JPH0675824B2 - Polishing tool - Google Patents
Polishing toolInfo
- Publication number
- JPH0675824B2 JPH0675824B2 JP63185357A JP18535788A JPH0675824B2 JP H0675824 B2 JPH0675824 B2 JP H0675824B2 JP 63185357 A JP63185357 A JP 63185357A JP 18535788 A JP18535788 A JP 18535788A JP H0675824 B2 JPH0675824 B2 JP H0675824B2
- Authority
- JP
- Japan
- Prior art keywords
- tool
- polishing
- polishing tool
- resin
- disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Description
【発明の詳細な説明】 <産業上の利用分野> 本発明は,金属,セラミックス,ガラス等の物体表面
を,微粒子を含む加工液を用いて研磨するための研磨工
具に関する。The present invention relates to a polishing tool for polishing the surface of an object such as metal, ceramics, glass or the like with a working fluid containing fine particles.
<従来の技術> 各種材料の物体表面を鏡面に仕上げ研磨する場合,工具
表面にダイヤモンド,アルミナ,酸化珪素等の微粒子を
含む加工液,即ちポリシ剤を散布しつつ当該工具面と上
記物体表面とを相互に擦り合せることによって加工する
方法,いわゆるポリシングが採用されている。<Prior Art> When finishing the surface of an object of various materials into a mirror surface, while spraying a machining liquid containing fine particles of diamond, alumina, silicon oxide, etc., that is, a polishing agent, the tool surface and the object surface A so-called polishing method, which is a method of processing by rubbing each other, is adopted.
このポリシングに用いられる研磨工具に必要な条件は,
微粒子を適度に保持すること及び被加工面との接触面
積が大きくなるために弾性を有すること,被加工面と
工具面との潤滑性を保つこと及び加工系の冷却のために
加工液の保持性がよいこと,耐摩擦性がよいこと,
工具材料そのものの加工性がよいこと等が挙げられる。
そして,従来においては,これらの条件を比較的よく満
足するものとして,発泡ポリウレタン系の不織布,ポリ
塩化ビニル系の樹脂,ナイロン系樹脂,弗素系樹脂及び
錫,鉛等の軟質金属が使用されている。The conditions required for the polishing tool used for this polishing are:
Holds the fine particles moderately and has elasticity because the contact area with the work surface is large, keeps the lubricity between the work surface and the tool surface, and holds the working fluid for cooling the working system. Good resistance, good abrasion resistance,
For example, the workability of the tool material itself is good.
In the past, foamed polyurethane non-woven fabric, polyvinyl chloride resin, nylon resin, fluorine resin and soft metals such as tin and lead have been used to satisfy these conditions relatively well. There is.
<発明が解決しようとする課題> しかしながら,従来から使用されている樹脂材料は概し
て水に対する濡れ性がよくなく,上記(1),(2)の条件を
満足するものではない。よって,例えば,発泡ポリウレ
タンの場合は,特殊な処理をして発泡させて表面に微小
な開口部を設け,この開口部に加工液や粒子を保持する
ようにして,Si,GaAs等の半導体の研磨工具などとしてい
る。ところが,かかる工具では,表面の特殊加工部分の
寿命が短いという問題があり,又,発泡層の弾性係数が
小さすぎるために被加工面の周辺がダレる等の問題も発
生する。<Problems to be Solved by the Invention> However, conventionally used resin materials generally do not have good wettability with water and do not satisfy the above conditions (1) and (2). Therefore, for example, in the case of foamed polyurethane, a special treatment is used to foam and form a minute opening in the surface, and the processing liquid and particles are held in this opening, so that a semiconductor such as Si or GaAs is formed. It is used as a polishing tool. However, in such a tool, there is a problem that the life of the specially processed portion of the surface is short, and there is also a problem that the periphery of the processed surface is sagged because the elastic coefficient of the foam layer is too small.
一方,ポリ塩化ビニル系の樹脂,ナイロン樹脂,弗素系
樹脂等の硬質樹脂及び,錫,鉛等の軟質金属を用いる場
合には,加工液の保持性を改善するために工具表面に螺
旋状や格子状の溝を形成している。しかし,元々材料自
体の濡れ性がよくないため,次のような諸々の問題点を
生じる。即ち, 加工液が水玉状となり,粒子はその水玉の中で凝集
して工具表面に付着し,工具表面での粒子の均一分散が
困難となり,ミクロ的に見た場合の加工の均質化が図れ
ない。On the other hand, when a hard resin such as a polyvinyl chloride resin, a nylon resin, a fluorine resin, or a soft metal such as tin or lead is used, a spiral or The lattice-shaped grooves are formed. However, since the wettability of the material itself is originally poor, the following various problems occur. That is, the machining fluid becomes a polka dot, and the particles agglomerate in the polka dots and adhere to the tool surface, making it difficult to uniformly disperse the particles on the tool surface, and to achieve uniform machining in a microscopic view. Absent.
回転工具面と加工液の間で相対滑りを生じるため,
被加工面に対する微粒子の運動量が多くとれない。Since relative slip occurs between the rotating tool surface and the machining fluid,
The momentum of fine particles with respect to the surface to be processed cannot be increased.
加工液が回転工具面からすぐに遠心力により振り飛
ばされ,工具面と被加工面の間で有効に作用しない。The machining fluid is immediately shaken off from the rotating tool surface by the centrifugal force and does not work effectively between the tool surface and the surface to be machined.
このように粒子が均一に加工面全体に作用しない場合に
は,加工能率が低くなると共に,塊としての粒子が作用
することにより,加工面に局部的なスクラッチや歪を残
すことになる。When the particles do not uniformly act on the entire machined surface as described above, the machining efficiency becomes low, and the particles as a mass act to leave a local scratch or strain on the machined surface.
本発明は,以上述べた問題点を解決した研磨工具を提供
することを目的とする。An object of the present invention is to provide a polishing tool that solves the above-mentioned problems.
<課題を解決するため手段> 前記目的を達成する本発明の研磨工具は,物体表面との
間に微粒子を含有する加工液を保持しつつ当該物体表面
を研磨する円盤状の工具であって,ニトロセルロースを
基体とする繊維素を主成分とするセルロース系樹脂から
なる一体構造物で構成され且つ厚さ方向に対して均一な
樹脂組成を有し,円盤状表面に螺旋溝あるいは放射状の
傾斜溝を設けたことことを特徴とする。<Means for Solving the Problem> A polishing tool of the present invention that achieves the above object is a disk-shaped tool for polishing a surface of an object while holding a working fluid containing fine particles between the object surface and It has a uniform resin composition in the thickness direction and is composed of an integral structure composed of cellulose-based resin whose main component is nitrocellulose-based fibrin, and has spiral or radial slanted grooves on the disk-shaped surface. Is provided.
以下,本発明の構成を詳述する。The configuration of the present invention will be described in detail below.
本発明においてニトロセルロースを基体とする繊維素を
主成分とするセルロース系樹脂とは,ニトロセルロース
を基体とする繊維素を主成分として樹脂状としたもので
あり,好適には繊維素10〜90重量%に樟脳10〜50重合%
及びエタノール20〜60重量%を配合することにより得ら
れる。In the present invention, the cellulosic resin containing nitrocellulose-based fibrin as the main component is a resin containing nitrocellulose-based fibrin as the main component, and preferably 10 to 90 Camphor 10 to 50% polymerization by weight%
And 20 to 60% by weight of ethanol.
また,ここでニトロセルロースを基体とする繊維素とは
硝酸セルロース,酢酸セルロース等をいう。かかる繊維
素は,例えば次の化学式 で表されるように,官能基として水酸基を有していて
る。Further, the nitrocellulose-based fibrin here means cellulose nitrate, cellulose acetate and the like. Such fibrin has, for example, the following chemical formula: As shown in, it has a hydroxyl group as a functional group.
従って,かかる繊維素を主成分とするセルロース系樹脂
は水に対する濡れ性が非常によい。また,当該樹脂は水
酸基を有しているにもかかわらず水には溶けず,アルカ
リで若干膨潤するだけである。一方,従来から使用され
ている硬質樹脂は水酸基を有しないので,濡れ性がよく
ない。例えば,濡れ性の良否の尺度である接触角を比べ
てみると,本発明のセルロース系樹脂では60度前後であ
るが,ポリ塩化ビニール系樹脂では87度,ナイロン系樹
脂では70度,弗素系樹脂では90度以上である。このよう
に本発明のセルロース系樹脂は従来にない良好な濡れ性
を有しているので,かかるセルロース系樹脂からなる一
体構造体で構成され且つ厚さ方向に対して均一な樹脂組
成を有し,円盤状表面に螺旋溝あるいは放射状の傾斜溝
を設けた研磨工具では,加工液の被加工面への作用が均
一化され,良好な加工特性を得ることができる。なお,
本発明における研磨工具は表面粗さが0〜50μmの凸凹
面に形成されているのが好ましい。Therefore, the cellulosic resin containing such a fibrin as a main component has very good wettability with water. Further, although the resin has a hydroxyl group, it is insoluble in water and only slightly swells with alkali. On the other hand, the hard resin used conventionally does not have a hydroxyl group and therefore has poor wettability. For example, comparing the contact angle, which is a measure of the quality of wettability, is about 60 degrees for the cellulose resin of the present invention, 87 degrees for the polyvinyl chloride resin, 70 degrees for the nylon resin, and fluorine series. It is 90 degrees or more for resin. As described above, since the cellulosic resin of the present invention has a good wettability which has never been obtained, it has a uniform resin composition in the thickness direction and is composed of an integral structure made of such cellulosic resin. In a polishing tool having a spiral groove or a radial inclined groove on the disk-shaped surface, the action of the machining liquid on the surface to be machined is made uniform, and good machining characteristics can be obtained. In addition,
The polishing tool according to the present invention is preferably formed into an uneven surface having a surface roughness of 0 to 50 μm.
<実 施 例> 以下,本発明を実施例に基づいて説明する。<Examples> Hereinafter, the present invention will be described based on Examples.
(実施例1) 第1図は本発明の円盤状の研磨工具を用いた研磨装置に
よる研磨方法の実施例である。同図に示すように,研磨
工具11は,セルロースエステルの一種である硝酸セルロ
ースから得た厚さ2mmのセルロイド板であり,この研磨
工具を鉄定盤12の表面に接着剤13を介して接着した後,
旋削によって平面に形成し,円盤状表面にさらにピッチ
2mm,深さ0.5mm,幅0.5mmの螺旋溝14を形成したものであ
る。(Embodiment 1) FIG. 1 is an embodiment of a polishing method by a polishing apparatus using a disk-shaped polishing tool of the present invention. As shown in the figure, the polishing tool 11 is a 2 mm thick celluloid plate obtained from cellulose nitrate, which is a type of cellulose ester, and the polishing tool is adhered to the surface of the iron surface plate 12 with an adhesive 13. After doing
Formed flat by turning and further pitched on a disk-shaped surface
A spiral groove 14 having a width of 2 mm, a depth of 0.5 mm and a width of 0.5 mm is formed.
研磨工具11上には,接着基板15に接着された被加工試料
16,すなわちSiウェハが載置されており,加工液17を合
せ面に滴加しながら,定盤12を回転させるとともに接着
基板15を自転させて,研磨を行った。The sample to be processed adhered to the adhesion substrate 15 on the polishing tool 11.
That is, 16, that is, a Si wafer is placed, and while the processing liquid 17 is added dropwise to the mating surface, the surface plate 12 is rotated and the adhesive substrate 15 is rotated to perform polishing.
本実施例で,加工液17はpH12程度の弱アルカリ性液にSi
O2の微粒子を懸濁させたものであり,定盤12の回転速度
は60rpm前後とし,接着基板15には荷重をかけて被加工
試料16に200gr/cm2程度の研磨圧力を作用させた。In this embodiment, the working liquid 17 is a weak alkaline liquid having a pH of about 12,
O 2 particles were suspended, the rotation speed of the platen 12 was about 60 rpm, a load was applied to the adhesive substrate 15, and a polishing pressure of about 200 gr / cm 2 was applied to the sample 16 to be processed. .
本実施例では加工能率が0.5μm/minと従来法に比べて30
%程度能率が高く,また,加工面の平面度が1μm以下
/φ4インチと高い精度を得た。また,弱アルカリによ
って工具の表面層のみが極僅かに膨潤するため被加工面
に対する作用が均一化され,しかもソフト化されるた
め,加工面の表面粗さも10Å以下と従来法に比べて50%
も改善されるとともに,加工歪みの残留も認められなか
った。In this example, the processing efficiency is 0.5 μm / min, which is 30% compared to the conventional method.
The efficiency is high at about%, and the flatness of the machined surface is 1 μm or less / φ4 inch. In addition, since only the surface layer of the tool swells slightly due to weak alkali, the effect on the surface to be machined is made uniform and the surface is softened, and the surface roughness of the machined surface is less than 10Å, which is 50% of that of the conventional method.
Was also improved, and no residual processing strain was observed.
(実施例2) 第2図には本発明による別の円盤状の研磨工具を示す。
同図に示すように,研磨工具21は酢酸セルロース,樟脳
及びエタノールからなるセルロース系樹脂で形成された
ものである。この研磨工具21の表面は放射状に分割され
てフラット部22の間に回転方向に沿って深さが漸次変化
する傾斜溝23が形成されている。(Embodiment 2) FIG. 2 shows another disk-shaped polishing tool according to the present invention.
As shown in the figure, the polishing tool 21 is made of a cellulose-based resin composed of cellulose acetate, camphor and ethanol. The surface of the polishing tool 21 is radially divided, and inclined grooves 23 whose depth gradually changes along the rotational direction are formed between the flat portions 22.
第3図はかかる研磨工具21を取り付けた研磨装置による
研磨方法の実施例である。同図に示すように,外筒30内
に回転可能に支持された研磨工具21上には複数個のSiウ
ェハからなる被加工試料31が載置されている。各試料31
は試料接着用基板32に接着されて支持板33にそれぞれ自
転しうるように設けられた支持筒部34間に挿入されてお
り,回転する研磨工具21上でそれぞれ自転するようにな
っている。FIG. 3 shows an embodiment of a polishing method using a polishing apparatus equipped with such a polishing tool 21. As shown in the figure, a sample 31 made of a plurality of Si wafers is placed on a polishing tool 21 rotatably supported in an outer cylinder 30. Each sample 31
Are inserted between supporting cylinders 34 which are bonded to the sample bonding substrate 32 and are provided on the supporting plate 33 so as to be respectively rotatable, and are each rotated on the rotating polishing tool 21.
pH12程度の弱アルカリ性液にSiO2の微粒子を懸濁させた
加工液35を外筒30内に入れて研磨工具21と試料31との加
工面まで浸漬した状態で,工具21を60rpm程度で回転さ
せる。このとき,試料31の被加工面である平面と工具表
面のフラット部22及び傾斜溝23との間に挟まれた加工液
35は隙間の大きな傾斜溝23の深いところから隙間の小さ
なフラット部22まで連続的に狭小化されながら移動する
のでハイドロダイナミックの作用により動圧が発生し,
試料31の被加工面は工具面から浮き上がる。加工液35中
には微粒子が含まれているのでこの微粒子の衝突作用等
によってSiウェハ面が加工される。Rotate the tool 21 at about 60 rpm with the working liquid 35 in which fine particles of SiO 2 are suspended in a weak alkaline liquid with a pH of about 12 placed in the outer cylinder 30 and immersed in the working surfaces of the polishing tool 21 and the sample 31. Let At this time, the machining liquid sandwiched between the flat surface of the sample 31 to be machined and the flat portion 22 and the inclined groove 23 on the tool surface.
Since 35 moves continuously from the deep part of the inclined groove 23 with a large gap to the flat part 22 with a small gap, dynamic pressure is generated by the action of hydrodynamics,
The processed surface of the sample 31 floats above the tool surface. Since the processing liquid 35 contains fine particles, the Si wafer surface is processed by the collision action of the fine particles and the like.
このように,研磨工具として濡れ性の良い酢酸セルロー
ス,樟脳及びエタノールからなるセルロース系樹脂で形
成されたものを用いているため,回転工具面と加工液と
の間の相対滑りが少なくなり,そのため,工具面の運動
によって加工液が連れ動き,被加工面に対する運動量も
大きくなり,従来よりも加工能率が30〜50%向上した。
又,加工面の平面度,表面粗さも実施例1程度に改善さ
れ,加工歪みの残留も認められなかった。In this way, since the polishing tool is made of a cellulose-based resin consisting of cellulose acetate, camphor and ethanol, which have good wettability, the relative slip between the rotary tool surface and the machining fluid is reduced, The machining fluid moves with the movement of the tool surface, and the momentum with respect to the surface to be machined also increases, improving the machining efficiency by 30 to 50% compared to the conventional method.
Further, the flatness and surface roughness of the machined surface were improved to the extent of Example 1, and no residual machining strain was observed.
<発明の効果> 以上説明したように,各種材料の表面研磨用工具の材料
としてニトロセルロースを基体とする繊維素が主成分で
あるセルロース系樹脂を用いることにより,素材の持つ
高親水性により工具面に対する加工液の濡れ性が良好に
なり,かつ工具面全体に加工液が均一に分散される。<Effects of the Invention> As described above, by using a cellulosic resin whose main component is a nitrocellulose-based fibrin as a material for a surface polishing tool of various materials, the tool has a high hydrophilic property. The wettability of the machining fluid to the surface is improved, and the machining fluid is evenly distributed over the entire tool surface.
また,上記セルロース系樹脂の一体構造体で構成してい
るので,厚さ方向に対して均一な樹脂組成を有するとと
もに,円盤状表面に螺旋溝または放射状の傾斜溝を形成
することが可能となる。このような溝を形成することに
より,高速相対移動による溝からのハイドロダイナミッ
クの作用による動圧が発生し,試料の加工面は工具面か
ら浮上し,被接触となる。この結果,試料の被加工面に
おいて加工液中の微粒子が均一化し,その研磨微粒子の
衝突作用によって試料の研磨能率が向上し,かつ傷の少
ないソフトな仕上げ加工面が容易に得られるという利点
がある。Further, since it is composed of the integral structure of the above cellulose-based resin, it has a uniform resin composition in the thickness direction and can form a spiral groove or a radial inclined groove on the disk-shaped surface. . By forming such a groove, dynamic pressure is generated due to hydrodynamic action from the groove due to high-speed relative movement, and the machined surface of the sample floats above the tool surface and becomes contacted. As a result, the fine particles in the working liquid are made uniform on the work surface of the sample, the polishing efficiency of the sample is improved by the collision action of the polishing fine particles, and a soft finishing surface with few scratches can be easily obtained. is there.
第1図〜第3図はそれぞれ本発明の実施例を示す説明図
である。 図面中, 11,12,は研磨工具, 16,31,は被加工試料, 17,35,は加工液である。1 to 3 are explanatory views showing an embodiment of the present invention. In the drawing, 11,12, are polishing tools, 16,31 are samples to be processed, and 17,35 are working fluids.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 斎藤 忠男 東京都千代田区内幸町1丁目1番6号 日 本電信電話株式会社内 (56)参考文献 実開 昭48−94287(JP,U) 実開 昭55−156864(JP,U) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Tadao Saito 1-1-6 Uchisaiwaicho, Chiyoda-ku, Tokyo Nihon Telegraph and Telephone Corporation (56) References Showa 48-94287 (JP, U) Show 55-156864 (JP, U)
Claims (1)
を保持しつつ当該物体表面を研磨する円盤状の研磨工具
であって,ニトロセルロースを基体とする繊維素を主成
分とするセルロース系樹脂からなる一体構造物で構成さ
れ且つ厚さ方向に対して均一な樹脂組成を有し,円盤状
表面に螺旋溝あるいは放射状の傾斜溝を設けたことを特
徴とする研磨工具。1. A disk-shaped polishing tool for polishing a surface of an object while holding a working fluid containing fine particles between the surface of the object and cellulose containing nitrocellulose as a main component and containing fibrin as a main component. A polishing tool comprising an integrated structure made of a system resin, having a uniform resin composition in a thickness direction, and having a spiral groove or a radial inclined groove on a disk-shaped surface.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63185357A JPH0675824B2 (en) | 1988-07-27 | 1988-07-27 | Polishing tool |
| DE68915219T DE68915219T2 (en) | 1988-07-26 | 1989-07-24 | Method and device for forming curved surfaces. |
| EP89113618A EP0352709B1 (en) | 1988-07-26 | 1989-07-24 | Method and apparatus for forming curved surface |
| US07/385,255 US5048929A (en) | 1988-07-26 | 1989-07-25 | Method and apparatus for forming curved surface |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63185357A JPH0675824B2 (en) | 1988-07-27 | 1988-07-27 | Polishing tool |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0236073A JPH0236073A (en) | 1990-02-06 |
| JPH0675824B2 true JPH0675824B2 (en) | 1994-09-28 |
Family
ID=16169373
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63185357A Expired - Lifetime JPH0675824B2 (en) | 1988-07-26 | 1988-07-27 | Polishing tool |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0675824B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7201322B2 (en) * | 2018-01-05 | 2023-01-10 | 株式会社荏原製作所 | Polishing head for face-up polishing apparatus, polishing apparatus provided with the polishing head, and polishing method using the polishing apparatus |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4894287U (en) * | 1972-02-12 | 1973-11-10 | ||
| JPS55156864U (en) * | 1979-04-28 | 1980-11-11 |
-
1988
- 1988-07-27 JP JP63185357A patent/JPH0675824B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0236073A (en) | 1990-02-06 |
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