JPH0686313B2 - Electron beam tinting prevention glass - Google Patents
Electron beam tinting prevention glassInfo
- Publication number
- JPH0686313B2 JPH0686313B2 JP63048510A JP4851088A JPH0686313B2 JP H0686313 B2 JPH0686313 B2 JP H0686313B2 JP 63048510 A JP63048510 A JP 63048510A JP 4851088 A JP4851088 A JP 4851088A JP H0686313 B2 JPH0686313 B2 JP H0686313B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- glass
- coloring
- sio
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/22—ZrO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/23—Mixtures
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
Description
【発明の詳細な説明】 ［産業上の利用分野］ 本発明は電子線着色防止ガラスに係り、特に平板テレビ
や陰極線管（CRT）のディスプレイ前面パネルの如き、
電子線が照射されるディスプレイ前面パネル等に用いる
に好適な電子線による着色を防止したガラスに関する。Description: TECHNICAL FIELD The present invention relates to an electron beam anti-coloring glass, and particularly to a flat panel TV or a display front panel of a cathode ray tube (CRT),
The present invention relates to a glass that is suitable for use in a display front panel or the like that is irradiated with an electron beam and that is prevented from being colored by the electron beam.
［従来の技術］ 一般に、CRT等の電子線が照射されるガラスには、電子
線による着色を低減するために、予めアルカリ成分であ
るＫとNaをほぼ1:1のモル比になるように、かつ、若干
のLiを添加したガラス組成のガラスを溶解して用いた
り、また、通常のソーダ・ライム・シリカガラス板の電
子線の照射される表面層のNaをＫにイオン交換し、Na,K
のバランスを取ることにより電子線による着色を低減す
る処理を行なったものが用いられてきた。[Prior Art] Generally, in a glass irradiated with an electron beam such as a CRT, in order to reduce coloring due to the electron beam, a molar ratio of K and Na, which are alkaline components, is set to about 1: 1 in advance. In addition, a glass having a glass composition to which a small amount of Li is added is melted and used, or Na in the surface layer of a normal soda-lime-silica glass plate irradiated with an electron beam is ion-exchanged with K to obtain Na. , K
Those which have been subjected to a treatment for reducing the coloring due to the electron beam by balancing the above have been used.
［発明が解決しようとする課題］ これら従来の方法では、電子線のビーム電流密度が35μ
A/cm2と高くなると、電子線による着色を十分低減する
ことができず、ディスプレイの輝度劣化等の問題をひき
おこしていた。[Problems to be Solved by the Invention] In these conventional methods, the electron beam beam current density is 35 μm.
When it is as high as A / cm 2 , coloring due to the electron beam cannot be sufficiently reduced, which causes problems such as deterioration of display brightness.
本発明は、このような従来の問題点を解決し、高い電流
密度の電子ビームで長時間照射されても、電子線による
着色が殆ど無い耐電子線着色性に優れた電子線着色防止
ガラスを提供することを目的とする。The present invention solves such a conventional problem, and provides an electron beam tinting preventive glass excellent in electron beam tinting resistance which is hardly colored by an electron beam even when irradiated with an electron beam having a high current density for a long time. The purpose is to provide.
［課題を解決するための手段］ 本発明の電子線着色防止ガラスは、下地が板ガラス組成
であり、その表面の厚さ0.6〜15μｍの表面層のアルカ
リがイオン交換処理されてNa/（Na＋Ｋ）が0.4〜0.65
（モル比）とされている板ガラス表面に、厚さ0.3〜６
μｍの、実質的にSiO2及び／又はZrO2よりなる被膜を有
することを特徴とする。[Means for Solving the Problems] In the electron beam coloration-preventing glass of the present invention, the underlayer has a plate glass composition, and the alkali of the surface layer having a surface thickness of 0.6 to 15 μm is subjected to ion exchange treatment to obtain Na / (Na + K). Is 0.4 to 0.65
(Mole ratio) on the plate glass surface, thickness 0.3 ~ 6
It is characterized by having a coating of μm, consisting essentially of SiO 2 and / or ZrO 2 .
以下、図面を参照して本発明を詳細に説明する。Hereinafter, the present invention will be described in detail with reference to the drawings.
第１図は本発明の電子線着色防止ガラスの一実施例を示
す断面図である。FIG. 1 is a sectional view showing an embodiment of the electron beam coloring preventing glass of the present invention.
図示の如く、本発明の電子線着色防止ガラス1Aは、表面
層2aがイオン交換処理されてNa/（Na＋Ｋ）が0.4〜0.65
（モル比）、好ましくは0.5（モル比）とされたガラス
板2Aの、電子線が照射される表面に、実質的にSiO2及び
／又はZrO2よりなる被膜３を0.3〜６μｍの厚さに形成
したものである。As shown in the figure, in the electron beam coloring prevention glass 1A of the present invention, the surface layer 2a is ion-exchanged so that Na / (Na + K) is 0.4 to 0.65.
(Molar ratio), preferably 0.5 (molar ratio) of the glass plate 2A, the surface of which is irradiated with an electron beam, a coating 3 substantially consisting of SiO 2 and / or ZrO 2 having a thickness of 0.3 to 6 μm. It was formed in.
即ち、本発明の電子線着色防止ガラス1Aにおいては、基
板となる通常のTVガラス又はソーダ・ライム・シリカガ
ラス（フロートガラス）組成（組成は、各々、下記第１
表及び第２表に示す。）のガラス板2Aの表面層2aのNaを
Ｋでイオン交換処理し、Na/（Na＋Ｋ）（モル比）が0.4
〜0.65となるようにして、耐電子線着色性が付与されて
いるため、被膜３の厚さを比較的薄くすることができ
る。That is, in the electron beam anti-coloring glass 1A of the present invention, an ordinary TV glass or soda-lime-silica glass (float glass) composition as a substrate (compositions are as follows:
The results are shown in Tables and Table 2. ), The surface layer 2a of the glass plate 2A is ion-exchanged with K to give Na / (Na + K) (molar ratio) of 0.4.
Since the electron beam coloring resistance is imparted in the range of 0.65, the thickness of the coating film 3 can be made relatively thin.
なお一般に、高い加速電圧で高電流密度を付加された場
合は、Ｘ線の放射が発生するので、基板とするガラスと
しては、PbO,SrO,BaO,ZrO2を各々０〜30重量％の範囲で
含有し、かつ、これらの合計量が30重量％以下であり、
SiO2を50重量％以上含有するガラスのような、Ｘ線遮蔽
効果のあるガラスを用いると、着色防止と共にＸ線遮蔽
効果を付与することができる。 Generally, when a high current density is applied with a high acceleration voltage, X-ray radiation occurs, so the glass used as the substrate is PbO, SrO, BaO, ZrO 2 in the range of 0 to 30% by weight. And the total amount of these is 30% by weight or less,
When glass having an X-ray shielding effect, such as glass containing 50 wt% or more of SiO 2 , is used, the X-ray shielding effect can be provided together with the prevention of coloration.
基板とするガラス板組成は、表面の被膜との熱膨張差を
極力少なくするように適宜選定するのが有利である。It is advantageous to appropriately select the composition of the glass plate used as the substrate so as to minimize the difference in thermal expansion from the film on the surface.
このようなガラス板2Aの表面に形成する被膜３は、実質
的にSiO2及び／又はZrO2よりなるものである。この被膜
３中には、電子線により容易に着色する着色源となるア
ルカリは２重量％以下、好ましくは実質的に含有されて
いないことが重要である。同様に、やはり着色源である
PbO又はSnO2についても、各々0.5重量％以下、好ましく
は実質的に含有されていないことが重要である。The coating film 3 formed on the surface of the glass plate 2A is substantially made of SiO 2 and / or ZrO 2 . It is important that the coating 3 contains no more than 2% by weight, preferably substantially no alkali, which serves as a coloring source and is easily colored by an electron beam. Similarly, it is also a coloring source
Also with respect to PbO or SnO 2 , it is important that the content of PbO or SnO 2 is not more than 0.5% by weight, preferably substantially none.
被膜３の厚さ及びイオン交換処理される表面層2aの厚さ
は、照射される電子ビームの加速電圧に応じて、Thomso
n-widdingtonの法則で推定される電子ビームの到達深さ
で決定される。通常、電子ビームは７〜30KVの加速電圧
で使用されることから、被膜３を0.3〜６μｍの厚さで
形成する場合、イオン交換処理されるガラス表面層2aの
厚さ（Ｋイオンが到達する深さ）は、着色防止効果及び
イオン交換処理効率の面から、0.6〜15μｍとする。な
お、被膜３の厚さは、薄過ぎると着色防止効果が十分で
なく、厚過ぎるとひび割れの問題がある上に、膜形成効
率面から経済的にも不利である。The thickness of the coating film 3 and the thickness of the surface layer 2a subjected to the ion exchange treatment depend on Thomso
It is determined by the electron beam arrival depth estimated by n-widdington's law. Usually, the electron beam is used at an accelerating voltage of 7 to 30 KV. Therefore, when the coating 3 is formed to have a thickness of 0.3 to 6 μm, the thickness of the glass surface layer 2a to be ion-exchanged (K ions reach it). The depth) is set to 0.6 to 15 μm in terms of the effect of preventing coloration and the efficiency of ion exchange treatment. If the thickness of the coating 3 is too thin, the effect of preventing coloration is not sufficient, and if it is too thick, there is a problem of cracking and it is economically disadvantageous in terms of film forming efficiency.
このようなイオン交換処理は、通常のソーダ・ライム・
シリカガラス板等をKNO3溶液に浸漬するなどの方法によ
り、容易に実施することができる。This kind of ion-exchange treatment is a normal soda lime
It can be easily carried out by a method of immersing a silica glass plate or the like in a KNO 3 solution.
また、本発明において、実質的にSiO2及び／又はZrO2よ
りなる被膜３を形成する方法としては、SiO2の過飽和状
態となった珪弗化水素酸を含む処理液あるいは、これに
更にZrO2を含む処理液に、イオン交換処理されたガラス
板を浸漬して被膜を析出させる析出法又はゾルーゲル法
等を採用することができる。特に、被膜の厚さを１μｍ
以上と厚く形成する場合には、ゾルーゲル法が好適であ
る。Further, in the present invention, as a method of forming the coating film 3 substantially made of SiO 2 and / or ZrO 2 , a treatment liquid containing hydrofluoric acid in a supersaturated state of SiO 2 or ZrO 2 is further added. A precipitation method or a sol-gel method in which an ion-exchange treated glass plate is immersed in a treatment liquid containing 2 to deposit a coating film can be employed. Especially, the thickness of the coating is 1 μm
The sol-gel method is suitable for forming a thicker layer.
［作用］ 実質的にSiO2及び／又はZrO2よりなる被膜は、電子線に
よる着色原因物質を実質的に含まず、電子線遮蔽、減衰
効果が高い。そして、電子線が高い加速電圧で透過した
場合であっても、基板ガラスの着色を防止ないし低減す
ることができる。しかも、SiO2及び／又はZrO2よりなる
被膜は、透明性、基板ガラスとの接着性にも優れ、膜形
成も容易で膜形成効率が高い。[Operation] The coating film substantially composed of SiO 2 and / or ZrO 2 does not substantially contain a substance causing coloration due to an electron beam, and has a high electron beam shielding and damping effect. Even if the electron beam is transmitted at a high acceleration voltage, it is possible to prevent or reduce the coloring of the substrate glass. Moreover, the coating film made of SiO 2 and / or ZrO 2 is excellent in transparency and adhesiveness to the substrate glass, is easy to form a film, and has high film forming efficiency.
従って、このような実質的にSiO2及び／又はZrO2よりな
る被膜を所定の厚さに形成することにより、電子線を効
果的に遮蔽し、電子線による基板ガラスの着色を有効に
防止することができるが、基板ガラスの表面の厚さ0.6
〜15μｍの表面層が、イオン交換処理により、Na/（Na
＋Ｋ）（モル比）が0.4〜0.65とされた耐電子線着色ガ
ラスである場合には、このような実質的にSiO2及び／又
はZrO2よりなる被膜が0.3μｍ以上という電子線到達深
さより薄いものであっても、被膜の減衰効果により高電
流密度の電子線強度も有効に低減されるため、電子線に
よる着色は確実に防止される。Therefore, by forming such a film substantially consisting of SiO 2 and / or ZrO 2 to a predetermined thickness, the electron beam is effectively shielded and the coloring of the substrate glass by the electron beam is effectively prevented. Can have a substrate glass surface thickness of 0.6
The surface layer of ~ 15μm is treated with Na / (Na
+ K) (molar ratio) is 0.4 to 0.65, the electron beam-resistant colored glass has a electron beam arrival depth of 0.3 μm or more when such a coating film substantially made of SiO 2 and / or ZrO 2 is used. Even if it is thin, the intensity of the electron beam having a high current density is effectively reduced by the attenuation effect of the coating film, so that the coloring due to the electron beam is surely prevented.
［実施例］ 以下、実施例及び比較例を挙げて、本発明をより具体的
に説明する。[Examples] Hereinafter, the present invention will be described more specifically with reference to Examples and Comparative Examples.
実施例１ 第３表に示す組成（分析値）のソーダ・ライム・シリカ
ガラス板をKNO3溶液中でイオン交換し、表面層（厚さ1
1.5μｍ）でNaとＫのモル比を約1:1にしたガラス板を製
造した。次いで、このガラス板を常温のSiO2を飽和した
珪弗化水素酸水溶液に約24時間浸漬し、約１μｍ厚さの
SiO2膜を形成した。Example 1 A soda-lime-silica glass plate having the composition (analytical value) shown in Table 3 was subjected to ion exchange in a KNO 3 solution to give a surface layer (thickness 1
A glass plate having a molar ratio of Na and K of about 1: 1 was produced. Next, this glass plate is immersed in a hydrosilicofluoric acid aqueous solution saturated with SiO 2 at room temperature for about 24 hours to form a glass plate having a thickness of about 1 μm.
A SiO 2 film was formed.
得られたガラス板に、耐電防止のためにアルミニウムを
約500Å蒸着し、その後、約35μA/cm2電流密度の電子ビ
ームを、約10KVの加速電圧で照射した。 Aluminum was vapor-deposited on the obtained glass plate in an amount of about 500 Å to prevent electric resistance, and then an electron beam having a current density of about 35 μA / cm 2 was irradiated at an acceleration voltage of about 10 KV.
50時間照射後の400nmの光線の透過率の変化を第４表に
示す。Table 4 shows the change in transmittance of 400 nm light after irradiation for 50 hours.
実施例２ 実施例１と同様にしてイオン交換処理したガラス板を、
体積百分率でテトラエトキシシラン（TEOS［Si（OC
2H5）4］）43部、エタノール43部、水14部からなる溶液
の中に、数回浸漬し、ディッピング法でSiO2膜を付け、
乾燥、焼き付けし約0.3μｍのSiO2膜を形成した。Example 2 A glass plate that had been subjected to an ion exchange treatment in the same manner as in Example 1 was used.
Tetraethoxysilane (TEOS [Si (OC
2 H 5 ) 4 ])) Soaked several times in a solution consisting of 43 parts, 43 parts of ethanol, and 14 parts of water, and attached a SiO 2 film by the dipping method.
It was dried and baked to form a SiO 2 film of about 0.3 μm.
得られたガラス板について、実施例１と同様にして照射
試験を行ない、透過率の変化を調べ、結果を第４表に示
した。An irradiation test was conducted on the obtained glass plate in the same manner as in Example 1 to examine the change in transmittance, and the results are shown in Table 4.
比較例1,2 比較のため、第３表に示すソーダ・ライム・シリカガラ
ス板（比較例１）及び後掲の第５表に示すTVガラス板
（比較例２）について、実施例１と同様に試験を行なっ
た場合の結果を第４表に併記する。Comparative Examples 1 and 2 For comparison, the soda-lime-silica glass plate (Comparative Example 1) shown in Table 3 and the TV glass plate (Comparative Example 2) shown in Table 5 below are the same as in Example 1. Table 4 also shows the results of the tests conducted in Table 1.
第４表より、本発明の電子線着色防止ガラスでは、電子
線着色による透過率低下が大幅に減少していることがわ
かる。 From Table 4, it can be seen that the electron beam coloration-preventing glass of the present invention significantly reduces the decrease in transmittance due to electron beam coloration.
［発明の効果］ 以上詳述した通り、本発明の電子線着色防止ガラスは極
めて電子線の遮蔽ないし減衰効果の高い、実質的にSiO2
及び／又はZrO2よりなる被膜を形成してなるものであっ
て、従来の耐電子線着色ガラスでは強い着色が避けられ
なかったような、高い電流密度の電子線を照射しても、
ガラスの着色を大幅に低減することができ、輝度劣化等
の問題を効果的に解決することができる。[Advantages of the Invention] As described in detail above, the electron beam coloration-preventing glass of the present invention has a substantially high electron beam shielding or attenuating effect, and is substantially SiO 2.
And / or ZrO 2 formed by forming a coating film, even if it is irradiated with an electron beam having a high current density such that strong coloring cannot be avoided in the conventional electron beam resistant colored glass,
The coloring of the glass can be significantly reduced, and problems such as deterioration in brightness can be effectively solved.
第１図は本発明の一実施例に係る電子線着色防止ガラス
を示す断面図である。 1A…電子線着色防止ガラス、 2A…ガラス板、 ３…被膜。FIG. 1 is a sectional view showing an electron beam coloring preventing glass according to an embodiment of the present invention. 1A ... Electron beam coloring prevention glass, 2A ... Glass plate, 3 ... Coating.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭61−77644（ＪＰ，Ａ) 特開 昭56−64302（ＪＰ，Ａ) 特開 昭53−82444（ＪＰ，Ａ) 特開 昭62−283846（ＪＰ，Ａ) 特公 昭46−38516（ＪＰ，Ｂ１) 特公 昭47−14237（ＪＰ，Ｂ１) 実公 昭44−11150（ＪＰ，Ｙ１) 米国特許3504212（ＵＳ，Ａ) ─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-61-77644 (JP, A) JP-A-56-64302 (JP, A) JP-A-53-82444 (JP, A) JP-A-62- 283846 (JP, A) JP-B-46-38516 (JP, B1) JP-B-47-14237 (JP, B1) JP-B-44-11150 (JP, Y1) US Patent 3504212 (US, A)
Claims (1)
厚さ0.6〜15μｍの表面層のアルカリがイオン交換処理
されてNa/（Na＋Ｋ）が0.4〜0.65（モル比）とされてい
る板ガラス表面に、厚さ0.3〜６μｍの実質的にSiO2及
び／又はZrO2よりなる被膜を有することを特徴とする電
子線着色防止ガラス。1. A glass plate having a glass plate composition as a base material, wherein the alkali of a surface layer having a thickness of 0.6 to 15 μm is subjected to an ion exchange treatment so that Na / (Na + K) is 0.4 to 0.65 (molar ratio). An electron beam anti-coloring glass, characterized in that it has on its surface a coating having a thickness of 0.3 to 6 μm and substantially consisting of SiO 2 and / or ZrO 2 .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63048510A JPH0686313B2 (en) | 1988-03-01 | 1988-03-01 | Electron beam tinting prevention glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63048510A JPH0686313B2 (en) | 1988-03-01 | 1988-03-01 | Electron beam tinting prevention glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01224242A JPH01224242A (en) | 1989-09-07 |
| JPH0686313B2 true JPH0686313B2 (en) | 1994-11-02 |
Family
ID=12805370
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63048510A Expired - Lifetime JPH0686313B2 (en) | 1988-03-01 | 1988-03-01 | Electron beam tinting prevention glass |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0686313B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07120514B2 (en) * | 1990-02-26 | 1995-12-20 | 三菱電機株式会社 | Cathode ray tube |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3504212A (en) | 1967-03-20 | 1970-03-31 | Westinghouse Electric Corp | High contrast display device incorporating a light absorption and scattering layer |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4411150Y1 (en) * | 1965-08-02 | 1969-05-08 | ||
| JPS5382444A (en) * | 1976-12-28 | 1978-07-20 | Seiko Epson Corp | Surface treating method of liquid crystal panel |
| JPS593721B2 (en) * | 1979-10-29 | 1984-01-25 | 大阪府 | anti-reflection film |
| JPH0742140B2 (en) * | 1984-09-22 | 1995-05-10 | 日本板硝子株式会社 | Glass articles that prevent electron beam coloring |
| JPH062605B2 (en) * | 1986-06-02 | 1994-01-12 | 日本板硝子株式会社 | Method for producing crystallized glass article |
-
1988
- 1988-03-01 JP JP63048510A patent/JPH0686313B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3504212A (en) | 1967-03-20 | 1970-03-31 | Westinghouse Electric Corp | High contrast display device incorporating a light absorption and scattering layer |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01224242A (en) | 1989-09-07 |
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