JPH0675285B2 - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPH0675285B2 JPH0675285B2 JP14873285A JP14873285A JPH0675285B2 JP H0675285 B2 JPH0675285 B2 JP H0675285B2 JP 14873285 A JP14873285 A JP 14873285A JP 14873285 A JP14873285 A JP 14873285A JP H0675285 B2 JPH0675285 B2 JP H0675285B2
- Authority
- JP
- Japan
- Prior art keywords
- containing layer
- magnetic recording
- recording medium
- thin film
- metal oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000005291 magnetic effect Effects 0.000 title claims description 26
- 239000010409 thin film Substances 0.000 claims description 24
- 230000005294 ferromagnetic effect Effects 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- 229910044991 metal oxide Inorganic materials 0.000 claims description 15
- 150000004706 metal oxides Chemical class 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 11
- 229920002627 poly(phosphazenes) Polymers 0.000 claims description 10
- 239000002131 composite material Substances 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 5
- 239000010936 titanium Substances 0.000 claims description 4
- 229910000859 α-Fe Inorganic materials 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims 1
- 229910001930 tungsten oxide Inorganic materials 0.000 claims 1
- 239000010408 film Substances 0.000 description 18
- 238000000034 method Methods 0.000 description 8
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 239000000314 lubricant Substances 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000007733 ion plating Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- -1 polyethylene terephthalate Polymers 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- LMHHRCOWPQNFTF-UHFFFAOYSA-N s-propan-2-yl azepane-1-carbothioate Chemical compound CC(C)SC(=O)N1CCCCCC1 LMHHRCOWPQNFTF-UHFFFAOYSA-N 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000005340 laminated glass Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229940043265 methyl isobutyl ketone Drugs 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- GKTNLYAAZKKMTQ-UHFFFAOYSA-N n-[bis(dimethylamino)phosphinimyl]-n-methylmethanamine Chemical compound CN(C)P(=N)(N(C)C)N(C)C GKTNLYAAZKKMTQ-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- CXGONMQFMIYUJR-UHFFFAOYSA-N perfluorododecanoic acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F CXGONMQFMIYUJR-UHFFFAOYSA-N 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は、情報産業分野等で利用される高記録密度の磁
気記録媒体に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high recording density magnetic recording medium used in the information industry field and the like.
従来の技術 情報の高密度記録の要求にともない有機バインダーにγ
−Fe2O3等強磁性粉末を分散させた塗布型磁気記録媒体
に代って、プラスチック等の非磁性基板に真空蒸着法,
スパッタリング法,イオンプレーティング法等で直接強
磁性金属薄膜を設けた磁気記録媒体が研究開発され、一
部実用に供されている。Conventional technology γ as an organic binder due to the demand for high-density recording of information
In place of the coating type magnetic recording medium in which ferromagnetic powder such as —Fe 2 O 3 is dispersed, vacuum deposition method on a non-magnetic substrate such as plastic,
A magnetic recording medium directly provided with a ferromagnetic metal thin film by a sputtering method, an ion plating method or the like has been researched and developed, and is partially put to practical use.
発明が解決しようとする問題点 強磁性金属の媒体は、記録再生時に於いて、ヘッドとの
接触走査で該薄膜層が容易に剥離,摩耗,損傷等を起こ
す。上記欠陥を改善するため、媒体の表面上に保護膜を
設けることが提案されている。例えばSiO2,Al2O3,等
の金属酸化物層を形成し、その表面に脂肪酸系潤滑剤の
皮膜を形成し、複合保護膜とする(特開昭59-154642号
公報)提案が、なされている。しかしながらこの場合、
脂肪酸系潤滑剤が、下地の酸化物層との結合が弱くか
つ、耐熱性が低いために、磁気記録ヘッドとの接触走行
中に、剥離及び摩擦熱による分解が生じて長期の耐久性
に対して効果が少ない。DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention In a ferromagnetic metal medium, the thin film layer easily peels, wears, or damages upon contact scanning with the head during recording and reproduction. In order to improve the above defects, it has been proposed to provide a protective film on the surface of the medium. For example, a proposal is made by forming a metal oxide layer of SiO 2 , Al 2 O 3 , etc., and forming a film of a fatty acid-based lubricant on the surface thereof to form a composite protective film (JP-A-59-154642). Has been done. However, in this case
Since the fatty acid type lubricant has weak bond with the underlying oxide layer and low heat resistance, peeling and decomposition due to frictional heat occur during running while contacting with the magnetic recording head for long-term durability. And less effective.
問題点を解決するための手段 非磁性基板上に設けた強磁性金属薄膜面上に、金属酸化
物含有層を形成し、その金属酸化物含有層表面に、ポリ
ホスファゼン含有層を形成して保護膜とする。Means for Solving Problems A metal oxide-containing layer is formed on the surface of a ferromagnetic metal thin film provided on a non-magnetic substrate, and a polyphosphazene-containing layer is formed and protected on the surface of the metal oxide-containing layer. The film.
作用 強磁性金属薄膜表面の金属酸化物含有層による耐摩耗性
向上と滑剤ホスホファゼンとの結合力を高めると同時
に、滑剤自身の耐熱性,耐酸化性により離脱及び分解が
抑制されるために、耐久性の優れた高記録密度の磁気記
録媒体を得ることが出来る。Action Improves wear resistance by the metal oxide-containing layer on the surface of the ferromagnetic metal thin film and enhances the binding force with the lubricant phosphophazene. At the same time, the heat resistance and oxidation resistance of the lubricant itself suppresses dissociation and decomposition. It is possible to obtain a high recording density magnetic recording medium having excellent properties.
実施例 図は、本発明の磁気記録媒体の断面図である。図におい
て、1は非磁性基板、2は強磁性金属薄膜、3は金属酸
化物含有層、4はポリホスファゼン含有層である。本発
明による磁気記録媒体に使用し得る非磁性基板1として
は、ポリ塩化ビニル,ポリエチレンテレフタレート,ポ
リイミド,ポリアミド等の高分子材料,アルミニウム等
の非磁性金属材料,ガラス,磁器等のセラミック材料等
周知の材料からなるフィルム,板状等が挙げられる。ま
た本発明の磁気記録媒体に使用し得る強磁性金属薄膜2
としては、鉄,コバルト,ニッケルの1種以上の合金ま
たは、これらとマンガン,クロム,チタン,リン,イッ
トリウム,サマリウム,ビスマス等とを組合せた合金等
がある。非磁性基板1上に強磁性金属薄膜2を形成させ
るには、真空蒸着法,スパッタリング法,イオンプレー
ティング法,メッキ法等周知の方法を用いる。本発明に
おいては、上述した如き強磁性金属薄膜2面上に、金属
酸化物含有層3を形成し、さらにその表面にポリホスフ
ァゼン含有層4を設けるものである。本発明で使用し得
る金属酸化物層3としては、Al2O3,Fe2O3,SiO2,Zr
O2,TiO2,WO2,CrO2,フェライト,複合ガラスが挙げ
られる。フェライトは、一般式MO・Fe2O3(式中Mは、M
n2+,Co2+,Ni2+,Cu2+,Zn2+から選ばれた少なくとも
一種である)なる組成を持つものである。上記の金属酸
化物含有層を形成させる方法としては、スパッタリング
法,反応性蒸着,反応性イオンプレーティング及び、A
l,Si,Zr,Ti,Wアルコラートを加水分解して重合する塗膜
法があり、特に、SiアルコラートとZrアルコラート,Ti
アルコラート,Wアルコラートのいずれかを混合して作製
した複合ガラス皮膜は、熱膨張係数等の物性制御,量産
性において有効であった。CrO2の場合は、上記方法以外
に、Co−Cr系強磁性金属膜をある一定条件で希硝酸処理
をする事により選択的にCrO2皮膜を磁性薄膜上に形成す
ることが出来た。Example FIG. 1 is a sectional view of a magnetic recording medium of the present invention. In the figure, 1 is a non-magnetic substrate, 2 is a ferromagnetic metal thin film, 3 is a metal oxide containing layer, and 4 is a polyphosphazene containing layer. As the non-magnetic substrate 1 that can be used in the magnetic recording medium according to the present invention, polymer materials such as polyvinyl chloride, polyethylene terephthalate, polyimide and polyamide, non-magnetic metal materials such as aluminum, ceramic materials such as glass and porcelain are well known. Examples include films and plates made of the above materials. A ferromagnetic metal thin film 2 that can be used in the magnetic recording medium of the present invention
Examples of such alloys include one or more alloys of iron, cobalt, and nickel, and alloys of these in combination with manganese, chromium, titanium, phosphorus, yttrium, samarium, bismuth, and the like. In order to form the ferromagnetic metal thin film 2 on the non-magnetic substrate 1, known methods such as a vacuum vapor deposition method, a sputtering method, an ion plating method and a plating method are used. In the present invention, the metal oxide containing layer 3 is formed on the surface of the ferromagnetic metal thin film 2 as described above, and the polyphosphazene containing layer 4 is further provided on the surface thereof. Examples of the metal oxide layer 3 usable in the present invention include Al 2 O 3 , Fe 2 O 3 , SiO 2 and Zr.
O 2, TiO 2, WO 2 , CrO 2, ferrite, and a laminated glass. Ferrite has the general formula MO ・ Fe 2 O 3 (where M is M
n 2+ , Co 2+ , Ni 2+ , Cu 2+ , Zn 2+ ). As the method of forming the above-mentioned metal oxide-containing layer, sputtering method, reactive vapor deposition, reactive ion plating, and A
There is a coating method in which l, Si, Zr, Ti, W alcoholate is hydrolyzed and polymerized, in particular, Si alcoholate and Zr alcoholate, Ti
The composite glass film prepared by mixing either alcoholate or W alcoholate was effective in controlling physical properties such as thermal expansion coefficient and mass productivity. In the case of CrO 2 , in addition to the above method, a Co—Cr based ferromagnetic metal film was selectively treated with dilute nitric acid under a certain condition to selectively form a CrO 2 film on the magnetic thin film.
ポリホスファゼンとしては、一般式; (式中、m,m′は0〜7の整数,nは、4〜30の整数であ
る) で表わされるポリフロロアルコキシホスファゼンが特に
好ましい。側鎖分子のm,m′が7以上の場合は、耐熱
性,潤滑性が低下をきたした。主鎖のnが4未満の場合
は、耐熱性、下地との結合力の低下をきたし耐久性を充
分発揮出来ず又、31以上の場合は、ポリホスファゼンが
溶媒に難溶になるため下地表面に均一膜を作り難くなり
保護膜の機能を発揮できなかった。ポリホスファゼン含
有層の形成法は、エタノール,メチルイソブチルケト
ン,テトラヒドロフラン,メチルエチルケトン、ジメチ
ルケトン、ジメチルホルムアミド,ジメチルスルフォオ
キシドの溶媒に、溶解し、塗布工程で薄膜を形成した。
金属酸化物含有層厚みとポリホスファゼン含有層厚みの
和は、50〜500Åが好適であった。501Å以上になると信
号再生時にスペーシングロスにより出力低下が生じ、50
Å未満の時は、均一な保護膜を形成し難く、耐摩耗性,
潤滑性に問題を生じた。The polyphosphazene has the general formula; (In the formula, m and m'are integers of 0 to 7 and n is an integer of 4 to 30). Polyfluoroalkoxyphosphazene is particularly preferable. When m and m'of the side chain molecule were 7 or more, heat resistance and lubricity were deteriorated. When n of the main chain is less than 4, heat resistance and bond strength with the substrate are deteriorated and durability cannot be sufficiently exhibited. When n is 31 or more, polyphosphazene is hardly soluble in a solvent and thus the surface of the substrate. It became difficult to form a uniform film, and the function of the protective film could not be exhibited. The polyphosphazene-containing layer was formed by dissolving in a solvent of ethanol, methylisobutylketone, tetrahydrofuran, methylethylketone, dimethylketone, dimethylformamide, dimethylsulfoxide and forming a thin film in the coating step.
The sum of the thickness of the metal oxide-containing layer and the thickness of the polyphosphazene-containing layer was preferably 50 to 500Å. If it exceeds 501 Å, the output will drop due to spacing loss during signal playback,
When it is less than Å, it is difficult to form a uniform protective film, and wear resistance,
There was a problem with lubricity.
以下に実施例をもって説明する。An example will be described below.
実施例−1 暑さ20μmのポリイミドフィルム基板上に、真空蒸着法
によりコバルト(90wt%)−クロム(10wt%)からなる
膜厚1500Åの強磁性金属薄膜を作った。この媒体の表面
に、反応性蒸着法によりAl2O3の酸化物層を112Å形成
し、さらにその表面にポリジトリフロロエトキシホスフ
ァゼン(m,m′=0,n=4)の0.1wt%エタノール溶液を
塗布乾燥し厚みが154Åの薄膜を形成した。膜厚測定
は、エリプソメーターで測定した(以下すべてこの方法
を用いた。)。試料形状は3.5インチのディスクとし
た。Example 1 A ferromagnetic metal thin film having a film thickness of 1500 Å made of cobalt (90 wt%)-chromium (10 wt%) was formed on a polyimide film substrate having a heat of 20 μm by a vacuum deposition method. An Al 2 O 3 oxide layer of 112 Å was formed on the surface of this medium by reactive vapor deposition, and 0.1 wt% ethanol of polyditrifluoroethoxyphosphazene (m, m '= 0, n = 4) was further formed on the surface. The solution was applied and dried to form a thin film having a thickness of 154Å. The film thickness was measured with an ellipsometer (hereinafter, this method was used). The sample shape was a 3.5 inch disk.
実施例−2 実施例1と同構成の強磁性金属薄膜表面に、スパッタ法
により膜厚105ÅのZnフェライト薄膜を設けた。さらに
その表面にポリジペンタフロロプロポオキシホスファゼ
ン(m,m′=1,n=6)の0.05wt%テトラヒドロフラン溶
液を塗布乾燥し210Åの薄膜を形成した。試料形状は、
実施例1と同じ様に作製した。Example-2 A Zn ferrite thin film having a film thickness of 105Å was provided on the surface of a ferromagnetic metal thin film having the same structure as in Example 1 by a sputtering method. Further, a 0.05 wt% tetrahydrofuran solution of polydipentafluoropropoxy phosphazene (m, m ′ = 1, n = 6) was applied on the surface and dried to form a 210 Å thin film. The sample shape is
It was prepared in the same manner as in Example 1.
実施例−3 暑さ50μmのポリエチレンテレフタレート基板上に、ス
パッタ法でコバルト(85%)−クロム(15%)からなる
膜厚2000Åの強磁性金属薄膜表面にSiイソプロピレート
とZrイソプロピレートの複合溶液(商品名グラスカ40
1、月板研究所製)を触媒存在下で100℃で加水分解し重
合させ、ZrO2‐SiO2の組成からなるガラス皮膜(厚み20
0Å)形成した。さらにその表面にポリフロロアルコキ
シホスファゼン(m,m′=4,n=10)の0.05wt%のジメチ
ルホルムアミドとアセトン(体積比1:4)の混合溶媒溶
液を塗布乾燥し120Åの厚みの薄膜を形成した。試料
は、実施例1,2と同様な形状に作製した。Example 3 A composite solution of Si isopropylate and Zr isopropylate was formed on a surface of a ferromagnetic metal thin film having a film thickness of 2000 Å consisting of cobalt (85%)-chromium (15%) by sputtering on a polyethylene terephthalate substrate having a heat of 50 μm. (Product name Glasca 40
1, manufactured by Tsukiita Kenkyusho Co., Ltd., is hydrolyzed and polymerized at 100 ° C in the presence of a catalyst to form a glass film composed of ZrO 2 -SiO 2 (thickness: 20
0Å) formed. Furthermore, a 0.05 wt% solution of polyfluoroalkoxyphosphazene (m, m ′ = 4, n = 10) in dimethylformamide and acetone (volume ratio 1: 4) was applied to the surface and dried to form a thin film with a thickness of 120Å. Formed. The sample was formed in the same shape as in Examples 1 and 2.
実施例−4 実施例3と同構成の強磁性金属薄膜を0.1NHNO3溶液に1
分間浸漬した後95℃で1分間熱風乾燥して、その表面に
CrO2の皮膜を形成した。さらにその表面にポリフロロア
ルコキシホスファゼン(m,m′=6,n=25)の0.01wt%の
ジメチルスルホオキシドとテトラヒドロフラン(体積比
1:3)の混合溶媒溶液を塗布乾燥し255Åの厚みの薄膜を
形成し、前記実施例と同様な試料を作製した。Example 4 A ferromagnetic metal thin film having the same structure as in Example 3 was added to a 0.1N HNO 3 solution.
After soaking for 1 minute, dry with hot air at 95 ° C for 1 minute, and
A film of CrO 2 was formed. Furthermore, 0.01 wt% of polyfluoroalkoxyphosphazene (m, m '= 6, n = 25) dimethyl sulfoxide and tetrahydrofuran (volume ratio
A mixed solvent solution of 1: 3) was applied and dried to form a thin film having a thickness of 255 Å, and a sample similar to the above-mentioned example was prepared.
比較例−1 実施例1,2と同構成の強磁性金属薄膜上にステアリン酸
含有層厚み200Åのみを設け、実施例と同形状の試料を
作製した。Comparative Example-1 Only a stearic acid-containing layer having a thickness of 200 Å was provided on a ferromagnetic metal thin film having the same structure as in Examples 1 and 2, and a sample having the same shape as that of Example was prepared.
比較例−2 実施例3,4と同構成の強磁性金属薄膜上に、スパッタ法
により膜厚200ÅのSiO2の薄膜を設け、さらにその表面
にパーフルオロラウリル酸含有層を100Åの厚みに形成
した。実施例と同様な形状の試料を作製した。Comparative Example-2 A SiO 2 thin film having a film thickness of 200 Å was provided on a ferromagnetic metal thin film having the same configuration as in Examples 3 and 4, and a perfluorolauric acid-containing layer was further formed on the surface to a thickness of 100 Å. did. A sample having the same shape as that of the example was prepared.
上記実施例および比較例で得られた各磁気ディスクにつ
いて媒体表面の摩擦係数,耐久性を調べた結果を、表1
に示した。試験条件は下記に示した。Table 1 shows the results of examining the friction coefficient and durability of the medium surface for each magnetic disk obtained in the above Examples and Comparative Examples.
It was shown to. The test conditions are shown below.
a摩擦試験条件 測定機;往復静,動摩擦係数自動測定機ヘッド材料,形
状,鋼球(SUJ)直径 3m/m 〃荷重;20gr 〃走行速度;10mm/S 測定雰囲気;25℃ 60%RH b耐久試験条件 測定機;ディスクタイプ磁気記録測定機 ヘッド荷重;10gr 〃走行速度;3m/S 測定雰囲気;25℃ 60%RH 出力が初期値より3dB低下するまでの走行回数が測定し
た。a Friction test condition Measuring machine: reciprocating static, dynamic friction coefficient automatic measuring machine Head material, shape, steel ball (SUJ) diameter 3m / m 〃 load; 20gr 〃 running speed; 10mm / S measurement atmosphere; 25 ℃ 60% RH b durability Test conditions Measuring machine: Disk type magnetic recording measuring machine Head load; 10 gr 〃 Running speed; 3 m / S Measurement atmosphere; 25 ° C 60% RH The number of running times until the output decreased by 3 dB from the initial value was measured.
表−1の結果から明らかなように、本発明品は、潤滑
性,耐久性に共に優れている。実施例以外にも、SiO2‐
TiO2,SiO2‐WO2の複合ガラスとポリフロロアルコキシ
ホスファゼンの組み合せにおいても同等の効果をもたら
した。 As is clear from the results shown in Table-1, the product of the present invention is excellent in both lubricity and durability. In addition to the examples, SiO 2
The same effect was also obtained in the combination of TiO 2 , SiO 2 -WO 2 composite glass and polyfluoroalkoxyphosphazene.
発明の効果 本発明の磁気記録媒体は、潤滑性,耐久性に優れている
ことを確認され、実用上きわめて有益なものである。Effect of the Invention The magnetic recording medium of the present invention has been confirmed to have excellent lubricity and durability, and is extremely useful in practice.
図は、本発明の実施例における磁気記録媒体の断面図で
ある。 1……非磁性基板、2……強磁性金属薄膜、3……金属
酸化物含有層、4……ポリホスファゼン含有層。FIG. 1 is a sectional view of a magnetic recording medium in an example of the present invention. 1 ... Non-magnetic substrate, 2 ... Ferromagnetic metal thin film, 3 ... Metal oxide containing layer, 4 ... Polyphosphazene containing layer.
Claims (5)
に、金属酸化物含有層を形成し、その金属酸化物含有層
表面に、ポリホスファゼン含有層を形成した磁気記録媒
体。1. A magnetic recording medium in which a metal oxide-containing layer is formed on a surface of a ferromagnetic metal thin film provided on a non-magnetic substrate, and a polyphosphazene-containing layer is formed on the surface of the metal oxide-containing layer.
rの内の何れかの酸化物である特許請求の範囲第1項記
載の磁気記録媒体。2. The metal oxide containing layer comprises Al, Fe, Si, Zr, Ti, W, C.
The magnetic recording medium according to claim 1, which is an oxide of any of r.
選ばれた少なくとも一種である。) で表わされるフェライトである特許請求の範囲第1項記
載の磁気記録媒体。3. The metal oxide-containing layer has the following general formula: MO.Fe 2 O 3 (where M is Mn 2+ , Fe 2+ , Co 2+ , Ni 2+ , Cu 2+ , Zn). The magnetic recording medium according to claim 1, which is a ferrite represented by the formula: at least one selected from 2+ .
コニア,酸化チタン,酸化タングステンよりなる群から
選んだ少なくとも一つからなる複合ガラスからなる特許
請求の範囲第1項記載の磁気記録媒体。4. The magnetic recording medium according to claim 1, wherein the metal oxide-containing layer comprises a composite glass comprising at least one selected from the group consisting of silicon oxide, zirconia oxide, titanium oxide and tungsten oxide. .
る。) で表わされるポリフロロアルコキシホスファゼンである
特許請求の範囲第1項記載の磁気記録媒体。5. A polyphosphazene having the following general formula; The magnetic recording medium according to claim 1, which is a polyfluoroalkoxyphosphazene represented by the formula (m and m'are integers of 0 to 7 and n is an integer of 4 to 30).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14873285A JPH0675285B2 (en) | 1985-07-05 | 1985-07-05 | Magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14873285A JPH0675285B2 (en) | 1985-07-05 | 1985-07-05 | Magnetic recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS629519A JPS629519A (en) | 1987-01-17 |
| JPH0675285B2 true JPH0675285B2 (en) | 1994-09-21 |
Family
ID=15459366
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14873285A Expired - Lifetime JPH0675285B2 (en) | 1985-07-05 | 1985-07-05 | Magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0675285B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2565503B2 (en) * | 1987-04-20 | 1996-12-18 | 株式会社日立製作所 | Driving device for elevator |
| JPH02168419A (en) * | 1988-12-22 | 1990-06-28 | Asahi Glass Co Ltd | Magnetic recording medium |
| JPH0383796A (en) * | 1989-08-29 | 1991-04-09 | Hitachi Elevator Eng & Service Co Ltd | Elevator door control device |
| KR101209266B1 (en) | 2010-06-30 | 2012-12-06 | 한국과학기술연구원 | Biodegradable and thermosensitive poly(phosphazene)-superparamagnetic nano-particle complex, preparation method and use thereof |
-
1985
- 1985-07-05 JP JP14873285A patent/JPH0675285B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS629519A (en) | 1987-01-17 |
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