JPH0675094B2 - Semiconductor device testing equipment - Google Patents
Semiconductor device testing equipmentInfo
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- JPH0675094B2 JPH0675094B2 JP12102486A JP12102486A JPH0675094B2 JP H0675094 B2 JPH0675094 B2 JP H0675094B2 JP 12102486 A JP12102486 A JP 12102486A JP 12102486 A JP12102486 A JP 12102486A JP H0675094 B2 JPH0675094 B2 JP H0675094B2
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Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、半導体素子のα線照射による誤動作を試験す
るための装置に関する。The present invention relates to an apparatus for testing malfunction of a semiconductor element due to α-ray irradiation.
半導体素子の誤動作の1つにソフトエラーがある。この
原因となるα線の発生源は、半導体素子を構成している
Siチツプ,Al配線,ガラス保護膜その他の材料及びこれ
らをパツケージするためのプラスチツク,セラミツクそ
の他の材料中に、ppbオーダで微量に含まれているU,Th
等の自然放射性物質である。U,Th等は自然崩壊によつて
α粒子(Heの原子核)を放出する。A soft error is one of the malfunctions of semiconductor devices. The source of α-rays that cause this constitutes a semiconductor element.
Si chips, Al wirings, glass protective films and other materials, and plastics, ceramics and other materials for packaging these, which are contained in trace amounts on the order of ppb, U and Th.
Is a naturally radioactive substance such as. U, Th, etc. emit α particles (He nuclei) by spontaneous decay.
第2図10は半導体装置のパツケージ材から放出されるα
粒子数NとエネルギーEの関係を表わしたα線のエネル
ギースペクトルである。これらのα線エネルギー分布は
連続的に幅の広い分布を示し、これらα粒子が半導体素
子に入射すると、この飛程に沿つて電子−正孔対を生成
させる。MOSダイナミツクメモリでは、これらの生成さ
れた電子がメモリセルの空のポテンシヤル井戸部に、一
定以上蓄積するとソフトエラーが発生する。又、高速バ
イポーラスタチツクメモリでは、生成された電子が雑音
電流として流れソフトエラーを発生させる。このような
ソフトエラーは半導体素子の高集積化,高速化に伴い増
加する傾向にある。2 Fig. 10 shows α emitted from the package material of the semiconductor device.
It is the energy spectrum of the alpha ray showing the relationship between the number N of particles and the energy E. These α-ray energy distributions continuously show a wide distribution, and when these α-particles enter a semiconductor device, electron-hole pairs are generated along this range. In the MOS dynamic memory, a soft error occurs when these generated electrons accumulate in the empty potential well portion of the memory cell for a certain amount or more. Further, in the high speed bipolar static memory, the generated electrons flow as a noise current to cause a soft error. Such soft errors tend to increase with higher integration and higher speed of semiconductor devices.
そこで半導体素子のα線によるソフトエラーの評価を行
う必要が生じ、本発明の創生に至つた。この評価を行う
場合、パツケージ材から自然に放出されるα粒子だけで
は、α線の密度が非常に小さいため試験に長時間を要す
ることとなる。従つて一般にはα線密度の大きい自然放
射性物質又は人工放射性物質を用い加速試験を行うが、
加速試験に用いるα線源は、あるエネルギー値にピーク
を持つ単一エネルギー分布(第2図11)であり、実際の
パツケージ材から放出されるエネルギースペクトル10と
比べ大きく異なつている。この様なα線源を用い半導体
素子のソフトエラーを評価すると実際の結果と大きく異
なり問題であつた。またソフトエラー率は半導体素子に
照射するα線エネルギーに依存すると考えられている
が、従来の装置では、照射α線エネルギーを可変するこ
とができなかつた。Therefore, it became necessary to evaluate the soft error due to the α ray of the semiconductor element, which led to the creation of the present invention. When this evaluation is performed, it takes a long time for the test only with α particles naturally emitted from the package material, because the α ray density is very small. Therefore, generally, an accelerated test is performed using a natural radioactive material or an artificial radioactive material with a high α-ray density.
The α-ray source used in the acceleration test has a single energy distribution having a peak at a certain energy value (Fig. 2, Fig. 11), which is greatly different from the energy spectrum 10 emitted from the actual package material. When the soft error of the semiconductor device was evaluated using such an α-ray source, there was a problem, which was significantly different from the actual result. Further, the soft error rate is considered to depend on the α-ray energy with which the semiconductor element is irradiated, but in the conventional device, the irradiation α-ray energy could not be varied.
上記問題を解決する装置としては、実開昭55−118175に
記載のように、α線源と被試験半導体装置間のα線通過
経路上に金属製薄板を化学エツチング等して表面を不規
則にしたものや、薄い金属材料等を積層したものをα線
エネルギー減速材として用い、この減速材中をα線が通
過することにより連続的で幅の広いエネルギー分布を発
生させていた。As an apparatus for solving the above problem, as described in Japanese Utility Model Laid-Open No. 55-118175, a metal thin plate is chemically etched on the α-ray passing path between the α-ray source and the semiconductor device under test so that the surface is irregular. The α-ray energy moderator that is formed by laminating a thin metal material or the like is used as the α-ray energy moderator, and α-rays pass through the moderator to generate a continuous and wide energy distribution.
また他の装置としては、特願昭59−264459に記載のよう
に、真空中においてα線源と被試験半導体素子間のα線
通過経路上に、厚さの異なる複数のα線エネルギー減速
材部片を同一回転平面上に設けて、円板状の減速材を形
成し、前記α線源からのα線を、回転させた前記減速材
中に通過させることにより、連続的で幅の広いエネルギ
ー分布を発生させていた。As another device, as described in Japanese Patent Application No. 59-264459, a plurality of α-ray energy moderators having different thicknesses are provided on the α-ray passing path between the α-ray source and the semiconductor device under test in vacuum. By providing the pieces on the same rotation plane to form a disk-shaped moderator, and passing the α-rays from the α-ray source into the rotated moderator, it is possible to make the moderator continuous and wide. The energy distribution was generated.
また被試験半導体素子に照射するα線エネルギーを可変
できる装置としては、特開昭56−48146に記載のよう
に、真空中において、α線源と被試験半導体素子間のα
線通過経路上に、αエネルギー減速材フイルムを配置
し、この減速材フイルムの厚さ,枚数,材質のうちの少
なくとも一つを変更することにより、被試験半導体装置
に入射するα線エネルギーを可変できるようにしていた
ものもある。Further, as an apparatus capable of varying the α-ray energy applied to a semiconductor element under test, as described in JP-A-56-48146, an α-ray between an α-ray source and a semiconductor element under test in vacuum is used.
The α-energy moderator film is arranged on the ray passage, and the α-ray energy incident on the semiconductor device under test can be varied by changing at least one of the thickness, the number and the material of the moderator film. There were also things I was able to do.
上記従来技術には以下のような問題点がある。 The above conventional technique has the following problems.
1.α線エネルギーの減速材として、金属,有機薄膜を用
いているが、1)これらは、α線照射に対して永久的に
使用できるものではなく、経時的に劣化し特性が変化す
るので、再現性ある特性の補償を行う必要がある。2)
所望するα線エネルギーの減衰量を得るための手段とし
て、減速材の厚さ,枚数,材質等を変える必要があり、
予めこれ等各パラメータとエネルギ減衰量の関係を求め
ておく必要があり補償が一時的なものとなる。1. Metals and organic thin films are used as moderators for α-ray energy, but 1) these cannot be permanently used for α-ray irradiation and deteriorate over time and their characteristics change. , It is necessary to compensate for reproducible characteristics. 2)
As a means for obtaining a desired amount of attenuation of α-ray energy, it is necessary to change the thickness, number, and material of the moderator,
The relationship between each of these parameters and the amount of energy attenuation needs to be obtained in advance, and the compensation becomes temporary.
2.金属製薄板を化学エツチング等して、表面を不規則に
したものや、薄い金属材料等を積層したものをα線エネ
ルギー減速材として使用した場合、その減衰材の物理的
な場所において、これを通過するα線のエネルギー減衰
量が異なるだけである。即ち、被試験半導体装置の物理
的な同一箇所においては常に一定値のα線エネルギーし
か照射されない。即ちα線照射対称の寸法精度に対し、
表面の不規則性が顕著となり均一な照射が行えない。2.When a thin metal plate is chemically etched, the surface is made irregular, or a thin metal material is laminated as an α-ray energy moderator, in the physical location of the attenuator, The only difference is the amount of energy attenuation of α rays passing through this. That is, the same physical position of the semiconductor device under test is always irradiated with a constant value of α-ray energy. That is, for dimensional accuracy of α-ray irradiation symmetry,
Irregularity of the surface becomes remarkable and uniform irradiation cannot be performed.
3.減速材の処理方法として化学エツチングを行なつた場
合、減速材表面のエツチング度合,形状が同じものを作
ることは難しい。即ち、個々の減速材によつてエネルギ
ースペクトルが異なつてしまう。3. When chemical etching is used as a moderator processing method, it is difficult to make the moderator surface with the same etching degree and shape. That is, the energy spectrum varies depending on each moderator.
4.真空中において、ECL系(Emitter Coupled Logic)バ
イポーラRAMのような、大きい消費電力を有する半導体
素子のソストエラー評価を行う場合、半導体素子からの
自己発熱により素子の電気的特性を変化させてしまうこ
とがある。このため半導体素子の冷却が必要とするが、
真空中であるためヒートパイプ、ペルチエ効果素子等を
用いても、十分な冷却を行うことが技術的に難しくな
る。4. When evaluating the sost error of a semiconductor device with large power consumption such as ECL (Emitter Coupled Logic) bipolar RAM in vacuum, the electrical characteristics of the device will change due to self-heating from the semiconductor device. Sometimes. Therefore, it is necessary to cool the semiconductor element,
Since it is in a vacuum, it is technically difficult to perform sufficient cooling even if a heat pipe, a Peltier effect element, or the like is used.
5.真空中で評価する場合、真空チヤンバ,真空ポンプ,
真空計等の種々の装置が必要であり、又これらの装置を
収容するための真空チヤンバが大きくなるので、真空に
引く時間が数十分かかり、装置の経済性,作業性,保守
性の面で改善の余地を残す。5. When evaluating in vacuum, vacuum chamber, vacuum pump,
Since various devices such as vacuum gauges are required, and the vacuum chamber for accommodating these devices becomes large, it takes several tens of minutes to evacuate the vacuum, and the cost, workability, and maintainability of the device are reduced. Leave room for improvement.
本発明の目的は、上記した従来技術の問題点をなくし、
半導体素子のソフトエラーを評価するための装置を提供
することにある。The object of the present invention is to eliminate the above-mentioned problems of the prior art,
An object is to provide an apparatus for evaluating a soft error of a semiconductor device.
上記目的を達成するため、α線エネルギーの減速材とし
て空気を用いること、換言すればα線源と被試験半導体
素子間に距離を確保することで、照射するα線のエネル
ギー分布を作り出すこととした。In order to achieve the above object, air is used as a moderator for α-ray energy, in other words, a distance is secured between the α-ray source and the semiconductor device under test to create an energy distribution of α-rays to be irradiated. did.
問題点を解決するための手段としては、α線源と被試験
半導体素子との相対距離を任意の値に制御する手段及び
その制御手段を所定のエネルギー分布が得られるよう駆
動する手段が挙げられよう。Means for solving the problem include means for controlling the relative distance between the α-ray source and the semiconductor device under test to an arbitrary value and means for driving the control means so as to obtain a predetermined energy distribution. See.
具体的には、α線源と被試験半導体素子間の距離lを、
α線源駆動制御装置により制御する。そして、予め距離
lとα線エネルギー減衰量の関係を測定し、この結果に
基づいて被試験半導体素子に照射するα線エネルギー分
布を計算し、α線源を断続・連続的に移動させ距離lを
制御することにより、α線エネルギー可変及び連続的で
幅の広いエネルギー分布を発生する。Specifically, the distance l between the α-ray source and the semiconductor device under test is
It is controlled by the α-ray source drive control device. Then, the relationship between the distance l and the α-ray energy attenuation is measured in advance, and the α-ray energy distribution for irradiating the semiconductor device under test is calculated based on this result, and the α-ray source is intermittently and continuously moved to move the distance l. By controlling .alpha.-ray energy and generating a continuous and wide energy distribution.
予め距離lとα線エネルギー減衰量の関係を測定し、こ
の結果を基に被試験半導体素子に照射されるα線エネル
ギー分布を計算し、α線源をα線源移動制御装置で断続
・連続的に移動させ距離lを制御することにより、α線
エネルギー及びエネルギー分布を調節する。The relationship between the distance 1 and the α-ray energy attenuation is measured in advance, the α-ray energy distribution irradiated to the semiconductor device under test is calculated based on this result, and the α-ray source is intermittently / continuously controlled by the α-ray source movement control device. The α-ray energy and the energy distribution are adjusted by controlling the distance 1 by moving the magnetic field.
以下、本発明の一実施例を図面を参照して説明する。 An embodiment of the present invention will be described below with reference to the drawings.
α線は電離作用が大きく、ある物質中にα線が侵入する
と、その物質への電離作用によりα線はエネルギーを減
衰させ、ついには消滅してしまう。α-rays have a large ionizing action, and when α-rays penetrate into a certain substance, the α-rays attenuate energy by the ionizing action on the substance and finally disappear.
初期にα線が持つているエネルギーをE,物質中を通過し
てα線が消滅するまでに進んだ距離を飛程Rとすると、
R∝E3/2の関係がある。空気中の場合、RとEの関係
は、ガイガーの式R=0.318・E3/2で表わされ第3図の
ようになる。しかし、実際に加速評価に用いるα線源
は、第2図に示すように、あるエネルギー値にピークを
持つ単一エネルギー分布11であるため、直接第3図の関
係式から、そのエネルギー分布の減衰量を求めることは
できない。そこで、第4図に示すようにα線源とα線エ
ネルギー分布を分析する検出器間の距離をlとし、lを
パラメータとした場合のエネルギー分布の変化を調べ
る。その結果、距離lがl0,l1,l2,l3,l4(l0<l1<
l2<l3<l4)と大きくなるに従い、空気中でのα線エネ
ルギー減衰量が大きくなり、検出器に入射するα線のエ
ネルギー分布はNo(E),N1(E),N2(E),N
3(E),N4(E)とエネルギー値が小さい方へシフト
していき、それと同時にα粒子数のピーク値も減少して
いくことが判明した。Let E be the energy that α rays initially have, and range R that is the distance that α rays disappear after passing through the substance.
There is a relationship of R∝E 3/2 . In air, the relation between R and E is expressed by Geiger's equation R = 0.318 · E 3/2 and is as shown in FIG. However, the α-ray source actually used for acceleration evaluation has a single energy distribution 11 having a peak at a certain energy value, as shown in FIG. The amount of attenuation cannot be calculated. Therefore, as shown in FIG. 4, the distance between the α-ray source and the detector for analyzing the α-ray energy distribution is set to 1, and the change in the energy distribution when 1 is used as a parameter is examined. As a result, the distance l becomes l 0 , l 1 , l 2 , l 3 , l 4 (l 0 <l 1 <
As 2 2 <l 3 <l 4 ) increases, the amount of α-ray energy attenuation in the air increases, and the energy distribution of α-rays incident on the detector is N o (E), N 1 (E), N 2 (E), N
It was found that the energy values of 3 (E) and N 4 (E) shift to smaller values, and at the same time, the peak value of the number of α particles also decreases.
そこで、予め距離lとα線エネルギー減衰量の関係を測
定しておき、このデータを基に照射させたいα線エネル
ギー分布の発生条件(距離lと距離lを保持しておく時
間t)を、計算(シミユレーシヨン)により求め、その
結果を用い、α線源をα線源移動制御装置で制御させな
がら、被試験半導体素子にα線を照射させてソフトエラ
ーの評価を行う。Therefore, the relationship between the distance 1 and the amount of α-ray energy attenuation is measured in advance, and the generation condition of the α-ray energy distribution to be irradiated (the time t for holding the distance 1 and the distance 1) is determined based on this data. The soft error is evaluated by irradiating the semiconductor element under test with α-rays while controlling the α-ray source by the α-ray source movement control device, using the result obtained by calculation (simulation).
つまり、第5図に示すような連続的で幅の広いα線エネ
ルギー分布12を発生させたい場合、この単一分布の合計
として現わすことができ、各単一分布を発生させるため
のα線源の移動距離lと、そこでα線を保持している時
間tの関係を求めればよく、その関係は第6図に示すよ
うになる。なお、時間tの選択に関しては、第7図に示
すように距離lを一定にして保持時間tをt0′<t1′<
t2′<t3′と長くすれば、α線エネルギーEを一定にし
たまま、その単一分布のα粒子数だけを増やすことがで
きる。That is, when it is desired to generate a continuous and wide α-ray energy distribution 12 as shown in FIG. 5, it can be expressed as the sum of this single distribution, and α-rays for generating each single distribution can be expressed. The relationship between the moving distance l of the source and the time t during which the α ray is held may be obtained, and the relationship is as shown in FIG. Regarding the selection of the time t, the holding time t is t 0 ′ <t 1 ′ <with the distance 1 kept constant as shown in FIG.
By increasing t 2 ′ <t 3 ′, it is possible to increase the number of α particles in the single distribution while keeping the α-ray energy E constant.
第1図は本発明の一実施例に係る試験装置の構成図であ
る。第1図において、1はα線を放出するα線源,2はα
線源1を上下に移動させ所要時間保持するためのα線源
移動制御装置,3は被試験半導体素子,4は被試験半導体素
子3から信号を取り出すためのソケツト,5は被試験半導
体素子3から読出したデータを正常データと比較しソフ
トエラーが発生したかどうかをチエツクするソフトエラ
ー検出テスター,6はα線源1から放出されるα線エネル
ギーを検出するための検出器,7は検出器6からの信号を
処理し、α線源1から放出されるα線エネルギー分布を
測定する波高分析装置,8は被試験半導体素子3に照射さ
れるα線エネルギー分布をシミユレーシヨンし、その発
生条件を設定するための計算機,9は被試験半導体素子3
に対して外部から進入する光を遮へいするための暗箱で
ある。FIG. 1 is a configuration diagram of a test apparatus according to an embodiment of the present invention. In FIG. 1, 1 is an α-ray source that emits α-rays, and 2 is an α-ray source.
An α-ray source movement control device for moving the radiation source 1 up and down and holding it for a required time, 3 is a semiconductor device under test, 4 is a socket for extracting a signal from the semiconductor device under test 3, and 5 is a semiconductor device under test 3 A soft error detection tester that compares the data read from the normal data with the normal data to check whether a soft error has occurred, 6 is a detector for detecting the α-ray energy emitted from the α-ray source 1, and 7 is a detector A wave height analyzer for processing the signal from 6 and measuring the α-ray energy distribution emitted from the α-ray source 1, 8 simulates the α-ray energy distribution with which the semiconductor element 3 under test is irradiated, and determines the generation conditions. Calculator for setting, 9 is the semiconductor device under test 3
It is a dark box that shields light coming in from the outside.
図示の例では、被試験半導体素子3(ソケツト4)はα
線源1の真下に位置し、検出器6はその横に配置されて
いるが、これら被試験半導体素子3(ソケツト4)と検
出器6との夫々の配置は適宜交換できるようになつてい
る。In the illustrated example, the semiconductor device under test 3 (socket 4) is α
The detector 6 is located right below the radiation source 1 and is arranged beside it, but the respective arrangements of the semiconductor device under test 3 (socket 4) and the detector 6 can be appropriately exchanged. .
以上述べた装置の動作について説明する。まずα線源1
と検出器6間の距離lをパラメータとして、第4図に示
す様な各距離l0,l1,…lnにおけるα線エネルギー分布
N0(E),N1(E),……Nn(E)を波高分析装置7を
用い一定時間T0測定し、このデータを基礎データとして
計算機8に入力する。計算機8では、被試験半導体素子
3に照射させるα線エネルギー分布を、上記基礎データ
を用いシミユレーシヨンし、その発生条件(距離lと距
離lの保持時間t)を求める。この際、発生させるα線
エネルギー分布をN(E)とすると、 の関係式から発生分布を計算することができ、第6図に
示すようなlとtの関係を求めることができる。次に、
求めたlとtの関係を用い、α線源駆動・制御装置2が
α線源1を断続・連続的に移動制御することによつて、
照射α線エネルギーの可変及び連続的で幅の広いα線エ
ネルギー分布を発生させることができる。そして、α線
源1の真下に被試験半導体素子3(ソケツト4)を配置
し、α線を被試験半導体素子3に照射し、ソフトエラー
検出テスタ5で、被試験半導体素子3からのデータを読
出し、そのデータと正常データとを比較させ、ソフトエ
ラーが発生したかどうかを調べる。The operation of the apparatus described above will be described. First α source 1
Using the distance l between the detector and the detector 6 as a parameter, the α-ray energy distribution at each distance l 0 , l 1 , ... In as shown in FIG.
N 0 (E), N 1 (E), ... Nn (E) is measured for a certain period of time T 0 by using the wave height analyzer 7, and this data is input to the computer 8 as basic data. The computer 8 simulates the α-ray energy distribution with which the semiconductor element 3 to be tested is irradiated using the above-mentioned basic data, and obtains the generation condition (distance 1 and holding time t of the distance 1). At this time, if the generated α-ray energy distribution is N (E), The generation distribution can be calculated from the relational expression of, and the relationship between l and t as shown in FIG. 6 can be obtained. next,
By using the obtained relationship between l and t, the α-ray source drive / control device 2 intermittently and continuously controls the movement of the α-ray source 1.
The irradiation α-ray energy can be varied and a continuous and wide α-ray energy distribution can be generated. Then, the semiconductor device under test 3 (socket 4) is arranged directly under the α-ray source 1, the semiconductor device under test 3 is irradiated with α-rays, and the data from the semiconductor device under test 3 is read by the soft error detection tester 5. Read and compare the data with normal data to check if a soft error has occurred.
以上述べたように、空気中でα線源と検出器間の距離に
おけるα線エネルギー減衰量の関係を求め、希望するα
線エネルギー分布の発生条件(距離lと距離lの保持時
間t)を求め、この結果を基にα線源駆動・制御装置が
α線源を制御することにより、被試験半導体素子に入射
するα線エネルギーを変えたり、連続的で幅の広いα線
エネルギー分布を発生することができ、被試験半導体素
子のソフトエラーを従来よりも正確に評価することがで
きる。As described above, the relationship between the α-ray energy attenuation in the distance between the α-ray source and the detector in air is obtained, and the desired α
The generation condition of the line energy distribution (distance 1 and holding time t of the distance 1) is obtained, and the α-ray source drive / control device controls the α-ray source based on this result, so that the incident α on the semiconductor device under test. It is possible to change the line energy and generate a continuous and wide α-ray energy distribution, and it is possible to evaluate the soft error of the semiconductor device under test more accurately than before.
本発明装置によれば、従来の方法に比べ簡単な方法でエ
ネルギーにピークを持つ単一エネルギー分布のα線源か
ら、空気中で低いエネルギー領域を持つ広範囲の連続的
なエネルギー分布を発生させることができ、実際のパツ
ケージ材から放出されるα線エネルギー分布に近い状態
を再現でき、半導体装置のソフトエラー率を従来よりも
正確に評価することができる。According to the device of the present invention, it is possible to generate a wide range continuous energy distribution having a low energy region in air from an α-ray source having a single energy distribution having a peak in energy by a method simpler than the conventional method. Therefore, the state close to the α-ray energy distribution emitted from the actual package material can be reproduced, and the soft error rate of the semiconductor device can be evaluated more accurately than before.
また、半導体素子に照射するα線エネルギーを変えて、
半導体素子のα線耐量(α線エネルギー依存性)を測定
することにより、半導体素子の構造に対応した評価がで
き、ソフトエラー障害のメカニズム解析が可能となる。Also, by changing the α-ray energy applied to the semiconductor element,
By measuring the α-ray radiation resistance (α-ray energy dependence) of the semiconductor element, it is possible to perform an evaluation corresponding to the structure of the semiconductor element and to analyze the mechanism of the soft error failure.
第1図は本発明の一実施例に係る試験装置の構成図、第
2図は半導体装置のパツケージ材とα線源から放出され
るα線エネルギー分布図、第3図は空気中におけるα粒
子エネルギーと飛程の関係を示す図、第4図(a)はα
線源と検出器との位置関係を示す図、第4図(b)は空
気中におけるα線源とα粒子エネルギー検出器間距離を
パラメータにした時のα線エネルギー分布図、第5図は
本発明装置により発生するα線連続エネルギー分布の一
例を示す図、第6図は本発明装置により発生するα線エ
ネルギー分布の発生条件を示すタイムチヤート図、第7
図はα線源と検出器間距離を一定にし、α線照射時間を
パラメータにした時のα線エネルギー分布図である。 1…α線源 2…α線源駆動・制御装置 3…被試験半導体装置FIG. 1 is a configuration diagram of a test apparatus according to an embodiment of the present invention, FIG. 2 is a distribution chart of α-ray energy emitted from a package material of a semiconductor device and an α-ray source, and FIG. 3 is an α-particle in air. A diagram showing the relationship between energy and range, Fig. 4 (a) is α
FIG. 4 (b) is a diagram showing the positional relationship between the radiation source and the detector, FIG. 4 (b) is an α-ray energy distribution diagram when the distance between the α-ray source and the α-particle energy detector in air is used as a parameter, and FIG. 5 is FIG. 6 is a diagram showing an example of an α-ray continuous energy distribution generated by the device of the present invention, FIG. 6 is a time chart showing the generation condition of the α-ray energy distribution generated by the device of the present invention, FIG.
The figure is an α-ray energy distribution diagram when the distance between the α-ray source and the detector is fixed and the α-ray irradiation time is used as a parameter. 1 ... α-ray source 2 ... α-ray source drive / control device 3 ... Semiconductor device under test
Claims (1)
該半導体素子のα線による誤動作を試験する半導体素子
の試験装置において、 空気中に置かれたα線源と、該α線源と被試験半導体素
子との間の距離を制御する手段とを備え、前記距離と該
距離を保持する時間とを適宜設定し、被試験半導体素子
に所要のエネルギー及びエネルギー分布をもつα線を照
射することを特徴とする半導体素子の試験装置。1. A semiconductor device testing apparatus for irradiating a semiconductor device under test with α-rays to test malfunctions of the semiconductor device due to α-rays, wherein an α-ray source placed in air and the α-rays are used. Means for controlling the distance between the source and the semiconductor device under test, the distance and the time for holding the distance are appropriately set, and the α-ray having the required energy and energy distribution is applied to the semiconductor device under test. A semiconductor device testing device characterized by irradiation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12102486A JPH0675094B2 (en) | 1986-05-28 | 1986-05-28 | Semiconductor device testing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12102486A JPH0675094B2 (en) | 1986-05-28 | 1986-05-28 | Semiconductor device testing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62278470A JPS62278470A (en) | 1987-12-03 |
| JPH0675094B2 true JPH0675094B2 (en) | 1994-09-21 |
Family
ID=14800925
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12102486A Expired - Fee Related JPH0675094B2 (en) | 1986-05-28 | 1986-05-28 | Semiconductor device testing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0675094B2 (en) |
-
1986
- 1986-05-28 JP JP12102486A patent/JPH0675094B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62278470A (en) | 1987-12-03 |
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