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JPH069918B2 - Fluorine-containing resin coated body and method for producing the same - Google Patents
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JPH069918B2 - Fluorine-containing resin coated body and method for producing the same - Google Patents

Fluorine-containing resin coated body and method for producing the same

Info

Publication number
JPH069918B2
JPH069918B2 JP63136467A JP13646788A JPH069918B2 JP H069918 B2 JPH069918 B2 JP H069918B2 JP 63136467 A JP63136467 A JP 63136467A JP 13646788 A JP13646788 A JP 13646788A JP H069918 B2 JPH069918 B2 JP H069918B2
Authority
JP
Japan
Prior art keywords
fluororesin
molecular weight
fluorine
containing resin
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63136467A
Other languages
Japanese (ja)
Other versions
JPH01304936A (en
Inventor
稔 荒牧
昌弘 久保
広志 市丸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Priority to JP63136467A priority Critical patent/JPH069918B2/en
Publication of JPH01304936A publication Critical patent/JPH01304936A/en
Publication of JPH069918B2 publication Critical patent/JPH069918B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は新規な含フッ素樹脂被覆体に関するものであ
り、各種材料基体上に潤滑性、離型性、撥水・撥油性の
面を形成したものである。
TECHNICAL FIELD The present invention relates to a novel fluorine-containing resin coating, which has a surface having lubricity, releasability and water / oil repellency on various material substrates. It was done.

[従来技術] テトラフルオロエチレン樹脂(PTFE)をはじめとし
て含フッ素樹脂は、潤滑性、非粘着性、撥水・撥油性な
どの優れた特性を有しており、これらの特性の要求され
る各種用途に使用されているが、これら優れた物性を他
の各種材料の表面に付与することがおこなわれている。
その手段としては、真空蒸着等の手段により被膜を形成
する方法、あるいは粉体の焼き付け、塗装等の方法がお
こなわれている。しかし、これらの方法はそれぞれ問題
点を有している。すなわち、含フッ素樹脂の真空蒸着等
の手段では材料基体が高温下に置かれるため、耐熱性の
材料でなければ、この方法を適用することができない。
含フッ素樹脂粉末の焼き付けによる方法においても同様
に材料基体が限定されるものである。さらに塗装による
方法においては、含フッ素樹脂として溶剤に溶解しやす
いものを選ぶため、含フッ素樹脂の特性である潤滑性能
等が劣ることとなる。
[Prior Art] Fluorine-containing resins such as tetrafluoroethylene resin (PTFE) have excellent properties such as lubricity, non-adhesiveness, water repellency, and oil repellency. Although it is used for various purposes, it has been attempted to impart these excellent physical properties to the surface of various other materials.
As a means therefor, a method of forming a film by means such as vacuum vapor deposition, a method of baking powder, a method of coating or the like are performed. However, each of these methods has problems. That is, since the material substrate is placed at a high temperature by means such as vacuum deposition of a fluorine-containing resin, this method cannot be applied unless it is a heat-resistant material.
Also in the method of baking the fluorine-containing resin powder, the material substrate is similarly limited. Further, in the method of coating, since a fluororesin which is easily dissolved in a solvent is selected, the lubrication performance, which is a characteristic of the fluororesin, is deteriorated.

[問題点を解決するための手段] 本発明者らはこれら従来方法による問題点のないものを
得るには含フッ素樹脂の分子量が可及的に低いものを選
ぶことで解決できることを見いだし、本発明に到達した
ものである。すなわち本発明は基体上に平均分子量が60
0〜1500の範囲の含フッ素樹脂を被覆してなる含フッ素
樹脂被覆体であり、その製造法としては、平均分子量が
600〜1500の範囲の含フッ素樹脂をターゲット材として
真空メッキ法により基体上に該含フッ素樹脂を被覆する
ことを特徴とする含フッ素樹脂被覆体の製造法および平
均分子量が600〜1500の範囲の含フッ素樹脂を有機溶剤
に溶解してなる溶液により基体上に塗膜を形成し、該有
機溶剤を揮散させることを特徴とする含フッ素樹脂被覆
体の製造法である。
[Means for Solving Problems] The present inventors have found that in order to obtain a product without problems by these conventional methods, it can be solved by selecting a fluororesin having a molecular weight as low as possible. The invention has been reached. That is, the present invention has an average molecular weight of 60 on the substrate.
A fluorine-containing resin coated body obtained by coating a fluorine-containing resin in the range of 0 to 1500, and its production method has an average molecular weight of
A method for producing a fluororesin-coated body characterized by coating the fluororesin on a substrate by a vacuum plating method using a fluororesin in the range of 600 to 1500 and an average molecular weight in the range of 600 to 1500 A method for producing a fluororesin-coated body, which comprises forming a coating film on a substrate with a solution prepared by dissolving a fluororesin in an organic solvent, and volatilizing the organic solvent.

本発明における含フッ素樹脂はその分子量が600〜1500
の範囲の低分子量体であり、本発明者らが、すでに提案
したサブミクロンオーダーの低分子量含フッ素樹脂粉末
の製造法として含フッ素樹脂をフッ素化材の存在下で加
熱反応させ、発生する反応生成ガスからその中に含まれ
ているより低分子量化された含フッ素樹脂を冷却、析出
させる方法(特願昭61-285962号)により得られる含フ
ッ素樹脂低分子量物を好適に使用できる。以下、この含
フッ素樹脂低分子量物の製造についてより詳しく説明す
る。
The fluorine-containing resin in the present invention has a molecular weight of 600 to 1500.
Is a low molecular weight substance in the range of, and the present inventors have already proposed a method for producing a low molecular weight fluororesin powder of the submicron order, a fluororesin is heated and reacted in the presence of a fluorinated material, and a reaction occurs. A low molecular weight fluororesin obtained by a method of cooling and precipitating a lower molecular weight fluororesin contained therein from the produced gas (Japanese Patent Application No. 61-285962) can be preferably used. Hereinafter, the production of this fluororesin low molecular weight product will be described in more detail.

原料の含フッ素樹脂としては、PTFE、テトラフルオ
ロエチレン−ヘキサフルオロプロピレン共重合体(FE
P)、テトラフルオロエチレン−パーフルオロアルコキ
シエチレン共重合体(PFA)、ポリクロロトリフルオ
ロエチレン(PCTFE)、エチレン−テトラフルオロ
エチレン共重合体(ETFE)、ポリビニリデンフルオ
ライド(PVdF)、ポリビニルフルオライド(PV
F)等の汎用の含フッ素樹脂が好適に用いられ、粉末、
ペレット、シート、スクラップあるいはフィラー入りの
ものなど、いかなる形状のものでも使用できるが、あら
かじめフッ素化剤、放射線あるいは加熱などの手段によ
り低分子量化したものを用いる方が、反応速度が速く、
高収率で目的の低分子量物を得ることができる。フッ素
化剤としては、フッ素(F)、三フッ化窒素(N
)、三フッ化塩素(ClF)などが使用され、反
応条件は使用する樹脂により異なるが、原料の含フッ素
樹脂を融合以上に加熱し、雰囲気温度は原料温度よりい
くぶん低めの200〜550℃においておこなわれる。雰囲気
温度が200℃以下では含フッ素樹脂の低分子量物は容易
に気体とならない。また、原料温度が600℃以上、雰囲
気温度が550℃以上では反応生成ガス中の含フッ素樹脂
の低分子量物が分解するために収率よく含フッ素樹脂の
低分子量物を得ることができない。また、使用するフッ
素化剤の添加量は、含フッ素樹脂の種類、形状にもよる
が、含フッ素樹脂100重量部に対してフッ素原子として
0.01重量部以上となるように供給(存在)させればよ
く、0.01重量部より少ないと低分子量化反応は容易に進
行しない。一方、過剰に存在する場合には、含フッ素樹
脂の低分子量化が進みすぎ、収率よく目的とする低分子
量物を得ることができないので、大略10重量部程度まで
の範囲で選択するのが好ましい。この場合、窒素、アル
ゴン、ヘリウム、四フッ化炭素等の不活性ガスで稀釈使
用する。
As the fluorine-containing resin as a raw material, PTFE, tetrafluoroethylene-hexafluoropropylene copolymer (FE
P), tetrafluoroethylene-perfluoroalkoxyethylene copolymer (PFA), polychlorotrifluoroethylene (PCTFE), ethylene-tetrafluoroethylene copolymer (ETFE), polyvinylidene fluoride (PVdF), polyvinyl fluoride (PV
A general-purpose fluorine-containing resin such as F) is preferably used, and powder,
Any shape such as pellets, sheets, scraps or fillers can be used, but it is faster to use those having a low molecular weight by a means such as a fluorinating agent, radiation or heating in advance.
The target low molecular weight product can be obtained in high yield. As the fluorinating agent, fluorine (F 2 ) and nitrogen trifluoride (N
F 3 ), chlorine trifluoride (ClF 3 ), etc. are used, and the reaction conditions are different depending on the resin used, but the fluorine-containing resin of the raw material is heated more than fusion, and the ambient temperature is slightly lower than the raw material temperature of 200- It is performed at 550 ℃. When the ambient temperature is 200 ° C or lower, the low molecular weight fluoropolymer does not easily turn into a gas. Further, when the raw material temperature is 600 ° C. or higher and the atmospheric temperature is 550 ° C. or higher, the low molecular weight substance of the fluororesin in the reaction product gas is decomposed, so that the low molecular weight substance of the fluororesin cannot be obtained in good yield. The amount of the fluorinating agent used depends on the type and shape of the fluororesin, but as a fluorine atom relative to 100 parts by weight of the fluororesin.
It may be supplied (present) in an amount of 0.01 parts by weight or more, and if it is less than 0.01 parts by weight, the reaction for lowering the molecular weight does not easily proceed. On the other hand, when it is present in excess, the molecular weight of the fluorine-containing resin is too low, and the desired low molecular weight product cannot be obtained in good yield, so it is generally selected within a range of up to about 10 parts by weight. preferable. In this case, it is diluted with an inert gas such as nitrogen, argon, helium or carbon tetrafluoride.

使用する反応器は、気体と固体が接触する形態のもので
あれば、いかなるもので使用できるが、例えば多段の反
応棚を具備する強制循環式の反応器、流動層などのの気
固接触が良好に行える反応器が好ましい。
Any reactor can be used as long as it is in a form in which gas and solid are in contact with each other.For example, a gas-solid contact such as a forced circulation type reactor equipped with a multi-stage reaction shelf and a fluidized bed can be used. A reactor that works well is preferred.

含フッ素樹脂の低分子量物を収率よく得るために、含フ
ッ素樹脂の低分子量物を気体状で含む高温の反応生成ガ
スを100℃以下好ましくは室温以下に冷却し、含フッ素
樹脂の低分子量物を析出、分離または捕集するための冷
却器および分離器または捕集器が必要である。冷却の方
法としては、空気、水、冷媒、液化ガスなどが考えら
れ、反応生成ガスの冷却速度をコントロールすることに
より析出する粒子の粒径をコントロールすることが可能
である、分離または捕集の方法としては、重力を利用し
た沈降室型、慣性力を利用した衝突板型、遠心力を利用
したサイクロン、バックフィルターなどが採用される。
また、反応器内の圧力は高圧になればなるほど反応は速
やかに進行するが常圧でも十分な反応速度を持ってい
る。かかる方法で得られる含フッ素樹脂の低分子量物
は、微小な球状あるいは薄片状の粉末であり、冷却速度
を大とすることにより、より粒子径を小さくすることが
可能である。なお、生成物は活性なフッ素ラジカルの存
在下で分解を行っているため、末端はCF化されてお
り、極めて安定である。
In order to obtain the low molecular weight product of the fluororesin in good yield, the high-temperature reaction product gas containing the low molecular weight product of the fluororesin in a gaseous state is cooled to 100 ° C or lower, preferably room temperature or lower, and the low molecular weight of the fluororesin Coolers and separators or collectors for depositing, separating or collecting material are needed. As a cooling method, air, water, a refrigerant, a liquefied gas, etc. are considered, and it is possible to control the particle size of the precipitated particles by controlling the cooling rate of the reaction product gas. As the method, a sedimentation chamber type utilizing gravity, a collision plate type utilizing inertial force, a cyclone utilizing centrifugal force, a back filter, etc. are adopted.
Further, the higher the pressure in the reactor, the faster the reaction proceeds, but at normal pressure it has a sufficient reaction rate. The low molecular weight substance of the fluorine-containing resin obtained by such a method is a fine spherical or flaky powder, and the particle diameter can be further reduced by increasing the cooling rate. In addition, since the product is decomposed in the presence of active fluorine radicals, the terminal is converted into CF 3 and is extremely stable.

この方法により得られる含フッ素樹脂の分子量の調整は
反応温度および冷却温度を選ぶことにより容易に実施で
きるものである。また、このようにして得た低分子量含
フッ樹脂をさらに加熱気化させ、その加熱温度、冷却温
度を選んで、より分子量分布の狭い含フッ素樹脂粉末を
得ることができる。
The molecular weight of the fluororesin obtained by this method can be easily adjusted by selecting the reaction temperature and the cooling temperature. Further, the low molecular weight fluororesin thus obtained is further vaporized by heating, and the heating temperature and cooling temperature are selected to obtain a fluororesin powder having a narrower molecular weight distribution.

かかる低分子量の含フッ素樹脂粉末を用いて各種基体の
表面を被覆する方法として、本発明においては平均分子
量が600〜1500の範囲の含フッ素樹脂をターゲット材と
して真空メッキをおこなうものである。真空メッキ手段
としては真空蒸着、スパッタリング、イオンプレーティ
ング等の各種手段が可能であり、以下、真空蒸着法によ
り基体上に含フッ素樹脂被覆を形成する場合について具
体的に説明する。真空蒸着装置内に予め分子量の調整さ
れた含フッ素樹脂粉末を置き、装置内の真空度を10-6
10-1torrとしたのち抵抗加熱器等の加熱源により含フッ
素樹脂粉末を加熱する。装置内の真空度が10-1torrより
低い場合には残留気体が含フッ素樹脂分子の平均自由行
程が小さくなり、被覆すべき基体に届かないうちに衝突
を繰り返し、大きな粒子に成長してエネルギーを失い落
下してしまう。真空度が高いほど、蒸着には好都合であ
るが、10-6torr以下にするのは困難であり、10-4torrに
おける空気の平均自由行程は約50cmであるので、工業的
に蒸着をおこなうには10-4torrあれば十分である。蒸着
源の温度は50〜300℃の範囲であり、使用する含フッ素
樹脂の分子量により異なるが、50℃より低い場合には、
含フッ素樹脂が気化しにくく、装置内の分子密度が小さ
いために、蒸着に時間がかかる。また、300℃より温度
が高い場合には、含フッ素樹脂の気化が容易で、分子の
エネルギーが大きく、蒸着は速やかに進行する。しか
し、あまり温度が高いと基体との距離、蒸着時間にもよ
るが、基体が変形、変質したり、膜厚のコントロールが
困難となるなど好ましくない。
As a method of coating the surface of various substrates with such a low molecular weight fluororesin powder, in the present invention, vacuum plating is performed using a fluororesin having an average molecular weight of 600 to 1500 as a target material. Various means such as vacuum deposition, sputtering, and ion plating can be used as the vacuum plating means, and the case of forming the fluorine-containing resin coating on the substrate by the vacuum deposition method will be specifically described below. Place the fluorine-containing resin powder whose molecular weight has been adjusted in advance in the vacuum vapor deposition device, and set the degree of vacuum in the device to 10 -6 ~
After setting to 10 -1 torr, the fluorine-containing resin powder is heated by a heating source such as a resistance heater. If the degree of vacuum in the equipment is lower than 10 -1 torr, the residual gas has a small mean free path of the fluorine-containing resin molecules and repeats collisions before reaching the substrate to be coated, growing into large particles and generating energy. Loses and falls. The higher the degree of vacuum, the better the vapor deposition, but it is difficult to reduce it to 10 -6 torr or less, and the average free path of air at 10 -4 torr is about 50 cm, so industrial vapor deposition is performed. 10 -4 torr is enough. The temperature of the vapor deposition source is in the range of 50 ~ 300 ℃, depending on the molecular weight of the fluororesin used, but if it is lower than 50 ℃,
Since the fluorine-containing resin is hard to vaporize and the molecular density in the device is low, vapor deposition takes time. Further, when the temperature is higher than 300 ° C., the fluorine-containing resin is easily vaporized, the molecular energy is large, and the vapor deposition proceeds rapidly. However, if the temperature is too high, the substrate may be deformed or deteriorated, or the control of the film thickness may become difficult, depending on the distance to the substrate and the vapor deposition time.

含フッ素樹脂と基体との距離は装置にもよるが5〜50c
mの範囲が好ましい。50cmより大きい場合には、平均
自由行程にくらべて距離が大き過ぎるために含フッ素樹
脂分子がエネルギーを失って落下してしまう。距離は短
いほどよいが、5cmより短いと基体が蒸発源の放射熱
に耐えられず、変形、変質しやすい。本発明が対象とす
る基体の材質は特に限定されず、いかなる種類の材料で
もよいが、本発明の効果が最も発揮されるのは、基体が
耐熱性のない材料の場合である。すなわち、本発明の範
囲の低分子量の含フッ素樹脂を用いた場合には、基体温
度をほぼ常温としたままで、均質な含フッ素樹脂皮膜を
形成しうるものであり、基体の変形、変質を伴うことな
しに良好に各種物性に優れた皮膜を形成できる。かかる
材料としては、一般にはプラスチック材料があり、ま
た、基材自体は耐熱性の材料であっても、その表面に機
能性を有する各種の薄膜が形成された材料であって、熱
履歴を嫌う材料、たとえば磁気ディスク等の材料に対し
て特に有効である。
The distance between the fluororesin and the substrate depends on the device but is 5 to 50c.
A range of m is preferred. If it is larger than 50 cm, the fluorine-containing resin molecule loses energy and falls because the distance is too large as compared with the mean free path. The shorter the distance, the better, but if the distance is shorter than 5 cm, the substrate cannot withstand the radiant heat of the evaporation source, and is easily deformed or deteriorated. The material of the substrate targeted by the present invention is not particularly limited and may be any type of material, but the effect of the present invention is most exerted when the substrate is a material having no heat resistance. That is, when a low molecular weight fluorine-containing resin within the scope of the present invention is used, a uniform fluorine-containing resin film can be formed with the temperature of the substrate kept at about room temperature. A film excellent in various physical properties can be formed without being accompanied. As such a material, generally, there is a plastic material, and even if the base material itself is a heat-resistant material, it is a material having various functional thin films formed on the surface thereof, and the heat history is disliked. It is particularly effective for materials such as magnetic disks.

蒸着時間は数秒〜数十分程度の範囲である。これより時
間が短いと膜の生成には至らず、これより長くなると結
晶が成長して均一な膜を得ることができない。
The vapor deposition time is in the range of several seconds to several tens of minutes. If the time is shorter than this, the formation of a film cannot be achieved, and if it is longer than this, crystals grow and a uniform film cannot be obtained.

上記の条件で蒸着をおこなうことにより膜厚み数nm〜
数μmの平滑な皮膜を得ることができる。膜厚のコント
ロールは当然、蒸着時間によりおこなうことができる
が、厳密なコントロールをおこなうには、含フッ素樹脂
を全量蒸発させて蒸着するようにし、基材面積に応じ
て、適宜所望の膜厚を得ることができる。
By performing vapor deposition under the above conditions, a film thickness of several nm
A smooth film with a thickness of several μm can be obtained. The film thickness can of course be controlled by the vapor deposition time, but in order to perform strict control, the fluorine-containing resin should be vaporized by evaporating the entire amount, and the desired film thickness should be set appropriately according to the substrate area. Obtainable.

以上は真空メッキにより被覆する方法について述べた
が、本発明の第2の方法、すなわち、平均分子量が600
〜1500の範囲の含フッ素樹脂を有機溶剤に溶解してなる
溶液により基体上に塗膜を形成し、該有機溶剤を揮散さ
せる方法によっても良好な被膜形成が可能である。平均
分子量がこの範囲にある含フッ素樹脂は種々の溶媒に溶
解可能であるが、このうち不燃性、低毒性等の物性に優
れ、しかも容易に揮発する溶媒である1,1,2-トリクロロ
-1,2,2-トリフルオロエタン(フロン113)は最も好
ましい溶媒の1つである。たとえば平均分子量700の含
フッ素樹脂の場合、このフロン113には常温で5g/
フロン113−100g程度溶解するものであり、この
溶解液を用いて、各種基体に浸漬、スプレー、塗布、ス
ピンコート等の各種手段により液膜を形成し、自然乾
燥、あるいは場合によって加熱乾燥させることにより溶
媒が揮散し、溶液中に溶解している低分子量の含フッ素
樹脂が基材に密着した均一透明な膜として得られるもの
である。この場合、フロン113は自然乾燥で容易に揮
散するため、特に加熱乾燥が不都合な材料の場合には、
自然乾燥をおこなうことが好ましい。得られる含フッ素
樹脂被膜の膜厚は液膜形成手段によっても異なるが、基
本的には溶媒の種類、含フッ素樹脂の溶解量により決定
される。例えば、フロン113の100gに対して0.3g溶
解した液を用いた場合浸漬法では、0.2μm程度の被膜
が得られる。
Although the method of coating by vacuum plating has been described above, the second method of the present invention, that is, the average molecular weight is 600
It is also possible to form a good coating film by a method of forming a coating film on a substrate with a solution prepared by dissolving a fluororesin in the range of to 1500 in an organic solvent and volatilizing the organic solvent. Fluorine-containing resins having an average molecular weight in this range can be dissolved in various solvents, but among them, 1,1,2-trichloro, which is a solvent that has excellent physical properties such as nonflammability and low toxicity, and is easily volatilized
-1,2,2-Trifluoroethane (CFC113) is one of the most preferred solvents. For example, in the case of a fluorine-containing resin having an average molecular weight of 700, this fluorocarbon 113 has 5 g /
About 100-100 g of Freon is dissolved, and a liquid film is formed by various means such as dipping, spraying, coating, and spin coating on various substrates using this solution, and naturally drying or, if necessary, heat drying. Thus, the solvent is volatilized, and the low molecular weight fluororesin dissolved in the solution is obtained as a uniform transparent film in close contact with the substrate. In this case, the CFC 113 is easily dried by volatilization naturally, so especially in the case of a material in which heat drying is inconvenient,
It is preferable to perform natural drying. The film thickness of the obtained fluororesin coating varies depending on the liquid film forming means, but is basically determined by the type of solvent and the amount of the fluororesin dissolved. For example, when a solution in which 0.3 g of Freon 113 is dissolved in 100 g is used, a film of about 0.2 μm can be obtained by the dipping method.

このようにして得られた被膜は基材との密着性に優れた
膜であり、潤滑性能、撥水・撥油性等の各種物性の高い
透明な表面を提供するものである。
The coating film thus obtained is a film having excellent adhesion to the base material, and provides a transparent surface having various physical properties such as lubricating performance and water / oil repellency.

以上、含フッ素樹脂として、本発明者らが提案した特願
昭61-285962号の方法により得られるものを用いる例に
ついて述べたが、必ずしも、かかる方法により得られる
含フッ素樹脂低分子量物を使用する必要はなく、他の手
段、例えば、市販の低分子量含フッ素樹脂有機溶媒分散
体を使用することも可能である。すなわち、デュポン社
製″Vydax AR″(フロン113中に分散されたテトラフ
ルオロエチレンテロマー)を遠心沈降法あるいはろ過等
の手段により非溶解分を除去し、含フッ素樹脂低分子量
物のフロン113溶液を得ることができる。このものは
そのまま本発明の被覆法の第2の方法に使用することが
でき、各種基体上に液膜を形成し、乾燥させることによ
り、含フッ素樹脂被膜を形成することができる。また、
この含フッ素樹脂低分子量物のフロン113溶液の溶媒
(フロン113)を揮発させ、固形状の含フッ素樹脂を
得ることができる。このものは、その平均分子量が70
0程度であり、本発明の被覆法の第1の方法である真空
メッキ法のターゲット材として使用できる。
As described above, examples of using the fluororesin obtained by the method of Japanese Patent Application No. 61-285962 proposed by the present inventors have been described, but the fluororesin low molecular weight product obtained by such a method is not necessarily used. However, it is also possible to use other means, for example, a commercially available low molecular weight fluororesin organic solvent dispersion. That is, "Vydax AR" (tetrafluoroethylene telomer dispersed in Freon 113) manufactured by DuPont is used to remove non-dissolved components by means such as centrifugal sedimentation or filtration, and a fluorocarbon resin low molecular weight Freon 113 solution is obtained. Obtainable. This product can be used as it is in the second method of the coating method of the present invention, and a fluororesin coating film can be formed by forming a liquid film on various substrates and drying it. Also,
The solvent (Freon 113) of the fluorocarbon low molecular weight Freon 113 solution can be volatilized to obtain a solid fluororesin. This has an average molecular weight of 70
It is about 0 and can be used as a target material in the vacuum plating method which is the first method of the coating method of the present invention.

以下、本発明を実施例により具体的に説明する。Hereinafter, the present invention will be specifically described with reference to examples.

参考例1 特願昭61-285962号の方法と同様にして含フッ素樹脂低
分子量の微粉末を得た。すなわち、5mm角のPTFEペ
レットをニッケル製反応器に仕込み窒素ガスで稀釈した
フッ素ガスを導入し450℃で反応を行い、PTFEの主
鎖切断を行った。得られたワックスを粗粉砕ののち、ジ
ェットミルで微粉砕し、融点315℃、分子量8500、平均
粒子径3μmの粉末を得た。この粗粉砕ワックスを窒素
で10%に稀釈したフッ素ガス中550℃で反応をおこな
い、反応生成ガスを吸引し冷却器で約30℃に冷却し低分
子量物を析出、補集した。このようにして得た平均分子
量2000(比較例1)の粉末を得た。この粉末を用い、蒸
発温度、冷却温度を種々かえて平均分子量が約700、
1000、1500の3種類の含フッ素樹脂粉末を得
た。
Reference Example 1 A low molecular weight fluorine-containing resin fine powder was obtained in the same manner as in Japanese Patent Application No. 61-285962. That is, 5 mm square PTFE pellets were charged into a nickel reactor, fluorine gas diluted with nitrogen gas was introduced, and the reaction was carried out at 450 ° C. to cut the main chain of PTFE. The wax thus obtained was roughly pulverized and then finely pulverized with a jet mill to obtain a powder having a melting point of 315 ° C., a molecular weight of 8500 and an average particle diameter of 3 μm. This coarsely pulverized wax was reacted at 550 ° C. in fluorine gas diluted with nitrogen to 10%, and the reaction product gas was sucked and cooled to about 30 ° C. by a cooler to deposit and collect low molecular weight substances. A powder having an average molecular weight of 2000 (Comparative Example 1) thus obtained was obtained. Using this powder, the average molecular weight is about 700, with various evaporation and cooling temperatures.
Three kinds of fluorine-containing resin powders 1000 and 1500 were obtained.

なお、分子量の測定は既知のパーフルオロカーボンの融
点と米国特許第3067262号に示される融点と分子量の関
係から求めた。
The molecular weight was determined from the relationship between the known melting point of perfluorocarbon and the melting point and molecular weight shown in US Pat. No. 3,067,262.

実施例1 磁性粉としてγ−Feの塗膜面を有する磁気ディス
ク(アルミ基板)%基体とし参考例1で得た平均分子量
700の含フッ素樹脂を蒸発源とし、150℃に加熱し、
3×10-4torrの真空度に維持した真空蒸着装置内で蒸着
をおこなった。蒸着時間は3秒、蒸着源と基体との距離
は15cmである。また、基体の温度は蒸着終了時におい
て30℃であった。得られた膜の評価をおこなった。接触
角はn−エキサデカンを1滴、滴下し、投影法により測
定した。摩擦係数はα−アルミナのスライダを周速20m
/sec、荷重20gの条件で測定した。耐久性は膜が破損
し、磁性層面に傷が発生するまでの摺動回数を測定し
た。この結果を第1表に示した。
Example 1 A magnetic disk (aluminum substrate)% substrate having a coated surface of γ-Fe 2 O 3 as magnetic powder was used, and the fluorine-containing resin having an average molecular weight of 700 obtained in Reference Example 1 was used as an evaporation source and heated to 150 ° C. ,
Vapor deposition was performed in a vacuum vapor deposition apparatus maintained at a vacuum degree of 3 × 10 −4 torr. The vapor deposition time is 3 seconds, and the distance between the vapor deposition source and the substrate is 15 cm. The temperature of the substrate was 30 ° C. at the end of vapor deposition. The obtained film was evaluated. The contact angle was measured by a projection method after dropping one drop of n-exadecane. Friction coefficient is α-alumina slider 20 m circumferential speed
/ Sec, the load was 20 g. The durability was measured by the number of times of sliding until the film was damaged and the magnetic layer surface was scratched. The results are shown in Table 1.

実施例2〜4 実施例1と同様にして、基体の種類、含フッ素樹脂の種
類、反応条件を第1表のとおりとし、蒸着をおこなっ
た。この結果を第1表に示した。
Examples 2 to 4 Vapor deposition was performed in the same manner as in Example 1, except that the type of substrate, the type of fluororesin and the reaction conditions were as shown in Table 1. The results are shown in Table 1.

実施例5 デュポン社製”Vydax AR”を遠心沈降機にかけ固形分を
含まない溶液を得た。この溶液を加熱し、溶媒であるフ
ロン113を揮散させて白色の固形分を得た。このもの
はDTA分析により、融点は82℃であることを確認し、
参考例と同様にして、その平均分子量を求めたところ約
700であった。この固形分を実施例1と同様にして蒸
着をおこなった。この結果を第1表にしめした。
Example 5 "Vydax AR" manufactured by DuPont was subjected to a centrifugal sedimentation machine to obtain a solution containing no solid content. This solution was heated to volatilize the freon 113 as a solvent to obtain a white solid. This product was confirmed to have a melting point of 82 ° C by DTA analysis,
The average molecular weight was about 700 as in the reference example. This solid content was vapor-deposited in the same manner as in Example 1. The results are shown in Table 1.

実施例6、7、8 参考例1で得た各種含フッ素樹脂(平均分子量700)
(実施例6)および実施例5で得た含フッ素樹脂(実施
例7)をフロン113に溶解し溶液を得た(いずれも0.
3g/フロン113−100gの濃度)。この溶液を用い実
施例1と同じ基体上にスピンコートし、自然乾燥により
被膜を得た。また、実施例5で遠心沈降により得た固形
分を含まない溶液(実施例8)をそのまま用いて同様に
被膜を得た。この膜の評価を次に示した。
Examples 6, 7 and 8 Various fluorine-containing resins obtained in Reference Example 1 (average molecular weight 700)
The fluororesin (Example 7) obtained in (Example 6) and Example 5 was dissolved in Freon 113 to obtain a solution.
3 g / Freon 113-100 g concentration). This solution was spin-coated on the same substrate as in Example 1 and naturally dried to obtain a film. In addition, a solution containing no solid content (Example 8) obtained by centrifugal sedimentation in Example 5 was used as it was, and a film was similarly obtained. The evaluation of this film is shown below.

膜厚 接触角 摩擦係数 耐久性 実施例6 0.03μ 81゜ 0.23 29000 実施例7 0.03 80 0.25 30000 実施例8 0.51 75 0.35 10000 比較例1 参考例1で得た平均分子量2000の含フッ素樹脂を用
い、実施例1と同様にして蒸着をおこなったが、膜は得
られず、粉末が析出した。また、70℃でも同様であっ
た。そこで基体温度を100℃にて蒸着をおこなった。こ
の結果を第1表に示した。
Film thickness Contact angle Friction coefficient Durability Example 6 0.03μ 81 ° 0.23 29000 Example 7 0.03 80 0.25 30000 Example 8 0.51 75 0.35 10000 Comparative Example 1 Using the fluorine-containing resin having an average molecular weight of 2000 obtained in Reference Example 1, Vapor deposition was carried out in the same manner as in Example 1, but no film was obtained and powder was deposited. The same was true at 70 ° C. Therefore, vapor deposition was performed at a substrate temperature of 100 ° C. The results are shown in Table 1.

[発明の効果] 本発明の含フッ素樹脂被覆体は特定の範囲の低分子量物
により被覆されたものであり、各種物性、特にその潤滑
性能に優れ、しかもかかる被覆体を得るには、加熱条件
下での工程を要しないため、耐熱性のない材料、あるい
は、熱履歴による変質を受けやすい材料の表面改質には
すぐれた効果を発揮するものである。
[Effects of the Invention] The fluororesin coating of the present invention is coated with a low molecular weight substance in a specific range, and has various physical properties, in particular, its lubricating performance is excellent. Since it does not require a step below, it exhibits an excellent effect for surface modification of a material having no heat resistance or a material which is susceptible to deterioration due to heat history.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】基体上に含フッ素樹脂をフッ素化剤の存在
下で加熱反応させ、発生する反応生成ガスからその中に
含まれているより低分子量化された含フッ素樹脂を冷
却、析出させる方法により得られる平均分子量が600〜1
500の範囲の含フッ素樹脂を被覆してなる含フッ素樹脂
被覆体。
1. A fluorine-containing resin is heated and reacted on a substrate in the presence of a fluorinating agent, and a lower-molecular-weight fluorine-containing resin contained therein is cooled and precipitated from the generated reaction product gas. The average molecular weight obtained by the method is 600-1
A fluororesin-coated body obtained by coating a fluororesin in the range of 500.
【請求項2】含フッ素樹脂をフッ素化剤の存在下で加熱
反応させ、発生する反応生成ガスからその中に含まれて
いるより低分子量化された含フッ素樹脂を冷却、析出さ
せる方法により得られる平均分子量が600〜1500の範囲
の含フッ素樹脂をターゲット材として真空メッキ法によ
り基体上に該含フッ素樹脂を被覆することを特徴とする
含フッ素樹脂被覆体の製造法。
2. Obtained by a method of heating and reacting a fluororesin in the presence of a fluorinating agent, and cooling and precipitating a lower molecular weight fluororesin contained therein from the generated reaction product gas. A method for producing a fluororesin-coated body, which comprises coating the fluororesin on a substrate by vacuum plating using a fluororesin having an average molecular weight in the range of 600 to 1500 as a target material.
【請求項3】含フッ素樹脂をフッ素化剤の存在下で加熱
反応させ、発生する反応生成ガスからその中に含まれて
いるより低分子量化された含フッ素樹脂を冷却、析出さ
せる方法により得られる平均分子量が600〜1500の範囲
の含フッ素樹脂を有機溶剤に溶解してなる溶液により基
体上に塗膜を形成し、該有機溶剤を揮散させることを特
徴とする含フッ素樹脂被覆体の製造法。
3. A method in which a fluororesin is heated and reacted in the presence of a fluorinating agent, and a lower molecular weight fluororesin contained therein is cooled and precipitated from the generated reaction product gas. The average molecular weight is 600 ~ 1500 to form a coating film on a substrate by a solution of a fluororesin dissolved in an organic solvent, the production of a fluororesin coating characterized by volatilizing the organic solvent Law.
JP63136467A 1988-06-02 1988-06-02 Fluorine-containing resin coated body and method for producing the same Expired - Lifetime JPH069918B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Application Number Priority Date Filing Date Title
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Publication Number Publication Date
JPH01304936A JPH01304936A (en) 1989-12-08
JPH069918B2 true JPH069918B2 (en) 1994-02-09

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* Cited by examiner, † Cited by third party
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JPH101554A (en) 1996-06-18 1998-01-06 Nisshinbo Ind Inc Melamine resin foam excellent in oil repellency
JP4945851B2 (en) * 2001-02-26 2012-06-06 ダイキン工業株式会社 Non-adhesive wear-resistant paint composition and non-adhesive wear-resistant coated article
JP2003105529A (en) * 2001-09-28 2003-04-09 Matsushita Electric Ind Co Ltd Method of manufacturing resin film, electronic component and method of manufacturing the same
JP4585798B2 (en) * 2004-06-15 2010-11-24 株式会社ティー アンド ケー Fluorine-containing thin film and method for producing substrate having the fluorine-containing thin film
US20060051570A1 (en) * 2004-09-03 2006-03-09 Kaori Iwamoto Perfluoroelastomer articles having good surface properties
US7767251B2 (en) * 2005-03-16 2010-08-03 Shiping Wang Repellent elastomeric article
KR20100014816A (en) 2007-04-20 2010-02-11 아사히 가라스 가부시키가이샤 Fluorine-containing polymer thin film and method for producing the same
CN115044905B (en) * 2022-07-19 2024-11-22 枣阳新和化工有限公司 A cathode two-component electrophoretic paint coating process

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JPH0737536B2 (en) * 1986-04-02 1995-04-26 エヌティエヌ株式会社 Sliding material
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