JPH0679173B2 - Ion flow control plate - Google Patents
Ion flow control plateInfo
- Publication number
- JPH0679173B2 JPH0679173B2 JP60084612A JP8461285A JPH0679173B2 JP H0679173 B2 JPH0679173 B2 JP H0679173B2 JP 60084612 A JP60084612 A JP 60084612A JP 8461285 A JP8461285 A JP 8461285A JP H0679173 B2 JPH0679173 B2 JP H0679173B2
- Authority
- JP
- Japan
- Prior art keywords
- row
- openings
- ion flow
- opening
- line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G15/00—Apparatus for electrographic processes using a charge pattern
- G03G15/22—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20
- G03G15/32—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the charge pattern is formed dotwise, e.g. by a thermal head
- G03G15/321—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the charge pattern is formed dotwise, e.g. by a thermal head by charge transfer onto the recording material in accordance with the image
- G03G15/323—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the charge pattern is formed dotwise, e.g. by a thermal head by charge transfer onto the recording material in accordance with the image by modulating charged particles through holes or a slit
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Electrophotography Using Other Than Carlson'S Method (AREA)
- Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、イオン流書込みによる静電記録装置におけ
るイオン流制御板に関するものである。Description: TECHNICAL FIELD The present invention relates to an ion flow control plate in an electrostatic recording device by ion flow writing.
第9図,第10図は従来のこの種のイオン流制御板の構成
例を示し、第11図はその使用例である。第9図は第11図
のイオン流制御板をコロナイオン発生用ワイヤ側から見
た平面図(上面図),第10図は同じく誘電体記録媒体側
から見た平面図(下面図)である。9 and 10 show an example of the construction of a conventional ion flow control plate of this type, and FIG. 11 shows an example of its use. FIG. 9 is a plan view (top view) of the ion flow control plate of FIG. 11 as seen from the corona ion generating wire side, and FIG. 10 is a plan view (bottom view) of the same as the dielectric recording medium side. .
これらの図において、1は上部電極、2はイオン流通過
用開口部(以下単に開口部という)、3は下部電極、4
は絶縁体基板であり、これらでイオン流制御板5が構成
される。6は誘電体からなる記録媒体、7は導電性基
板、8はコロトロンシールドケース、9はコロナイオン
発生用ワイヤ、10はイオン流制御パルス、11,12,13は電
源である。In these figures, 1 is an upper electrode, 2 is an ion flow passage opening (hereinafter simply referred to as an opening), 3 is a lower electrode, 4
Is an insulating substrate, and these constitute the ion flow control plate 5. 6 is a recording medium made of a dielectric material, 7 is a conductive substrate, 8 is a corotron shield case, 9 is a corona ion generating wire, 10 is an ion flow control pulse, and 11, 12 and 13 are power supplies.
なお、記録媒体6に付された矢印は移動方向を示す。The arrow attached to the recording medium 6 indicates the moving direction.
まず、イオン流を用いた静電像形成の方法を第11図によ
つて説明する。第11図に示すように、コロナイオン発生
用ワイヤ9とコロトロンシールドケース8の間に数KVの
高電圧を電源11から印加することによりコロナイオン発
生用ワイヤ9近傍で発生したイオンは、イオン流制御板
5にあけられた開口部2を通過して記録媒体6に到達す
る。この際、コロナイオン発生用ワイヤ9と上部電極1
の間,および下部電極3と導電性基板7との間にはいず
れも常にイオンをコロナイオン発生用ワイヤ9から記録
媒体6へ進める向きの電界(順方向電場)が電源11,13
により加えられている。このとき、下部電極3の電位を
わずかに変えて上部電極1と下部電極3との間の電界を
制御することによつてイオンの開口部2を通過する量を
制御する。開口部2内の電界の制御は、電源12およびイ
オン流制御パルス10により行われる。First, a method of forming an electrostatic image using an ion flow will be described with reference to FIG. As shown in FIG. 11, when a high voltage of several KV is applied between the corona ion generating wire 9 and the corotron shield case 8 from the power source 11, the ions generated near the corona ion generating wire 9 are It reaches the recording medium 6 through the opening 2 formed in the flow control plate 5. At this time, the corona ion generating wire 9 and the upper electrode 1
An electric field (forward electric field) for advancing ions from the corona ion generating wire 9 to the recording medium 6 is always provided between the lower electrode 3 and the conductive substrate 7 between the power sources 11 and 13.
Has been added by. At this time, the amount of ions passing through the opening 2 is controlled by slightly changing the potential of the lower electrode 3 to control the electric field between the upper electrode 1 and the lower electrode 3. The electric field in the opening 2 is controlled by the power supply 12 and the ion flow control pulse 10.
この種のイオン流制御板5は、高い記録ドツト密度を実
現するために開口部2を2次元配列とすることが一般に
行われているが、従来のこの種のイオン流制御板5にお
いては開口部2の配列は、例えば第9図,第10図に見ら
れるように単に端から順に斜めにずらして並べた配列と
なつているため、静電像形成の際に、特にベタ黒印字に
相当する静電像形成をする際記録媒体6上の同じ列の中
で先に形成された静電像電荷によるクーロン力(反発
力)により、次に照射されるイオン流の軌跡が曲げら
れ、結果として記録媒体6上で静電像が不均一に形成さ
れ、記録むらを生じるという欠点がある。In this type of ion flow control plate 5, the openings 2 are generally arranged in a two-dimensional array in order to realize a high recording dot density. The arrangement of the portion 2 is, for example, as shown in FIG. 9 and FIG. 10, simply arranged in an obliquely shifted manner from the end, so that it corresponds to solid black printing particularly in electrostatic image formation. When the electrostatic image is formed, the locus of the ion stream to be irradiated next is bent by the Coulomb force (repulsive force) due to the electrostatic image charges previously formed in the same row on the recording medium 6, and the result is As a result, there is a drawback that an electrostatic image is nonuniformly formed on the recording medium 6 and uneven recording occurs.
第12図は第9図,第10図にみられるような開口部2の配
列をもつイオン流制御板5を用いてベタ黒記録部分の静
電像の形成を行つたときのイオン流軌跡の偏向による静
電像の不均一な形成の過程を模式的に表わしたものであ
り、14は静電像電荷、15はイオン流軌跡である。FIG. 12 shows the locus of ion flow when an electrostatic image of a solid black recording portion is formed by using the ion flow control plate 5 having the arrangement of the openings 2 as shown in FIG. 9 and FIG. The process of uneven formation of an electrostatic image due to deflection is schematically shown, where 14 is an electrostatic image charge and 15 is an ion flow locus.
第12図において記録媒体6上の記録媒体進行方向と平行
(コロナイオン発生用ワイヤ9と平行)な1記録ライン
上の静電像の形成(ベタ黒記録時)は(1)→(8)の
順に行われる。この際、例えば第10図における第2列目
の開口部2からのイオン流が照射される第12図の(2)
の過程において、イオン流軌跡15は第1列目の開口部2
からのイオン流により既に形成ずみの静電像電荷14によ
り形成された不均一電場の影響を受けて曲げられ、第2
列の開口部2の直下から少しずれた位置に静電像が形成
される。以下同様の過程が第12図の(3)→(8)の順
に行われ最終的な静電像電荷14は記録媒体6上に第13図
のように不均一な分布をもつ結果となり、現像後は本来
ベタ黒であるべき部分にしま模様を生ずることとなる
(特開昭55−14244号公報参照)。In FIG. 12, formation of an electrostatic image on one recording line parallel to the recording medium traveling direction on the recording medium 6 (parallel to the corona ion generating wire 9) (during solid black recording) is (1) → (8). It is performed in order. At this time, for example, the ion current from the opening 2 in the second row in FIG. 10 is irradiated ((2) in FIG. 12).
In the process of, the ion flow locus 15 becomes the opening 2 of the first row.
Bending under the influence of the non-uniform electric field formed by the electrostatic image charge 14 already formed by the ion flow from
An electrostatic image is formed at a position slightly deviated from immediately below the opening 2 of the row. Thereafter, the same process is performed in the order of (3) → (8) in FIG. 12, and the final electrostatic image charge 14 has a non-uniform distribution on the recording medium 6 as shown in FIG. After that, a stripe pattern is formed in a portion which should be solid black (see JP-A-55-14244).
この発明は、これらの欠点を除去するためになされたも
ので、記録媒体に照射されるイオン流軌跡の偏向を防ぐ
イオン流制御板を提供することを目的とする。The present invention has been made in order to eliminate these drawbacks, and an object of the present invention is to provide an ion flow control plate which prevents deflection of the ion flow trajectory irradiated on a recording medium.
この発明にかかるイオン流制御板は、多数の開口部を記
録媒体の移動方向に垂直な4つの列上に設け、第1列目
には記録媒体上で最終的に得ようとする記録ドットピッ
チの4倍のピッチで開口部を配列し、第2列目には第1
列目と同じピッチでしかも第1列上のとなりあう2つの
開口部を結ぶ線分の垂直2等分線上に各開口部を配置
し、第3列目には第1列と同じピッチでしかも第1列上
のとなりあう2つの開口部を結ぶ線分を垂直に1:3また
は3:1のいずれか一方の距離に分割する線上に各開口部
を配置し、第4列目には第1列と同じピッチでしかも第
1列上のとなりある2つの開口部を結ぶ線分を垂直に3:
1または1:3の比率のうち第3列と同一でない方の距離に
分割する線上に各開口部を配置したものである。The ion flow control plate according to the present invention is provided with a large number of openings on four rows perpendicular to the moving direction of the recording medium, and the first row is the recording dot pitch to be finally obtained on the recording medium. The openings are arranged at a pitch four times larger than that of the first row in the second row.
The openings are arranged at the same pitch as the first row and on the vertical bisector of the line segment that connects the two openings on the first row, and the third row has the same pitch as the first row. Place each opening on the line that vertically divides the line segment that connects the two adjacent openings on the first row into either 1: 3 or 3: 1 distance. The line segment that connects the two adjacent openings on the first row at the same pitch as the first row is vertically set to 3:
Each of the openings is arranged on a line that divides into a distance that is not the same as the third row in the ratio of 1 or 1: 3.
またこの発明にかゝる別の発明は、開口部を8つの列上
に設けたものである。Another invention according to the present invention is that the openings are provided on eight rows.
この発明においては、多数の開口部が印字ラインに対し
て前列以前の開口部により既に形成された静電像電荷の
分布を常に左右対称に分割する位置に次の列の開口部を
順次配置した配列となつているため、照射されるイオン
流は左右で同じ大きさのクーロン力を受け、直進して記
録媒体上に記録を行う。In the present invention, the openings in the next row are sequentially arranged at positions where a large number of openings always symmetrically divide the distribution of electrostatic image charges already formed by the openings in the previous row and before the print line. Because of the array, the irradiated ion flow receives the same Coulomb force on the left and right and goes straight to record on the recording medium.
またこの発明の別の発明は、8つの列上の開口部からイ
オン流は直進して記録媒体上に記録を行う。Further, according to another invention of the present invention, the ion flow goes straight through the openings on the eight rows to perform recording on the recording medium.
第1図〜第4図はこの発明の第1の実施例を説明する図
であり、第1図はこの発明によるイオン流制御板5の上
面図,第2図は下面図である。これらの図で1〜6およ
び14,15は第11図,第12図に示したものと同じである。1 to 4 are views for explaining a first embodiment of the present invention, FIG. 1 is a top view of an ion flow control plate 5 according to the present invention, and FIG. 2 is a bottom view. 1 to 6 and 14, 15 are the same as those shown in FIGS. 11 and 12.
第3図は第1図,第2図に示したイオン流通過用の開口
部2の配列を持つイオン流制御板5を用いてベタ黒記録
部分の静電像の形成を行う過程を、第12図と同様に開口
部2の各列によるイオン流照射過程ごとに8段階に分け
て示したものであり、静電像の形成は第3図中(1)→
(8)の順に行われる。FIG. 3 shows a process of forming an electrostatic image of a solid black recording portion by using the ion flow control plate 5 having the arrangement of the openings 2 for passing the ion flow shown in FIGS. Similar to FIG. 12, the process is divided into 8 steps for each ion flow irradiation process by each row of the openings 2, and the electrostatic image is formed by (1) in FIG.
It is performed in the order of (8).
第4図は第3図の過程により最終的に形成される記録媒
体6上の静電像の分布を示す図である。FIG. 4 is a diagram showing the distribution of the electrostatic image on the recording medium 6 which is finally formed by the process of FIG.
イオン流制御板5が第1図,第2図に示すような開口部
2の配列となつているから、静電像の形成は第3図に示
すようにイオン流軌跡15の偏向のない状態で行われ静電
像電荷14は各々開口部2の直下に形成され、最終的な静
電像電荷14の分布は第4図のような均一な分布となり、
現像後も均一なムラのない画像が得られる。Since the ion flow control plate 5 has the arrangement of the openings 2 as shown in FIGS. 1 and 2, the electrostatic image is formed without deflection of the ion flow locus 15 as shown in FIG. The electrostatic image charge 14 is formed immediately below the opening 2, and the final electrostatic image charge 14 has a uniform distribution as shown in FIG.
Even after development, a uniform and even image can be obtained.
第3図においてイオン流軌跡15の偏向の生じない理由を
説明すると、例えば第3図の過程(2)においてイオン
流の照射は第3図の過程(1)ですでに照射された静電
像の分布の間隔の中央の真上に位置する開口部2を通じ
て行われるため、このときのイオン流は図中の左右の静
電像から同じ大きさのクーロン力を受け、この結果、イ
オン流軌跡15は図中で右にも左にも偏向を起こさない。
同様に第3図中の過程(3)〜(8)においてイオン流
を照射する開口部2の位置は、記録媒体6上の同一記録
ライン上で、すでに形成された静電像により常に左右同
じ大きさのクーロン力を受けるように設定されているた
め、イオン流軌跡15の偏向は起こらない。The reason why the deflection of the ion flow locus 15 does not occur in FIG. 3 will be explained. For example, in the step (2) of FIG. 3, the irradiation of the ion flow is performed by the electrostatic image already irradiated in the step (1) of FIG. Since it is performed through the opening 2 located directly above the center of the distribution interval, the ion flow at this time receives Coulomb force of the same magnitude from the electrostatic images on the left and right in the figure, and as a result, the ion flow trajectory 15 does not deflect to the right or left in the figure.
Similarly, in the steps (3) to (8) in FIG. 3, the position of the opening 2 for irradiating the ion current is always the same on the same recording line on the recording medium 6 due to the electrostatic image already formed. The ion flow trajectory 15 is not deflected because it is set to receive a large Coulomb force.
イオン流軌跡15の偏向が起こらないための開口部2の配
列条件は具体的には第3図中で過程(1)〜(8)中の
どの過程においても、あるイオン流軌跡15をみると記録
媒体6上で、そのイオン流軌跡15と、そのイオン流軌跡
15のすぐ右のイオン流軌跡15までの間に存在する静電像
電荷14と、同じくすぐ左のイオン流軌跡15までの間に存
在する静電像電荷14とが問題とするイオン流軌跡15を中
心として対称な分布をなしていることである。The arrangement condition of the openings 2 for preventing the deflection of the ion flow locus 15 is specifically shown in FIG. 3 when a certain ion flow locus 15 is observed in any of the processes (1) to (8). On the recording medium 6, the ion flow locus 15 and the ion flow locus
Ion flow locus 15 which is a problem due to electrostatic image charge 14 existing up to ion flow locus 15 immediately to the right of 15 and electrostatic image charge 14 also existing up to ion flow locus 15 to the immediate left of 15 It has a symmetrical distribution centered on.
このように、すべての開口部2をイオン流通過状態とし
たとき、前列以前の開口部2により既に形成された静電
像電荷14の分布を常に左右対称に分割する位置に、次の
列の開口部2を配置するという規則に従つてイオン流制
御板5上の開口部2の配列を設定することが、イオン流
軌跡15の偏向を防止したイオン流制御板5の条件であ
る。なお、この規則はイオン流制御板5の右端部と左端
部では結果的に守れないことになるが、それ以外の部分
を規則性に従つて配置することで問題はない。In this way, when all the openings 2 are in the ion flow passing state, the distribution of the electrostatic image charges 14 already formed by the openings 2 before the previous row is always symmetrically divided into the positions of the next row. Setting the arrangement of the openings 2 on the ion flow control plate 5 according to the rule of arranging the openings 2 is a condition of the ion flow control plate 5 that prevents the deflection of the ion flow trajectory 15. Although this rule cannot be observed at the right end portion and the left end portion of the ion flow control plate 5 as a result, there is no problem by arranging the other portions according to the regularity.
このような条件をみたす開口部2の配列は、第1図,第
2図のように開口部2を8列に配置する場合、第1図,
第2図に示した配列のみではなく、他にも存在する。以
下これについて説明する。The arrangement of the openings 2 satisfying such a condition is as shown in FIGS. 1 and 2 when the openings 2 are arranged in 8 rows as shown in FIGS.
There are other arrangements than the arrangement shown in FIG. This will be described below.
第5図,第6図はこの発明の前記第1の実施例を含む開
口部2の種々の配列を説明するための図であり、第5図
は開口部2を8列に配置するイオン流制御板5の上面に
おける開口部2位置を説明する図、第6図は第5図にお
ける開口部2の位置を指定する表の図である。5 and 6 are views for explaining various arrangements of the openings 2 including the first embodiment of the present invention. FIG. 5 shows an ion flow in which the openings 2 are arranged in 8 rows. FIG. 6 is a view for explaining the position of the opening 2 on the upper surface of the control plate 5, and FIG. 6 is a table for specifying the position of the opening 2 in FIG.
イオン流制御板5上の開口部2の位置は、開口部2を8
列に構成する場合ならば印字ライン上で連続する8個の
記録ドツトに対応する8個の開口部2の位置を指定すれ
ば決定され、その他の開口部2の位置は同じパターンの
繰返しにより決まる。The position of the opening 2 on the ion flow control plate 5 is 8
In the case of arranging in rows, the positions are determined by designating the positions of the eight openings 2 corresponding to the eight continuous recording dots on the print line, and the positions of the other openings 2 are determined by repeating the same pattern. .
第5図はその8個の開口部2を提供するイオン流制御板
5の部分を示す。開口部2は第6図により第5図中にお
ける位置が指定され、その指定位置は第6図に示すよう
に全部で16通りの組合せが可能である。FIG. 5 shows the part of the ion flow control plate 5 which provides its eight openings 2. The position of the opening 2 in FIG. 5 is designated by FIG. 6, and the designated position can be a total of 16 combinations as shown in FIG.
第5図,第6図の見方は、例えば第1列の開口部2の位
置は第5図中〜で示す線上のいずれかから選択され
るが、例えば第6図の表中の組合せのNo.(1)の場合
を見ると、第1列に相当する欄には数字“1"が記されて
おり、これは第5図中の第1列目の横線上のたて線で
指定される位置に第1列の開口部2を設定することを意
味しており、同様に第2列目の欄の数字“5"は第5図中
の第2列目の横線上のたて線で指定される位置に第2
列の開口部2を設定することを意味している(これらの
位置を点線丸印で表す)。以下同様にして第6図の表中
の組合せのNo.(1)の欄を右に3〜8列目まで見てい
けば、3〜8列目の開口部2の位置がいずれも数字で指
定されている。第6図中組合せNo.(1)を指定する開
口部2の位置に従つてイオン流制御板5を構成したもの
が第1図に他ならない。なお、第1図と第2図は開口部
2の位置が互に左右反転している。From the viewpoint of FIGS. 5 and 6, for example, the position of the opening 2 in the first row is selected from one of the lines shown by in FIG. 5 to, but, for example, the combination No. in the table of FIG. Looking at the case of (1), the number "1" is written in the column corresponding to the first column, which is designated by the vertical line on the horizontal line in the first column in FIG. It means that the opening 2 of the first row is set at a position where the number "5" in the column of the second row is the vertical line on the horizontal line of the second row in FIG. Second at the position specified by
This means setting the opening 2 of the row (these positions are indicated by dotted circles). Similarly, if you look at the No. (1) column of the combinations in the table of FIG. 6 to the right on the 3rd to 8th rows, the positions of the openings 2 on the 3rd to 8th rows are all numbers. It is specified. The ion flow control plate 5 is configured in accordance with the position of the opening 2 that specifies the combination No. (1) in FIG. 1 and 2, the positions of the openings 2 are horizontally reversed.
第6図に示す組合せNo.(1)〜No.(16)を、第1図を
参照してまとめて表現すると下記のようになる。すなわ
ち、第1図に示すように、第1列の開口部2の隣接する
間隔を8lとし、各列における開口部2の中心線同士の間
隔(記録ドツトピツチ)をlとすると、多数の開口部2
は記録媒体6の移動方向に垂直な8つの列、つまり第1
列〜第8列上に設け、第1列目には記録媒体6上で最終
的に得ようとする記録ドツトピツチlの8倍のピツチ8l
で開口部2を配列し、第2列目には第1列目と同じピツ
チ8lでしかも第1列上のとなりあう2つの開口部2を結
ぶ線分の垂直2等分線上に各開口部2を配置し、第3列
目には第1列,第2列と同じピツチ8lでしかも第1列上
のとなりあう2つの開口部2を結ぶ線分を垂直に1:3(2
l:6l)または3:1(6l:2l)のいずれか一方のみの距離に
分割する線上に各開口部2を配置し、第4列目には第1,
第2,第3列と同じピツチ8lでしかも第1列上のとなりあ
う2つの開口部2を結ぶ線分を垂直に3:1(6l:2l)また
は1:3(2l:6l)の比率のうち第3列と同一でない方の距
離に分割する線上に各開口部2を配置し、第5列目には
第1列と同じピツチ8lでしかも第1列目ととなりあう2
つの開口部2を結ぶ線分を垂直に1:7(1l:7l),3:5(3
l:5l),5:3(5l:3l),7:1(7l:1l)のいずれか1つのみ
の比率に分割する線上に各開口部2を配列し、第6列目
には第1列目と同じピツチ8lでしかも第5列のとなりあ
う2つの開口部2を結ぶ線分の垂直2等分線上に各開口
部2を配置し、第7列目には第1列と同じピツチ8lでし
かも第5列上のとなりあう2つの開口部2を結ぶ線分を
垂直に1:3(2l:6l)または3:1(6l:2l)のいずれか一方
のみの距離に分割する線上に各開口部2を配置し、第8
列目には第1列と同じピツチ8lでしかも第5列上のとな
りあう2つの開口部2を結ぶ線分を垂直に3:1(6l:2l)
または1:3(2l:6l)の比率のうち第7列と同一でない方
の距離に分割する線上に各開口部2を配置したものであ
る。The combinations No. (1) to No. (16) shown in FIG. 6 can be collectively expressed with reference to FIG. That is, as shown in FIG. 1, if the spacing between adjacent openings 2 in the first row is 8 l and the spacing between the center lines of the openings 2 in each row (recording pitch) is l, there are many openings. Two
Are eight columns perpendicular to the moving direction of the recording medium 6, that is, the first column
The rows 8 to 8 are provided, and the first row has a pitch 8l which is 8 times the recording dot pitch l to be finally obtained on the recording medium 6.
The openings 2 are arranged in the same manner as the first row and the same pitch 8l is provided in the second row, and each opening is on the perpendicular bisector of the line segment connecting the two openings 2 that are adjacent to each other in the first row. 2 are arranged, and the third row has the same pitch 8l as the first row and the second row, and the line segment connecting the two openings 2 which are adjacent to each other on the first row is vertically 1: 3 (2
l: 6l) or 3: 1 (6l: 2l), each opening 2 is placed on a line that divides into only one distance, and in the 4th row,
The same pitch 8l as the second and third rows, and the line segment connecting the two adjacent openings 2 on the first row is vertically 3: 1 (6l: 2l) or 1: 3 (2l: 6l) Each opening 2 is arranged on a line that divides into a distance that is not the same as the third row, and the fifth row has the same pitch 8l as the first row and also becomes the first row.
The line segment connecting the two openings 2 is 1: 7 (1l: 7l), 3: 5 (3
l: 5l), 5: 3 (5l: 3l), and 7: 1 (7l: 1l), each opening 2 is arranged on a line that divides only one, and the sixth row is The same pitch 8l as the first row, and each opening 2 is arranged on the vertical bisector of the line segment connecting the two openings 2 adjacent to each other in the fifth row, and the same as the first row in the seventh row. Pitch 8l and divide the line segment connecting the two adjacent openings 2 on the 5th row vertically to either 1: 3 (2l: 6l) or 3: 1 (6l: 2l). Arrange each opening 2 on the line, and
The first row has the same pitch 8l as the first row, and the line segment connecting the two adjacent openings 2 on the fifth row is vertically 3: 1 (6l: 2l).
Alternatively, each opening 2 is arranged on a line that divides into a distance that is not the same as that of the seventh row in the ratio of 1: 3 (2l: 6l).
以上の実施例は、開口部2を8列に2次元配列する場合
の例で示したが、同様にして開口部2を4列に2次元配
列する実施例も可能である。第7図,第8図は開口部2
を4列に配列する場合のイオン流制御板5の2つの実施
例の上面図で、第1図に対応するものである。Although the above-described embodiments have been described as examples in which the openings 2 are two-dimensionally arranged in eight rows, an embodiment in which the openings 2 are two-dimensionally arranged in four rows is also possible. 7 and 8 show the opening 2
FIG. 3 is a top view of two examples of the ion flow control plate 5 in the case of arranging in four rows, which corresponds to FIG. 1.
上記第7図,第8図に示す実施例の場合もまとめれば下
記のようになる。The case of the embodiments shown in FIGS. 7 and 8 can be summarized as follows.
すなわち、第7図の場合は、記録ドツトピツチを第1図
の場合と同じくlとし、同じ列における開口部2の間隔
を4lとすると、第7図の実施例は、開口部2は記録媒体
6の移動方向に垂直な4つの列上に設け、第1列目には
記録媒体6上で最終的に得ようとする記録ドツトピツチ
の4倍のピツチ4lで開口部2を配列し、第2列目には第
1列目と同じピツチ4lでしかも第1列上のとなりあう2
つの開口部2を結ぶ線分の垂直2等分線上に各開口部2
を配置し、第3列目には第1列目と同じピツチ4lでしか
も第1列上のとなりあう2つの開口部2を結ぶ線分を垂
直に1:3(1l:3l)の距離に分割する線上に各開口部2を
配置し、第4列目には第1列目と同じピツチ4lでしかも
第1列上のとなりあう2つの開口部2を結ぶ線分を垂直
に3:1(3l:1l)の距離に分割する線上に各開口部2を配
置したものである。That is, in the case of FIG. 7, assuming that the recording dot is 1 as in the case of FIG. 1 and the distance between the openings 2 in the same row is 4 l, in the embodiment of FIG. Are provided on four rows perpendicular to the moving direction of the recording medium, and the openings 2 are arranged in the first row on the recording medium 6 by the pitch 4l which is four times as large as the recording dot pitch to be finally obtained. Eyes have the same pitch 4l as in the first row and are on the first row 2
Each opening 2 on the vertical bisector of the line segment that connects the two openings 2
And the line 3 connecting the two openings 2 on the first row, which are the same pitch 4l as the first row on the third row, is vertically at a distance of 1: 3 (1l: 3l). Each opening 2 is arranged on the dividing line, and in the 4th row, the same pitch 4l as the 1st row is used, and the line segment connecting the two openings 2 that are adjacent to each other on the 1st row is vertically 3: 1. The openings 2 are arranged on a line dividing the distance (3l: 1l).
さらに、第8図の実施例は、多数の開口部2は記録媒体
6の移動方向に垂直な4つの列上に設け、第1列目には
記録媒体6上で最終的に得ようとする記録ドツトピツチ
lの4倍のピツチ4lで開口部2を配列し、第2列目には
第1列目と同じピツチ4lでしかも第1列上のとなりあう
2つの開口部2を結ぶ線分の垂直2等分線上に各開口部
2を配置し、第3列目には第1列と同じピツチ4lでしか
も第1列上のとなりあう2つの開口部2を結ぶ線分を垂
直に3:1(3l:1l)の距離に分割する線上に各開口部2を
配置し、第4列目には第1列と同じピツチ4lでしかも第
1列上のとなりあう2つの開口部2を結ぶ線分を垂直に
1:3(1l:3l)の距離に分割する線上に各開口部2を配置
したものもである。Further, in the embodiment of FIG. 8, a large number of openings 2 are provided on four rows perpendicular to the moving direction of the recording medium 6, and the first row is to be finally obtained on the recording medium 6. The openings 2 are arranged with a pitch 4l which is four times as large as the recording dot pitch l, and the second row has the same pitch 4l as the first row, and a line segment connecting two adjacent openings 2 on the first row. The openings 2 are arranged on the vertical bisectors, and the third row has the same pitch 4l as the first row, and the line segment connecting the two openings 2 that are adjacent to each other on the first row is vertically 3: Arrange each opening 2 on a line that divides into a distance of 1 (3l: 1l), and connect the two openings 2 that are the same pitch 4l as the first row in the fourth row and are adjacent to each other on the first row. Line segment vertically
There is also one in which each opening 2 is arranged on a line dividing into a distance of 1: 3 (1l: 3l).
以上の実施例を含んで、この発明における開口部2の配
列規則を一般的に示すと下記のようになる。The arrangement rule of the openings 2 according to the present invention including the above embodiments is generally shown as follows.
イオン流通過用の開口部2の第1列は{(記録媒体6上
で最終的に得ようとする記録ドツトピツチl)×(総列
数)}の間隔で、印字ラインに平行に規則的に配置す
る。The first row of the openings 2 for passing the ion stream is regularly arranged in parallel with the print line at an interval of {(recording dot l to be finally obtained on the recording medium 6) × (total number of rows)}. Deploy.
第2列目以降は常に1つ前の列のとなりあう2つの開口
部2間を結ぶ線分を2n分割(n:整数)する位置から前記
線分に垂直に上げた線分のうち1つ前以前の列の開口部
2の位置を横切らないもので、かつnを最小とする線の
うち任意の1つの線上に開口部2の位置を定め、印字ラ
インに平行上に第1列と同じ間隔で開口部2を規則的に
配置する。ただし、総列数(列の数)は2k(k:整数)を
満すものとする。One of the line segments perpendicular to the line segment from the position where the line segment that connects the two openings 2 that are adjacent to each other in the previous column is divided into 2n (n: integer) from the second column onwards. The position of the opening 2 is determined so that it does not cross the position of the opening 2 in the previous row and is on any one of the lines that minimizes n, and is parallel to the print line and is the same as the first row. The openings 2 are regularly arranged at intervals. However, the total number of columns (number of columns) shall be 2k (k: integer).
上記一般則により、この発明において2,4,8,16,32,…,2
k(k:整数)に開口部2を2次元配置する場合の配置法
がすべて示される。According to the above general rule, in the present invention, 2, 4, 8, 16, 32, ..., 2
All the arrangement methods when the openings 2 are arranged two-dimensionally in k (k: integer) are shown.
なお、以上の実施例は、イオン流制御板5の表裏を逆転
して使用することも可能である。またこれまでの実施例
では、イオン流制御板5の片面に共通電極、他面に個々
の開口部2に個別に配線した個別電極を配した例で示し
たが、この発明においては開口部2の配列そのものが本
質的であり、電極パターンの形状等は他の形でも一向に
差し支えない。例えば、イオン流制御板5の片面で2個
以上の開口部2をひとまとめにした電極パターン形状と
し、他面でも2個以上の開口部2を先の面と異なる組合
せでひとまとめにした電極パターン形状とし、各々の面
にイオン流制御信号を与えて個々の開口部2におけるイ
オン流の通過を制御する、いわゆるマトリクス構成の電
極形状としてもよい。In the above embodiment, the front and back of the ion flow control plate 5 can be reversed and used. Further, in the above-described embodiments, the common electrode is arranged on one surface of the ion flow control plate 5, and the individual electrodes individually wired to the respective openings 2 are arranged on the other surface, but in the present invention, the openings 2 are arranged. The arrangement itself is essential, and the shape of the electrode pattern may be any other shape. For example, an electrode pattern shape in which two or more openings 2 are grouped together on one surface of the ion flow control plate 5 and an electrode pattern shape in which two or more openings 2 are grouped together on the other surface in a combination different from the previous surface Alternatively, an ion flow control signal may be applied to each surface to control the passage of the ion flow through the individual openings 2, so that the electrodes may have a so-called matrix configuration.
さらに、上記の説明では、記録媒体6の移動方向は副走
査方向と一致しており、この移動方向と垂直な方向とは
主走査方向を指すものである。したがつて、前記の垂直
とは厳密な意味でなく、大きな幅を有することはいうま
でもない。Furthermore, in the above description, the moving direction of the recording medium 6 coincides with the sub-scanning direction, and the direction perpendicular to this moving direction indicates the main scanning direction. Therefore, it is needless to say that the term "vertical" is not strictly defined and has a large width.
〔発明の効果〕 この発明は以上説明したように、多数の開口部を記録媒
体の移動方向に垂直な複数の列上に設け、かつその配列
はすべての開口部をイオン流通過状態としたとき、記録
媒体上の移動方向と垂直な印字ラインに対して前列以前
の開口部により既に形成された静電像電荷の分布を常に
左右対称に分割する位置に次の開口部を順次配置したの
で、静電潜像を形成する際にイオン流軌跡の偏向が起こ
りにくく、静電像が均一に形成され、特にベタ黒部分を
記録する際、記録濃度むらの少ない画像が得られる利点
がある。[Effects of the Invention] As described above, the present invention provides a large number of openings on a plurality of rows perpendicular to the moving direction of the recording medium, and the arrangement is such that all openings are in the ion flow passage state. Since the distribution of electrostatic image charges already formed by the opening in the front row and the distribution of the electrostatic image charge that is already formed with respect to the print line perpendicular to the moving direction on the recording medium is always symmetrically divided, the following openings are sequentially arranged. When the electrostatic latent image is formed, the deflection of the ion flow trajectory is unlikely to occur, the electrostatic image is formed uniformly, and there is an advantage that an image with little recording density unevenness can be obtained especially when recording a solid black portion.
またこの発明の別の発明は、開口部を8つの列上に設け
たので、組合せの多い開口部の配列が容易に得られるた
め、製造し易いと同時に、記録ピッチすなわち解像度に
比して開口部面積(通常は開口部の穴直径)の大きい開
口部を配置できるため、イオン流通過量を大きく確保し
やすく、結果的に早い記録速度においても十分な記録濃
度を得られ易いイオン流制御板が実現できる利点があ
る。Further, according to another invention of the present invention, since the openings are provided on eight rows, it is possible to easily obtain an array of openings having a large number of combinations. Therefore, it is easy to manufacture and at the same time, the openings are compared with the recording pitch, that is, resolution. Since an opening having a large area (usually the hole diameter of the opening) can be arranged, it is easy to secure a large ion flow passage amount, and as a result, an ion flow control plate that can easily obtain a sufficient recording density even at a high recording speed. There are advantages that can be realized.
【図面の簡単な説明】 第1図はこの発明の第1の実施例を示す上面図、第2図
は同じく下面図、第3図はこの発明の第1の実施例のイ
オン流制御板を用いて静電像の形成を行う過程の説明
図、第4図はこの発明の第1の実施例のイオン流制御板
を用いて静電像の形成を行つた結果得られる均一な電荷
分布の例を示す説明図、第5図はこの発明の他の実施例
の開口部の種々の位置を説明するための図、第6図は第
5図における開口部の位置を指定する表を示す図、第7
図,第8図はこの発明のさらに他の実施例をそれぞれ示
す上面図、第9図は従来のイオン流制御板の上面図、第
10図は同じく下面図、第11図は従来のイオン流制御板の
使用例の断面図、第12図は従来のイオン流制御板を用い
て静電像の形成を行う過程の説明図、第13図は同じく従
来のイオン流制御板を用いて静電像の形成を行つた結果
得られる不均一な電荷分布の例を示す説明図である。 図中、1は上部電極、2は開口部、3は下部電極、4は
絶縁体基板、5はイオン流制御板、lは記録ドツトピツ
チである。BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a top view showing a first embodiment of the present invention, FIG. 2 is a bottom view of the same, and FIG. 3 shows an ion flow control plate of the first embodiment of the present invention. FIG. 4 is an explanatory view of a process of forming an electrostatic image by using the ion flow control plate of the first embodiment of the present invention, which shows a uniform charge distribution obtained as a result of forming an electrostatic image. FIG. 5 is an explanatory view showing an example, FIG. 5 is a view for explaining various positions of the opening of another embodiment of the present invention, and FIG. 6 is a view showing a table for designating the position of the opening in FIG. , 7th
FIG. 8 is a top view showing still another embodiment of the present invention, and FIG. 9 is a top view of a conventional ion flow control plate.
10 is a bottom view of the same, FIG. 11 is a cross-sectional view of an example of using a conventional ion flow control plate, and FIG. 12 is an explanatory view of a process of forming an electrostatic image using the conventional ion flow control plate. FIG. 13 is an explanatory diagram showing an example of a non-uniform charge distribution obtained as a result of forming an electrostatic image using the conventional ion flow control plate. In the figure, 1 is an upper electrode, 2 is an opening, 3 is a lower electrode, 4 is an insulator substrate, 5 is an ion flow control plate, and 1 is a recording dot pitch.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭55−55878(JP,A) 特開 昭58−72162(JP,A) 特開 昭59−55764(JP,A) ─────────────────────────────────────────────────── ─── Continuation of front page (56) Reference JP-A-55-55878 (JP, A) JP-A-58-72162 (JP, A) JP-A-59-55764 (JP, A)
Claims (2)
絶縁性基板の上面と下面にそれぞれ上部電極と下部電極
をそれぞれの開口部を前記絶縁体基板の開口部に重ねて
設け、前記上部電極と下部電極に印加する電位を制御す
ることによってイオン流を制御して静電像を形成するイ
オン流制御板において、前記多数の開口部を記録媒体の
移動方向に垂直な4つ等間隔の列上に設け、第1列目に
は記録媒体上で最終的に得ようとする記録ドットピッチ
の4倍のピッチで開口部を配列し、第2列目には第1列
目と同じピッチでしかも第1列上のとなりあう2つの開
口部を結ぶ線分の垂直2等分線上に各開口部を配置し、
第3列目には第1列と同じピッチでしかも第1列上のと
なりあう2つの開口部を結ぶ線分を垂直に1:3または3:1
のいずれか一方のみの距離に分割する線上に各開口部を
配置し、第4列目には第1列と同じピッチでしかも第1
列上のとなりあう2つの開口部を結ぶ線分を垂直に3:1
または1:3の比率のうち第3列と同一でない方の距離に
分割する線上に各開口部を配置したことを特徴とするイ
オン流制御板。1. An upper electrode and a lower electrode are provided on the upper surface and the lower surface of an insulating substrate on which a large number of openings for passing an ion flow are formed, and the upper electrode and the lower electrode are provided so as to overlap with the opening of the insulating substrate. In an ion flow control plate for controlling an ion flow by controlling an electric potential applied to an upper electrode and a lower electrode to form an electrostatic image, the plurality of openings are arranged at four equal intervals perpendicular to a moving direction of a recording medium. On the recording medium, the openings are arranged at a pitch four times as large as the recording dot pitch to be finally obtained on the recording medium, and the second row is the same as the first row. Arrange each opening on the vertical bisector of the line segment that connects the two openings that are adjacent to each other at the pitch,
The third row has the same pitch as the first row, and the line segment connecting the two adjacent openings on the first row is vertically set to 1: 3 or 3: 1.
Each of the openings is arranged on a line that divides only one of the distances, and the fourth row has the same pitch as the first row and the first row.
Vertically connect the line segment that connects the two adjacent openings on the line 3: 1
Alternatively, the ion flow control plate is characterized in that each opening is arranged on a line that divides into a distance that is not the same as the third row in the ratio of 1: 3.
絶縁性基板の上面と下面にそれぞれ上部電極と下部電極
をそれぞれの開口部を前記絶縁体基板の開口部に重ねて
設け、前記上部電極と下部電極に印加する電位を制御す
ることによってイオン流を制御して静電像を形成するイ
オン流制御板において、前記多数の開口部を記録媒体の
移動方向に垂直な8つの等間隔の列上に設け、第1列目
には記録媒体上で最終的に得ようとする記録ドットピッ
チの8倍のピッチで開口部を配列し、第2列目には第1
列目と同じピッチでしかも第1列上のとなりあう2つの
開口部を結ぶ線分の垂直2等分線上に各開口部を配置
し、第3列目には第1列と同じピッチでしかも第1列上
のとなりあう2つの開口部を結ぶ線分を垂直に1:3また
は3:1のいずれか一方のみの距離に分割する線上に各開
口部を配置し、第4列目には第第1列と同じピッチでし
かも第1列上のとなりあう2つの開口部を結ぶ線分を垂
直に3:1または1:3の比率のうち第3列と同一でない方の
距離に分割する線上に各開口部を配置し、第5列目には
第1列と同じピッチでしかも第1列目のとなりあう2つ
の開口部を結ぶ線分を垂直に1:7,3:5,5:3,7:1のいずれ
か1つのみの比率に分割する線上に各開口部を配列し、
第6列目には第1列目と同じピッチでしかも第5列上の
となりあう2つの開口部を結ぶ線分の垂直2等分線上に
各開口部を配置し、第7列目には第1列と同じピッチで
しかも第5列上のとなりあう2つの開口部を結ぶ線分を
垂直に1:3または3:1のいずれか一方のみの距離に分割す
る線上に各開口部を配置し、第8列目には第1列と同じ
ピッチでしかも第5列上のとなりあう2つの開口部を結
ぶ線分を垂直に3:1または1:3の比率のうち第7列と同一
でない方の距離に分割する線上に各開口部を配置したこ
とを特徴とするイオン流制御板。2. An upper electrode and a lower electrode are provided on the upper surface and the lower surface of an insulating substrate on which a large number of openings for passing an ion flow are provided, and the respective opening portions are provided so as to overlap with the opening portion of the insulating substrate. In an ion flow control plate that controls an ion flow by controlling an electric potential applied to an upper electrode and a lower electrode to form an electrostatic image, the multiple openings are provided at eight equal intervals perpendicular to a moving direction of a recording medium. On the first row, the openings are arranged at a pitch of 8 times the recording dot pitch to be finally obtained on the recording medium, and the first row is arranged on the second row.
The openings are arranged at the same pitch as the first row and on the vertical bisector of the line segment that connects the two openings on the first row, and the third row has the same pitch as the first row. Place each opening on the line that vertically divides the line segment connecting the two adjacent openings on the first row to either 1: 3 or 3: 1, and on the fourth row The line segment connecting the two adjacent openings on the first row at the same pitch as the first row is vertically divided into a distance of 3: 1 or 1: 3 which is not the same as the third row. The openings are arranged on the line, and the line segment connecting the two openings that are adjacent to each other at the same pitch as the first column in the fifth column is vertically 1: 7,3: 5,5. Arrange each opening on a line that divides only one of the ratios: 3,7: 1,
In the sixth column, the openings are arranged at the same pitch as in the first column and on the perpendicular bisector of the line segment connecting the two adjacent openings on the fifth column, and in the seventh column Place each opening on the line that divides the line segment that connects the two openings on the fifth row that have the same pitch as the first row and that is adjacent to each other vertically to either 1: 3 or 3: 1 However, the 8th row has the same pitch as the 1st row, and the line segment connecting the two adjacent openings on the 5th row is vertically aligned with the 7th row in the ratio of 3: 1 or 1: 3. An ion flow control plate characterized in that each opening is arranged on a line that divides into a distance that is not.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60084612A JPH0679173B2 (en) | 1985-04-22 | 1985-04-22 | Ion flow control plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60084612A JPH0679173B2 (en) | 1985-04-22 | 1985-04-22 | Ion flow control plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61243466A JPS61243466A (en) | 1986-10-29 |
| JPH0679173B2 true JPH0679173B2 (en) | 1994-10-05 |
Family
ID=13835516
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60084612A Expired - Lifetime JPH0679173B2 (en) | 1985-04-22 | 1985-04-22 | Ion flow control plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0679173B2 (en) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5938908B2 (en) * | 1978-10-19 | 1984-09-19 | 沖電気工業株式会社 | high speed printing machine |
| JPS5872162A (en) * | 1981-10-26 | 1983-04-30 | Sony Corp | Visible image recording and forming method |
| JPS5955764A (en) * | 1982-09-24 | 1984-03-30 | Canon Inc | image recording device |
-
1985
- 1985-04-22 JP JP60084612A patent/JPH0679173B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61243466A (en) | 1986-10-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |