JPH0678263B2 - Process for producing 4- (parafluorobenzoyl) phenols - Google Patents
Process for producing 4- (parafluorobenzoyl) phenolsInfo
- Publication number
- JPH0678263B2 JPH0678263B2 JP61152639A JP15263986A JPH0678263B2 JP H0678263 B2 JPH0678263 B2 JP H0678263B2 JP 61152639 A JP61152639 A JP 61152639A JP 15263986 A JP15263986 A JP 15263986A JP H0678263 B2 JPH0678263 B2 JP H0678263B2
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- acid
- para
- phenols
- catalyst
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- HLRVUOFDBXRZBI-UHFFFAOYSA-N 4-fluoro-4'-hydroxybenzophenone Chemical class C1=CC(O)=CC=C1C(=O)C1=CC=C(F)C=C1 HLRVUOFDBXRZBI-UHFFFAOYSA-N 0.000 title claims description 17
- 238000000034 method Methods 0.000 title description 27
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 claims description 53
- 150000001555 benzenes Chemical class 0.000 claims description 36
- 238000005893 bromination reaction Methods 0.000 claims description 32
- 239000003054 catalyst Substances 0.000 claims description 31
- 229910000042 hydrogen bromide Inorganic materials 0.000 claims description 26
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 24
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 23
- 229910052794 bromium Inorganic materials 0.000 claims description 23
- 238000005886 esterification reaction Methods 0.000 claims description 21
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 16
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 16
- 230000032050 esterification Effects 0.000 claims description 14
- 150000002989 phenols Chemical class 0.000 claims description 14
- 238000006462 rearrangement reaction Methods 0.000 claims description 14
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 12
- 230000031709 bromination Effects 0.000 claims description 12
- 229910001882 dioxygen Inorganic materials 0.000 claims description 10
- 238000005810 carbonylation reaction Methods 0.000 claims description 8
- 239000003377 acid catalyst Substances 0.000 claims description 7
- 230000006315 carbonylation Effects 0.000 claims description 7
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 125000001424 substituent group Chemical group 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 description 58
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 40
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 36
- -1 aliphatic halogenated hydrocarbons Chemical class 0.000 description 36
- 239000007789 gas Substances 0.000 description 23
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 21
- 239000007791 liquid phase Substances 0.000 description 19
- 239000002253 acid Substances 0.000 description 18
- 239000012071 phase Substances 0.000 description 17
- 150000001875 compounds Chemical class 0.000 description 15
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 15
- 239000000203 mixture Substances 0.000 description 15
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 14
- 229910021536 Zeolite Inorganic materials 0.000 description 14
- 239000002585 base Substances 0.000 description 14
- 239000010457 zeolite Substances 0.000 description 14
- 229910052763 palladium Inorganic materials 0.000 description 13
- 239000002904 solvent Substances 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 12
- 150000008423 fluorobenzenes Chemical class 0.000 description 12
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 12
- 239000011541 reaction mixture Substances 0.000 description 11
- 239000010949 copper Substances 0.000 description 10
- 238000003756 stirring Methods 0.000 description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 9
- 229940108928 copper Drugs 0.000 description 9
- NXXYKOUNUYWIHA-UHFFFAOYSA-N 2,6-Dimethylphenol Chemical compound CC1=CC=CC(C)=C1O NXXYKOUNUYWIHA-UHFFFAOYSA-N 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 150000007513 acids Chemical class 0.000 description 8
- 150000001340 alkali metals Chemical class 0.000 description 8
- 229910052759 nickel Inorganic materials 0.000 description 8
- 229910052757 nitrogen Inorganic materials 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 229910052783 alkali metal Inorganic materials 0.000 description 7
- 239000006227 byproduct Substances 0.000 description 7
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 7
- QGJOPFRUJISHPQ-UHFFFAOYSA-N Carbon disulfide Chemical compound S=C=S QGJOPFRUJISHPQ-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- 238000004821 distillation Methods 0.000 description 6
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 6
- 229910052742 iron Inorganic materials 0.000 description 6
- 229940098779 methanesulfonic acid Drugs 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- AITNMTXHTIIIBB-UHFFFAOYSA-N 1-bromo-4-fluorobenzene Chemical compound FC1=CC=C(Br)C=C1 AITNMTXHTIIIBB-UHFFFAOYSA-N 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 5
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 150000003003 phosphines Chemical class 0.000 description 5
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 4
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 4
- BBYDXOIZLAWGSL-UHFFFAOYSA-N 4-fluorobenzoic acid Chemical compound OC(=O)C1=CC=C(F)C=C1 BBYDXOIZLAWGSL-UHFFFAOYSA-N 0.000 description 4
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 4
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Natural products P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 4
- 230000002411 adverse Effects 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 4
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 4
- 229910052792 caesium Inorganic materials 0.000 description 4
- 229910001431 copper ion Inorganic materials 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000002425 crystallisation Methods 0.000 description 4
- 230000008025 crystallization Effects 0.000 description 4
- 150000002170 ethers Chemical class 0.000 description 4
- 150000004820 halides Chemical class 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- PYLWMHQQBFSUBP-UHFFFAOYSA-N monofluorobenzene Chemical compound FC1=CC=CC=C1 PYLWMHQQBFSUBP-UHFFFAOYSA-N 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- XXQBEVHPUKOQEO-UHFFFAOYSA-N potassium superoxide Chemical compound [K+].[K+].[O-][O-] XXQBEVHPUKOQEO-UHFFFAOYSA-N 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 150000003460 sulfonic acids Chemical class 0.000 description 4
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 4
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 4
- DWNYXIICDFVJEX-UHFFFAOYSA-N 1,2-dibromo-3-fluorobenzene Chemical compound FC1=CC=CC(Br)=C1Br DWNYXIICDFVJEX-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 239000002841 Lewis acid Substances 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 101150003085 Pdcl gene Proteins 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 3
- 239000013522 chelant Substances 0.000 description 3
- 125000004093 cyano group Chemical group *C#N 0.000 description 3
- FSBVERYRVPGNGG-UHFFFAOYSA-N dimagnesium dioxido-bis[[oxido(oxo)silyl]oxy]silane hydrate Chemical compound O.[Mg+2].[Mg+2].[O-][Si](=O)O[Si]([O-])([O-])O[Si]([O-])=O FSBVERYRVPGNGG-UHFFFAOYSA-N 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 229910000765 intermetallic Inorganic materials 0.000 description 3
- 238000005342 ion exchange Methods 0.000 description 3
- 150000007517 lewis acids Chemical class 0.000 description 3
- 239000003446 ligand Substances 0.000 description 3
- 239000000395 magnesium oxide Substances 0.000 description 3
- 239000000391 magnesium silicate Substances 0.000 description 3
- 229910052919 magnesium silicate Inorganic materials 0.000 description 3
- 235000019792 magnesium silicate Nutrition 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 150000002815 nickel Chemical class 0.000 description 3
- BMGNSKKZFQMGDH-FDGPNNRMSA-L nickel(2+);(z)-4-oxopent-2-en-2-olate Chemical compound [Ni+2].C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O BMGNSKKZFQMGDH-FDGPNNRMSA-L 0.000 description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 229910052701 rubidium Inorganic materials 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 238000005292 vacuum distillation Methods 0.000 description 3
- ZEJARTSMPYSXPM-UHFFFAOYSA-N (4-fluorophenyl)-(4-hydroxy-3,5-dimethylphenyl)methanone Chemical compound CC1=C(O)C(C)=CC(C(=O)C=2C=CC(F)=CC=2)=C1 ZEJARTSMPYSXPM-UHFFFAOYSA-N 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 2
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- PAMIQIKDUOTOBW-UHFFFAOYSA-N 1-methylpiperidine Chemical compound CN1CCCCC1 PAMIQIKDUOTOBW-UHFFFAOYSA-N 0.000 description 2
- QSZCGGBDNYTQHH-UHFFFAOYSA-N 2,3-dimethoxyphenol Chemical compound COC1=CC=CC(O)=C1OC QSZCGGBDNYTQHH-UHFFFAOYSA-N 0.000 description 2
- 229940090248 4-hydroxybenzoic acid Drugs 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 239000005749 Copper compound Substances 0.000 description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 2
- 239000005909 Kieselgur Substances 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 101100030361 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) pph-3 gene Proteins 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- 229910018287 SbF 5 Inorganic materials 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- OUUQCZGPVNCOIJ-UHFFFAOYSA-M Superoxide Chemical compound [O-][O] OUUQCZGPVNCOIJ-UHFFFAOYSA-M 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 2
- CUJRVFIICFDLGR-UHFFFAOYSA-N acetylacetonate Chemical compound CC(=O)[CH-]C(C)=O CUJRVFIICFDLGR-UHFFFAOYSA-N 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000000908 ammonium hydroxide Substances 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 239000010425 asbestos Substances 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 2
- 239000000440 bentonite Substances 0.000 description 2
- 229910000278 bentonite Inorganic materials 0.000 description 2
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
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- 229910052796 boron Inorganic materials 0.000 description 1
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- 150000001768 cations Chemical class 0.000 description 1
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- 238000001816 cooling Methods 0.000 description 1
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- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
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- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- OMZSGWSJDCOLKM-UHFFFAOYSA-N copper(II) sulfide Chemical compound [S-2].[Cu+2] OMZSGWSJDCOLKM-UHFFFAOYSA-N 0.000 description 1
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 1
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 1
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- 150000003983 crown ethers Chemical class 0.000 description 1
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- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- ZBCKWHYWPLHBOK-UHFFFAOYSA-N cyclohexylphosphane Chemical compound PC1CCCCC1 ZBCKWHYWPLHBOK-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- SBWJERDWKYNUFP-UHFFFAOYSA-N dibenzylphosphane Chemical class C=1C=CC=CC=1CPCC1=CC=CC=C1 SBWJERDWKYNUFP-UHFFFAOYSA-N 0.000 description 1
- PTLIZOFGXLGHSY-UHFFFAOYSA-N dibutylphosphane Chemical compound CCCCPCCCC PTLIZOFGXLGHSY-UHFFFAOYSA-N 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- VPLLTGLLUHLIHA-UHFFFAOYSA-N dicyclohexyl(phenyl)phosphane Chemical compound C1CCCCC1P(C=1C=CC=CC=1)C1CCCCC1 VPLLTGLLUHLIHA-UHFFFAOYSA-N 0.000 description 1
- HDULBKVLSJEMGN-UHFFFAOYSA-N dicyclohexylphosphane Chemical compound C1CCCCC1PC1CCCCC1 HDULBKVLSJEMGN-UHFFFAOYSA-N 0.000 description 1
- VZZJVOCVAZHETD-UHFFFAOYSA-N diethylphosphane Chemical compound CCPCC VZZJVOCVAZHETD-UHFFFAOYSA-N 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- HASCQPSFPAKVEK-UHFFFAOYSA-N dimethyl(phenyl)phosphine Chemical compound CP(C)C1=CC=CC=C1 HASCQPSFPAKVEK-UHFFFAOYSA-N 0.000 description 1
- GPAYUJZHTULNBE-UHFFFAOYSA-N diphenylphosphine Chemical compound C=1C=CC=CC=1PC1=CC=CC=C1 GPAYUJZHTULNBE-UHFFFAOYSA-N 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 238000006266 etherification reaction Methods 0.000 description 1
- WUOIAOOSKMHJOV-UHFFFAOYSA-N ethyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(CC)C1=CC=CC=C1 WUOIAOOSKMHJOV-UHFFFAOYSA-N 0.000 description 1
- ZNOXPPRACNEBIA-UHFFFAOYSA-N ethyl(phenyl)phosphane Chemical compound CCPC1=CC=CC=C1 ZNOXPPRACNEBIA-UHFFFAOYSA-N 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- UQSQSQZYBQSBJZ-UHFFFAOYSA-N fluorosulfonic acid Chemical compound OS(F)(=O)=O UQSQSQZYBQSBJZ-UHFFFAOYSA-N 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910021480 group 4 element Inorganic materials 0.000 description 1
- 229910021478 group 5 element Inorganic materials 0.000 description 1
- LHGVFZTZFXWLCP-UHFFFAOYSA-N guaiacol Chemical compound COC1=CC=CC=C1O LHGVFZTZFXWLCP-UHFFFAOYSA-N 0.000 description 1
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 description 1
- 239000004312 hexamethylene tetramine Substances 0.000 description 1
- 235000010299 hexamethylene tetramine Nutrition 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- IGUXCTSQIGAGSV-UHFFFAOYSA-K indium(iii) hydroxide Chemical compound [OH-].[OH-].[OH-].[In+3] IGUXCTSQIGAGSV-UHFFFAOYSA-K 0.000 description 1
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 1
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- 235000014413 iron hydroxide Nutrition 0.000 description 1
- GYCHYNMREWYSKH-UHFFFAOYSA-L iron(ii) bromide Chemical compound [Fe+2].[Br-].[Br-] GYCHYNMREWYSKH-UHFFFAOYSA-L 0.000 description 1
- NCNCGGDMXMBVIA-UHFFFAOYSA-L iron(ii) hydroxide Chemical compound [OH-].[OH-].[Fe+2] NCNCGGDMXMBVIA-UHFFFAOYSA-L 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000012280 lithium aluminium hydride Substances 0.000 description 1
- AFRJJFRNGGLMDW-UHFFFAOYSA-N lithium amide Chemical compound [Li+].[NH2-] AFRJJFRNGGLMDW-UHFFFAOYSA-N 0.000 description 1
- SIAPCJWMELPYOE-UHFFFAOYSA-N lithium hydride Chemical compound [LiH] SIAPCJWMELPYOE-UHFFFAOYSA-N 0.000 description 1
- 229910000103 lithium hydride Inorganic materials 0.000 description 1
- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 1
- 229910001947 lithium oxide Inorganic materials 0.000 description 1
- HPGPEWYJWRWDTP-UHFFFAOYSA-N lithium peroxide Chemical compound [Li+].[Li+].[O-][O-] HPGPEWYJWRWDTP-UHFFFAOYSA-N 0.000 description 1
- YDGSUPBDGKOGQT-UHFFFAOYSA-N lithium;dimethylazanide Chemical compound [Li+].C[N-]C YDGSUPBDGKOGQT-UHFFFAOYSA-N 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- KRPXAHXWPZLBKL-UHFFFAOYSA-L magnesium;diphenoxide Chemical compound [Mg+2].[O-]C1=CC=CC=C1.[O-]C1=CC=CC=C1 KRPXAHXWPZLBKL-UHFFFAOYSA-L 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- UJNZOIKQAUQOCN-UHFFFAOYSA-N methyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C)C1=CC=CC=C1 UJNZOIKQAUQOCN-UHFFFAOYSA-N 0.000 description 1
- MHERPFVRWOTBSF-UHFFFAOYSA-N methyl(phenyl)phosphane Chemical compound CPC1=CC=CC=C1 MHERPFVRWOTBSF-UHFFFAOYSA-N 0.000 description 1
- PYIGXCSOLWAMGG-UHFFFAOYSA-M methyl(triphenyl)phosphanium;hydroxide Chemical compound [OH-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(C)C1=CC=CC=C1 PYIGXCSOLWAMGG-UHFFFAOYSA-M 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- XRKQMIFKHDXFNQ-UHFFFAOYSA-N n-cyclohexyl-n-ethylcyclohexanamine Chemical compound C1CCCCC1N(CC)C1CCCCC1 XRKQMIFKHDXFNQ-UHFFFAOYSA-N 0.000 description 1
- GNVRJGIVDSQCOP-UHFFFAOYSA-N n-ethyl-n-methylethanamine Chemical compound CCN(C)CC GNVRJGIVDSQCOP-UHFFFAOYSA-N 0.000 description 1
- 150000002816 nickel compounds Chemical class 0.000 description 1
- FBMUYWXYWIZLNE-UHFFFAOYSA-N nickel phosphide Chemical compound [Ni]=P#[Ni] FBMUYWXYWIZLNE-UHFFFAOYSA-N 0.000 description 1
- SPIFDSWFDKNERT-UHFFFAOYSA-N nickel;hydrate Chemical compound O.[Ni] SPIFDSWFDKNERT-UHFFFAOYSA-N 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 150000002828 nitro derivatives Chemical class 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- VLZLOWPYUQHHCG-UHFFFAOYSA-N nitromethylbenzene Chemical compound [O-][N+](=O)CC1=CC=CC=C1 VLZLOWPYUQHHCG-UHFFFAOYSA-N 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- SWMBQMGPRYJSCI-UHFFFAOYSA-N octylphosphane Chemical compound CCCCCCCCP SWMBQMGPRYJSCI-UHFFFAOYSA-N 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- DUXDETQJUQZYEX-UHFFFAOYSA-L oxalate;rubidium(1+) Chemical compound [Rb+].[Rb+].[O-]C(=O)C([O-])=O DUXDETQJUQZYEX-UHFFFAOYSA-L 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- PZKNFJIOIKQCPA-UHFFFAOYSA-N oxalic acid palladium Chemical compound [Pd].OC(=O)C(O)=O PZKNFJIOIKQCPA-UHFFFAOYSA-N 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- WKMKTIVRRLOHAJ-UHFFFAOYSA-N oxygen(2-);thallium(1+) Chemical compound [O-2].[Tl+].[Tl+] WKMKTIVRRLOHAJ-UHFFFAOYSA-N 0.000 description 1
- 150000002940 palladium Chemical class 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 description 1
- JKDRQYIYVJVOPF-FDGPNNRMSA-L palladium(ii) acetylacetonate Chemical compound [Pd+2].C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O JKDRQYIYVJVOPF-FDGPNNRMSA-L 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- RPGWZZNNEUHDAQ-UHFFFAOYSA-N phenylphosphine Chemical compound PC1=CC=CC=C1 RPGWZZNNEUHDAQ-UHFFFAOYSA-N 0.000 description 1
- DJFBJKSMACBYBD-UHFFFAOYSA-N phosphane;hydrate Chemical group O.P DJFBJKSMACBYBD-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000137 polyphosphoric acid Polymers 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 239000004300 potassium benzoate Substances 0.000 description 1
- 235000010235 potassium benzoate Nutrition 0.000 description 1
- 229940103091 potassium benzoate Drugs 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 1
- 229910001950 potassium oxide Inorganic materials 0.000 description 1
- DPLVEEXVKBWGHE-UHFFFAOYSA-N potassium sulfide Chemical compound [S-2].[K+].[K+] DPLVEEXVKBWGHE-UHFFFAOYSA-N 0.000 description 1
- KVOIJEARBNBHHP-UHFFFAOYSA-N potassium;oxido(oxo)alumane Chemical compound [K+].[O-][Al]=O KVOIJEARBNBHHP-UHFFFAOYSA-N 0.000 description 1
- ZGJADVGJIVEEGF-UHFFFAOYSA-M potassium;phenoxide Chemical compound [K+].[O-]C1=CC=CC=C1 ZGJADVGJIVEEGF-UHFFFAOYSA-M 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910001952 rubidium oxide Inorganic materials 0.000 description 1
- CWBWCLMMHLCMAM-UHFFFAOYSA-M rubidium(1+);hydroxide Chemical compound [OH-].[Rb+].[Rb+] CWBWCLMMHLCMAM-UHFFFAOYSA-M 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- ODZPKZBBUMBTMG-UHFFFAOYSA-N sodium amide Chemical compound [NH2-].[Na+] ODZPKZBBUMBTMG-UHFFFAOYSA-N 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- HYHCSLBZRBJJCH-UHFFFAOYSA-M sodium hydrosulfide Chemical compound [Na+].[SH-] HYHCSLBZRBJJCH-UHFFFAOYSA-M 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- PFUVRDFDKPNGAV-UHFFFAOYSA-N sodium peroxide Chemical compound [Na+].[Na+].[O-][O-] PFUVRDFDKPNGAV-UHFFFAOYSA-N 0.000 description 1
- NESLWCLHZZISNB-UHFFFAOYSA-M sodium phenolate Chemical compound [Na+].[O-]C1=CC=CC=C1 NESLWCLHZZISNB-UHFFFAOYSA-M 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 229910052979 sodium sulfide Inorganic materials 0.000 description 1
- GRVFOGOEDUUMBP-UHFFFAOYSA-N sodium sulfide (anhydrous) Chemical compound [Na+].[Na+].[S-2] GRVFOGOEDUUMBP-UHFFFAOYSA-N 0.000 description 1
- ZBNMBCAMIKHDAA-UHFFFAOYSA-N sodium superoxide Chemical compound [Na+].O=O ZBNMBCAMIKHDAA-UHFFFAOYSA-N 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- 229910000144 sodium(I) superoxide Inorganic materials 0.000 description 1
- 239000011973 solid acid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- UUCCCPNEFXQJEL-UHFFFAOYSA-L strontium dihydroxide Chemical compound [OH-].[OH-].[Sr+2] UUCCCPNEFXQJEL-UHFFFAOYSA-L 0.000 description 1
- 229910001866 strontium hydroxide Inorganic materials 0.000 description 1
- UHCGLDSRFKGERO-UHFFFAOYSA-N strontium peroxide Chemical compound [Sr+2].[O-][O-] UHCGLDSRFKGERO-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- WWNBZGLDODTKEM-UHFFFAOYSA-N sulfanylidenenickel Chemical compound [Ni]=S WWNBZGLDODTKEM-UHFFFAOYSA-N 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 1
- 239000003930 superacid Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- CLZWAWBPWVRRGI-UHFFFAOYSA-N tert-butyl 2-[2-[2-[2-[bis[2-[(2-methylpropan-2-yl)oxy]-2-oxoethyl]amino]-5-bromophenoxy]ethoxy]-4-methyl-n-[2-[(2-methylpropan-2-yl)oxy]-2-oxoethyl]anilino]acetate Chemical compound CC1=CC=C(N(CC(=O)OC(C)(C)C)CC(=O)OC(C)(C)C)C(OCCOC=2C(=CC=C(Br)C=2)N(CC(=O)OC(C)(C)C)CC(=O)OC(C)(C)C)=C1 CLZWAWBPWVRRGI-UHFFFAOYSA-N 0.000 description 1
- PUGUQINMNYINPK-UHFFFAOYSA-N tert-butyl 4-(2-chloroacetyl)piperazine-1-carboxylate Chemical compound CC(C)(C)OC(=O)N1CCN(C(=O)CCl)CC1 PUGUQINMNYINPK-UHFFFAOYSA-N 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- CRUVUWATNULHFA-UHFFFAOYSA-M tetramethylphosphanium;hydroxide Chemical compound [OH-].C[P+](C)(C)C CRUVUWATNULHFA-UHFFFAOYSA-M 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- 229910021515 thallium hydroxide Inorganic materials 0.000 description 1
- 229910003438 thallium oxide Inorganic materials 0.000 description 1
- QGYXCSSUHCHXHB-UHFFFAOYSA-M thallium(i) hydroxide Chemical compound [OH-].[Tl+] QGYXCSSUHCHXHB-UHFFFAOYSA-M 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- IFXORIIYQORRMJ-UHFFFAOYSA-N tribenzylphosphane Chemical compound C=1C=CC=CC=1CP(CC=1C=CC=CC=1)CC1=CC=CC=C1 IFXORIIYQORRMJ-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- VYGSFTVYZHNGBU-UHFFFAOYSA-N trichloromethanesulfonic acid Chemical compound OS(=O)(=O)C(Cl)(Cl)Cl VYGSFTVYZHNGBU-UHFFFAOYSA-N 0.000 description 1
- NYKQYQGHJAVHSU-UHFFFAOYSA-M triethylsulfanium;hydroxide Chemical compound [OH-].CC[S+](CC)CC NYKQYQGHJAVHSU-UHFFFAOYSA-M 0.000 description 1
- LEMQFBIYMVUIIG-UHFFFAOYSA-N trifluoroborane;hydrofluoride Chemical compound F.FB(F)F LEMQFBIYMVUIIG-UHFFFAOYSA-N 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- KCTAHLRCZMOTKM-UHFFFAOYSA-N tripropylphosphane Chemical compound CCCP(CCC)CCC KCTAHLRCZMOTKM-UHFFFAOYSA-N 0.000 description 1
- WXAZIUYTQHYBFW-UHFFFAOYSA-N tris(4-methylphenyl)phosphane Chemical compound C1=CC(C)=CC=C1P(C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 WXAZIUYTQHYBFW-UHFFFAOYSA-N 0.000 description 1
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical compound [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000010969 white metal Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は、耐熱性ポリマー用のモノマー、あるいは農
薬、医薬等の中間体として重要な4−(パラフルオロベ
ンゾイル)フエノール類の製造方法に関する。TECHNICAL FIELD The present invention relates to a method for producing 4- (parafluorobenzoyl) phenols, which are important as monomers for heat-resistant polymers or intermediates for agricultural chemicals, pharmaceuticals and the like.
(従来の技術および問題点) 4−(パラフルオロベンゾイル)フエノールの製法とし
て、パラフルオロ安息香酸とフエノールとを、大量のポ
リリン酸中で反応させる方法(特公昭50−4653号公
報)、大量の無水フツ化水素中で反応させる方法(特開
昭53−9735号公報)、大量のメタンスルホン酸中で反応
させる方法(特開昭57−154140号公報)、大量のトリフ
ルオロメタンスルホン酸中で反応させる方法(特開昭58
−62132号公報)が提案されているが、これらの方法で
は、パラフルオロ安息香酸が高価なことと、大量の強酸
を使用することと、さらには、脱水反応によつて生成し
た水により、これらの酸が希釈されてしまい、必要な酸
の濃度を保持するためには濃縮しなければならないが、
これらの酸と水との親和性が大きく、その分離が困難で
あることなどの欠点を有している。また、パラフルオロ
安息香酸クロリドとフエノールとのフリーデル・クラフ
ツ反応を行う方法(特開昭53−9735号公報、特開昭58−
15936号公報)も提案されているが、パラフルオロ安息
香酸クロリドはさらに高価なものである。(Prior Art and Problems) As a method for producing 4- (parafluorobenzoyl) phenol, a method of reacting parafluorobenzoic acid and phenol in a large amount of polyphosphoric acid (Japanese Patent Publication No. 50-4653), a large amount of Reaction in anhydrous hydrogen fluoride (JP-A-53-9735), reaction in a large amount of methanesulfonic acid (JP-A-57-154140), reaction in a large amount of trifluoromethanesulfonic acid Method (JP-A-58)
However, in these methods, due to the high cost of parafluorobenzoic acid, the use of a large amount of strong acid, and the water generated by the dehydration reaction, Acid has been diluted and must be concentrated to maintain the required acid concentration,
These acids have the disadvantages that they have a high affinity for water and their separation is difficult. Further, a method of carrying out the Friedel-Crafts reaction between parafluorobenzoic acid chloride and phenol (Japanese Patent Laid-Open No. 9735/53, Japanese Patent Laid-Open No.
No. 15936), but parafluorobenzoic acid chloride is more expensive.
さらに、フツ化ベンゼンとパラヒドロキシ安息香酸と
を、無水フツ化水素−三フツ化ホウ素中で反応させる方
法(特開昭58−15936号公報)、大量のトリフルオロメ
タンスルホン酸中で反応させる方法(特開昭58−62132
号公報)も提案されているが、パラヒドロキシ安息香酸
が比較的高価な原料であることと、脱水反応によつて生
成してくる水とこれらの強酸との分離が、前述のように
困難なことなどの欠点を有している。Furthermore, a method of reacting fluorinated benzene and parahydroxybenzoic acid in anhydrous hydrogen fluoride-boron trifluoride (JP-A-58-15936), a method of reacting in a large amount of trifluoromethanesulfonic acid ( JP-A-58-62132
However, para-hydroxybenzoic acid is a relatively expensive raw material, and it is difficult to separate water generated by the dehydration reaction from these strong acids as described above. It has drawbacks such as that.
(問題点を解決するための手段) そこで、本発明者らは、簡単な化合物であるフツ化ベン
ゼン、一酸化炭素、フエノール類から安価に、4−(パ
ラフルオロベンゾイル)フエノール類を製造する方法に
ついて鋭意検討を重ねた結果、本発明を完成するに至つ
た。(Means for Solving Problems) Therefore, the present inventors have proposed a method for inexpensively producing 4- (parafluorobenzoyl) phenols from simple compounds such as fluorinated benzene, carbon monoxide, and phenols. As a result of repeated intensive studies, the present invention has been completed.
すなわち、本発明は、フツ化ベンゼン、一酸化炭素およ
びフエノール類から4−(パラフルオロベンゾイル)フ
エノール類を製造するに当り、 (a)臭素および/または分子状酸素と臭化水素とから
なるブロム化剤とフツ化ベンゼンとを反応させて、パラ
ブロモフルオロベンゼンを得るブロム化工程、 (b)該パラブロモフルオロベンゼンをカルボニル化触
媒および塩基の存在下に、一酸化炭素およびパラ位に置
換基を持たないフエノール類と反応させて、パラフルオ
ロ安息香酸フエニルエステル類を得るエステル化工程、
および (c)該パラフルオロ安息香酸フエニルエステル類を酸
触媒の存在下、4−(パラフルオロベンゾイル)フエノ
ール類に転位させる転位反応工程よりなることを特徴と
する4−(パラフルオロベンゾイル)フエノール類の製
造方法を提供することにある。That is, in the present invention, in producing 4- (parafluorobenzoyl) phenols from fluorinated benzene, carbon monoxide and phenols, (a) bromine and / or molecular oxygen and hydrogen bromide are used. A bromination step of reacting an agent with fluorinated benzene to obtain para-bromofluorobenzene, and (b) the para-bromofluorobenzene in the presence of a carbonylation catalyst and a base at the carbon monoxide and para-substituents An esterification step for obtaining parafluorobenzoic acid phenyl esters by reacting with phenols having no
And (c) a rearrangement reaction step of rearranging the parafluorobenzoic acid phenyl esters into 4- (parafluorobenzoyl) phenols in the presence of an acid catalyst. It is to provide a manufacturing method of a class.
本発明の方法は、次のような反応式で表わされる。The method of the present invention is represented by the following reaction formula.
(a) ブロム化工程 および/または (b) エステル化工程 (c) 転位反応工程 (式中、R1,R2,R3,R4は、それぞれ水素または低級アル
キル基、低級アルコキシ基、フツ素原子、ニトロ基、シ
アノ基から選ばれた置換基を表わし、これらは、それぞ
れが同じものであつてもよい。また、Baseとは塩基を表
わす。) 本発明のブロム化工程においては、ブロム化剤として臭
素、または分子状酸素と臭化水素を、それぞれ単独で、
または組み合わせて用いることができる。(A) Bromination process And / or (B) Esterification step (C) Rearrangement reaction step (In the formula, R 1 , R 2 , R 3 , and R 4 each represent a substituent selected from hydrogen or a lower alkyl group, a lower alkoxy group, a fluorine atom, a nitro group, and a cyano group, and these are respectively May be the same, and Base represents a base.) In the brominating step of the present invention, bromine as a brominating agent, or molecular oxygen and hydrogen bromide are each independently,
Alternatively, they can be used in combination.
臭素を用いるフツ化ベンゼンのブロム化反応は、気相、
液相いずれでもできるが、パラブロモフルオロベンゼン
を高選択率、高収率で得るためには、液相での反応がよ
り好ましい。そして、その液相ブロム化反応を実施する
際には、臭素1モル当り1.1〜10モルのフツ化ベンゼン
を用いることが好ましく、より好ましくは1.3〜5モル
のフツ化ベンゼンが用いられる。フツ化ベンゼンの使用
量が臭素1モル当り1.1モルより少いと、ジブロモフル
オロベンゼンやトリブロモフルオロベンゼンなどの多ブ
ロム化フルオロベンゼンの副生量が増したり、未反応の
臭素が残つたりして、パラブロモフルオロベンゼンの収
率や選択率が低下する。また、10倍モルより多くのフツ
化ベンゼンを用いることは、ブロム化反応自体は問題が
ないが、反応器が大きくなつたり、分離すべき未反応の
フツ化ベンゼンの量が多くなるので、好ましい方法では
ない。The bromination reaction of fluorinated benzene using bromine is carried out in the gas phase,
Although either liquid phase can be used, in order to obtain para-bromofluorobenzene with high selectivity and high yield, the reaction in liquid phase is more preferable. When carrying out the liquid phase bromination reaction, 1.1 to 10 mol of fluorinated benzene is preferably used, and more preferably 1.3 to 5 mol of fluorinated benzene is used per mol of bromine. If the amount of fluorobenzene used is less than 1.1 mol per mol of bromine, the amount of polybrominated fluorobenzene such as dibromofluorobenzene and tribromofluorobenzene will increase, and unreacted bromine will remain. The yield and selectivity of para-bromofluorobenzene decrease. Further, it is preferable to use more than 10 times mol of fluorinated benzene because the bromination reaction itself has no problem, but the reactor becomes large and the amount of unreacted fluorinated benzene to be separated increases. Not the way.
また、パラブロモフルオロベンゼンの選択率を上げ、異
性体であるオルトブロモフルオロベンゼンやメタブロモ
フルオロベンゼン、あるいは多ブロム化フルオロベンゼ
ンの副生量を低くするためには、液相ブロム化反応はで
きるだけ低温で行うことが好ましい。このような意味で
は、反応は100℃以下の温度で行われるのが好ましく、
その範囲は−20〜100℃であり、より好ましくは−10〜8
0℃の範囲である。Further, in order to increase the selectivity of para-bromofluorobenzene and reduce the amount of by-products such as isomers ortho-bromofluorobenzene, meta-bromofluorobenzene, or polybrominated fluorobenzene, the liquid-phase bromination reaction should be performed as much as possible. It is preferable to carry out at a low temperature. In this sense, the reaction is preferably carried out at a temperature of 100 ° C or lower,
The range is −20 to 100 ° C., more preferably −10 to 8 ° C.
It is in the range of 0 ° C.
この液相ブロム化反応は、無触媒でも実施できるが、触
媒を使用することも、反応温度を低下させてパラブロモ
フルオロベンゼンの選択率を向上させたり、反応速度を
上げたりできるので好ましい方法である。This liquid phase bromination reaction can be carried out without a catalyst, but it is also possible to use a catalyst because it is possible to lower the reaction temperature to improve the selectivity of para-bromofluorobenzene and to increase the reaction rate. is there.
このような触媒としては、鉄粉、塩化鉄、臭化鉄、水酸
化鉄などの鉄触媒;塩化アルミニウム、臭化アルミニウ
ムなどのアルミニウム触媒;ヨウ素などを用いることが
できる。特に好ましいのは鉄触媒である。As such a catalyst, iron powder, iron chloride, iron bromide, iron hydroxide and other iron catalysts; aluminum chloride, aluminum bromide and other aluminum catalysts; iodine and the like can be used. Particularly preferred is an iron catalyst.
また、液相ブロム化反応においては、フツ化ベンゼン以
外の他の溶媒を用いずに実施することも好ましい方法で
あるが、必要に応じて溶媒を用いることもできる。この
ような溶媒としては、反応に悪影響を及ぼさないもので
あれば、どのようなものも使用できるが、例えば、酢
酸、プロピオン酸などの低級脂肪族カルボン酸類;四塩
化炭素、クロロホルム、塩化メチレン、トリクロロエタ
ンなどの低級脂肪族ハロゲン化炭化水素類;エーテル、
ジオキサンなどのエーテル類;二硫化炭素などがあげら
れる。Further, it is also a preferable method to carry out the liquid phase bromination reaction without using a solvent other than fluorinated benzene, but a solvent can be used if necessary. As such a solvent, any solvent can be used as long as it does not adversely affect the reaction, and for example, lower aliphatic carboxylic acids such as acetic acid and propionic acid; carbon tetrachloride, chloroform, methylene chloride, Lower aliphatic halogenated hydrocarbons such as trichloroethane; ethers,
Ethers such as dioxane; carbon disulfide and the like.
この液相ブロム化反応は、回分式でも流通式でも実施で
きるが、反応系中では、臭素に対してフツ化ベンゼンが
当量より過剰に存在している状態で反応させることが重
要である。This liquid phase bromination reaction can be carried out by either a batch system or a flow system, but it is important to carry out the reaction in the reaction system in a state where fluorinated benzene is present in excess of the equivalent amount with respect to bromine.
このような臭素をブロム化剤とする液相ブロム化反応に
よつて、パラブロモフルオロベンゼンが臭素に対して80
%以上の収率および選択率で得られ、通常の場合、さら
に高い90%以上あるいは95%以上の収率および選択率が
達成できる。By such liquid phase bromination reaction using bromine as a brominating agent, para-bromofluorobenzene was converted to
% Yields and selectivities, and in the usual cases, even higher yields and selectivities of 90% or higher or 95% or higher can be achieved.
また、分子状酸素と臭化水素をブロム化剤として使用す
るフツ化ベンゼンのオキシブロム化反応の場合も、気
相、液相のいずれでも実施できるが、生産性の高いこと
や爆発限界のことを考慮すれば、気相での反応がより好
ましい。In addition, the oxybromination reaction of fluorinated benzene using molecular oxygen and hydrogen bromide as brominating agents can be carried out in either the gas phase or the liquid phase, but the high productivity and explosion limit In consideration, the reaction in the gas phase is more preferable.
この気相オキシブロム化反応は、無触媒でも実施できる
が、パラブロモフルオロベンゼンの収率や選択率をより
向上させたり、反応温度を低下させたり、反応速度を向
上させる目的で、触媒を用いることがより好ましい方法
である。このような触媒としては、銅系触媒や鉄系触
媒、およびこれらを混合した触媒などが好ましく用いら
れるが、特に好ましいのは、銅を含有する固体触媒であ
る。このような銅系触媒としては、銅粉などの銅金属;
塩化銅、臭化銅、ヨウ化銅などのハロゲン化物類;硝酸
銅、硫酸銅、酢酸銅などの塩類;酸化第一銅、酸化第二
銅、硫化銅などの酸化物および硫化物類などの各種銅化
合物が用いられる。This gas phase oxybromination reaction can be carried out without a catalyst, but a catalyst is used for the purpose of further improving the yield and selectivity of parabromofluorobenzene, lowering the reaction temperature, and improving the reaction rate. Is a more preferable method. As such a catalyst, a copper-based catalyst, an iron-based catalyst, a catalyst obtained by mixing these, or the like is preferably used, but a solid catalyst containing copper is particularly preferable. As such a copper-based catalyst, copper metal such as copper powder;
Halides such as copper chloride, copper bromide and copper iodide; salts such as copper nitrate, copper sulfate and copper acetate; oxides and sulfides such as cuprous oxide, cupric oxide and copper sulfide Various copper compounds are used.
これらの金属状銅または銅化合物は、単独でも用いるこ
ともできるが、例えば、活性炭、グラフアイト、シリ
カ、アルミナ、シリカ−アルミナ、シリカ−チタニア、
チタニア、ジルコニア、硫酸バリウム、炭酸カルシウ
ム、アスベスト、ベントナイト、ケイソウ土、ポリマ
ー、イオン交換樹脂、ゼオライト、モレキユラーシー
ブ、ケイ酸マグネシウム、マグネシアなどの担体に担持
されたものであつてもよい。These metallic coppers or copper compounds can be used alone or, for example, activated carbon, graphite, silica, alumina, silica-alumina, silica-titania,
It may be supported on a carrier such as titania, zirconia, barium sulfate, calcium carbonate, asbestos, bentonite, diatomaceous earth, polymer, ion exchange resin, zeolite, molecular sieve, magnesium silicate or magnesia.
また、銅を含有する固体触媒として、銅イオンでイオン
交換したゼオライトも好ましく用いられる。このような
銅イオン交換ゼオライトは、ゼオライトを銅イオンを含
む水溶液中に浸漬することによつて、ゼオライト中のナ
トリウムカチオンを所定量の銅カチオンで交換した後、
乾燥したものであつて、容易に得られるものである。銅
イオンの交換量は、イオン交換容量の5%以上であり、
より好ましくは10%以上である。なお、ここでいうイオ
ン交換容量とは、ゼオライトのアニオン部であるAlO4 -
と対をなすカチオン部の総量である。Further, as the solid catalyst containing copper, zeolite ion-exchanged with copper ions is also preferably used. Such copper ion-exchanged zeolite, by immersing the zeolite in an aqueous solution containing copper ions, after exchanging sodium cations in the zeolite with a predetermined amount of copper cations,
It is a dried product and can be easily obtained. The exchange amount of copper ions is 5% or more of the ion exchange capacity,
It is more preferably 10% or more. Incidentally, AlO 4 The ion exchange capacity here is an anion of the zeolite -
It is the total amount of the cation portion paired with.
このようなゼオライトとしては、Y型ゼオライト、モル
デナイト、ZSM−5などが好ましく用いられるが、特に
好ましいのはY型ゼオライトである。As such a zeolite, Y-type zeolite, mordenite, ZSM-5 and the like are preferably used, but Y-type zeolite is particularly preferable.
この気相オキシブロム化反応の原料中のフツ化ベンゼン
の臭化水素に対するモル比は1.0〜10の範囲であり、よ
り好ましくは1.2〜8の範囲である、この比が1.0より小
さいと、未反応の臭化水素が残つたり、多ブロム化フル
オロベンゼンの副生量が増加するので好ましくない。ま
た、この比を10以上で実施することは、反応上は悪影響
はないが、パラブロモフルオロベンゼンの空時収率が低
下し、分離すべき未反応のフツ化ベンゼンの量が増える
ので好ましい方法ではない。The molar ratio of fluorinated benzene to hydrogen bromide in the raw material for this gas phase oxybromination reaction is in the range of 1.0 to 10 and more preferably in the range of 1.2 to 8. If this ratio is less than 1.0, unreacted Of hydrogen bromide and the amount of by-produced polybrominated fluorobenzene increase, which is not preferable. Further, if this ratio is carried out at 10 or more, there is no adverse effect on the reaction, but the space-time yield of para-bromofluorobenzene is reduced, and the amount of unreacted fluorinated benzene to be separated is increased. is not.
また、供給ガス中の分子状酸素の臭化水素に対するモル
比は0.5〜10の範囲であり、より好ましくは0.6〜5の範
囲である。この比が0.5より小さいと、未反応の臭化水
素が残るので好ましくない。また、10より大きくする
と、生成物の空時収率が低下するので好ましくない。The molar ratio of molecular oxygen to hydrogen bromide in the feed gas is in the range of 0.5 to 10, more preferably 0.6 to 5. If this ratio is less than 0.5, unreacted hydrogen bromide remains, which is not preferable. On the other hand, if it is more than 10, the space-time yield of the product is lowered, which is not preferable.
この分子状酸素とは、純酸素または酸素を含むものであ
つて、空気でもよいし、あるいは空気または純酸素に反
応を阻害しない他のガス、例えば、窒素、アルゴン、ヘ
リウム、炭酸ガスなどの不活性ガスを加えて希釈したも
のであつてもよい。This molecular oxygen may be pure oxygen or oxygen-containing oxygen, and may be air, or other gas that does not interfere with the reaction with air or pure oxygen, such as nitrogen, argon, helium, carbon dioxide, or the like. It may be diluted with active gas.
気相オキシブロム化反応の反応温度は、反応系を気相に
保てる温度であれば特に制限はないが、あまり高温にな
ると、パラブロモフルオロベンゼンの選択率や収率が低
下するため、通常は60〜400℃、好ましくは100〜300
℃、さらに好ましくは150〜250℃の範囲である。The reaction temperature of the gas phase oxybromination reaction is not particularly limited as long as it is a temperature that can maintain the reaction system in the gas phase, but if the temperature is too high, the selectivity or yield of para-bromofluorobenzene decreases, so it is usually 60 ~ 400 ° C, preferably 100-300
C., more preferably 150 to 250.degree.
気相オキシブロム化反応は、減圧、常圧、加圧のいずれ
かの圧力下でも実施できるが、通常、0.5〜10気圧、好
ましくは0.8〜5気圧の範囲で行われる。The gas phase oxybromination reaction can be carried out under any of reduced pressure, normal pressure and increased pressure, but is usually carried out in the range of 0.5 to 10 atm, preferably 0.8 to 5 atm.
このような気相オキシブロム化反応によつて、パラブロ
モフルオロベンゼンが臭化水素に対して、80%以上の収
率および選択率で得られ、通常の場合、さらに高い90%
以上の収率および選択率が達成できる。By such a gas-phase oxybromination reaction, para-bromofluorobenzene can be obtained in a yield and selectivity of 80% or more with respect to hydrogen bromide, which is usually higher than 90%.
The above yield and selectivity can be achieved.
気相オキシブロム化反応において、ブロム源として、臭
化水素のみでなく、臭化水素と臭素の混合物を用いるこ
とも、もちろん可能である。It is of course possible to use not only hydrogen bromide but also a mixture of hydrogen bromide and bromine as the bromine source in the gas phase oxybromination reaction.
臭素を用いるブロム化反応の場合、通常、臭化水素が副
生するので、この副生臭化水素をオキシブロム化反応に
使用することも好ましい方法である。この場合、副生臭
化水素を系外に取り出して、別のオキシブロム化反応装
置で反応を行うこともできるし、臭素を使うブロム化の
反応系内に酸化剤である分子状酸素や硝酸などを加える
ことによつて、オキシブロム化反応を併発させながら行
うこともできる。In the case of the bromination reaction using bromine, hydrogen bromide is usually produced as a by-product, and it is also a preferable method to use this by-produced hydrogen bromide in the oxybromination reaction. In this case, the by-product hydrogen bromide can be taken out of the system and reacted in another oxybromination reaction device, or molecular oxygen or nitric acid, which is an oxidant, can be added to the bromination reaction system using bromine. By adding it, it is also possible to carry out the oxybromination reaction concurrently.
もちろん、副生する臭化水素あるいはそれを塩の形でブ
ロム化反応の系外に取り出して、公知の方法で臭素とし
て回収することも可能である。Of course, it is also possible to take out by-product hydrogen bromide or its form in the form of a salt out of the bromination reaction system and recover it as bromine by a known method.
このようなブロム化反応によつて得られたブロム化フル
オロベンゼン混合物は、パラブロモフルオロベンゼンを
主成分とするものであるが、通常は少量のオルトブロモ
フルオロベンゼンを含んでいる場合があり、また、場合
によつては、微量のメタブロモフルオロベンゼンやジブ
ロモフルオロベンゼンを含んでいることもあるが、これ
らの副生物は必要に応じて蒸留および/または晶析等の
操作によつて除去することができる。The brominated fluorobenzene mixture obtained by such a bromination reaction contains para-bromofluorobenzene as a main component, but usually contains a small amount of ortho-bromofluorobenzene, and In some cases, trace amounts of metabromofluorobenzene and dibromofluorobenzene may be contained, but these by-products should be removed by operations such as distillation and / or crystallization, if necessary. You can
本発明のエステル化工程においては、ブロム化工程で得
られたパラブロモフルオロベンゼンをカルボニル化触媒
および塩基の存在下に、一酸化炭素およびフエノール類
と反応させて、パラフルオロ安息香酸フエニルエステル
類を得る。In the esterification step of the present invention, the parabromofluorobenzene obtained in the bromination step is reacted with carbon monoxide and phenols in the presence of a carbonylation catalyst and a base to give parafluorobenzoic acid phenyl esters. To get
カルボニル化触媒としては、パラジウム、ロジウム、ル
テニウム、白金、イリジウムなどの白金属元素を含む触
媒、あるいは鉄、コバルト、ニツケルなどの金属元素を
含む触媒が好ましく用いられる。特に好ましいのはパラ
ジウム触媒またはニツケル触媒である。パラジウム触媒
としては、成分としてパラジウム元素を含むものであれ
ば特に制限はなく、パラジウムが金属状態であつてもよ
いし、化合物を形成する成分であつてもよい。また、こ
のパラジウム成分が例えば、活性炭、グラフアイト、シ
リカ、アルミナ、シリカ−アルミナ、シリカ−チタニ
ア、チタニア、ジルコニア、硫酸バリウム、炭酸カルシ
ウム、アスベスト、ベントナイト、ケイソウ土、ポリマ
ー、イオン交換樹脂、ゼオライト、モレキユラーシー
ブ、ケイ酸マグネシウム、マグネシアなどの担体に担持
されたものであつてもよい。As the carbonylation catalyst, a catalyst containing a white metal element such as palladium, rhodium, ruthenium, platinum or iridium, or a catalyst containing a metal element such as iron, cobalt or nickel is preferably used. Particularly preferred is a palladium catalyst or a nickel catalyst. The palladium catalyst is not particularly limited as long as it contains a palladium element as a component, and palladium may be in a metallic state or may be a component forming a compound. Further, this palladium component is, for example, activated carbon, graphite, silica, alumina, silica-alumina, silica-titania, titania, zirconia, barium sulfate, calcium carbonate, asbestos, bentonite, diatomaceous earth, polymer, ion exchange resin, zeolite, It may be supported on a carrier such as molecular sieve, magnesium silicate or magnesia.
金属状態のパラジウムとしては、パラジウム金属、パラ
ジウム黒、パラジウムイオンを含む化合物を前記のよう
な担体に担持した後、水素やホルムアルデヒド、ヒドラ
ジンなどで還元処理したもの、およびパラジウムを含む
合金あるいは金属間化合物などが用いられる。合金ある
いは金属間化合物としては、例えば、セレン、テルル、
イオウ、アンチモン、ビスマス、銅、銀、金、亜鉛、ス
ズ、バナジウム、鉄、コバルト、ニツケル、水銀、鉛、
タリウム、クロム、モリブデン、タングステンなどを含
むものがあげられる。もちろん、これらの合金あるいは
金属間化合物が、前記のような担体に担持されたもので
あつてもよい。Examples of the palladium in the metallic state include palladium metal, palladium black, and a compound containing palladium ions supported on the carrier as described above, followed by reduction treatment with hydrogen, formaldehyde, hydrazine, or the like, and an alloy containing palladium or an intermetallic compound. Are used. Examples of alloys or intermetallic compounds include selenium, tellurium,
Sulfur, antimony, bismuth, copper, silver, gold, zinc, tin, vanadium, iron, cobalt, nickel, mercury, lead,
Examples thereof include those containing thallium, chromium, molybdenum, tungsten and the like. Of course, these alloys or intermetallic compounds may be supported on the carrier as described above.
一方、パラジウムを含む化合物としては、PdCl2,PdBr2,
PdI2,Pd(NO3)2,PdSO4などの無機塩類;Pd(OCOCH3)2,
シユウ酸パラジウムなどの有機酸塩類;Pd(CN)2;PdO;P
dS;M2〔PdX4〕,M2〔PdX6〕で示されるパラジウム酸塩類
(Mはアルカリ金属、またはアンモニウムイオンを表わ
し、Xはニトロ基、シアノ基、ハロゲン,NO3,1/2 SO4
を表わす);〔Pd(NH3)4〕X4、〔Pd(en)2〕X2な
どのパラジウムのアンミン錯体類(Xは上記と同じ意味
をもち、enはエチレンジアミンを表わす);PdCl2(PhC
N)2,PdCl2(PR3)2,Pd(CO)(PR3)3,Pd(PPh3)4,Pd
Cl(R)(PPh3)2,Pd(C2H4)(PPh3)2,Pd(C3H5)2
などの錯化合物または有機金属化合物類(Rはアルキ
ル、アリールなどの有機基を表わす);Pd(acac)2な
どのキレート配位子が配位した錯化合物類(acacはアセ
チルアセトンを表わす)などが用いられる。On the other hand, as the compound containing palladium, PdCl 2 , PdBr 2 ,
Inorganic salts such as PdI 2 , Pd (NO 3 ) 2 and PdSO 4 ; Pd (OCOCH 3 ) 2 ,
Organic acid salts such as palladium oxalate; Pd (CN) 2 ; PdO; P
dS; M 2 [PdX 4 ], M 2 [PdX 6 ] Palladates (M represents an alkali metal or an ammonium ion, X is a nitro group, a cyano group, a halogen, NO 3 , 1/2 SO Four
Amnesium complexes of palladium such as [Pd (NH 3 ) 4 ] X 4 and [Pd (en) 2 ] X 2 (X has the same meaning as above, and en represents ethylenediamine); PdCl 2 (PhC
N) 2 , PdCl 2 (PR 3 ) 2 ,, Pd (CO) (PR 3 ) 3 ,, Pd (PPh 3 ) 4 ,, Pd
Cl (R) (PPh 3) 2, Pd (C 2 H 4) (PPh 3) 2, Pd (C 3 H 5) 2
Complex compounds or organometallic compounds (R represents an organic group such as alkyl or aryl); complex compounds in which a chelate ligand such as Pd (acac) 2 is coordinated (acac represents acetylacetone), etc. Used.
また、本発明で用いられるニツケル触媒とは、成分とし
てニツケル元素を含むものであれば特に制限はなく、ニ
ツケルが金属状態であつてもよいし、化合物を形成する
成分であつてもよい。さらに、このニツケル成分が前記
のような担体に担持されたものであつてもよい。The nickel catalyst used in the present invention is not particularly limited as long as it contains a nickel element as a component, and nickel may be in a metallic state or may be a component forming a compound. Further, the nickel component may be supported on the carrier as described above.
一方、ニツケルを含む化合物としては、NiCl2、NiBr2、
NiI2などのハロゲン化ニツケル類;NiSO4、Ni(N
O3)2、NiCO3、Ni(SCN)2、Ni(ClO4)2などの無機
酸のニツケル塩類;Ni(OCOCH3)2、シユウ酸ニツケル
などの有機酸のニツケル塩類;酸化ニツケル;水酸化ニ
ツケル;硫化ニツケル;リン化ニツケル;M2〔NiX4〕、M
4〔NiX6〕で示されるニツケル酸塩類(Mはアルカリ金
属またはアンモニウムイオンを表わし、Xはニトロ基、
シアノ基、ハロゲン、NO3、 を表わす);〔Ni(NH3)4〕X2、〔Ni(Y)3〕X2、
〔Ni(Y)2〕X2、〔Ni(py)4〕X2などのニツケルの
アンミン錯体類(Xは上記と同じ意味をもち、Yはエチ
レンジアミン、ジエチレントリアミン、ビピリジン、フ
エナントロリンなどのキレート配位子を表わし、pyはピ
リジンを表わす);Ni(acac)2などのキレート配位子
が配位した錯化合物類(acacはアセチルアセトンを表わ
す);Ni(CO)4、Ni(CO)3(PR3)、Ni(CO)2(PR
3)2、NiX2(PR3)2、NiX(PR3)3、Ni(PR3)4、N
iXPh(PR3)2、Ni(RNC)2、〔NiX(allyl)〕2Ni(C
5H5)2、Ni(CO)2(C5H5)2、NiX(C5H5)(P
R3)、Ni(COD)2、Ni(COD)(PR3)などの錯化合物
類または有機ニツケル化合物類(Rはアルキル、アリー
ルなどの有機基を表わし、CODはシクロオクタジエンを
表わす)などが用いられる。なお、これらの化合物の中
で或る種のものについては、水和物の形で用いてもよ
い。On the other hand, the compounds containing nickel include NiCl 2 , NiBr 2 ,
Halogenated nickels such as NiI 2 ; NiSO 4 , Ni (N
Nickel salts of inorganic acids such as O 3 ) 2 , NiCO 3 , Ni (SCN) 2 and Ni (ClO 4 ) 2 ; Nickel salts of organic acids such as Ni (OCOCH 3 ) 2 and oxalic acid; Nickel oxide; Water Nickel oxide; Nickel sulfide; Nickel phosphide; M 2 [NiX 4 ], M
4 Nickel salts represented by [NiX 6 ] (M represents an alkali metal or ammonium ion, X is a nitro group,
Cyano group, halogen, NO 3 , Represents;); [Ni (NH 3 ) 4 ] X 2 , [Ni (Y) 3 ] X 2 ,
Nickel ammine complexes such as [Ni (Y) 2 ] X 2 and [Ni (py) 4 ] X 2 (X has the same meaning as above, Y is a chelate such as ethylenediamine, diethylenetriamine, bipyridine, and phenanthroline. Represents a ligand, py represents pyridine); complex compounds in which a chelate ligand such as Ni (acac) 2 is coordinated (acac represents acetylacetone); Ni (CO) 4 , Ni (CO) 3 (PR 3 ), Ni (CO) 2 (PR
3 ) 2 , NiX 2 (PR 3 ) 2 , NiX (PR 3 ) 3 , Ni (PR 3 ) 4 , N
iXPh (PR 3 ) 2 , Ni (RNC) 2 , [NiX (allyl)] 2 Ni (C
5 H 5) 2, Ni ( CO) 2 (C 5 H 5) 2, NiX (C 5 H 5) (P
R 3 ), Ni (COD) 2 , Ni (COD) (PR 3 ) and other complex compounds or organic nickel compounds (R represents an organic group such as alkyl and aryl, COD represents cyclooctadiene), etc. Is used. Note that some of these compounds may be used in the form of hydrates.
これらのパラジウム触媒およびニツケル触媒は、1種だ
け用いてもよいし、2種以上を用いることもできる。These palladium catalysts and nickel catalysts may be used alone or in combination of two or more.
さらに、収率や選択率を向上させたり、反応速度を上げ
たり、反応温度を下げたりする目的で、他の化合物を添
加することもできる。このような化合物としては、例え
ば、一般式(I)で示されるようなホスフイン化合物が
あげられる。Further, other compounds can be added for the purpose of improving the yield and selectivity, increasing the reaction rate, and decreasing the reaction temperature. Examples of such a compound include a phosphine compound represented by the general formula (I).
PR′1R′2R′3 (I) (式中、R′1,R′2,R′3は水素、ハロゲン、脂肪族
基、脂環族基、芳香族基、芳香脂肪族基を表わし、これ
らは同じものであつてもよいし、また、リンを含む環を
構成する要素であつてもよい。) もちろん、このようなリンを1分子中に2個以上含むポ
リホスフイン化合物であつてもよい。PR ′ 1 R ′ 2 R ′ 3 (I) (wherein R ′ 1 , R ′ 2 and R ′ 3 are hydrogen, halogen, an aliphatic group, an alicyclic group, an aromatic group and an araliphatic group. Which may be the same or may be elements constituting a ring containing phosphorus.) Of course, such a polyphosphine compound containing two or more phosphorus in one molecule may be used. Good.
このようなホスフイン化合物としては、例えば、n−オ
クチルホスフイン、ジ−n−ブチルホスフイン、ジエチ
ルブチルホスフイン、トリ−n−プロピルホスフイン、
トリ−n−ブチルホスフインなどのアルキルホスフイ
ン、ジアルキルホスフインおよびトリアルキルホスフイ
ン類;シクロヘキシルホスフイン、ジシクロヘキシルホ
スフインなどの脂環族ホスフイン類;ベンジルホスフイ
ン、ジベンジルホスフイン、ジベンジルエチルホスフイ
ン、トリベンジルホスフインなどの芳香脂肪族ホスフイ
ン類;メチルフエニルホスフイン、エチルフエニルホス
フイン、ジメチルフエニルホスフイン、メチルジフエニ
ルホスフイン、メチルベンジルフエニルホスフイン、エ
チルジフエニルホスフイン、ジシクロヘキシルフエニル
ホスフインなどの混合ホスフイン類;フエニルホスフイ
ン、トリルホスフイン、ジフエニルホスフイン、トリフ
エニルホスフイン、トリストリルホスフイン、ジフエニ
ルトリルホスフインなどのアリールホスフイン、ジアリ
ールホスフインおよびトリアリールホスフイン類;ビス
(ジフエニルホスフイノ)メタン、ビス(ジフエニルホ
スフイノ)エタン、オルトフエニレンビス(ジエチルホ
スフイン、2,2′−ビス(ジフエニルホスフイン)−1,
1′−ビナフチルなどのジホスフイン類などが用いられ
る。Examples of such phosphine compounds include n-octylphosphine, di-n-butylphosphine, diethylbutylphosphine, tri-n-propylphosphine,
Alkylphosphines such as tri-n-butylphosphine, dialkylphosphines and trialkylphosphines; cycloaliphatic phosphines such as cyclohexylphosphine and dicyclohexylphosphine; benzylphosphines, dibenzylphosphines, dibenzylethyl Aroaliphatic phosphines such as phosphine and tribenzylphosphine; methylphenylphosphine, ethylphenylphosphine, dimethylphenylphosphine, methyldiphenylphosphine, methylbenzylphenylphosphine, ethyldiphenylphosphine And mixed cyclophosphines such as dicyclohexylphenylphosphine; phenylphosphine, tolylphosphine, diphenylphosphine, triphenylphosphine, tristrilphosphine, diphenyltolylphosphine Which arylphosphines, diarylphosphines and triarylphosphines; bis (diphenylphosphino) methane, bis (diphenylphosphino) ethane, orthophenylenebis (diethylphosphine, 2,2'-bis (diphine) Enylphosphine) -1,
Diphosphines such as 1'-binaphthyl are used.
このようなホスフイン化合物は、1種類でもよいし、2
種以上混合して用いてもよい。このようなホスフイン化
合物の中で、特にトリアリールホスフインが好ましく用
いられる。トリアリールホスフインの中でも、入手の容
易さなどの理由でトリフエニルホスフインが特に好まし
く用いられる。Such phosphine compounds may be of one type or of two types.
You may use it in mixture of 2 or more types. Among such phosphine compounds, triarylphosphine is particularly preferably used. Among the triarylphosphines, triphenylphosphine is particularly preferably used because it is easily available.
また、本発明で用いられる塩基としては、無機性、有機
性のいずれのものであつてもよい。このような塩基とし
ては、例えば、酸化リチウム、過酸化リチウム、酸化ナ
トリウム、過酸化ナトリウム、超酸化ナトリウム、酸化
カリウム、過酸化カリウム、三酸化二カリウム、超酸化
カリウム、酸化ルビジウム、過酸化ルビジウム、三酸化
二ルビジウム、超酸化ルビジウム、オゾン化ルビジウ
ム、酸化セシウム、過酸化セシウム、三酸化二セシウ
ム、超酸化セシウム、オゾン化セシウムなどのアルカリ
金属の酸化物類;酸化ベリリウム、酸化マグネシウム、
酸化カルシウム、過酸化カルシウム、酸化ストロンチウ
ム、過酸化ストロンチウム、酸化バリウム、過酸化バリ
ウムなどのアルカリ土類金属の酸化物類;水酸化リチウ
ム、水酸化ナトリウム、水酸化カリウム、水酸化ルビジ
ウム、水酸化セシウム、水酸化ベリリウム、水酸化マグ
ネシウム、水酸化カルシウム、水酸化ストロンチウム、
水酸化バリウムなどのアルカリ金属およびアルカリ土類
金属の水酸化物類;炭酸ナトリウム、炭酸水素ナトリウ
ム、炭酸カリウム、炭酸水素カリウム、炭酸バリウム、
ケイ酸ナトリウム、ケイ酸マグネシウム、アルミン酸カ
リウム、アルミン酸カルシウム、ホウ酸ナトリウム、ホ
ウ酸バリウム等の強塩基と弱酸の塩類;炭化カルシウ
ム、炭化セシウム等の炭化物類;水酸化アルミニウム、
水酸化カリウム、水酸化インジウム、水酸化タリウム、
酸化タリウム等のアルミニウム族金属の水酸化物および
酸化物類;酸化ランタン、酸化セリウム、水酸化セリウ
ム等の希土類元素の酸化物および水酸化物類;水素化リ
チウム、水素化ナトリウム、ホウ水素化ナトリウム、水
素化カルシウム、水素化リチウムアルミニウム等の水素
化物類;硫化ナトリウム、硫化水素ナトリウム、硫化カ
リウム、硫化カルシウム等のアルカリ金属またはアルカ
リ土類金属の硫化物および硫化水素化物類;水酸化テト
ラエチルアンモニウム、水酸化テトラプロピルアンモニ
ウム等の水酸化第四級アンモニウム化合物類;水酸化メ
チルトリフエニルホスホニウム、水酸化テトラメチルホ
スホニウム等の水酸化第四級ホスホニウム化合物類;水
酸化トリエチルスルホニウム、水酸化トリフエニルスル
ホニウム等の水酸化第三級スルホニウム化合物類;酢酸
ナトリウム、安息香酸カリウム、シユウ酸ルビジウム、
プロピオン酸バリウム等の強塩基と弱有機酸との塩類;
ナトリウムメチラート、ナトリウムエチラート、カルシ
ウムエチラート等のアルカリ金属およびアルカリ土類金
属のアルコラート類;ナトリウムフエノラート、カリウ
ムフエノラート、マグネシウムフエノラート等のアルカ
リ金属およびアルカリ土類金属のフエノラート類や、用
いる芳香族ヒドロキシ化合物のアルカリ金属塩類または
アルカリ土類金属類;リチウムアミド、ナトリウムアミ
ド、カルシウムアミド、リチウムジメチルアミド等のア
ルカリ金属およびアルカリ土類金属のアミド類;トリメ
チルアミン、トリエチルアミン、トリ−n−ブチルアミ
ン、トリフエニルアミン、ジエチルメチルアミン、N,N
−ジエチルアニリン、N−メチルピペリジン、N,N′−
ジエチルピペラジン、N−メチルモルホリン、トリエチ
レンジアミン、ヘキサメチレンテトラミン、N,N,N,N′
−テトラメチルエチレンジアミン、ジシクロヘキシルエ
チルアミン、1,2,2,6,6−ペンタメチルピペリジン、ピ
リジン、キノリン、フエナンスロリン、インドール、N
−メチルイミダゾール、1,8−ジアザビシクロ−〔5,4,
0〕−ウンデセン−7(DBU)、1,5−ジアゾビシクロ−
〔4,3,0〕−ノネン−5(DBU)等の第三級アミン類や環
状含窒素化合物類(ただし、N−H基をもたないも
の);クラウンエーテル、アザクラウンエーテル、チア
クラウンエーテル、アザクラウンなどのクラウン化合物
類、およびこれらのクラウン化合物とアルカリ金属やア
ルカリ土類金属イオンなどとの錯体類などが用いられ
る。The base used in the present invention may be either inorganic or organic. Examples of such a base include lithium oxide, lithium peroxide, sodium oxide, sodium peroxide, sodium superoxide, potassium oxide, potassium peroxide, dipotassium trioxide, potassium superoxide, rubidium oxide, rubidium peroxide, Alkali metal oxides such as rubidium trioxide, rubidium superoxide, rubidium ozonide, cesium oxide, cesium peroxide, cesium trioxide, cesium superoxide, and cesium ozonide; beryllium oxide, magnesium oxide,
Alkaline earth metal oxides such as calcium oxide, calcium peroxide, strontium oxide, strontium peroxide, barium oxide and barium peroxide; lithium hydroxide, sodium hydroxide, potassium hydroxide, rubidium hydroxide, cesium hydroxide , Beryllium hydroxide, magnesium hydroxide, calcium hydroxide, strontium hydroxide,
Alkali metal and alkaline earth metal hydroxides such as barium hydroxide; sodium carbonate, sodium hydrogen carbonate, potassium carbonate, potassium hydrogen carbonate, barium carbonate,
Salts of strong bases and weak acids such as sodium silicate, magnesium silicate, potassium aluminate, calcium aluminate, sodium borate, and barium borate; carbides such as calcium carbide and cesium carbide; aluminum hydroxide,
Potassium hydroxide, indium hydroxide, thallium hydroxide,
Aluminum group metal hydroxides and oxides such as thallium oxide; rare earth element oxides and hydroxides such as lanthanum oxide, cerium oxide and cerium hydroxide; lithium hydride, sodium hydride, sodium borohydride , Hydrides such as calcium hydride and lithium aluminum hydride; alkali metal or alkaline earth metal sulfides and sulfides such as sodium sulfide, sodium hydrogen sulfide, potassium sulfide and calcium sulfide; tetraethylammonium hydroxide; Quaternary ammonium hydroxide compounds such as tetrapropylammonium hydroxide; Quaternary phosphonium hydroxide compounds such as methyltriphenylphosphonium hydroxide and tetramethylphosphonium hydroxide; triethylsulfonium hydroxide, triphenylsulfonium hydroxide Hydroxy Tertiary sulfonium compounds; sodium acetate, potassium benzoate, oxalate rubidium,
Salts of strong bases such as barium propionate with weak organic acids;
Alcohols of alkali metals and alkaline earth metals such as sodium methylate, sodium ethylate, calcium ethylate; alkali metal and alkaline earth metal phenolates such as sodium phenolate, potassium phenolate, magnesium phenolate and the like Alkali metal salts or alkaline earth metals of aromatic hydroxy compounds; alkali metal and alkaline earth metal amides such as lithium amide, sodium amide, calcium amide, lithium dimethylamide; trimethylamine, triethylamine, tri-n-butylamine, Triphenylamine, diethylmethylamine, N, N
-Diethylaniline, N-methylpiperidine, N, N'-
Diethylpiperazine, N-methylmorpholine, triethylenediamine, hexamethylenetetramine, N, N, N, N '
-Tetramethylethylenediamine, dicyclohexylethylamine, 1,2,2,6,6-pentamethylpiperidine, pyridine, quinoline, phenanthroline, indole, N
-Methylimidazole, 1,8-diazabicyclo- [5,4,
0] -undecene-7 (DBU), 1,5-diazobicyclo-
Tertiary amines such as [4,3,0] -nonene-5 (DBU) and cyclic nitrogen-containing compounds (however, those having no NH group); crown ethers, azacrown ethers, thiacrowns Crown compounds such as ether and azacrown, and complexes of these crown compounds with alkali metal or alkaline earth metal ions are used.
さらに、これらの塩基性を示すグループが分子内に2個
以上あつてもよいし、例えば、水酸化第四級アンモニウ
ム基を有する陰イオン交換樹脂のようなポリマーの一部
を形成するものであつてもよい。また、これらの塩基性
物質または塩基性を有するグループが固体に担持された
り、化学的に結合されているものであつてもよい。これ
らの塩基は1種でもよいが、2種以上混合して用いても
よい。Further, two or more of these basic groups may be present in the molecule, and they may form a part of a polymer such as an anion exchange resin having a quaternary ammonium hydroxide group. May be. Further, these basic substances or groups having basicity may be supported on a solid or chemically bound. These bases may be used alone or in combination of two or more.
本発明で用いられるパラ位に置換基を持たないフエノー
ル類とは、一般式 で示される化合物である(R1,R2,R3,R4は前述のとお
り)。The phenols having no substituent at the para position used in the present invention have the general formula (R 1 , R 2 , R 3 , and R 4 are as described above).
このようなフエノール類としては、例えば、フエノー
ル、クレゾール、ジメチルフエノール、トリメチルフエ
ノール、テトラメチルフエノール、エチルフエノール、
ジエチルフエノール、トリエチルフエノール、エチルク
レゾール、メトキシフエノール、エトキシフエノール、
ジメトキシフエノール、メトキシクレゾール、フルオロ
フエノール、ジフルオロフエノール、フルオロクレゾー
ル、ニトロフエノール、ジニトロフエノール、ニトロク
レゾール、シアノフエノール、ジシアノフエノール、シ
アノクレゾール、フルオロニトロフエノール、フルオロ
ニトロクレゾール、フルオロシアノフエノール、ニトロ
シアノフエノール、シクロヘキシルフエノール、シクロ
ヘキシルクレゾール、シクロヘキシルフルオロフエノー
ルなどが用いられる(ただし、置換フエノールの場合、
ヒドロキシル基に対してパラ位が置換されたものは除
く)。Examples of such phenols include phenol, cresol, dimethylphenol, trimethylphenol, tetramethylphenol, ethylphenol,
Diethylphenol, triethylphenol, ethylcresol, methoxyphenol, ethoxyphenol,
Dimethoxyphenol, methoxycresol, fluorophenol, difluorophenol, fluorocresol, nitrophenol, dinitrophenol, nitrocresol, cyanophenol, dicyanophenol, cyanocresol, fluoronitrophenol, fluoronitrocresol, fluorocyanophenol, nitrocyanophenol, cyclohexyl Used are phenol, cyclohexylcresol, cyclohexylfluorophenol, etc. (However, in the case of substituted phenol,
Excluding those in which the para position is substituted with respect to the hydroxyl group).
このようなフエノール類のなかで、フエノールまたは2,
6−ジメチルフエノールが特に好ましく用いられる。Among such phenols, phenol or 2,
6-Dimethylphenol is particularly preferably used.
一酸化炭素は純一酸化炭素でもよいし、窒素、アルゴ
ン、ヘリウム、低級炭化水素などの反応に悪影響を及ぼ
さない他のガスで希釈されたものであつてもよい。一酸
化炭素は分圧で0.1〜300kg/cm2、好ましくは1〜200kg/
cm2の範囲で使用される。The carbon monoxide may be pure carbon monoxide, or may be diluted with another gas such as nitrogen, argon, helium, or lower hydrocarbon that does not adversely affect the reaction. Carbon monoxide has a partial pressure of 0.1 to 300 kg / cm 2 , preferably 1 to 200 kg /
Used in the cm 2 range.
エステル化工程を実施するに当り、カルボニル化触媒
は、その中に含まれる金属原子として、パラブロモフル
オロベンゼンに対して、通常、0.001〜1,000倍モルの量
で使用されるのが好ましい。In carrying out the esterification step, the carbonylation catalyst is preferably used as a metal atom contained therein usually in an amount of 0.001 to 1,000 times mol based on parabromofluorobenzene.
塩基は、生成する臭化水素を中和するのに必要な量を使
用するのが好ましいが、もちろん、これよりも少なくて
もよいし、多くてもよい。The base is preferably used in an amount necessary to neutralize the hydrogen bromide formed, but of course, it may be less or more than this.
また、ホスフイン化合物のような添加剤を用いる場合に
は、カルボニル化触媒中の金属原子に対して、通常、0.
01〜1,000倍モルの量で使用されるのが好ましい。When an additive such as a phosphine compound is used, the amount of the metal atom in the carbonylation catalyst is usually 0.
It is preferably used in an amount of 01 to 1,000 times the molar amount.
フエノール類は、パラブロモフルオロベンゼンに対して
少なくとも当量用いることが好ましい。また、過剰量の
フエノール類を用いることによつて溶媒とすることもで
きる。It is preferable to use at least an equivalent amount of phenols with respect to para-bromofluorobenzene. It is also possible to use a solvent by using an excess amount of phenols.
このようにエステル化反応においては、特別に反応溶媒
を用いなくても実施できるが、必要に応じて反応に悪影
響を及ぼさない溶媒を用いることもできる。このような
溶媒としては、例えば、ヘキサン、ヘプタン、オクタ
ン、デカン、ペンタデカンなどの脂肪族炭化水素類;シ
クロヘキサン、メチルシクロヘキサンなどの脂肪族炭化
水素類;ベンゼン、トルエン、キシレン、メシチレンな
どの芳香族炭化水素類;アセトニトリル、ベンゾニトリ
ルなどのニトリル類;スルホラン、メチルスルホラン、
ジメチルスルホランなどのスルホン類;テトラヒドロフ
ラン、1,4−ジオキサン、1,2−ジメトキシエタンなどの
エーテル類;アセトン、メチルエチルケトンなどのケト
ン類;酢酸エチル、安息香酸エチルなどのエステル類;
N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミ
ド、N−メチルピロリドン、ヘキサメチルホスホルアミ
ドなどのアミド類などがあげられる。Thus, the esterification reaction can be carried out without using a reaction solvent, but a solvent which does not adversely influence the reaction can be used if necessary. Examples of such a solvent include aliphatic hydrocarbons such as hexane, heptane, octane, decane, and pentadecane; aliphatic hydrocarbons such as cyclohexane and methylcyclohexane; aromatic hydrocarbons such as benzene, toluene, xylene, and mesitylene. Hydrogen; Nitriles such as acetonitrile and benzonitrile; Sulfolane, Methylsulfolane,
Sulfones such as dimethylsulfolane; ethers such as tetrahydrofuran, 1,4-dioxane and 1,2-dimethoxyethane; ketones such as acetone and methyl ethyl ketone; esters such as ethyl acetate and ethyl benzoate;
Examples thereof include amides such as N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone and hexamethylphosphoramide.
エステル化反応は、通常50〜350℃、好ましくは100〜30
0℃の範囲で、また、反応圧力は、通常1〜500kg/cm2、
好ましくは5〜300kg/cm2の範囲で実施される。Esterification reaction is usually 50 ~ 350 ℃, preferably 100 ~ 30
In the range of 0 ℃, the reaction pressure is usually 1 ~ 500kg / cm 2 ,
It is preferably carried out in the range of 5 to 300 kg / cm 2 .
このようなカルボニル化反応を行うことによつて、パラ
ブロモフルオロベンゼンのフツ素原子は置換されずに、
臭素原子のみがアリーロキシカルボニル基によつて置換
されたパラフルオロ安息香酸フエニルエステル類が、90
%以上の高収率および高選択率で得られることがわかつ
た。By performing such a carbonylation reaction, the fluorine atom of para-bromofluorobenzene is not replaced,
Parafluorobenzoic acid phenyl esters in which only the bromine atom is replaced by an aryloxycarbonyl group are
It was found that a high yield of not less than% and a high selectivity can be obtained.
また、エステル化工程で副生する臭化水素と塩基との塩
は、エステル化反応混合物を水洗するなどの方法によ
り、パラフルオロ安息香酸フエニルエステル類から容易
に分離される。そして、この臭化水素と塩基との塩から
は、公知の方法によつて臭化水素と塩基として、または
臭素と塩基として、それぞれ容易に回収することがで
き、これらは、それぞれブロム化工程およびエステル化
工程に循環再使用することができる。Further, the salt of hydrogen bromide and a base produced as a by-product in the esterification step is easily separated from the parafluorobenzoic acid phenyl ester by a method such as washing the esterification reaction mixture with water. Then, from this salt of hydrogen bromide and a base, as a hydrogen bromide and a base by a known method, or as bromine and a base, respectively, they can be easily recovered, respectively. It can be recycled and reused in the esterification step.
本発明の転位反応工程においては、エテル化工程で得ら
れたパラフルオロ安息香酸フエニルエステル類を酸触媒
の存在下、転位反応を行なつて、目的とする4−(パラ
フルオロベンゾイル)フエノール類を得る。In the rearrangement reaction step of the present invention, the rearrangement reaction of the parafluorobenzoic acid phenyl esters obtained in the etherification step is carried out in the presence of an acid catalyst to obtain the desired 4- (parafluorobenzoyl) phenols. To get
転位反応工程において用いることのできる酸触媒として
は、実質的に水をほとんど含まないものであれば使用す
ることができるが、収率や選択率をできるだけ高くする
ために、ルイス酸および/または強酸性プロトン酸を用
いることが好ましい。As the acid catalyst that can be used in the rearrangement reaction step, it is possible to use an acid catalyst that contains substantially no water, but in order to maximize yield and selectivity, a Lewis acid and / or a strong acid can be used. It is preferable to use a protic acid.
このようなルイス酸としては、ホウ素、アルミニウム、
ガリウム、インジウム、タリウム、スカンジウム、イツ
トリウムなどのIII属の元素のハロゲン化物類;ケイ
素、ゲルマニウム、スズ、チタン、ジルコニウムなどの
IV属の元素のハロゲン化物類;アンチモン、ビスマス、
バナジウム、ニオブ、タンタルなどのV属の元素のハロ
ゲン化物類、鉄、銅、亜鉛などの金属のハロゲン化物類
などが用いられる。Such Lewis acids include boron, aluminum,
Halides of Group III elements such as gallium, indium, thallium, scandium, yttrium; silicon, germanium, tin, titanium, zirconium, etc.
Group IV element halides; antimony, bismuth,
Halides of Group V elements such as vanadium, niobium, and tantalum, and metal halides such as iron, copper, and zinc are used.
また、強酸性プロトン酸としては、無水フツ化水素;ト
リフルオロ酢酸、パーフルオロプロピオン酸などのフル
オロカルボン酸類;メタンスルホン酸、エタンスルホン
酸、ベンゼンスルホン酸などのスルホン酸類;フルオロ
スルホン酸、クロルスルホン酸、トリフルオロメタンス
ルホン酸、トリクロロメタンスルホン酸、パーフルオロ
エタンスルホン酸などのハロゲン化スルホン酸類、およ
びハロゲン化アルカンスルホン酸類などが用いられる。
また、固体酸である高シリカ含有ゼオライト、強酸性陽
イオン交換樹脂や、固体超強酸と呼ばれる酸類も本発明
の転位反応に用いることができる。The strongly acidic protonic acids include hydrogen fluoride anhydride; fluorocarboxylic acids such as trifluoroacetic acid and perfluoropropionic acid; sulfonic acids such as methanesulfonic acid, ethanesulfonic acid and benzenesulfonic acid; fluorosulfonic acid and chlorosulfone. Acids, halogenated sulfonic acids such as trifluoromethanesulfonic acid, trichloromethanesulfonic acid, perfluoroethanesulfonic acid, and halogenated alkanesulfonic acids are used.
In addition, a high-silica-containing zeolite that is a solid acid, a strongly acidic cation exchange resin, or an acid called a solid superacid can also be used in the rearrangement reaction of the present invention.
固体超強酸とは、100%硫酸よりも強い酸強度をもつ固
体状の強酸のことであり、このものとしては、例えばSb
F5、TaF5、BF3、CF3SO3H、SbF5−HF、SbF5−FSO3Hまた
はこれらの混合物などをSiO2−Al2O3、SiO2−TiO2、SiO
2−ZrO2、TiO2−ZrO2、Al2O3−B2O3、SiO2−WO3、HF−
ゼオライト、Al2O3、SiO2、グラフアイト、陽イオン交
換樹脂、活性炭、フツ素化グラフアイトなどの担持させ
たもの、フツ素化スルホン酸樹脂などを挙げることがで
きる。ここで、フツ素化スルホン酸樹脂とは、−CF2SO3
H基および/またはCFSO3H基を有する樹脂のことであ
る。A solid super strong acid is a solid strong acid having an acid strength stronger than 100% sulfuric acid, and examples thereof include Sb.
F 5, TaF 5, BF 3 , CF 3 SO 3 H, SbF 5 -HF, SbF 5 -FSO 3 H or mixtures thereof and the like SiO 2 -Al 2 O 3, SiO 2 -TiO 2, SiO
2 -ZrO 2, TiO 2 -ZrO 2 , Al 2 O 3 -B 2 O 3, SiO 2 -WO 3, HF-
Examples thereof include zeolite, Al 2 O 3 , SiO 2 , grafitite, cation exchange resin, activated carbon, supported fluorinated grafitite, and fluorinated sulfonic acid resin. Here, the fluorinated sulfonic acid resin is -CF 2 SO 3
It is a resin having an H group and / or a CFSO 3 H group.
これらの酸は、単独で、あるいは2種以上を混合して用
いることができる。These acids can be used alone or in combination of two or more.
また、この転位反応は無溶媒で行なつてもよいが、反応
に悪影響を及ぼさない溶媒を用いることもできる。この
ような溶媒としては、二硫化炭素;クロロホルム、塩化
メチレン、四塩化炭素、ジクロルエタン、トリクロロエ
タン、テトラクロロエタンなどのハロゲン化炭化水素
類;クロルベンゼン、ジクロルベンゼン、ブロムベンゼ
ン、クロルナフタレンなどのハロゲン化芳香族炭化水素
類;ニトロベンゼン、ニトロトルエン、ニトロメタンな
どのニトロ化合物類などが用いられる。Further, this rearrangement reaction may be carried out without a solvent, but a solvent which does not adversely influence the reaction can also be used. Such solvents include carbon disulfide; halogenated hydrocarbons such as chloroform, methylene chloride, carbon tetrachloride, dichloroethane, trichloroethane, and tetrachloroethane; halogenated hydrocarbons such as chlorobenzene, dichlorobenzene, bromobenzene, and chloronaphthalene. Aromatic hydrocarbons; nitro compounds such as nitrobenzene, nitrotoluene and nitromethane are used.
この転位反応は、実質的に無水の条件下で行うことが好
ましい。反応系中に水が存在すると、パラフルオロ安息
香酸フエニルエステル類の加水分解が起り、目的とする
4−(パラフルオロベンゾイル)フエノール類の収率が
低下するからである。したがつて、酸触媒中の水分はも
ちろんのこと、溶媒を用いる場合は、溶媒中の水分率を
できるだけ低くしておくことが好ましい。This rearrangement reaction is preferably performed under substantially anhydrous conditions. When water is present in the reaction system, the parafluorobenzoic acid phenyl esters are hydrolyzed, and the yield of the desired 4- (parafluorobenzoyl) phenols is decreased. Therefore, not to mention the water content in the acid catalyst, when using a solvent, it is preferable to keep the water content in the solvent as low as possible.
また、この転位反応を行う温度および反応時間は、用い
る触媒や溶媒の種類などの他の反応条件によつて異なる
が、通常−30〜250℃、好ましくは−20〜200℃の温度範
囲で、数分〜数十時間の範囲である。The temperature and reaction time for carrying out this rearrangement reaction vary depending on other reaction conditions such as the type of catalyst and solvent used, but are usually in the range of -30 to 250 ° C, preferably -20 to 200 ° C, It ranges from a few minutes to a few tens of hours.
このような転位反応を行うことによつて、パラフルオロ
安息香酸フエニルエステル類から高収率、高選択率で4
−(パラフルオロベンゾイル)フエノール類が得られ
る。By carrying out such a rearrangement reaction, it is possible to obtain 4
-(Parafluorobenzoyl) phenols are obtained.
(発明の効果) 本発明の方法により、フツ化ベンゼン、一酸化炭素およ
びフエノール類から高収率、高選択率で4−(パラフル
オロベンゾイル)フエノール類が製造できることが明ら
かとなつた。(Effect of the Invention) It was revealed that the method of the present invention can produce 4- (parafluorobenzoyl) phenols from fluorinated benzene, carbon monoxide and phenols in high yield and high selectivity.
(実施例) 以下、実施例により本発明をさらに説明するが、本発明
は、これらの実施例に限定されるものではない。(Examples) Hereinafter, the present invention will be further described with reference to Examples, but the present invention is not limited to these Examples.
実施例1 撹拌装置、温度計、液中まで延びた窒素導入口、冷却管
およびガス出口、液中まで導入口が延びている滴下ロー
トを備えた4つ口フラスコを用いて液相ブロム化反応を
実施した。フラスコ内にフツ化ベンゼン40g、鉄粉0.2g
を入れ、乾燥窒素を少しずつ流しながら、系を5〜10℃
に冷却した。撹拌下に、滴下ロートから臭素25gを徐々
に滴下した。臭化水素ガスの発生量がほぼ一定となるよ
うに臭素を加え、10〜15℃で反応させた。約30分を要し
た。次いで、40℃で約30分反応を続けた結果、臭素は完
全に消費された。Example 1 Liquid phase bromination reaction using a four-necked flask equipped with a stirrer, a thermometer, a nitrogen inlet extending into the liquid, a cooling pipe and a gas outlet, and a dropping funnel having the inlet extending into the liquid. Was carried out. Fluorinated benzene 40g, iron powder 0.2g in the flask
, While slowly flowing dry nitrogen, the system 5 ~ 10 ℃
Cooled to. Under stirring, 25 g of bromine was gradually added dropwise from the dropping funnel. Bromine was added so that the amount of hydrogen bromide gas generated was almost constant, and the reaction was carried out at 10 to 15 ° C. It took about 30 minutes. Then, as a result of continuing the reaction at 40 ° C. for about 30 minutes, bromine was completely consumed.
液相から未反応のフツ化ベンゼンを留去することによつ
て、ブロム化フルオロベンゼン混合物27.3gが得られ
た。ブロム化フルオロベンゼン混合物中の組成は、パラ
ブロモフルオロベンゼン98.5%、オルトブロモフルオロ
ベンゼン1.0%、メタフルオロブロモベンゼン0.5%であ
つた。このブロム化フルオロベンゼン混合物から晶析操
作によつて分離されたパラブロモフルオロベンゼンを用
いて、次のエステル化工程を行なつた。By distilling off unreacted fluorinated benzene from the liquid phase, 27.3 g of a brominated fluorobenzene mixture was obtained. The composition of the brominated fluorobenzene mixture was 98.5% para-bromofluorobenzene, 1.0% ortho-bromofluorobenzene and 0.5% meta-fluorobromobenzene. The following esterification step was performed using para-bromofluorobenzene separated from this brominated fluorobenzene mixture by a crystallization operation.
パラブロモフルオロベンゼン17.5g、フエノール11.3g、
トリ−n−ブチルアミン22.2g、塩化パラジウム40mg、
トリフエニルホスフイン0.4gをオートクレーブに入れ、
オートクレーブの内部を一酸化炭素で置換した後、一酸
化炭素を30kg/cm2に圧入した。撹拌下に200℃で2時間
反応させた後、冷却し、反応液を分析した結果、パラブ
ロモフルオロベンゼンの反応率は99%で、パラフルオロ
安息香酸フエニルエステルが収率98%、選択率99%で得
られた。Para-bromofluorobenzene 17.5g, phenol 11.3g,
22.2 g of tri-n-butylamine, 40 mg of palladium chloride,
Add 0.4 g of triphenylphosphine to the autoclave,
After substituting the inside of the autoclave with carbon monoxide, carbon monoxide was injected under pressure of 30 kg / cm 2 . After reacting at 200 ° C for 2 hours with stirring, the mixture was cooled, and the reaction mixture was analyzed. As a result, the reaction rate of parabromofluorobenzene was 99%, and the yield of parafluorobenzoic acid phenyl ester was 98%. Obtained in 99%.
エステル化反応混合物を減圧蒸留することによつて得ら
れたパラフルオロ安息香酸フエニルエステルを用いて、
次の転位反応工程を行なつた。Using parafluorobenzoic acid phenyl ester obtained by vacuum distillation of the esterification reaction mixture,
The next rearrangement reaction step was performed.
パラフルオロ安息香酸フエニル10.8g、トリフルオロメ
タンスルホン酸22gをフラスコに入れ、撹拌下45〜50℃
で2時間反応させた。その後、大部分のトリフルオロメ
タンスルホン酸を減圧下に留去した後、反応混合物を冷
水に入れた。生成した白色結晶を別して減圧下に乾燥
して分析した結果、4−(パラフルオロベンゾイル)フ
エノールが収率96%、選択率96%で得られたことがわか
つた。Add 10.8 g of phenyl parafluorobenzoate and 22 g of trifluoromethanesulfonic acid to the flask and stir at 45-50 ° C under stirring.
And reacted for 2 hours. Then, most of the trifluoromethanesulfonic acid was distilled off under reduced pressure, and the reaction mixture was put into cold water. The white crystals formed were separated and dried under reduced pressure and analyzed. As a result, it was found that 4- (parafluorobenzoyl) phenol was obtained in a yield of 96% and a selectivity of 96%.
未反応のフツ化ベンゼンおよびパラブロモフルオロベン
ゼンは、それぞれ回収されてブロム化工程およびエステ
ル化工程に循環再使用できるので、本実施例は、反応し
たフツ化ベンゼンを基準として4−(パラフルオロベン
ゾイル)フエノールが収率93.6%、選択率93.6%で得ら
れたことを示している。Since unreacted fluorinated benzene and para-bromofluorobenzene can be recovered and reused in the bromination step and the esterification step, respectively, the present example is based on the reacted fluorinated benzene as 4- (parafluorobenzoyl). ) It shows that phenol was obtained with a yield of 93.6% and a selectivity of 93.6%.
実施例2 Y型ゼオライトのナトリウムイオンの約65%を2価の銅
イオンで交換して調製した銅−Y型ゼオライトを触媒と
して充填した内径1.5cmのガラス製の反応管の上部か
ら、臭化水素ガス、分子状酸素、フツ化ベンゼン、およ
び希釈剤としての窒素を導入することでフツ化ベンゼン
の気相オキシブロム化反応を行なつた。Example 2 About 65% of sodium ions of Y-type zeolite was exchanged with divalent copper ions, and prepared by exchanging copper-Y-type zeolite as a catalyst. The gas phase oxybromination reaction of fluorinated benzene was carried out by introducing hydrogen gas, molecular oxygen, fluorinated benzene, and nitrogen as a diluent.
供給原料組成は、モル比でフツ化ベンゼン/HBr/O2/N2=
2/1/1/3で、フツ化ベンゼン基準のWHSVは10hr-1、常圧
下、190〜200℃の温度で反応を行い、定常状態になつた
後、反応生成物を分析した結果、臭化水素の反応率は10
0%で、フツ化ベンゼンの反応率は49%であり、ブロム
化フルオロベンゼン混合物中の組成は、モル%でパラブ
ロモフルオロベンゼン93.1%、オルトブロモフルオロベ
ンゼン2.7%、メタブロモフルオロベンゼン3.0%、ジブ
ロモフルオロベンゼン1.2%であつた。The feed composition is fluorinated benzene / HBr / O 2 / N 2 =
On 2/1/1/3, WHSV based on fluorinated benzene was subjected to reaction at a temperature of 190 to 200 ° C under atmospheric pressure for 10 hr -1 , and after reaching a steady state, the reaction product was analyzed and Reaction rate of hydrogen fluoride is 10
At 0%, the reaction rate of fluorinated benzene is 49%, the composition in the brominated fluorobenzene mixture is 93.1% para-bromofluorobenzene, 2.7% ortho-bromofluorobenzene 2.7%, meta-bromofluorobenzene 3.0%, in mol%. It was dibromofluorobenzene 1.2%.
このブロム化フルオロベンゼン混合物から蒸留および晶
析によつて得られたパラブロモフルオロベンゼンを用い
て、次のエステル化反応を行つた。The following esterification reaction was carried out using para-bromofluorobenzene obtained from this brominated fluorobenzene mixture by distillation and crystallization.
パラブロモフルオロベンゼン17.5g、2,6−ジメチルフエ
ノール14.6g、トリ−n−ブチルアミン22.2g、パラジウ
ム黒25mg、トリフエニルホスフイン0.4gを用い、実施例
1のエステル化工程と同様な方法で230℃で2時間反応
させた結果、パラフルオロブロムベンゼンの反応率は9
8.2%で、パラフルオロ安息香酸2,6−ジメチルフエニル
エステルが収率97.0%、選択率98.8%で得られた。Parabromofluorobenzene (17.5 g), 2,6-dimethylphenol (14.6 g), tri-n-butylamine (22.2 g), palladium black (25 mg) and triphenylphosphine (0.4 g) were used. As a result of reacting for 2 hours at ℃, the reaction rate of parafluorobromobenzene is 9
At 8.2%, parafluorobenzoic acid 2,6-dimethylphenyl ester was obtained with a yield of 97.0% and a selectivity of 98.8%.
このパラフルオロ安息香酸2,6−ジメチルフエニルエス
テル19.5g、メタンスルホン酸76gをフラスコに入れ、撹
拌下に150℃で1.5時間反応させた後、減圧下に大部分の
メタンスルホン酸を留去した。次いで、反応混合物を冷
水に入れ、生成してくる白色結晶を別し、減圧下に乾
燥した。この白色結晶は、4−(パラフルオロベンゾイ
ル)−2,6−ジメチルフエノールであり、その収率は97
%で、選択率は99%であつた。19.5 g of this parafluorobenzoic acid 2,6-dimethylphenyl ester and 76 g of methanesulfonic acid were placed in a flask and reacted under stirring at 150 ° C for 1.5 hours, then most of the methanesulfonic acid was distilled off under reduced pressure. did. Then, the reaction mixture was put in cold water, the white crystals that had formed were separated, and dried under reduced pressure. The white crystals were 4- (parafluorobenzoyl) -2,6-dimethylphenol, and the yield was 97.
%, The selectivity was 99%.
未反応のフツ化ベンゼンおよびパラブロモフルオロベン
ゼンは、それぞれに回収されてブロム化工程およびエス
テル化工程に循環再使用できるので、本実施例は、反応
したフツ化ベンゼンを基準として4−(パラフルオロベ
ンゾイル)−2,6−ジメチルフエノールが収率89.2%、
選択率91.1%で得られたことを示している。Unreacted fluorinated benzene and para-bromofluorobenzene can be respectively recovered and recycled for the bromination step and the esterification step. Therefore, in this example, 4- (parafluorofluorobenzene was used as a reference based on the reacted fluorinated benzene. Benzoyl) -2,6-dimethylphenol yield 89.2%,
It shows that the selectivity was obtained at 91.1%.
実施例3 ブロム化工程を第1図に示すような連続反応装置を用い
て、臭素による液相ブロム化反応と、その時に副生して
くる臭化水素による気相オキシブロム化反応を連続的に
実施した。Example 3 Using a continuous reaction apparatus as shown in FIG. 1 in the bromination process, a liquid phase bromination reaction with bromine and a gas phase oxybromination reaction with hydrogen bromide produced as a by-product at that time are continuously performed. Carried out.
液相ブロム化反応装置第1槽(1)は5〜10℃、第2層
(2)は20〜25℃、第3槽(3)は40〜45℃に保たれて
おり、平均滞留時間は、それぞれ40分となるように、フ
ツ化ベンゼンと臭素をモル比3対1の割合で第1槽
(1)に導入した。触媒はFeBr3がフツ化ベンゼンに対
して0.1モル%となるように添加されていた。Liquid phase bromination reactor The first tank (1) is kept at 5 to 10 ° C, the second layer (2) is kept at 20 to 25 ° C, and the third tank (3) is kept at 40 to 45 ° C. For each 40 minutes, fluorinated benzene and bromine were introduced into the first tank (1) in a molar ratio of 3: 1. The catalyst was added such that FeBr 3 was 0.1 mol% with respect to the fluorobenzene.
第3槽(3)からオーバフローで流出してくる液相反応
混合物は、蒸留装置(4)に導き、塔頂よりフツ化ベン
ゼンを、塔中段よりモノブロモフルオロベンゼンを回収
し、塔底より多ブロム化フルオロベンゼンと触媒を分離
した。The liquid-phase reaction mixture flowing out of the third tank (3) due to overflow was led to a distillation apparatus (4), and fluorinated benzene was recovered from the top of the column and monobromofluorobenzene was recovered from the middle stage of the column, and was collected from the bottom of the column. The brominated fluorobenzene and catalyst were separated.
塔頂より回収されたフツ化ベンゼンの一部と、液相ブロ
ム化反応で生成した臭化水素ガスは、気相オキシブロム
化反応器(5)の上部から酸素および窒素と共に導入さ
れている。そのモル比は、フツ化ベンゼン/HBr/O2/N2=
1.2/1/0.8/3となるように調整されており、反応混合物
は蒸留装置(6)に導き、分離されている。気相オキシ
ブロム化反応装置には、実施例1で用いたのと同じCu2+
イオン交換Yゼオライトが充填されており、反応温度19
0〜200℃、WHSV 7 hr-1で反応が行われた。Part of the fluorinated benzene recovered from the top of the column and hydrogen bromide gas produced in the liquid phase bromination reaction are introduced together with oxygen and nitrogen from the upper part of the gas phase oxybromination reactor (5). The molar ratio is fluorinated benzene / HBr / O 2 / N 2 =
It is adjusted to 1.2 / 1 / 0.8 / 3, and the reaction mixture is introduced into the distillation apparatus (6) and separated. The gas phase oxybromination reactor had the same Cu 2+ as used in Example 1.
It is packed with ion-exchange Y zeolite and has a reaction temperature of 19
The reaction was carried out at 0-200 ° C and WHSV of 7 hr -1 .
液相ブロム化反応で得られたブロム化フルオロベンゼン
中のモノブロモフルオロベンゼンの選択率は99%であ
り、モノブロモフルオロベンゼン中のパラ体は97%、オ
ルト体2%、メタ体1%であつた。また、気相オキシブ
ロム化反応で得られたブロム化フルオロベンゼン中のモ
ノブロモフルオロベンゼンの選択率は97%であり、モノ
ブロモフルオロベンゼン中のパラ体は94%、オルト体2
%、メタ体4%であつた。The selectivity of monobromofluorobenzene in the brominated fluorobenzene obtained by the liquid phase bromination reaction was 99%, and the para form in the monobromofluorobenzene was 97%, the ortho form was 2%, and the meta form was 1%. Atsuta The selectivity of monobromofluorobenzene in the brominated fluorobenzene obtained by the gas phase oxybromination reaction is 97%, the para body in the monobromofluorobenzene is 94%, and the ortho body 2
%, And the meta form was 4%.
このブロム化フルオロベンゼン混合物から、蒸留および
晶析によつて得られたパラブロモフルオロベンゼンを用
いて、次のエステル化工程を行つた。The following esterification step was carried out using para-bromofluorobenzene obtained from this brominated fluorobenzene mixture by distillation and crystallization.
パラフルオロブロムベンゼン17.5g、フエノール11.3g、
トリ−n−ブチルアミン22.2g、ニツケルアセチルアセ
トナートNi(acac)21.2g、トリフエニルホスフイン2.6
gをオートクレーブに入れ、オートクレーブの内部を一
酸化炭素で置換した後、一酸化炭素を50kg/cm2に圧入し
た。撹拌下に210〜230℃で2時間反応させた後、冷却
し、反応液を分析した結果、パラフルオロブロムベンゼ
ンの反応率は95%で、パラフルオロ安息香酸フエニルエ
ステルが収率88.4%、選択率93%で得られた。Parafluorobromobenzene 17.5g, phenol 11.3g,
Tri-n-butylamine 22.2 g, nickel acetylacetonate Ni (acac) 2 1.2 g, triphenylphosphine 2.6
g was placed in an autoclave, the inside of the autoclave was replaced with carbon monoxide, and then carbon monoxide was injected under pressure of 50 kg / cm 2 . After reacting at 210 to 230 ° C. for 2 hours under stirring, the mixture was cooled, and the reaction solution was analyzed. As a result, the reaction rate of parafluorobromobenzene was 95%, and the yield of parafluorobenzoic acid phenyl ester was 88.4%. The selectivity was 93%.
エステル化反応混合物を減圧蒸留することによつて得ら
れたパラフルオロ安息香酸フエニルエステルを用いて、
次の転位反応工程を行つた。Using parafluorobenzoic acid phenyl ester obtained by vacuum distillation of the esterification reaction mixture,
The next rearrangement reaction step was performed.
パラフルオロ安息香酸フエニルエステル15g、液状無水
フツ化水素150gを還流冷却器付ポリエチレン製フラスコ
に入れ、撹拌下0〜10℃で6時間反応させた。反応後、
系を20〜40℃に上げ、無水フツ化水素を蒸留によつて回
収した。得られた残渣を少量の希アルカリ水および蒸留
水で洗浄した後、減圧下に乾燥した。生成物を分析した
結果、パラフルオロ安息香酸フエニルエステルの反応率
は67%で、4−(パラフルオロベンゾイル)フエノール
が収率66.3%、選択率99%で生成していた。異性体であ
る2−(パラフルオロベンゾイル)フエノールは1%し
か検出されなかつた。15 g of parafluorobenzoic acid phenyl ester and 150 g of liquid anhydrous hydrogen fluoride were placed in a polyethylene flask equipped with a reflux condenser, and reacted at 0 to 10 ° C. for 6 hours with stirring. After the reaction
The system was raised to 20-40 ° C and anhydrous hydrogen fluoride was recovered by distillation. The obtained residue was washed with a small amount of diluted alkaline water and distilled water, and then dried under reduced pressure. As a result of analyzing the product, the reaction rate of parafluorobenzoic acid phenyl ester was 67%, and 4- (parafluorobenzoyl) phenol was produced in a yield of 66.3% and a selectivity of 99%. The isomer 2- (parafluorobenzoyl) phenol was only detected at 1%.
未反応のフツ化ベンゼン、パラブロモフルオロベンゼン
およびパラフルオロ安息香酸フエニルエステルは、それ
ぞれ回収されて、ブロム化工程、エステル化工程および
転位反応工程に循環再使用できるので、本実施例は、反
応したフッ化ベンゼンを基準として、4−(パラフルオ
ロベンゾイル)フエノールが収率87.2%、選択率87.2%
で得られたことを示している。Unreacted fluorinated benzene, para-bromofluorobenzene and para-fluorobenzoic acid phenyl ester can be recovered and reused in the bromination step, the esterification step and the rearrangement reaction step, respectively. Based on the fluorinated benzene, 4- (parafluorobenzoyl) phenol yield 87.2%, selectivity 87.2%
It has been obtained in.
また、無水フツ化水素の回収率は98%であつた。The recovery rate of anhydrous hydrogen fluoride was 98%.
実施例4 実施例1のブロム化反応工程と同様な方法により、臭素
とフツ化ベンゼンとの液相ブロム化反応によつて得られ
たパラブロモフルオロベンゼンを用いて、次のエステル
化工程を行つた。Example 4 The following esterification step was carried out using para-bromofluorobenzene obtained by the liquid phase bromination reaction of bromine and fluorobenzene in the same manner as in the bromination reaction step of Example 1. Ivy.
パラフルオロブロムベンゼン17.5g、2,6−ジメチルフエ
ノール14.6g、ピリジン10g、酢酸パラジウム60mg、トリ
ス(4−メチルフエニル)ホスフイン0.3gをオートクレ
ーブに入れ、実施例1と同様な方法により反応を行つた
結果、パラフルオロ安息香酸−2,6−ジメチルフエニル
エステルが収率96%選択率98%で得られた。Parafluorobromobenzene 17.5 g, 2,6-dimethylphenol 14.6 g, pyridine 10 g, palladium acetate 60 mg, tris (4-methylphenyl) phosphine 0.3 g were placed in an autoclave, and the reaction was carried out by the same method as in Example 1. , Parafluorobenzoic acid-2,6-dimethylphenyl ester was obtained with a yield of 96% and a selectivity of 98%.
次いで、このパラフルオロ安息香酸−2,6−ジメチルフ
エニルエステル12.2g、無水塩化アルミニウム7.3g、乾
燥オルトジクロルベンゼン70mlをフラスコに入れ、150
℃で撹拌下に4時間反応させた。反応後、オルトジクロ
ルベンゼンを減圧下で留去、残渣に塩酸水溶液を入れ撹
拌した。次いで、酢酸エチルで抽出を行い、抽出液から
酢酸エチルを留去することによつて、4−(パラフルオ
ロベンゾイル)−2,6−ジメチルフエノールを収率94%
で得た。反応したフツ化ベンゼン基準の収率は90.7%で
あつた。Next, 12.2 g of this parafluorobenzoic acid-2,6-dimethylphenyl ester, 7.3 g of anhydrous aluminum chloride, and 70 ml of dry orthodichlorobenzene were placed in a flask,
The reaction was carried out for 4 hours under stirring at ℃. After the reaction, orthodichlorobenzene was distilled off under reduced pressure, and a hydrochloric acid aqueous solution was added to the residue and stirred. Then, extraction was performed with ethyl acetate, and ethyl acetate was distilled off from the extract to give 4- (parafluorobenzoyl) -2,6-dimethylphenol in a yield of 94%.
Got with. The yield based on the reacted fluorinated benzene was 90.7%.
実施例5 実施例3の方法で得られたパラブロモフルオロベンゼン
を用いて、次のエステル化工程を行つた。パラブロモフ
ルオロベンゼン17.5g、フエノール11.3g、トリエチルア
ミン12.2g、カーボンにパラジウム5w%を担持した5%P
d/C1.06g、トリフエニルホスフイン0.67gをオートクレ
ーブに入れ、オートクレーブの内部を一酸化炭素で置換
した後、一酸化炭素を50kg/cm2圧入した。撹拌下に170
℃で2時間反応させた後、冷却し、反応混合物にベンゼ
ンを加え、Pd/Cとトリエチルアミンの臭化水素塩を別
し、液成分を分析した結果、パラフルオロ安息香酸フエ
ニルが収率99%、選択率99%で生成していた。Example 5 The following esterification step was carried out using the parabromofluorobenzene obtained by the method of Example 3. Parabromofluorobenzene 17.5g, phenol 11.3g, triethylamine 12.2g, 5% P supporting 5w% palladium on carbon
d / C (1.06 g) and triphenylphosphine (0.67 g) were placed in an autoclave, the inside of the autoclave was replaced with carbon monoxide, and then carbon monoxide was injected under a pressure of 50 kg / cm 2 . 170 with stirring
After reacting for 2 hours at ℃, cooled, benzene was added to the reaction mixture, Pd / C and hydrobromide of triethylamine were separated, and the liquid components were analyzed. As a result, the yield of phenyl parafluorobenzoate was 99%. , Was generated with a selectivity of 99%.
このエステル化反応混合物を含む液からベンゼンを留
去した後、減圧蒸留を行うことによつてパラフルオロ安
息香酸フエニルエステル20.6gを得た。Benzene was distilled off from the liquid containing the esterification reaction mixture, and then vacuum distillation was performed to obtain 20.6 g of parafluorobenzoic acid phenyl ester.
このパラフルオロ安息香酸フエニルエステル17.3g、メ
タンスルホン酸50g、トリフルオロメタンスルホン酸1g
をフラスコに入れ、撹拌下100℃で30分間反応させた
後、メタンスルホン酸およびトリフルオロメタンスルホ
ン酸の大部分を減圧下に留去した。次いで、反応混合物
を冷水に入れ、生成してくる白色結晶を別し、減圧下
に乾燥した。4−(パラフルオロベンゾイル)フエノー
ルが収率96%、選択率96%で得られた。反応したフツ化
ベンゼン基準の収率は90%であつた。This parafluorobenzoic acid phenyl ester 17.3g, methanesulfonic acid 50g, trifluoromethanesulfonic acid 1g
Was placed in a flask and reacted at 100 ° C. for 30 minutes under stirring, and then most of methanesulfonic acid and trifluoromethanesulfonic acid were distilled off under reduced pressure. Then, the reaction mixture was put into cold water, and white crystals that had formed were separated and dried under reduced pressure. 4- (parafluorobenzoyl) phenol was obtained with a yield of 96% and a selectivity of 96%. The yield based on the reacted fluorinated benzene was 90%.
本発明の好ましい実施態様は次のとおりである。Preferred embodiments of the present invention are as follows.
(1)ブロム化工程を臭素による液相ブロム化反応で実
施する特許請求の範囲記載の方法。(1) The method according to the claims, wherein the bromination step is carried out by a liquid phase bromination reaction with bromine.
(2)ブロム化工程を分子状酸素と臭化水素を用いる気
相オキシブロム化反応で実施する特許請求の範囲記載の
方法。(2) The method according to the claims, wherein the brominating step is carried out by a gas phase oxybromination reaction using molecular oxygen and hydrogen bromide.
(3)ブロム化工程を、臭素による液相ブロム化反応
と、分子状酸素と臭化水素を用いる気相オキシブロム化
反応を併用することで実施する特許請求の範囲記載の方
法。(3) The method according to the claims, wherein the bromination step is carried out by using a liquid phase bromination reaction with bromine and a gas phase oxybromination reaction using molecular oxygen and hydrogen bromide in combination.
(4)フエノール類がフエノールまたは2,6−ジメチル
フエノールである特許請求の範囲記載の方法。(4) The method according to the claims, wherein the phenols are phenol or 2,6-dimethylphenol.
(5)カルボニル化触媒がパラジウム触媒またはニツケ
ル触媒である特許請求の範囲記載の方法。(5) The method according to the claims, wherein the carbonylation catalyst is a palladium catalyst or a nickel catalyst.
(6)酸触媒がルイス酸および/または強酸性プロトン
酸である特許請求の範囲記載の方法。(6) The method according to the claims, wherein the acid catalyst is a Lewis acid and / or a strongly acidic protic acid.
第1図は、本発明のブロム化工程の連続流通反応装置の
一例を示す模式図である。FIG. 1 is a schematic diagram showing an example of a continuous flow reactor in the bromination process of the present invention.
Claims (1)
ール類から4−(パラフルオロベンゾイル)フエノール
類を製造するに当り、 (a)臭素および/または分子状酸素と臭化水素とから
なるブロム化剤とフツ化ベンゼンとを反応させて、パラ
ブロモフルオロベンゼンを得るブロム化工程、 (b)該パラブロモフルオロベンゼンをカルボニル化触
媒および塩基の存在下に、一酸化炭素およびパラ位に置
換基を持たないフエノール類と反応させて、パラフルオ
ロ安息香酸フエニルエステル類を得るエステル化工程、
および (c)該パラフルオロ安息香酸フエニルエステル類を酸
触媒の存在下、4−(パラフルオロベンゾイル)フエノ
ール類に転位させる転位反応工程よりなることを特徴と
する4−(パラフルオロベンゾイル)フエノール類の製
造方法。1. When producing 4- (parafluorobenzoyl) phenols from fluorinated benzene, carbon monoxide and phenols, (a) bromination comprising bromine and / or molecular oxygen and hydrogen bromide. A brominating step of reacting an agent with fluorinated benzene to obtain para-bromofluorobenzene, (b) adding a substituent at carbon monoxide and a para-position to the para-bromofluorobenzene in the presence of a carbonylation catalyst and a base. An esterification step for obtaining parafluorobenzoic acid phenyl esters by reacting with phenols that do not have,
And (c) a 4- (parafluorobenzoyl) phenol, which comprises a rearrangement reaction step of rearranging the parafluorobenzoic acid phenyl esters into 4- (parafluorobenzoyl) phenols in the presence of an acid catalyst. Manufacturing method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61152639A JPH0678263B2 (en) | 1986-07-01 | 1986-07-01 | Process for producing 4- (parafluorobenzoyl) phenols |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61152639A JPH0678263B2 (en) | 1986-07-01 | 1986-07-01 | Process for producing 4- (parafluorobenzoyl) phenols |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6310741A JPS6310741A (en) | 1988-01-18 |
| JPH0678263B2 true JPH0678263B2 (en) | 1994-10-05 |
Family
ID=15544796
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61152639A Expired - Lifetime JPH0678263B2 (en) | 1986-07-01 | 1986-07-01 | Process for producing 4- (parafluorobenzoyl) phenols |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0678263B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR3045414B1 (en) * | 2015-12-18 | 2019-12-27 | IFP Energies Nouvelles | NOVEL CATALYTIC COMPOSITION BASED ON NICKEL AND LIGAND PHOSPHINE TYPE AND A LEWIS BASE AND ITS USE IN A PROCESS OF OLEFIN OLIGOMERIZATION |
| CN115974705A (en) * | 2022-12-25 | 2023-04-18 | 阜新睿光氟化学有限公司 | Preparation method of 2-bromo-4-trifluoromethoxyaniline |
-
1986
- 1986-07-01 JP JP61152639A patent/JPH0678263B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6310741A (en) | 1988-01-18 |
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