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JPH0673335B2 - Thin film magnetic element - Google Patents
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JPH0673335B2 - Thin film magnetic element - Google Patents

Thin film magnetic element

Info

Publication number
JPH0673335B2
JPH0673335B2 JP3164229A JP16422991A JPH0673335B2 JP H0673335 B2 JPH0673335 B2 JP H0673335B2 JP 3164229 A JP3164229 A JP 3164229A JP 16422991 A JP16422991 A JP 16422991A JP H0673335 B2 JPH0673335 B2 JP H0673335B2
Authority
JP
Japan
Prior art keywords
thin film
magnetic thin
insulating layer
magnetic
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP3164229A
Other languages
Japanese (ja)
Other versions
JPH0684639A (en
Inventor
一幸 山口
次郎 鳥生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AMORUFUASU DENSHI DEBAISU KENKYUSHO KK
Original Assignee
AMORUFUASU DENSHI DEBAISU KENKYUSHO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AMORUFUASU DENSHI DEBAISU KENKYUSHO KK filed Critical AMORUFUASU DENSHI DEBAISU KENKYUSHO KK
Priority to JP3164229A priority Critical patent/JPH0673335B2/en
Publication of JPH0684639A publication Critical patent/JPH0684639A/en
Publication of JPH0673335B2 publication Critical patent/JPH0673335B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Thin Magnetic Films (AREA)
  • Coils Or Transformers For Communication (AREA)
  • Coils Of Transformers For General Uses (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は高周波領域で使用する薄
膜磁気素子の改良に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to improvement of a thin film magnetic element used in a high frequency range.

【0002】[0002]

【従来の技術】従来の磁性薄膜トランスの中で、1次コ
イルと2次コイルを絶縁層を介して、積層して作製した
例(日本応用磁気学会誌 Vol.12,No.2,P.385(1988) )
を図6に示した。この図は磁性薄膜トランスの性能を計
算するための概念図である。1が上層磁性薄膜、2が1
次コイル、3が2次コイル、4が下層磁性薄膜、6,
7,8が絶縁層で、支持体は省略してある。1次コイル
2に高周波電流を流し、磁性薄膜1,4を励磁し、それ
によって、2次コイル3に誘導起電力を発生させ、薄膜
トランスとして動作させる。
2. Description of the Related Art In a conventional magnetic thin film transformer, an example in which a primary coil and a secondary coil are laminated by interposing an insulating layer (Journal of Applied Magnetics, Vol. 12, No. 2, P. 385 (1988))
Is shown in FIG. This figure is a conceptual diagram for calculating the performance of the magnetic thin film transformer. 1 is the upper magnetic thin film, 2 is 1
Secondary coil, 3 is secondary coil, 4 is lower magnetic thin film, 6,
Insulating layers 7 and 8 are omitted from the support. A high-frequency current is passed through the primary coil 2 to excite the magnetic thin films 1 and 4, whereby an induced electromotive force is generated in the secondary coil 3 to operate as a thin film transformer.

【0003】[0003]

【発明が解決しようとする課題】図6に示した従来例で
は、下層磁性薄膜4と上層磁性薄膜1は、外周部で同一
位置に積層している。一般に積層状態での各層の膜歪み
は周縁部分が最も強い。そのため、従来例では、外周部
は歪みの影響を受けやすく、薄膜トランス作製のプロセ
スにおいて、外周部が局所的に支持体や下の層から離れ
て、浮いたり、そこが起点となって、積層膜全体が剥離
するなどの問題がある。
In the conventional example shown in FIG. 6, the lower magnetic thin film 4 and the upper magnetic thin film 1 are laminated at the same position on the outer peripheral portion. Generally, the film strain of each layer in the laminated state is strongest in the peripheral portion. Therefore, in the conventional example, the outer peripheral portion is easily affected by the strain, and in the process of manufacturing the thin film transformer, the outer peripheral portion is locally separated from the support or the lower layer and floats or becomes the starting point, and the laminated layer is formed. There is a problem such as peeling of the entire film.

【0004】図6の従来例では、磁性薄膜と同様に、絶
縁層6,7,8が周縁部で同一位置に積層している。こ
のような場合は、前述の磁性薄膜の積層の場合と同じ理
由で問題がある。特に性能向上を目的として、磁性薄
膜、絶縁層、導体パターン層などを多層積層するにした
がい、従来例では、剥離などの問題が多く、作製歩留が
悪い。本発明は上記課題を解決するために、積層歪みに
よる剥離を防止して、作製歩留を大幅に向上させた薄膜
磁気素子を提供することを目的とする。
In the conventional example shown in FIG. 6, the insulating layers 6, 7 and 8 are laminated at the same position in the peripheral edge portion, as in the magnetic thin film. In such a case, there is a problem for the same reason as the case of laminating the magnetic thin films described above. In particular, in order to improve performance, a magnetic thin film, an insulating layer, a conductor pattern layer, and the like are laminated in multiple layers. In the conventional example, there are many problems such as peeling and the manufacturing yield is poor. In order to solve the above problems, it is an object of the present invention to provide a thin film magnetic element in which peeling due to stacking strain is prevented and the production yield is significantly improved.

【0005】[0005]

【課題を解決するための手段】本発明は上記課題を解決
するために、第1の手段は上層磁性薄膜と下層磁性薄膜
を絶縁層や導体パターン層を挾んで積層する場合に、そ
の周縁部において、上層磁性薄膜を下層磁性薄膜の周縁
にはみ出るように積層することである。
In order to solve the above problems, the first means of the present invention is to provide a peripheral portion of an upper magnetic thin film and a lower magnetic thin film when sandwiching an insulating layer or a conductor pattern layer. In (2), the upper magnetic thin film is laminated so as to protrude to the peripheral edge of the lower magnetic thin film.

【0006】又、第2の手段は、磁性薄膜や導体パター
ン層を絶縁するため、複数の絶縁層を積層する場合に、
その周縁部において、上側の絶縁層が下側の絶縁層の外
側にはみ出すように絶縁層を積層することである。
The second means is to insulate the magnetic thin film and the conductor pattern layer, so that when a plurality of insulating layers are laminated,
In the peripheral portion, the insulating layer is laminated so that the upper insulating layer extends outside the lower insulating layer.

【0007】[0007]

【作用】上記第1の手段により、周縁部で外側にはみ出
させた磁性薄膜の部分は、その1層だけが支持体に密着
することになるから、膜歪みは非常に小さく、支持体と
の密着力が強い。又、その密着力が強い上層磁性薄膜
が、下の導体パターン層、絶縁層、下層磁性薄膜などを
上から押さえる形態にするから、剥離という問題は発生
しなくなり、作製歩留が大幅に向上した。
By the first means, only one layer of the portion of the magnetic thin film protruding to the outside at the peripheral portion comes into close contact with the support, so that the film strain is very small, and the magnetic strain between the support and the support is small. Strong adhesion. In addition, since the upper magnetic thin film, which has strong adhesion, presses the lower conductor pattern layer, insulating layer, lower magnetic thin film, etc. from above, the problem of peeling does not occur and the production yield is greatly improved. .

【0008】又、第2の手段により、周縁部で上層絶縁
層を下層絶縁層の外側にはみ出させるから、周縁部で
は、上層絶縁層一層となり、周縁部の歪みは緩和され密
着力が強くなる。それと同時に、上側の絶縁層は下側の
導体パターン層や絶縁層を上から包み込んで、下側に押
さえるような形態を取るから剥離という問題が発生しな
くなり、作製歩留が大幅に向上した。
Further, by the second means, the upper insulating layer is protruded to the outside of the lower insulating layer at the peripheral portion, so that the peripheral insulating layer becomes one layer at the peripheral portion, and the strain at the peripheral portion is relieved and the adhesion is strengthened. . At the same time, the upper insulating layer wraps the lower conductor pattern layer and the insulating layer from the upper side and presses the lower conductive pattern layer from the upper side, so that the problem of peeling does not occur and the manufacturing yield is greatly improved.

【0009】[0009]

【実施例】以下図面を参照して本発明の実施例を詳細に
説明する。
Embodiments of the present invention will now be described in detail with reference to the drawings.

【0010】図1は、本発明の一実施例の磁性薄膜トラ
ンスの上面図で、11が上層磁性薄膜、12が1次コイ
ル、13が2次コイル、17,18が磁性薄膜とコイル
を絶縁するための絶縁層の一部である。図2(a)、
(b)は本発明のコイル構成を示したもので、(a)が
1次コイル12の全体図で、(b)が2次コイル13の
全体図である。図3は、図1のA−B線断面図である。
11が上層磁性薄膜、12が1次コイル、13が2次コ
イル、14が下層磁性薄膜、15が支持体、16,1
7,18が絶縁層である。上層の磁性薄膜11には下層
の磁性薄膜14の周縁にはみ出た部分19が設けられ
る。また、絶縁層17には絶縁層16の周縁にはみ出た
部分20が設けられ、絶縁層18には絶縁層17の周縁
にはみ出た部分21が設けられる。
FIG. 1 is a top view of a magnetic thin film transformer according to an embodiment of the present invention. 11 is an upper magnetic thin film, 12 is a primary coil, 13 is a secondary coil, and 17 and 18 insulate the magnetic thin film from the coil. Is a part of the insulating layer. 2 (a),
(B) shows the coil structure of the present invention, (a) is an overall view of the primary coil 12, and (b) is an overall view of the secondary coil 13. FIG. 3 is a cross-sectional view taken along the line AB of FIG.
11 is an upper magnetic thin film, 12 is a primary coil, 13 is a secondary coil, 14 is a lower magnetic thin film, 15 is a support, 16, 1
Reference numerals 7 and 18 are insulating layers. The upper magnetic thin film 11 is provided with a portion 19 protruding from the peripheral edge of the lower magnetic thin film 14. Further, the insulating layer 17 is provided with a portion 20 protruding to the peripheral edge of the insulating layer 16, and the insulating layer 18 is provided with a portion 21 protruding to the peripheral edge of the insulating layer 17.

【0011】図4は、図1のC−D線断面図で、1次コ
イル12と磁性薄膜11と14を絶縁するための絶縁層
の部分である。15が支持体、17と18が絶縁層であ
る。絶縁層18には絶縁層17の周縁にはみ出た部分2
2が設けられる。
FIG. 4 is a sectional view taken along the line C--D in FIG. 1, which shows an insulating layer portion for insulating the primary coil 12 from the magnetic thin films 11 and 14. Reference numeral 15 is a support, and 17 and 18 are insulating layers. The insulating layer 18 has a portion 2 protruding from the periphery of the insulating layer 17.
Two are provided.

【0012】図5は、図1のE−F線断面図で、2次コ
イル13と磁性薄膜11と14を絶縁するための絶縁層
の部分である。15が支持体、16,17が絶縁層であ
る。絶縁層17には絶縁層16の周縁にはみ出た部分2
3が設けられる。
FIG. 5 is a sectional view taken along the line EF of FIG. 1 and shows an insulating layer portion for insulating the secondary coil 13 from the magnetic thin films 11 and 14. Reference numeral 15 is a support, and 16 and 17 are insulating layers. The insulating layer 17 has a portion 2 protruding from the periphery of the insulating layer 16.
3 is provided.

【0013】図3から分かるように、絶縁層17が、内
部の2次コイル13と絶縁層16を包み込み、はみ出た
部分20で下層の磁性薄膜14に密着し、あたかも糊づ
けしているような形態にしてある。また、絶縁層18が
その外部にはみ出た部分21で、下層の磁性薄膜14に
糊づけし、上層の磁性薄膜11は、内部の絶縁層16〜
18、コイル12,13及び下層の磁性薄膜14を全部
包み込んで、はみ出た部分19で支持体15に密着、糊
づけしている形態にしてある。図4、図5についても同
様で、上側の絶縁層18,17で内部を包み込んで、周
縁のはみ出た部分22,23で支持体15に糊づけして
いるような形態で密着している。
As can be seen from FIG. 3, the insulating layer 17 encloses the secondary coil 13 and the insulating layer 16 inside, and the protruding portion 20 adheres to the lower magnetic thin film 14 and seems to be glued. It is in the form. Further, the insulating layer 18 is glued to the lower magnetic thin film 14 at the portion 21 protruding to the outside thereof, and the upper magnetic thin film 11 is attached to the inner insulating layers 16 to 16.
18, the coils 12, 13 and the lower magnetic thin film 14 are all wrapped up, and the protruding portion 19 is in close contact with and glued to the support 15. The same applies to FIGS. 4 and 5, in which the inside is wrapped with the upper insulating layers 18 and 17, and the protruding portions 22 and 23 at the peripheral edges are adhered to the support 15 in such a manner as to be glued.

【0014】以上のように本発明の特長は、上の層が内
部を包み込んで周縁で積層数を少なくし、膜の積層歪み
が小さい状態で下の層、または支持体に密着させている
ということである。
As described above, the feature of the present invention is that the upper layer wraps the inside to reduce the number of laminated layers at the peripheral edge, and the layer is adhered to the lower layer or the support in a state where the laminating strain of the film is small. That is.

【0015】以上の実施例では磁性薄膜トランスの場合
について述べたが、励磁導体コイルを包み込むように形
成された磁性薄膜を有する、いわゆる閉磁路構造の磁性
薄膜インダクタに上記の方法を適用した場合においても
同等の効果を奏することは明らかである。
In the above embodiments, the case of the magnetic thin film transformer was described, but in the case where the above method is applied to a magnetic thin film inductor having a so-called closed magnetic circuit structure, which has a magnetic thin film formed so as to enclose an exciting conductor coil. It is clear that also produces the same effect.

【0016】[0016]

【発明の効果】以上述べたように本発明によれば、周縁
部の積層数を最小にすることができるので、周縁部での
積層歪みを最小にすることができる。その結果、従来の
実施例では、超音波洗浄の工程において、磁性薄膜トラ
ンスの周縁部から少しずつ浮き上がって、剥離しかける
こともあったが、本発明によって、超音波洗浄の工程に
おいて、そのような問題がなくなった。また、従来の実
施例では、フォトレジストの現像工程や流水洗浄の工程
において、磁性薄膜トランスの周縁部の積層歪みによる
局部的な密着不良部から液体が浸み込み、じわじわ剥離
するということもあったが、本発明によってそのような
問題は解決できた。以上のように、本発明は作製歩留を
大幅に向上させた。
As described above, according to the present invention, it is possible to minimize the number of laminated layers in the peripheral portion, and thus it is possible to minimize the lamination strain in the peripheral portion. As a result, in the conventional example, in the ultrasonic cleaning process, the magnetic thin film transformer may be gradually lifted up from the peripheral portion and may be peeled off. However, according to the present invention, in the ultrasonic cleaning process, The problem is gone. Further, in the conventional example, in the process of developing the photoresist and the process of washing with running water, the liquid may infiltrate and peel off gradually from the locally defective adhesion portion due to the stacking distortion of the peripheral portion of the magnetic thin film transformer. However, the present invention has solved such a problem. As described above, the present invention significantly improves the production yield.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例を示す上面図である。FIG. 1 is a top view showing an embodiment of the present invention.

【図2】本発明に係るコイルの一例を示す構成図であ
る。
FIG. 2 is a configuration diagram showing an example of a coil according to the present invention.

【図3】図1のA−B線断面図である。3 is a cross-sectional view taken along the line AB of FIG.

【図4】図1のC−D線断面図である。4 is a cross-sectional view taken along the line CD of FIG.

【図5】図1のE−F線断面図である。5 is a cross-sectional view taken along the line EF of FIG.

【図6】従来の磁性薄膜トランスを示す一部切欠斜視図
である。
FIG. 6 is a partially cutaway perspective view showing a conventional magnetic thin film transformer.

【符号の説明】[Explanation of symbols]

11…上層磁性薄膜、12…1次コイル、13…2次コ
イル、14…下層磁性薄膜、15…支持体、16,1
7,18…絶縁層。
11 ... Upper magnetic thin film, 12 ... Primary coil, 13 ... Secondary coil, 14 ... Lower magnetic thin film, 15 ... Support, 16, 1
7, 18 ... Insulating layer.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 磁性薄膜トランス、磁性薄膜インダクタ
等の薄膜磁気素子において、絶縁層、導体パターン層を
挾んで複数の磁性薄膜を積層する場合に、磁性薄膜の周
縁部において、上層磁性薄膜が下層磁性薄膜の外部には
み出すように積層することを特徴とする薄膜磁気素子。
1. In a thin film magnetic element such as a magnetic thin film transformer or a magnetic thin film inductor, when a plurality of magnetic thin films are laminated with an insulating layer and a conductor pattern layer interposed therebetween, an upper magnetic thin film is a lower layer at a peripheral portion of the magnetic thin film. A thin film magnetic element characterized by being stacked so as to extend outside a magnetic thin film.
【請求項2】 磁性薄膜トランス、磁性薄膜インダクタ
等の薄膜磁気素子において、磁性薄膜や導体パターン層
を絶縁するため、上部絶縁層が下部絶縁層の外部にはみ
出すように積層することを特徴とする薄膜磁気素子。
2. In a thin film magnetic element such as a magnetic thin film transformer or a magnetic thin film inductor, in order to insulate the magnetic thin film and the conductor pattern layer, the upper insulating layer is laminated so as to extend outside the lower insulating layer. Thin film magnetic element.
JP3164229A 1991-07-04 1991-07-04 Thin film magnetic element Expired - Lifetime JPH0673335B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3164229A JPH0673335B2 (en) 1991-07-04 1991-07-04 Thin film magnetic element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3164229A JPH0673335B2 (en) 1991-07-04 1991-07-04 Thin film magnetic element

Publications (2)

Publication Number Publication Date
JPH0684639A JPH0684639A (en) 1994-03-25
JPH0673335B2 true JPH0673335B2 (en) 1994-09-14

Family

ID=15789129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3164229A Expired - Lifetime JPH0673335B2 (en) 1991-07-04 1991-07-04 Thin film magnetic element

Country Status (1)

Country Link
JP (1) JPH0673335B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5126243B2 (en) 2010-02-08 2013-01-23 株式会社村田製作所 Electronic components
JP6690386B2 (en) * 2016-04-27 2020-04-28 Tdk株式会社 Coil parts and power circuit unit

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4713711A (en) * 1985-05-08 1987-12-15 International Business Machines Thin film magnetic transducer having center tapped winding
JPS61255517A (en) * 1985-05-09 1986-11-13 Seiko Epson Corp Magnetic head
JPS6324680A (en) * 1986-07-17 1988-02-02 Toshiba Corp Manufacture of thin film of semiconductor element
JPH07107731B2 (en) * 1986-10-24 1995-11-15 シャープ株式会社 Yoke type thin film magnetic head
JPS63253513A (en) * 1987-04-09 1988-10-20 Yamaha Corp Thin-film magnetic head
JPS6415926A (en) * 1987-07-09 1989-01-19 Nec Corp Forming method of fine pattern
JPH0268704A (en) * 1988-09-02 1990-03-08 Yamaha Corp Manufacture of thin film head

Also Published As

Publication number Publication date
JPH0684639A (en) 1994-03-25

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