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JPH0691131B2 - Film carrier - Google Patents
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JPH0691131B2 - Film carrier - Google Patents

Film carrier

Info

Publication number
JPH0691131B2
JPH0691131B2 JP63304392A JP30439288A JPH0691131B2 JP H0691131 B2 JPH0691131 B2 JP H0691131B2 JP 63304392 A JP63304392 A JP 63304392A JP 30439288 A JP30439288 A JP 30439288A JP H0691131 B2 JPH0691131 B2 JP H0691131B2
Authority
JP
Japan
Prior art keywords
copper foil
film carrier
film
positioning
accuracy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63304392A
Other languages
Japanese (ja)
Other versions
JPH02150044A (en
Inventor
和男 須江
美夫 常住
昇 内田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP63304392A priority Critical patent/JPH0691131B2/en
Publication of JPH02150044A publication Critical patent/JPH02150044A/en
Publication of JPH0691131B2 publication Critical patent/JPH0691131B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0266Marks, test patterns or identification means
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process

Landscapes

  • Wire Bonding (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、半導体ICチップの高密度実装技術において、
硬質基板の狭ピッチ電極とフィルムキャリアのリード電
極を多点同時接続する際の、硬質基板の電極に対する位
置決め精度を向上させることのできるフィルムキャリア
に関するものである。
TECHNICAL FIELD The present invention relates to high-density mounting technology for semiconductor IC chips,
The present invention relates to a film carrier capable of improving the positioning accuracy with respect to the electrodes of the hard substrate when the narrow pitch electrodes of the hard substrate and the lead electrodes of the film carrier are simultaneously connected at multiple points.

従来の技術 従来のフィルムキャリアの位置決め方法を第3図につい
て説明する。第3図において、硬質基板であるパネル1
にフィルムキャリア2を一括接続する際に、パネル1を
パネル搭載治具パレット3にセットして真空吸着方式に
より固定し、一方、フィルムキャリア2を第3図の矢印
Aの方向にスライドできるスライドベース4から突出し
ている基準ピン5により位置決めし、パネル電極6と、
フィルムキャリア2にボンディングされた半導体ICチッ
プ7に接続されている銅箔リード電極8との位置合せを
行う。
2. Description of the Related Art A conventional film carrier positioning method will be described with reference to FIG. In FIG. 3, panel 1 which is a rigid substrate
When the film carriers 2 are collectively connected to the panel, the panel 1 is set on the panel mounting jig pallet 3 and fixed by the vacuum suction method, while the film carrier 2 can be slid in the direction of arrow A in FIG. Positioned by the reference pin 5 protruding from 4, and the panel electrode 6,
The copper foil lead electrode 8 connected to the semiconductor IC chip 7 bonded to the film carrier 2 is aligned.

第4図はパネル1とフィルムキャリア2との接続装置の
平面図である。第4図において、液晶ディスプレイなど
のパネル1はたとえば上下左の3辺からピッチ幅0.2m
m、電極幅0.1mmの数100本のパネル電極6が形成されて
おり、このパネル電極6にフィルムキャリア2の銅箔リ
ード電極8を重ね、電極の位置合せを実施する。このと
き、位置決め用の基準ピン5をフィルムキャリア2の位
置決め用の基準ピン5をフィルムキャリア2の位置決め
孔に差し込み、実態顕微鏡9をフィルムキャリア2の電
極8の位置まで矢印Aの方向にスライドさせ、パネル電
極6とフィルムキャリア2の電極8を拡大観察しながら
互いに位置合せをする。この位置合せ時の微調整はそれ
ぞれのスライドベース4に連結されたマイクロメーター
ヘッド10を回転させながらスライドベース4をガイドベ
ース11に沿って横方向に移動させて微調整する。
FIG. 4 is a plan view of a connecting device between the panel 1 and the film carrier 2. In FIG. 4, a panel 1 such as a liquid crystal display has a pitch width of 0.2 m from the upper, lower, left and three sides, for example.
Several hundreds of panel electrodes 6 having a width of m and an electrode width of 0.1 mm are formed, and the copper foil lead electrodes 8 of the film carrier 2 are placed on the panel electrodes 6 to align the electrodes. At this time, the positioning reference pin 5 is inserted into the positioning hole of the film carrier 2 and the actual microscope 9 is slid to the position of the electrode 8 of the film carrier 2 in the direction of arrow A. The panel electrode 6 and the electrode 8 of the film carrier 2 are aligned with each other while being observed in an enlarged manner. The fine adjustment at the time of alignment is performed by moving the slide base 4 laterally along the guide base 11 while rotating the micrometer head 10 connected to each slide base 4.

次に位置調整が終了すると、全体を載置したステージ12
を矢印Bの方向に移動させ、電極部が加圧・加熱ツール
13の下に位置したときに加圧・加熱ツール13を下降さ
せ、電極部の接続が終了すると、ステージ12を矢印Bと
反対方向に移動させ、接続の1サイクルを終了する。
Next, when the position adjustment is completed, the stage 12
Is moved in the direction of arrow B, and the electrode part is pressed and heated.
When the pressing / heating tool 13 is moved downward when it is located below 13, and the connection of the electrode parts is completed, the stage 12 is moved in the direction opposite to the arrow B, and one connection cycle is completed.

第5図は第4図のX−X断面図である。第3図におい
て、ガイドベース11の上をスライドするスライドベース
4に基準ピン5が配置され、この基準ピン5が固定され
たブロック14はシリンダ15により上下駆動されるシャフ
ト16に連結されており、シリンダ15が上下することによ
り基準ピン5が上下し、フィルムキャリア2のフィルム
2aと銅箔2bを貫通してパンチングにより形成された位置
孔20を介して位置決めしたり、位置決めを解除する。ば
ね17はブロック14に固定されたピン18とスライドベース
4の間に介装されて、ブロック14に固定された基準ピン
5を上方に付勢する機能を有している。19はフィルムキ
ャリア押えで、基準ピン5の抜き差しをスムーズに実施
するためのものである。
FIG. 5 is a sectional view taken along line XX of FIG. In FIG. 3, a reference pin 5 is arranged on a slide base 4 that slides on a guide base 11, and a block 14 to which the reference pin 5 is fixed is connected to a shaft 16 which is vertically driven by a cylinder 15. When the cylinder 15 moves up and down, the reference pin 5 moves up and down, and the film of the film carrier 2
Positioning is performed via a position hole 20 formed by punching through the 2a and the copper foil 2b, or the positioning is released. The spring 17 is interposed between the pin 18 fixed to the block 14 and the slide base 4, and has a function of urging the reference pin 5 fixed to the block 14 upward. Reference numeral 19 is a film carrier retainer for smoothly inserting and removing the reference pin 5.

発明が解決しようとする課題 このとき、電極ピッチが大きい場合は、たとえば0.5mm
以上であれば、フィルムキャリア2の孔径精度が±30μ
と多少大きくても、接続後のショート不良は発生せず、
電気的に導通さえしていれば問題はなかった。
At this time, if the electrode pitch is large, for example, 0.5 mm
If the above, the accuracy of the hole diameter of the film carrier 2 is ± 30μ
Even if it is a little big, short-circuit failure does not occur after connection,
There was no problem as long as it was electrically connected.

ところが電極ピッチが0.2mm以下の狭ピッチで、しかも
電極幅が0.1mmの多点電極(たとえば数10本〜数100本)
を同時に一括接続する場合、従来のように基準ピン5と
フィルムキャリア2の位置決め精度において、フィルム
キャリア2の孔径寸法精度のばらつきを±30μ、また基
準ピン5の加工精度を±5μとして考慮すると、位置合
せ精度は狭ピッチであるため相対的に低下し、電極間で
ショートなどが発生するという不都合が生じる。このた
め、位置精度を出すために基準ピン5とフィルムキャリ
ア2の孔径精度を向上することが望ましい。基準ピン5
は機械加工精度を向上させることで解決できるが、フィ
ルムキャリア2の孔径精度はフィルム送りをしながら1
個づつパンチングするためフィルム送り精度の限界もあ
ることから±30μ以下にすることは不可能である。
However, the electrode pitch is a narrow pitch of 0.2 mm or less, and the electrode width is 0.1 mm (for example, several tens to several hundreds).
When simultaneously connecting all together, considering the positioning accuracy of the reference pin 5 and the film carrier 2 as in the conventional case, considering the variation in the hole diameter dimension accuracy of the film carrier 2 as ± 30 μ and the processing accuracy of the reference pin 5 as ± 5 μ, The positioning accuracy is relatively low due to the narrow pitch, which causes a disadvantage that a short circuit occurs between the electrodes. Therefore, it is desirable to improve the hole diameter accuracy of the reference pin 5 and the film carrier 2 in order to obtain the positional accuracy. Reference pin 5
Can be solved by improving the machining accuracy, but the hole diameter accuracy of the film carrier 2 is 1 while feeding the film.
Since punching is done individually, there is a limit to the film feed accuracy, so it is not possible to make it less than ± 30μ.

本発明は上記問題を解決するものであり、フィルムキャ
リアの位置決め孔径の精度を従来の±30μの精度から±
2μまで向上させることのできるフィルムキャリアを提
供することを目的とするものである。
The present invention is to solve the above problems, the accuracy of the positioning hole diameter of the film carrier from the conventional ± 30μ accuracy ±
It is an object to provide a film carrier that can be improved to 2μ.

課題を解決するための手段 上記課題を解決するために、本発明は、フィルムキャリ
アの位置決め孔を従来のように打抜き金型でパンチング
により形成するのではなく、銅箔に電極銅箔パターンを
形成するときに同時に露光エッチングより銅箔に位置決
め孔を形成したものである。このとき、銅箔の位置決め
孔に対応するフィルム部分の孔は銅箔の位置決め孔より
もあらかじめ大きくして先に形成されており、このフィ
ルムに銅箔が裏打ちされた後に、フィルムの孔内の銅箔
部分に位置決め孔の露光エッチングが電極銅箔パターン
の露光エッチングと同時に行われる。
Means for Solving the Problems In order to solve the above problems, the present invention forms an electrode copper foil pattern on a copper foil instead of forming a positioning hole of a film carrier by punching with a punching die as in the conventional case. At the same time, a positioning hole is formed in the copper foil by exposure etching. At this time, the holes of the film portion corresponding to the positioning holes of the copper foil are formed in advance and are larger than the positioning holes of the copper foil, and after the copper foil is lined on this film, The exposure etching of the positioning holes in the copper foil portion is performed simultaneously with the exposure etching of the electrode copper foil pattern.

作用 上記構成により、フィルムキャリアの位置決め孔は電極
銅箔パターン成形と同時の露光エッチング加工により銅
箔に形成されるため、電極銅箔パターンと相関が取れて
孔径が形成されるので、±2μの精度を確保できる。ま
た、銅箔のみで位置決めするため、基準ピンと孔径のク
リアランスを0で設計し孔径精度が±2μのマイナス目
に孔径が形成されても、基準ピンが孔径に入らないこと
がなく、極めて作業性が良いアライメントが可能とな
る。
Action With the above configuration, since the positioning hole of the film carrier is formed in the copper foil by the exposure etching process simultaneously with the electrode copper foil pattern forming, the hole diameter is formed in correlation with the electrode copper foil pattern. Accuracy can be secured. In addition, since the positioning is performed only with copper foil, the clearance between the reference pin and the hole diameter is designed to be 0, and even if the hole diameter is formed on the minus side with a hole diameter accuracy of ± 2μ, the reference pin does not fall into the hole diameter, so workability is extremely high. However, good alignment is possible.

実施例 以下本発明の一実施例について図面を用いて説明する。Embodiment One embodiment of the present invention will be described below with reference to the drawings.

第1図は本発明の一実施例のフィルムキャリア位置決め
孔と基準ピンの関係を示す要部断面図である。第1図に
おいて、21はフィルムキャリアでポリイミドなどのフィ
ルム21aと銅箔21bとからなっており、フィルム21aの孔2
2は、位置決め孔が形成される位置に対応して、先に金
型で打抜かれた大きな孔径を有し、孔径精度は従来と同
じ±30μまたはそれ以上であってもよい。このフィルム
21aに29μ±6μの膜厚を有する銅箔21bが裏打ちされて
おり、電極銅箔パターン成形と同時の露光エッチングに
よりフィルム21aの孔22に対応する銅箔部分に銅箔21bの
孔23が形成されている。この銅箔21bの孔23の孔径精度
は、銅箔21bの孔23が電極銅箔パターン成形と同時の露
光エッチングにより銅箔21bに形成されたものであるか
ら、2μ以下の精度にすることができる。このときの露
光エッチングは紫外線を使用した露光エッチングが採用
される。24は位置決め孔23に挿通される基準ピンであ
る。
FIG. 1 is a sectional view of an essential part showing the relationship between a film carrier positioning hole and a reference pin according to an embodiment of the present invention. In FIG. 1, reference numeral 21 denotes a film carrier, which is composed of a film 21a made of polyimide or the like and a copper foil 21b.
2 has a large hole diameter that has been punched with a mold in advance, corresponding to the position where the positioning hole is formed, and the hole diameter accuracy may be the same as the conventional ± 30μ or more. This film
21a is lined with a copper foil 21b having a film thickness of 29μ ± 6μ, and the hole 23 of the copper foil 21b is formed in the copper foil portion corresponding to the hole 22 of the film 21a by exposure etching simultaneously with the formation of the electrode copper foil pattern. Has been done. The hole diameter accuracy of the hole 23 of the copper foil 21b is 2μ or less because the hole 23 of the copper foil 21b is formed in the copper foil 21b by exposure etching simultaneously with the electrode copper foil pattern forming. it can. At this time, as the exposure etching, exposure etching using ultraviolet rays is adopted. A reference pin 24 is inserted into the positioning hole 23.

このフィルムキャリア21の製造は次のようにして行われ
る。先づ金型で打抜かれた大きな孔22を有するフィルム
21aに銅箔21bを裏打ちし、この銅箔21bにリード電極と
なる銅箔パターンを露光エッチングにより形成すると同
時に、フィルム21aの孔22内の銅箔21b部分に露光エッチ
ング加工による位置決め孔23を形成する。したがって、
位置決め孔23の孔径は電極銅箔パターンと相関が取れて
±2μの精度を確保できる。
The film carrier 21 is manufactured as follows. A film with large holes 22 punched first with a die
21a is lined with a copper foil 21b, and a copper foil pattern serving as a lead electrode is formed on this copper foil 21b by exposure etching, and at the same time, a positioning hole 23 is formed on the copper foil 21b in the hole 22 of the film 21a by exposure etching. To do. Therefore,
The hole diameter of the positioning hole 23 is correlated with the electrode copper foil pattern, and an accuracy of ± 2μ can be secured.

これを従来のフィルムキャリア2の位置決め孔20と基準
ピン5との関係を示す第2図と比較すると、従来のもの
は、位置決め孔20がポリイミドなどのフィルム2aとこれ
に裏打ちされた銅箔2bとを同時に金型で打抜いて機械的
に形成されているため、孔径精度は±30μであり、ピッ
チ幅200μ以下のリード電極の孔径精度としては使用で
きない。しかし、第1図のものでは、基準ピン24に対応
する銅箔部分のみに位置決め孔23を露光エッチングによ
り形成しているため、前述のように±2μ以下にでき、
基準ピン24の機械加工精度を向上させておけば、位置決
め精度を十分に高めることができる。
Comparing this with FIG. 2 showing the relationship between the positioning hole 20 of the conventional film carrier 2 and the reference pin 5, in the conventional one, the positioning hole 20 has a film 2a made of polyimide or the like and a copper foil 2b lined with the film 2a. Since the holes and are mechanically formed by punching at the same time, the hole diameter accuracy is ± 30μ, which cannot be used as the hole diameter accuracy for lead electrodes with a pitch width of 200μ or less. However, in the case of FIG. 1, since the positioning hole 23 is formed by exposure etching only in the copper foil portion corresponding to the reference pin 24, it is possible to make it ± 2 μ or less as described above,
If the machining accuracy of the reference pin 24 is improved, the positioning accuracy can be sufficiently improved.

発明の効果 以上のように本発明によれば、多点電極の接続を実施す
るに当り、電極の位置合せ用の位置決め孔精度を従来の
±30μから±2μ以下にすることができるため、電極の
位置合せに関する作業工数の短縮化および接続の歩留を
大幅に向上させることが可能である。
EFFECTS OF THE INVENTION As described above, according to the present invention, when connecting multi-point electrodes, the positioning hole accuracy for electrode alignment can be reduced from the conventional ± 30 μ to ± 2 μ or less. It is possible to shorten the work man-hours related to the positioning of and to significantly improve the yield of connection.

また、電極銅箔パターン成形と同時の露光エッチングに
よる銅箔の孔のみを位置決め孔としているため、フィル
ムキャリア作製の際の金型打抜きの孔径の精度を取るた
めの操作は全ったく必要としなくなり、フィルムキャリ
アのコストダウンを図ることができる。
Also, since only the holes of the copper foil by exposure etching at the same time as the electrode copper foil pattern forming are used as the positioning holes, it is not necessary to carry out any operation to obtain the precision of the hole diameter of the die punch when manufacturing the film carrier. The cost of the film carrier can be reduced.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の一実施例のフィルムキャリアの要部断
面図、第2図は従来のフィルムキャリアの要部断面図、
第3図は基準ピンによる位置決め方法を説明する斜視
図、第4図はフィルムキャリアと硬質基板との接続装置
の平面図、第5図は第4図のX−X断面図である。 21……フィルムキャリア、21a……フィルム、21b……銅
箔、22……フィルムに先に金型で打抜かれた孔、23……
エッチング加工による銅箔の位置決め孔、24……基準ピ
ン。
FIG. 1 is a sectional view of a main part of a film carrier according to an embodiment of the present invention, and FIG. 2 is a sectional view of a main part of a conventional film carrier.
3 is a perspective view for explaining a positioning method using a reference pin, FIG. 4 is a plan view of a connecting device between a film carrier and a hard substrate, and FIG. 5 is a sectional view taken along line XX of FIG. 21 …… Film carrier, 21a …… Film, 21b …… Copper foil, 22 …… Hole previously punched by die in film, 23 ……
Positioning holes in copper foil by etching, 24 ... Reference pin.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】半導体ICチップがボンディングされ、硬質
基板の狭ピッチ電極に接続される電極を有するフィルム
キャリアであって、電極の位置合せ精度を向上させるた
めの位置決め孔を、電極銅箔パターン成形と同時に露光
エッチングにより形成した銅箔の孔のみで構成したフィ
ルムキャリア。
1. A film carrier having electrodes to which a semiconductor IC chip is bonded and connected to narrow-pitch electrodes on a hard substrate, wherein a positioning hole for improving the alignment accuracy of the electrodes is formed into an electrode copper foil pattern. At the same time, a film carrier composed only of copper foil holes formed by exposure etching.
JP63304392A 1988-11-30 1988-11-30 Film carrier Expired - Lifetime JPH0691131B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63304392A JPH0691131B2 (en) 1988-11-30 1988-11-30 Film carrier

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63304392A JPH0691131B2 (en) 1988-11-30 1988-11-30 Film carrier

Publications (2)

Publication Number Publication Date
JPH02150044A JPH02150044A (en) 1990-06-08
JPH0691131B2 true JPH0691131B2 (en) 1994-11-14

Family

ID=17932467

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63304392A Expired - Lifetime JPH0691131B2 (en) 1988-11-30 1988-11-30 Film carrier

Country Status (1)

Country Link
JP (1) JPH0691131B2 (en)

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JP4678334B2 (en) * 2006-05-29 2011-04-27 日立電線株式会社 Film punching and pasting device
JP5147591B2 (en) 2008-08-06 2013-02-20 日東電工株式会社 Suspension board with circuit, manufacturing method thereof, and positioning method of suspension board with circuit

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4049903A (en) * 1974-10-23 1977-09-20 Amp Incorporated Circuit film strip and manufacturing method
JPS6117751U (en) * 1984-07-05 1986-02-01 シャープ株式会社 Tape carrier semiconductor device
JPH0750724B2 (en) * 1986-12-17 1995-05-31 株式会社日立製作所 Liquid crystal display

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