Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPH0666533B2 - Method for manufacturing aluminum nitride substrate - Google Patents
[go: Go Back, main page]

JPH0666533B2 - Method for manufacturing aluminum nitride substrate - Google Patents

Method for manufacturing aluminum nitride substrate

Info

Publication number
JPH0666533B2
JPH0666533B2 JP63103670A JP10367088A JPH0666533B2 JP H0666533 B2 JPH0666533 B2 JP H0666533B2 JP 63103670 A JP63103670 A JP 63103670A JP 10367088 A JP10367088 A JP 10367088A JP H0666533 B2 JPH0666533 B2 JP H0666533B2
Authority
JP
Japan
Prior art keywords
aln
substrate
aluminum nitride
binder
nitride substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63103670A
Other languages
Japanese (ja)
Other versions
JPH01273381A (en
Inventor
裕一 岩淵
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokin Corp
Original Assignee
Tokin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokin Corp filed Critical Tokin Corp
Priority to JP63103670A priority Critical patent/JPH0666533B2/en
Publication of JPH01273381A publication Critical patent/JPH01273381A/en
Publication of JPH0666533B2 publication Critical patent/JPH0666533B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/58Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
    • C04B35/581Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on aluminium nitride
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B37/00Joining burned ceramic articles with other burned ceramic articles or other articles by heating
    • C04B37/02Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles
    • C04B37/021Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles in a direct manner, e.g. direct copper bonding [DCB]
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/4582Porous coatings, e.g. coating containing porous fillers
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5053Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials non-oxide ceramics
    • C04B41/5062Borides, Nitrides or Silicides
    • C04B41/5063Aluminium nitride

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Products (AREA)
  • Cooling Or The Like Of Electrical Apparatus (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、主として高い電力出力を扱う個別半導体や、
電子装置の放熱板に用いられる窒化アルミニウム(以下
AlNと称する)基板表面に金属層を形成するための表面
層を形成する方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial application] The present invention mainly relates to an individual semiconductor that handles high power output,
Aluminum nitride used for heat sinks of electronic devices (hereinafter
The present invention relates to a method of forming a surface layer for forming a metal layer on the surface of a substrate (referred to as AlN).

〔従来技術の内容と問題点〕[Contents and problems of conventional technology]

従来、この種のAlN基板と金属層との密着強度を得る方
法としてAlN表面を化学的にエッチング等により荒らす
か、あるいはAlNと金属層との間に表面を酸化してアル
ミナ層の中間層を構成し、密着強度を得るという手法が
用いられていたが、エッチングを用いる場合、エッチン
グの度合いが大きいとAlN基板の強度低下を起こすとい
う問題があり、またAlNの表面にアルミナの中間層を形
成するという方法も、非酸化物系セラミックスの場合、
空気中での焼成に於ける中間生成物を得ることがむずか
しいこと、光熱伝導性の基板を用いる場合、中間層によ
って熱伝導性が損なわれ高熱伝導性としての本来の性能
が失われること、還元性雰囲気で熱を加える場合、一度
形成した中間層が分解する場合があること等の問題があ
った。
Conventionally, as a method of obtaining adhesion strength between this type of AlN substrate and the metal layer, the AlN surface is chemically roughened by etching or the like, or the surface is oxidized between the AlN and the metal layer to form an intermediate layer of the alumina layer. However, when etching is used, there is a problem that the strength of the AlN substrate decreases when the degree of etching is large, and an intermediate layer of alumina is formed on the surface of AlN. In the case of non-oxide ceramics,
It is difficult to obtain an intermediate product in baking in air, and when using a photothermally conductive substrate, the intermediate layer impairs the thermal conductivity and the original performance as high thermal conductivity is lost. When heat is applied in a neutral atmosphere, there is a problem that the intermediate layer once formed may decompose.

〔発明の目的〕[Object of the Invention]

本発明は、これらの欠点を除去するため、AlN基板焼成
時にAlN基板表面にバインダー量の多いAlN基板を正規Al
N基板表面に接着し、焼結時にバインダーを飛ばしてAlN
基板表面に凹凸を形成することにより、金属層とAlNと
の密着強度の優れたAlN基板を提供することを目的とす
る。
In order to eliminate these drawbacks, the present invention uses a regular AlN substrate with a large amount of binder on the surface of the AlN substrate during firing of the AlN substrate.
N Adheres to the substrate surface and removes the binder during sintering to make AlN
An object is to provide an AlN substrate having excellent adhesion strength between a metal layer and AlN by forming irregularities on the substrate surface.

〔発明の構成〕[Structure of Invention]

本発明は、AlN基板の製造方法に於て、AlN粉末とバイン
ダーから形成されるグリーンシート中のAlNの占める比
率が2ないし70wt%であるグリーンシートを作成し、こ
れをグリーン基板の最外層の少なくとも一面に貼りつ
け、バインダーを除去した後、焼成を行うことによりAl
N基板表面に凹凸を形成し、AlN基板表面に接着強度の高
い金属層を形成するものである。即ち本発明は、複数枚
の窒化アルミニウムグリーンシートを積層し、成形、脱
バインダー処理の後、高温焼成を行って窒化アルミニウ
ム基板とする製造方法に於て、窒化アルミニウム粉末の
占める比率が2ないし70wt%のグリーンシートを作成
し、これをグリーン基板の最外層の片面、又は両面に置
き、予備焼成してバインダーを除去した後、高温焼成す
ることにより表面に凹凸を形成することを特徴とする窒
化アルミニウム基板の製造方法である。
The present invention is a method for manufacturing an AlN substrate, in which a green sheet formed from AlN powder and a binder has a proportion of AlN in the range of 2 to 70 wt% and is used as an outermost layer of the green substrate. After applying the binder on at least one side and removing the binder, the Al
It is intended to form irregularities on the surface of the N substrate and to form a metal layer having high adhesive strength on the surface of the AlN substrate. That is, the present invention is a manufacturing method in which a plurality of aluminum nitride green sheets are laminated, molded and debindered, and then subjected to high temperature firing to obtain an aluminum nitride substrate. % Green sheet is prepared, placed on one side or both sides of the outermost layer of the green substrate, prebaked to remove the binder, and then baked at a high temperature to form irregularities on the surface. It is a manufacturing method of an aluminum substrate.

〔実施例による説明〕[Explanation by Examples]

以下、本発明による実施例としてAlN基板を用いた金属
層との接合例を示す。有機バインダーとして分子量7万
ないし10万のポリビニールブチラール(PVB)を用いて
各種類の粉末量のセラミックスグリーンシートを作成し
た。その際添加したAlN粉末は平均粒径1.0μmである。
An example of joining with a metal layer using an AlN substrate will be shown below as an example according to the present invention. Polyvinyl butyral (PVB) having a molecular weight of 70,000 to 100,000 was used as an organic binder to prepare a ceramic green sheet of each kind of powder amount. The AlN powder added at that time has an average particle size of 1.0 μm.

1.まず、ポリビニールブチラールをイソプロピルアルコ
ールに溶解し、これに比率で85wt%のAlNを徐々に加え
ながら手撹拌を行ったのち、ホモジナイザーにて20分間
の混練を行った。この時の粘度は6000ないし15000cpsで
あった。次にドクターブレード法により膜厚100μm、
幅160mmに成膜を行ない、得られたシートを140×140mm
に打ち抜いて正規のシート1とした。
1. First, polyvinyl butyral was dissolved in isopropyl alcohol, and 85% by weight of AlN was gradually added to this, while stirring by hand, and then kneading with a homogenizer for 20 minutes. The viscosity at this time was 6000 to 15000 cps. Next, using a doctor blade method, a film thickness of 100 μm,
Film is formed to a width of 160 mm and the resulting sheet is 140 x 140 mm
It was punched out into a regular sheet 1.

2.同様にAlNの占める比率が2ないし85wt%にわたり10
種類のAlN粉末とバインダーとの重量比の異なる厚さ40
μmのグリーンシート2を作成した。
2. Similarly, the proportion of AlN ranges from 2 to 85 wt% and is 10
Thickness 40 with different AlN powder and binder weight ratio
A green sheet 2 of μm was prepared.

積層は第1図に示すように1のAlNシートを12枚積層し
た後、2のAlNシートを1枚積み重ねた。これを金型内
にて熱圧着を行ない一枚のプレス体を得た。得られたプ
レス体は常圧のNガス雰囲気中で15℃/時以下の昇
温速度で550℃まで昇温し、さらに550℃で8時間保持
し、バインダーの除去を行った。次にNガス雰囲気
中で1800℃の焼成温度で5時間の焼成を行ない焼結体を
製造した。得られた焼結体は第2図に示すように表面に
多数の突起が形成された。この時の粗さはAlN充填率20w
t%の時最大で、最大表面粗さRmaxは12μmであった。
As for lamination, as shown in FIG. 1, 12 sheets of 1 AlN sheet were laminated and then 1 sheet of 2 AlN sheet was laminated. This was subjected to thermocompression bonding in a mold to obtain a pressed body. The obtained pressed body was heated to 550 ° C. at a temperature rising rate of 15 ° C./hour or less in a normal pressure N 2 gas atmosphere, and was further held at 550 ° C. for 8 hours to remove the binder. Next, firing was performed at a firing temperature of 1800 ° C. for 5 hours in a N 2 gas atmosphere to produce a sintered body. As shown in FIG. 2, the obtained sintered body had a large number of protrusions formed on its surface. Roughness at this time is AlN filling rate 20w
The maximum surface roughness Rmax was 12 μm at t%.

次にセラミックス表面に通常行なわれている方法で、2m
m×2mmの寸法に無電解Niメッキを厚さ10μmに形成し、
得られたNiメッキ層に0.7mmφのリード線を垂直に半田
付けし、垂直引っ張り強度を測定した。結果は、第1表
の通りである。
Next, 2 m
Electroless Ni plating is formed to a size of mx 2 mm to a thickness of 10 μm,
A 0.7 mmφ lead wire was vertically soldered to the obtained Ni plating layer, and the vertical tensile strength was measured. The results are shown in Table 1.

第1表に示すように、好ましい密着強度が2.0Kg/mm2
上の値はAlNの充填率が10wt%ないし50wt%の時に得ら
れ、1.0Kg/mm2以上の値は2wt%ないし70wt%のAlNの充
填率の時に得られる。
As shown in Table 1, the preferable adhesion strength of 2.0 Kg / mm 2 or more is obtained when the filling rate of AlN is 10 wt% to 50 wt%, and the value of 1.0 Kg / mm 2 or more is 2 wt% to 70 wt%. It is obtained at the filling rate of AlN.

第1表に示すように、AlNの充填率において70wt%を超
える場合、焼結体表面は従来の方法による焼結体と同様
凹凸は認められず、平均表面粗さはRa0.4μm、最大表
面粗さもRmax3.7μmであった。また密着強度も従来法
のものと同等であった。次にAlNの充填率が2wt%未満の
場合も凹凸の効果は低下し従来法のものと同等であっ
た。第1表に示すように本発明によるAlN表面相に凹凸
を形成する方法ではAlNの充填率2ないし70wt%の範囲
にあれば従来方法に比べて密着強度の高い金属膜を作る
ことが出来ることが判かった。尚、本発明は実施例で示
すように、AlN表面に凹凸を設ける手段としてAlNに添加
するバインダの量を多くし、焼結時に飛散させて表面に
凹凸を形成するものであり、添加するバインダとしては
実施例の有機バインダのみでなく、焼結時に飛散する他
の有機添加材であっても本発明の効果と同じ効果を得ら
れることは当然である。
As shown in Table 1, when the filling rate of AlN exceeds 70 wt%, the surface of the sintered body does not show the unevenness like the sintered body by the conventional method, the average surface roughness is Ra 0.4 μm, and the maximum surface is The roughness was Rmax 3.7 μm. The adhesion strength was also the same as that of the conventional method. Next, even when the filling rate of AlN was less than 2 wt%, the effect of unevenness decreased and it was equivalent to that of the conventional method. As shown in Table 1, in the method of forming irregularities on the AlN surface phase according to the present invention, it is possible to form a metal film having a higher adhesion strength than the conventional method if the AlN filling rate is in the range of 2 to 70 wt%. Was understood. Incidentally, the present invention, as shown in the examples, is to increase the amount of binder added to AlN as a means for providing irregularities on the AlN surface, and to scatter during sintering to form irregularities on the surface. As a matter of course, not only the organic binders of the examples, but also other organic additives scattered during sintering can obtain the same effects as those of the present invention.

〔発明の効果〕〔The invention's effect〕

以上述べたごとく本発明によれば、セラミックスと金属
相との密着強度に優れたセラミックス基板を、セラミッ
クスの表面に凹凸を形成することにより得ることが出来
た。
As described above, according to the present invention, a ceramic substrate having excellent adhesion strength between the ceramic and the metal phase can be obtained by forming irregularities on the surface of the ceramic.

【図面の簡単な説明】[Brief description of drawings]

第1図は、熱圧着時のセラミックスシートの構成図。 第2図は、本発明による方法で得られた焼結体と無電解
Ni膜との接合の断面図。 1……セラミックスグリーンシート(正規)。 2……セラミックスグリーンシート(AlN粉末の占める
比率が2ないし70wt%)。 3……プレス金型。 4……Ni膜。 5……セラミックス焼結体。
FIG. 1 is a configuration diagram of a ceramic sheet during thermocompression bonding. FIG. 2 shows a sintered body obtained by the method according to the present invention and an electroless material.
Sectional drawing of joining with Ni film. 1 ... Ceramics green sheet (regular). 2 Ceramics green sheet (AlN powder accounts for 2 to 70 wt%). 3 ... Press die. 4 ... Ni film. 5: Ceramics sintered body.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 H01L 23/15 H05K 3/38 A 7011−4E ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Office reference number FI technical display location H01L 23/15 H05K 3/38 A 7011-4E

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】複数枚の窒化アルミニウムグリーンシート
を積層し、成形、脱バインダー処理の後、高温焼成を行
って窒化アルミニウム基板とする製造方法に於て、窒化
アルミニウム粉末の占める比率が2ないし70wt%のグリ
ーンシートを作成し、これをグリーン基板の最外層の片
面、又は両面に置き予備焼成してバインダーを除去した
後、高温焼成することにより表面に凹凸を形成すること
を特徴とする窒化アルミニウム基板の製造方法。
1. A method for producing an aluminum nitride substrate by laminating a plurality of aluminum nitride green sheets, molding and debinding them, and then performing high-temperature firing to produce aluminum nitride powder in which the proportion of aluminum nitride powder is 2 to 70 wt. % Green sheet, which is placed on one side or both sides of the outermost layer of the green substrate to remove the binder by pre-baking and then baking at high temperature to form irregularities on the surface. Substrate manufacturing method.
JP63103670A 1988-04-25 1988-04-25 Method for manufacturing aluminum nitride substrate Expired - Lifetime JPH0666533B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63103670A JPH0666533B2 (en) 1988-04-25 1988-04-25 Method for manufacturing aluminum nitride substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63103670A JPH0666533B2 (en) 1988-04-25 1988-04-25 Method for manufacturing aluminum nitride substrate

Publications (2)

Publication Number Publication Date
JPH01273381A JPH01273381A (en) 1989-11-01
JPH0666533B2 true JPH0666533B2 (en) 1994-08-24

Family

ID=14360227

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63103670A Expired - Lifetime JPH0666533B2 (en) 1988-04-25 1988-04-25 Method for manufacturing aluminum nitride substrate

Country Status (1)

Country Link
JP (1) JPH0666533B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03292791A (en) * 1990-04-11 1991-12-24 Toshiba Corp Wiring board

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0774105B2 (en) * 1986-08-26 1995-08-09 京セラ株式会社 Manufacturing method of aluminum nitride-based green sheet
JPH0770644B2 (en) * 1986-03-27 1995-07-31 株式会社東芝 Thermal conductive substrate

Also Published As

Publication number Publication date
JPH01273381A (en) 1989-11-01

Similar Documents

Publication Publication Date Title
CN112239365A (en) Method for sintering multilayer piezoelectric ceramic sheet at one time
JPH0679995B2 (en) WN metallization structure of AlN substrate
JPH0666533B2 (en) Method for manufacturing aluminum nitride substrate
JP7122085B2 (en) Multilayer ceramic capacitor and manufacturing method thereof
JP3059117B2 (en) Ceramic circuit board
JP3669056B2 (en) Manufacturing method of ceramic multilayer wiring board
JPH04329617A (en) Manufacture of laminated ceramic electronic component
JPH02238642A (en) Manufacture of ceramic circuit board
JP3193626B2 (en) Manufacturing method of ceramic multilayer substrate
JP4439257B2 (en) Ceramic green sheet and manufacturing method thereof
CN116835990B (en) Composite ceramic substrate, copper-clad ceramic substrate, preparation method and application
JPH06188569A (en) Multilayer wiring board
JP3872285B2 (en) Manufacturing method of glass ceramic substrate
JPS6342147A (en) Manufacture of ceramic package
JP3872283B2 (en) Manufacturing method of glass ceramic substrate
JP2681328B2 (en) Circuit board manufacturing method
JP4502977B2 (en) Unsintered laminated sheet
JP3811381B2 (en) Manufacturing method of glass ceramic substrate
JP3229540B2 (en) Manufacturing method of ceramic multilayer substrate
JP3909182B2 (en) Manufacturing method of glass ceramic substrate
JP3909192B2 (en) Manufacturing method of glass ceramic substrate
JP3369312B2 (en) Multilayer piezoelectric element and method of manufacturing the same
JP3981265B2 (en) Manufacturing method of glass ceramic substrate
JP4443659B2 (en) Manufacturing method of multilayer ceramic parts
JPH04243173A (en) electrostrictive effect element