JPH0683772B2 - Pressure swing adsorption method - Google Patents
Pressure swing adsorption methodInfo
- Publication number
- JPH0683772B2 JPH0683772B2 JP61253475A JP25347586A JPH0683772B2 JP H0683772 B2 JPH0683772 B2 JP H0683772B2 JP 61253475 A JP61253475 A JP 61253475A JP 25347586 A JP25347586 A JP 25347586A JP H0683772 B2 JPH0683772 B2 JP H0683772B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- psa
- raw material
- pressure swing
- swing adsorption
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Separation Of Gases By Adsorption (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Description
【発明の詳細な説明】 ［産業上の利用分野］ 本発明は圧力スイング吸着装置（PSA装置）を使用して
空気からO2ガス及びN2ガスを精製する方法に関し、詳細
には一方のPSA装置の排ガスを他のPSA装置の原料ガスと
して有効に利用することにより、N2ガス及びO2ガスを高
効率に回収できる様に構成した圧力スイング吸着方法に
関するものである。TECHNICAL FIELD The present invention relates to a method for purifying O 2 gas and N 2 gas from air using a pressure swing adsorption device (PSA device), and in particular to one PSA. The present invention relates to a pressure swing adsorption method configured to recover N 2 gas and O 2 gas with high efficiency by effectively utilizing the exhaust gas of the apparatus as a raw material gas of another PSA apparatus.
［従来の技術］ 第５図は原料空気よりN2ガスを精製する３搭式PSA装置
の例を示す概略説明図である。原料ガス供給管８から供
給される原料空気は前処理搭2a,2bのいずれか一方を通
過してH2O及びCO2が吸着除去された後、レシーバタンク
６を経由して吸着搭3a,3b,3cのいずれかへ送給される。
そして該吸着搭3a〜3c内の吸着剤に対して非吸着性のO2
を主体とする通過ガスは排気管9aから前処理搭2a,2bの
いずれかへ返送されH2O及びCO2を脱着して前処理搭2a,2
bを再生した後、放出管９から系外へ廃棄される。他方
吸着剤に吸着されたN2成分はその後真空ポンプ４の減圧
吸引によって脱着され製品タンク５内へ回収される。[Prior Art] FIG. 5 is a schematic explanatory view showing an example of a three-stage PSA device for purifying N 2 gas from raw material air. The raw material air supplied from the raw material gas supply pipe 8 passes through either one of the pretreatment towers 2a and 2b to adsorb and remove H 2 O and CO 2, and then passes through the receiver tank 6 to the adsorption tower 3a, It is sent to either 3b or 3c.
Then, O 2 which is non-adsorptive to the adsorbent in the adsorption columns 3a to 3c
The gas mainly passing through the exhaust pipe 9a is returned to one of the pretreatment towers 2a and 2b, and H 2 O and CO 2 are desorbed to the pretreatment towers 2a and 2b.
After regenerating b, it is discarded from the discharge pipe 9 to the outside of the system. On the other hand, the N 2 component adsorbed by the adsorbent is then desorbed by the vacuum suction of the vacuum pump 4 and collected in the product tank 5.
第６図は原料空気よりO2ガスを精製する３搭式PSA装置
の側を示す概略説明図である。ブロワー12によって吸引
された原料空気はエアフィルター11を介して原料ガス供
給管17から吸着搭13a,13b,13cのいずれに導入される。
そして該吸着搭内の吸着剤に対して非吸着性を示すO2ガ
スはこれら吸着搭をそのまま通過し、その大部分が製品
タンク16内へ回収される。他方吸着剤に対して易吸着性
を示すN2，H2O，CO2成分はその後真空ポンプ14によって
減圧脱着されミストセパレータ15を経て系外へ放出され
る。FIG. 6 is a schematic explanatory view showing the side of a three-stage PSA device for purifying O 2 gas from raw material air. The raw material air sucked by the blower 12 is introduced into the adsorption towers 13a, 13b, 13c from the raw material gas supply pipe 17 through the air filter 11.
Then, the O 2 gas that is non-adsorptive to the adsorbent in the adsorption tower passes through these adsorption towers as it is, and most of it is collected in the product tank 16. On the other hand, N 2 , H 2 O, and CO 2 components that easily adsorb to the adsorbent are desorbed under reduced pressure by the vacuum pump 14 and then released to the outside of the system through the mist separator 15.
［発明が解決しようとする問題点］ 第5,6図に例示したN2精製用PSA装置及びO2精製用PSA装
置に供給される原料ガスとしては一般に空気が利用さ
れ、原料ガス中のN2，O2ガス濃度は常にほぼ一定であ
る。その為上記PSA装置において回収される製品ガスの
純度及び回収量もほぼ一定であり、PSA装置に多少の改
良を加えても純度及び回収量を向上させるには自ずから
限界があった。また従来のPSA装置では回収目的としな
い不用な排ガスはそのまま大気中へ放出してしまうのが
一般的であり、N2精製用PSA装置はO2濃度の高い排ガス
が、他方O2精製用PSA装置ではN2濃度の高い排ガスが夫
々そのまま放出されている。しかしこのことは良く考え
てみると極めて無駄なことである。[Problems to be Solved by the Invention] Air is generally used as the raw material gas supplied to the N 2 purification PSA apparatus and the O 2 purification PSA apparatus illustrated in FIGS. 2 and O 2 gas concentrations are almost always constant. Therefore, the purity and recovery amount of the product gas recovered in the PSA device are almost constant, and there is a limit to improve the purity and recovery amount even if the PSA device is slightly improved. Moreover, in conventional PSA equipment, it is common to release waste gas that is not intended for recovery into the atmosphere as it is, and in PSA equipment for N 2 purification, exhaust gas with a high O 2 concentration is used, while PSA for O 2 purification is used. Exhaust gas with high N 2 concentration is directly emitted from the device. However, this is extremely useless if you think about it carefully.
そこで本発明者らは上記PSA装置から放出される排ガス
を有効利用すれば、O2ガス及びN2ガスの回収操業が大幅
に改善され、これらをより安価に入手できるのではない
かと考えて種々検討した結果、本発明の圧力スイング吸
着方法を完成させるに至った。Therefore, the present inventors have considered that if the exhaust gas discharged from the PSA device is effectively used, the recovery operation of O 2 gas and N 2 gas is significantly improved, and these may be obtained at a lower cost. As a result of the investigation, the pressure swing adsorption method of the present invention has been completed.
［問題点を解決するための手段］ 上記目的を達成し得た本発明方法は、次の点に要旨を有
するものである。[Means for Solving Problems] The method of the present invention which has achieved the above object has the following points.
即ちO2ガスが精製用PSA装置（以下O2PSA装置という）と
N2ガス精製用PSA装置（以下N2PSA装置という）とを並列
し、（イ）O2PSA装置から排出されるN2ガス濃度の高い
排出ガスの一部又は全部をN2PSA装置の原料ガスとして
使用する方法、或はこれとは逆に（ロ）N2PSA装置から
排出されるO2濃度の高い排出ガスの一部又は全部をO2PS
A装置の原料ガスとして使用する方法を採用する。That is, O 2 gas is used as a purification PSA device (hereinafter referred to as O 2 PSA device).
A PSA device for N 2 gas purification (hereinafter referred to as N 2 PSA device) is arranged in parallel, and (a) part or all of the exhaust gas with high N 2 gas concentration discharged from the O 2 PSA device is stored in the N 2 PSA device. how to use as a raw material gas, or which inversely to the (b) N 2 PSA some or all of the O 2 concentration of high exhaust gas discharged from the apparatus O 2 PS
The method used as the raw material gas for the A unit is adopted.
［作用］ 本発明方法では、O2PSA装置の排ガスをN2PSA装置の原料
スとして用いる方法又はN2PSA装置の排ガスをO2PSA装置
の原料ガスとして用いる方法を採用するので、夫々のPS
A装置に供給する原料ガス中の回収目的成分濃度を予め
高めておくことができる。これによって原料回収比率
［（回収製品ガス量／原料ガス量）×100］を相対的に
高めることが可能となり、従来方法に比較して単位時間
当たりの製品ガス回収量を向上させることができる。In the act present invention method, to adopt a method of using the exhaust gas of a method or N 2 PSA apparatus using the exhaust gas of O 2 PSA unit as a raw material scan of N 2 PSA device as the source gas of O 2 PSA unit, each of the PS
The concentration of the target component to be recovered in the raw material gas supplied to the device A can be increased in advance. As a result, the raw material recovery ratio [(recovered product gas amount / raw material gas amount) × 100] can be relatively increased, and the product gas recovery amount per unit time can be improved as compared with the conventional method.
［実施例］ 第１図は本発明方法を実施する為に設計されたPSA装置
の代表例を示す概略説明図であり、N2PSA装置の後段側
にO2PSA装置Ｏを配設したものを示す。即ちN2PSA装置Ｎ
の排ガス放出管９は三方弁22及びバッファータンク21を
介してO2PAS装置Ｏの原料ガス供給管17に連結され、該
バッファータンク21にはO2PAS装置Ｏ用の原料空気導入
管17aが接続される。従ってN2PSA装置Ｎの吸着搭3a〜3c
を通過してきたO2リッチの排ガスは排気管9a及び前処理
搭2a,2bを介して放出管９からバッファータンク21へ送
給される。調圧のために設けられた該バッファータンク
21に導入されたO2リッチ排ガスはエアフィルター11を介
して導入される原料空気と混合され、ブロワー12によっ
てO2PAS装置Ｏへ供給される。[Embodiment] FIG. 1 is a schematic explanatory view showing a typical example of a PSA apparatus designed to carry out the method of the present invention, in which an O 2 PSA apparatus O is arranged at the subsequent stage of the N 2 PSA apparatus. Indicates. That is, N 2 PSA device N
The exhaust gas discharge pipe 9 is connected to the raw material gas supply pipe 17 of the O 2 PAS device O via the three-way valve 22 and the buffer tank 21, and the raw material air introduction pipe 17a for the O 2 PAS device O is connected to the buffer tank 21. Connected. Therefore, the adsorption towers 3a to 3c of the N 2 PSA device N
The O 2 rich exhaust gas that has passed through is discharged from the discharge pipe 9 to the buffer tank 21 via the exhaust pipe 9a and the pretreatment towers 2a and 2b. The buffer tank provided for pressure regulation
The O 2 rich exhaust gas introduced into 21 is mixed with the raw material air introduced through the air filter 11, and is supplied to the O 2 PAS apparatus O by the blower 12.
従って前段のN2PSA装置Ｎにおける原料ガスには通常の
空気が使用されることになるが、後段のO2PSA装置Ｏで
は、O2リッチな排ガスの導入によってO2ガス濃度の高め
られた富酸空気が原料ガスとして供給され、該O2PSA装
置Ｏにおける製品O2ガスの純度及び回収量が向上する。Therefore, normal air is used as the source gas in the N 2 PSA unit N in the former stage, but in the O 2 PSA unit O in the latter stage, the O 2 gas concentration was increased by the introduction of the O 2 rich exhaust gas. The acid-enriched air is supplied as the raw material gas, and the purity and recovery amount of the product O 2 gas in the O 2 PSA apparatus O are improved.
第２図は第１図の例とは逆に前段にO2PSA装置Ｏ、後段
にN2PSA装置Ｎを配設した例を示す概略説明図であり、O
2PSA装置Ｏの排ガス放出管18はN2PSA装置Ｎの原料ガス
供給管８に三方弁32及びバッファータンク31を介して連
結される。従ってN2PSA装置に供給される原料ガスは富
窒素となり、該N2PSA装置Ｎにおいて精製されるN2ガス
は高純度且つ高回収量となる。2 is a schematic explanatory view showing an example in which an O 2 PSA device O is arranged in the front stage and an N 2 PSA device N is arranged in the rear stage, contrary to the example of FIG.
The exhaust gas discharge pipe 18 of the 2 PSA device O is connected to the raw material gas supply pipe 8 of the N 2 PSA device N via a three-way valve 32 and a buffer tank 31. Therefore, the raw material gas supplied to the N 2 PSA apparatus becomes nitrogen-rich, and the N 2 gas purified in the N 2 PSA apparatus N has a high purity and a high recovery amount.
第3,4図はN2PSA装置Ｎ及びO2PSA装置Ｏの排ガス放出管
及び原料ガス供給管を相互に接続し、原料空気の導入箇
所を１箇所に限定した実施例を示す概略説明図である。FIGS. 3 and 4 are schematic explanatory views showing an embodiment in which the exhaust gas discharge pipe and the raw material gas supply pipe of the N 2 PSA device N and the O 2 PSA device O are connected to each other, and the introduction position of the raw air is limited to one place. Is.
第3,4図ともO2PSA装置Ｏの排ガス放出管18はN2PSA装置
Ｎの原料ガス供給管８に三方弁及びバッファータンク21
を介して連結され、またN2PSA装置Ｎの放出管９はO2PSA
装置Ｏの原料ガス供給管17に三方弁及びバッファータン
クを介して接続される。In both FIGS. 3 and 4, the exhaust gas discharge pipe 18 of the O 2 PSA unit O is connected to the source gas supply pipe 8 of the N 2 PSA unit N by a three-way valve and a buffer tank 21.
And the discharge pipe 9 of the N 2 PSA device N is connected to the O 2 PSA.
It is connected to the raw material gas supply pipe 17 of the device O via a three-way valve and a buffer tank.
第３図に示す実施例ではO2PSA装置Ｏの原料ガス供給側
のバッファータンク21に原料空気導入管17aを設けてい
るのに対し、第４図に示す実施例ではN2PSA装置Ｎの原
料ガス供給側のバッファータンク31に原料空気導入管34
を配設する点で相違するが原理的には同一であるので一
括して説明する。Whereas there is provided a feed air inlet pipe 17a into the raw material gas supply side of the buffer tank 21 of the O 2 PSA device O in the embodiment shown in Figure 3, in the embodiment shown in FIG. 4 of the N 2 PSA unit N Into the buffer tank 31 on the source gas supply side, the source air introduction pipe 34
However, they are the same in principle, so they will be described collectively.
これらの実施例においては後段PSA装置の原料ガスはそ
の全量又は一部が前段PSA装置の排ガスによってまかな
われることになるので、後段PSA装置及び前段PSA装置の
処理能力は排ガス量に見合った適正な均衡を考慮して設
計されることになる。尚第3,4図に示す破線23aは前処置
搭2a,2bを通過しないバイパス管を示し、N2PSA装置Ｎの
排ガス管9aと三方弁22,35を直結させ、不要成分であるC
O2やH2OがPSA装置内を循環しない様にこれらを廃棄管23
bから放出するものである。また第3,4図の他の実施態様
として後段のPAS装置の排ガスをPSA装置外へ放出してい
るものであっても構わない。In these examples, the raw material gas of the rear PSA device will be entirely or partially covered by the exhaust gas of the front PSA device, so that the treatment capacity of the rear PSA device and the front PSA device is appropriate for the exhaust gas amount. It will be designed in consideration of equilibrium. The broken line 23a shown in FIGS. 3 and 4 indicates a bypass pipe that does not pass through the pretreatment towers 2a and 2b. The exhaust gas pipe 9a of the N 2 PSA device N and the three-way valves 22 and 35 are directly connected to each other and are unnecessary components C
Dispose of O 2 and H 2 O so that they do not circulate in the PSA equipment.
It is emitted from b. Further, as another embodiment of FIGS. 3 and 4, the exhaust gas of the PAS device at the latter stage may be discharged to the outside of the PSA device.
（実施例） 第６図に示すO2PSA装置Ｏに原料ガスとして通常の空気
を2500Nm3/hで供給したとき、回収O2ガスの純度は93
％、回収率は42％であった。これを第１の試験装置とす
る。さらに第５図で示すN2PSA装置Ｎに原料ガスとして
通常の空気を150Nm3/hで供給したとき、回収N2ガス純度
は99.999％、回収率は42％であった。これを第２の試験
装置とする。尚上記第1,2の試験装置のガス回収量は、
夫々次の通りである。(Example) When normal air was supplied at 2500 Nm 3 / h as a source gas to the O 2 PSA apparatus O shown in FIG. 6, the purity of the recovered O 2 gas was 93.
%, The recovery rate was 42%. This is the first test device. Further, when ordinary air as a raw material gas was supplied at 150 Nm 3 / h to the N 2 PSA apparatus N shown in FIG. 5, the recovered N 2 gas purity was 99.999% and the recovery rate was 42%. This is the second test device. In addition, the gas recovery amount of the first and second test equipment is
Each is as follows.
O2PSA装置ＯのO2ガス回収量： 2500×0.21×0.42≒220（Nm3/h） N2PSA装置ＮのN2ガス回収量： 150×0.79×0.42≒50（Nm3/h） 上期したガス回収条件を備えた第1,2試験装置を第３図
に示す様に接続し、該装置を運転したところ、O2PSA装
置Ｏのブロワー12入側に供給される原料ガス中のO2濃度
は24％（原料空気では21％）に向上させることができ、
純度93％のO2ガスを2500×0.24×0.42＝250（Nm3/h）で
回収できた。O 2 PSA unit O 2 gas recovery amount of O: 2500 × 0.21 × 0.42 ≒ 220 (Nm 3 / h) N N 2 gas recovery amount of 2 PSA unit N: 150 × 0.79 × 0.42 ≒ 50 (Nm 3 / h) When the 1st and 2nd test equipment equipped with the gas recovery conditions for the first half were connected as shown in Fig. 3 and the equipment was operated, the O 2 PSA equipment O in the source gas supplied to the inlet side of the blower 12 O 2 concentration can be increased to 24% (21% for raw air),
O 2 gas with a purity of 93% could be collected at 2500 × 0.24 × 0.42 = 250 (Nm 3 / h).
またN2PSA装置Ｎの圧縮機１入側に供給される原料ガス
中のN2ガス濃度は87％（原料空気では79％）にまで向上
されることが可能となり、純度99.999％の製品N2ガス回
収量を150×0.87×0.42＝55（Nm3/h）に向上することが
できた。これらの結果、製品O2ガス及びN2ガスとも回収
量は従来の単独PSA装置に比べて約10〜15％増加させる
ことができることが分かった。In addition, the N 2 gas concentration in the raw material gas supplied to the inlet side of the compressor 1 of the N 2 PSA device N can be increased to 87% (79% in the raw material air), and the product N with a purity of 99.999% can be obtained. It was possible to improve the 2 gas recovery rate to 150 x 0.87 x 0.42 = 55 (Nm 3 / h). As a result, it was found that the recovery amount of both product O 2 gas and N 2 gas can be increased by about 10 to 15% as compared with the conventional single PSA device.
［発明の効果］ 本発明方法によって従来N2又はO2PSA装置から放出され
ていた排ガスを有効に分離・回収できる様になり、さら
に回収される目的成分は高純度化がはかれ、しかも単位
時間当たりの回収量も高くなり効率的な精製が達成され
る。[Effects of the Invention] By the method of the present invention, it becomes possible to effectively separate and recover the exhaust gas that has been conventionally discharged from the N 2 or O 2 PSA apparatus, and the recovered target component is highly purified and has a unit The recovery amount per time is also high, and efficient purification is achieved.
第１〜４図は本発明方法に適用されるPSA装置の実施例
を示す概略説明図、第５図は単独のN2PSA装置を示す概
略説明図、第６図は単独のO2PSA装置を示す概略説明図
である。 １……圧縮機、2a,2b……前処理搭 3a,3b,3c……吸着搭、４……真空ポンプ ５……N2ガス製品タンク ６……レシーバータンク ８……原料ガス供給管、９……放出管 11……エアフィルター、12……ブロワー 13a,13b,13c……吸着搭 14……真空ポンプ、15……ミストセパレータ 16……O2ガス製品タンク 17……原料ガス供給管、18……放出管 21,26,31,36……バッファータンク 22,25,32,35……三方弁 34……原料空気導入管1 to 4 are schematic explanatory diagrams showing an embodiment of a PSA device applied to the method of the present invention, FIG. 5 is a schematic explanatory diagram showing a single N 2 PSA device, and FIG. 6 is a single O 2 PSA device. It is a schematic explanatory drawing which shows. 1 ...... compressor, 2a, 2b ...... pretreatment tower 3a, 3b, 3c ...... adsorption tower, 4 ...... vacuum pump 5 ...... N 2 gas product tank 6 ...... receiver tank 8 ...... source gas supply pipe, 9 …… Release pipe 11 …… Air filter, 12 …… Blower 13a, 13b, 13c …… Adsorption tower 14 …… Vacuum pump, 15 …… Mist separator 16 …… O 2 gas product tank 17 …… Raw material gas supply pipe , 18 …… Release pipe 21,26,31,36 …… Buffer tank 22,25,32,35 …… Three-way valve 34 …… Material air inlet pipe
Claims (2)
るN2ガス純度の高い排ガスの一部又は全部をO2ガス精製
用圧力スイング吸着装置の原料ガスとして使用すること
を特徴とする圧力スイング吸着方法。1. A pressure, characterized by using O 2 part of high N 2 gas purity exhaust in gas purification-pressure swing adsorption unit or a whole as a raw material gas of O 2 gas purification pressure swing adsorption apparatus Swing Adsorption method.
るO2ガス純度の高い排ガスの一部又は全部をO2ガス精製
用圧力スイング吸着装置の原料ガスとして使用すること
を特徴とする圧力スイング吸着方法。2. A pressure swing characterized by using a part or all of the exhaust gas having a high O 2 gas purity in a pressure swing adsorption device for N 2 gas purification, as a raw material gas for the pressure swing adsorption device for O 2 gas purification. Adsorption method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61253475A JPH0683772B2 (en) | 1986-10-23 | 1986-10-23 | Pressure swing adsorption method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61253475A JPH0683772B2 (en) | 1986-10-23 | 1986-10-23 | Pressure swing adsorption method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63107719A JPS63107719A (en) | 1988-05-12 |
| JPH0683772B2 true JPH0683772B2 (en) | 1994-10-26 |
Family
ID=17251898
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61253475A Expired - Lifetime JPH0683772B2 (en) | 1986-10-23 | 1986-10-23 | Pressure swing adsorption method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0683772B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021060289A1 (en) * | 2019-09-24 | 2021-04-01 | 積水化学工業株式会社 | Method for producing purified gas, method for producing valuable material, gas purification device, and device for producing valuable material |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3288070B2 (en) * | 1992-05-20 | 2002-06-04 | 有限会社マエダ | Filter device for compressed air |
-
1986
- 1986-10-23 JP JP61253475A patent/JPH0683772B2/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021060289A1 (en) * | 2019-09-24 | 2021-04-01 | 積水化学工業株式会社 | Method for producing purified gas, method for producing valuable material, gas purification device, and device for producing valuable material |
| JPWO2021060289A1 (en) * | 2019-09-24 | 2021-04-01 | ||
| CN114401781A (en) * | 2019-09-24 | 2022-04-26 | 积水化学工业株式会社 | Method for producing purified gas, method for producing valuable, gas purification device, and valuable production device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63107719A (en) | 1988-05-12 |
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