JPH0690539B2 - Electrophotographic photoreceptor - Google Patents
Electrophotographic photoreceptorInfo
- Publication number
- JPH0690539B2 JPH0690539B2 JP27441589A JP27441589A JPH0690539B2 JP H0690539 B2 JPH0690539 B2 JP H0690539B2 JP 27441589 A JP27441589 A JP 27441589A JP 27441589 A JP27441589 A JP 27441589A JP H0690539 B2 JPH0690539 B2 JP H0690539B2
- Authority
- JP
- Japan
- Prior art keywords
- weight
- parts
- layer
- protective layer
- surface protective
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
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- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 150000001716 carbazoles Chemical class 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000004770 chalcogenides Chemical class 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- XCIXKGXIYUWCLL-UHFFFAOYSA-N cyclopentanol Chemical compound OC1CCCC1 XCIXKGXIYUWCLL-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 150000002220 fluorenes Chemical class 0.000 description 1
- 150000008376 fluorenones Chemical class 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 239000012433 hydrogen halide Substances 0.000 description 1
- 229910000039 hydrogen halide Inorganic materials 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229940097275 indigo Drugs 0.000 description 1
- COHYTHOBJLSHDF-UHFFFAOYSA-N indigo powder Chemical class N1C2=CC=CC=C2C(=O)C1=C1C(=O)C2=CC=CC=C2N1 COHYTHOBJLSHDF-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 150000002475 indoles Chemical class 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- CTAPFRYPJLPFDF-UHFFFAOYSA-N isoxazole Chemical compound C=1C=NOC=1 CTAPFRYPJLPFDF-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- XHNQXIBDPQINOF-UHFFFAOYSA-N n-(9h-carbazol-1-yl)fluoren-9-imine Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NC1=CC=CC2=C1NC1=CC=CC=C12 XHNQXIBDPQINOF-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000006396 nitration reaction Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 150000004866 oxadiazoles Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 125000002080 perylenyl group Chemical class C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 229920002382 photo conductive polymer Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 1
- 150000003219 pyrazolines Chemical class 0.000 description 1
- RQGPLDBZHMVWCH-UHFFFAOYSA-N pyrrolo[3,2-b]pyrrole Chemical class C1=NC2=CC=NC2=C1 RQGPLDBZHMVWCH-UHFFFAOYSA-N 0.000 description 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical class C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229920001909 styrene-acrylic polymer Polymers 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- NLDYACGHTUPAQU-UHFFFAOYSA-N tetracyanoethylene Chemical group N#CC(C#N)=C(C#N)C#N NLDYACGHTUPAQU-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- VLLMWSRANPNYQX-UHFFFAOYSA-N thiadiazole Chemical compound C1=CSN=N1.C1=CSN=N1 VLLMWSRANPNYQX-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 230000002087 whitening effect Effects 0.000 description 1
Landscapes
- Photoreceptors In Electrophotography (AREA)
Description
【発明の詳細な説明】 〈産業上の利用分野〉 この発明は電子写真感光体に関し、より詳細には、表面
保護層を有する電子写真感光体に関するものである。DETAILED DESCRIPTION OF THE INVENTION <Field of Industrial Application> The present invention relates to an electrophotographic photoreceptor, and more particularly to an electrophotographic photoreceptor having a surface protective layer.
〈従来の技術〉 いわゆるカールソンプロセスを利用した、複写機等の画
像形成装置においては、導電性を有する基材上に感光層
を形成した電子写真感光体が用いられている。<Prior Art> In an image forming apparatus such as a copying machine utilizing a so-called Carlson process, an electrophotographic photoreceptor having a photosensitive layer formed on a conductive base material is used.
電子写真感光体は、画像形成プロセス時に電気的、光学
的、機械的な衝撃を繰返し受けるので、これら衝撃に対
する耐久性を向上させる等の目的で、感光層の上に、結
着樹脂からなる表面保護層を積層することが行われてい
る。The electrophotographic photosensitive member is repeatedly subjected to electrical, optical and mechanical shocks during the image forming process. Therefore, for the purpose of improving durability against these shocks, a surface made of a binder resin is formed on the photosensitive layer. Laminating a protective layer is performed.
結着樹脂としては、表面保護層の硬度を向上させるた
め、熱硬化性シリコーン樹脂が主として用いられる。し
かし、上記熱硬化性シリコーン樹脂単独では、摺動摩擦
に対して脆く、損傷を受けやすい等の問題がある。As the binder resin, a thermosetting silicone resin is mainly used in order to improve the hardness of the surface protective layer. However, the thermosetting silicone resin alone has problems that it is brittle against sliding friction and is easily damaged.
そこで、表面保護層の結着樹脂として熱硬化性シリコー
ン樹脂と、ポリ酢酸ビニル等の熱可塑性樹脂とを併用し
た電子写真感光体(特開昭63-18354号公報参照)や、熱
硬化性シリコーン樹脂とアクリル系重合体とを併用した
電子写真感光体が提案されている(特開昭60-3639号公
報参照)。Therefore, an electrophotographic photosensitive member (see JP-A-63-18354) using a thermosetting silicone resin as a binder resin for the surface protective layer and a thermoplastic resin such as polyvinyl acetate, or a thermosetting silicone An electrophotographic photosensitive member using a resin and an acrylic polymer in combination has been proposed (see JP-A-60-3639).
〈発明が解決しようとする課題〉 しかしながら、前者の併用系においては、感光体の感度
が十分でなく、また、熱硬化性シリコーン樹脂単独の場
合に比べて表面硬度が低く、却って損傷を受けやすい
等、表面保護層の物性の面で問題がある他、特に熱硬化
性シリコーン樹脂にポリ酢酸ビニルを併用した系では、
表面保護層を形成するための塗布液が安定性に欠け、ポ
ットライフを過ぎると膜の白化が生じるという問題もあ
った。<Problems to be Solved by the Invention> However, in the former combination system, the sensitivity of the photoconductor is not sufficient, and the surface hardness is low as compared with the case of using the thermosetting silicone resin alone, and it is rather easily damaged. Etc., there is a problem in terms of the physical properties of the surface protective layer, and especially in a system in which polyvinyl acetate is used in combination with a thermosetting silicone resin,
There is also a problem that the coating solution for forming the surface protective layer lacks stability, and whitening of the film occurs after the pot life.
一方、後者の併用系では、光学特性に優れると共に、ポ
リ酢酸ビニルよりも、熱硬化性シリコーン樹脂に対する
相溶性が優れたアクリル系重合体を使用しているため、
前記ポリ酢酸ビニルの併用系よりも感光特性を向上する
ことができる。しかし、上記併用系のアクリル系重合体
は、平均分子量が8000〜60000の高分子量のものである
ため、塗布液中への溶解が容易でない。このため、上記
アクリル系重合体の塗布液中への溶解が不充分である
と、均一な層を形成できず、ムラ、白濁等が生じて、表
面保護層の透明性が悪くなり、感光体の感光特性が悪化
したり、或いは、表面保護層の強度が低下して、摺動摩
擦に対して脆くなったり、クラックが発生し易くなった
りするという問題がある。On the other hand, the latter combination system uses an acrylic polymer having excellent optical properties and compatibility with a thermosetting silicone resin, which is superior to polyvinyl acetate.
The photosensitivity can be improved as compared with the combined use system of polyvinyl acetate. However, since the above-mentioned combination type acrylic polymer has a high molecular weight of 8,000 to 60,000, it cannot be easily dissolved in the coating liquid. Therefore, if the acrylic polymer is insufficiently dissolved in the coating liquid, a uniform layer cannot be formed, resulting in unevenness, turbidity, etc., resulting in poor transparency of the surface protective layer. There is a problem in that the photosensitive characteristics of No. 1 are deteriorated, or the strength of the surface protective layer is reduced, so that the surface becomes brittle against sliding friction and cracks easily occur.
この発明は、以上の事情に鑑みてなされたものであっ
て、電子写真感光体の感光特性、物性等に悪影響を与え
ることなく、しかも熱硬化性シリコーン樹脂単独の場合
に比べて摺動摩擦に対する脆さ等が改善された表面保護
層を有する電子写真感光体を提供することを目的として
いる。The present invention has been made in view of the above circumstances, and does not adversely affect the photosensitive characteristics and physical properties of the electrophotographic photosensitive member, and is more fragile to sliding friction than the case of using a thermosetting silicone resin alone. It is an object of the present invention to provide an electrophotographic photosensitive member having a surface protective layer with improved roughness and the like.
〈課題を解決するための手段および作用〉 上記課題を解決するための、この発明の電子写真感光体
は、熱硬化性シリコーン樹脂と、平均分子量6000以下の
アクリル系重合体とを、熱硬化性シリコーン樹脂の非揮
発性固形分100重量部に対してアクリル系重合体0.1〜30
重量部の割合で含有する塗布液を感光層上に塗布し、硬
化させてなる表面保護層を有することを特徴としてい
る。<Means and Actions for Solving the Problems> In order to solve the above problems, the electrophotographic photoreceptor of the present invention comprises a thermosetting silicone resin and an acrylic polymer having an average molecular weight of 6000 or less. Acrylic polymer 0.1 to 30 per 100 parts by weight of non-volatile solid content of silicone resin
It is characterized in that it has a surface protective layer formed by applying a coating liquid contained in a proportion of parts by weight onto the photosensitive layer and curing it.
また、上記表面保護層には、導電性付与剤としての導電
性金属酸化物粒子のコロイド溶液を塗布液に混和させる
ことによって、当該導電性金属酸化物粒子が均一に分散
されていることが好ましい。Further, it is preferable that the conductive metal oxide particles are uniformly dispersed in the surface protective layer by mixing a colloidal solution of conductive metal oxide particles as a conductivity imparting agent with the coating liquid. .
上記構成からなる、この発明の電子写真感光体において
は、塗布液中に含有されるアクリル系重合体の平均分子
量が6000以下と小さいため、従来のものに比べて塗布液
中への溶解が容易であり、形成される表面保護層は、均
一で、光学特性、並びに物性に優れたものとなる。In the electrophotographic photoreceptor of the present invention having the above-mentioned constitution, the average molecular weight of the acrylic polymer contained in the coating liquid is as small as 6000 or less, so that it is easily dissolved in the coating liquid as compared with the conventional one. The surface protective layer formed is uniform and has excellent optical characteristics and physical properties.
なお、塗布液中における、熱硬化性シリコーン樹脂の非
揮発性固形分100重量部に対する、上記アクリル系重合
体の含有量が0.1〜30重量部に限定されるのは、下記の
理由による。すなわち、アクリル系重合体の含有量が0.
1重量部未満では、アクリル系重合体の添加効果が十分
に得られず、硬化後の表面保護層に、クラックや、摺動
摩擦に対する脆さ等の、物性の悪化が生じる。一方、ア
クリル系重合体の含有量が30重量部を超えると、塗布液
中への溶解が困難になってムラが生じ、表面保護層の透
明性が悪くなって、感光体の感光特性が悪化する。上記
アクリル系重合体の含有量は0.1〜15重量部であること
がより好ましい。The reason why the content of the acrylic polymer is limited to 0.1 to 30 parts by weight with respect to 100 parts by weight of the nonvolatile solid content of the thermosetting silicone resin in the coating liquid is as follows. That is, the content of the acrylic polymer is 0.
If the amount is less than 1 part by weight, the effect of adding the acrylic polymer is not sufficiently obtained, and the cured surface protective layer is deteriorated in physical properties such as cracks and brittleness against sliding friction. On the other hand, when the content of the acrylic polymer exceeds 30 parts by weight, it becomes difficult to dissolve it in the coating liquid and unevenness occurs, the transparency of the surface protective layer deteriorates, and the photosensitive characteristics of the photoreceptor deteriorate. To do. The content of the acrylic polymer is more preferably 0.1 to 15 parts by weight.
塗布液中に含有される熱硬化性シリコーン樹脂は、テト
ラアルコキシシラン、トリアルコキシアルキルシラン、
ジアルコキシジアルキルシラン等のオルガノシラン、ト
リクロルアルキルシラン、ジクロルジアルキルシラン等
のオルガノハロゲンシランなど、シラン系化合物の、単
独または2種以上の混合物の加水分解物(いわゆるオル
ガノポリシロキサン)、またはその初期縮合反応物を非
揮発性固形分として、溶媒中に溶解または分散させたも
ので、シラン化合物のアルコキシ基、アルキル基として
は、メトキシ基、エトキシ基、イソプロポキシ基、t−
ブトキシ基、グリシドキシ基、メチル、エチル等の、炭
素数1〜4程度の低級基が挙げられる。The thermosetting silicone resin contained in the coating liquid is tetraalkoxysilane, trialkoxyalkylsilane,
A hydrolyzate (so-called organopolysiloxane) of a silane compound such as an organosilane such as dialkoxydialkylsilane, a trichloroalkylsilane, an organohalogensilane such as a dichlorodialkylsilane, or a mixture thereof (so-called organopolysiloxane), or an initial stage thereof. The condensation reaction product is dissolved or dispersed in a solvent as a non-volatile solid content, and the alkoxy group and the alkyl group of the silane compound include a methoxy group, an ethoxy group, an isopropoxy group, and t-
Examples thereof include lower groups having about 1 to 4 carbon atoms such as butoxy group, glycidoxy group, methyl and ethyl.
上記熱硬化性シリコーン樹脂と併用されるアクリル系重
合体としては、メチルアクリレート、メチルメタクリレ
ート、エチルアクリレート、エチルメタクリレート、ブ
チルアクリレート、ブチルメタクリレート等のアクリル
系モノマーからなるホモポリマーまたはコポリマーが挙
げられる。上記アクリル系重合体の平均分子量が6000以
下に限定されるのは、平均分子量が6000を超えると、前
述したように、塗布液中への溶解性が低下して、均一な
膜を形成できなくなる。Examples of the acrylic polymer used in combination with the thermosetting silicone resin include homopolymers or copolymers of acrylic monomers such as methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, butyl acrylate, and butyl methacrylate. The average molecular weight of the acrylic polymer is limited to 6000 or less, when the average molecular weight exceeds 6000, as described above, the solubility in the coating liquid is reduced, it is not possible to form a uniform film .
上記熱硬化性シリコーン樹脂およびアクリル系重合体を
溶解または分散して、表面保護層用の塗布液を構成する
溶媒としては、例えばイソプロピルアルコール;n−ヘキ
サン、オクタン、シクロヘキサン等の脂肪族系炭化水
素;ベンゼン、トルエン、キシレン等の芳香族炭化水
素;ジクロロメタン、ジクロロエタン、四塩化炭素、ク
ロロベンゼン等のハロゲン化炭化水素;ジメチルエーテ
ル、ジエチルエーテル、テトラヒドロフラン、エチレン
グリコールジメチルエーテル、エチレングリコールジエ
チルエーテル、ジエチレングリコールジメチルエーテル
等のエーテル類;アセトン、メチルエチルケトン、シク
ロヘキサノン等のケトン類;酢酸エチル、酢酸メチル等
のエステル類;ジメチルホルムアミド;ジメチルスルホ
キシド等が挙げられ、これらが単独で、または二種以上
混合して使用される。As the solvent constituting the coating solution for the surface protective layer by dissolving or dispersing the thermosetting silicone resin and the acrylic polymer, for example, isopropyl alcohol; n-hexane, octane, aliphatic hydrocarbons such as cyclohexane Aromatic hydrocarbons such as benzene, toluene, xylene; halogenated hydrocarbons such as dichloromethane, dichloroethane, carbon tetrachloride, chlorobenzene; ethers such as dimethyl ether, diethyl ether, tetrahydrofuran, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether Ketones such as acetone, methyl ethyl ketone and cyclohexanone; esters such as ethyl acetate and methyl acetate; dimethylformamide; dimethyl sulfoxide and the like, These are used alone or in two or more.
上記熱硬化性シリコーン樹脂およびアクリル系重合体を
含有する表面保護層用の塗布液は、条件によっては触媒
を用いなくても、加熱するだけで硬化させることができ
るが、通常、硬化反応をスムーズ且つ均一に完結させる
ために触媒を用いる場合が多い。The coating solution for the surface protective layer containing the thermosetting silicone resin and the acrylic polymer can be cured by heating without a catalyst depending on the conditions, but usually the curing reaction is smooth. In addition, a catalyst is often used in order to achieve uniform completion.
硬化用触媒としては、無機酸または有機酸、アミン類な
どのアルカリ等、種々のものを使用することができる。
また、必要に応じて、従来公知の硬化助剤等を併用する
こともできる。As the curing catalyst, various ones such as inorganic acids or organic acids, alkalis such as amines, etc. can be used.
Further, if necessary, a conventionally known curing aid and the like can be used in combination.
上記両樹脂からなる表面保護層には、画像形成プロセス
における下層への電荷の注入を容易にする目的で、導電
性付与剤が分散されていることが好ましい。In the surface protective layer composed of both resins, a conductivity-imparting agent is preferably dispersed for the purpose of facilitating the injection of charges into the lower layer in the image forming process.
上記導電性付与剤としては、酸化スズ、酸化チタン、酸
化インジウム、酸化アンチモン等の単体金属酸化物や、
酸化スズと酸化アンチモンとの固溶体等の導電性金属酸
化物が挙げられる。上記導電性金属酸化物は、一般に、
微粒子状態で、硬化前の塗布液中に攪拌、混合され、塗
膜の硬化によって表面保護層中に分散されるが、微粒子
の状態では凝集し易く、塗布液中に均一に分散させるた
めに長時間の攪拌が必要となるため、前述したように、
コロイド溶液の状態で、塗布液中に混和させることが好
ましい。上記コロイド溶液においては、導電性金属酸化
物の微粒子は、それぞれの持つ表面電荷によって互いに
反発して、塗布液中における凝集が防止されるので、短
時間の攪拌、混合により、塗布液中に均一に分散させる
ことができる。The conductivity imparting agent, tin oxide, titanium oxide, indium oxide, simple metal oxides such as antimony oxide,
A conductive metal oxide such as a solid solution of tin oxide and antimony oxide can be used. The conductive metal oxide is generally
In the state of fine particles, it is stirred and mixed in the coating liquid before curing, and it is dispersed in the surface protective layer by curing the coating film, but in the state of fine particles it easily aggregates, and it takes a long time to uniformly disperse in the coating liquid. As mentioned above, since it takes time to stir,
It is preferable to mix the colloidal solution in the coating solution. In the colloidal solution, the fine particles of the conductive metal oxide repel each other due to the surface charge of each, and the aggregation in the coating liquid is prevented. Can be dispersed in.
導電性金属酸化物粒子のコロイド溶液の製造方法は、導
電性金属酸化物の種類によって異なり、例えば、五酸化
アンチモン(Sb2O5)のコロイド溶液は、無水三酸化ア
ンチモンと硝酸とを混合し、加熱後、α−ヒドロキシカ
ルボン酸と、N,N−ジメチルホルムアミド(DMF)等の有
機溶媒とをこの順に添加し、副生成物としての水を蒸留
によって除去する方法(特開昭47-11382号公報参照)
や、塩化水素等のハロゲン化水素に、エチレングリコー
ルに代表される1価或いは2価以上のアルコール、DMF
等の親水性有機溶媒およびα−ヒドロキシカルボン酸を
加え、そこへ三酸化アンチモンを分散させた状態で、過
酸化水素水によって酸化させる方法(特開昭52-38495号
公報、特開昭52-38496号公報参照)等により調製するこ
とができる。The method for producing a colloidal solution of conductive metal oxide particles depends on the type of conductive metal oxide. For example, a colloidal solution of antimony pentoxide (Sb 2 O 5 ) is prepared by mixing anhydrous antimony trioxide and nitric acid. After heating, α-hydroxycarboxylic acid and an organic solvent such as N, N-dimethylformamide (DMF) are added in this order, and water as a by-product is removed by distillation (JP-A-47-11382). (See issue)
Or hydrogen halide such as hydrogen chloride, monovalent or divalent alcohol represented by ethylene glycol, DMF
A method in which a hydrophilic organic solvent such as α-hydroxycarboxylic acid is added, and antimony trioxide is dispersed therein and then oxidized with hydrogen peroxide solution (Japanese Patent Laid-Open No. 38395/52/38495). (See Japanese Patent No. 38496) and the like.
上記五酸化アンチモンコロイド溶液を調製するための分
散媒としては、下層の感光層を侵すことがないように、
有機性の小さいメチルアルコール、エチルアルコール、
n−プロピルアルコール、イソプロピルアルコール、ブ
チルアルコール等のアルコール類を用いることが好まし
い。As a dispersion medium for preparing the antimony pentoxide colloidal solution, so as not to attack the lower photosensitive layer,
Organic small methyl alcohol, ethyl alcohol,
It is preferable to use alcohols such as n-propyl alcohol, isopropyl alcohol and butyl alcohol.
また、酸化スズ(SnO2、SnO等)と酸化アンチモン(Sb2
O5、Sb2O3等)との固溶体のコロイド溶液の場合には、例
えば第1図に示すように、固溶体粒子1の表面に、粒径
5nm以下程度の酸化ケイ素粒子2…を吸着させる方法等
により調製することができる。そして、第1図の構造に
おいては、固溶体粒子1の表面に吸着された酸化ケイ素
粒子2…が、分散媒としての極性溶媒との接触によりOH
基を生じて負に帯電することで、固溶体粒子1の表面に
電荷を持たせるようになっている。In addition, tin oxide (SnO 2 , SnO, etc.) and antimony oxide (Sb 2
In the case of a colloidal solution of a solid solution with O 5 , Sb 2 O 3 etc.), for example, as shown in FIG.
It can be prepared by a method of adsorbing silicon oxide particles 2 ... In the structure of FIG. 1, the silicon oxide particles 2 adsorbed on the surface of the solid solution particles 1 are OH when contacted with a polar solvent as a dispersion medium.
By generating a group to be negatively charged, the surface of the solid solution particle 1 is charged.
上記酸化スズと酸化アンチモンとの固溶体粒子は、通
常、酸化スズの微粒子にアンチモンをドープして形成さ
れるもので、特に限定されないが、固溶体粒子中におけ
るアンチモンの含有割合が0.001〜30重量%であること
が好ましく、5〜20重量%であることがより好ましい。
固溶体粒子中におけるアンチモンの含有割合が0.001重
量%未満の場合や、30重量%を超えた場合には、十分な
導電性が得られなくなる虞がある。The solid solution particles of tin oxide and antimony oxide are usually formed by doping tin oxide fine particles with antimony, and are not particularly limited, but the content ratio of antimony in the solid solution particles is 0.001 to 30% by weight. It is preferably present, and more preferably 5 to 20% by weight.
When the content ratio of antimony in the solid solution particles is less than 0.001% by weight or exceeds 30% by weight, sufficient conductivity may not be obtained.
また、上記固溶体粒子の粒径は特に限定されないが、10
〜20nmであることが好ましい。固溶体粒子の粒径が10nm
未満では、表面保護層の電気抵抗が大きくなり、20nmを
超えると、表面保護層の光透過率が低下する虞がある。The particle size of the solid solution particles is not particularly limited, but 10
It is preferably ˜20 nm. Particle size of solid solution particles is 10 nm
If it is less than 20 nm, the electric resistance of the surface protective layer increases, and if it exceeds 20 nm, the light transmittance of the surface protective layer may decrease.
固溶体粒子に対する酸化ケイ素の割合も特に限定されな
いが、固溶体粒子100重量部に対し10重量部以下である
ことが好ましい。固溶体粒子100重量部に対する酸化ケ
イ素の割合が10重量部を超えた場合には、十分な導電性
が得られなくなる虞がある。The ratio of silicon oxide to solid solution particles is not particularly limited, but is preferably 10 parts by weight or less with respect to 100 parts by weight of solid solution particles. When the ratio of silicon oxide to 100 parts by weight of the solid solution particles exceeds 10 parts by weight, sufficient conductivity may not be obtained.
上記固溶体粒子と共にコロイド溶液を構成する分散媒と
しては、前述したように、酸化ケイ素を負に帯電させる
ために極性溶媒が使用され、特に、保護層用塗布液との
相溶性に優れ、且つ下地層としての感光層を侵す虞のな
い、メチルアルコール、エチルアルコール、n−プロピ
ルアルコール、イソプロピルアルコール、ブチルアルコ
ール等のアルコール類が好適に使用される。As the dispersion medium that forms the colloidal solution with the solid solution particles, as described above, a polar solvent is used to negatively charge silicon oxide, and particularly, the compatibility with the protective layer coating liquid is excellent, and Alcohols, such as methyl alcohol, ethyl alcohol, n-propyl alcohol, isopropyl alcohol, and butyl alcohol, which do not damage the photosensitive layer as the base layer, are preferably used.
上記表面保護層を構成する結着樹脂には、膜の特性を損
なわない範囲で、前記以外の熱硬化性樹脂または熱可塑
性樹脂を併用することができる。前記以外の他の結着樹
脂としては、硬化性アクリル樹脂;アルキッド樹脂;不
飽和ポリエステル樹脂;ジアリルフタレート樹脂;フェ
ノール樹脂;尿素樹脂;ベンゾグアナミン樹脂;メラミ
ン樹脂;スチレン系重合体;スチレン−アクリル系共重
合体;ポリエチレン、エチレン−酢酸ビニル共重合体、
塩素化ポリエチレン、ポリプロピレン、アイオノマー等
のオレフィン系重合体;ポリ塩化ビニル;塩化ビニル−
酢酸ビニル共重合体;ポリ酢酸ビニル;飽和ポリエステ
ル;ポリアミド;熱可塑性ポリウレタン樹脂;ポリカー
ボネート;ポリアリレート;ポリスルホン;ケトン樹
脂;ポリビニルブチラール樹脂;ポリエーテル樹脂が例
示される。A thermosetting resin or a thermoplastic resin other than those described above can be used in combination with the binder resin forming the surface protective layer as long as the characteristics of the film are not impaired. Other binder resins other than the above are curable acrylic resins; alkyd resins; unsaturated polyester resins; diallyl phthalate resins; phenol resins; urea resins; benzoguanamine resins; melamine resins; styrene polymers; styrene-acrylic copolymers. Polymer; polyethylene, ethylene-vinyl acetate copolymer,
Olefinic polymers such as chlorinated polyethylene, polypropylene, ionomers; polyvinyl chloride; vinyl chloride-
Examples are vinyl acetate copolymers; polyvinyl acetate; saturated polyesters; polyamides; thermoplastic polyurethane resins; polycarbonates; polyarylates; polysulfones; ketone resins; polyvinyl butyral resins; polyether resins.
上記表面保護層には、ターフェニル、ハロナフトキノン
類、アセナフチレン等従来公知の増感剤;9−(N,N−ジ
フェニルヒドラジノ)フルオレン、9−カルバゾリルイ
ミノフルオレン等のフルオレン系化合物;導電性付与
剤;アミン系、フェノール系等の酸化防止剤、ベンゾフ
ェノン系等の紫外線吸収剤などの劣化防止剤;可塑剤な
ど、種々の添加剤を含有させることができる。In the surface protective layer, conventionally known sensitizers such as terphenyl, halonaphthoquinones, and acenaphthylene; fluorene compounds such as 9- (N, N-diphenylhydrazino) fluorene and 9-carbazolyliminofluorene; conductive materials Various additives such as a property-imparting agent; an antioxidant such as an amine-based or phenol-based agent; a deterioration inhibitor such as an ultraviolet absorber such as a benzophenone-based agent; and a plasticizer can be contained.
上記表面保護層の膜厚は、0.1〜10μm、特に2〜5μ
mの範囲内であることが好ましい。The thickness of the surface protective layer is 0.1 to 10 μm, especially 2 to 5 μm.
It is preferably within the range of m.
なお、この発明感光体は、表面保護層以外の構成につい
ては、従来と同様の材料を用い、従来同様の構成とする
ことができる。The photoreceptor of the present invention can have the same structure as the conventional one by using the same material as the conventional material except for the surface protective layer.
まず、導電性基材について述べる。First, the conductive base material will be described.
導電性基材は、電子写真感光体が組み込まれる画像形成
装置の機構、構造に対応してシート状あるいはドラム状
など、適宜の形状に形成される。また、上記導電性基材
は、全体を金属などの導電性材料で構成しても良く、基
材自体は導電性を有しない構造材料で形成し、その表面
に導電性を付与しても良い。The conductive base material is formed into an appropriate shape such as a sheet shape or a drum shape according to the mechanism and structure of the image forming apparatus in which the electrophotographic photosensitive member is incorporated. Further, the conductive base material may be entirely composed of a conductive material such as metal, or the base material itself may be formed of a structural material having no conductivity, and the surface thereof may be provided with conductivity. .
なお、前者の構造を有する導電性基材において使用され
る導電性材料としては、表面がアルマイト処理された、
または未処理のアルミニウム、銅、スズ、白金、金、
銀、バナジウム、モリブデン、クロム、カドミウム、チ
タン、ニッケル、パラジウム、インジウム、ステンレス
鋼、真鍮等の金属材料が好ましい。As the conductive material used in the conductive base material having the former structure, the surface was anodized,
Or untreated aluminum, copper, tin, platinum, gold,
A metal material such as silver, vanadium, molybdenum, chromium, cadmium, titanium, nickel, palladium, indium, stainless steel, or brass is preferable.
一方、後者の構造としては、合成樹脂製基材またはガラ
ス基材の表面に、上記例示の金属や、ヨウ化アルミニウ
ム、酸化スズ、酸化インジウム等の導電性材料からなる
薄膜が、真空蒸着法または湿式めっき法などの公知の膜
形成方法によって積層された構造、上記合成樹脂成形品
やガラス基材の表面に上記金属材料等のフィルムがラミ
ネートされた構造、上記合成樹脂成形品やガラス基材の
表面に、導電性を付与する物質が注入された構造が例示
される。On the other hand, as the latter structure, on the surface of a synthetic resin base material or a glass base material, a thin film made of a conductive material such as the above-exemplified metals or aluminum iodide, tin oxide, indium oxide, a vacuum deposition method or Structures laminated by a known film forming method such as a wet plating method, structures in which a film such as the metal material is laminated on the surface of the synthetic resin molded product or the glass substrate, the synthetic resin molded product or the glass substrate A structure in which a substance imparting conductivity is injected into the surface is exemplified.
なお、導電性基材は、必要に応じて、シランカップリン
グ剤やチタンカップリング剤などの表面処理剤で表面処
理を施し、感光層との密着性を高めても良い。The conductive base material may be subjected to a surface treatment with a surface treatment agent such as a silane coupling agent or a titanium coupling agent, if necessary, to enhance the adhesion to the photosensitive layer.
次に、導電性基材上に形成される感光層について述べ
る。Next, the photosensitive layer formed on the conductive substrate will be described.
感光層は、半導体材料や有機材料、またはこれらの複合
材料からなる下記構成のものが使用できる。The photosensitive layer may be made of a semiconductor material, an organic material, or a composite material thereof, having the following structure.
半導体材料からなる単層型の感光層。A single layer type photosensitive layer made of a semiconductor material.
結着樹脂中に電荷発生材料と電荷輸送材料とを含有す
る単層型の有機感光層。A single-layer type organic photosensitive layer containing a charge generating material and a charge transporting material in a binder resin.
結着樹脂中に電荷発生材料を含有する電荷発生層と、
結着樹脂中に電荷輸送材料を含有する電荷輸送層とから
なる積層型の有機感光層。A charge generation layer containing a charge generation material in a binder resin,
A laminated organic photosensitive layer comprising a charge transport layer containing a charge transport material in a binder resin.
半導体材料からなる電荷発生層と、上記有機の電荷輸
送層とが積層された複合型の感光層。A composite type photosensitive layer in which a charge generation layer made of a semiconductor material and the organic charge transport layer are laminated.
複合型感光層において電荷発生層として用いられると共
に、単独でも感光層を形成できる半導体材料としては、
例えばa−As2Se3、a−SeAsTe等のアモルファスカルコ
ゲン化物やアモルファスセレン(a−Se)、アモルファ
スシリコン(a−Si)が例示される。上記半導体材料か
らなる感光層または電荷発生層は、真空蒸着法、グロー
放電分解法等の公知の薄膜形成方法によって形成するこ
とができる。As a semiconductor material that can be used alone as a charge generation layer in a composite type photosensitive layer to form a photosensitive layer,
Examples thereof include amorphous chalcogenides such as a-As 2 Se 3 , a-SeAsTe, amorphous selenium (a-Se), and amorphous silicon (a-Si). The photosensitive layer or charge generating layer made of the above semiconductor material can be formed by a known thin film forming method such as a vacuum vapor deposition method or a glow discharge decomposition method.
単層型または積層型の有機感光層における電荷発生層に
使用される、有機または無機の電荷発生材料としては、
例えば前記例示の半導体材料の粉末;ZnO、CdS等のII-VI
族微結晶;ピリリウム塩;アゾ系化合物;ビスアゾ系化
合物;フタロシアニン系化合物;アンサンスロン系化合
物;ペリレン系化合物;インジゴ系化合物;トリフェニ
ルメタン系化合物;スレン系化合物;トルイジン系化合
物;ピラゾリン系化合物;キナクリドン系化合物;ピロ
ロピロール系化合物が例示される。そして、上記例示の
化合物の中でも、フタロシアニン系化合物に属する、α
型,β型,γ型など種々の結晶型を有するアルミニウム
フタロシアニン、銅フタロシアニン、メタルフリーフタ
ロシアニン、オキソチタニルフタロシアニン等が好まし
く用いられ、特に、上記メタルフリーフタロシアニンお
よび/またはオキソチタニルフタロシアニンがよく好ま
しく用いられる。なお、上記電荷発生材料は、それぞれ
単独で用いられる他、複数種を併用しても良い。As the organic or inorganic charge generating material used for the charge generating layer in the single-layer type or laminated type organic photosensitive layer,
For example, the powder of the semiconductor material exemplified above; ZnO, CdS, etc. II-VI
Group crystallites; pyrylium salts; azo compounds; bisazo compounds; phthalocyanine compounds; ansanthrone compounds; perylene compounds; indigo compounds; triphenylmethane compounds; threnic compounds; toluidine compounds; pyrazoline compounds; Examples include quinacridone compounds; pyrrolopyrrole compounds. And among the above-exemplified compounds, α belonging to a phthalocyanine-based compound
Aluminum phthalocyanine, copper phthalocyanine, metal-free phthalocyanine, oxotitanyl phthalocyanine, etc. having various crystal types such as β-type, β-type, and γ-type are preferably used, and particularly, the above metal-free phthalocyanine and / or oxotitanyl phthalocyanine are often preferably used. . The charge generating materials may be used alone or in combination of plural kinds.
また、上記単層型または積層型の有機感光層や、複合型
の感光層における電荷輸送層中に含まれる電荷輸送材料
としては、例えばテトラシアノエチレン;2,4,7−トリニ
トロ−9−フルオレノン等のフルオレノン系化合物;ジ
ニトロアントラセン等のニトロ化化合物;無水コハク
酸;無水マレイン酸;ジブロモ無水マレイン酸;トリフ
ェニルメタン系化合物;2,5−ジ(4−ジメチルアミノフ
ェニル)−1,3,4−オキサジアゾール等のオキサジアゾ
ール系化合物;9−(4−ジエチルアミノスチリル)アン
トラセン等のスチリル系化合物;ポリ−N−ビニルカル
バゾール等のカルバゾール系化合物;1−フェニル−3−
(p−ジメチルアミノフェニル)ピラゾリン等のピラゾ
リン系化合物;4,4′,4″−トリス(N,N−ジフェニルア
ミノ)トリフェニルアミン等のアミン誘導体;1,1−ビス
(4−ジエチルアミノフェニル)−4,4−ジフェニル−
1,3−ブタジエン等の共役不飽和化合物;4−(N,N−ジエ
チルアミノ)ベンズアルデヒド−N,N−ジフェニルヒド
ラゾン等のヒドラゾン系化合物;インドール系化合物、
オキサゾール系化合物、イソオキサゾール系化合物、チ
アゾール系化合物、チアジアゾール系化合物、イミダゾ
ール系化合物、ピラゾール系化合物、ピラゾリン系化合
物、トリアゾール系化合物等の含窒素環式化合物;縮合
多環族化合物が例示される。上記電荷輸送材料も単独
で、あるいは、複数種併用して用いることができる。な
お、上記電荷輸送材料の中でも、前記ポリ−N−ビニル
カルバゾール等の光導電性を有する高分子材料は、感光
層の結着樹脂としても使用することができる。Examples of the charge transport material contained in the charge transport layer in the single-layer type or multilayer type organic photosensitive layer or the composite type photosensitive layer include tetracyanoethylene; 2,4,7-trinitro-9-fluorenone. Fluorenone compounds such as; nitration compounds such as dinitroanthracene; succinic anhydride; maleic anhydride; dibromomaleic anhydride; triphenylmethane compounds; 2,5-di (4-dimethylaminophenyl) -1,3, Oxadiazole compounds such as 4-oxadiazole; styryl compounds such as 9- (4-diethylaminostyryl) anthracene; carbazole compounds such as poly-N-vinylcarbazole; 1-phenyl-3-
Pyrazoline compounds such as (p-dimethylaminophenyl) pyrazolin; amine derivatives such as 4,4 ′, 4 ″ -tris (N, N-diphenylamino) triphenylamine; 1,1-bis (4-diethylaminophenyl) -4,4-diphenyl-
Conjugated unsaturated compounds such as 1,3-butadiene; hydrazone compounds such as 4- (N, N-diethylamino) benzaldehyde-N, N-diphenylhydrazone; indole compounds,
Nitrogen-containing cyclic compounds such as oxazole-based compounds, isoxazole-based compounds, thiazole-based compounds, thiadiazole-based compounds, imidazole-based compounds, pyrazole-based compounds, pyrazoline-based compounds, and triazole-based compounds; and condensed polycyclic compounds are exemplified. The above charge transport materials can be used alone or in combination of two or more. Among the above charge transport materials, the photoconductive polymer material such as poly-N-vinylcarbazole can also be used as the binder resin for the photosensitive layer.
また、前記単層型または積層型の有機感光層、複合型感
光層における電荷輸送層などの層には、前記増感剤、フ
ルオレン系化合物、酸化防止剤、紫外線吸収剤等の劣化
防止剤、可塑剤などの添加剤を含有させることができ
る。Further, the single-layer type or laminated type organic photosensitive layer, the layer such as the charge transport layer in the composite type photosensitive layer, the sensitizer, a fluorene compound, an antioxidant, a deterioration inhibitor such as an ultraviolet absorber, Additives such as plasticizers may be included.
単層型の有機感光層における、結着樹脂100重量部に対
する電荷発生材料の含有割合は、2〜20重量部の範囲
内、特に3〜15重量部の範囲内であることが好ましく、
一方、結着樹脂100重量部に対する電荷輸送材料の含有
割合は、40〜200重量部の範囲内、特に50〜100重量部の
範囲内であることが好ましい。電荷発生材料が2重量部
未満、または、電荷輸送材料が40重量部未満では、感光
体の感度が不充分になったり残留電位が大きくなったり
するからであり、電荷発生材料が20重量部を超え、また
は、電荷輸送材料が200重量部を超えると、感光体の耐
摩耗性が十分に得られなくなるからである。In the single-layer organic photosensitive layer, the content ratio of the charge generation material to 100 parts by weight of the binder resin is preferably in the range of 2 to 20 parts by weight, particularly preferably 3 to 15 parts by weight,
On the other hand, the content ratio of the charge transport material to 100 parts by weight of the binder resin is preferably in the range of 40 to 200 parts by weight, and particularly preferably in the range of 50 to 100 parts by weight. If the charge generating material is less than 2 parts by weight or the charge transporting material is less than 40 parts by weight, the sensitivity of the photoconductor becomes insufficient and the residual potential becomes large. This is because if the amount exceeds or the amount of the charge transport material exceeds 200 parts by weight, the abrasion resistance of the photoreceptor cannot be sufficiently obtained.
上記単層型感光層は、適宜の厚みに形成できるが、通常
は、10〜50μm、特に15〜25μmの範囲内に形成される
ことが好ましい。The single-layer type photosensitive layer can be formed to have an appropriate thickness, but it is usually preferably formed in the range of 10 to 50 μm, particularly 15 to 25 μm.
一方、積層型の有機感光層を構成する層のうち、電荷発
生層における、結着樹脂100重量部に対する電荷発生材
料の含有割合は、5〜500重量部の範囲内、特に10〜250
重量部の範囲内であることが好ましい。電荷発生材料が
5重量部未満では電荷発生能が小さ過ぎ、500重量部を
超えると隣接する他の層や基材との密着性が低下するか
らである。On the other hand, in the layers constituting the laminated organic photosensitive layer, the content ratio of the charge generating material to the binder resin 100 parts by weight in the charge generating layer is in the range of 5 to 500 parts by weight, particularly 10 to 250 parts by weight.
It is preferably within the range of parts by weight. This is because if the amount of the charge generating material is less than 5 parts by weight, the charge generating ability is too small, and if it exceeds 500 parts by weight, the adhesiveness with other adjacent layers or substrates is deteriorated.
上記電荷発生層の膜厚は、0.01〜3μm、特に0.1〜2
μmの範囲内であることが好ましい。The thickness of the charge generation layer is 0.01 to 3 μm, particularly 0.1 to 2 μm.
It is preferably in the range of μm.
また、積層型の有機感光層および複合型感光層を構成す
る層のうち、電荷輸送層における、結着樹脂100重量部
に対する電荷輸送材料の含有割合は、10〜500重量部の
範囲内、特に25〜200重量部の範囲内であることが好ま
しい。電荷輸送材料が10重量部未満では電荷輸送能が十
分でなく、500重量部を超えると電荷輸送層の機械的強
度が低下するからである。Further, among the layers constituting the laminated organic photosensitive layer and the composite type photosensitive layer, in the charge transport layer, the content ratio of the charge transport material relative to 100 parts by weight of the binder resin is in the range of 10 to 500 parts by weight, and particularly, It is preferably in the range of 25 to 200 parts by weight. This is because if the charge transport material is less than 10 parts by weight, the charge transport ability is insufficient, and if it exceeds 500 parts by weight, the mechanical strength of the charge transport layer is lowered.
上記電荷輸送層の膜厚は、2〜100μm、特に5〜30μ
mの範囲内であることが好ましい。The thickness of the charge transport layer is 2 to 100 μm, particularly 5 to 30 μm.
It is preferably within the range of m.
以上に説明した、単層型や積層型の有機感光層、複合型
感光層のうちの電荷輸送層、および表面保護層などの有
機の層は、前述した各成分を含有する各層用の塗布液を
調製し、これら塗布液を、前述した層構成を形成し得る
ように、各層毎に順次導電性基材上に塗布し、乾燥また
は硬化させることで積層形成することができる。As described above, the organic layer such as the single-layer type or laminated type organic photosensitive layer, the charge transport layer of the composite type photosensitive layer, and the surface protective layer is a coating liquid for each layer containing the above-mentioned components. Is prepared, and each of these layers is sequentially coated on a conductive base material so that the above-mentioned layer constitution can be formed, and dried or cured to form a laminate.
なお、上記塗布液の調製に際しては、使用される結着樹
脂等の種類に応じて種々の溶剤を使用することができ
る。上記溶剤としては、n−ヘキサン、オクタン、シク
ロヘキサン等の脂肪族炭化水素;ベンゼン、キシレン、
トルエン等の芳香族炭化水素;ジクロロメタン、四塩化
炭素、クロロベンゼン、塩化メチレン等のハロゲン化炭
化水素;メチルアルコール、エチルアルコール、イソプ
ロピルアルコール、アリルアルコール、シクロペンタノ
ール、ベンジルアルコール、フルフリルアルコール、ジ
アセトンアルコール等のアルコール類;ジメチルエーテ
ル、ジエチルエーテル、テトラヒドロフラン、エチレン
グリコールジメチルエーテル、エチレングリコールジエ
チルエーテル、ジエチレングリコールジメチルエーテル
等のエーテル類;アセトン、メチルエチルケトン、メチ
ルイソブチルケトン、シクロヘキサノン等のケトン類;
酢酸エチル、酢酸メチル等のエステル類;ジメチルホル
ムアミド;ジメチルスルホキシド等、種々の溶剤が例示
され、これらが一種または二種以上混合して用いられ
る。また、上記塗布液を調製する際、分散性、塗工性等
を向上させるため、界面活性剤やレベリング剤等を併用
しても良い。When preparing the above-mentioned coating liquid, various solvents can be used depending on the type of binder resin or the like used. Examples of the solvent include aliphatic hydrocarbons such as n-hexane, octane and cyclohexane; benzene, xylene,
Aromatic hydrocarbons such as toluene; halogenated hydrocarbons such as dichloromethane, carbon tetrachloride, chlorobenzene, methylene chloride; methyl alcohol, ethyl alcohol, isopropyl alcohol, allyl alcohol, cyclopentanol, benzyl alcohol, furfuryl alcohol, diacetone Alcohols such as alcohols; ethers such as dimethyl ether, diethyl ether, tetrahydrofuran, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone;
Examples of various solvents include esters such as ethyl acetate and methyl acetate; dimethylformamide; dimethylsulfoxide and the like, and these are used alone or in combination of two or more. In addition, a surfactant, a leveling agent, or the like may be used together in order to improve dispersibility, coatability, and the like when preparing the coating liquid.
また、上記塗布液は従来慣用の方法、例えばミキサー、
ボールミル、ペイントシェーカー、サンドミル、アトラ
イター、超音波分散機等を用いて調製することができ
る。Further, the coating solution is a conventional method, for example, a mixer,
It can be prepared using a ball mill, paint shaker, sand mill, attritor, ultrasonic disperser, or the like.
〈実施例〉 以下に、実施例に基づき、この発明をより詳細に説明す
る。<Examples> Hereinafter, the present invention will be described in more detail with reference to Examples.
実施例1〜4、比較例1,2 結着樹脂としてのポリアリレート(ユニチカ社製,商品
名U−100)100重量部、電荷輸送材料としての4−(N,
N−ジエチルアミノ)ベンズアルデヒド−N,N−ジフェニ
ルヒドラゾン100重量部および溶媒としての塩化メチレ
ン(CH2Cl2)900重量部からなる電荷輸送用塗布液を調
製し、この塗布液を外径78mm×長さ340mmのアルミニウ
ム管上に塗布した後、90℃で30分間加熱乾燥させて、膜
厚約20μmの電荷輸送層を形成した。Examples 1 to 4, Comparative Examples 1 and 2 100 parts by weight of polyarylate (manufactured by Unitika Ltd., trade name U-100) as a binder resin, 4- (N,
N-diethylamino) benzaldehyde-N, N-diphenylhydrazone 100 parts by weight and methylene chloride (CH 2 Cl 2 ) as a solvent 900 parts by weight to prepare a charge-transporting coating liquid, and this coating liquid was prepared to have an outer diameter of 78 mm × length. After coating on a 340 mm aluminum tube, it was heated and dried at 90 ° C. for 30 minutes to form a charge transport layer having a film thickness of about 20 μm.
次に、上記電荷輸送層上に、電荷発生材料としての2,7
−ジブロモアンサンスロン(ICI社製)80重量部および
メタルフリーフタロシアニン(BASF社製)20重量部、結
着樹脂としてのポリ酢酸ビニル(日本合成化学社製,商
品名Y5−N)50重量部および溶媒としてのジアセトンア
ルコール2000重量部からなる電荷発生層用塗布液を塗布
し、110℃で30分間加熱乾燥させて、膜厚約0.5μmの電
荷発生層を形成した。Next, on the charge transport layer, 2,7 as a charge generating material
-80 parts by weight of dibromoanthanthurone (manufactured by ICI) and 20 parts by weight of metal-free phthalocyanine (manufactured by BASF), 50 parts by weight of polyvinyl acetate (manufactured by Nippon Gohsei Co., Ltd., trade name Y5-N) as a binder resin, and A charge generation layer coating solution consisting of 2000 parts by weight of diacetone alcohol as a solvent was applied and dried by heating at 110 ° C. for 30 minutes to form a charge generation layer having a thickness of about 0.5 μm.
次に、0.02N塩酸57.4重量部とイソプロピルアルコール3
6重量部とを混合し、上記混合液の液温を20〜25℃に保
ちつつ攪拌しながら、メチルトリメトキシシラン80重量
部およびグリシドキシプロピルトリメトキシシラン20重
量部を徐々に滴下した後、室温に1時間放置することに
よってシラン加水分解物溶液を得、このシラン加水分解
物溶液中の非揮発性固形分100重量部に対し、次表に示
す配合量のアクリル酸エステル−メタクリル酸エステル
共重合体(日本触媒社製、商品名アロロン450、平均分
子量5000〜6000)を配合して表面保護層用の塗布液を調
製した。Next, 57.4 parts by weight of 0.02N hydrochloric acid and isopropyl alcohol 3
After mixing with 6 parts by weight, 80 parts by weight of methyltrimethoxysilane and 20 parts by weight of glycidoxypropyltrimethoxysilane were gradually added dropwise while stirring while maintaining the liquid temperature of the mixed solution at 20 to 25 ° C. A silane hydrolyzate solution was obtained by allowing it to stand at room temperature for 1 hour, and based on 100 parts by weight of the non-volatile solid content in this silane hydrolyzate solution, the amount of acrylic acid ester-methacrylic acid ester shown in the following table A copolymer (manufactured by Nippon Shokubai Co., Ltd., trade name Alorone 450, average molecular weight 5000 to 6000) was mixed to prepare a coating solution for the surface protective layer.
次に、アンチモンドープ酸化スズ微粉末(住友セメント
社製、酸化スズと酸化アンチモンとの固溶体粒子、アン
チモンを10重量%含有)を、上記塗布液中の樹脂固形分
100重量部に対して50重量部、シリコーン系界面滑性剤
を0.3重量部配合して、ボールミルにより150時間攪拌、
混合した。そして、上記塗布液とアンチモンドープ酸化
スズ微粉末との混合物に、硬化剤としてのトリエチルア
ミン0.5重量部を添加した後、前記電荷発生層上に塗布
し、110℃で1時間加熱硬化させて、膜厚約2.5μmの表
面保護層を形成し、積層形感光層を有するドラム型の電
子写真感光体を作製した。Next, antimony-doped tin oxide fine powder (manufactured by Sumitomo Cement Co., containing solid solution particles of tin oxide and antimony oxide, containing 10% by weight of antimony) was used as a resin solid content in the coating liquid.
50 parts by weight to 100 parts by weight, 0.3 parts by weight of a silicone-based interfacial lubricant are mixed, and stirred for 150 hours with a ball mill,
Mixed. Then, 0.5 part by weight of triethylamine as a curing agent was added to the mixture of the coating liquid and the antimony-doped tin oxide fine powder, and the mixture was coated on the charge generation layer and cured by heating at 110 ° C. for 1 hour to form a film. A surface protective layer having a thickness of about 2.5 μm was formed to prepare a drum-type electrophotographic photosensitive member having a laminated photosensitive layer.
比較例3,4 平均分子量5000〜6000のアクリル酸エステル−メタクリ
ル酸エステル共重合体に代えて、平均分子量55000のポ
リアクリレート(三菱レイヨン社製、商品名ダイヤナー
ルBR105)を配合したこと以外は、上記実施例1〜4と
同様にして電子写真感光体を作製した。Comparative Examples 3 and 4, in place of the acrylic acid ester-methacrylic acid ester copolymer having an average molecular weight of 5000 to 6000, except that polyacrylate having an average molecular weight of 55000 (manufactured by Mitsubishi Rayon Co., Ltd., trade name Dianal BR105) was blended. Electrophotographic photoreceptors were produced in the same manner as in Examples 1 to 4 above.
上記各実施例並びに比較例で作製した電子写真感光体に
ついて、下記の各試験を行った。The following tests were carried out on the electrophotographic photosensitive members produced in the above-mentioned Examples and Comparative Examples.
表面電位測定 上記各電子写真感光体を、静電複写試験装置(ジェンテ
ック社製,ジェンテックシンシア30M型機)に装填し、
その表面を正に帯電させて、表面電位V1s.p.(V)を測
定した。Surface potential measurement Each of the above electrophotographic photoconductors was loaded into an electrostatic copying tester (Gentec Cynthia 30M model, manufactured by Gentec),
The surface was positively charged and the surface potential V 1 sp (V) was measured.
半減露光量測定 上記帯電状態の各電子写真感光体を、上記静電複写試験
装置の露光光源であるハロゲンランプを用いて、露光強
度0.92mW/cm2、露光時間60m秒の条件で露光し、前記表
面電位V1s.p.が1/2になるのに要する時間を求め、半減
露光量E1/2(lux・Sec)を算出した。Half-exposure amount measurement Each electrophotographic photosensitive member in the charged state is exposed under the conditions of an exposure intensity of 0.92 mW / cm 2 and an exposure time of 60 msec using a halogen lamp which is an exposure light source of the electrostatic copying test apparatus. The half-exposure amount E1 / 2 (lux · Sec) was calculated by determining the time required for the surface potential V 1 sp to become 1/2.
繰返し露光後の表面電位変化測定 上記各電子写真感光体を複写機(三田工業社製,DC-111
型機)に装填して500枚の複写処理を行った後、表面電
位を、繰返し露光後の表面電位V2s.p.(V)として測定
した。Measurement of change in surface potential after repeated exposure Each of the above electrophotographic photoconductors was copied by a copying machine (manufactured by Mita Kogyo Co., Ltd., DC-111
After performing a copying process on 500 sheets, the surface potential was measured as the surface potential V 2 sp (V) after repeated exposure.
また、前記表面電位測定値V1s.p.値と、繰返し露光後の
表面電位測定値V2s.p.値とから、下記式〔I〕により、
表面電位変化値−ΔV(V)を算出した。Further, from the surface potential measurement value V 1 sp value and the surface potential measurement value V 2 sp value after repeated exposure, according to the following formula [I],
The surface potential change value-ΔV (V) was calculated.
−ΔV(V)= V2s.p.(V)−V1s.p.(V)…〔I〕 耐摩耗試験 各電子写真感光体をドラム研磨試験機(三田工業社製)
に装填すると共に、このドラム研磨試験機に設けられ
た、感光体が1000回転する間に1回転する研磨試験紙装
着リングに研磨試験紙(住友スリーエム社製,商品名イ
ンペリアルラッピングフィルム,粒径12μmの酸化アル
ミニウム粉末を表面に付着させたもの)を装填し、この
研磨試験紙を感光体表面に線圧10g/mmで押圧しながら、
感光体を100回回転させた時の摩耗量(μm)を測定し
た。-ΔV (V) = V 2 sp (V) -V 1 sp (V) ... [I] Abrasion resistance test Each electrophotographic photosensitive member was subjected to a drum polishing tester (manufactured by Mita Kogyo Co., Ltd.).
And a drum tester installed on this drum polishing tester, which rotates once during 1000 revolutions of the photoconductor, has a polishing test paper (Sumitomo 3M, trade name Imperial Wrapping Film, particle size 12 μm) Aluminum oxide powder on the surface) was loaded and the polishing test paper was pressed against the surface of the photoconductor at a linear pressure of 10 g / mm,
The amount of wear (μm) when the photoconductor was rotated 100 times was measured.
外観 表面保護層の外観を目視により観察した。Appearance The appearance of the surface protective layer was visually observed.
以上の結果を次表に示す。The above results are shown in the following table.
上記表の結果より、実施例1〜4の電子写真感光体は、
何れも、平均分子量が6000を超えるアクリル系重合体を
配合した比較例3,4に比べて、繰返し露光後の表面電位
変化量が小さく、また、摩耗量が小さいことから、上記
実施例1〜4における表面保護層は、均一で、物性、感
光特性に優れたものであることが判明した。 From the results in the above table, the electrophotographic photoreceptors of Examples 1 to 4 were
In both cases, the average molecular weight was smaller than that of Comparative Examples 3 and 4 in which the acrylic polymer was more than 6000, the amount of change in surface potential after repeated exposure was small, and the amount of wear was small. It was found that the surface protective layer in No. 4 was uniform and had excellent physical properties and photosensitivity.
また、上記実施例1〜4および比較例1,2の結果より、
塗布液中におけるアクリル系重合体の配合量が0.1重量
部未満では表面保護層の物性が悪化し、30重量部を超え
ると感光特性が悪化することが判明した。In addition, from the results of Examples 1 to 4 and Comparative Examples 1 and 2 above,
It was found that when the amount of the acrylic polymer compounded in the coating liquid was less than 0.1 parts by weight, the physical properties of the surface protective layer deteriorated, and when it exceeded 30 parts by weight, the photosensitive characteristics deteriorated.
〈発明の効果〉 この発明の電子写真感光体は以上のように構成されてい
るため、電子写真感光体の感光特性、物性等に悪影響を
与えることなく、しかも熱硬化性シリコーン樹脂単独の
場合に比べて摺動摩擦に対する脆さ等が改善された表面
保護層を有するものとなる。<Effects of the Invention> Since the electrophotographic photosensitive member of the present invention is configured as described above, it does not adversely affect the photosensitive characteristics, physical properties, etc. of the electrophotographic photosensitive member, and when the thermosetting silicone resin alone is used. In comparison, the surface protective layer has improved brittleness against sliding friction.
また、導電性付与剤としての導電性金属酸化物粒子が、
コロイド溶液状態で塗布液に混和されている場合には、
当該導電性金属酸化物粒子を表面保護層中に均一に分散
させることが容易になる。Further, the conductive metal oxide particles as a conductivity imparting agent,
If it is mixed with the coating solution in a colloidal solution,
It becomes easy to uniformly disperse the conductive metal oxide particles in the surface protective layer.
第1図は酸化スズと酸化アンチモンとの固溶体粒子の表
面に酸化ケイ素粒子を吸着させることで、上記固溶体粒
子を帯電させた状態を示す模式図である。 1……固溶体粒子、2……酸化ケイ素粒子。FIG. 1 is a schematic diagram showing a state where the solid solution particles of tin oxide and antimony oxide are charged by adsorbing the silicon oxide particles on the surface of the solid solution particles. 1 ... Solid solution particles, 2 ... Silicon oxide particles.
Claims (2)
00以下のアクリル系重合体とを、熱硬化性シリコーン樹
脂の非揮発性固形分100重量部に対してアクリル系重合
体0.1〜30重量部の割合で含有する塗布液を感光層上に
塗布し、硬化させてなる表面保護層を有することを特徴
とする電子写真感光体。1. A thermosetting silicone resin and an average molecular weight of 60.
A coating solution containing an acrylic polymer of 00 or less and 0.1 to 30 parts by weight of the acrylic polymer with respect to 100 parts by weight of the nonvolatile solid content of the thermosetting silicone resin is applied on the photosensitive layer. An electrophotographic photoreceptor having a surface protective layer formed by curing.
00以下のアクリル系重合体とを、熱硬化性シリコーン樹
脂の非揮発性固形分100重量部に対してアクリル系重合
体0.1〜30重量部の割合で含有すると共に、導電性金属
酸化物粒子のコロイド溶液が混和された塗布液を感光層
上に塗布し、硬化させることにより、上記導電性金属酸
化物粒子が導電性付与剤として均一に分散された表面保
護層を有することを特徴とする電子写真感光体。2. A thermosetting silicone resin and an average molecular weight of 60.
Acrylic polymer of 00 or less, containing 0.1 to 30 parts by weight of the acrylic polymer with respect to 100 parts by weight of the nonvolatile solid content of the thermosetting silicone resin, the conductive metal oxide particles of An electron characterized by having a surface protective layer in which the above-mentioned conductive metal oxide particles are uniformly dispersed as a conductivity-imparting agent by applying a coating solution containing a colloid solution to the photosensitive layer and curing it. Photoreceptor.
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27441589A JPH0690539B2 (en) | 1989-10-20 | 1989-10-20 | Electrophotographic photoreceptor |
| CA002027998A CA2027998A1 (en) | 1989-10-20 | 1990-10-18 | Electrophotographic photosensitive element |
| EP90120124A EP0423823B1 (en) | 1989-10-20 | 1990-10-19 | Electrophotographic photosensitive element |
| US07/599,858 US5260157A (en) | 1989-10-20 | 1990-10-19 | Electrophotographic photosensitive element comprising a surface protective layer comprising an etherified melamine-formaldehyde resin |
| DE69024592T DE69024592T2 (en) | 1989-10-20 | 1990-10-19 | Electrophotographic photosensitive member |
| ES90120124T ES2080775T3 (en) | 1989-10-20 | 1990-10-19 | PHOTOSENSITIVE ELECTROPHOTOGRAPHIC ELEMENT. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27441589A JPH0690539B2 (en) | 1989-10-20 | 1989-10-20 | Electrophotographic photoreceptor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03135575A JPH03135575A (en) | 1991-06-10 |
| JPH0690539B2 true JPH0690539B2 (en) | 1994-11-14 |
Family
ID=17541355
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27441589A Expired - Lifetime JPH0690539B2 (en) | 1989-10-20 | 1989-10-20 | Electrophotographic photoreceptor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0690539B2 (en) |
-
1989
- 1989-10-20 JP JP27441589A patent/JPH0690539B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03135575A (en) | 1991-06-10 |
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