JPH0688770B2 - Monosilane manufacturing method - Google Patents
Monosilane manufacturing methodInfo
- Publication number
- JPH0688770B2 JPH0688770B2 JP10989085A JP10989085A JPH0688770B2 JP H0688770 B2 JPH0688770 B2 JP H0688770B2 JP 10989085 A JP10989085 A JP 10989085A JP 10989085 A JP10989085 A JP 10989085A JP H0688770 B2 JPH0688770 B2 JP H0688770B2
- Authority
- JP
- Japan
- Prior art keywords
- catalyst
- monosilane
- reaction
- present
- anion exchange
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Silicon Compounds (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明はアルコキシシランを原料としてモノシランを製
造する方法に関するものである。TECHNICAL FIELD The present invention relates to a method for producing monosilane from an alkoxysilane as a raw material.
モノシランは半導体用高純度シリコン原料として使用さ
れるほか、アモルフアス−シリコン感光体、太陽電池、
ニユーセラミツクス材料等の原料として広範に使用され
ている。Monosilane is used as a high-purity silicon raw material for semiconductors, as well as amorphous silicon photoconductors, solar cells,
It is widely used as a raw material for New Ceramics materials.
従来よりモノシランの製造法に関しては数多くの提案が
なされている。特公昭51−20040には、モノシランを製
造するための最も有力な方法の1つとして、ナトリウム
エトキシドを触媒として、トリエトキシシランを不均化
する方法が記載されている。Many proposals have hitherto been made regarding a method for producing monosilane. Japanese Examined Patent Publication No. 51-20040 describes a method of disproportionating triethoxysilane using sodium ethoxide as a catalyst, as one of the most effective methods for producing monosilane.
〔発明が解決しようとする問題点〕 この方法は触媒効率が極めて高い等の優れた特徴をもつ
ものであるが、触媒反応を液相媒体中で実施するため、
触媒が副生物質等(テトラエトキシシラン等)に溶解
し、触媒と副生物質との分離が必ずしも容易でない等の
問題点がある。尚、この反応は前記式から明らかなよう
に、副生物質が多量に生成するが、この副生物質は種々
ケイ素化合物の原料、例えば高純度ケイ素の原料として
有用であり、触媒を除去することが必要である。 [Problems to be Solved by the Invention] Although this method has excellent characteristics such as extremely high catalytic efficiency, since the catalytic reaction is carried out in a liquid phase medium,
There is a problem that the catalyst is dissolved in a by-product substance (tetraethoxysilane etc.), and it is not always easy to separate the catalyst and the by-product substance. As is clear from the above formula, this reaction produces a large amount of by-product substances, but this by-product substance is useful as a raw material for various silicon compounds, for example, a raw material for high-purity silicon. is necessary.
本発明の目的は原料のアルコキシシランからモノシラン
を効率よく製造し得、かつ反応生成物から触媒を容易に
分離できるモノシランの製造方法を提供するにある。An object of the present invention is to provide a method for producing monosilane, which can efficiently produce monosilane from a raw material alkoxysilane and can easily separate a catalyst from a reaction product.
本発明者等は、前記欠点に鑑み、触媒効率が高く、かつ
反応生成物との分離操作の容易な触媒について研究した
結果、ある種の固体触媒が、この目的に合致するもので
ある事を見出し本発明に到達した。In view of the above-mentioned drawbacks, the present inventors have studied a catalyst having a high catalyst efficiency and an easy separation operation from a reaction product, and as a result, a certain kind of solid catalyst is found to meet this purpose. Heading The invention has been reached.
すなわち、本発明は陰イオン交換樹脂よりなる触媒の存
在下に一般式(I)で示されるアルコキシシランを不均
化して HnSi(OR)4-n……(I) (式中、Rは炭素数1〜6のアルキル基、nは1、2あ
るいは3を表わす) モノシランを製造する方法に存する。That is, the present invention disproportionates an alkoxysilane represented by the general formula (I) in the presence of a catalyst composed of an anion exchange resin to produce H n Si (OR) 4-n (I) (wherein R Represents an alkyl group having 1 to 6 carbon atoms, and n represents 1, 2 or 3).
以下に、本発明を詳細に説明する。The present invention will be described in detail below.
本発明において使用される原料であるところのアルコキ
シシランは、例えば特開昭54−163529、特開昭55−7689
に記載の方法等により容易に調製される。Alkoxysilanes, which are the raw materials used in the present invention, are, for example, JP-A Nos. 54-163529 and 55-7689.
It is easily prepared by the method described in 1.
本発明方法における不均化反応は、陰イオン交換樹脂を
触媒として使用し実施される。The disproportionation reaction in the method of the present invention is carried out using an anion exchange resin as a catalyst.
ここで云う陰イオン交換樹脂とは、三次元に重合した高
分子基体に、交換基として1〜3級のアミンまたは、4
級アンモニウム基を結合させた樹脂であり、高分子基体
の代表的なものとしては、スチレンとジビニルベンゼン
との共重合体がある。The anion exchange resin referred to herein is a polymer substrate polymerized in a three-dimensional manner, with a primary to tertiary amine or 4 as an exchange group.
A resin having a quaternary ammonium group bonded thereto, and a typical polymer substrate is a copolymer of styrene and divinylbenzene.
イオン交換樹脂に於ては、共重合体の架橋度によつて架
橋度8%以下の低架橋度樹脂とそれ以上の高架橋度樹脂
に分類されるが、本発明ではそのいずれもが使用でき
る。また構造的に多孔度によつてゲル状、ポーラス状、
ハイポーラス状の形状に分類されるが、本発明ではその
いずれもが使用できる。また一般的に入手出来る陰イオ
ン交換樹脂は、科学的に安定なCl塩(R−N・Cl)形で
あり、通常使用に際してNaOH溶液を用いてOH塩(R−N
・OH)形に再生するが、本発明方法では、Cl塩形でも、
OH塩形でも何等さしつかえない。Ion-exchange resins are classified into low-crosslinking resins having a crosslinking degree of 8% or less and high-crosslinking resins having a crosslinking degree of more than 8%, depending on the crosslinking degree of the copolymer, and any of them can be used in the present invention. Further, structurally, depending on the porosity, gel, porous,
Although classified into a high-porous shape, any of them can be used in the present invention. The anion exchange resin that is generally available is a chemically stable Cl salt (RN-Cl) type, and when used normally, an OH salt (RN
・ OH) form, but in the method of the present invention, even in the Cl salt form,
OH salt form can be used.
市販の陰イオン交換樹脂の具体的例としては、三菱化成
社の製造販売品DiAiONのSA−10A、HPA−25、PA−306、W
A−20、WA−30等を挙げることができる。Specific examples of commercially available anion exchange resins include SA-10A, HPA-25, PA-306, W of DiAiON manufactured and sold by Mitsubishi Kasei.
Examples include A-20 and WA-30.
触媒としての陰イオン交換樹脂使用量は、原料アルコキ
シシランに対して、0.01重量%以上でその本来の目的を
達成する事が出来るが、通常0.1〜200重量%の範囲の条
件が採用される。The amount of the anion exchange resin used as a catalyst can achieve its original purpose by 0.01% by weight or more with respect to the raw material alkoxysilane, but a condition of 0.1 to 200% by weight is usually adopted.
反応の型式としては、懸濁回分式でも、固定床流通式で
も実施出来る。特に装置の材質に何等の制約もなく実施
出来るので好適な反応型式を自由に選択する事が出来
る。The reaction can be carried out either in a suspended batch system or a fixed bed flow system. In particular, since it can be carried out without any restriction on the material of the apparatus, a suitable reaction type can be freely selected.
反応は常圧、常温下で実施しても充分目的を達成するこ
とが可能であるが一般的には、常圧、加温下で行う方が
より好ましい。本発明による方法は、あまり温度に左右
されないが特に好ましい温度は、50°〜80℃である。The reaction can achieve the purpose sufficiently even if it is carried out at normal pressure and room temperature, but it is generally more preferable to carry out the reaction at normal pressure and under heating. The process according to the invention is less temperature-dependent, but a particularly preferred temperature is between 50 ° and 80 ° C.
反応圧力も減圧下から加圧下まで任意の圧力で実施しう
るが、生成物モノシランが空気と接触すると瞬時に着火
する事より、常圧条件が操作性に優れている。The reaction pressure may be any pressure from reduced pressure to increased pressure. However, when the product monosilane comes into contact with air, it is instantly ignited, and the normal pressure condition is excellent in operability.
本発明における原料のアルコキシシランは、単一組成で
も混合物でも何等さしつかえない。一方不均化反応生成
物の1つであるテトラメトキシシランや、他の物質、例
えばヘキサン、ヘプタン等の脂肪族飽和炭化水素や、シ
クロヘキサン等の脂環式飽和炭化水素を溶媒として共に
用いる事も出来る。The raw material alkoxysilane in the present invention may be a single composition or a mixture. On the other hand, tetramethoxysilane, which is one of the disproportionation reaction products, and other substances such as saturated aliphatic hydrocarbons such as hexane and heptane, and alicyclic saturated hydrocarbons such as cyclohexane may be used together as a solvent. I can.
反応は通常、窒素や、アルゴンの不活性ガス雰囲気下で
実施される。特に窒素の使用はモノシランを凝縮捕集す
る場合に好適である。The reaction is usually carried out under an inert gas atmosphere of nitrogen or argon. In particular, the use of nitrogen is suitable for condensing and collecting monosilane.
次に本発明方法を実施例により更に具体的に説明する
が、本発明はその要旨をこえない限り以下の実施例に限
定されるものでない。Next, the method of the present invention will be described more specifically by way of examples, but the present invention is not limited to the following examples unless it exceeds the gist.
実施例1 攪拌翼、窒素ガス導入管、冷却管付ガス排出管及び液仕
込み管を備えた、100ml内容積の耐圧ガラスオートクレ
ーブに、触媒として予め、加温下窒素気流で乾燥した三
菱化成社製DiAiON−WA−30の陰イオン交換樹脂3.5gを仕
込み、充分窒素でオートクレーブ系内を置換した。しか
る後トリメトキシシラン0.2moleを室温下、液仕込み管
より添加し攪拌を開始した。Example 1 A pressure-resistant glass autoclave having an internal volume of 100 ml, equipped with a stirring blade, a nitrogen gas introduction pipe, a gas discharge pipe with a cooling pipe, and a liquid charging pipe, was previously dried as a catalyst in a nitrogen stream under heating and manufactured by Mitsubishi Kasei 3.5 g of DiAiON-WA-30 anion exchange resin was charged, and the inside of the autoclave system was sufficiently replaced with nitrogen. Thereafter, 0.2 mole of trimethoxysilane was added from a liquid charging tube at room temperature and stirring was started.
反応は室温下、触媒とトリメトキシシランが接触した時
点より起りモノシランが生成し、その後70℃に加温し、
モノシランが生成しなくなるまで1時間実施した。生成
モノシランは経時的にガスクロマトグラフイーで定量し
た。その結果、トリメトキシシランの転換率97.5mole
%、モノシラン生成0.0487moleであつた。The reaction occurs at room temperature from the time when the catalyst and trimethoxysilane come into contact with each other, monosilane is produced, and then heated to 70 ° C,
It was carried out for 1 hour until monosilane was not produced. The produced monosilane was quantified by gas chromatography over time. As a result, the conversion of trimethoxysilane was 97.5mole.
%, Monosilane formation was 0.0487 mole.
尚、反応後、反応生成物を過し、触媒を分離した。触
媒は原料及び反応生成物に不溶であり、分離は容易であ
る。After the reaction, the reaction product was passed and the catalyst was separated. The catalyst is insoluble in the raw materials and reaction products, and can be easily separated.
実施例2〜3 実施例1において実施した方法で、陰イオン交換樹脂の
種類(いずれも三菱化成社製)、量及び反応時間をかえ
て実施した結果を表−2に示す。また触媒として使用し
た陰イオン交換樹脂の物性を表−1に示す。Examples 2 to 3 Table 2 shows the results obtained by changing the type of anion exchange resin (all manufactured by Mitsubishi Kasei Co., Ltd.), the amount and the reaction time by the method used in Example 1. Table 1 shows the physical properties of the anion exchange resin used as a catalyst.
尚、用いたそれぞれの陰イオン交換樹脂は原料及び反応
生成物に不溶であり、反応生成物を過することにより
触媒は容易に分離することができた。Each anion exchange resin used was insoluble in the raw material and the reaction product, and the catalyst could be easily separated by passing the reaction product.
〔効果〕 本発明方法によれば、上記したようにアルコキシシラン
からモノシランを容易に得ることができる。しかも本発
明で使用する触媒は反応生成物に実質的に不溶であり、
反応生成物からの分離は極めて容易である。反応生成物
(副生物質)は種々のケイ素製品の原料、例えば光フア
イバー、IC封止剤、IC用器具、フオトマスク等の用途に
用いられる高純度ケイ素の原料として有用であり、触媒
の分離が容易なことは工業的に意義が大きい。 [Effect] According to the method of the present invention, monosilane can be easily obtained from alkoxysilane as described above. Moreover, the catalyst used in the present invention is substantially insoluble in the reaction product,
Separation from the reaction product is extremely easy. Reaction products (by-products) are useful as raw materials for various silicon products, for example, raw materials for high-purity silicon used for applications such as optical fibers, IC sealants, IC devices, photomasks, etc. Easy is industrially significant.
Claims (1)
を触媒の存在下に HnSi(OR)4-n……(I) (式中、Rは炭素数1〜6のアルキル基、nは1、2あ
るいは3を表わす。) 不均化してモノシランを製造する方法において、触媒と
して陰イオン交換樹脂を使用する事を特徴とするモノシ
ランの製法。1. An alkoxysilane represented by general formula (I) in the presence of a catalyst, H n Si (OR) 4-n (I) (wherein R is an alkyl group having 1 to 6 carbon atoms, n represents 1, 2 or 3.) A process for producing monosilane by disproportionation, which comprises using an anion exchange resin as a catalyst.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10989085A JPH0688770B2 (en) | 1985-05-22 | 1985-05-22 | Monosilane manufacturing method |
| US06/860,572 US4667047A (en) | 1985-05-16 | 1986-05-07 | Method for producing monosilane and a tetraalkoxysilane |
| DE8686106556T DE3686508T2 (en) | 1985-05-16 | 1986-05-14 | METHOD FOR THE PRODUCTION OF MONOSILANE AND A TETRAAL COXYSILANE. |
| EP86106556A EP0201919B1 (en) | 1985-05-16 | 1986-05-14 | Method for producing monosilane and a tetraalkoxysilane |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10989085A JPH0688770B2 (en) | 1985-05-22 | 1985-05-22 | Monosilane manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61270206A JPS61270206A (en) | 1986-11-29 |
| JPH0688770B2 true JPH0688770B2 (en) | 1994-11-09 |
Family
ID=14521749
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10989085A Expired - Lifetime JPH0688770B2 (en) | 1985-05-16 | 1985-05-22 | Monosilane manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0688770B2 (en) |
-
1985
- 1985-05-22 JP JP10989085A patent/JPH0688770B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61270206A (en) | 1986-11-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |