JPH0686670B2

JPH0686670B2 - Discharge chemical reactor

Info

Publication number: JPH0686670B2
Application number: JP62090086A
Authority: JP
Inventors: 潤一清水; 立男麻蒔; 英雄内川
Original assignee: 日電アネルバ株式会社
Priority date: 1987-04-13
Filing date: 1987-04-13
Publication date: 1994-11-02
Anticipated expiration: 2009-11-02
Also published as: JPS63255383A

Description

【発明の詳細な説明】（産業上の利用分野）本発明は、真空中で放電により化学反応を起こさせて、
被処理物表面に薄膜を作成したり、エッチングを行なっ
たりする放電化学反応装置に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial field of application) The present invention is characterized by causing a chemical reaction by discharge in a vacuum,
The present invention relates to a discharge chemical reaction device that forms a thin film on a surface of an object to be processed or performs etching.

（従来の技術）真空中における放電化学反応を利用し薄膜を作ったりエ
ッチングを行なったりする放電化学反応装置では、電界
にほぼ直交する方向に磁界を印加して放電のプラズマ密
度を高くし、化学反応を高速化し、より低圧、低温で、
より純度の高い薄膜を作成したり、より高速に質の良い
エッチングを行なうことが可能となることはよく知られ
ている。（特公昭59−15982号公報参照）またこのとき、被処理物表面における薄膜の作成あるい
はエッチングを均一化するには、前記印加磁界を交番磁
界にしたり、回転磁界とするのが有効であることも知ら
れている。（特開昭61−86942号公報参照）（発明が解決しようとする問題点）従来の磁界発生方法は、二つの電極の一方または両方の
裏面に永久磁石若しくは電磁石を配置するか、真空容器
の外側に大きい励磁コイルを対向障立させて両者の間の
磁界の中に前記二つの電極に囲まれた空間が含まれるよ
うにするかの何れかの方法を採用している。(Prior Art) In a discharge chemical reaction device that uses a discharge chemical reaction in a vacuum to form a thin film or perform etching, a magnetic field is applied in a direction substantially orthogonal to an electric field to increase the plasma density of the discharge, Speed up the reaction, lower pressure, lower temperature,
It is well known that it is possible to form a thin film having higher purity and to perform high-quality etching at higher speed. (See Japanese Examined Patent Publication No. 59-15982) At this time, it is effective to make the applied magnetic field an alternating magnetic field or a rotating magnetic field in order to uniformly form or etch a thin film on the surface of the object to be processed. Is also known. (See Japanese Patent Laid-Open No. 61-86942) (Problems to be Solved by the Invention) In the conventional magnetic field generation method, a permanent magnet or an electromagnet is arranged on the back surface of one or both of the two electrodes, or Either method is adopted in which a large exciting coil is opposed to the outside so that the magnetic field between the two encloses the space surrounded by the two electrodes.

しかし、電極の裏面に永久磁石若しくは電磁石を配置す
る方法では、磁力線は電極表面と交差して出入りするこ
とになるため、「電極表面に平行」で且つ「一様即ち均
一な」磁界というのは到底得られない。一方、真空容器
の外側に大きい励磁コイルを対向障立させる方法は、被
処理物の表面積が大きくなると真空容器も大きくなり、
かなり高い磁束密度をその表面全体に均一に分布させよ
うとすると、磁界発生用の電磁石または電磁コイルの直
径はどうしても大きくなり、また対向する磁極間の距離
も大きく離れてしまうので、励磁電流も増加することに
なり、装置全体の大型化、大電力化は免がれない、とい
う欠点がある。However, in the method of arranging the permanent magnet or electromagnet on the back surface of the electrode, the magnetic field lines cross in and out of the electrode surface, so that a “parallel to the electrode surface” and “uniform or uniform” magnetic field is I can't get it at all. On the other hand, the method of facing a large exciting coil to the outside of the vacuum container is such that the larger the surface area of the workpiece, the larger the vacuum container,
If you try to evenly distribute a fairly high magnetic flux density over the entire surface, the diameter of the electromagnet or electromagnetic coil for magnetic field generation will inevitably increase, and the distance between the opposing magnetic poles will also greatly increase, so the excitation current will also increase. Therefore, there is a drawback in that the size and power consumption of the entire apparatus are inevitable.

また近時は大量の被処理物を処理するため装置が大型化
する傾向にあるが、このときどうしても真空容器内に導
入されたガスに分布の不均一を生じ、そのため薄膜堆積
またはエッチングに部分的な遅速を生ずることになり、
その対策が望まれている。Also, recently, the apparatus tends to be large in size because a large amount of the object to be processed is processed, but at this time, the gas introduced into the vacuum container inevitably has a non-uniform distribution, which causes a partial deposition or etching of the thin film. It will cause a slow speed,
The measures are desired.

（発明の目的）この発明は、磁界発生に電力を必要とせず、装置の小型
化を可能にし、且つ被処理物表面に平行な方向に理想的
な形状の回転磁界を発生することの出来る、高効率で均
一性に秀れた放電化学反応装置の提供を目的とする。(Object of the Invention) The present invention does not require electric power to generate a magnetic field, enables downsizing of an apparatus, and can generate a rotating magnetic field having an ideal shape in a direction parallel to a surface of an object to be processed. An object is to provide a discharge chemical reaction device having high efficiency and excellent uniformity.

（問題点を解決するための手段）この発明は、真空容器、該真空容器に気体を導入する手
段、該真空容器を排気する手段、該真空容器内の圧力を
調整する手段、該真空容器内に設置された電極及び対向
電極、該電極及び対向電極の間の空間に電界を生ぜしめ
てその空間に放電プラズマを起こさせる手段、前記電界
にほぼ直角の方向の磁界を発生する磁界発生手段を備え
る放電化学反応装置において、該磁界発生手段が、該電
極の中心軸に向かってその磁極を対向させて該中心軸に
交差する磁路を有し、且つ該中心軸又は該中心軸から偏
心した軸を回転軸として真空容器内の前記電極と対向電
極の間の空間に回転可能に配置されて該空間において前
記気体を攪拌することが可能な永久磁石であるような放
電化学反応装置によって前記目的を達成してものであ
る。(Means for Solving Problems) The present invention relates to a vacuum container, a means for introducing a gas into the vacuum container, a means for exhausting the vacuum container, a means for adjusting the pressure in the vacuum container, and an inside of the vacuum container. An electrode and a counter electrode installed on the substrate, means for generating an electric field in the space between the electrode and the counter electrode to generate discharge plasma in the space, and magnetic field generating means for generating a magnetic field in a direction substantially perpendicular to the electric field. In the discharge chemical reaction device, the magnetic field generating means has a magnetic path intersecting the central axis with the magnetic poles facing the central axis of the electrode, and the central axis or an axis eccentric from the central axis. With the discharge chemical reaction device as a permanent magnet that is rotatably arranged in a space between the electrode and the counter electrode in the vacuum container with the rotating shaft as a rotation axis and can stir the gas in the space, Achievement It is.

（作用）磁極間距離を極小にして磁界発生の効率を高め、磁界発
生装置を小型化し、回転する永久磁石は真空容器内のガ
スを攪拌してその分布を均一化する。(Operation) The distance between the magnetic poles is minimized to enhance the efficiency of magnetic field generation, the magnetic field generator is downsized, and the rotating permanent magnet agitates the gas in the vacuum container to make its distribution uniform.

（実施例）次に、この発明を図面を用い、実施例により説明する。(Example) Next, this invention is demonstrated by an Example using drawing.

第１図（正面断面図）はこの発明の第１の実施例であ
り、真空容器１には、真空容器１を排気する手段２と、
真空容器１に気体を導入する手段３、真空容器１内の圧
力を調整する手段４が接続されている。真空容器１の内
部に設置した電極５および対向電極６には、交流（高周
波やマイクロ波でもよい）又は直流の電源７を接続して
電界Ｅが加えられている。FIG. 1 (front sectional view) is a first embodiment of the present invention, in which a vacuum container 1 is provided with a means 2 for exhausting the vacuum container 1.
A means 3 for introducing gas into the vacuum container 1 and a means 4 for adjusting the pressure inside the vacuum container 1 are connected. An electric field E is applied to the electrode 5 and the counter electrode 6 installed inside the vacuum container 1 by connecting an AC (high frequency or microwave) or DC power supply 7.

更に、その電界とほぼ直交する磁界Ｂを設けるように、
前記両電極に挟まれた空間をNS極で挟むような永久磁石
８が設けられており、且つこの永久磁石８を、電極５の
表面の中央に立てた垂線即ち中心線を回転軸として回転
させる回転手段９（例えば、電動機）が真空容器内に設
けられている。電極５の上には被処理物である基板10が
載置されている。Furthermore, to provide a magnetic field B that is substantially orthogonal to the electric field,
A permanent magnet 8 is provided so as to sandwich the space sandwiched between the two electrodes with NS poles, and the permanent magnet 8 is rotated about a perpendicular line, i.e., a center line, which stands at the center of the surface of the electrode 5, as a rotation axis. Rotating means 9 (for example, an electric motor) is provided in the vacuum container. A substrate 10, which is an object to be processed, is placed on the electrode 5.

電源７から電力が両電極に印加されたとき、これら電界
と磁界によって放電はかなり低い圧力状態でも高密度に
発生することになり、高速でしかも良質の表面処理が可
能となるが、特に、本発明の場合は、磁界の強さとその
良好な均一性が、処理の均一度を極めて高いものにし、
更に均整のとれた電界と磁界の直交形状は、トレンチエ
ッチングなどの加工で加工精度を高める効果を生ずる。When electric power is applied from the power source 7 to both electrodes, the electric field and the magnetic field cause the discharge to occur at a high density even under a considerably low pressure state, which enables high-speed and high-quality surface treatment. In the case of the invention, the strength of the magnetic field and its good homogeneity make the homogeneity of the treatment extremely high,
Further, the well-balanced orthogonal shape of the electric field and the magnetic field produces an effect of enhancing the processing accuracy by processing such as trench etching.

第２図は、本発明の第２の実施例の同様の図であり、各
部材の名称，符号は第１図と同様である。第１図と異な
るところは、この場合は永久磁石８の回転軸が、電極５
の中心軸からみるとやや偏心して設けられており、この
偏心によって基板10の表面で、時間的に見た平均的な磁
界の強さが、第１の実施例の装置よりも一層均一化され
るように考慮されている。真空容器内のガスの攪拌力も
高まる。FIG. 2 is a view similar to the second embodiment of the present invention, and the names and reference numerals of the respective members are the same as in FIG. The difference from FIG. 1 is that in this case, the rotation axis of the permanent magnet 8 is
It is provided with a slight eccentricity when viewed from the center axis of the substrate. Due to this eccentricity, the average magnetic field strength over time on the surface of the substrate 10 is made more uniform than that of the device of the first embodiment. Are considered to be. The stirring power of the gas in the vacuum container also increases.

（発明の効果）この発明は、磁界発生に電力を要せず、装置の小型化を
可能にし、且つ被処理物表面に平行な方向に理想的な形
状の回転磁界を発生することの出来る、高効率で均一性
に秀れたの放電化学反応装置を提供する効果がある。(Effect of the Invention) The present invention does not require electric power to generate a magnetic field, enables miniaturization of an apparatus, and can generate a rotating magnetic field having an ideal shape in a direction parallel to a surface of an object to be processed. It is effective in providing a discharge chemical reaction device having high efficiency and excellent uniformity.

[Brief description of drawings]

第１図は本発明の第１の実施例の正面断面図。第２図は本発明の第２の実施例の正面断面図。１……真空容器、２……真空容器を排気する手段、３…
…真空容器に気体を導入する手段、４……真空容器内の
圧力を調整する手段、５……電極、６……対向電極、７
……電源、８……永久磁石、９……回転手段、10……被
処理物の基板、Ｅ……電界、Ｂ……磁界。FIG. 1 is a front sectional view of the first embodiment of the present invention. FIG. 2 is a front sectional view of a second embodiment of the present invention. 1 ... vacuum container, 2 ... means for evacuating the vacuum container, 3 ...
... Means for introducing gas into the vacuum container, 4 ... Means for adjusting pressure in the vacuum container, 5 ... Electrodes, 6 ... Counter electrodes, 7
...... Power supply, 8 ・・・ Permanent magnet, 9 ・・・ Rotation means, 10 ・・・ Substrate of the object to be processed, E ・・・ Electric field, B ・・・ Magnetic field.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献特開昭61−87884（ＪＰ，Ａ) 特開昭61−187336（ＪＰ，Ａ) 特開昭59−18638（ＪＰ，Ａ) 特開昭58−55569（ＪＰ，Ａ) ─────────────────────────────────────────────────── ─── Continuation of front page (56) Reference JP-A-61-87884 (JP, A) JP-A-61-187336 (JP, A) JP-A-59-18638 (JP, A) JP-A-58- 55569 (JP, A)

Claims

[Claims]

1. A vacuum container, means for introducing gas into the vacuum container, means for exhausting the vacuum container, means for adjusting pressure in the vacuum container, electrodes and counter electrodes installed in the vacuum container, In a discharge chemical reaction device provided with means for generating an electric field in the space between the electrode and the counter electrode to generate discharge plasma in the space, and magnetic field generating means for generating a magnetic field in a direction substantially perpendicular to the electric field, The means has a magnetic path that has its magnetic poles facing toward the central axis of the electrode and intersects the central axis, and has the magnetic axis in the vacuum container with the central axis or an axis eccentric from the central axis as a rotation axis. A discharge chemical reaction device comprising a permanent magnet rotatably arranged in a space between an electrode and a counter electrode and capable of stirring the gas in the space.