JPH067265B2 - Electrophotographic recording material base material coating device - Google Patents
Electrophotographic recording material base material coating deviceInfo
- Publication number
- JPH067265B2 JPH067265B2 JP58201104A JP20110483A JPH067265B2 JP H067265 B2 JPH067265 B2 JP H067265B2 JP 58201104 A JP58201104 A JP 58201104A JP 20110483 A JP20110483 A JP 20110483A JP H067265 B2 JPH067265 B2 JP H067265B2
- Authority
- JP
- Japan
- Prior art keywords
- coating
- base material
- liquid
- coating liquid
- endless
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/007—Slide-hopper coaters, i.e. apparatus in which the liquid or other fluent material flows freely on an inclined surface before contacting the work
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0525—Coating methods
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/06—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying two different liquids or other fluent materials, or the same liquid or other fluent material twice, to the same side of the work
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明はエンドレスに形成された連続面を有する基材の
外面上に塗液を同時に二層以上の重畳に均一に塗布する
電子写真記録体基材等の塗布装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an electrophotographic recording material in which a coating solution is simultaneously and uniformly applied in a superposition of two or more layers on the outer surface of a base material having an endless continuous surface. The present invention relates to a coating device for substrates and the like.
[発明の背景] エンドレスに形成された連続面を有する基材の外面上の
薄膜で均一な塗布に関してスプレー塗布法、浸漬塗布
法、ブレード塗布法、ロール塗布法等の種々の方法が検
討されている。特に電子写真感光体ドラムのような薄膜
で均一な塗布については生産性のすぐれた塗布装置を開
発すべく検討されている。しかしながら、従来のエンド
レスに形成された連続面を有する基材への塗布方法の装
置においては、均一な塗膜が得られなかったり生産性が
悪い等の短所があった。BACKGROUND OF THE INVENTION Various methods such as a spray coating method, a dip coating method, a blade coating method and a roll coating method have been studied for uniform coating with a thin film on the outer surface of a base material having an endless continuous surface. There is. In particular, thin film uniform coating such as electrophotographic photosensitive drum is being studied to develop a coating device having excellent productivity. However, the conventional apparatus for coating a base material having an endless continuous surface has drawbacks that a uniform coating film cannot be obtained and productivity is poor.
スプレー塗布法ではスプレーガンより噴出した塗布液滴
が該エンドレスに形成された連続面を有する基材の外周
面上に到達するまでに溶媒が蒸発するために塗布液滴の
固形分濃度が上昇してしまい、それにともない塗布液滴
の粘度上昇がおこって液滴が面に到達した時、液滴が面
上を充分に広がらないため、あるいは乾燥固化してしま
った粒子が表面に付着するため、塗布表面の平滑性の良
いものが得られない。また該連続面を有する基材への液
滴の到達率が100%でなく部分的にも不均一であるた
め、膜厚コントロールが非常に困難である。更に、高分
子溶液等では糸引きを起こす事があるため使用する溶媒
及び樹脂に制限がある。ブレード塗布法、ロール塗布法
は例えば円筒状基材の長さ方向にブレードもしくはロー
ルを配置し該円筒状基材を周方向に回転させて塗布を行
い円筒状基材を1回転させた後ブレードもしくはロール
を後退させるものである。しかしながら、ブレードもし
くはロールを後退させる際、塗布液の粘性により、塗布
膜厚の一部に他の部分より厚い部分が生じ、均一な塗膜
が得られない欠点がある。特開昭54-87229号公報、特開
昭54-128740号公報には、ブレード塗布におけるブレー
ドが真空と大気の切換え可能なタンクもしくはシリンダ
ー内のピストンの運動の方向の変化とつながっており、
ブレードを後退させる際前記真空側に切り換えることに
より余剰な塗布液を吸い取り均一な塗膜を得るものであ
る。しかしながら、均一な塗膜を得るためには吸引する
タイミングの設定や吸引する塗布液量の精密な制御が必
要となるが、この制御が複雑かつ困難であるなどの欠点
がある。In the spray coating method, the solvent evaporates by the time the coating droplets ejected from the spray gun reach the outer peripheral surface of the base material having the endlessly formed continuous surface, so that the solid content concentration of the coating droplets increases. When the droplets reach the surface due to the increase in viscosity of the applied droplets, the droplets do not spread sufficiently on the surface, or the dried and solidified particles adhere to the surface. The smoothness of the coated surface cannot be obtained. Further, since the arrival rate of droplets to the base material having the continuous surface is not 100% and is partially uneven, it is very difficult to control the film thickness. Further, since a polymer solution or the like may cause stringing, there are restrictions on the solvent and resin used. The blade coating method and the roll coating method include, for example, arranging a blade or a roll in the length direction of a cylindrical base material, rotating the cylindrical base material in the circumferential direction to perform coating, and rotating the cylindrical base material once, and then the blade. Alternatively, the roll is retracted. However, when the blade or roll is retracted, there is a drawback in that a part of the coating film thickness is thicker than other parts due to the viscosity of the coating liquid, and a uniform coating film cannot be obtained. JP-A-54-87229, JP-A-54-128740, the blade in the blade coating is connected to the change of the direction of movement of the piston in the tank or cylinder that can switch between vacuum and atmosphere,
By switching to the vacuum side when the blade is retracted, the excess coating liquid is absorbed to obtain a uniform coating film. However, in order to obtain a uniform coating film, it is necessary to set the suction timing and precisely control the amount of the coating liquid to be sucked, but there are drawbacks such that this control is complicated and difficult.
浸漬塗布法(特開昭49-130736号公報参照)は、上記に
おけるような塗布膜表面の平滑性、塗布膜の均一性の悪
い点は改良される。しかし塗布膜厚の制御が塗布液物性
(粘度、表面張力、密度)と塗布速度に支配され塗布液
物性の調整が非常に重要であり、また塗布速度も低く制
限されるため生産性が悪い等の欠点がある。The dip coating method (see Japanese Patent Application Laid-Open No. 49-130736) is improved in that the surface smoothness of the coating film and the uniformity of the coating film are poor. However, the control of the coating film thickness is governed by the physical properties of the coating liquid (viscosity, surface tension, density) and the coating speed, and adjustment of the physical properties of the coating liquid is very important. Also, the coating speed is limited to a low level, resulting in poor productivity. There is a drawback of.
特開昭56-15864号公報、特開昭56-15865号公報、特開昭
56-15866号公報には、円筒状基材円周にあるクリアラン
スを持って配置されたかき取り刃を移動させ、塗布をお
こなうため形成する膜厚はかき取り刃と円筒状基材のク
リアランスにより決定され、その膜厚はクリアランスの
約1/2となり均一な膜厚を得るためには円筒状基材を回
転させたりクリアランスを一定に保つためにかき取り刃
の保持方法を提案している。さらに塗膜厚を変化させる
場合においては塗膜厚はクリアランスの約1/2となるた
め、必要とする塗膜厚に応じたクリアランスを有するよ
うなかき取り刃を用意して交換する必要があり、膜厚変
更のたびに作業員は煩雑な作業を強いられる。またかき
取り刃の設定精度が即膜厚精度となるため精度に遊び
(可変性)がなく、塗布膜厚の微調整が非常にむずかし
い。JP-A-56-15864, JP-A-56-15865, JP-A-SHO
56-15866 discloses that the film thickness to be formed by moving a scraping blade arranged with a clearance around the circumference of a cylindrical base material to determine the coating thickness is determined by the clearance between the scraping blade and the cylindrical base material. The film thickness is about 1/2 of the clearance, and in order to obtain a uniform film thickness, we have proposed a method of rotating the cylindrical substrate and holding the scraping blade to keep the clearance constant. Furthermore, when changing the coating thickness, the coating thickness will be about 1/2 of the clearance, so it is necessary to prepare and replace a scraping blade that has a clearance according to the required coating thickness. Every time the film thickness is changed, the worker is forced to perform complicated work. Further, since the setting accuracy of the scraping blade is the film thickness accuracy immediately, there is no play (variability) in accuracy, and it is very difficult to finely adjust the coating film thickness.
本出願人は上記欠点を解決すべく塗布装置を先に特願昭
57-74030号として提案した。この先提案技術の塗布装置
によれば、エンドレスに形成された連続面を有する基材
への塗布が均一な膜厚を得ることが可能であり、精度の
高い膜厚制御を迅速かつ容易に行うことができる塗布装
置である。しかし該塗布装置にあっては、一度の塗布工
程で基材に一層の塗膜しか塗布することができず、2以
上の塗液を二層以上の重畳に同時に塗布することはでき
ない。したがって該基材に重畳塗布する場合には上記塗
布工程にて一層塗布毎に乾燥させ、さらに上記塗布工程
を繰り返し行わなければならず、その操作が極めて繁雑
であった。The present applicant has filed a patent application first to solve the above-mentioned drawbacks.
Proposed as No. 57-74030. According to the coating device of the previously proposed technology, it is possible to obtain a uniform film thickness on a base material having a continuous surface formed endlessly, and it is possible to perform high-precision film thickness control quickly and easily. It is a coating device that can However, in the coating apparatus, only one coating film can be coated on the substrate in one coating step, and two or more coating liquids cannot be simultaneously coated in a superposition of two or more layers. Therefore, in the case of overlapping coating on the base material, it was necessary to dry each layer in the coating step and repeat the coating step, and the operation was extremely complicated.
[発明の目的] 本発明は上記にみられる欠点を解決すべく成されたもの
で、エンドレスに形成された連続面を有する基材へ一度
の塗布工程で2以上の塗液を同時に二層以上の重畳に塗
布することを可能ならしめる塗布装置を提供するもので
あり、本発明のその他の目的ないし付随する目的は本明
細書の以下の記述によって明らかにされる。[Object of the Invention] The present invention has been made to solve the above-mentioned drawbacks, and two or more coating liquids of two or more layers are simultaneously applied to a base material having a continuous surface formed endlessly in one application step. SUMMARY OF THE INVENTION The present invention provides a coating apparatus capable of coating multiple layers, and other and related objects of the present invention will be made clear by the following description of the present specification.
[課題を解決するための手段] 上記目的を達成するための本発明の塗布方法は、電子写
真感光体基材の如く、エンドレスに形成された連続周面
を有すると共に一端から他端まで同一形状を有する柱状
又は筒状の基材を連続的に上方向に移動させながら液を
塗布する固定のビード塗布装置において、エンドレスの
ホッパーエッジが基材周面を取囲むように且つ該基材周
面との間に2以上の重畳塗布液層からなるビードを基材
全周に亘って架橋可能な間隙を維持するように、ホッパ
ー装置が配置されており、該ホッパー装置は、前記エン
ドレスのホッパーエッジにおいて終端をなすように該ホ
ッパーエッジに向かって全周が徐々に集束すると共に下
方に傾斜するエンドレスに構成された液スライド曲斜面
と、該液スライド曲斜面にエンドレスに形成された2以
上の塗布液流出口と、該塗布液流出口から前記液スライ
ド曲斜面を流下させて前記塗布液ビードの重畳層の各々
に塗布液を重畳の関係で供給するエンドレスの塗布液分
配室と、を具備していることを特徴とする。[Means for Solving the Problems] A coating method of the present invention for achieving the above-mentioned object has a continuous peripheral surface formed endlessly and has the same shape from one end to the other end like an electrophotographic photoreceptor substrate. In a fixed bead coating apparatus for coating a liquid while continuously moving a columnar or tubular base material having an upward direction, an endless hopper edge surrounds the base material peripheral surface and the base material peripheral surface. A hopper device is arranged so as to maintain a gap capable of cross-linking a bead composed of two or more superposed coating liquid layers over the entire circumference of the base material, and the hopper device comprises the endless hopper edge. At the end of the liquid slide curved slope that is configured as an endless structure in which the entire circumference gradually converges toward the hopper edge and is inclined downward, and the liquid slide curved slope is endlessly formed. Two or more coating liquid outlets formed, and an endless coating liquid that flows down the liquid slide curved surface from the coating liquid outlet to supply the coating liquid to each of the overlapping layers of the coating liquid beads in a superposed relationship. And a distribution chamber.
尚、特開昭49-42343号や同54-124039号には、塗布する
基材がエンドレスではなくシート状の場合における塗布
方法が記載されているが、これらの技術は、エンドレス
の連続周面を有する柱状又は筒状の基材を塗布する本願
発明とは、その構成、課題及び目的を全く異にする異な
る分野の技術である。何故ならば、シート状に塗布する
技術では液スライド面が単なる平面であり、該液スライ
ド面を流れる塗布液は液流出口から押し出された状態の
まま、即ち、略同一幅のまま平面上を流下し、その幅を
維持したまま平面の基材に平面状に塗布されるものであ
るが、柱状又は筒状の基材の場合は、塗布液が流下する
面はエンドレスの曲斜面であるため、流下する塗布液が
側端部を有さずエンドレスである点、また該塗布液が、
全周が塗布液流出口から基材に向かって徐々に集束する
曲斜面を流下する点において全く異なる構成、課題ない
し目的を有するからである。Incidentally, JP-A-49-42343 and JP-A-54-124039 describe a coating method in the case where the base material to be coated is in the form of a sheet instead of endless. The invention of the present application for applying a columnar or tubular base material having the above is a technology in a different field having completely different configurations, problems, and objects. This is because in the technique of applying in a sheet shape, the liquid slide surface is a mere flat surface, and the coating liquid flowing on the liquid slide surface remains in the state of being pushed out from the liquid outlet, that is, on the flat surface with substantially the same width. It flows down and is applied flat on a flat base material while maintaining its width.However, in the case of a columnar or tubular base material, the surface on which the coating solution flows down is an endless curved slope. The point that the coating liquid flowing down is endless without side edges, and the coating liquid is
This is because it has a completely different configuration, problem, or object in that the entire circumference flows down from a coating liquid outlet toward a substrate on a curved slope that gradually converges.
[発明の具体的構成] 本発明に係る塗布装置は、エンドレスに形成された連続
周面を有すると共に一端から他端まで同一形状を有する
柱状又は筒状の基材の外面上に液を塗布する装置におい
て、2以上の塗布液分配室及び塗布液分配室の各々につ
ながる塗布液分配スリットの各々が連続であり、各塗布
液分配室に塗布液を供給する塗布液供給手段が塗布液分
配室に連結してあり、各塗布液分配スリットの塗布液流
出口が、エンドレスのホッパーエッジにおいて終端をな
すようにホッパーエッジに向かって全周が徐々に集束す
ると共に下方に傾斜する液スライド曲斜面に形成されて
おり、該液スライド曲斜面の終端をなすエンドレスのホ
ッパーエッジは、基材外寸より0.05〜1mm大きく、液ス
ライド曲斜面終端より下方に延びる長さが0.1〜10m
m、好ましくは0.5〜4mmであることがよい。又前記ホッ
パーエッジは前記スライド曲斜面終端より鉛直下方及び
それより30度迄の範囲内で前記基材と反対側に傾斜した
ものであり、より好ましくは、鉛直下方及びそれより20
度迄の範囲内で傾いて延びるものである。[Specific Configuration of the Invention] A coating apparatus according to the present invention coats a liquid on the outer surface of a columnar or tubular base material having a continuous peripheral surface formed endlessly and having the same shape from one end to the other end. In the apparatus, two or more coating liquid distribution chambers and coating liquid distribution slits connected to the coating liquid distribution chambers are continuous, and a coating liquid supply means for supplying the coating liquid to each coating liquid distribution chamber is a coating liquid distribution chamber. The coating liquid outlets of the coating liquid distribution slits gradually converge toward the hopper edge so that the coating liquid outlet of each coating liquid distribution slit terminates at the endless hopper edge, and the liquid slide curved inclined surface inclines downward. The endless hopper edge formed at the end of the liquid slide curved slope is 0.05 to 1 mm larger than the outer dimension of the base material, and the length extending downward from the liquid slide curved slope end is 0.1 to 10 m.
m, preferably 0.5 to 4 mm. Further, the hopper edge is inclined vertically downward from the end of the slanted slope and up to 30 degrees from the end, and is more preferably inclined vertically downward and 20 degrees from the base.
It extends with an inclination within a range of up to degrees.
ホッパーエッジの傾斜が30度を超えると塗布液の架橋が
短くなり、ビードが不安定となって良好な塗布膜が得に
くくなる。又塗布装置に供給された塗布液は一旦、各塗
布液分配室に溜められ、これに連結する塗布液分配スリ
ットの各々に塗布液を均一に分配するようにされるが、
前記塗布液を前記スリットに均一に分配しかつ前記スリ
ットに分配された塗布液を基材面に均一に塗布できるよ
うにするには、前記塗布液分配スリットに対する前記塗
布液分配室の圧力損失比は各々40以上であり、より好ま
しくは40〜100,000の範囲内であるのがよい。圧力損失
が40未満の場合は、各塗布液の均一な分配及び塗布がで
きにくくなり、100,000を超えると各塗布液分配室を大
きくするとか、各スリットを長くする必要が生じ、装置
構造上問題を生ずる。When the inclination of the hopper edge exceeds 30 degrees, the cross-linking of the coating solution becomes short, the bead becomes unstable, and it becomes difficult to obtain a good coating film. Further, the coating liquid supplied to the coating device is once stored in each coating liquid distribution chamber, and the coating liquid is evenly distributed to each of the coating liquid distribution slits connected thereto.
The pressure loss ratio of the coating liquid distribution chamber to the coating liquid distribution slit is set so that the coating liquid can be uniformly distributed to the slits and the coating liquid distributed to the slits can be uniformly coated on the substrate surface. Is 40 or more, and more preferably 40 to 100,000. If the pressure loss is less than 40, it will be difficult to evenly distribute and apply each coating liquid, and if it exceeds 100,000, it will be necessary to enlarge each coating liquid distribution chamber or to lengthen each slit, which is a structural problem of the device. Cause
本発明の塗布装置における2以上の重畳塗布液層の塗布
による塗膜は塗布液ビードによって形成される。つまり
塗布装置を離れる塗布液の層は、その離れるときの厚さ
と同じ厚さの層で基材に直接塗布されるのではなくて一
度液溜り(ビード)になってから該基材に移るのであ
る。従ってこの塗布液ビードによって形成される塗膜
は、実際上塗布装置から基材に直接形成されるのではな
く塗布装置は単に塗布液ビードを維持し、基材はそのビ
ードから塗布される。このビードによる塗布ではそのビ
ードを横切ってこれと交叉して移動する基材上に塗布さ
れる塗膜の厚みは、ビードの作用によって決定され且つ
基材が移動する速度、塗布液の供給速度、ホッパー構造
の効率等によって変化する。A coating film obtained by coating two or more superposed coating liquid layers in the coating apparatus of the present invention is formed by coating liquid beads. In other words, the layer of the coating liquid leaving the coating device is not directly applied to the base material in a layer having the same thickness as when the coating liquid leaves the coating device, but is transferred to the base material once it forms a liquid pool (bead). is there. Therefore, the coating formed by this coating solution bead is not actually formed directly from the coating apparatus to the substrate, but the coating apparatus simply maintains the coating solution bead and the substrate is coated from the bead. In coating with this bead, the thickness of the coating applied on the substrate that moves across and across the bead is determined by the action of the bead and the rate at which the substrate moves, the feed rate of the coating liquid, It changes depending on the efficiency of the hopper structure.
本発明の塗布装置は、塗布するエンドレスに形成された
連続周面を有する基材が円筒形である場合には、ホッパ
ーエッジは前記円筒形基材直径よりやや大なる直径(0.
05〜1mm大なる直径)の円形の終端部となり、また該ホ
ッパーエッジにおいて終端をなす液スライド曲斜面は円
錐状の斜面、即ち、所謂すり鉢状となり、更に該液スラ
イド曲斜面に形成される塗布液分配スリットも円形とな
る。In the coating apparatus of the present invention, when the base material having a continuous peripheral surface formed endlessly to be coated has a cylindrical shape, the hopper edge has a diameter slightly larger than the cylindrical base material diameter (0.
The liquid slide curved slope that becomes a circular end portion (diameter of 05 to 1 mm larger) and ends at the hopper edge is a conical slope, that is, a so-called mortar shape, and the coating formed on the liquid slide curved slope. The liquid distribution slit is also circular.
本発明の塗布装置による塗布は次のようにして行われ
る。即ち、電子写真感光体の如く、エンドレスに形成さ
れた連続周面を有すると共に一端から他端まで同一形状
を有する柱状又は筒状の基材を塗布する場合において、
該基材周面を取り囲むように且つ該周面全周との間に間
隙を維持するようにホッパーを設け、該間隙に、基材周
面を取り囲むように対向するホッパーエッジと基材周面
とを架橋する塗布液ビードを全周に形成し、該ビードに
対して、1つの塗布液層が他の塗布液層を伴って連続的
に且つ同時に供給して、各個別の層が明確な重畳関係に
維持される如くなし、前記基材をその周面が前記塗布液
ビードと交叉し且つ接触するように連続的に上方向に移
動させ、基材周面が、塗布液ビードの重畳層の外端部に
係合して結合層を同時に引出し同時重畳塗布される。The coating by the coating device of the present invention is performed as follows. That is, in the case of applying a columnar or tubular base material having a continuous peripheral surface formed endlessly and having the same shape from one end to the other end as in an electrophotographic photoreceptor,
A hopper is provided so as to surround the peripheral surface of the base material and to maintain a gap between the peripheral surface of the base material and the peripheral surface of the base material. A coating solution bead for cross-linking and is formed all around, and one coating solution layer is continuously and simultaneously supplied to the bead together with another coating solution layer so that each individual layer is distinct. The base material is continuously moved upward so that the peripheral surface of the base material intersects and contacts the coating liquid bead, and the peripheral surface of the base material is a superposed layer of the coating liquid bead. The bonding layers are simultaneously drawn out by simultaneously engaging with the outer ends of the layers, and are applied simultaneously.
[実施例] 以下、本発明の実施例を添付図面に従って詳細に説明す
る。しかし本発明は以下の実施態様に限定されるもので
はない。EXAMPLES Examples of the present invention will be described below in detail with reference to the accompanying drawings. However, the present invention is not limited to the following embodiments.
第1図は本発明に係る塗布装置を示す一部断面斜視図、
第2図は基材への塗布状態を示す断面図である。FIG. 1 is a partial sectional perspective view showing a coating apparatus according to the present invention,
FIG. 2 is a cross-sectional view showing a coating state on a base material.
各図において、1は塗布装置本体、2は塗布液を塗布す
るホッパー装置である。3A、3Bは塗布液分配室で該
分配室3A、3Bには各々異なる塗布液S1、S2を供
給する供給パイプ4A、4Bが連結されている。5A、
5Bは塗布液分配スリットで、端部を持たず基材外周を
取り囲むように連続して形成されている。6A、6Bは
塗布液流出口、7は液スライド曲斜面、8はホッパーエ
ッジ、9は塗布液ビードである。In each drawing, 1 is a coating apparatus main body, and 2 is a hopper apparatus for coating a coating liquid. 3A and 3B are coating liquid distribution chambers, and supply pipes 4A and 4B for supplying different coating liquids S1 and S2 are connected to the distribution chambers 3A and 3B. 5A,
5B is a coating liquid distribution slit, which is continuously formed so as not to have an end portion and to surround the outer periphery of the base material. 6A and 6B are coating solution outlets, 7 is a liquid slide curved slope, 8 is a hopper edge, and 9 is a coating solution bead.
各々異なる塗布液S1、S2は、必要量だけ図示しない
ポンプによりパイプ4A、4Bを介して各々分配室3
A、3Bに供給される。そこで塗布液S1、S2は円筒
形ドラムの円周方向に分配され、分配スリット5A,5
Bを経て各々塗布液流出口6A、6Bよりスライド部7
上に円周方向に均一に流出し、該液スライド曲斜面7を
流下しながら前記塗布液がS1、S2は二層形成され、
前記液スライド曲斜面7を介してホッパーエッジ8より
円筒形基材10の外周面11全周との間に架橋してビードを
形成し、該ビードによって該基材外周面11に二層の層状
L1、L2塗布される。A different amount of the different coating liquids S1 and S2 are distributed through the pipes 4A and 4B by a pump (not shown) to the distribution chambers 3 respectively.
It is supplied to A and 3B. Therefore, the coating liquids S1 and S2 are distributed in the circumferential direction of the cylindrical drum, and the distribution slits 5A and 5
Slide portion 7 from coating liquid outlets 6A and 6B via B
Flowing out uniformly in the circumferential direction upward, and while flowing down the liquid slide curved slope 7, the coating liquid S1 and S2 are formed into two layers,
A bead is formed by bridging from the hopper edge 8 to the entire outer peripheral surface 11 of the cylindrical base material 10 through the liquid slide curved surface 7 to form a two-layered layer on the outer peripheral surface 11 of the base material. L1 and L2 are applied.
本発明の好ましい実施態様では、ホッパーエッジ径と円
筒形基材外径との差は0.05〜1mmの範囲であるが、好ま
しくは0.1〜0.6mmの範囲である。又、液スライド曲斜面
の傾斜角度は水平に対して10〜70゜の範囲であり、より
好ましくは20〜45゜の範囲である。In a preferred embodiment of the present invention, the difference between the hopper edge diameter and the cylindrical substrate outer diameter is in the range of 0.05 to 1 mm, preferably 0.1 to 0.6 mm. Moreover, the inclination angle of the liquid slide curved slope is in the range of 10 to 70 ° with respect to the horizontal, and more preferably in the range of 20 to 45 °.
尚本装置において塗布される塗布液の粘度は0.5〜700cp
の範囲で、好ましくは1〜500cpの範囲である。本装置
において塗布された塗布膜は円筒形基材円周方向に、継
ぎ目なく分配室分配スリット及びスライド部が配置され
ているため塗布された塗膜は、継ぎ目なく均一なもので
ある。又塗膜厚は塗布液供給量と円筒形の移動速度によ
り決定されるため容易にコントロールが可能であり同時
に塗布速度は浸漬法に比べはるかに速くできる。さらに
該ホッパー装置は異なる数種類の塗布液に応じて複数設
けてもよい。The viscosity of the coating liquid applied in this device is 0.5 to 700 cp.
In the range of 1 to 500 cp. The coating film applied in this apparatus has a seamless distribution chamber distribution slit and a slide portion arranged in the circumferential direction of the cylindrical substrate, and thus the applied coating film is seamless and uniform. Further, the coating film thickness can be easily controlled because it is determined by the supply amount of the coating liquid and the moving speed of the cylindrical shape, and at the same time, the coating speed can be much faster than that of the dipping method. Further, a plurality of the hopper devices may be provided according to different kinds of coating liquids.
なお同図中、第1図及び第2図と同一符号で示した部分
は第1図及び第2図における該当符号が示す部材と同一
のものを示す。In the figure, the parts designated by the same reference numerals as those in FIGS. 1 and 2 are the same as the members designated by the corresponding reference numerals in FIGS. 1 and 2.
塗布液分配室に塗布液を供給する塗布液供給手段として
は上記実施例に示す如くパイプを用いることが好まし
く、また塗布液の安定性、均一性等のためには図示しな
いが2以上の複数のパイプを用いてもよい。As the coating liquid supply means for supplying the coating liquid to the coating liquid distribution chamber, it is preferable to use a pipe as shown in the above-mentioned embodiment, and a plurality of pipes of two or more are provided although not shown for the stability and uniformity of the coating liquid. You may use the pipe of this.
本発明の塗布装置においては、塗布液の粘度からきまる
膜厚範囲を下回る膜厚で塗布する場合、塗布液粘度が高
すぎる場合、又塗布速度が高速となりすぎたりした場合
に、該円筒形基材円周上にホッパーエッジで塗布された
液が持ち去られる時に液の粘性によりビードの液を上に
持ち上げようとする力が強く働いて該円筒形基材とホッ
パーエッジとの間に形成されるビードが安定に存在する
ことができなくなることがあり、これを防止するために
第3図に示す如く、ホッパーエッジ8と連続面を有する
基材10との間に形成している塗布液のビードの下部に該
ビードと円筒形基材10と協働する減圧室12を設け、当該
減圧室12に連通する気体排出管13を設けて減圧室12内を
雰囲気気圧より負圧に保つよう減圧し塗布をおこなうよ
うにした塗布装置も好適に用いることができる。In the coating apparatus of the present invention, when coating with a film thickness less than the film thickness range determined by the viscosity of the coating liquid, when the coating liquid viscosity is too high, or when the coating speed is too high, the cylindrical base When the liquid applied on the circumference of the material at the hopper edge is carried away, the viscosity of the liquid strongly acts to lift the liquid of the bead upward, forming between the cylindrical base material and the hopper edge. The bead may not be able to exist stably, and in order to prevent this, as shown in FIG. 3, the bead of the coating liquid formed between the hopper edge 8 and the base material 10 having a continuous surface. A decompression chamber 12 that cooperates with the bead and the cylindrical substrate 10 is provided in the lower part of the decompression chamber, and a gas discharge pipe 13 that communicates with the decompression chamber 12 is provided to reduce the pressure inside the decompression chamber 12 to a negative pressure below the atmospheric pressure. A coating device that is designed to perform coating is also preferable. It can be used for.
この装置を用いれば、ビード下方にビード及び円筒形基
材10表面一部を壁の一部として含む減圧室12内より空気
を排気管13を通して排出し減圧室12内圧を雰囲気圧より
負に(望ましくは雰囲気圧より1mm水柱〜300mm水柱の
範囲で低く)保って塗布するようにして制御される。従
って塗布速度の変動や円筒形基材とホッパーエッジとの
間隙の変動等による塗布が不均一となることを防止する
ことができる。If this device is used, air is discharged from the inside of the decompression chamber 12 including the bead and a part of the surface of the cylindrical substrate 10 as a part of the wall below the bead, and the internal pressure of the decompression chamber 12 becomes negative than the atmospheric pressure ( Desirably, the coating pressure is controlled to be kept lower than the atmospheric pressure in the range of 1 mm water column to 300 mm water column). Therefore, it is possible to prevent uneven coating due to fluctuations in the coating speed, fluctuations in the gap between the cylindrical substrate and the hopper edge, and the like.
以上、本発明の実施例では2つの塗布液を同時に重畳塗
布する場合について述べたが、3以上の塗布液を同時に
重畳塗布することもできる。As described above, in the embodiments of the present invention, the case where the two coating liquids are simultaneously applied in a superimposed manner has been described, but three or more coating liquids can be applied simultaneously in an overlapping manner.
本装置は薄膜で均一な塗布膜を要求する電子写真感光体
ドラム、静電記録体の製造、ローラー表面上への被覆、
エンドレス帯状物等の外周面への塗膜形成等に用いら
れ、それらに制限されることはない。即ちエンドレスに
形成された連続周面を有すると共に一端から他端まで同
一形状を有する柱状又は筒状の基材の外面上の同時重畳
塗布装置として用いられる。This device is a thin electrophotographic photosensitive drum that requires a uniform coating film, manufacturing of electrostatic recording media, coating on the roller surface,
It is used for forming a coating film on the outer peripheral surface of an endless strip or the like, and is not limited thereto. That is, it is used as a simultaneous superposition coating device on the outer surface of a columnar or tubular base material having an endless continuous peripheral surface and the same shape from one end to the other.
なお、本装置ではホッパーエッジと円筒形基材は、ある
間隙を持って配置されているため基材(円筒形ドラム)
を傷つけることがない。In this device, the hopper edge and the cylindrical base material are arranged with a certain gap, so the base material (cylindrical drum)
Not hurt.
また本装置に使用される塗布液は、塗布に必要な量だけ
供給するため少量ですみ、溶液状態で含有される成分が
分解等変質し易いような不安定な液においても短時間で
塗布乾燥が行われるため有利である。In addition, the coating solution used in this device can be supplied in an amount necessary for coating, so only a small amount is required. Which is advantageous.
[実験例] 以下、本発明の実験例について説明する。[Experimental Example] An experimental example of the present invention will be described below.
被塗布物である基材は、外径100mmのアルミニウム製の
ドラムであり、該ドラムに下層に電荷発生層(CGL)
を、その上に電荷輸送層(CTL)を塗布した。各々の
塗布液組成および塗布条件を下記する。The substrate to be coated is a drum made of aluminum having an outer diameter of 100 mm, and the drum has a charge generation layer (CGL) as a lower layer.
Was coated with a charge transport layer (CTL). The composition of each coating solution and the coating conditions are described below.
CGL塗布液組成 モノアゾ顔料25重量部、ポリカーボネート25重量部を粉
砕混合した後、1,2−ジクロルエタン850重量部を加え、
ビールミルにて24時間分散を行い、塗布液を得た。該塗
布液の粘度は100cp(B型粘度計NO.2ローター60rpm)で
あった。CGL coating liquid composition 25 parts by weight of monoazo pigment and 25 parts by weight of polycarbonate were pulverized and mixed, and then 850 parts by weight of 1,2-dichloroethane was added,
It was dispersed in a beer mill for 24 hours to obtain a coating liquid. The viscosity of the coating solution was 100 cp (B-type viscometer NO.2 rotor 60 rpm).
CTL塗布液組成 ポリカーボネート100重量部、ポリビニルカルバゾール
(PVK)75重量部、1,2−ジクロルエタン1045重量部
を攪拌溶解し、塗布液を得た。該塗布液の粘度は200cp
であった。Composition of CTL coating liquid 100 parts by weight of polycarbonate, 75 parts by weight of polyvinylcarbazole (PVK), and 1045 parts by weight of 1,2-dichloroethane were dissolved by stirring to obtain a coating liquid. The viscosity of the coating solution is 200 cp
Met.
実験例1 第1図に示す塗布装置を用いて下記塗布条件にてCGL
塗布液が下側となるように分配室3Bにつながる供給口
4Bより、CTL塗布液を分配室3Aにつながる供給口
4Aより、夫々ポンプにて供給し塗布し、塗布後直ちに
ドライヤーにて乾燥したところ、均一な塗膜が得られ
た。Experimental Example 1 CGL under the following coating conditions using the coating apparatus shown in FIG.
The CTL coating liquid was supplied from the supply port 4B connected to the distribution chamber 3B so that the coating liquid is on the lower side, and the CTL coating liquid was supplied from the supply port 4A connected to the distribution chamber 3A by a pump to apply the liquid, and immediately after the application, it was dried with a dryer. As a result, a uniform coating film was obtained.
塗布条件 塗布速度(ドラム上昇速度)=2m/min CGL供給量=12.6cc/min (乾燥後膜厚=1μm相当、乾燥前膜厚=20μm) CTL供給量=107cc/min (乾燥後膜厚=25μm相当、乾燥前膜厚=170μm) 塗布装置内径=100.5mm 比較例1 特開昭49-130736号公報記載の浸漬塗布法により上記組
成の塗布液の塗布を行った。Coating conditions Coating speed (drum rise speed) = 2m / min CGL supply rate = 12.6cc / min (film thickness after drying = 1μm, film thickness before drying = 20μm) CTL supply rate = 107cc / min (film thickness after drying = (Corresponding to 25 μm, film thickness before drying = 170 μm) Coating device inner diameter = 100.5 mm Comparative Example 1 A coating solution having the above composition was coated by the dip coating method described in JP-A-49-130736.
上記組成の塗布液を塗布槽満たした後、ドラムを浸漬
し、次いでドラムを引き上げた後、ドライヤーにて乾燥
した。After the coating liquid of the above composition was filled in the coating tank, the drum was dipped, and then the drum was pulled up and dried with a dryer.
その結果、CGL塗布液は、塗布速度2.0m/minでは膜
が厚くなりすぎドラム全周に液だれが生じた。乾燥後膜
厚=1μmを得るためには、塗布速度を0.9m/minに下
げる必要があった。As a result, at the coating speed of 2.0 m / min, the CGL coating liquid became too thick and dripping occurred on the entire circumference of the drum. In order to obtain a film thickness of 1 μm after drying, it was necessary to reduce the coating speed to 0.9 m / min.
またCTL塗布液は上記CGL塗布液と同様、塗布速度
2.0m/minでは膜が厚くなりすぎ液だれが生じて均一な
塗膜が得られなかった。均一な塗膜を得るには、塗布速
度を0.24m/minに下げる必要があった。Also, the CTL coating liquid is similar to the CGL coating liquid in coating speed
At 2.0 m / min, the film became too thick and dripping occurred, and a uniform coating film could not be obtained. In order to obtain a uniform coating film, it was necessary to reduce the coating speed to 0.24 m / min.
以上の結果から、当該比較例1の浸漬塗布法では、均一
な塗膜を得るためには、塗布速度を実験例1(本発明)
に比して大幅に遅くする必要があり、更にCGL、CY
L各々を1層毎別々に塗布しなければならないので生産
性が極めて低い。From the above results, in the dip coating method of Comparative Example 1, in order to obtain a uniform coating film, the coating speed was set to Experimental Example 1 (the present invention).
Compared to CGL, CY
The productivity is extremely low because each L must be applied separately for each layer.
比較例2 特開昭56-15864号公報記載の塗布方法により先ずCGL
塗布液の塗布を、次にCTL塗布液の塗布を行った。Comparative Example 2 First, CGL was prepared by the coating method described in JP-A-56-15864.
The coating liquid was applied, and then the CTL coating liquid was applied.
CGLの塗布 この塗布方法でのかき取り後の膜厚は、かき取り刃とド
ラムのクリアランスの約半分となるので乾燥前膜厚=20
μmを得るため、下記取り刃の内径を100.08mm、かき取
り刃移動速度を2m/min、ドラム回転数を400rpmとして
塗布を行った。Application of CGL The film thickness after scraping by this coating method is about half the clearance between the scraping blade and the drum, so the film thickness before drying = 20
In order to obtain μm, the following inner diameter of the blade was 100.08 mm, the scraping blade moving speed was 2 m / min, and the drum rotation speed was 400 rpm.
得られた塗膜は、約5mmピッチのスパイラル状の濃淡む
らが発生した。CGL塗布液は顔料分散系の液であるた
め擬塑性を示し、液に働く剪断力がなくなると急激に粘
度が上がる性質を有しており、また乾燥前の膜厚が20μ
mと薄いためレベリングされなかったために濃淡むらが
発生したものと思われる。ドラム回転数を大きくしレベ
リング効果が出易い条件を検討したが100rpmが塗布でき
る限界であった。このとき、スペイラル状の濃淡むらは
ピッチが小さくなったが依然残っており結局均一な塗膜
は得られなかった。The resulting coating film had spiral-shaped unevenness of light and shade with a pitch of about 5 mm. Since the CGL coating liquid is a pigment dispersion liquid, it exhibits pseudoplasticity, and has the property of rapidly increasing viscosity when the shearing force acting on the liquid is removed, and the film thickness before drying is 20μ.
It is thought that unevenness in shade occurred because it was not leveled because it was as thin as m. The conditions under which the drum rotation speed was increased and the leveling effect was easily obtained were examined, but 100 rpm was the limit for application. At this time, although the pitch-like unevenness in the shape of a spiral was reduced, it remained, and a uniform coating film could not be obtained.
CTLの塗布 かき取り刃の内径を100.6mmとした以外はCGLの塗布
と同様にしてCTLの塗布を行った。Application of CTL Application of CTL was performed in the same manner as application of CGL except that the inner diameter of the scraping blade was 100.6 mm.
得られた塗膜は、CGLと異なり外観上は均一な塗膜が
得られたが、膜厚を測定したところ、約5mmで3μmの
膜厚変動があった。1,2−ジクロルエタンは比較的蒸発
が早いため乾燥過程で粘度が上昇しレベリングされなか
ったものと思われる。The obtained coating film was uniform in appearance, unlike CGL, but when the film thickness was measured, there was a film thickness variation of 3 μm at about 5 mm. It is considered that 1,2-dichloroethane was not leveled because the viscosity increased during the drying process because the evaporation was relatively fast.
以上の結果から、当該比較例2の塗布法では、前記比較
例1の浸漬塗布法のように塗布速度を大幅に遅くする必
要はないが、均一な塗膜が得にくい。From the above results, it is not necessary to significantly slow down the coating speed in the coating method of Comparative Example 2 as in the dip coating method of Comparative Example 1, but it is difficult to obtain a uniform coating film.
[発明の効果] 以上のように本発明の塗布装置は、柱状又は筒状の基材
のエンドレスに形成された連続周面上に傷つけることな
く、性質の異なる2以上の塗布液を一度の塗布工程で同
時に2以上の層状に、しかも均一な膜厚が得られるよう
塗布することが可能であり、その膜厚制御も容易であ
り、固定の塗布装置を用い、被塗布基材を上方向に連続
的に移動させながら連続塗布する構成と相俟って、迅速
かつ高い生産性を有する。特に、本発明を電子写真感光
体等の記録体の製造に用いる場合、下引層、電荷発生
層、電荷輸送層等(特開昭51-90827号、同57-67934号、
同57-179857号等参照。)を同時重畳塗布することが可
能である。[Effects of the Invention] As described above, the coating apparatus of the present invention is capable of coating two or more coating liquids having different properties at one time without damaging the continuous peripheral surface of a columnar or tubular base material formed endlessly. It is possible to apply two or more layers simultaneously in the process so that a uniform film thickness can be obtained, and it is easy to control the film thickness. Combined with the structure of continuous coating while continuously moving, it has high productivity in a quick manner. In particular, when the present invention is used for producing a recording body such as an electrophotographic photoreceptor, an undercoat layer, a charge generation layer, a charge transport layer, etc. (JP-A-51-90827, 57-67934,
See 57-179857. ) Can be applied at the same time.
第1図は本発明に係る塗布装置を示す一部断面斜視図、
第2図はエンドレスに形成された連続面を有する基材へ
の塗布状態を示す断面図、第3図は他の実施例を示す断
面図である。 図中において、1は塗布装置本体、2はホッパー装置、
3A、3Bは塗布液分配装置、4A、4Bはパイプ、5
A、5Bは塗布液分配スリット、6A、6Bは塗布液流
出口、7は液スライド曲斜面、8はホッパーエッジ、9
は塗布液ビード、10は基材、11は基材外周面、12は減圧
室、13は排出管、を各々指示する。FIG. 1 is a partial sectional perspective view showing a coating apparatus according to the present invention,
FIG. 2 is a cross-sectional view showing a coating state on a base material having an endless continuous surface, and FIG. 3 is a cross-sectional view showing another embodiment. In the figure, 1 is a coating device main body, 2 is a hopper device,
3A and 3B are coating liquid distributors, 4A and 4B are pipes, 5
A and 5B are coating liquid distribution slits, 6A and 6B are coating liquid outlets, 7 is a liquid slide curved slope, 8 is a hopper edge, and 9 is a hopper edge.
Is a coating liquid bead, 10 is a base material, 11 is an outer peripheral surface of the base material, 12 is a decompression chamber, and 13 is a discharge pipe.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 山本 幸一 東京都日野市さくら町1番地 小西六写真 工業株式会社内 (56)参考文献 特開 昭49−42343(JP,A) 特開 昭54−124039(JP,A) 特開 昭56−15864(JP,A) 特開 昭49−107040(JP,A) 特開 昭53−2768(JP,A) 特開 昭58−189061(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Koichi Yamamoto 1 Sakura-cho, Hino-shi, Tokyo Within Konishi Roku Photo Industry Co., Ltd. (56) Reference JP-A-49-42343 (JP, A) JP-A-54- 124039 (JP, A) JP 56-15864 (JP, A) JP 49-107040 (JP, A) JP 53-2768 (JP, A) JP 58-189061 (JP, A)
Claims (1)
形成された連続周面を有すると共に一端から他端まで同
一形状を有する柱状又は筒状の基材を連続的に上方向に
移動させながら液を塗布する固定のビード塗布装置にお
いて、エンドレスのホッパーエッジが基材周面を取囲む
ように且つ該基材周面との間に2以上の重畳塗布液層か
らなるビードを基材全周に亘って架橋可能な間隙を維持
するように、ホッパー装置が配置されており、該ホッパ
ー装置は、前記エンドレスのホッパーエッジにおいて終
端をなすように該ホッパーエッジに向かって全周が徐々
に集束すると共に下方に傾斜するエンドレスに構成され
た液スライド曲斜面と、該液スライド曲斜面にエンドレ
スに形成された2以上の塗布液流出口と、該塗布液流出
口から前記液スライド曲斜面を流下させて前記塗布液ビ
ードの重畳層の各々に塗布液を重畳の関係で供給するエ
ンドレスの塗布液分配室と、を具備していることを特徴
とする電子写真記録体基材等の塗布装置。1. A columnar or tubular base material having an endless continuous peripheral surface and having the same shape from one end to the other end, such as an electrophotographic photosensitive base material, is continuously moved upward. Meanwhile, in a fixed bead coating device for coating a liquid, a bead composed of two or more overlapping coating liquid layers is formed on the entire base material such that an endless hopper edge surrounds the peripheral surface of the base material and the peripheral surface of the base material. A hopper device is arranged to maintain a bridging gap around the circumference, the hopper device gradually converging around the entire circumference toward the hopper edge so as to terminate at the endless hopper edge. And a slanted liquid slide curved surface which is inclined endlessly, two or more coating liquid outlets which are endlessly formed on the liquid slide curved slope, and the liquid sludge is provided from the coating liquid outlet. And an endless coating liquid distribution chamber for supplying the coating liquid to each of the superposed layers of the coating liquid beads in a superposed relationship by flowing down the curved slope. Applicator for etc.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58201104A JPH067265B2 (en) | 1983-10-28 | 1983-10-28 | Electrophotographic recording material base material coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58201104A JPH067265B2 (en) | 1983-10-28 | 1983-10-28 | Electrophotographic recording material base material coating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6093442A JPS6093442A (en) | 1985-05-25 |
| JPH067265B2 true JPH067265B2 (en) | 1994-01-26 |
Family
ID=16435464
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58201104A Expired - Lifetime JPH067265B2 (en) | 1983-10-28 | 1983-10-28 | Electrophotographic recording material base material coating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH067265B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01158452A (en) * | 1987-12-15 | 1989-06-21 | Konica Corp | Production of photosensitive body |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3920862A (en) * | 1972-05-01 | 1975-11-18 | Eastman Kodak Co | Process by which at least one stripe of one material is incorporated in a layer of another material |
| JPS514110B2 (en) * | 1973-04-17 | 1976-02-09 | ||
| JPS5487229A (en) * | 1977-12-23 | 1979-07-11 | Fujitsu Ltd | Coating device of photo sensitive drum for zerography |
| JPS54124039A (en) * | 1978-03-01 | 1979-09-26 | Agfa Gevaert Nv | Method and apparatus for providing multii layers on web by curtain coating |
| JPS54128740A (en) * | 1978-03-29 | 1979-10-05 | Fujitsu Ltd | Production of photosensitive drum for zerography |
| JPS6038982B2 (en) * | 1979-07-17 | 1985-09-04 | 松下電器産業株式会社 | Apparatus for applying coating material to the outer peripheral surface of a cylindrical substrate |
| JPS5615866A (en) * | 1979-07-17 | 1981-02-16 | Matsushita Electric Ind Co Ltd | Method of applying coating material to peripheral surface of cylindrical substrate |
| JPS5615864A (en) * | 1979-07-17 | 1981-02-16 | Matsushita Electric Ind Co Ltd | Method of applying coating material on peripheral surface of cylindrical-substrate |
-
1983
- 1983-10-28 JP JP58201104A patent/JPH067265B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6093442A (en) | 1985-05-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4508296B2 (en) | Method for applying multiple fluid layers on a substrate | |
| JP4301578B2 (en) | How to minimize waste when coating fluid with a slide coater | |
| US5849363A (en) | Apparatus and method for minimizing the drying of a coating fluid on a slide coater surface | |
| JP2575579B2 (en) | Slide bead coating apparatus and photographic member forming method | |
| JPH0372350B2 (en) | ||
| JPH11197570A (en) | Coating method and coating applicator | |
| JP2812755B2 (en) | Manufacturing method of cylindrical coated body | |
| JPH067265B2 (en) | Electrophotographic recording material base material coating device | |
| JPH0614188B2 (en) | Method and apparatus for coating electrophotographic recording material substrate, etc. | |
| JP3661303B2 (en) | Cylindrical substrate coating method and coating apparatus | |
| JP3503005B2 (en) | Coating method of cylindrical substrate | |
| JPS5837866B2 (en) | Coating method and equipment | |
| JPH1099763A (en) | Coating method and coating device | |
| JP2007069102A (en) | Apparatus and method for coating cylindrical substrate, and method for producing electrophotographic photosensitive member | |
| JP2004074159A (en) | Method of coating cylindrical substrate | |
| JPH0975833A (en) | Method for positioning cylindrical base material of apparatus for vertical application, cylindrical base material for vertical application and method for vertical application | |
| JPH10272401A (en) | Coating method and coating device | |
| JPH0810688A (en) | Device and method for slide bead coating | |
| JPH02311849A (en) | Coating device for manufacture of electrophotographic sensitive body | |
| JPH02311850A (en) | Coating device for manufacture of electrophotographic sensitive body | |
| JPS6093441A (en) | Coating method and device of base material or the like of electrophotographic recording material | |
| JPH05119487A (en) | Annular coating device | |
| JPH1071354A (en) | Coating apparatus and method | |
| JPH10305250A (en) | Coating method and coating device | |
| JPS60172378A (en) | Coating device |