JPH0697241B2 - Wafer inspection system - Google Patents
Wafer inspection systemInfo
- Publication number
- JPH0697241B2 JPH0697241B2 JP62157167A JP15716787A JPH0697241B2 JP H0697241 B2 JPH0697241 B2 JP H0697241B2 JP 62157167 A JP62157167 A JP 62157167A JP 15716787 A JP15716787 A JP 15716787A JP H0697241 B2 JPH0697241 B2 JP H0697241B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- stage
- measurement chamber
- shutter
- probe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000007689 inspection Methods 0.000 title claims description 9
- 238000005259 measurement Methods 0.000 claims description 30
- 239000000523 sample Substances 0.000 claims description 13
- 230000000903 blocking effect Effects 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 description 35
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
Landscapes
- Measurement Of Resistance Or Impedance (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、シリコンウェーハ，拡散層，エピタキシャル
層，イオン注入層などの比抵抗（抵抗率），シート抵抗
を測定する比抵抗測定器等のウェーハ検査装置に関す
る。DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention relates to a resistivity measuring device for measuring the resistivity (resistivity) of silicon wafers, diffusion layers, epitaxial layers, ion implantation layers, etc. The present invention relates to a wafer inspection device.
測定の対象となるシリコンウェーハの比抵抗，シート抵
抗を測定する時、シリコンウェーハの一部に光が当たる
と光電流がウェーハに流れ、正確な測定値が得られな
い，測定値のばらつきが大きいなどの悪影響を受ける。When measuring the specific resistance and sheet resistance of a silicon wafer to be measured, if a part of the silicon wafer is exposed to light, photocurrent will flow into the wafer and accurate measured values cannot be obtained. Will be adversely affected.
このためシリコンウェーハの比抵抗，シート抵抗を測定
する時は、シリコンウェーハ周辺を暗くする必要があ
る。そのためには、ウェーハを暗室の中へ入れて測定す
る方法と、ウェーハの周辺を測定時のみ暗室状態にして
やる方法がある。いずれの方法においても、最終的に完
全な暗室とするには何らかの機構が必要となる。Therefore, when measuring the specific resistance and sheet resistance of a silicon wafer, it is necessary to darken the periphery of the silicon wafer. For that purpose, there are a method of putting the wafer in a dark room for measurement and a method of putting the periphery of the wafer in a dark room state only at the time of measurement. In either method, some kind of mechanism is required to finally obtain a completely dark room.
従来は、ウェーハの比抵抗，シート抵抗を測定するた
め、測定室にウェーハを搬入し、測定後、搬出する機構
を，測定中の測定室を暗室状態に保つこと、ウェーハの
搬入，搬出が容易であること等の条件により簡単に得る
ことができないという問題点があった。Conventionally, to measure the specific resistance and sheet resistance of the wafer, a mechanism for loading the wafer into the measuring chamber and then carrying it out after the measurement is used. It is easy to carry the wafer in and out by keeping the measuring chamber in the dark state during the measurement. There is a problem in that it cannot be easily obtained due to such conditions as
本発明装置は上記の問題点を解決するため、光を遮断
し、ウェーハの電気的特性を検査するウェーハ検査装置
において、ウェーハ１をセットするステージ２と、この
ステージ２を水平方向へ移動させるステージ移動機構３
と、前記ステージ２の出入口８を有する，光を通さない
測定室６と、この測定室６内に設けられるウェーハ１の
電気特性検査用端子のプローブ７と、前記測定室６の出
入口８に鉛直方向に移動可能に設けられ該測定室と外部
を遮断するシャッタ４と、このシャッタ４を開閉するシ
ャッタ開閉機構５とよりなる構成としたものである。In order to solve the above problems, the apparatus of the present invention is a wafer inspection apparatus that blocks light and inspects electrical characteristics of a wafer. Moving mechanism 3
And a measurement chamber 6 having an entrance / exit 8 of the stage 2 that does not pass light, a probe 7 for an electric characteristic inspection terminal of the wafer 1 provided in the measurement chamber 6, and a perpendicular to the entrance / exit 8 of the measurement chamber 6. The shutter 4 is provided so as to be movable in any direction and shuts off the measurement chamber from the outside, and a shutter opening / closing mechanism 5 that opens / closes the shutter 4.
まず、ウェーハ１をステージ２上にセットし、シャッタ
４をシャッタ開閉機構５により上動して開く。次にウェ
ーハ１をセットしたステージ２をステージ移動機構３に
より水平方向へ移動して測定室６内に搬入する。搬入
後、シャッタ４をシャッタ開閉機構５により下動して閉
じ、測定室６を暗室状態にする。そしてステージ２上の
ウェーハ１の電気特性を検査用端子のプローブ７により
測定する。測定後、シャッタ４をシャッタ開閉機構５に
より上動して開き、ウェーハ１をセットしたステージ２
をステージ移動機構３により水平方向へ移動して測定室
６より搬出する。First, the wafer 1 is set on the stage 2, and the shutter 4 is moved up and opened by the shutter opening / closing mechanism 5. Next, the stage 2 on which the wafer 1 is set is moved in the horizontal direction by the stage moving mechanism 3 and loaded into the measurement chamber 6. After carrying in, the shutter 4 is moved downward by the shutter opening / closing mechanism 5 and closed, and the measurement chamber 6 is brought into a dark room state. Then, the electrical characteristics of the wafer 1 on the stage 2 are measured by the probe 7 of the inspection terminal. After the measurement, the shutter 4 is moved upward by the shutter opening / closing mechanism 5 and opened, and the stage 2 on which the wafer 1 is set
Is moved horizontally by the stage moving mechanism 3 and is carried out from the measurement chamber 6.
以下図面により本発明の実施例を説明する。 Embodiments of the present invention will be described below with reference to the drawings.
第１図は本発明装置の一実施例を示す簡略斜視図、第２
図はその側面図である。FIG. 1 is a simplified perspective view showing an embodiment of the device of the present invention.
The figure is a side view thereof.
第1,第２図において１はウェーハ、２はウェーハ１を上
面にセットするステージである。３はステージ移動機構
で、ウェーハ１をセットしたステージ２を水平方向へ移
動して測定室６の出入口８から室内に搬入したり、これ
より搬出したりするものである。In FIGS. 1 and 2, 1 is a wafer, and 2 is a stage for setting the wafer 1 on the upper surface. Reference numeral 3 denotes a stage moving mechanism which moves the stage 2 on which the wafer 1 is set in the horizontal direction so as to be carried in or out of the chamber from the entrance 8 of the measurement chamber 6.
６は測定室で、ステージ移動機構３により室内に搬入さ
れたステージ２上のウェーハ１の比抵抗，シート抵抗の
測定に用いる４探針プローブ７が内設されている。測定
室６は外部からの光を通さない材質・構造で構成されて
いる。４はシャッタで、この測定室６と外部を，換言す
れば出入口８を遮断したり、開放したりする役目を果た
すものである。５はシャッタ開閉機構で、このシャッタ
４を上下方向に移動して開閉するものである。Reference numeral 6 denotes a measuring chamber, in which a 4-probe probe 7 used for measuring the specific resistance and sheet resistance of the wafer 1 on the stage 2 carried into the chamber by the stage moving mechanism 3 is installed. The measurement chamber 6 is made of a material and structure that does not allow light from the outside to pass therethrough. Reference numeral 4 denotes a shutter, which serves to block or open the measuring chamber 6 and the outside, in other words, the entrance / exit 8. A shutter opening / closing mechanism 5 moves the shutter 4 in the vertical direction to open / close it.
９はステージ２を支えるステージ移動機構３の一部が搬
入，搬出時に邪魔にならず、ガイドとなるガイド溝であ
る。Reference numeral 9 denotes a guide groove that serves as a guide for a part of the stage moving mechanism 3 that supports the stage 2 without being a hindrance during loading and unloading.
光遮断機構は、シャッタ4,ステージ移動機構３の一部及
び測定室６等により構成される。The light blocking mechanism is composed of the shutter 4, a part of the stage moving mechanism 3, the measuring chamber 6 and the like.
まず、ウェーハ１を第１図，第３図示のようにステージ
２上にセットし、シャッタ４をシャッタ開閉機構５によ
り上動して測定室６の出入口８を開く（第１図，第３図
参照）。第２図はシャッタ４が開く途中，または閉じる
途中の状態を示している。次にウェーハ１をセットした
ステージ２をステージ移動機構３によりガイド溝９に沿
って水平方向へ移動して測定室６内に搬入する。搬入
後、シャッタ４をシャッタ開閉機構５により下動して閉
じ測定室６の出入口８を閉じて測定室６を暗室状態にす
る（第４図参照）。そしてステージ２上のウェーハ１の
比抵抗，シート抵抗を４探針プローブ７により測定す
る。測定後、シャッタ４をシャッタ開閉機構５により上
動して開き、測定室６の出入口８を開いてウェーハ１を
セットしたステージ２をステージ移動機構３によりガイ
ド溝９に沿って水平方向へ移動して測定室６より搬出す
る。First, the wafer 1 is set on the stage 2 as shown in FIGS. 1 and 3, and the shutter 4 is moved upward by the shutter opening / closing mechanism 5 to open the entrance / exit 8 of the measurement chamber 6 (see FIGS. 1 and 3). reference). FIG. 2 shows a state where the shutter 4 is being opened or closed. Next, the stage 2 on which the wafer 1 is set is horizontally moved along the guide groove 9 by the stage moving mechanism 3 and carried into the measurement chamber 6. After loading, the shutter 4 is moved downward by the shutter opening / closing mechanism 5 to close the entrance / exit 8 of the measurement chamber 6 to bring the measurement chamber 6 into a dark room state (see FIG. 4). Then, the specific resistance and sheet resistance of the wafer 1 on the stage 2 are measured by the 4-probe probe 7. After the measurement, the shutter 4 is moved upward by the shutter opening / closing mechanism 5 and opened, the entrance / exit 8 of the measurement chamber 6 is opened, and the stage 2 on which the wafer 1 is set is horizontally moved along the guide groove 9 by the stage moving mechanism 3. And carry out from the measurement room 6.
上述のように本発明によれば、測定時に測定室６内を暗
室状態にすることができ、外部からの光を遮断できるた
め、ウェーハ１に光電流が流れることがなく、ウェーハ
１の比抵抗，シート抵抗を正確に測定でき、測定値のば
らつきも少なくできるなど、ウェーハの電気特性を正確
に検査することができる。As described above, according to the present invention, the inside of the measurement chamber 6 can be made into a dark room state at the time of measurement, and the light from the outside can be blocked, so that no photocurrent flows through the wafer 1 and the specific resistance of the wafer 1 is reduced. The sheet electrical resistance can be accurately measured, and the variation in the measured values can be reduced, so that the electrical characteristics of the wafer can be accurately inspected.
また、暗室状態をシャッタ4,ステージ移動機構３の一部
及び測定室６等により容易に保つことができ、ウェーハ
１の搬入・搬出もステージ移動機構３により簡単にでき
るものである。Further, the dark room state can be easily maintained by the shutter 4, a part of the stage moving mechanism 3, the measuring chamber 6 and the like, and the wafer 1 can be easily loaded and unloaded by the stage moving mechanism 3.
特に、ウェーハの径方向の検査をするとき、プローブを
水平移動させずに、ステージ移動機構によりウェーハを
水平方向移動させることで、ウェーハの径方向の検査が
できるので、プローブの水平移動機構を必要とせず、構
成を簡単に安価にできると共に、駆動部が少ないために
駆動制御が簡単になるばかりでなく、シャッタを上下方
向に移動させて開閉するようにしたので、周辺空気を掻
き乱すことが少なく、パーティクルを巻き上げることが
極めて少なく、良好な検査ができる。In particular, when inspecting the wafer in the radial direction, it is possible to inspect the wafer in the radial direction by moving the wafer in the horizontal direction using the stage moving mechanism without moving the probe in the horizontal direction. Not only that, the structure can be made simple and inexpensive, and the drive control is simple due to the small number of drive parts.In addition, the shutter is moved vertically to open and close, so that the surrounding air can be disturbed. The number of particles is extremely small, and the particles are hardly wound up, and a good inspection can be performed.
第１図は本発明装置の一実施例を示す簡略斜視図、第２
図はその側面図、第３図及び第４図はその作用説明用側
面図である。 １……ウェーハ、２……ステージ、３……ステージ移動
機構、４……シャッタ、５……シャッタ開閉機構、６…
…測定室、７……４探針プローブ、８……出入口。FIG. 1 is a simplified perspective view showing an embodiment of the device of the present invention.
The figure is a side view thereof, and FIGS. 3 and 4 are side views for explaining the operation thereof. 1 ... Wafer, 2 ... Stage, 3 ... Stage moving mechanism, 4 ... Shutter, 5 ... Shutter opening / closing mechanism, 6 ...
… Measurement room, 7 …… 4 probe probe, 8 …… Gateway.
Claims (3)
するウェーハ検査装置において、ウェーハをセットする
ステージと、このステージを水平方向へ移動させるステ
ージ移動機構と、前記ステージの出入口を有する，光を
通さない測定室と、この測定室内に設けられるウェーハ
の電気特性検査用端子のプローブと、前記測定室の出入
口に鉛直方向に移動可能に設けられ該測定室と外部を遮
断するシャッタと、このシャッタを開閉するシャッタ開
閉機構とよりなることを特徴とするウェーハ検査装置。1. A wafer inspecting apparatus for inspecting electrical characteristics of a wafer by blocking light, comprising a stage for setting a wafer, a stage moving mechanism for horizontally moving the stage, and an entrance / exit of the stage. A measurement chamber that does not transmit light, a probe for a terminal for inspecting electrical characteristics of a wafer that is provided in this measurement chamber, a shutter that is movably provided in the vertical direction at the entrance and exit of the measurement chamber, and that shuts off the measurement chamber and the outside, A wafer inspection device comprising a shutter opening / closing mechanism for opening / closing the shutter.
するガイド溝を有することを特徴とする特許請求の範囲
第１項記載のウェーハ検査装置。2. The wafer inspection apparatus according to claim 1, wherein a guide groove for guiding the stage moving mechanism is provided at the bottom of the measurement chamber.
するガイド溝を有し、プローブは、ウェーハの比抵抗，
シート抵抗を測定する４探針のプローブである特許請求
の範囲第１項記載のウェーハ検査装置。3. A guide groove for guiding a stage moving mechanism is provided at the bottom of the measurement chamber, and the probe is provided with a specific resistance of the wafer,
The wafer inspection apparatus according to claim 1, which is a four-probe probe that measures sheet resistance.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62157167A JPH0697241B2 (en) | 1987-06-23 | 1987-06-23 | Wafer inspection system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62157167A JPH0697241B2 (en) | 1987-06-23 | 1987-06-23 | Wafer inspection system |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPS641972A JPS641972A (en) | 1989-01-06 |
| JPH011972A JPH011972A (en) | 1989-01-06 |
| JPH0697241B2 true JPH0697241B2 (en) | 1994-11-30 |
Family
ID=15643653
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62157167A Expired - Lifetime JPH0697241B2 (en) | 1987-06-23 | 1987-06-23 | Wafer inspection system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0697241B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DK1983082T3 (en) | 2006-02-06 | 2013-11-04 | Mitsui Chemicals Inc | Spun adhesive nonwoven |
| JP6184088B2 (en) * | 2012-01-27 | 2017-08-23 | ローム株式会社 | Manufacturing method of chip resistor |
| JP7595604B2 (en) * | 2022-01-12 | 2024-12-06 | ニデックプレシジョン株式会社 | Shutter mechanism and inspection device |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS468806Y1 (en) * | 1966-02-17 | 1971-03-29 | ||
| JPS496670Y1 (en) * | 1968-04-11 | 1974-02-16 | ||
| JPS4990263U (en) * | 1972-11-27 | 1974-08-05 |
-
1987
- 1987-06-23 JP JP62157167A patent/JPH0697241B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS641972A (en) | 1989-01-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term | ||
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20071130 Year of fee payment: 13 |