JPH0687489B2 - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPH0687489B2 JPH0687489B2 JP30566686A JP30566686A JPH0687489B2 JP H0687489 B2 JPH0687489 B2 JP H0687489B2 JP 30566686 A JP30566686 A JP 30566686A JP 30566686 A JP30566686 A JP 30566686A JP H0687489 B2 JPH0687489 B2 JP H0687489B2
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- Prior art keywords
- semiconductor device
- current limiting
- current
- limiting element
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は、半導体装置に関し、特に大電流のスイッチ素
子として使用される半導体素子及びこの半導体素子を過
電流から保護する限流素子を備えた半導体装置に係わ
る。The present invention relates to a semiconductor device, and more particularly to a semiconductor element used as a switching element for large current and a limit for protecting this semiconductor element from overcurrent. The present invention relates to a semiconductor device having a flow element.
(従来の技術) 大電流が流れる電気回路をオン・オフさせる機器として
は、有接点のスイッチが汎用されているが、近年、無接
点の半導体スイッチが無アーク、無騒音、無保守等の利
点を有することから使用し始められている。かかる半導
体スイッチは、上述した利点を有する反面、過電流(特
に短絡電流等の異常電流)に対して非常に弱い。例え
ば、半導体スイッチを構成しているサイリスタに規定値
以上の電流が流れると、該サイリスタが破壊して常にオ
ン状態になってしまう問題があった。(Prior Art) A contact switch is widely used as a device for turning on / off an electric circuit through which a large current flows, but in recent years, a contactless semiconductor switch has advantages such as no arc, no noise, and no maintenance. Have been started to use. Such a semiconductor switch has the advantages described above, but is very weak against overcurrent (especially abnormal current such as short circuit current). For example, when a current exceeding a specified value flows through a thyristor forming a semiconductor switch, the thyristor breaks down and is always turned on.
このようなことから、電気回路に速断ヒューズを挿入
し、過電流が電気回路に流れた際、回路を遮断して半導
体スイッチを保護することが行われている。しかしなが
ら、かかる速断ヒューズを用いた場合には過電流によっ
て該速断ヒューズが切れた後、回路を復帰させるため
に、新品の速断ヒューズと交換しなければならず、保守
が煩雑になるという問題があった。また、応答性も必ず
しも満足するものではなく、更に交換によるコスト面で
も問題があった。For this reason, a fast-acting fuse is inserted in an electric circuit, and when an overcurrent flows in the electric circuit, the circuit is cut off to protect the semiconductor switch. However, when such a fast-acting fuse is used, a new quick-acting fuse must be replaced with a new one in order to restore the circuit after the fast-acting fuse is blown by an overcurrent, and there is a problem that maintenance becomes complicated. It was Further, the responsiveness is not always satisfactory, and there is a problem in terms of cost due to replacement.
一方、有接点のブレーカが一部半導体素子の保護に試み
られている。しかしながら、かかるブレーカは接点を開
くのに機械的動作を伴い、過電流の発生から該ブレーカ
の動作までに時間遅れが生じる。その結果、半導体素子
を保護するのに必要な応答性に関し、充分ではないとい
う問題があった。On the other hand, contact breakers have been tried to protect some semiconductor elements. However, such a breaker involves a mechanical operation to open the contact, and there is a time delay from the occurrence of overcurrent to the operation of the breaker. As a result, there is a problem that the responsiveness required to protect the semiconductor element is not sufficient.
このようなことから、本出願人はCr等を少量添加したV2
O3セラミックスからなり、過電流が流れた際に金属→絶
縁体転移に基づく抵抗急増により電流を絞る限流素子を
半導体素子と直列に接続した保護回路を既に出願した。
かかる保護回路では、限流素子が前述したブレーカに比
べて応答性が良好で、数msec以内に過電流を限流する作
用を有するため、電気回路を迅速にオフ状態にして半導
体スイッチを確実に保護し、しかも繰返して使用でき、
復帰を簡単に行なうことができる。しかしながら、前記
限流素子は定格電流の通電時に発熱が生じ、満足する通
電容量が得られなくなるという問題があった。Therefore, the present applicant has proposed that V 2 containing a small amount of Cr, etc.
We have already applied for a protection circuit consisting of O 3 ceramics in which a current limiting element is connected in series with a semiconductor element to restrict the current due to a resistance increase due to a metal → insulator transition when an overcurrent flows.
In such a protection circuit, the current limiting element has better responsiveness than the breaker described above and has the effect of limiting the overcurrent within a few msec, so that the electric circuit can be quickly turned off to ensure the semiconductor switch. Protects and can be used repeatedly,
You can easily restore. However, the current limiting element has a problem that heat is generated when a rated current is applied, and a satisfactory current carrying capacity cannot be obtained.
(発明が解決しようとする問題点) 本発明は、上記従来の問題点を解決するためになされた
もので、短絡電流等の過電が流れても半導体素子を確実
に保護し、しかも復帰を簡単に行なうことが可能で、更
に発熱を生じる限流素子及び半導体素子を効果的に放熱
して充分に満足な通電容量を確保し得る半導体装置を提
供しようとするものである。(Problems to be Solved by the Invention) The present invention has been made in order to solve the above-mentioned conventional problems, and reliably protects a semiconductor element even when an overcurrent such as a short-circuit current flows, and further, restores it. It is an object of the present invention to provide a semiconductor device which can be easily carried out and can further effectively radiate heat from a current limiting element and a semiconductor element which generate heat, thereby ensuring a sufficient current carrying capacity.
[発明の構成] (問題点を解決するための手段) 本発明は、半導体素子と限流素子とを電気的に直列に接
続し、かつ同一の放熱フィンに固定し、前記放熱フィン
に冷却ファンを付設したことを特徴とする半導体装置で
ある。[Structure of the Invention] (Means for Solving Problems) According to the present invention, a semiconductor element and a current limiting element are electrically connected in series and fixed to the same radiation fin, and the cooling fan is attached to the radiation fin. The semiconductor device is characterized by being attached.
上記限流素子としては、以下に具体的に説明する温度上
昇に伴って抵抗が急上昇するセラミックス系のものと金
属系のものが好ましい。As the current limiting element, a ceramic-based element and a metal-based element whose resistance rapidly increases with a temperature increase, which will be specifically described below, are preferable.
.セラミックス系の限流素子としては、(V1-xAx)2O3
[但し、式中のAはCr、Al、Scのうちの少なくとも一
種、xは0≦x≦0.02の範囲の数値を示す]にて表わさ
れる組成からなる限流素子が挙げられる。こうした限流
素子は、常温での抵抗が10-3Ω・cm以下と小さく、しか
も約100℃で抵抗が2桁増大し、非常に応答性が高いと
いう特性を有する。なお、温度上昇に伴って抵抗が増大
する素子としては従来よりBaTiO3半導体素子が知られて
いるが、かかる素子は常温の抵抗が10〜102Ωcmと大き
く、本発明における半導体装置の限流素子としては適切
ではない。. As a ceramic-based current limiting element, (V 1-x A x ) 2 O 3
A current limiting element having a composition represented by [wherein A represents at least one of Cr, Al, and Sc, and x represents a numerical value in the range of 0 ≦ x ≦ 0.02] is given. Such a current limiting element has a characteristic that the resistance at room temperature is as small as 10 −3 Ω · cm or less, and the resistance increases by two digits at about 100 ° C., and the response is extremely high. Incidentally, as a device whose resistance increases with temperature rise, a BaTiO 3 semiconductor device is conventionally known, but such a device has a large resistance at room temperature of 10 to 10 2 Ωcm, which is a current limiting factor of the semiconductor device of the present invention. Not suitable as a device.
上記一般式中のCr、Al、Scは、温度上昇時に抵抗を増大
させる特性(PTC特性)を発揮させるのに必要な元素で
あり、かつxの値は 0≦x≦0.02の範囲とすることが必要であり、より好ま
しい範囲は0.0005≦x≦0.015である。xの値が0.02を
越えると、限流素子は高抵抗状態を保ちPTC特性を示さ
なくなる。Cr, Al, and Sc in the above general formula are elements necessary to exert the characteristic (PTC characteristic) of increasing resistance when the temperature rises, and the value of x should be in the range of 0 ≦ x ≦ 0.02. Is required, and a more preferable range is 0.0005 ≦ x ≦ 0.015. When the value of x exceeds 0.02, the current limiting element maintains the high resistance state and does not show the PTC characteristic.
また、上記組成の限流素子において、Fe、Cu、Ni、Co、
Snを含有させることにより該限流素子の焼結性を高める
ことが可能となる。これら金属は、少なくとも一種を20
重量%以下添加することにより前記焼結性の向上化を図
ることができる。即ち、それら金属の添加量が20重量%
を越えると、PTC倍率の低下を招く。最も好ましい金属
の添加範囲は、2〜15重量%である。なお、前記金属の
中で特にsnは既述した焼結性の向上の他に、PTC特性を
向上できるため有効である。Snは、1400〜1600℃の焼結
温度及び焼結雰囲気において金属として安定で上記式で
表わされる金属酸化物の粒子間に液相として介在し、焼
結促進の効果を発揮できる。また、焼結後の焼結体はSn
析出相がPTC特性における低抵抗領域の比抵抗を低減
し、かつ電流容量を拡大する効果を有する。更に、Snを
添加した限流素子はPTC特性を示す転移温度の変数が少
ないという特徴も有する。In the current limiting element having the above composition, Fe, Cu, Ni, Co,
By including Sn, it becomes possible to enhance the sinterability of the current limiting element. At least one of these metals is 20
It is possible to improve the sinterability by adding less than or equal to wt%. That is, the addition amount of those metals is 20% by weight.
If it exceeds, the PTC ratio will decrease. The most preferable metal addition range is 2 to 15% by weight. Among the above metals, sn is particularly effective because it can improve the PTC characteristics in addition to the above-mentioned improvement in sinterability. Sn is stable as a metal in the sintering temperature of 1400 to 1600 ° C. and in a sintering atmosphere, and intervenes as a liquid phase between particles of the metal oxide represented by the above formula, and can exert an effect of promoting sintering. In addition, the sintered body after sintering is Sn
The precipitated phase has the effect of reducing the specific resistance in the low resistance region of the PTC characteristic and expanding the current capacity. Further, the current limiting element containing Sn has a feature that the transition temperature variable showing the PTC characteristic is small.
更に、上記組成の限流素子において、Fe、Cu、Ni、Co、
Snとは別にW又はMoを添加することにより焼結体の結晶
粒を小さくでき、過電流で急激に加熱された場合におい
ても充分な耐熱衝撃性を発揮できる。Furthermore, in the current limiting device having the above composition, Fe, Cu, Ni, Co,
By adding W or Mo separately from Sn, the crystal grains of the sintered body can be made small, and sufficient thermal shock resistance can be exhibited even when rapidly heated by an overcurrent.
.金属系の限流素子は、絶縁性筒状容器と、この容器
内に封入され、固体→液体→気体に相変態により抵抗が
急上昇する金属とから構成されている。かかる構成の限
流素子は、過電流がなくなると、金属気体は冷却して液
体から固体まで相変態して元の状態に戻るため、繰返し
使用することができる。こうした構成において、筒状容
器の内部にピストンを設けることによって、気体状の金
属の圧力の過大上昇を防止でき、かつ冷却時に固体に戻
る際、ピストンの作用によりスムーズに元の形状に復帰
させることができる。ここに用いる金属は、固有抵抗が
低く、かつ融点の低いものが望ましい。具体的には、H
g、Na、K、Cd、Zn、In、Sn、Pb又はこれらの合金等を
挙げることができる。. The metal-based current limiting element is composed of an insulating cylindrical container and a metal which is enclosed in the container and whose resistance rapidly increases due to a phase transformation from solid to liquid to gas. When the overcurrent disappears, the current limiting element having such a configuration can be repeatedly used because the metal gas is cooled and undergoes a phase transformation from liquid to solid to return to the original state. In such a configuration, by providing a piston inside the tubular container, it is possible to prevent an excessive increase in the pressure of the gaseous metal, and to return to the original shape smoothly by the action of the piston when returning to solid during cooling. You can It is desirable that the metal used here has a low specific resistance and a low melting point. Specifically, H
Examples thereof include g, Na, K, Cd, Zn, In, Sn, Pb and alloys thereof.
以下、本発明を図面を参照して詳細に説明する。Hereinafter, the present invention will be described in detail with reference to the drawings.
第1図は、本発明に係わる半導体装置の一例を示す概略
図である。この半導体装置1は、銅やアルミニウム等の
良熱伝導性材料からなる放熱フィン2を備えている。こ
の放熱フィン2上には、半導体素子3及び限流素子4が
良導電性接着剤を介して固着されている。これら半導体
素子3及び限流素子4は、リード端子5により直列に接
続されている。更に、前記放熱フィン2の一端には、該
放熱フィン2を強制的に空冷するための冷却用のファン
6が付設されている。FIG. 1 is a schematic diagram showing an example of a semiconductor device according to the present invention. This semiconductor device 1 includes a radiation fin 2 made of a material having good thermal conductivity such as copper or aluminum. The semiconductor element 3 and the current limiting element 4 are fixed to the heat radiation fin 2 with a good conductive adhesive. The semiconductor element 3 and the current limiting element 4 are connected in series by a lead terminal 5. Further, a cooling fan 6 for forcibly cooling the heat radiation fin 2 is attached to one end of the heat radiation fin 2.
(作用) 上記第1図図示の半導体装置1を用いて第2図図示の電
気回路を構成する。即ち、第2図中の7は前記半導体装
置1の半導体素子3によりオン・オフされる負荷、8は
ブレーカであり、これら半導体装置1、ブレーカ8及び
負荷7は夫々直列に接続されている。このような電気回
路において、負荷7に異常が生じ、回路に過電流が流れ
始めると、半導体装置1に組込まれた抵抗変化量の大き
い限流素子4が高速に応答して動作を開始し、過電流を
所定値以下に限流する。なお、ブレーカ8は短絡電流が
回路に流れ、半導体装置1の限流素子4により限流後、
回路を完全にオフ状態にする作用をなす。また、前記限
流素子4及び半導体素子3は通常の通電時に発熱を生じ
るが、これら限流素子4及び半導体素子3は同一の放熱
フィン2に固着され、かつ該放熱フィン2は冷却用ファ
ン6により強制的に冷却されているため、各限流素子4
半導体素子3の発熱を効果的に放熱でき、充分満足する
通電容量を得ることができる。しかも、限流素子4及び
半導体素子3は同一の放熱フィン2に固着されているた
め、半導体装置自体の小型化を達成できる。(Operation) The semiconductor device 1 shown in FIG. 1 is used to form the electric circuit shown in FIG. That is, 7 in FIG. 2 is a load that is turned on / off by the semiconductor element 3 of the semiconductor device 1, 8 is a breaker, and these semiconductor device 1, breaker 8 and load 7 are connected in series. In such an electric circuit, when an abnormality occurs in the load 7 and an overcurrent starts to flow in the circuit, the current limiting element 4 with a large resistance change amount incorporated in the semiconductor device 1 responds at high speed to start its operation. Limit the overcurrent to below a specified value. In the breaker 8, a short circuit current flows in the circuit, and after the current is limited by the current limiting element 4 of the semiconductor device 1,
It acts to turn the circuit completely off. Further, although the current limiting element 4 and the semiconductor element 3 generate heat during normal energization, the current limiting element 4 and the semiconductor element 3 are fixed to the same radiation fin 2, and the radiation fin 2 is a cooling fan 6. Each current limiting element 4 is forcibly cooled by
The heat generated by the semiconductor element 3 can be effectively dissipated, and a sufficient current carrying capacity can be obtained. Moreover, since the current limiting element 4 and the semiconductor element 3 are fixed to the same radiation fin 2, the semiconductor device itself can be downsized.
(発明の実施例) 以下、本発明の実施例を前述した第1図及び第2図等を
参照して説明する。(Embodiment of the Invention) An embodiment of the present invention will be described below with reference to FIGS. 1 and 2 described above.
実施例1 半導体スイッチ(通電容量;40A、許容電流時間積;I2・
t=3200A2sec)3、組成が(V0.997Cr0.003)2O3+5%
Snからなる限流素子(形状;5mm×5mm×30mm、抵抗;約1
0mΩ)4を第1図に示すようにアルミニウム製の放熱フ
ィン(表面積1200cm2)2上に良導電性接着剤を介して
固着し、かつこれら半導体スイッチ3及び限流素子4を
リード端子5により直列接続し、更に前記放熱フィン2
の一端に冷却用ファン6を付設して半導体装置1を組立
てた。こうした半導体装置1を、第2図に示すように負
荷7及び市販のブレーカ8に対し直列接続して電気回路
を構成した。Example 1 Semiconductor switch (current carrying capacity: 40 A, permissible current time product: I 2 ·
t = 3200A 2 sec) 3, composition is (V 0.997 Cr 0.003 ) 2 O 3 + 5%
Current limiting element made of Sn (shape: 5 mm × 5 mm × 30 mm, resistance: about 1
0 mΩ) 4 as shown in FIG. 1 on a radiation fin (surface area 1200 cm 2 ) made of aluminum through a good conductive adhesive, and these semiconductor switch 3 and current limiting element 4 are connected by a lead terminal 5. Connected in series, and the heat radiation fin 2
The semiconductor device 1 was assembled by attaching a cooling fan 6 to one end of the. Such a semiconductor device 1 was connected in series to a load 7 and a commercially available breaker 8 as shown in FIG. 2 to form an electric circuit.
比較例1 放熱フィン及び冷却用ファンを用いない以外、実施例1
と同様な構成の半導体装置を組立て、この半導体装置を
実施例1と同様に負荷、ブレーカに直列接続して第2図
の電気回路を構成した。Comparative Example 1 Example 1 except that the radiation fin and the cooling fan were not used.
A semiconductor device having the same structure as in (1) was assembled, and this semiconductor device was connected in series to a load and a breaker in the same manner as in Example 1 to form the electric circuit of FIG.
しかして、上記実施例1及び比較例1の電気回路につい
て220V、5.0kAの短絡電流による短絡試験を行なった。
その結果、本実施例1の場合には短絡電流を1.2kAまで
限流され、しかこ電流時間積(I2・t)は1900A2・sec
と抑制され限流効果があった。これに対し、比較例1の
場合には実施例1と同様、短絡電流を1.2kAまで限流さ
れ、しかも電流時間積(I2・t)は1900A2・secと抑制
され限流効果があった。Then, a short circuit test was performed on the electric circuits of Example 1 and Comparative Example 1 described above by a short circuit current of 220 V and 5.0 kA.
As a result, in the case of the first embodiment, the short-circuit current is limited to 1.2 kA, and the current time product (I 2 · t) is 1900 A 2 · sec.
It was suppressed and there was a current limiting effect. On the other hand, in the case of Comparative Example 1, as in Example 1, the short-circuit current was limited to 1.2 kA, and the current-time product (I 2 · t) was suppressed to 1900 A 2 · sec, which had a current limiting effect. It was
また、本実施例1及び比較例1の電気回路について通電
容量を調べるために40Aの電流を通電し、限流素子の温
度上昇を調べた。その結果、本実施例1の場合には1時
間の通電で25℃までしか温度上昇せず、充分満足する通
電容量があることが確認された。これに対し、比較例1
の場合には同電流を20分間通電した時点で70℃まで上昇
し、満足な通電容量が得られなかった。Further, in order to examine the current carrying capacity of the electric circuits of Example 1 and Comparative Example 1, a current of 40 A was applied and the temperature rise of the current limiting element was examined. As a result, in the case of the present Example 1, it was confirmed that the temperature rises only to 25 ° C. in one hour of energization, and that there is a sufficient energizing capacity. On the other hand, Comparative Example 1
In the case of, the current increased to 70 ° C when the same current was applied for 20 minutes, and a satisfactory current carrying capacity was not obtained.
実施例2 第3図に示す絶縁製筒状容器11と、この容器11の両端部
に連結された凸状端子12a及び凹状端子12bと、この凹状
端子12b内に所定の空間をあけて装入されるピストン13
と、前記容器11内に封入され、前記ピストン13により押
圧されるHg14とから構成される限流素子(抵抗;5mΩ)
を用いた以外、実施例1と同様な半導体装置をを組立
て、この半導体装置を実施例1と同様に負荷、ブレーカ
に直列接続して第2図の電気回路を構成した。Example 2 An insulating cylindrical container 11 shown in FIG. 3, a convex terminal 12a and a concave terminal 12b connected to both ends of the container 11, and a predetermined space in the concave terminal 12b. Piston 13
And a current limiting element (resistance: 5 mΩ) which is enclosed in the container 11 and Hg14 which is pressed by the piston 13.
2 was constructed by assembling a semiconductor device similar to that of Example 1 and connecting this semiconductor device in series with a load and a breaker as in Example 1.
比較例2 放熱フィン及び冷却用ファンを用いない以外、実施例2
と同様な構成の半導体装置を組立て、この半導体装置を
実施例1と同様に負荷、ブレーカに直列接続して第2図
の電気回路を構成した。Comparative Example 2 Example 2 except that the radiation fin and the cooling fan were not used.
A semiconductor device having the same structure as in (1) was assembled, and this semiconductor device was connected in series to a load and a breaker in the same manner as in Example 1 to form the electric circuit of FIG.
しかして、上記実施例2及び比較例2の電気回路につい
て実施例1と同様な短絡試験を行なった。その結果、本
実施例2の場合には短絡電流を1kAまで限流され、しか
も電流時間積(I2・t)は1500A2・secと抑制され限流
効果があった。これに対し、比較例2の場合には実施例
2と同様、短絡電流を1kAまで限流され、しかも電流時
間積(I2・t)は1500A2・secと抑制され限流効果があ
った。Then, the same short circuit test as in Example 1 was performed on the electric circuits of Example 2 and Comparative Example 2 described above. As a result, in the case of Example 2, the short-circuit current was limited to 1 kA, and the current-time product (I 2 · t) was suppressed to 1500 A 2 · sec, resulting in the current limiting effect. On the other hand, in the case of Comparative Example 2, as in Example 2, the short-circuit current was limited to 1 kA, and the current-time product (I 2 · t) was suppressed to 1500 A 2 · sec, which had a current limiting effect. .
また、本実施例2及び比較例2の電気回路について通電
容量を調べるために40Aの電流を通電し、限流素子の温
度上昇を調べた。その結果、本実施例2の場合には1時
間の通電で20℃までしか温度上昇せず、充分満足する通
電容量があることが確認された。これに対し、比較例1
の場合には同電流を30分間通電した時点で70℃まで上昇
し、満足な通電容量が得られなかった。In addition, in order to check the current carrying capacity of the electric circuits of Example 2 and Comparative Example 2, a current of 40 A was applied and the temperature rise of the current limiting element was examined. As a result, in the case of Example 2, it was confirmed that the temperature rises only up to 20 ° C. in one hour of energization, and that there is a sufficient energizing capacity. On the other hand, Comparative Example 1
In the case of No. 3, when the same current was applied for 30 minutes, the temperature rose to 70 ° C and a satisfactory current carrying capacity was not obtained.
なお、上記実施例ではパワー半導体素子として半導体ス
イッチを例にして説明したが、半導体整流素子等の保護
にも同様に適用できるものである。Although the semiconductor switch has been described as an example of the power semiconductor element in the above-described embodiment, it can be similarly applied to protection of a semiconductor rectifying element and the like.
[発明の効果] 以上詳述した如く、本発明によれば短絡電流等の過電が
流れても半導体素子を確実に保護し、しかも復帰を簡単
に行なうことが可能で、更に発熱を生じる限流素子及び
半導体素子を効果的に放熱して充分に満足な通電容量を
確保し得る高信頼性でコンパクトな半導体装置を提供で
きる。[Effects of the Invention] As described in detail above, according to the present invention, even if an overcurrent such as a short-circuit current flows, the semiconductor element can be reliably protected, and the recovery can be easily performed. It is possible to provide a highly reliable and compact semiconductor device capable of effectively radiating heat from a current element and a semiconductor element and ensuring a sufficiently satisfactory current carrying capacity.
第1図は本発明の半導体装置を示す概略図、第2図は本
発明の半導体装置を組込んだ電気回路を示す回路図、第
3図は本発明の半導体装置に用いる限流素子の一例を示
す断面図である。 1……半導体装置、2……放熱フィン、3……半導体素
子(半導体スイッチ)、4……限流素子、5……リード
端子、6……冷却用ファン、7……負荷、8……ブレー
カ、11……絶縁性筒状容器、14……Hg。FIG. 1 is a schematic view showing a semiconductor device of the present invention, FIG. 2 is a circuit diagram showing an electric circuit incorporating the semiconductor device of the present invention, and FIG. 3 is an example of a current limiting element used in the semiconductor device of the present invention. FIG. 1 ... Semiconductor device, 2 ... Radiating fin, 3 ... Semiconductor element (semiconductor switch), 4 ... Current limiting element, 5 ... Lead terminal, 6 ... Cooling fan, 7 ... Load, 8 ... Breaker, 11 ... Insulating cylindrical container, 14 ... Hg.
Claims (5)
接続し、かつ同一の放熱フィンに固定し、前記放熱フィ
ンに冷却ファンを付設したことを特徴とする半導体装
置。1. A semiconductor device in which a semiconductor element and a current limiting element are electrically connected in series and fixed to the same radiation fin, and a cooling fan is attached to the radiation fin.
昇するセラミックス系のものであることを特徴とする特
許請求の範囲第1項記載の半導体装置。2. The semiconductor device according to claim 1, wherein the current limiting element is of a ceramic type whose resistance rapidly increases with a rise in temperature.
AはCr、Al、Scのうちの少なくとも一種、xは0≦x≦
0.02の範囲の数値を示す]にて表わされる組成からなる
ことを特徴とする特許請求の範囲第2項記載の半導体装
置。3. A current limiting element is (V 1-x A x ) 2 O 3 [wherein A is at least one of Cr, Al and Sc, and x is 0 ≦ x ≦
A semiconductor device according to claim 2, wherein the semiconductor device has a composition represented by a numerical value in the range of 0.02].
封入され、固体→液体→気体への相変態により抵抗が急
上昇する金属とから構成されていることを特徴とする特
許請求の範囲第1項記載の半導体装置。4. The current limiting element comprises an insulating container and a metal which is enclosed in the container and whose resistance rapidly increases due to a phase transformation from solid to liquid to gas. 2. A semiconductor device according to claim 1.
又はこれらの合金からなることを特徴とする特許請求の
範囲第4項記載の半導体装置。5. The metal is Hg, Na, K, Cd, Zn, In, Sn, Pb.
Alternatively, the semiconductor device according to claim 4, which is made of an alloy of these.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30566686A JPH0687489B2 (en) | 1986-12-22 | 1986-12-22 | Semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30566686A JPH0687489B2 (en) | 1986-12-22 | 1986-12-22 | Semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63157448A JPS63157448A (en) | 1988-06-30 |
| JPH0687489B2 true JPH0687489B2 (en) | 1994-11-02 |
Family
ID=17947886
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30566686A Expired - Fee Related JPH0687489B2 (en) | 1986-12-22 | 1986-12-22 | Semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0687489B2 (en) |
-
1986
- 1986-12-22 JP JP30566686A patent/JPH0687489B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63157448A (en) | 1988-06-30 |
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