JPH0665015B2 - electronic microscope - Google Patents

Description

TECHNICAL FIELD The present invention relates to an electron microscope equipped with a side-entry type sample device for inserting a sample from a direction orthogonal to the optical axis,
Particularly, the present invention relates to an electron microscope equipped with a sample processing device such as a vapor deposition device or an ion gun.

[Prior Art] Recently, for example, a vapor deposition device is incorporated in the body of an electron microscope,
An apparatus has been proposed in which a substance to be a sample is vapor-deposited on a base material arranged on the optical axis by this vapor deposition device, and a change in the growth state of crystals due to the difference in the sample is observed. In such an apparatus, the sample is required to be observed in a horizontally arranged state in order to secure a high quality image.

FIG. 2 is a schematic view of a conventional electron microscope incorporating such a vapor deposition device. In such a device, the electron beam formed on the upper pole piece 2 of the objective lens 1 as shown in FIG. The vapor deposition device 4 is arranged so as to look into the sample 3 (base material) through the passage hole 2a, and a heating current is supplied to the filament 5 in the vapor deposition device to vaporize the vaporized substance from the filament 5 and to use the vaporized particles 6 as a base. The material is vapor-deposited into a sample 3, and changes in the crystal growth state due to the difference in the sample are observed.

[Problems to be Solved by the Invention] By the way, in the conventional apparatus configured as described above, since the vaporized particles 6 are made to pass through the electron beam passage hole 2a and deposited on the sample 3, the filament 5 must be arranged close to the optical axis Z. Therefore, when a heating current is supplied to the filament 5, the electric field due to this heating current affects the irradiation electron beam and the observation field of view moves. Further, since a secondary electron detector, an X-ray detector, etc. are mounted in the sample chamber space above the objective lens 1, it is space-consuming to mount a plurality of vapor deposition devices in addition to these detectors. It is impossible, and therefore, there is a drawback in that a plurality of vapor deposition devices cannot be mounted and a different substance cannot be vapor-deposited on a sample.

The present invention has been made in view of the above points, eliminating the effect on the irradiation electron beam by the electric field generated by the heating current,
Moreover, it is an object of the present invention to provide a device capable of mounting a plurality of sample processing devices such as a vapor deposition device and an ion gun.

[Means for Solving the Problems] In order to achieve the above object, the present invention relates to upper and lower magnetic pole pieces of an objective lens, a sample holder inserted between the upper and lower magnetic pole pieces in a direction orthogonal to the optical axis, and A sample held horizontally on a sample holder and a sample processing device for irradiating the sample with vaporized particles or ion beams, and a hole for passing the vaporized particles or ion beams emitted from the sample processing device are provided. An electron microscope provided on the upper yoke of the objective lens, in which the sample processing device is arranged outside the upper magnetic pole piece so that the vaporized particles or the ion beam is irradiated through the gap between the upper magnetic pole piece of the objective lens and the sample holder. Is characterized by.

[Embodiment] An embodiment of the present invention will be described in detail below with reference to the accompanying drawings.

FIG. 1 is a schematic view showing an embodiment of the present invention, in which 10 is an objective lens, which includes an upper magnetic pole piece 11 and a lower magnetic pole piece 12, a spacer 13 formed of a non-magnetic material, and an objective lens. The lens yoke 14 and the exciting coil 15 are included. Reference numeral 16 denotes a sample stage arranged in the upper part of the objective lens, that is, on the outer circumference of the pole piece.
Is configured so that it can be finely moved in a plane orthogonal to the optical axis Z by a moving mechanism (not shown) including a combination of a push screw and a spring. Reference numeral 17 denotes a plate body formed of a non-magnetic material for mounting the sample stage 16, and the exciting coil 1
It is fixed on 5. Reference numeral 18 is a holder passage hole formed in the sample stage 16 so that its axis is substantially orthogonal to the optical axis Z, reference numeral 19 is a goniometer whose one end is rotatably attached to the holder passage hole 18, and the other end is the yoke. It penetrates the side wall of 14 and is taken out to the atmosphere. The rotation center of the goniometer 19 is formed so as to substantially coincide with the holder passage hole 18. A sample holder 20 is movably and rotatably supported at the center of the goniometer 19, and has a plate-like tip (vacuum side).
1 is detachably attached. Reference numeral 22 is a drive rod for moving the sample holder 20 in the axial direction by engaging with the tip portion of the sample holder 20. Reference numeral 14a is a hole provided in the upper yoke of the objective lens yoke 14. Reference numeral 23 is a vapor deposition apparatus having a basket type filament 24, and the vapor deposition apparatus 23 is attached to the mirror body 25 at a position outside the upper magnetic pole piece 11. The vapor deposition device 23 is arranged so that the vaporized particles 6 from the filament 24 pass through the gap between the upper magnetic pole piece 11 and the sample holder 20 through the hole 14a and reach the sample 21.
In the present embodiment, they are arranged at the intersection of the optical axis Z and the rotation center of the goniometer 19, that is, on the line of about 35 ° with respect to the horizontal direction from the sample center. 13a and 14a are spacers 13
And a passage hole for vaporized particles 6 formed in the objective lens yoke 14, and the vaporized particles 6 emitted from the filament 24.
Pass through these passage holes and are deposited on the surface of the sample 21.

In the apparatus configured as described above, when the sample 21 is set on the optical axis Z and a heating current is applied to the filament 24 in this state, the desired evaporation substance retained in the filament 24 is evaporated and the evaporation is performed. Since the particles 6 pass through the passage holes and adhere to the sample 21, it is possible to observe a change in the crystal growth state due to the difference in the samples.

Further, in the apparatus configured as described above, since the vapor deposition apparatus 23 is arranged at a position relatively distant from the optical axis Z, even if a heating current is supplied to the filament 24, an electric field due to the current is applied to the irradiation electron beam. Since there is no effect, the observation field of view does not move. Further, by disposing the vapor deposition device in this manner, a plurality of vapor deposition devices can be disposed around the optical axis Z, and thus different evaporation substances can be deposited on the sample in a superimposed manner.

Incidentally, the above-mentioned embodiment is an exemplification, and many modifications can be considered in the implementation. For example, in the above-mentioned embodiment, the vapor deposition device is arranged on the line of about 35 ° from the center of the sample with respect to the horizontal direction, but the present invention is not limited to this position, and the vaporized particles are the magnetic pole pieces on the objective lens. The sample processing device may be arranged in the peripheral portion away from the optical axis so that the sample is irradiated with the light passing through the gap between the sample holder and the sample holder.

Also, in the above-mentioned embodiment, the case where the vapor deposition device was incorporated was shown, but if an ion gun is incorporated instead of this, the sample surface can be etched, and the depth direction of the sample can be increased by repeating etching and observation. The state of can be observed sequentially. In this case, when the ion gun is operated, an electric field that affects the orbit of the electron beam is generated from the filament of the ion gun, but since the ion gun is arranged away from the optical axis of the electron beam, in this case as well, The same effect as the embodiment can be achieved.

[Effects of the Invention] As described in detail above, according to the present invention, it is possible to arrange a sample horizontally when observing the sample while irradiating the sample with evaporated particles or ions for vapor deposition or for ion etching. As a result, it is possible to observe a high-quality image, and it is possible to prevent the electric field based on the filament heating current of the vapor deposition device or ion gun from affecting the electron beam. By doing so, it is possible to prevent the situation of escaping, and it is possible to improve the operability of this type of electron microscope.

[Brief description of drawings]

FIG. 1 is a schematic configuration diagram of an embodiment of the present invention, and FIG. 2 is a diagram for explaining a conventional device. 10: objective lens, 11: pole pieces on the objective lens, 12:
Lower pole piece of objective lens, 13: spacer, 14: objective lens yoke, 15: exciting coil 15, 16: sample stage, 17: plate, 18: holder passage hole, 19: goniometer, 20: sample holder, 21: sample , 22: Drive rod:
23: vapor deposition device, 24: filament, 25: mirror body.

Claims (1)

[Claims] 1. An upper and lower magnetic pole piece of an objective lens, a sample holder inserted between the upper and lower magnetic pole pieces in a direction orthogonal to the optical axis, a sample held horizontally on the sample holder, and evaporation to the sample. A sample processing device for irradiating a particle or an ion beam is provided, and a hole for passing evaporated particles or an ion beam emitted from the sample processing device is provided in an upper yoke of an objective lens. An electron microscope, wherein the sample processing device is arranged outside the upper magnetic pole piece so as to irradiate through the gap between the upper magnetic pole piece of the objective lens and the sample holder.