JPH0680070B2 - Phosphoramidide compound and method for producing the same - Google Patents
Phosphoramidide compound and method for producing the sameInfo
- Publication number
- JPH0680070B2 JPH0680070B2 JP60211240A JP21124085A JPH0680070B2 JP H0680070 B2 JPH0680070 B2 JP H0680070B2 JP 60211240 A JP60211240 A JP 60211240A JP 21124085 A JP21124085 A JP 21124085A JP H0680070 B2 JPH0680070 B2 JP H0680070B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- amino group
- compound
- general formula
- hydroxyl group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Saccharide Compounds (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は新規なヌクレオシドホスホルアミダイド化合物
及びその製造法に関し、さらに詳しくは、リン酸部分の
水酸基及び塩基部分のアミノ基の保護基としてそれぞれ
アリル型残基及びアリルオキシカルボニル型残基を有す
る新規なヌクレオシドホスホルアミダイド化合物及びそ
の製造法に関する。TECHNICAL FIELD The present invention relates to a novel nucleoside phosphoramidide compound and a method for producing the same, more specifically, as a protecting group for a hydroxyl group of a phosphoric acid moiety and an amino group of a base moiety. The present invention relates to a novel nucleoside phosphoramidide compound having an allyl type residue and an allyloxycarbonyl type residue, respectively, and a method for producing the same.
(従来の技術) 最近の遺伝子工学の発展に伴い、その重要な素材である
DNA(デオキシリボ核酸)やRNA(リボ核酸)などのポリ
ヌクレオチドを化学的に合成する方法の研究が盛んに行
われている。(Prior art) With the recent development of genetic engineering, it is an important material.
BACKGROUND ART Research on methods for chemically synthesizing polynucleotides such as DNA (deoxyribonucleic acid) and RNA (ribonucleic acid) has been actively conducted.
従来、ポリヌクレオチドの化学合成法としてリン酸ジエ
ステル法、リン酸トリエステル法、ホスファイト法など
の手法が知られているが、いずれの方法の場合も副反応
をさけるためにリン酸部分の水酸基及びヌクレオシド塩
基のアミノ基を保護したのち縮合反応に供されている。Conventionally, methods such as the phosphoric acid diester method, the phosphoric acid triester method, and the phosphite method are known as chemical synthesis methods for polynucleotides, but in any case, in order to avoid side reactions, the hydroxyl group of the phosphate moiety is avoided. And, after protecting the amino group of the nucleoside base, it is subjected to a condensation reaction.
而して水酸基の保護基として、従来からメチル基やシア
ノエチル基が知られており、またアミノ基の保護基とし
てベンゾイル基、イソブチリル基、アニソイル基などが
知られている(例えば特開昭57−176998号、テトラヘド
ロン・レタース第24巻、第52号、第5843〜5846頁な
ど)。Thus, a methyl group or a cyanoethyl group has been conventionally known as a protective group for a hydroxyl group, and a benzoyl group, an isobutyryl group, an anisoyl group or the like is known as a protective group for an amino group (for example, JP-A-57- 176998, Tetrahedron Letters 24, 52, 5843-5846).
しかし、これらの方法では所定の反応後に脱保護するに
あたりチオフェノールを用いたり熱アンモニア水で長時
間にわたって処理しなければならないという問題があ
り、また水酸基とアミノ基を別々の操作で脱保護しなけ
ればならないために操作が煩雑化するという問題があっ
た。However, these methods have a problem that thiophenol must be used for deprotection after a predetermined reaction or treatment with hot ammonia water must be carried out for a long time, and the hydroxyl group and the amino group must be deprotected by separate operations. There is a problem that the operation becomes complicated because it has to be done.
(発明が解決しようとする問題点) そこで本発明者らはかかる従来技術の欠点を解決すべく
鋭意検討の結果、水酸基の保護基としてアリル型残基を
使用し、かつアミノ基の保護基としてアリルオキシカル
ボニル型残基を使用すると、緩和な条件下に同時にかつ
速やかに脱保護可能であり、しかもポリヌクレオチド合
成反応の過程ではきわめて安定なことを見い出し、本発
明を完成するに到った。(Problems to be Solved by the Invention) Then, as a result of intensive investigations by the present inventors to solve the above-mentioned drawbacks of the prior art, an allyl-type residue was used as a hydroxyl-protecting group, and as an amino-group protecting group It was found that the use of an allyloxycarbonyl type residue enables simultaneous and rapid deprotection under mild conditions, and is extremely stable in the process of polynucleotide synthesis reaction, leading to the completion of the present invention.
(問題点を解決するための手段) かくして本発明によれば、第一の発明として下記一般式
〔I〕で表わされるホスホルアミダイド化合物が提供さ
れ、第二の発明として下記一般式〔II〕で表わされるヌ
クレオシド類と下記一般式〔III〕で表されるリンアミ
ド化合物とを反応せることを特徴とする前記一般式
〔I〕で表されるホスホルアミダイド化合物の製造法が
提供される。(Means for Solving Problems) Thus, according to the present invention, a phosphoramidide compound represented by the following general formula [I] is provided as a first invention, and a second general formula [II ] A method for producing a phosphoramidide compound represented by the above general formula [I] is provided by reacting a nucleoside represented by the above formula with a phosphoramide compound represented by the following general formula [III]. .
(式中、R1及びR2は保護基を有する水酸基または−OR4
を表わし、R3は水素原子、保護基を有する水酸基または
−OR4を表し、R4は を表わし、Xは炭素数10以下の2級アミノ基または不飽
和結合を有することある炭素数10以下の環状アミノ基、
Aはアリル基残基を表わし、R1、R2及びR3のいずれか一
つのみが−OR4であり、BAOCはアミノ基を有さないヌク
レオシド塩基またはアミノ基もしくはイミノ基がアリル
オキシカルボニル型で保護されたヌクレオシド塩基の残
基を表わす。) (式中、R1′及びR2′は保護基を有していてもよい水酸
基を表わし、R3′は水素原子または保護基を有していて
もよい水酸基を表わし、R1′、R2′及びR3′のいずれか
一つのみが水酸基でありBAOC、X及びAは前記と同じ
であり、Yは前記Xと同じ2級アミノ基、不飽和結合を
有することある環状アミノ基またはハロゲン原子を表わ
す。) 本発明のヌクレオシドホスホルアミダイド化合物は、リ
ン酸部分の水酸基がアリル型残基で保護され、かつヌク
レオシド塩基中にアミノ基が存在する場合にはそのアミ
ノ基がアリルオキシカルボニル型残基で保護されたもの
である。ここでヌクレオシド塩基がイミノ基しか含まな
い場合には、そのイミノ基はアリルオキシカルボニル型
残基で保護されていてもいなくてもよい。 (In the formula, R 1 and R 2 are a hydroxyl group having a protective group or —OR 4
The stands, R 3 represents a hydroxyl group or -OR 4 has a hydrogen atom, a protecting group, R 4 is Represents a secondary amino group having 10 or less carbon atoms or a cyclic amino group having 10 or less carbon atoms which may have an unsaturated bond,
A represents an allyl group residue, only one of R 1 , R 2 and R 3 is —OR 4 , and B AOC is a nucleoside base having no amino group or an allyloxy group having an amino group or imino group. Represents a carbonyl-protected residue of a nucleoside base. ) (In the formula, R 1 ′ and R 2 ′ represent a hydroxyl group optionally having a protecting group, R 3 ′ represents a hydrogen atom or a hydroxyl group optionally having a protecting group, R 1 ′, R Only one of 2 ′ and R 3 ′ is a hydroxyl group, B AOC , X and A are the same as above, Y is the same secondary amino group as X above, and a cyclic amino group which may have an unsaturated bond. Or a halogen atom.) The nucleoside phosphoramidide compound of the present invention has a hydroxyl group of a phosphoric acid moiety protected by an allyl-type residue, and when an amino group is present in the nucleoside base, the amino group is an allyl group. It is protected by an oxycarbonyl type residue. When the nucleoside base contains only an imino group, the imino group may or may not be protected by an allyloxycarbonyl type residue.
前記式中、R1及びR2は保護基を有する水酸基または−OR
4であり、保護基はヌクレオシド化学において一般的に
用いられているものであればいずれでもよい。その具体
例として、例えばトリチル基、モノメトキシトリチル
基、ジメトキシトリチル基、トリメチルシリル基、トリ
エチルシリル基、トリフェニルシリル基、t−ブチルジ
メチルシリル基、テトラヒドロピラニル基、4−メトキ
シテトラヒドロフラニル基、ベンゾイル基、ベンジル
基、テトラヒドロフラニル基、メトキシメチル基、メト
キシエトキシメチル基、フェノキシメチル基、メチルチ
オメチル基、フェニルチオメチル基などが例示される。In the above formula, R 1 and R 2 are a hydroxyl group having a protective group or —OR
4 and the protecting group may be any of those commonly used in nucleoside chemistry. Specific examples thereof include, for example, trityl group, monomethoxytrityl group, dimethoxytrityl group, trimethylsilyl group, triethylsilyl group, triphenylsilyl group, t-butyldimethylsilyl group, tetrahydropyranyl group, 4-methoxytetrahydrofuranyl group, benzoyl. Examples thereof include a group, a benzyl group, a tetrahydrofuranyl group, a methoxymethyl group, a methoxyethoxymethyl group, a phenoxymethyl group, a methylthiomethyl group and a phenylthiomethyl group.
またR4は で示されるホスフィンの残基である。ここでAで表わさ
れるアリル型残基は脱保護反応を本質的に損わないもの
であればいずれでもよく、その具体例としてアリル基、
メタリル基、クロチル基、プレニル基、ゲラニル基、シ
ンナミル基、p−クロロシンナミル基などが例示され
る。これらの保護基の炭素数はとくに制限されないが、
通常、10以下のものが用いられる。R 4 is Is the residue of phosphine. The allyl type residue represented by A here may be any as long as it does not substantially impair the deprotection reaction. Specific examples thereof include an allyl group,
Examples thereof include a methallyl group, a crotyl group, a prenyl group, a geranyl group, a cinnamyl group, and a p-chlorocinnamyl group. The number of carbon atoms of these protecting groups is not particularly limited,
Usually, 10 or less is used.
またXで表される炭素数10以下の2級アミノ基の具体例
としては、ジメチルアミノ基、ジエチルアミノ基、ジイ
ソプロピルアミノ基、ジ−t−ブチルアミノ基、メチル
プロピルアミノ基、メチルヘキシルアミノ基、メチルシ
クロヘキシルアミノ基、エチルベンジルアミノ基などが
例示され、不飽和結合を有することある炭素数10以下の
環状アミノ基の具体例としては、モルホリノ基、チオモ
ルホリノ基、ピロリジノ基、ピペリジノ基、2,6−ジメ
チルピペリジノ基、ピペラジノ基、イミダゾリノ基、ピ
ロリノ基などが例示される。Specific examples of the secondary amino group having 10 or less carbon atoms represented by X include dimethylamino group, diethylamino group, diisopropylamino group, di-t-butylamino group, methylpropylamino group, methylhexylamino group, Examples include methylcyclohexylamino group, ethylbenzylamino group, and the like, and specific examples of the cyclic amino group having 10 or less carbon atoms which may have an unsaturated bond include a morpholino group, a thiomorpholino group, a pyrrolidino group, a piperidino group, and 2, Examples thereof include a 6-dimethylpiperidino group, a piperazino group, an imidazolino group and a pyrrino group.
さらにYはXと同様の2級アミノ基や不飽和結合を有す
ることある環状アミノ基の他、塩素、臭素、沃素などの
ハロゲン原子であり、なかでも2級アミノ基が好まし
い。Further, Y is a secondary amino group similar to X or a cyclic amino group which may have an unsaturated bond, or a halogen atom such as chlorine, bromine or iodine, and among them, a secondary amino group is preferable.
またR3は水素原子、保護基を有する水酸基または−OR4
であり、保護基及びR4の内容は前記と同様である。R 3 is a hydrogen atom, a hydroxyl group having a protective group or —OR 4
And the contents of the protecting group and R 4 are the same as described above.
本発明のヌクレオシドホスホルアミダイドは、ポリヌク
レオチドの合成用モノマーとして用いられるものであ
り、そのためR1,R2またはR3のいずれか一つにのみ−OR4
が導入されている。The nucleoside phosphoramidite of the present invention is used as a monomer for synthesizing a polynucleotide, and therefore only one of R 1 , R 2 and R 3 has -OR 4
Has been introduced.
さらにBAOCはアミノ基を有さないヌクレオシド塩基ま
たはアミノ基もしくはイミノ基がアリルオキシカルボニ
ル型残基で保護されたヌクレオシド塩基の残基である。
ヌクレオシド塩基を有するヌクレオシドの具体例として
は、例えばデオキシアデノシン、デオキシグアノシン、
デオキシシチジン、チミジン、アデノシン、グアノシ
ン、シチジン、ウリジン、イノシンなどが例示され、こ
れらのうちチミジン、ウリジン及びイノシンはアミノ基
を有さないものに属する。Further, B AOC is a nucleoside base having no amino group or a nucleoside base residue in which an amino group or an imino group is protected with an allyloxycarbonyl type residue.
Specific examples of nucleosides having a nucleoside base include, for example, deoxyadenosine, deoxyguanosine,
Deoxycytidine, thymidine, adenosine, guanosine, cytidine, uridine, inosine and the like are exemplified, and among these, thymidine, uridine and inosine belong to those having no amino group.
塩基部分のアミノ基の保護基として用いられるアリルオ
キシカルボニル型残基は、脱保護反応を本質的に損わな
いものであればいずれでもよく、その具体例として、ア
リルオキシカルボニル基、メタリルオキシカルボニル
基、クロチルオキシカルボニル基、プレニルオキシカル
ボニル基、シンナミルオキシカルボニル基、p−クロロ
シンナミルオキシカルボニル基、クロロアリルオキシカ
ルボニル基などが例示される。The allyloxycarbonyl type residue used as a protecting group for the amino group of the base moiety may be any as long as it does not substantially impair the deprotection reaction, and specific examples thereof include an allyloxycarbonyl group and methallyloxy group. Examples thereof include a carbonyl group, a crotyloxycarbonyl group, a prenyloxycarbonyl group, a cinnamyloxycarbonyl group, a p-chlorocinnamyloxycarbonyl group and a chloroallyloxycarbonyl group.
アリルオキシカルボニル型残基の炭素数は反応後に生ず
る副生物の分離や原料入手の容易性などを考慮して適宜
選択すればよいが、通常は炭素数12以下のものが用いら
れる。The carbon number of the allyloxycarbonyl type residue may be appropriately selected in consideration of separation of by-products generated after the reaction, availability of raw materials, and the like, but a carbon number of 12 or less is usually used.
本発明のホスホルアミダイド化合物は前記一般式〔II〕
で表わされるヌクレオシド類と前記一般式〔III〕で表
わされるリンアミド化合物を反応させることによって得
ることができる。The phosphoramidide compound of the present invention has the above general formula [II].
It can be obtained by reacting the nucleoside represented by the formula with the phosphorus amide compound represented by the general formula [III].
一般式〔II〕のR1′,R2′及びR3′のいずれか1つは水
酸基であり、それらが保護基を有する水酸基である場合
には、その保護基として前記のものと同様のものが用い
られる。In formula (II), any one of R 1 ′, R 2 ′ and R 3 ′ is a hydroxyl group, and when they are hydroxyl groups having a protecting group, the same protecting groups as those described above are used. Things are used.
また一般式〔III〕のXは前記と同様であり、さらにY
はXと同様の2級アミノ基や不飽和結合を有することあ
る環状アミノ基の他、塩素、臭素、沃素などのハロゲン
原子であり、なかでも2級アミノ基が好ましい。X in the general formula [III] is the same as above, and Y
Is a secondary amino group similar to X or a cyclic amino group which may have an unsaturated bond, as well as a halogen atom such as chlorine, bromine or iodine, and among them, a secondary amino group is preferable.
本発明で用いられるヌクレオシド類は未保護のヌクレオ
シドにクロロ炭酸アリル、ブロム炭酸アリル、アリル
(1−ベンゾトリアゾイル)カーボネートなどのアリル
化剤をトリエチルアミン、n−ブチルリチウムなどのご
とき塩基の存在下にテトラヒドロフラン、ヘキサメチル
ホスホリットトリアミドなどのごとき溶剤中で反応させ
ることによって容易に得ることができる。The nucleosides used in the present invention include unprotected nucleosides, and an allylating agent such as allyl chlorocarbonate, allyl bromcarbonate, and allyl (1-benzotriazoyl) carbonate in the presence of a base such as triethylamine and n-butyllithium. It can be easily obtained by reacting in a solvent such as tetrahydrofuran or hexamethylphosphortriamide.
またリンアミド化合物は、ヒドロキシジクロロホスフィ
ンのごときヒドロキシジハロゲノホスフィンを臭化アリ
ルに代表されるアリル化剤と反応させてアリルオキシジ
ハロゲノホスフィンとしたのち、エーテルなどのごとき
適当な溶媒中で2級アミンと反応させることによって容
易に得ることができる。The phosphorus amide compound is prepared by reacting hydroxydihalogenophosphine such as hydroxydichlorophosphine with an allylating agent typified by allyl bromide to give allyloxydihalogenophosphine, and then using a secondary amine in an appropriate solvent such as ether. It can be easily obtained by reacting with.
本発明におけるホスホルアミダイド化合物の製法は、原
料として前記一般式〔II〕及び〔III〕で表わされるヌ
クレオシド類とリンアミド化合物を使用すること以外、
常法に従って行われる。The method for producing the phosphoramidide compound in the present invention is, except that the nucleosides represented by the general formulas [II] and [III] and the phosphorus amide compound are used as raw materials,
It is performed according to the usual method.
例えば前者1モル当り後者1〜3モルを仕込み、テトラ
ヒドロフラン、アセトニトリル、ジメチルホルムアミ
ド、ジクロロメタン、ジメチルスルホキシドなどのごと
き溶剤の存在下に0〜40℃で1〜5時間反応することに
よって目的とするホスホルアミダイド化合物を効率よく
得ることができる。For example, the latter 1 to 3 mol per 1 mol of the former is charged, and the target phosphoryl is obtained by reacting at 0 to 40 ° C. for 1 to 5 hours in the presence of a solvent such as tetrahydrofuran, acetonitrile, dimethylformamide, dichloromethane and dimethylsulfoxide. An amidide compound can be efficiently obtained.
反応液中からの生成物の単離・精製は、通常の有機合成
反応の手段である吸着クロマトグラフィーやイオン交換
クロマトグラフィーあるいは有機溶媒による分配や結晶
化など公知の手段を適宜に選択し、あるいは組み合わせ
て実施することが可能である。Isolation / purification of the product from the reaction solution is carried out by appropriately selecting a known means such as adsorption chromatography or ion exchange chromatography, which is a means of ordinary organic synthesis reaction, or distribution or crystallization with an organic solvent, or It is possible to carry out in combination.
(発明の効果) かくして得られる本発明のホスホルアミダイド化合物
は、リン酸部分の水酸基とヌクレオシド塩基のアミノ基
もしくはイミノ基の双方の保護基を緩和な条件下に同時
にかつ速やかに除去することができる。例えば、かかる
ホスホルアミダイド化合物を所定の反応に供したのち、
ホスファイト部分をホスフェートに酸化し、しかるのゆ
O価のパラジウム化合物とアミンや蟻酸塩に代表される
求核試剤を用いて中性条件下に処理すると、室温で短時
間のうちに双方の保護基を除去することができる。(Effect of the Invention) The phosphoramidide compound of the present invention thus obtained is capable of simultaneously and rapidly removing both the hydroxyl group of the phosphate moiety and the protective groups of both the amino group and the imino group of the nucleoside base under mild conditions. You can For example, after subjecting such a phosphoramidide compound to a predetermined reaction,
When the phosphite moiety is oxidized to phosphate and treated with neutral O-containing palladium compounds and nucleophiles represented by amines and formates under neutral conditions, both are protected in a short time at room temperature. The group can be removed.
またアリル型残基及びアリルオキシカルボニル型残基は
糖部水酸基の脱保護反応で用いられる一般的な条件(例
えばトリクロロ酢酸による5′−水酸基の脱保護やテト
ラ−n−ブチルアンモニウムフロリドによる3′−水酸
基の脱保護など)や担体の除去に賞用されるアンモニア
処理の条件下できわめて安定に存在する。Further, the allyl type residue and the allyloxycarbonyl type residue are generally used in the deprotection reaction of the sugar group hydroxyl group (for example, deprotection of 5'-hydroxyl group with trichloroacetic acid or 3 with tetra-n-butylammonium fluoride). It exists extremely stably under the conditions of ammonia treatment, which is used for the removal of carriers such as the deprotection of'-hydroxyl group).
(実施例) 以下に実施例を挙げて本発明をさらに具体的に説明す
る。(Example) Hereinafter, the present invention will be described more specifically with reference to Examples.
参考例1 ジメチルアミン156ミリモルをエーテル80ミリリットル
に溶解したのちアリルオキシジクロロホスフィン、34.7
ミリモルを加えて室温で12時間撹拌した。反応後、生成
したジメチルアンモニウムクロライドを別し、エーテ
ル溶液を蒸留し油状のアリルオキシビス(N,N−ジメチ
ルアミノ)ホスフィンを得た。収率は76モル%であっ
た。物性値は以下のとうりである。沸点93〜94℃(48mm
Hg)1 H−NMR(C6D6)2.55(d、J=12.8Hz、12H、4NC
H3)、4.15(ddt、J=11.0,4.8,1.5Hz、2H、C=CC
H2)、5.08(ddd、J=10.1,2.0,15Hz,1H、cis CH=CHC
H2)、5.34(ddd、J=15.1,2.0,1.5Hz、1H、trans CH
=CHCH2)、5.90(ddt、J=15.1,10.1,4.8Hz、1H、CH2
=CHCH2)31 P NMR(C6D6−C6H61:4)138.36 参考例2 ジメチルアミンの代りにジイソプロピルアミンを用いる
こと以外は実施例1と同様にして反応を行い、アリルオ
キシビス(N,N−ジイソプロピルアミノ)ホスフィンを
得た。収率は55モル%であった。Reference Example 1 Allyloxydichlorophosphine, 34.7, was prepared by dissolving 156 mmol of dimethylamine in 80 ml of ether.
After adding mmol, the mixture was stirred at room temperature for 12 hours. After the reaction, the produced dimethylammonium chloride was separated, and the ether solution was distilled to obtain oily allyloxybis (N, N-dimethylamino) phosphine. The yield was 76 mol%. The physical properties are as follows. Boiling point 93-94 ℃ (48mm
Hg) 1 H-NMR (C 6 D 6 ) 2.55 (d, J = 12.8Hz, 12H, 4NC
H 3 ), 4.15 (ddt, J = 11.0,4.8,1.5Hz, 2H, C = CC
H 2 ), 5.08 (ddd, J = 10.1,2.0,15Hz, 1H, cis CH = CHC
H 2 ), 5.34 (ddd, J = 15.1, 2.0, 1.5Hz, 1H, trans CH
= CHCH 2 ), 5.90 (ddt, J = 15.1, 10.1, 4.8Hz, 1H, CH 2
= CHCH 2 ) 31 P NMR (C 6 D 6 -C 6 H 6 1: 4) 138.36 Reference Example 2 Reaction was performed in the same manner as in Example 1 except that diisopropylamine was used instead of dimethylamine, and allyloxy was performed. Bis (N, N-diisopropylamino) phosphine was obtained. The yield was 55 mol%.
沸点 130〜133℃/6mmHg1 H NMR(C6D6)1.17(dd、J=7.8,1.8Hz、24H、4NCH
(CH3)2)、3.53(d・sept、J=10.8,7.8Hz、4H、4
NCH)、4.10(ddt、J=10,5,2Hz、2H、C=CCH2)、5.
07(m、1H、cis CH=CHCH2)、5.33(m、1H、trans
CH=CHCH2)、5.93(ddt、J=18,10,5Hz、1H、CH2=CH
CH2)31 P NMR(C6D6−C6H6,1:4) 123.58ppm 実施例1 5′−o−モノメトキシトリチルチミジン1.5ミリモル
及び1−H−テトラゾール1.56ミリモルをテトラヒドロ
フラン:アセトニトリル=1:1の混合溶剤12ミリリット
ルに溶解したのち、アリルオキシビス(N,N−ジメチル
アミノ)ホスフィン2.25ミリモルを0℃で加え、次いで
25℃で1.5時間撹拌した。Boiling point 130-133 ° C / 6mmHg 1 H NMR (C 6 D 6 ) 1.17 (dd, J = 7.8,1.8Hz, 24H, 4NCH
(CH 3 ) 2 ), 3.53 (d · sept, J = 10.8,7.8Hz, 4H, 4
NCH), 4.10 (ddt, J = 10,5,2Hz, 2H, C = CCH 2 ), 5.
07 (m, 1H, cis CH = CHCH 2 ), 5.33 (m, 1H, trans
CH = CHCH 2 ), 5.93 (ddt, J = 18,10,5Hz, 1H, CH 2 = CH
CH 2 ) 31 P NMR (C 6 D 6 —C 6 H 6 , 1: 4) 123.58 ppm Example 1 5 mmol of 5′-o-monomethoxytritylthymidine and 1.56 mmol of 1-H-tetrazole were added to tetrahydrofuran: acetonitrile = After dissolving in 12 ml of a 1: 1 mixed solvent, 2.25 mmol of allyloxybis (N, N-dimethylamino) phosphine was added at 0 ° C., then
The mixture was stirred at 25 ° C for 1.5 hours.
飽和重炭酸ナトリウム水で洗浄した酢酸エチルで希釈し
たのち、飽和食塩水で洗浄し、有機層を硫酸マグネシウ
ムで乾燥したのち濃縮した。次いで残渣をトルエン:ヘ
キサン(3:1)混合溶剤に溶解し、−78℃で激しく撹拌
しながらヘキサン中に加え析出させ、白色の析出物を
過によって分離した。収率は71%であった。この析出物
を分析したところ、物性値は以下のとうりであり、第1
表に示すホスホルアミダイド(化合物1)であることが
判明した。1 H NMR(C6D6)1.55(brs、3H、C(5)CH3)、2.1−
2.6(m、8H、2NCH3、2H2′)、3.3−3.6(m、5H、2
H5′、OCH3)、4.1−4.4(m、3H、H4′、C=CCH2)、
4.95−5.4(m、3H、CH2=CCH3′)、5.6−6.0(m、1
H、C=CHC)、6.53(t-like、J=6Hz、1H、H1′)、
6.7−6.9,7.0−7.7(m、15、Aromatic H、C(5)
H)、10.5(twos、1H、N(3)H) IR(KBr)3440,3180,1720,1700,1610,1470,1260cm-1 UV(CH3CN)λmax=265.3nm(ε=1.11×104) 233.9 (ε=1.56×104) Anal Calcd for C35N40N3O7P:C、65.10;H、6.26;N、6.5
0Found:C、65.42H、6.20、N、6.45 実施例2 5′−o−モノメトキシトリチルチミジン3ミリモル及
び1−H−テトラゾール3.1ミリモルをテトラヒドロフ
ラン:アセトニトリル=1:1の混合溶剤20ミリリットル
に溶解したのち、アリルオキシビス(N,N−ジイソプロ
ピルアミノ)ホスフィン4.5ミリモルを0℃で加え、次
いで25℃で1.5時間撹拌した。その後、酢酸エチルと飽
和食塩水の等量混合物と混合したのち、分離した有機層
を飽和食塩水で洗浄し、有機層を硫酸マグネシウムで乾
燥したのち濃縮した。次いで残渣をトルエンに溶解し、
−78℃で撹拌しながらヘキサン中に加え析出させ、析出
物を過によって分離した。収率は76%であった。この
析出物の物性値は以下のとうりであり、第1表に示すホ
スホルアミダイド(化合物2)であることが判明した。1 H NMR(C6D6)1.10(dd、J=8,2Hz、12H、2NCH(C
H3)21.57,1.60(brs、3H、C(5)CH3)、2.1−2.7
(m、2H、2H2′)、3.15(m、2H、2NCH)、3.4(m、
5H、2H5′、OCH3)、4.1(m、1H、H4′)、4.38(m、
2H、C=CCH2)、5.03(m、1H、cis CH=CHCH2)、5.1
0(m、1H、H3′)、5.30(m、1H、trans CH=CHC
H2)、5.77(m、1H、C=CHCH2)、6.50(t-like、J
=6Hz、1H、H1′)、6.73−6.9,7.0−7.7(m、15H、Ar
omatic H、C(5)H)、10.4(brs、1H、N(3)
H) IR(KBr)3420,3180,1720,1690,1600,1450,1250cm-1 UV(CH3CN)λmax=264.7nm(ε=1.20×104) 233.3nm(ε=1.64×104) Anal.Calcd for C39H48N3O7P:C,66.74;H,6.91;N,5.98
Found:C,66.44;H,6.87;N,5.96 実施例3 5′−o−モノメトキシトリチル−N−アリルオキシカ
ルボニル−2′−デオキシアデノシン0.2ミリモル及び
1−H−テトラゾール0.21ミリモルをアセトニトリル2
ミリリットルに溶解したのち、アリルオキシビス(モル
ホリノ)ホスフィン0.3ミリモルを加え、25℃で1.5時間
撹拌した。The mixture was diluted with ethyl acetate washed with saturated aqueous sodium bicarbonate, washed with saturated brine, the organic layer was dried over magnesium sulfate, and concentrated. Then, the residue was dissolved in a mixed solvent of toluene: hexane (3: 1) and added to hexane with vigorous stirring at -78 ° C to cause precipitation, and a white precipitate was separated by filtration. The yield was 71%. When this precipitate was analyzed, the physical properties were as follows:
It was found to be the phosphoramidide (Compound 1) shown in the table. 1 H NMR (C 6 D 6 ) 1.55 (brs, 3H, C (5) CH 3 ), 2.1−
2.6 (m, 8H, 2NCH 3 , 2H 2 '), 3.3-3.6 (m, 5H, 2
H 5 ', OCH 3), 4.1-4.4 (m, 3H, H 4', C = CCH 2),
4.95-5.4 (m, 3H, CH 2 = CCH 3 '), 5.6-6.0 (m, 1
H, C = CHC), 6.53 (t-like, J = 6Hz, 1H, H 1 '),
6.7-6.9, 7.0-7.7 (m, 15, Aromatic H, C (5)
H), 10.5 (twos, 1H, N (3) H) IR (KBr) 3440,3180,1720,1700,1610,1470,1260cm -1 UV (CH 3 CN) λ max = 265.3nm (ε = 1.11 × 10 4 ) 233.9 (ε = 1.56 × 10 4 ) Anal Calcd for C 35 N 40 N 3 O 7 P: C, 65.10; H, 6.26; N, 6.5
0Found: C, 65.42H, 6.20, N, 6.45 Example 2 3 mmol of 5'-o-monomethoxytritylthymidine and 3.1 mmol of 1-H-tetrazole were dissolved in 20 ml of a mixed solvent of tetrahydrofuran: acetonitrile = 1: 1. Then, 4.5 mmol of allyloxybis (N, N-diisopropylamino) phosphine was added at 0 ° C, and then the mixture was stirred at 25 ° C for 1.5 hours. Then, after mixing with an equal mixture of ethyl acetate and saturated saline, the separated organic layer was washed with saturated saline, and the organic layer was dried over magnesium sulfate and then concentrated. The residue is then dissolved in toluene,
The mixture was added to hexane while stirring at -78 ° C to cause precipitation, and the precipitate was separated by filtration. The yield was 76%. The physical properties of this precipitate were as follows, and were found to be the phosphoramidite (Compound 2) shown in Table 1. 1 H NMR (C 6 D 6 ) 1.10 (dd, J = 8.2 Hz, 12 H, 2 NCH (C
H 3 ) 2 1.57, 1.60 (brs, 3H, C (5) CH 3 ), 2.1-2.7
(M, 2H, 2H 2 '), 3.15 (m, 2H, 2NCH), 3.4 (m,
5H, 2H 5 ', OCH 3 ), 4.1 (m, 1H, H 4 '), 4.38 (m,
2H, C = CCH 2 ), 5.03 (m, 1H, cis CH = CHCH 2 ), 5.1
0 (m, 1H, H 3 '), 5.30 (m, 1H, trans CH = CHC
H 2 ), 5.77 (m, 1H, C = CHCH 2 ), 6.50 (t-like, J
= 6Hz, 1H, H 1 '), 6.73-6.9, 7.0-7.7 (m, 15H, Ar
omatic H, C (5) H), 10.4 (brs, 1H, N (3)
H) IR (KBr) 3420,3180,1720,1690,1600,1450,1250cm -1 UV (CH 3 CN) λ max = 264.7nm (ε = 1.20 × 10 4 ) 233.3nm (ε = 1.64 × 10 4 ) Anal.Calcd for C 39 H 48 N 3 O 7 P: C, 66.74; H, 6.91; N, 5.98
Found: C, 66.44; H, 6.87; N, 5.96 Example 3 5'-o-monomethoxytrityl-N-allyloxycarbonyl-2'-deoxyadenosine 0.2 mmol and 1-H-tetrazole 0.21 mmol in acetonitrile 2
After dissolving in milliliter, 0.3 mmol of allyloxybis (morpholino) phosphine was added, and the mixture was stirred at 25 ° C. for 1.5 hours.
その後、反応液を酢酸エチル30ミリリットルで希釈し、
次いで0.1モルリン酸二水素カリウム−水酸化ナトリウ
ム緩衝液(pH7.0)15ミリリットルと混合した。分離し
た有機層を同様の緩衝液で洗浄後、硫酸マグネシウムで
乾燥したのち濃縮した。次いで残渣をシリカゲルカラム
クロマトグラフィー(メタノール:クロロホルム=1:5
0)で分離し、第1表に示すホスホルアミダイド(化合
物3)を83%の収率で得た。Then, dilute the reaction solution with 30 ml of ethyl acetate,
It was then mixed with 15 ml of 0.1 molar potassium dihydrogen phosphate-sodium hydroxide buffer (pH 7.0). The separated organic layer was washed with the same buffer solution, dried over magnesium sulfate, and then concentrated. Then, the residue was subjected to silica gel column chromatography (methanol: chloroform = 1: 5).
Separation in 0) gave phosphoramidide (Compound 3 ) shown in Table 1 in a yield of 83%.
物性値は以下のとうりである。1 H NMR(CDCl3)δ2.5−3.2(m、6H、2H2′、2PNC
H2)、6.25−3.85(m、9H、2H5′、2PNCCHO、OCH3)、
4.2−4.7(m、3H、allylic CH2、H4′)、4.74(d、2
H、J=6.7Hz、ACO-CH2)、5.1−5.7(m、5H、2C=C
H2、H3′)、5.85−6.2(m、2H、2CCH=C)、6.47(d
d、J=6,7Hz、1H、H1′)6.7−6.93,7.15−7.55(m、
14H、aromatic H)、8.07(s、1H、H2)、8.60(brs、
1H、NHCO)、8.64(s、1H、H8) IR(CHCl3)3425,3050,1770,1620,1610,1520,1480,1260
cm-1 UV(CH3ON)λmax=266.5,236.9,223.5nm Anal.Calcd for C41H45N6O8P:C,63.06;H,5.82;N,10.76
Found C,62.91;H,6.03;N,10.95 参考例3 (二量体の合成) 実施例1で得た化合物13.12ミリモルをテトラヒドロフ
ラン:アセトニトリル=1:2の混合溶剤15ミリリットル
に溶解したのち、3′−o−t−ブチルジメチルシリル
チミジン2.86ミリモルと1−H−テトラゾール3.42ミリ
モルを加え、20℃で2時間撹拌した。The physical properties are as follows. 1 H NMR (CDCl 3 ) δ2.5-3.2 (m, 6H, 2H 2 ′, 2PNC
H 2), 6.25-3.85 (m, 9H, 2H 5 ', 2PNCCHO, OCH 3),
4.2-4.7 (m, 3H, allic CH 2 , H 4 ′), 4.74 (d, 2
H, J = 6.7Hz, ACO- CH 2), 5.1-5.7 (m, 5H, 2C = C
H 2, H 3 '), 5.85-6.2 (m, 2H, 2CCH = C), 6.47 (d
d, J = 6,7 Hz, 1H, H 1 ′) 6.7−6.93, 7.15−7.55 (m,
14H, aromatic H), 8.07 (s, 1H, H 2 ), 8.60 (brs,
1H, NHCO), 8.64 (s , 1H, H 8) IR (CHCl 3) 3425,3050,1770,1620,1610,1520,1480,1260
cm -1 UV (CH 3 ON) λ max = 266.5,236.9,223.5nm Anal.Calcd for C 41 H 45 N 6 O 8 P: C, 63.06; H, 5.82; N, 10.76
Found C, 62.91; H, 6.03; N, 10.95 Reference Example 3 (two Synthesis of dimer) Compound 1 3.12 mmol, obtained in Example 1 tetrahydrofuran: acetonitrile = 1: After dissolving the 2 mixed solvent 15 ml of, 3'-o-t- butyldimethylsilyl thymidine 2.86 Mmol and 1-H-tetrazole (3.42 mmol) were added, and the mixture was stirred at 20 ° C for 2 hours.
次いで−78℃に冷却し、二酸化窒素4.86ミリモルのジク
ロロメタン溶液を加え、30分間酸化したのち、0.5モル
悪硫酸ナトリウム水溶液30ミリリットルを加えた。室温
に戻したのち、クロロホルムと飽和食塩水を加え、分離
した水層をクロロホルムで抽出した。乾燥後、クロマト
グラフィー(シリカゲル120g、メタノール:クロロホル
ム=1:30−1:20)により分離し、アリル−5′−o−モ
ノメトキシトリチルチミジリル−(3′→5′)−3′
−o−t−ブチルジメチルシリルチミジン(化合物4)
を86%の収率で得た。Then, the mixture was cooled to −78 ° C., a dichloromethane solution of 4.86 mmol of nitrogen dioxide was added, and after oxidizing for 30 minutes, 30 ml of a 0.5 mol aqueous sodium malsulfate solution was added. After returning to room temperature, chloroform and saturated saline were added, and the separated aqueous layer was extracted with chloroform. After drying, it was separated by chromatography (silica gel 120 g, methanol: chloroform = 1: 30-1: 20), and allyl-5′-o-monomethoxytritylthymidylyl- (3 ′ → 5 ′)-3 ′.
-Ot-Butyldimethylsilylthymidine (Compound 4 )
Was obtained in a yield of 86%.
この物質の物収値は以下のとうりである。The yield value of this substance is as follows.
Rf(SiO2、メタノール−酢酸エチル−ヘキサン=1:5
0:25)0.381 H NMR(CDCl3)0.09(s,6H,2SiCH3)、0.89(s、9H、
SiC(CH3)3)、1.41,1.90(each s、6H、25−CH3)、
2.1−2.8(m、4H、4H2′)、3.44(m、2H、2H5′)、
3.79(s、3H、OCH3)、3.95−4.7(m、7H、2H4′、
H3′、2H5′、CH2CH=)、5.1−5.5(m、3H、H3′、=
CH2)、5.65−6.08(m、1H、CH=CH2)、6.1−6.4
(m、2H、2H1′)、6.8,7.15−7.5(m、14H、Ar−
H)、7.67(brs、2H、6−H)、9.48(brs、2H、2N
H) IR(CHCl3)3350,2900,1700,1680,1595,1250cm-1 UV(CH3OH)λmax=266nm Anal.Calcd for C49H61N4O13PSi;C,60.47;H,6.33;N,5.7
5 Found;C,60.65;H,6.08;N,5.7131 P NMR(CDCl3:C6H6、1:1) 10.30,9.42 参考例4 (二量体の脱保護) 化合物4 0.084ミリモル及びトリフェニルホスフィン
0.0252ミリモルをアルゴン雰囲気下でテトラヒドロフラ
ン1ミリリットルに溶解したのちテトラキス(トリフェ
ニルホスフィン)パラジウム(O)0.0042ミリモルを加
え室温で5分間撹拌した。次いで、n−ブチルアミン36
マイクロリットルを加え、20分撹拌後、溶剤を留去した
のち、残渣をクロマトグラフィー(ODS、水:メタノー
ル=1:4)で分離し、アリル基が除去された対応のジヌ
クレオシドホスフェート(化合物5)を80モル%の収率
で得た。R f (SiO 2 , methanol-ethyl acetate-hexane = 1: 5
0:25) 0.38 1 H NMR (CDCl 3 ) 0.09 (s, 6H, 2SiCH 3 ), 0.89 (s, 9H,
SiC (CH 3) 3), 1.41,1.90 (each s, 6H, 25-CH 3),
2.1-2.8 (m, 4H, 4H 2 '), 3.44 (m, 2H, 2H 5 '),
3.79 (s, 3H, OCH 3 ), 3.95-4.7 (m, 7H, 2H 4 ',
H 3 ', 2H 5', CH 2 CH =), 5.1-5.5 (m, 3H, H 3 ', =
CH 2), 5.65-6.08 (m, 1H, CH = CH 2), 6.1-6.4
(M, 2H, 2H 1 '), 6.8, 7.15-7.5 (m, 14H, Ar-
H), 7.67 (brs, 2H, 6-H), 9.48 (brs, 2H, 2N)
H) IR (CHCl 3 ) 3350,2900,1700,1680,1595,1250cm -1 UV (CH 3 OH) λ max = 266nm Anal.Calcd for C 49 H 61 N 4 O 13 PSi; C, 60.47; H, 6.33; N, 5.7
5 Found; C, 60.65; H, 6.08; N, 5.71 31 P NMR (CDCl 3 : C 6 H 6 , 1: 1) 10.30,9.42 Reference Example 4 (Deprotection of dimer) Compound 4 0.084 mmol and tri Phenylphosphine
0.0252 mmol was dissolved in 1 ml of tetrahydrofuran under an argon atmosphere, 0.0042 mmol of tetrakis (triphenylphosphine) palladium (O) was added, and the mixture was stirred at room temperature for 5 minutes. Then, n-butylamine 36
After adding microliters and stirring for 20 minutes, the solvent was distilled off and the residue was separated by chromatography (ODS, water: methanol = 1: 4) to give the corresponding dinucleoside phosphate (compound 5 ) Was obtained in a yield of 80 mol%.
参考例5 (二量体の合成) 参考例3で用いた化合物1に代えて化合物3を用いるこ
と以外は参考例1に準じて実験を行い、アリル−5′−
o−モノメトキシトリチルデオキシアデノシリル−
(3′→5′)−3′−o−t−ブチルジメチルシリル
チミジン(化合物6)を得た。収率は85%であった。 Reference Example 5 (Synthesis of Dimer) Allyl-5'- was tested according to Reference Example 1 except that Compound 3 was used instead of Compound 1 used in Reference Example 3.
o-monomethoxytrityldeoxyadenosilyl-
(3 ′ → 5 ′)-3′-o-t-butyldimethylsilylthymidine (Compound 6 ) was obtained. The yield was 85%.
この物質の物性値は以下のとうりである。The physical properties of this substance are as follows.
元素分析値 計算値 C,59.70;H,6.06;N,9.20 実測値 C,59.85;H,6.01;N,9.14 参考例6 (二量体の脱保護) 化合物6 0.103ミリモルをテトラヒドロフラン2ミリ
リットルに溶解したのち、n−ブチルアミン0.406ミリ
モル及び蟻酸0.434ミリモルを順次滴下した。次いでテ
トラキス(トリフェニルホスフィン)パラジウム(O)
0.0104ミリモルをテトラヒドロフラン1.5ミリリットル
に溶解して加え、室温で20分間撹幤した。 Elemental analysis value Calculated value C, 59.70; H, 6.06; N, 9.20 Actual value C, 59.85; H, 6.01; N, 9.14 Reference example 6 (Deprotection of dimer) 0.103 mmol of compound 6 was dissolved in 2 ml of tetrahydrofuran. After that, 0.406 mmol of n-butylamine and 0.434 mmol of formic acid were sequentially added dropwise. Then tetrakis (triphenylphosphine) palladium (O)
0.0104 mmol was dissolved in 1.5 ml of tetrahydrofuran and added, and the mixture was stirred at room temperature for 20 minutes.
反応後、溶媒を留去し、酢酸エチルと水を加えて有機層
と水層に分離し、有機層を飽和食塩水で洗浄した。次い
で有機層を硫酸マグネシウムで乾燥したのち、濃縮し、
残渣をクロマトグラフィーで分離し、化合物6のリン部
分のアリル基及びヌクレオシド塩基部分のアリルオキシ
カルボニル基が除去されたジヌクレオシドホスフェート
(化合物7)を90モル%の収率で得た。After the reaction, the solvent was distilled off, ethyl acetate and water were added to separate the organic layer and the aqueous layer, and the organic layer was washed with saturated saline. Then, the organic layer is dried over magnesium sulfate and then concentrated,
The residue was separated by chromatography to obtain a dinucleoside phosphate (compound 7 ) from which the allyl group of the phosphorus part of compound 6 and the allyloxycarbonyl group of the nucleoside base part were removed in a yield of 90 mol%.
Claims (2)
ダイド化合物。 (式中、R1及びR2は保護基を有する水酸基または−OR4
を表わし、R3は水素原子、保護基を有する水酸基または
−OR4を表わし、R4は を表わし、Xは炭素数10以下の2級アミノ基または不飽
和結合を有することある炭素数10以下の環状アミノ基、
Aはアリル型残基を表わし、R1、R2及びR3のいずれか一
つのみが−OR4であり、BAOCはアミノ基を有さないヌク
レオシド塩基またはアミノ基もしくはイミノ基がアリル
オキシカルボニル型で保護されたヌクレオシド残基を表
わす。)1. A phosphoramidide compound represented by the following general formula [I]. (In the formula, R 1 and R 2 are a hydroxyl group having a protective group or —OR 4
The stands, R 3 represents a hydroxyl group or -OR 4 has a hydrogen atom, a protecting group, R 4 is Represents a secondary amino group having 10 or less carbon atoms or a cyclic amino group having 10 or less carbon atoms which may have an unsaturated bond,
A represents an allyl-type residue, only one of R 1 , R 2 and R 3 is —OR 4 , and B AOC is a nucleoside base having no amino group or an allyloxy group having an amino group or imino group. Represents a carbonyl-protected nucleoside residue. )
類と下記一般式〔III〕で表わされるリンアミド化合物
とを反応させることを特徴とする前記一般式〔I〕で表
わされるホスホルアミダイド化合物の製造法。 (式中、R1′及びR2′は保護基を有していてもよい水酸
基を表わし、R3′は水素原子または保護基を有していて
もよい水酸基を表わし、R1′、R2′及びR3′のいずれか
一つのみが水酸基でありBAOC、X及びAは前記と同じ
であり、Yは前記Xと同じ2級アミノ基、不飽和結合を
有することある環状アミノ基またはハロゲン原子を表わ
す。)2. A phosphoramid represented by the above general formula [I], which comprises reacting a nucleoside represented by the following general formula [II] with a phosphorus amide compound represented by the following general formula [III]. Method for producing daid compound. (In the formula, R 1 ′ and R 2 ′ represent a hydroxyl group optionally having a protecting group, R 3 ′ represents a hydrogen atom or a hydroxyl group optionally having a protecting group, R 1 ′, R Only one of 2 ′ and R 3 ′ is a hydroxyl group, B AOC , X and A are the same as above, Y is the same secondary amino group as X above, and a cyclic amino group which may have an unsaturated bond. Or represents a halogen atom.)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60211240A JPH0680070B2 (en) | 1985-09-25 | 1985-09-25 | Phosphoramidide compound and method for producing the same |
| EP86113090A EP0216357A3 (en) | 1985-09-25 | 1986-09-23 | Phosphoramidite compounds and process for production thereof |
| US07/229,773 US5026838A (en) | 1985-09-25 | 1988-08-04 | Phosphoramidite compounds and process for production thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60211240A JPH0680070B2 (en) | 1985-09-25 | 1985-09-25 | Phosphoramidide compound and method for producing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6270389A JPS6270389A (en) | 1987-03-31 |
| JPH0680070B2 true JPH0680070B2 (en) | 1994-10-12 |
Family
ID=16602605
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60211240A Expired - Lifetime JPH0680070B2 (en) | 1985-09-25 | 1985-09-25 | Phosphoramidide compound and method for producing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0680070B2 (en) |
-
1985
- 1985-09-25 JP JP60211240A patent/JPH0680070B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6270389A (en) | 1987-03-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5026838A (en) | Phosphoramidite compounds and process for production thereof | |
| US5359052A (en) | Chalcophospholanes useful in the synthesis of oligonucleoside phosphorothioates, phosphorodithioates and related selenates | |
| EP0090789A1 (en) | Chemical DNA synthesis | |
| WO1998039352A1 (en) | Novel bicyclonucleoside and oligonucleotide analogues | |
| Cruickshank et al. | Oligonucleotide labelling: a concise synthesis of a modified thymidine phosphoramidite | |
| Wada et al. | A new boranophosphorylation reaction for the synthesis of deoxyribonucleoside boranophosphates | |
| CN114555617B (en) | Phosphoramidite Activator | |
| Sheppard et al. | Preparation of 2'-O-(. beta.-Cyanoethyl phosphoramidites) of 3'-Deoxycytidine and 3'-Deoxyguanosine and Their Use for Solid-Phase Synthesis of Oligodeoxynucleotides Containing 2', 5'-Phosphodiester Linkages | |
| JP2006248949A (en) | Nucleoside derivatives, nucleotide derivatives and methods for producing them | |
| CN100484949C (en) | Nucleoside phosphoramidites used in the synthesis of RNA oligonucleotides and their synthesis methods | |
| JPH0680070B2 (en) | Phosphoramidide compound and method for producing the same | |
| JP7075681B2 (en) | An optically active segment for synthesizing a three-dimensional controlled oligonucleotide and a method for producing the same, and a method for synthesizing a three-dimensional controlled oligonucleotide using the same. | |
| CN114599664B (en) | Glycoside compound, amide compound and method for producing polynucleotide using the same | |
| JPH06135988A (en) | Nucleotide derivative | |
| JPS6270391A (en) | Method for producing protected oligonucleotides | |
| JPH0680071B2 (en) | Phosphoramidite compound and method for producing the same | |
| JP3985103B2 (en) | Novel complex and method for synthesizing oligonucleotide | |
| JP7776154B2 (en) | Chimeric nucleic acid oligomer containing phosphorothioate and boranophosphate, and method for producing the same | |
| JP4882074B2 (en) | Oligonucleotide derivative, gene detection probe and DNA chip | |
| JP2008195648A (en) | 4'-selenonucleosides and 4'-selenonucleotides | |
| AU2022400194A1 (en) | Method for producing polynucleotides | |
| JPH0368594A (en) | Production of polynucleotide | |
| JP4170665B2 (en) | Nucleic acid introduced with a nucleobase analog having a phenyl group | |
| WO2023180237A1 (en) | Method and compound | |
| EP0787740A2 (en) | Coupling unit of (6-4)photoproduct, process for preparing the same, process for preparing oligonucleotide containing (6-4) photoproduct by using the same and process for preparing DNA containing (6-4) photoproduct by using the same |