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JPH0658610B2 - Temperature control method for distribution device - Google Patents
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JPH0658610B2 - Temperature control method for distribution device - Google Patents

Temperature control method for distribution device

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Publication number
JPH0658610B2
JPH0658610B2 JP61040884A JP4088486A JPH0658610B2 JP H0658610 B2 JPH0658610 B2 JP H0658610B2 JP 61040884 A JP61040884 A JP 61040884A JP 4088486 A JP4088486 A JP 4088486A JP H0658610 B2 JPH0658610 B2 JP H0658610B2
Authority
JP
Japan
Prior art keywords
temperature
target temperature
heating means
fluid
target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61040884A
Other languages
Japanese (ja)
Other versions
JPS62197808A (en
Inventor
省二 児玉
信博 恩田
正之 安部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chiyoda Corp
Original Assignee
Chiyoda Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chiyoda Corp filed Critical Chiyoda Corp
Priority to JP61040884A priority Critical patent/JPH0658610B2/en
Publication of JPS62197808A publication Critical patent/JPS62197808A/en
Publication of JPH0658610B2 publication Critical patent/JPH0658610B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Control Of Temperature (AREA)

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は、発熱反応または吸熱反応を伴う流通装置のた
めの温度制御方法に関する。
TECHNICAL FIELD The present invention relates to a temperature control method for a flow apparatus involving an exothermic reaction or an endothermic reaction.

〈従来の技術〉 種々の化学プラントに於て、吸熱反応または発熱反応を
伴う流通式触媒層、反応炉等からなる流通装置を用いる
場合があるが、その温度制御が困難であるという問題が
あった。例えば、第1図に示されているように、触媒リ
アクタ1内に触媒を充填してなる触媒層2が設けられ、
電熱式その他の加熱手段4、5が前記触媒リアクタ1を
囲繞するように配設されるのが一般的であるが、矢印1
〜12により図示されているように、熱伝達の方向が多
岐に亘り、しかも各点の温度間に相互干渉が強く作用す
るため、熱伝達を正確に予想し、触媒層2の温度を制御
することが極めて困難である。
<Prior Art> In various chemical plants, there are cases where a flow-through catalyst layer involving an endothermic reaction or an exothermic reaction, a flow-through device comprising a reaction furnace, etc. is used, but there is a problem that the temperature control is difficult. It was For example, as shown in FIG. 1, a catalyst layer 2 formed by filling a catalyst in a catalytic reactor 1 is provided,
Generally, an electric heating type heating means 4 and 5 are arranged so as to surround the catalytic reactor 1.
12 to 12, since the directions of heat transfer are various and the mutual interference strongly acts between the temperatures at each point, the heat transfer is accurately predicted and the temperature of the catalyst layer 2 is controlled. Is extremely difficult.

また、例えば、触媒層2に於ける反応が発熱反応である
場合には、第2図に示されているように、触媒層の発熱
反応が温度に依存することとなり、未反応時及び反応時
の間の温度分布に顕著な差異が存在し、これを自動的に
制御することが極めて困難であり、特に、加熱手段と触
媒層との間に熱伝達の遅れ等を原因として加熱温度が過
大となった場合には、触媒層温度が暴走し、触媒を破損
するなどのトラブルを招き得る。従って、このような触
媒リアクタの運転のためには熟練したオペレータが必要
であり、また極めて煩雑な作業となっていた。
Further, for example, when the reaction in the catalyst layer 2 is an exothermic reaction, the exothermic reaction in the catalyst layer depends on the temperature as shown in FIG. There is a significant difference in the temperature distribution of the catalyst, and it is extremely difficult to control this automatically.In particular, the heating temperature becomes excessive due to the delay of heat transfer between the heating means and the catalyst layer. In that case, the temperature of the catalyst layer may run away, causing troubles such as damage to the catalyst. Therefore, a skilled operator is required for the operation of such a catalytic reactor, and the operation is extremely complicated.

〈発明が解決しようとする問題点〉 このような従来技術の欠点に鑑み、本発明の主な目的
は、自動化が困難であった流通装置の温度制御を正確か
つ自動的に行ない得る流通装置のための温度制御方法を
提供することにある。
<Problems to be Solved by the Invention> In view of the above-mentioned drawbacks of the conventional technology, a main object of the present invention is to provide a distribution apparatus capable of accurately and automatically controlling the temperature of the distribution apparatus, which has been difficult to automate. Temperature control method.

〈問題点を解決するための手段〉 このような目的は、本発明によれば、流体を流通させる
流通装置内に於ける流体の流れ方向に沿って配設された
複数の加熱手段と、該複数の加熱手段の各々に付設され
たヒータ温度検出手段と、前記流通装置内に於ける前記
複数の加熱手段の各々に対応する位置に配設された流体
温度検出手段と、前記ヒータ温度検出手段の検出値を第
一の目標温度に一致させるように前記加熱手段を駆動す
る駆動手段と、前記流体温度検出手段の検出値を第二の
目標温度に一致させるように前記第一の目標温度を制御
するための目標温度設定手段とを備える流通装置のため
の温度制御方法であって、前記第二の目標温度を最終目
標温度よりも所定値だけ低い昇温目標温度と定め、かつ
前記流体温度検出手段の検出値が該温度に達するレベル
に前記第一の目標温度を定めたうえで前記複数の加熱手
段を同時に駆動する急速昇温過程と、前記第二の目標温
度を前記昇温目標温度よりも所定値だけ高い過渡的目標
温度と定め、かつ前記流体温度検出手段の検出値が該温
度に達するレベルに前記第一の目標温度を更新したうえ
で前記複数の加熱手段を順次個別に駆動すると共に、前
記流体温度検出手段の検出値が前記最終目標温度に達す
るまで前記過渡的目標温度を徐々に増大させる微調整過
程とを有することを特徴とする流通装置のための温度制
御方法を提供することによって達成される。
<Means for Solving the Problems> According to the present invention, such an object is to provide a plurality of heating means arranged along the flow direction of the fluid in the circulation device for circulating the fluid, A heater temperature detecting means attached to each of the plurality of heating means, a fluid temperature detecting means arranged at a position corresponding to each of the plurality of heating means in the circulation device, and the heater temperature detecting means. The driving means for driving the heating means so as to match the detected value of the first target temperature with the first target temperature, and the first target temperature so as to match the detected value of the fluid temperature detection means with the second target temperature. A temperature control method for a flow device comprising a target temperature setting means for controlling, wherein the second target temperature is set as a temperature raising target temperature lower by a predetermined value than the final target temperature, and the fluid temperature The value detected by the detection means is the temperature A rapid temperature rising process of simultaneously driving the plurality of heating means after the first target temperature is set to a level that reaches the level, and the second target temperature is transiently higher than the temperature rising target temperature by a predetermined value. The target temperature is set, and the first target temperature is updated to a level at which the detection value of the fluid temperature detecting means reaches the temperature, and then the plurality of heating means are sequentially driven individually, and the fluid temperature detecting means is provided. And a fine adjustment process of gradually increasing the transient target temperature until the detected value of 1 reaches the final target temperature.

〈作用〉 このように、流通装置を流体の流れ方向に沿って複数の
区間に区分し、個々の区間をカスケード制御することに
より正確な温度制御が可能となり、特に加熱過程を急速
昇温過程と微調整過程とに区分することにより、迅速な
立ち上げと、精密な制御が可能となり、更に定常運転に
際しては、微調整モードを継続することにより、外乱が
あった場合でも精密な制御を継続して行なうことが可能
となる。
<Operation> As described above, the flow device is divided into a plurality of sections along the flow direction of the fluid, and the individual sections are cascade-controlled to enable accurate temperature control. By dividing into the fine adjustment process, quick start-up and precise control are possible.Furthermore, during steady operation, by continuing the fine adjustment mode, precise control is continued even if there is a disturbance. It becomes possible to do it.

〈実施例〉 以下、本発明の好適実施例を添付の図面について詳しく
説明する。
<Embodiment> Hereinafter, a preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings.

第3図は本発明に基づく、流通装置としての触媒層のた
めの温度制御装置の構成を図式的に示している。触媒リ
アクタ1は、管路7内に或る長さに亘って触媒を充填し
てなる触媒層2を設けてなるもので、図示されている矢
印20の向きに流体からなる反応物質が流通する。この
触媒リアクタ1の長さ方向に沿って4つの、例えば電熱
要素からなる加熱手段3〜6が配設されている。
FIG. 3 diagrammatically shows the construction of a temperature control device for a catalyst layer as a flow device according to the invention. The catalytic reactor 1 is provided with a catalyst layer 2 in which a catalyst is filled in a pipe line 7 over a certain length, and a reactant made of a fluid flows in a direction of an arrow 20 shown in the drawing. . Four heating means 3 to 6 composed of, for example, electric heating elements are arranged along the length of the catalytic reactor 1.

各加熱手段3〜6には、これらの加熱手段を制御するた
めの温度センサ9a〜9dがそれぞれ設けられている。
加熱手段3〜6に設けられた温度センサ9a〜9dは、
PID調節計などからなる4つの温度調節計10a〜1
0dにそれぞれ各加熱手段3〜6の実温度信号を供給
し、これら温度調節計が駆動装置11a〜11dを介し
て対応する加熱手段3〜6をフィードバック制御により
加熱する。
Each heating means 3-6 is provided with a temperature sensor 9a-9d for controlling these heating means, respectively.
The temperature sensors 9a to 9d provided in the heating means 3 to 6 are
Four temperature controllers 10a to 1 including PID controllers
0d is supplied with the actual temperature signals of the heating means 3 to 6, respectively, and these temperature controllers heat the corresponding heating means 3 to 6 through the driving devices 11a to 11d by feedback control.

一方触媒層2の内部にも、各加熱手段3〜6に対応する
位置に、長さ方向に沿って4つの温度センサ8a〜8d
が配設されている。これら温度センサ8a〜8dは、触
媒リアクタ1内に長手方向に沿って設置された多数の熱
電対から適宜選択されたものであって良い。温度センサ
8a〜8dにより得られた流体の実温度信号は、マイク
ロプロセッサを内蔵するコントローラ12に供給され、
このコントローラ12は、前記した温度調節計10a〜
10dの設定温度をそれぞれ制御する。
On the other hand, inside the catalyst layer 2, four temperature sensors 8a to 8d are provided along the length direction at positions corresponding to the heating means 3 to 6, respectively.
Is provided. These temperature sensors 8a to 8d may be appropriately selected from a large number of thermocouples installed in the catalytic reactor 1 along the longitudinal direction. The actual temperature signals of the fluid obtained by the temperature sensors 8a to 8d are supplied to the controller 12 having a built-in microprocessor,
This controller 12 is the temperature controller 10a-
The set temperature of 10d is controlled respectively.

次に、特に第5図に基づいて、本発明に基づく装置の作
動要領について説明する。
The operating principle of the device according to the invention will now be described with particular reference to FIG.

先ず、触媒リアクタの立ち上げに際しては、触媒リアク
タの最終目標温度が例えば400℃である場合に、触媒
層2の内部の温度がこれよりも10度低い390℃に達
するようなレベルに定めた昇温目標温度を温度調節計1
0a〜10dから出力し、すべての加熱手段3〜6につ
いて公知のカスケード制御を同時に行なう。触媒層2内
の各点が温度が390℃に達したなら、次に触媒層全域
の目標温度を最終目標温度より8℃低い、つまり昇温目
標温度より2℃高い過渡的目標温度に達するレベルに定
め、しかも流体の流れ方向に従い上流側から下流側に向
けて各温度調節計10a〜10dの設定目標温度を順次
変更する。これは、コントローラ12に内蔵されたマイ
クロプロセッサを用いて各温度調節計10a〜10dの
目標温度を制御することにより達成される。
First, when the catalytic reactor is started up, if the final target temperature of the catalytic reactor is, for example, 400 ° C., the temperature inside the catalyst layer 2 is set to a level that is 10 ° C. lower than 390 ° C. Temperature target temperature to the temperature controller 1
Output from 0a to 10d, and known cascade control is simultaneously performed for all the heating means 3 to 6. When the temperature of each point in the catalyst layer 2 reaches 390 ° C., the target temperature of the entire catalyst layer is 8 ° C. lower than the final target temperature, that is, the transitional target temperature 2 ° C. higher than the temperature raising target temperature. In addition, the set target temperatures of the temperature controllers 10a to 10d are sequentially changed from the upstream side to the downstream side according to the flow direction of the fluid. This is achieved by controlling the target temperature of each of the temperature controllers 10a-10d using the microprocessor built in the controller 12.

即ち、急速昇温モードにより触媒層全体の温度が390
℃を越えた時点、即ち点Aから、最上流側の温度調節計
10aの設定温度のみを更新制御することにより、同ゾ
ーンの、触媒層2内の温度センサ8aの指示が392℃
を越えるまで加熱手段3を制御し、点Bに至る。次にこ
れの一つ下流側のゾーンの加熱手段4を制御することに
より点Cから点Dに至り、温度センサ8bに於ける検出
温度が392℃に達するようにする。このようにして点
E、点F、点G、点Hに示されるように、各ゾーンに対
応する加熱手段毎に同様の制御を行ない、4番目のつま
り最下流側の加熱手段6の制御が完了した時点で、触媒
層2に於ける目標温度値を更に4℃高い396℃に高め
同様の制御を各加熱手段3〜6について順次行なう。
That is, the temperature of the entire catalyst layer is 390
When the temperature exceeds 8 ° C., that is, from point A, the temperature sensor 8a in the catalyst layer 2 in the same zone indicates 392 ° C. by updating and controlling only the set temperature of the temperature controller 10a on the most upstream side.
The heating means 3 is controlled until the temperature exceeds the point, and the point B is reached. Then, by controlling the heating means 4 in the zone on the one downstream side, the point C is reached to the point D so that the temperature detected by the temperature sensor 8b reaches 392 ° C. In this way, as indicated by points E, F, G, and H, similar control is performed for each heating means corresponding to each zone, and the fourth, that is, the most downstream heating means 6 is controlled. At the time of completion, the target temperature value in the catalyst layer 2 is further raised by 4 ° C. to 396 ° C., and similar control is sequentially performed for each heating means 3-6.

さて、触媒層2内の温度をゾーン毎の4点にて測定し、
そのうちの1点のみを目標温度に制御した場合には、他
の3点もその影響を受け変動することとなり、触媒層2
の各部分が複雑に干渉し合うため安定な制御が困難であ
る。そこで、本発明によれば、4つの加熱手段を流体の
流れ方向に沿って順次個別に制御し、触媒層全域を、個
々の部分毎に僅かずつ平衡状態に制御することにより、
全体的な制御動作の安定化を図るようにしたものであ
る。本実施例の場合、コントローラ12は、マイクロプ
ロセッサを内蔵し、各温度調節計10a〜10dの目標
温度を制御するコントローラと、加熱手段毎の制御をシ
ーケンス的に行うプログラムコントローラとを兼備した
ものからなっている。
Now, the temperature in the catalyst layer 2 is measured at four points in each zone,
When only one of the three points is controlled to the target temperature, the other three points will also be affected and fluctuate.
It is difficult to perform stable control because the respective parts of the above interfere with each other in a complicated manner. Therefore, according to the present invention, the four heating means are sequentially and individually controlled along the flow direction of the fluid, and the entire catalyst layer is controlled to be in an equilibrium state little by little for each individual portion.
This is intended to stabilize the overall control operation. In the case of the present embodiment, the controller 12 has a built-in microprocessor and has both a controller for controlling the target temperature of each of the temperature controllers 10a to 10d and a program controller for sequentially controlling the heating means. Has become.

このような手順を繰返し、最終的には触媒層2内の温度
センサ8a〜8dがすべて最終目標温度400℃±1℃
の範囲に収まるようにする。このようにして触媒層2の
全域が最終目標温度に達したならば、この微調整モード
を継続しつつ定常運転を行う。このようにして、触媒の
活性劣化など種々の外乱に対しても触媒リアクタを好適
に制御し続けることが可能となる。
By repeating this procedure, finally, all the temperature sensors 8a to 8d in the catalyst layer 2 have a final target temperature of 400 ° C ± 1 ° C.
Be within the range of. When the entire area of the catalyst layer 2 reaches the final target temperature in this way, steady operation is performed while continuing this fine adjustment mode. In this way, it becomes possible to continue to appropriately control the catalytic reactor against various disturbances such as catalyst activity deterioration.

〈発明の効果〉 このように、本発明によれば、コントローラ12を所定
のプログラムに従って作動させることにより、従来困難
であった触媒リアクタ等の流通装置の温度制御を安定か
つ正確にしかも自動的に行なうことができ、生産性向上
及び省力化に関して多大の効果を奏することができる。
<Effects of the Invention> As described above, according to the present invention, by operating the controller 12 according to a predetermined program, the temperature control of a flow device such as a catalytic reactor, which has been difficult in the past, can be stably, accurately and automatically performed. This can be performed, and a great effect can be achieved in terms of productivity improvement and labor saving.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明を適用し得る触媒リアクタ装置内の温度
伝達の方向を示す模式図である。 第2図は触媒による反応がある場合とない場合とに於け
る触媒リアクタ及び加熱手段内部の温度分布を示すグラ
フである。 第3図は本発明に基づく触媒層のための温度制御装置の
概要を示す図式的ブロック図である。 第4図は第3図に示された実施例の機能的な構造を示す
ブロック図である。 第5図は第3図及び第4図に示された実施例による温度
制御の過程を示す3次元グラフである。 1……触媒リアクタ、2……触媒層 3〜6……加熱手段、7……管路 8a〜8d、9a〜9d……温度センサ 10a〜10d……温度調節計 11a〜11d……駆動装置 12……コントローラ、20……矢印
FIG. 1 is a schematic diagram showing directions of temperature transmission in a catalytic reactor device to which the present invention can be applied. FIG. 2 is a graph showing the temperature distribution inside the catalytic reactor and the heating means with and without the reaction by the catalyst. FIG. 3 is a schematic block diagram showing an outline of a temperature control device for a catalyst layer according to the present invention. FIG. 4 is a block diagram showing the functional structure of the embodiment shown in FIG. FIG. 5 is a three-dimensional graph showing the process of temperature control according to the embodiment shown in FIGS. 3 and 4. DESCRIPTION OF SYMBOLS 1 ... Catalyst reactor, 2 ... Catalyst layer 3-6 ... Heating means, 7 ... Pipe lines 8a-8d, 9a-9d ... Temperature sensor 10a-10d ... Temperature controller 11a-11d ... Driving device 12 ... Controller, 20 ... Arrow

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭59−98221(JP,A) 特開 昭61−9275(JP,A) 特開 昭61−156316(JP,A) 実開 昭55−3862(JP,U) 特公 昭49−29403(JP,B1) ─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP 59-98221 (JP, A) JP 61-9275 (JP, A) JP 61-156316 (JP, A) Actual development 55- 3862 (JP, U) Japanese Patent Sho 49-29403 (JP, B1)

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】流体を流通させる流通装置内に於ける流体
の流れ方向に沿って配設された複数の加熱手段と、該複
数の加熱手段の各々に付設されたヒータ温度検出手段
と、前記流通装置内に於ける前記複数の加熱手段の各々
に対応する位置に配設された流体温度検出手段と、前記
ヒータ温度検出手段の検出値を第一の目標温度に一致さ
せるように前記加熱手段を駆動する駆動手段と、前記流
体温度検出手段の検出値を第二の目標温度に一致させる
ように前記第一の目標温度を制御するための目標温度設
定手段とを備える流通装置のための温度制御方法であっ
て、 前記第二の目標温度を最終目標温度よりも所定値だけ低
い昇温目標温度と定め、かつ前記流体温度検出手段の検
出値が該温度に達するレベルに前記第一の目標温度を定
めたうえで前記複数の加熱手段を同時に駆動する急速昇
温過程と、 前記第二の目標温度を前記昇温目標温度よりも所定値だ
け高い過渡的目標温度と定め、かつ前記流体温度検出手
段の検出値が該温度に達するレベルに前記第一の目標温
度を更新したうえで前記複数の加熱手段を順次個別に駆
動すると共に、前記流体温度検出手段の検出値が前記最
終目標温度に達するまで前記過渡的目標温度を徐々に増
大させる微調整過程とを有することを特徴とする流通装
置のための温度制御方法。
1. A plurality of heating means arranged along a flow direction of a fluid in a circulation device for circulating a fluid, heater temperature detecting means attached to each of the plurality of heating means, and The fluid temperature detecting means arranged at a position corresponding to each of the plurality of heating means in the circulation device, and the heating means so that the detection value of the heater temperature detecting means coincides with the first target temperature. A temperature for the flow device, which includes a driving means for driving and a target temperature setting means for controlling the first target temperature so that the detection value of the fluid temperature detecting means matches the second target temperature. A control method, wherein the second target temperature is set as a temperature raising target temperature lower by a predetermined value than the final target temperature, and the first target is set to a level at which the detection value of the fluid temperature detecting means reaches the temperature. After setting the temperature, A rapid temperature raising process in which a plurality of heating means are driven simultaneously, the second target temperature is set as a transient target temperature higher than the temperature raising target temperature by a predetermined value, and the detection value of the fluid temperature detecting means is The first target temperature is updated to a level at which the temperature is reached, and then the plurality of heating means are sequentially driven individually, and the transient target temperature is reached until the detection value of the fluid temperature detection means reaches the final target temperature. And a fine adjustment process for gradually increasing the temperature.
JP61040884A 1986-02-26 1986-02-26 Temperature control method for distribution device Expired - Lifetime JPH0658610B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61040884A JPH0658610B2 (en) 1986-02-26 1986-02-26 Temperature control method for distribution device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61040884A JPH0658610B2 (en) 1986-02-26 1986-02-26 Temperature control method for distribution device

Publications (2)

Publication Number Publication Date
JPS62197808A JPS62197808A (en) 1987-09-01
JPH0658610B2 true JPH0658610B2 (en) 1994-08-03

Family

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JP61040884A Expired - Lifetime JPH0658610B2 (en) 1986-02-26 1986-02-26 Temperature control method for distribution device

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Country Link
JP (1) JPH0658610B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103759857B (en) * 2014-01-23 2016-08-17 北京鑫雅图科贸有限公司 A kind of material pipe heat tracing online monitoring system

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS553862U (en) * 1978-06-23 1980-01-11
JPS5998221A (en) * 1982-11-26 1984-06-06 Shimadzu Corp heating control device

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JPS62197808A (en) 1987-09-01

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