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JPH066266B2 - Abrasive material projection area control method - Google Patents
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JPH066266B2 - Abrasive material projection area control method - Google Patents

Abrasive material projection area control method

Info

Publication number
JPH066266B2
JPH066266B2 JP60097982A JP9798285A JPH066266B2 JP H066266 B2 JPH066266 B2 JP H066266B2 JP 60097982 A JP60097982 A JP 60097982A JP 9798285 A JP9798285 A JP 9798285A JP H066266 B2 JPH066266 B2 JP H066266B2
Authority
JP
Japan
Prior art keywords
cleaning material
projection
polishing
strip
abrasive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP60097982A
Other languages
Japanese (ja)
Other versions
JPS61257774A (en
Inventor
省夫 下里
庸夫 江川
孝 山根
忠典 宮本
博康 湯浅
七三雄 菅沼
功治 玉田
訓郎 太田
等 六反田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Mitsubishi Heavy Industries Ltd
Shinto Industrial Co Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Shinto Kogyo KK
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd, Shinto Kogyo KK, Kawasaki Steel Corp filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP60097982A priority Critical patent/JPH066266B2/en
Publication of JPS61257774A publication Critical patent/JPS61257774A/en
Publication of JPH066266B2 publication Critical patent/JPH066266B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】 <産業上の利用分野> 本発明は、研掃材を効率良くワークに投射するための投
射領域を制御する方法に関し、特に板幅が複数種あるよ
うな熱間圧延鋼板に対するスケール除去に際して好適で
ある。
Description: TECHNICAL FIELD The present invention relates to a method for controlling a projection area for efficiently projecting a polishing / cleaning material onto a workpiece, and particularly to hot rolling in which a plurality of strip widths are provided. It is suitable for removing scale from steel sheets.

<従来の技術> 熱間圧延機により生産された鋼板の表面にはスケールが
発生し、その後の冷間圧延により平滑な鋼板表面を得る
ためにはこのスケールを除去する必要がある。従来の熱
延鋼板の脱スケール法は、圧延後の熱延鋼板を連続的に
酸洗槽に導入し、該酸洗槽を通過させて酸液により延鋼
板のスケールを溶解除去するようにしている。
<Prior Art> Scale is generated on the surface of a steel sheet produced by a hot rolling mill, and it is necessary to remove this scale in order to obtain a smooth steel sheet surface by subsequent cold rolling. The conventional hot-rolled steel sheet descaling method is to continuously introduce the rolled hot-rolled steel sheet into the pickling tank, and to pass through the pickling tank to dissolve and remove the scale of the rolled steel sheet with the acid solution. There is.

近年、熱間圧延工程の高速化及び酸洗工程と冷間圧延工
程との連続化に伴い、上述の連続酸洗法も種々検討され
ているが、このような酸洗法では酸洗速度を高めると必
然的に設備が大型化し、廃酸処理による公害を避けるた
めに更に高価な廃酸処理設備も必要となる。
In recent years, along with the speeding up of the hot rolling process and the continuation of the pickling process and the cold rolling process, various continuous pickling methods described above have been investigated. If it is increased, the equipment inevitably becomes large in size, and more expensive waste acid treatment equipment is also necessary in order to avoid pollution by waste acid treatment.

そこで、特願昭55−79088号公報等に開示されて
いるように、研掃材を熱延鋼板に投射してスケールの除
去を機械的に行う方法が考え出されている。この原理を
表す第4図に示すように、帯板1を挾んで少なくとも一
組(図示例では二組)の研掃材投射装置2,3を対向さ
せ、これら研掃材投射装置2,3から0.3ミリメート
ル以下の粒径の研掃材4を帯板1の表面に向けて高速で
投射し、帯板1に対する研掃材の衝突時の衝突により帯
板1の表面に付着しているスケールを剥離させるように
している。
Therefore, as disclosed in Japanese Patent Application No. 55-79088 and the like, a method of projecting a blasting material on a hot rolled steel sheet to mechanically remove the scale has been devised. As shown in FIG. 4 showing this principle, at least one set (two sets in the illustrated example) of the abrasive cleaning material projecting devices 2 and 3 are opposed to each other with the strip plate 1 interposed therebetween, and these abrasive cleaning material projecting devices 2 and 3 are arranged. From a particle diameter of 0.3 mm or less to the surface of the strip 1 at a high speed, and when the abrasive 1 collides with the strip 1, it adheres to the surface of the strip 1. The scale is peeled off.

このような機械的方法によると、無公害で効率の高い脱
スケールが可能となるが、上述した従来のものでは帯板
1の板幅に関係なく研掃材4の投射幅が常に一定のた
め、板幅が狭い帯板1に対しては研掃材4が無駄に使わ
れて研掃効率が低下する上、この無駄に投射される研掃
材4が図示しないキヤビネツトに多量に衝突するため、
キヤビネツトの早期摩耗を招来する。
According to such a mechanical method, it is possible to perform descaling with high efficiency without pollution. However, in the above-mentioned conventional method, the projection width of the cleaning material 4 is always constant regardless of the width of the strip 1. For the strip 1 having a narrow plate width, the polishing / cleaning material 4 is wastefully used to reduce the polishing / cleaning efficiency, and a large amount of the polishing / cleaning material 4 projected in vain collides with a cabinet (not shown). ,
This causes early wear of the cabinet.

そこで、第5図に示すように研掃材4を一定の拡がりで
投射する遠心式の研掃材投射装置5,6を帯板1の板幅
方向に複数配置し、帯板1の板幅に応じて研掃材投射装
置5,6を帯板1に対して接近離反移動させるようにし
たものが発表されている。
Therefore, as shown in FIG. 5, a plurality of centrifugal type cleaning / blasting material projecting devices 5, 6 for projecting the cleaning / cleaning material 4 with a constant spread are arranged in the plate width direction of the strip 1 to obtain the strip width of the strip 1. In accordance with the above, there has been announced that the abrasive cleaning material projection devices 5 and 6 are moved toward and away from the strip plate 1.

<発明が解決しようとする問題点> 帯板に対して研掃材投射装置全体が移動して研掃領域を
変えるようにした従来のものでは、研掃材投射装置の移
動機構が大型で複雑なため、設備コストが上昇する欠点
を有している。しかも、研掃材投射装置の移動機構に研
掃材が混入する可能性が高く、頻繁な故障を誘発する欠
点があつた。
<Problems to be Solved by the Invention> In the conventional one in which the entire polishing / cleaning material projection device is moved relative to the strip to change the polishing / cleaning area, the moving mechanism of the polishing / cleaning material projection device is large and complicated. Therefore, it has a drawback that the equipment cost increases. In addition, there is a high possibility that the abrasive cleaning material will be mixed in the moving mechanism of the abrasive cleaning material projection device, and there is a drawback that frequent failures are induced.

本発明はかかる知見に基づき、非常に簡単な手法で研掃
材の研掃領域を変えることの可能な方法を提供すること
を目的とする。
An object of the present invention is to provide a method capable of changing the scouring area of the scouring material by a very simple method based on such knowledge.

<問題点を解決するための手段> 本発明による研掃材投射領域制御方法は、研掃材を一定
の拡がりで投射する研掃材投射装置を複数台組合わせ、
ワークの大きさに応じてそれぞれ前記研掃材投射装置に
よる前記研掃材の投射方向を変えるようにしたことを特
徴とするものである。
<Means for Solving Problems> A method for controlling a projection / cleaning material projection region according to the present invention is a combination of a plurality of polishing / cleaning material projection devices for projecting the cleaning / cleaning material with a constant spread,
The projection direction of the abrasive cleaning material by the abrasive cleaning material projecting device is changed according to the size of the work.

<作用> 各研掃材投射装置による研掃材の投射方向を変えてその
投射領域の重複量を多く設定したり、或いは少なく設定
したりすることで全体的な投射領域が変化する。例えば
ワークが小さい場合には投射領域の重なりを多くし、ワ
ークが大きい場合には投射領域の重なりを小さくする。
<Operation> By changing the projection direction of the abrasive cleaning material by each abrasive cleaning material projection device and setting the overlapping amount of the projection area large or small, the entire projection area is changed. For example, when the work is small, the overlap of the projection areas is increased, and when the work is large, the overlap of the projection areas is decreased.

<実施例> 本発明を実現する研掃材投射装置の一例の構造を表す第
1図及びその作業状態を表す第2図,第3図に示すよう
に、帯板11を挾んで対向し且つこの帯板11を板幅方
向に配列する研掃材投射装置12は、駆動回転する回転
軸13と一体のデイストリビュータ14と、このデイス
トリビュータ14を囲むように配設される筒状のコント
ロールケージ15と、回転軸13と一体回転する投射円
板16とからなる。この投射円板16にはコントロール
ケージ15を囲むようにインペラ17が放射状に固設さ
れており、コントロールケージ15には研掃材18のスリ
ツト状をなす吐出口19が形成されている。コントロール
ケージ15は通常固定状態にあるが、必要に応じて回動
できるようになつており、吐出口19の向きを任意に変
えることが可能である。
<Example> As shown in FIG. 1 showing the structure of an example of the abrasive cleaning material projection apparatus for realizing the present invention, and FIG. 2 and FIG. 3 showing the working state thereof, the strip plate 11 is sandwiched and opposed to each other. The abrasive cleaning material projecting device 12 in which the strips 11 are arranged in the plate width direction has a distributor 14 integrated with a rotating shaft 13 that is driven and rotated, and a cylindrical member disposed so as to surround the distributor 14. It is composed of a control cage 15 and a projection disc 16 which rotates integrally with the rotary shaft 13. An impeller 17 is radially fixed to the projection disk 16 so as to surround the control cage 15, and a slit-like discharge port 19 for a polishing and cleaning material 18 is formed in the control cage 15. Although the control cage 15 is normally in a fixed state, it can be rotated as needed, and the direction of the discharge port 19 can be arbitrarily changed.

従って、デイストリビュータ14の開口部20からコン
トロールケージ15内に送られた研掃材18は、吐出口
19から投射円板16に送り出され、この投射円板16の
回転に伴う遠心力で加速されて帯板11へ投射される。
Therefore, the polishing agent 18 sent from the opening 20 of the distributor 14 into the control cage 15 is sent out from the discharge port 19 to the projection disk 16, and is accelerated by the centrifugal force accompanying the rotation of the projection disk 16. It is projected onto the strip plate 11.

ここで、帯板11の板幅が長い場合には研掃材18の投
射方向が下向きとなるようにコントロールケージ15の
吐出口19の位置を修正し(第2図参照)、各研掃材投
射装置12による研掃材18の投射領域の重複量が少なく
なるように設定し、帯板11全体に研掃材18が投射さ
れるようにする。
Here, when the plate width of the strip 11 is long, the position of the discharge port 19 of the control cage 15 is corrected so that the projection direction of the polishing / cleaning material 18 is downward (see FIG. 2). The overlapping amount of the projection area of the polishing / cleaning material 18 by the projection device 12 is set to be small so that the polishing / cleaning material 18 is projected onto the entire strip 11.

一方、逆に帯板11の板幅が短かい場合には、研掃材1
8の投射方向が帯板11に対して斜めとなるようにコン
トロールケージ15の吐出口19の位置を修正し(第3
図参照)、各研掃材投射装置12による研掃材18の投
射領域の重複量が多くなるように設定し、帯板11以外
の部分に研掃材18が投射されないようにする。
On the other hand, on the contrary, when the strip plate 11 has a short strip width, the cleaning material 1
The position of the discharge port 19 of the control cage 15 is corrected so that the projection direction of 8 is oblique to the strip plate 11 (3rd
(See the drawing), the overlapping amount of the projection area of the polishing / cleaning material 18 by each polishing / cleaning material projecting device 12 is set to be large so that the polishing / cleaning material 18 is not projected onto a portion other than the strip plate 11.

なお、研掃材投射装置の構造は本実施例以外のものでも
何ら問題なく、要するに研掃材の投射方向を変えること
が可能でありさえすれば良い。
It should be noted that the structure of the abrasive cleaning material projection device may be other than that of this embodiment without any problem, and in short, it is sufficient that the projection direction of the abrasive cleaning material can be changed.

<発明の効果> 本発明によると、ワークの大きさに応じて複数の研掃材
投射装置による研掃材の投射方向を変えるようにしたの
で、研掃材の無駄打ちが無くなつて研掃効率を高く保持
することができ、付帯設備の研掃を行う可能性が少なく
なつて装置の信頼性が向上する。又、研掃材投射装置に
よる研掃材の投射方向を変えるだけの機構で本発明を実
現できるため、装置事態の構造が余り複雑化せず、備費
コストの上昇を最小限に抑えることが可能である。
<Effects of the Invention> According to the present invention, the projection direction of the abrasive cleaning material is changed by the plurality of abrasive cleaning material projecting devices according to the size of the work, so that the abrasive cleaning can be performed without wasting the abrasive material. The efficiency can be kept high, and the possibility of carrying out blasting of incidental equipment is reduced, and the reliability of the equipment is improved. Further, since the present invention can be realized by a mechanism that only changes the projection direction of the abrasive cleaning material by the abrasive cleaning material projection device, the structure of the device situation does not become so complicated and it is possible to minimize the increase in equipment costs. Is.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明方法を実現し得る研掃材投射装置の一例
の構造を表す断面図、第2図及び第3図はその使用状態
をそれぞれ表す作業概念図、第4図及び第5図は従来例
をそれぞれ表す作業原理図である。 又、図中の符号で11は帯板、12は研掃材投射装置、
18は研掃材である。
FIG. 1 is a cross-sectional view showing the structure of an example of a polishing / cleaning material projecting device capable of realizing the method of the present invention, and FIGS. 2 and 3 are conceptual views showing the working state thereof, FIGS. 4 and 5 respectively. [Fig. 3] is a working principle diagram showing a conventional example. In the figure, reference numeral 11 is a strip plate, 12 is an abrasive cleaning material projection device,
Reference numeral 18 is a polishing agent.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 江川 庸夫 広島県広島市西区観音新町4丁目6番22号 三菱重工業株式会社広島研究所内 (72)発明者 山根 孝 広島県広島市西区観音新町4丁目6番22号 三菱重工業株式会社広島研究所内 (72)発明者 宮本 忠典 広島県広島市西区観音新町4丁目6番22号 三菱重工業株式会社広島造船所内 (72)発明者 湯浅 博康 岡山県倉敷市水島川崎通1丁目(番地な し) (72)発明者 菅沼 七三雄 岡山県倉敷市水島川崎通1丁目(番地な し) (72)発明者 玉田 功治 愛知県豊川市穂ノ原3丁目1番地 新東工 業株式会社豊川製作所内 (72)発明者 太田 訓郎 愛知県豊川市穂ノ原3丁目1番地 新東工 業株式会社豊川製作所内 (72)発明者 六反田 等 愛知県豊川市穂ノ原3丁目1番地 新東工 業株式会社豊川製作所内 (56)参考文献 特開 昭53−13284(JP,A) ─────────────────────────────────────────────────── ─── Continued front page (72) Inventor Yoshio Egawa 4-6-22 Kannon Shinmachi, Nishi-ku, Hiroshima City, Hiroshima Prefecture Mitsubishi Heavy Industries, Ltd. Hiroshima Research Laboratory (72) Inventor Takashi Yamane 4-chome, Kannon Shinmachi, Nishi-ku, Hiroshima Prefecture 6-22 No. 22 Hiroshima Research Laboratory, Mitsubishi Heavy Industries, Ltd. (72) Inventor Tadanori Miyamoto 4-6-22 Kannon Shinmachi, Nishi-ku, Hiroshima City, Hiroshima Prefecture Mitsubishi Heavy Industries Ltd. Hiroshima Shipyard (72) Inventor Hiroyasu Yuasa Mizushima, Kurashiki City, Okayama Prefecture Kawasaki-dori 1-chome (No house number) (72) Inventor Susanuma Nanao San-shima, Kurashiki-shi, Okayama Prefecture Kawashima-dori 1-chome house (No house) (72) Inventor Koji Tamada 3-1, Honohara, Toyokawa-shi, Aichi Shintoko Toyokawa Mfg. Co., Ltd. (72) Inventor, Kunrou Ota 3-1-1 Honohara, Toyokawa City, Aichi Shinto Kogyo Co., Ltd. (72) ) Inventor Rokutanda et al. 3-1, Honohara, Toyokawa City, Aichi Prefecture, Toyokawa Works, Shinto Industry Co., Ltd. (56) Reference JP-A-53-13284 (JP, A)

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】研掃材を一定の拡がりで投射する研掃材投
射装置を複数台組合わせ、ワークの大きさに応じてそれ
ぞれ前記研掃材投射装置による前記研掃材の投射方向を
変えるようにしたことを特徴とする研掃材投射領域制御
方法。
1. A plurality of polishing / cleaning material projection devices for projecting the polishing / cleaning material with a constant spread are combined, and the projection direction of the polishing / cleaning material by the polishing / cleaning material projection device is changed according to the size of the work. A method for controlling a projection area of abrasive cleaning material, characterized in that.
JP60097982A 1985-05-10 1985-05-10 Abrasive material projection area control method Expired - Fee Related JPH066266B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60097982A JPH066266B2 (en) 1985-05-10 1985-05-10 Abrasive material projection area control method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60097982A JPH066266B2 (en) 1985-05-10 1985-05-10 Abrasive material projection area control method

Publications (2)

Publication Number Publication Date
JPS61257774A JPS61257774A (en) 1986-11-15
JPH066266B2 true JPH066266B2 (en) 1994-01-26

Family

ID=14206870

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60097982A Expired - Fee Related JPH066266B2 (en) 1985-05-10 1985-05-10 Abrasive material projection area control method

Country Status (1)

Country Link
JP (1) JPH066266B2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1495841A4 (en) * 2002-04-16 2007-05-09 Jfe Steel Corp Surface treatment facility of metal plate, method for producing metal plate and system for producing metal plate
JP4713165B2 (en) * 2005-01-19 2011-06-29 日新製鋼株式会社 Shot blasting method and apparatus
JP4770238B2 (en) * 2005-03-31 2011-09-14 Jfeスチール株式会社 Warm shot peening method for thick steel plate
US20090286456A1 (en) * 2005-12-20 2009-11-19 Masakatsu Ito Control-cage, a centrifugal shot-blasting device, and a centrifugal shot-blasting device for throwing abrasive grains
US7601226B2 (en) * 2006-09-14 2009-10-13 The Material Works, Ltd. Slurry blasting apparatus for removing scale from sheet metal
WO2014041586A1 (en) * 2012-09-14 2014-03-20 コトブキ技研工業株式会社 Apparatus for grinding particulate substance and plant for manufacturing particulate substance
DE102013217431A1 (en) 2013-09-02 2015-03-05 Blanco Gmbh + Co Kg A method of hardening a sheet material and hardened sheet metal material

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5632874B2 (en) * 1973-08-08 1981-07-30
JPS54123488U (en) * 1978-02-17 1979-08-29

Also Published As

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