JPH07100640B2 - Single crystal manufacturing method - Google Patents
Single crystal manufacturing methodInfo
- Publication number
- JPH07100640B2 JPH07100640B2 JP63049492A JP4949288A JPH07100640B2 JP H07100640 B2 JPH07100640 B2 JP H07100640B2 JP 63049492 A JP63049492 A JP 63049492A JP 4949288 A JP4949288 A JP 4949288A JP H07100640 B2 JPH07100640 B2 JP H07100640B2
- Authority
- JP
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- Prior art keywords
- single crystal
- rod
- crystal
- zone
- high frequency
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は単結晶を製造する方法、特に高融点金属化合物
の転移及び副微結晶の少ない単結晶をフローティングゾ
ーン法によって製造する方法に関する。Description: TECHNICAL FIELD The present invention relates to a method for producing a single crystal, and more particularly to a method for producing a single crystal with less transition of refractory metal compound and sub-microcrystals by a floating zone method.
(従来の技術及びその問題点) 遷移金属の炭化物、炭窒化物、二硼化物及び六硼化カル
シウム型結晶構造を有する六硼化物などの高融点金属化
合物は、いずれも高い硬度を有しており、種々の用途に
利用されている。例えば、遷移金属の炭化物、炭窒化物
は、サーメットとして各種の切削工具、耐摩耗部品など
の実用に供せられている他に、電子材料、特にフィール
ドエミッターとして有望なものと考えられている。ま
た、遷移金属の二硼化物は、切削工具、高温構造部材な
どの用途開発が行われている。希土類元素の六硼化物の
中で六硼化ランタンは仕事関数が低く、高温での蒸気圧
が低いので、高輝度熱電子源として使用されている。(Prior Art and Its Problems) High melting point metal compounds such as transition metal carbides, carbonitrides, diborides and hexaborides having a calcium hexaboride type crystal structure all have high hardness. And is used for various purposes. For example, carbides and carbonitrides of transition metals are considered to be promising as electronic materials, especially field emitters, in addition to being used as cermets for various cutting tools, wear-resistant parts and the like. Further, the transition metal diboride is being developed for applications such as cutting tools and high temperature structural members. Among the rare earth element hexaborides, lanthanum hexaboride has a low work function and a low vapor pressure at high temperatures, and is therefore used as a high-intensity thermionic electron source.
これらの高融点金属化合物の単結晶育成法としては、フ
ラックス法、フローティングゾーン法などが知られてい
る。特にフローティングゾーン法は大型で良質の単結晶
を育成する方法として適しており、種々の提案がされて
いる。Flux method, floating zone method and the like are known as methods for growing single crystals of these refractory metal compounds. In particular, the floating zone method is suitable as a method for growing a large-sized single crystal of high quality, and various proposals have been made.
例えば、セラミックス誌11巻12号1083ページ(1976)に
は、LaB6などの六硼化物、ZrB2などの二硼化物の単結晶
を高周波誘導加熱によるフローティングゾーン法によっ
て育成する方法が記載されている。また、J.Less−Com
m.Metal82巻63ページ(1981)には、TiCなどの遷移金属
の炭化物の単結晶を高周波誘導加熱フローティングゾー
ン法によって育成する方法が開示されている。これらの
方法において高周波コイルの発振周波数は200KHzであ
り、得られる結晶棒には約1〜2mm3の副微結晶が多数存
在することが報告されている。前述した各種の用途に
は、フローティングゾーン法によって得られる結晶棒中
の副微結晶を出来るかぎり少なくすることが要望されて
いる。For example, Ceramics Vol. 11, No. 12, p. 1083 (1976) describes a method of growing a single crystal of a hexaboride such as LaB 6 or a diboride such as ZrB 2 by a floating zone method by high frequency induction heating. There is. Also, J. Less-Com
m. Metal, vol. 82, p. 63 (1981), a method for growing a single crystal of a transition metal carbide such as TiC by a high frequency induction heating floating zone method is disclosed. It has been reported that in these methods, the oscillation frequency of the high-frequency coil is 200 KHz, and the obtained crystal ingot has a large number of sub-fine crystals of about 1 to 2 mm 3 . For the above-mentioned various uses, it is desired to reduce the amount of sub-fine crystals in the crystal rod obtained by the floating zone method as much as possible.
(問題点を解決するための技術的手段) 本発明は上記要望を満足する高融点金属化合物の単結晶
の製造法を提供するものである。(Technical Means for Solving Problems) The present invention provides a method for producing a single crystal of a refractory metal compound which satisfies the above-mentioned needs.
本発明は、NaCl型結晶構造を有する遷移金属の炭化物及
び炭窒化物から選ばれる高融点金属化合物の単結晶を高
周波誘導加熱によるフローティングゾーン法によって製
造する際に、高周波コイルの発振周波数を250KHz〜1MHz
とし、高融点金属化合物からなる焼結棒の溶融部におけ
る直径に対する長さの比率を0.4〜1.2とすることを特徴
とする単結晶の製造法である。The present invention, when producing a single crystal of a refractory metal compound selected from carbides and carbonitrides of a transition metal having a NaCl type crystal structure by a floating zone method by high frequency induction heating, an oscillation frequency of a high frequency coil of 250 KHz ~ 1MHz
And the ratio of the length to the diameter in the fusion zone of the sintered rod made of a high melting point metal compound is 0.4 to 1.2.
本発明で使用される高融点金属化合物としては、NaCl型
結晶構造を有する遷移金属の炭化物及び炭窒化物が挙げ
られる。Examples of the refractory metal compound used in the present invention include transition metal carbides and carbonitrides having a NaCl type crystal structure.
NaCl型結晶構造を有する遷移金属炭化物の具体例として
は、TiC、ZrC、HfC、VC、NbC及びTaCが挙げられ、同炭
窒化物の具体例としては、TiCxNy、ZrCxNy、HfCxNy、VC
xNy、NbCxNy及びTaCxNyが挙げられる。上記において、
x<1、y<1、x+y≦1である。Specific examples of the transition metal carbide having a NaCl type crystal structure include TiC, ZrC, HfC, VC, NbC and TaC, and specific examples of the carbonitride include TiC x N y , ZrC x N y , HfC x N y , VC
and xN y , NbC x N y and TaC x N y . In the above,
x <1, y <1, and x + y ≦ 1.
これらの高融点金属化合物は常法に従い棒状に焼結した
後にフローティングゾーン法による処理に供される。These refractory metal compounds are subjected to a treatment by a floating zone method after being sintered into a rod shape by a conventional method.
本発明において高周波コイルの発振周波数は250KHz、〜
1MHz、好ましくは300〜700KHzである。発振周波数が250
KHz未満では、育成した結晶棒表面に不可避的に生成す
る多結晶外皮が厚くなると共に、中央部の単結晶領域中
の副微結晶が増大する。発振周波数が1MHzを超えると、
供給焼結棒の表面のみが溶融し、中心部が溶融しないた
め、均一な単結晶を育成することが困難である。In the present invention, the oscillation frequency of the high frequency coil is 250 KHz, ~
It is 1 MHz, preferably 300 to 700 KHz. Oscillation frequency is 250
If it is less than KHz, the polycrystal skin that is inevitably formed on the surface of the grown crystal rod becomes thick and the amount of sub-microcrystals in the central single crystal region increases. When the oscillation frequency exceeds 1MHz,
It is difficult to grow a uniform single crystal because only the surface of the supply sintered rod is melted and the central portion is not melted.
高融点金属化合物からなる焼結棒の溶融部における直径
に対する長さの比率は0.4〜1.2、好ましくは0.5〜1.0で
ある。この比率が0.4より小さいと、供給焼結棒の中心
部が充分に溶融せず、固液界面が溶融部側に凸形状にな
り過ぎて、均一な単結晶を製造することができない。上
記の比率が1.2を超えると、溶融部の長さが長くなり過
ぎ、界面形状が溶融部側に凹形状になって、多数の粒子
が発生し、単結晶とすることが困難になる。The ratio of the length to the diameter in the fusion zone of the sintered rod made of a high melting point metal compound is 0.4 to 1.2, preferably 0.5 to 1.0. If this ratio is smaller than 0.4, the central portion of the feed sintered rod will not be sufficiently melted, and the solid-liquid interface will be too convex toward the melted portion side, and a uniform single crystal cannot be manufactured. If the above ratio exceeds 1.2, the length of the fusion zone becomes too long, the interface shape becomes concave toward the fusion zone, and a large number of particles are generated, making it difficult to obtain a single crystal.
本発明におけるフローティングゾーン法の例を、使用す
る装置の概略を示す第1図に基づいて説明する。An example of the floating zone method according to the present invention will be described with reference to FIG. 1 showing an outline of an apparatus used.
回転軸1に取り付けられたホルダー2により棒状焼結体
3A及び3Bが支持される。高周波コイル4から250KHz〜1M
Hzの範囲内の高周波を発生させて、棒状焼結体3Aを誘導
加熱することにより溶融させて、直径に対する長さの比
率が0.4〜1.2の範囲内の溶融帯5を形成させる。溶融帯
5の上端部における棒状連結体3Aの溶融と、溶融帯5の
下端部における棒状単結晶6の析出を制御しながら、ホ
ルダー2に保持された棒状焼結体3Aを徐々に下方に移動
させることによって、棒状単結晶6が育成される。ホル
ダー2の移動速度は3〜30mm/hrであることが好まし
い。A rod-shaped sintered body with a holder 2 attached to a rotating shaft 1.
3A and 3B are supported. High frequency coil 4 to 250KHz ~ 1M
A high frequency within the range of Hz is generated, and the rod-shaped sintered body 3A is melted by induction heating to form a melting zone 5 having a ratio of length to diameter within the range of 0.4 to 1.2. While controlling the melting of the rod-shaped connecting body 3A at the upper end of the melting zone 5 and the precipitation of the rod-shaped single crystal 6 at the lower end of the melting zone 5, the rod-shaped sintered body 3A held by the holder 2 is gradually moved downward. By doing so, the rod-shaped single crystal 6 is grown. The moving speed of the holder 2 is preferably 3 to 30 mm / hr.
(発明の効果) 本発明によれば、転移密度、福微結晶密度の両者を、公
知のフローティングゾーン法で得られる単結晶に比し
て、1/5〜1/10に低減させることができる。(Effects of the Invention) According to the present invention, both the transition density and the fine crystal density can be reduced to 1/5 to 1/10 as compared with a single crystal obtained by a known floating zone method. .
(実施例) 以下に実施例を示す。実施例及び比較例において第1図
に示す装置を使用して単結晶を製造した。(Example) An example is shown below. Single crystals were manufactured using the apparatus shown in FIG. 1 in Examples and Comparative Examples.
実施例1 TiC粉末及び黒鉛粉末を混合した後、混合物を直径12m
m、長さ130mm及び50mmの2本の円柱にラバープレスに成
形した。これらの円柱を真空中1800℃で30分間焼結し
て、C/Ti原子比が0.99の棒状焼結体A、Bを得た。Example 1 After mixing TiC powder and graphite powder, the mixture was made to have a diameter of 12 m.
Two cylinders of m, length 130 mm and length 50 mm were molded by a rubber press. These cylinders were sintered in vacuum at 1800 ° C. for 30 minutes to obtain rod-shaped sintered bodies A and B having a C / Ti atomic ratio of 0.99.
棒状焼結体Aを上部、棒状焼結体Bを下部にしてホルダ
ー2で支持し、両焼結体の端部接触面に厚さ1mmの黒鉛
円板を挟んだ。The rod-shaped sintered body A was supported on the holder 2 with the rod-shaped sintered body A on the upper side and the rod-shaped sintered body B on the lower side, and a graphite disk having a thickness of 1 mm was sandwiched between the end contact surfaces of both sintered bodies.
全圧8気圧のヘリウムガス雰囲気中、高周波コイルの発
振周波数500KHzで、棒状焼結体A及び黒鉛円板との接触
部を溶融して溶融部を形成させ、溶融部の直径を10.0m
m、長さを6.5mmとして、両焼結棒を6mm/hrで下方に移動
させると共に10rpmで回転させた。棒状焼結体Aは溶融
帯域中に溶け込み、溶融帯下部には、C/Tiが0.96の単結
晶が育成された。In a helium gas atmosphere with a total pressure of 8 atm, at the oscillation frequency of the high-frequency coil of 500 KHz, the contact portion between the rod-shaped sintered body A and the graphite disk is melted to form a melted portion, and the diameter of the melted portion is 10.0 m.
With both m and length of 6.5 mm, both sintered rods were moved downward at 6 mm / hr and rotated at 10 rpm. The rod-shaped sintered body A melted into the melting zone, and a single crystal with C / Ti of 0.96 was grown in the lower portion of the melting zone.
得られた直径10.5mm、長さ60mmの結晶棒の品質を調査す
るため、(100)面を劈開し、劈開面を弗硝酸溶液でエ
ッチングして、転移密度及び副微結晶密度を測定した。
転移密度は104/cm2、副微結晶密度は10個/cm2であり、
上記結晶棒は良質な単結晶であることが判明した。In order to investigate the quality of the obtained crystal rod having a diameter of 10.5 mm and a length of 60 mm, the (100) plane was cleaved and the cleaved surface was etched with a hydrofluoric nitric acid solution to measure the transition density and the sub-fine crystal density.
The dislocation density is 10 4 / cm 2 , the secondary crystallite density is 10 pieces / cm 2 ,
It was found that the crystal rod was a good quality single crystal.
比較例1 高周波発振コイルの発振周波数を150KHzとした以外は実
施例1と同様の方法を繰り返した。得られた結晶の転移
密度は106/cm2、副微結晶密度は200個/cm2であった。Comparative Example 1 The same method as in Example 1 was repeated except that the oscillation frequency of the high frequency oscillation coil was 150 KHz. The obtained crystals had a transition density of 10 6 / cm 2 and a sub-fine crystal density of 200 crystals / cm 2 .
実施例2 棒状焼結体A、Bの組成をZrC0.7N0.3に変え、雰囲気
ガスの組成をヘリウム分圧9.5気圧、窒素分圧0.5気圧の
混合ガスに変え、さらに発振周波数を700KHzに変えた以
外は実施例1と同様の方法を繰り返した。Example 2 The composition of the rod-shaped sintered bodies A and B was changed to ZrC 0.7 N 0.3 , the composition of the atmosphere gas was changed to a mixed gas of helium partial pressure of 9.5 atm and nitrogen partial pressure of 0.5 atm, and the oscillation frequency was changed to 700 KHz. The same method as in Example 1 was repeated except for the above.
得られた直径10mm、長さ70mmの結晶棒の組成はZrC0.65
N0.2であり、転移密度は5×104/cm2、副微結晶密度は
20個/cm2あり、上記結晶棒は良質な単結晶であることが
判明した。The composition of the obtained crystal rod having a diameter of 10 mm and a length of 70 mm was ZrC 0.65.
N 0.2 , transition density 5 × 10 4 / cm 2 , sub-crystallite density
There were 20 pieces / cm 2, and it was found that the above crystal rod was a good quality single crystal.
比較例2 溶融部の直径を10mm、長さ15mmに変えた以外は実施例2
と同様の方法を繰り返した。得れた結晶の転移密度は10
7/cm2、副微結晶密度は250個/cm2であった。Comparative Example 2 Example 2 except that the diameter of the fusion zone was changed to 10 mm and the length was changed to 15 mm.
The same method was repeated. The transition density of the obtained crystal is 10
The density of secondary crystallites was 7 / cm 2 , and the number of secondary crystallites was 250 grains / cm 2 .
【図面の簡単な説明】 第1図は本発明を実施する装置の概略を示す図である。 3A、3B……棒状焼結体、 4……高周波コイル 5……溶融帯 6……棒状単結晶BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view of an apparatus for carrying out the present invention. 3A, 3B ... Rod-shaped sintered body, 4 ... High-frequency coil 5 ... Melting zone 6 ... Rod-shaped single crystal
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭60−226495(JP,A) 特開 昭59−146998(JP,A) 特公 昭60−6915(JP,B2) 特公 昭58−14399(JP,B2) ─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP 60-226495 (JP, A) JP 59-146998 (JP, A) JP 60-6915 (JP, B2) JP 58- 14399 (JP, B2)
Claims (1)
及び炭窒化物から選ばれる高融点金属化合物の単結晶を
高周波誘導加熱によるフローティングゾーン法によって
製造する際に、高周波コイルの発振周波数を250KHz〜1M
Hzとし、高融点金属化合物からなる焼結棒の溶融部にお
ける直径に対する長さの比率を0.4〜1.2とすることを特
徴とする単結晶の製造法。1. An oscillation frequency of a high frequency coil is 250 KHz when a single crystal of a refractory metal compound selected from carbides and carbonitrides of a transition metal having a NaCl type crystal structure is manufactured by a floating zone method by high frequency induction heating. ~ 1M
A method for producing a single crystal, characterized in that the ratio of the length to the diameter in the fusion zone of the sintered rod made of a high melting point metal compound is set to 0.4 to 1.2 in Hz.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63049492A JPH07100640B2 (en) | 1988-03-04 | 1988-03-04 | Single crystal manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63049492A JPH07100640B2 (en) | 1988-03-04 | 1988-03-04 | Single crystal manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01224291A JPH01224291A (en) | 1989-09-07 |
| JPH07100640B2 true JPH07100640B2 (en) | 1995-11-01 |
Family
ID=12832646
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63049492A Expired - Lifetime JPH07100640B2 (en) | 1988-03-04 | 1988-03-04 | Single crystal manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07100640B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4817099B2 (en) * | 2006-03-24 | 2011-11-16 | 独立行政法人物質・材料研究機構 | Carbide single crystal and manufacturing method thereof |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59146998A (en) * | 1983-02-05 | 1984-08-23 | Denki Kagaku Kogyo Kk | Method for growing automatically single crystal rod having uniform diameter |
| JPS60226495A (en) * | 1984-04-20 | 1985-11-11 | Hitachi Ltd | Method for growing lanthanum hexaboride single crystal |
-
1988
- 1988-03-04 JP JP63049492A patent/JPH07100640B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01224291A (en) | 1989-09-07 |
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