をデカンテーションし、沈澱物をバルブ1
0′を開いて排出管10から取り除く。表面被覆液を所
定濃度に保ち、且つその系中に存在する量を所定量にす
るについて、新たな表面被覆液が供給管91を介して滞
溜タンク9に供給される。剛体球については、それらが
摩耗したり疲労したりした場合、取出口54を介してそ
れらを取り除き、新たな剛体球を供給管53から系内に
導入する。During operation, in order to keep the surface coating solution clear, the solution is decanted in the retention tank 9 and the precipitate is removed from the valve 1
Open 0'and remove from drain 10. A new surface coating liquid is supplied to the retention tank 9 via the supply pipe 91 in order to keep the surface coating liquid at a predetermined concentration and set the amount existing in the system to a predetermined amount. As for hard spheres, when they become worn or fatigued, they are removed through the outlet 54 and new hard spheres are introduced into the system from the supply pipe 53.
以上のように操作することにより、円筒形基体表面への
痕跡窪みの形成は、基体表面が表面被覆液の薄液膜で完
全に覆われた状態で行われる。By operating as described above, the formation of the trace depressions on the surface of the cylindrical substrate is performed in a state where the substrate surface is completely covered with the thin liquid film of the surface coating liquid.
本発明の装置による上述の操作は、常温、常圧の条件下
で行うことができるが、剛体球の基体表面への衝突を強
くすることを所望する場合には、真空条件下で行うのが
好ましい。The above-mentioned operation by the apparatus of the present invention can be carried out under the conditions of room temperature and atmospheric pressure, but if it is desired to strengthen the collision of the hard sphere with the surface of the substrate, it should be carried out under vacuum conditions. preferable.
本発明の装置を操作して得られる基体は、その表面にそ
れを万遍なく覆って形成される薄固化膜を有し、該表面
が、平面部分が残されることなく万遍なく球状痕跡窪み
が形成されてなるものである。The substrate obtained by operating the apparatus of the present invention has a thinned film formed on its surface so as to cover it evenly, and the surface has a spherical trace indentation without leaving a flat portion. Are formed.
そしてこの基体は、系外に搬出して使用に供するまでそ
のまゝ保存しても、その表面は固化膜により外気から完
全に遮断されていることから、該基体がアルミ合金系の
材質のものであってもその表面に酸化膜が形成される等
の問題の生ずる機会は全くない。Even if this substrate is carried out of the system and stored as it is until it is used, since its surface is completely shielded from the outside air by the solidified film, the substrate is made of an aluminum alloy material. However, there is no chance of causing a problem such as the formation of an oxide film on the surface.
上述の本発明の装置によれば、処理済み基体を搬出後、
新たな円筒基体を系内に搬入し、該基体について上述の
操作を引き続いて繰返し行えるので、所望の表面加工の
施された基体を連続して製造することができる。According to the apparatus of the present invention described above, after carrying out the treated substrate,
Since a new cylindrical substrate is loaded into the system and the above-mentioned operation can be repeated for the substrate, a substrate having a desired surface treatment can be continuously produced.
上述の操作で表面加工して得られた基体は、その使用に
際してはいずれにしろ溶媒洗浄処理にかけて固化膜を溶
離し、表面を絶体クリーンの状態に乾燥した後、成膜
(光受容層形成)装置(図示せず)に搬入されるとこ
ろ、本発明の装置によれば、前記溶媒洗浄処理を行うこ
ともできる。In any case, the substrate obtained by the surface treatment by the above-mentioned operation is subjected to a solvent washing treatment to elute the solidified film, and after the surface is dried to an absolutely clean state, a film is formed (photoreceptive layer formation). ) When it is loaded into an apparatus (not shown), the apparatus of the present invention can also perform the solvent washing treatment.
その場合、表面加工処理後、表面被覆液を除いて系内を
クリーン状態にした後、滞溜タンク9を、図示しない洗
浄液(例えばトリクロロエタン)タンクに切り換え、洗
浄液を噴出管12、12に送って噴射孔12′、1
2′、…から下方噴射させ、同時に回転軸2を回転させ
て基体1、1′の表面の固化膜を溶離し、しかる後洗浄
を止めて基体表面を乾燥せしめる。In that case, after the surface treatment, after removing the surface coating liquid to bring the system into a clean state, the retention tank 9 is switched to a cleaning liquid (for example, trichloroethane) tank (not shown), and the cleaning liquid is sent to the ejection pipes 12 and 12. Injection holes 12 ', 1
.. are jetted downward from 2 ', ..., At the same time, the rotating shaft 2 is rotated to elute the solidified film on the surfaces of the substrates 1, 1', and thereafter, washing is stopped and the substrate surfaces are dried.
以上説明の本発明の装置により表面加工して得られる基
体は、所望の球状痕跡窪みが表面に平面部を残すことな
く形成されていて、その表面全体が固化膜に覆われて外
気から遮断されて維持されており、洗液に例えばトリク
ロロエタン等の溶剤を使用して洗浄すると、固化膜の溶
離が極めて効率的に進行し、表面の乾燥が全く乾燥ムラ
を残すことなく極めて効率的に行え、絶体クリーンの表
面状態のものとなり、光導電部材用基体として至適なも
のとなる。The substrate obtained by surface processing with the apparatus of the present invention described above has desired spherical trace dents formed without leaving a flat surface on the surface, and the entire surface is covered with a solidified film and shielded from the outside air. When the washing liquid is washed using a solvent such as trichloroethane, elution of the solidified film proceeds extremely efficiently, and the surface can be dried extremely efficiently without leaving any drying unevenness. The surface state is absolutely clean, which makes it optimal as a substrate for photoconductive members.
因みに上述のようにして得た、球状痕跡窪み形状表面の
支持体上に、グロー放電法によりa-Si(H,X)〔但し、X
はハロゲン原子を表わす。〕で構成される膜を形成し、
本発明の方法におけるような表面被覆液を使用しない方
法により得た球状痕跡窪み形状表面の支持体上に前記と
同様にして同様の膜を形成して、両者を画像露光装置を
用い波長780nm、スポット径80μmのレーザーを照射
して画像露光を行い現像、転写を行って画像を得、得ら
れた画像の干渉縞の発生状況を観察したところ、前者の
ものが顕著に優れていることがわかった。By the way, a-Si (H, X) [provided that X
Represents a halogen atom. ] To form a film,
The same film was formed on the support of the spherical trace dent shape surface obtained by the method not using the surface coating liquid in the method of the present invention in the same manner as above, and both wavelengths were 780 nm using an image exposure device, An image was obtained by irradiating an image with a laser having a spot diameter of 80 μm, developing and transferring the image, and observing the occurrence of interference fringes in the obtained image, the former one was found to be significantly superior. It was
第1(A)乃至1(C)図は、本発明の装置により形成され
る、基体表面の凹凸形状を説明するための模式図であ
る。第2図は、本発明の装置全体の断面略図であり、第
3図は、第2図に図示の装置の剛体球放出・落下手段の
説明図である。 図において、1、1′……基体、2……回転軸、 3……固定手段、4……剛体球放出・落下手段 5……剛体球移送塔、6、6……剛体球、 7……剛体球受け手段、8……表面被覆液受け手段、9
……滞溜タンク、12……噴出管FIGS. 1 (A) to 1 (C) are schematic views for explaining the uneven shape of the substrate surface formed by the apparatus of the present invention. FIG. 2 is a schematic cross-sectional view of the entire apparatus of the present invention, and FIG. 3 is an explanatory view of the hard sphere discharging / falling means of the apparatus shown in FIG. In the figure, 1, 1 '... Substrate, 2 ... Rotating shaft, 3 ... Fixing means, 4 ... Rigid sphere discharging / falling means, 5 ... Rigid sphere transfer tower, 6, 6 ... Rigid sphere, 7 ... ... Hard sphere receiving means, 8 ... Surface coating liquid receiving means, 9
…… Stagnant tank, 12 …… Spout pipe
───────────────────────────────────────────────────── フロントページの続き (72)発明者 村井 啓一 東京都大田区下丸子3丁目30番2号 キヤ ノン株式会社内 (56)参考文献 特開 昭62−36676(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Keiichi Murai, 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc. (56) References JP-A-62-36676 (JP, A)
Claims (1)
る剛体球放出・落下手段を上部に有し、その下部位置に
表面被覆液供給手段を有し、該供給手段の下部位置に左
右に可動な基体保持回転軸を有し、その下部位置に、多
穿孔部材で形成された剛球体受け手段と表面被覆液受け
手段とを有してなることを特徴とする光導電部材用基体
の製造装置。1. A hard sphere discharging / falling means having a sphere discharging blade provided upright on a rotating disk, having a surface coating liquid supplying means at a lower position thereof, and having a surface coating liquid supplying means at a lower position thereof. A base for a photoconductive member, which has a base-holding rotary shaft that is movable to the left and right, and has a hard sphere receiving means and a surface coating liquid receiving means formed of multi-perforated members at its lower position. Manufacturing equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25166385A JPH0656497B2 (en) | 1985-11-08 | 1985-11-08 | Manufacturing equipment for substrate for photoconductive member |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25166385A JPH0656497B2 (en) | 1985-11-08 | 1985-11-08 | Manufacturing equipment for substrate for photoconductive member |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62111260A JPS62111260A (en) | 1987-05-22 |
| JPH0656497B2 true JPH0656497B2 (en) | 1994-07-27 |
Family
ID=17226167
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25166385A Expired - Fee Related JPH0656497B2 (en) | 1985-11-08 | 1985-11-08 | Manufacturing equipment for substrate for photoconductive member |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0656497B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011086333A2 (en) | 2010-01-13 | 2011-07-21 | Kerneos | Thermal insulation material and method for manufacturing same |
| US11142480B2 (en) | 2013-04-24 | 2021-10-12 | The Intellectual Gorilla Gmbh | Lightweight thermal insulating cement-based materials |
| US11155499B2 (en) | 2014-02-04 | 2021-10-26 | The Intellectual Gorilla Gmbh | Lightweight thermal insulating cement based materials |
-
1985
- 1985-11-08 JP JP25166385A patent/JPH0656497B2/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011086333A2 (en) | 2010-01-13 | 2011-07-21 | Kerneos | Thermal insulation material and method for manufacturing same |
| EP3792231A1 (en) | 2010-01-13 | 2021-03-17 | Kerneos | Material for thermal insulation and method for manufacturing same |
| US11142480B2 (en) | 2013-04-24 | 2021-10-12 | The Intellectual Gorilla Gmbh | Lightweight thermal insulating cement-based materials |
| US11155499B2 (en) | 2014-02-04 | 2021-10-26 | The Intellectual Gorilla Gmbh | Lightweight thermal insulating cement based materials |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62111260A (en) | 1987-05-22 |
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