JPH07104593B2 - Light-shielding masking film - Google Patents
Light-shielding masking filmInfo
- Publication number
- JPH07104593B2 JPH07104593B2 JP30997886A JP30997886A JPH07104593B2 JP H07104593 B2 JPH07104593 B2 JP H07104593B2 JP 30997886 A JP30997886 A JP 30997886A JP 30997886 A JP30997886 A JP 30997886A JP H07104593 B2 JPH07104593 B2 JP H07104593B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- shielding
- layer
- adhesive
- release layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Description
【発明の詳細な説明】 [技術分野] 本発明はベースフイルム上に遮光性の剥離層を設けてな
る写真製版用に用いる遮光性マスキングフイルムに関す
る。更に詳しくは、遮光性、被膜性、耐老化性、易剥離
性のほかに再粘着性を付与した遮光性マスキングフイル
ムに関する。Description: TECHNICAL FIELD The present invention relates to a light-shielding masking film used for photoengraving, which comprises a base film and a light-shielding release layer. More specifically, it relates to a light-shielding masking film having light-shielding property, film-forming property, aging resistance, easy peeling property, and re-adhesion property.
[従来の技術] 従来より、写真製版用に用いる遮光性マスキングフイル
ムには、(イ)プラスチック支持体上の剥離層の材質
が、該プラスチック支持体に良好な接着性を有するゴム
状物質(たとえばニトリルゴム)と、これと相溶性があ
り、且つ室温でべとつかない物質および遮光性の染顔料
との混合物を前記プラスチック支持体上に塗布したもの
(特開昭54−104902号公報参照)、(ロ)透光性プラス
チックフィルム支持体の片面上に、少なくともアクリル
ゴム、塩化ビニル系樹脂および遮光性色素を含有する樹
脂組成物よりなる(さらに艶消剤を配合)剥離層を設け
たもの(特開昭61−110141号公報参照)、(ハ)(1)
プラスチック支持体上に感圧接着剤層を設け、該層上
に、(a)ニトリルゴム(b)ニトロセルロース(c)
粘着改質剤(d)遮光性着色剤を含む遮光性剥離層を設
けてなるもの、或は粘着改質剤(c)が脂肪族エステ
ル、トリメリット酸エステル、エポキシ化合物、ポリエ
ステル化合物の1種又は2種以上であるもの(特開昭61
−166549号公報参照)、(ニ)(A)透明なプラスチッ
ク支持体上に、(B)酢酸ビニル−エチレン共重合体ラ
テックス、塩化ビニル−エチレン共重合体ラテックス、
塩化ビニル−酢酸ビニル−エチレン三元共重合体ラテッ
クス、ポリアクリル酸エステルラテックス、ポリメタア
クリル酸エステルラテックス、ポリエステル樹脂ラテッ
クスおよびポリウレタン樹脂ラテックスの郡から選ばれ
た少なくとも1種のラテックスより形成された透明剥離
層と、(C)該透明剥離層に対して接着性の良好な熱可
塑性樹脂と着色剤とを含む油溶性着色樹脂層とを、順次
形成せしめたもの(特開昭61−143758号公報参照)、
(ホ)膜厚50〜200μmの透明支持体上にエチレン酢
ビ、ポリエチレン、1・2ナイロン等からなるホットメ
ルト層を介して膜厚10〜75μmのポリエチレンテレフタ
レートフィルムからなるラミネート層を施し、該ラミネ
ート層上に遮光性スクライブ適性層を施し、透明支持体
からの剥離性及びスクライブ適性を共有せるように構成
したもの(実開昭55−133442号公報参照)などがあっ
た。[Prior Art] Conventionally, in a light-shielding masking film used for photoengraving, (a) the material of the release layer on the plastic support is a rubber-like substance having good adhesiveness to the plastic support (for example, Nitrile rubber), a mixture of a substance which is compatible with the nitrile rubber and which is not sticky at room temperature and a light-shielding dye / pigment, and which is applied on the plastic support (see JP-A-54-104902), (B) A release layer comprising a resin composition containing at least an acrylic rubber, a vinyl chloride resin and a light-shielding dye (further compounded with a matting agent) is provided on one surface of a translucent plastic film support (special feature). (See Japanese Patent Laid-Open No. 61-110141), (C) (1)
A pressure-sensitive adhesive layer is provided on a plastic support, and (a) nitrile rubber (b) nitrocellulose (c) is provided on the layer.
An adhesive modifier (d) provided with a light-shielding release layer containing a light-shielding colorant, or the adhesive modifier (c) is one of an aliphatic ester, a trimellitic acid ester, an epoxy compound and a polyester compound. Or two or more kinds (Japanese Patent Laid-Open No. 61-61
-166549), (d) (A) vinyl acetate-ethylene copolymer latex, vinyl chloride-ethylene copolymer latex on a transparent plastic support,
Transparent formed from at least one latex selected from the group consisting of vinyl chloride-vinyl acetate-ethylene terpolymer latex, polyacrylic acid ester latex, polymethacrylic acid ester latex, polyester resin latex and polyurethane resin latex A release layer and (C) an oil-soluble colored resin layer containing a thermoplastic resin having good adhesiveness to the transparent release layer and a colorant are sequentially formed (Japanese Patent Laid-Open No. 143758/1986). reference),
(E) A laminated layer made of a polyethylene terephthalate film having a thickness of 10 to 75 μm is formed on a transparent support having a thickness of 50 to 200 μm via a hot melt layer made of ethylene vinyl acetate, polyethylene, 1.2 nylon or the like, There is a laminate (see Japanese Utility Model Laid-Open No. 55-133442) in which a light-shielding scribe-appropriate layer is provided on the laminate layer so that the releasability from the transparent support and the scribe-appropriate are shared.
しかしながら、上記のような遮光性マスキングフイルム
は、いずれも任意の図柄等に遮光性の剥離層を裁断し剥
離して写真製版用に用いられているが、誤って裁断し剥
離した場合にはもとに復元することができず、それまで
の作業労力並びに遮光性マスキングフイルムは無駄にな
ってしまうと言う欠点が有った。更にまたベースフイル
ムの上に直にゴム状物質を設けたものにあっては、経日
或るいは温度湿度に対する安定性が劣るために安定した
剥離層の剥離力、強度、伸度が得られない(ゴム、塩化
ビニルなどの劣化による)と言う欠点を有したり、幾層
にも塗膜を形成する場合には、塗膜が厚い為に長い乾燥
時間を必要とし、ラインスピードが遅くコストアップに
なると言う欠点を有したり、構成層の数が多くやはりコ
ストアップになると言う欠点を有していた。However, the light-shielding masking film as described above is used for photoengraving by cutting and peeling the light-shielding release layer on any pattern etc. However, there is a drawback in that the work effort and the light-shielding masking film up to that point are wasted because they cannot be restored. Furthermore, in the case where the rubber-like substance is provided directly on the base film, the stability of the peeling layer, the strength, and the elongation of the peeling layer are stable because the stability against daytime or temperature and humidity is poor. If you have the disadvantage that it is not present (due to deterioration of rubber, vinyl chloride, etc.), or if you want to form multiple layers of coating, a long drying time is required because the coating is thick, and the line speed is slow and cost is low. It has a drawback that the cost is increased, and that the number of constituent layers is large and the cost is also increased.
[発明の目的] 本発明は上記従来の問題点に鑑み、極めて良好な遮光
性、被膜性、耐老化性、易剥離性のほかに再粘着性を付
与し、任意の図柄等に遮光性の剥離層を裁断し剥離して
写真製版用に用いる作業において、誤って裁断し剥離し
た場合にも、もとに復元することができ、それまでの作
業労力並びに遮光性マスキングフイルムを無駄にするこ
とのない、ローコストの遮光性マスキングフイルムを提
供することにある。[Object of the Invention] In view of the above-mentioned conventional problems, the present invention imparts re-adhesiveness in addition to extremely good light-shielding property, film-forming property, aging resistance, and easy peeling property, so that the light-shielding property can be imparted to any pattern or the like. In the process of cutting and peeling the peeling layer and using it for photolithography, even if it is cut and peeled by mistake, it can be restored to its original state, and the work effort and the light-shielding masking film up to that point are wasted. The purpose of the present invention is to provide a low-cost light-shielding masking film that does not have any cost.
[発明の構成] 即ち本発明は、ベースフイルム(10)の上に再粘着性遮
光性剥離層(20)を設けた遮光性マスキングフイルムに
おいて、ベースフイルム(10)がポリエチレンテレフタ
レートフイルムであり、再粘着性遮光性剥離層(20)が
再粘着性を有するエチレン−酢酸ビニル共重合体からな
る再粘着性剥離層(21)とポリエチレンからなる中間層
(22)とが共押出し法により形成され、さらのその中間
層(22)上にゴム状物質とこのゴム状物質と相溶性があ
る物質および遮光性着色剤との混合物からなる遮光性層
(23)が塗布形成されてなることを特徴とする遮光性マ
スキングフイルムに関するものである。[Structure of the Invention] That is, according to the present invention, in a light-shielding masking film in which a re-adhesive light-shielding release layer (20) is provided on a base film (10), the base film (10) is a polyethylene terephthalate film, The adhesive light-shielding release layer (20) is a re-adhesive re-adhesive release layer (21) made of an ethylene-vinyl acetate copolymer and an intermediate layer (22) made of polyethylene are formed by a coextrusion method, Furthermore, a light-shielding layer (23) made of a mixture of a rubber-like substance, a substance compatible with the rubber-like substance and a light-shielding colorant is applied and formed on the intermediate layer (22). The present invention relates to a light-shielding masking film.
即ち、従来のベースフイルム上にゴム状物質、塩化ビニ
ル樹脂、塩化ビニル系共重合体、ニトロセルロース、ア
セチルセルロース、ポリウレタン樹脂と酢酸繊維素樹脂
の混合物などの樹脂に可塑剤などを混合したものに遮光
性の染顔料を混合したものの溶剤溶液を塗布乾燥して設
けていた遮光性の剥離層、或はベースフイルム上に、酢
酸ビニル−エチレン共重合体ラテックス、塩化ビニル−
エチレン共重合体ラテックス、塩化ビニル−酢酸ビニル
−エチレン三元共重合体ラテックス、ポリアクリル酸エ
ステルラテックス、ポリメタアクリル酸エステルラテッ
クス、ポリエステル樹脂ラテックスおよびポリウレタン
樹脂ラテックスなどのラテックス透明剥離層を介して、
該透明剥離層上に熱可塑性樹脂と着色剤とを含む油溶性
着色樹脂層とを順次形成せしめた遮光性の剥離層、或は
ベースフイルム上に、エチレン酢ビ、ポリエチレン、1
・2ナイロン等からなるホットメルト層を介してポリエ
チレンテレフタレートフィルムからなるラミネート層を
施し、該ラミネート層上に遮光性スクライブ適性層を施
した遮光性の剥離層にかえて、 本発明の遮光性マスキングフイルムにおいては、ベース
フイルム(10)の上に再粘着性遮光性剥離層(20)を設
けた遮光性マスキングフイルムにおいて、ベースフイル
ム(10)がポリエチレンテレフタレートフイルムであ
り、再粘着性遮光性剥離層(20)が再粘着性を有するエ
チレン−酢酸ビニル共重合体からなる再粘着性剥離層
(21)とポリエチレンからなる中間層(22)とが共押出
し法により形成され、さらのその中間層(22)上にゴム
状物質とこのゴム状物質と相溶性がある物質および遮光
性着色剤との混合物からなる遮光性層(23)を塗布形成
したものとし、殊に(とりわけ)再粘着性剥離層(21)
と中間層(22)を共押出法により形成したことによっ
て、極めて良好な遮光性、被膜性、耐老化性、易剥離性
のほかに再粘着性を付与した遮光性マスキングフイルム
を完成したものである。That is, a resin such as a rubber-like substance, a vinyl chloride resin, a vinyl chloride copolymer, nitrocellulose, acetylcellulose, a mixture of a polyurethane resin and an acetic acid fibrous resin mixed with a plasticizer on a conventional base film. A vinyl acetate-ethylene copolymer latex, vinyl chloride-vinyl chloride-ethylene copolymer latex, or vinyl chloride-on the base film, which was provided by coating and drying a solvent solution of a mixture of a light-shielding dye and pigment, was provided.
Through a latex transparent release layer such as ethylene copolymer latex, vinyl chloride-vinyl acetate-ethylene terpolymer latex, polyacrylic acid ester latex, polymethacrylic acid ester latex, polyester resin latex and polyurethane resin latex,
Ethylene vinyl acetate, polyethylene, 1 or 1 is provided on the light-shielding release layer in which a thermoplastic resin and an oil-soluble colored resin layer containing a colorant are sequentially formed on the transparent release layer, or on the base film.
A light-shielding masking layer of the present invention is used instead of the light-shielding release layer in which a laminate layer made of a polyethylene terephthalate film is provided through a hot melt layer made of 2 nylon or the like, and a light-shielding scribe-appropriate layer is provided on the laminate layer. Regarding the film, in the light-shielding masking film in which the re-adhesive light-shielding release layer (20) is provided on the base film (10), the base film (10) is a polyethylene terephthalate film, and the re-adhesive light-shielding release layer is used. A re-adhesive release layer (21) made of ethylene-vinyl acetate copolymer (20) having re-adhesiveness and an intermediate layer (22) made of polyethylene are formed by a co-extrusion method, and further the intermediate layer ( 22) A light-shielding layer (23) composed of a mixture of a rubber-like substance, a substance compatible with this rubber-like substance and a light-shielding colorant is applied on the above. And that form, in particular (among other things) the re-adhesive release layer (21)
By forming the intermediate layer (22) and the intermediate layer (22) by a coextrusion method, a light-shielding masking film having extremely good light-shielding property, film-forming property, aging resistance, easy peeling property, and re-adhesive property is completed. is there.
即ち本発明は、ベースフイルム(10)としてポリエチレ
ンテレフタレートフイルムを用い、その上に別途エチレ
ン−酢酸ビニル共重合体からなる再粘着性剥離層(21)
とポリエチレンからなる中間層(22)を共押出し法によ
り、再粘着性剥離層(21)と中間層(22)とからなる2
層構造物を形成し、さらにその2層構造物の中間層(2
2)の上にゴム状物質とこれと相溶性がある物質および
遮光性着色剤とからなる混合物の遮光性層(23)を塗布
形成して3層構造の再粘着性遮光性剥離層(20)を積層
したことによって、極めて良好な遮光性、被膜性、耐老
化性、易剥離性のほかに再粘着性を付与した遮光性マス
キングフイルムを提供することを可能としたものであ
る。That is, in the present invention, a polyethylene terephthalate film is used as the base film (10), and a re-adhesive release layer (21) made of an ethylene-vinyl acetate copolymer is additionally formed thereon.
A re-adhesive release layer (21) and an intermediate layer (22) by coextrusion of an intermediate layer (22) made of
A two-layer structure, and the intermediate layer (2
A re-adhesive light-shielding release layer (20) having a three-layer structure is formed by applying a light-shielding layer (23) of a mixture of a rubber-like substance, a substance compatible with the rubber-like substance, and a light-shielding colorant onto the 2). It is possible to provide a light-shielding masking film to which re-adhesiveness is imparted in addition to excellent light-shielding property, film-forming property, aging resistance, easy peeling property, by laminating (4).
本発明の遮光性マスキングフイルムを構成するベースフ
イルム(10)としては充分な自己保持性を有するもの
で、しかも共押出し法ならびに塗布によりえられた再粘
着性遮光性剥離層(20)と積層する際の1対のニップロ
ール圧に充分に耐えられ、光学的にむらのない透明なも
のが要求され、このような条件を満たすものとしてポリ
エチレンテレフタレートフイルムが好ましい。より好ま
しくはポリエチレンテレフタレートフイルムの二軸延伸
フイルムが適している。その厚さは50〜200μm程度の
ものを用いるが、より好ましくは75〜125μm程度のも
のを用いるのがしわや亀裂などのない遮光性マスキング
フイルムの製造が連続的に大量生産出来る点から好まし
い。The base film (10) constituting the light-shielding masking film of the present invention has sufficient self-holding property and is laminated with a re-adhesive light-shielding release layer (20) obtained by coextrusion method and coating. A transparent one that can withstand a pair of nip roll pressures at the same time and is optically free of optical unevenness is required, and a polyethylene terephthalate film is preferable as one satisfying such conditions. More preferably, a biaxially stretched film of polyethylene terephthalate film is suitable. The thickness is about 50 to 200 μm, and more preferably about 75 to 125 μm is preferable from the viewpoint of continuous mass production of a light-shielding masking film without wrinkles or cracks.
本発明の遮光性マスキングフイルムのベースフイルム
(10)の上に形成される再粘着性遮光性剥離層(20)の
厚さは特に制限は無いが通常10〜30μmの範囲から適宜
選ばれる。The thickness of the re-adhesive light-shielding release layer (20) formed on the base film (10) of the light-shielding masking film of the present invention is not particularly limited, but is usually appropriately selected from the range of 10 to 30 μm.
本発明の遮光性マスキングフイルムにおいて、再粘着性
遮光性剥離層(20)を構成する再粘着性剥離層(21)を
形成するための樹脂としては、共押出法が可能なエチレ
ン−酢酸ビニル共重合体が適している。その理由は、エ
チレン−酢酸ビニル共重合体は、エチレンと酢酸ビニル
との割合を変える事により再粘着性を任意にコントロー
ルする事ができる。したがって両者の割合を適宜選択す
ることによって任意の再粘着性、剥離性のものが得られ
る。またエチレンが中間層(22)に対して密着強度を高
める作用があり好ましい。また共押出法が可能な為に有
機溶剤等を使用せずに層を形成できるので、有機溶媒等
に溶解した塗液の塗布の場合の様に長い乾燥時間を必要
としないから、ラインスピードが上げられ、低コスト
で、環境を汚染する事がないので好ましい。In the light-shielding masking film of the present invention, as the resin for forming the re-adhesive release layer (21) constituting the re-adhesive light-shielding release layer (20), a coextrusion-processable ethylene-vinyl acetate copolymer is used. Polymers are suitable. The reason is that the re-adhesiveness of the ethylene-vinyl acetate copolymer can be arbitrarily controlled by changing the ratio of ethylene and vinyl acetate. Therefore, by appropriately selecting the ratio of the both, the re-adhesiveness and peeling property can be obtained. In addition, ethylene is preferable because it has the effect of increasing the adhesion strength to the intermediate layer (22). In addition, since the layer can be formed without using an organic solvent or the like because the co-extrusion method is possible, it does not require a long drying time as in the case of coating a coating solution dissolved in an organic solvent or the like, and thus the line speed is It is preferable because it can be manufactured at a low cost and does not pollute the environment.
本発明の遮光性マスキングフイルムにおいて、再粘着性
遮光性剥離層(20)を構成する中間層(22)を形成する
ための樹脂としては、共押出法が可能なポリエチレンが
適している。その理由は、ポリエチレンはエチレン−酢
酸ビニル共重合体からなる再粘着性剥離層(21)に対し
て密着強度が高く好ましい。また共押出法が可能な為に
有機溶剤等を使用せずに層を形成できるので、有機溶媒
等に溶解した塗液の塗布の場合の様に長い乾燥時間を必
要としないから、ラインスピードが上げられ、低コスト
で、環境を汚染する事がないので好ましい。さらにポリ
エチレンは安定した物質であり、中間層(22)の上に塗
布形成される主としてゴム状物質と遮光性着色剤とから
なる遮光性層(23)とエチレン−酢酸ビニル共重合体か
らなる再粘着性剥離層(21)との中間に位置して、遮光
性層(23)の有機溶媒等に溶解した塗液の塗布時の溶剤
から再粘着性剥離層(21)に対する攻撃を阻止し、ま
た、遮光性層(23)と再粘着性剥離層(21)の相互の化
学的物理的影響を遮断するので再粘着性剥離層(21)の
剥離性、再粘着性を長期間にわたって良好な状態に維持
できる作用があり好ましい。In the light-shielding masking film of the present invention, polyethylene capable of coextrusion is suitable as the resin for forming the intermediate layer (22) that constitutes the re-adhesive light-shielding release layer (20). The reason is that polyethylene is preferable because it has high adhesion strength to the re-adhesive release layer (21) made of an ethylene-vinyl acetate copolymer. In addition, since the layer can be formed without using an organic solvent or the like because the co-extrusion method is possible, it does not require a long drying time as in the case of coating a coating solution dissolved in an organic solvent or the like, and thus the line speed is It is preferable because it can be manufactured at a low cost and does not pollute the environment. Furthermore, polyethylene is a stable substance, and is composed of a light-shielding layer (23) mainly composed of a rubber-like substance and a light-shielding colorant formed by coating on the intermediate layer (22), and a re-formation film composed of an ethylene-vinyl acetate copolymer. It is located in the middle of the adhesive release layer (21) and prevents attack of the re-adhesive release layer (21) from the solvent at the time of applying the coating liquid dissolved in the organic solvent of the light shielding layer (23), Moreover, since the mutual chemical and physical influences of the light-shielding layer (23) and the re-adhesive release layer (21) are blocked, the re-adhesive release layer (21) has good releasability and re-adhesiveness for a long period of time. This is preferable because it has the effect of maintaining the state.
本発明の遮光性マスキングフイルムにおいて、再粘着性
遮光性剥離層(20)を構成する遮光性層(23)を形成す
るための混合物としては、アクリルニトリル含有量が20
〜40重量%のアクリルニトリル−ブタジエン共重合体
(ラバー)と塩化ビニルモノマーと酢酸ビニルモノマー
の共重合比が重量比で80〜95:20〜5の範囲の塩化ビニ
ル−酢酸ビニル共重合体との混合物が良い。またこの混
合比はより好ましくは30〜50:70:50の範囲が用いられ
る。In the light-shielding masking film of the present invention, the mixture for forming the light-shielding layer (23) constituting the re-adhesive light-shielding release layer (20) has an acrylonitrile content of 20.
A vinyl chloride-vinyl acetate copolymer having a copolymerization ratio of acrylonitrile-butadiene copolymer (rubber) to vinyl chloride monomer and vinyl acetate monomer of 80 to 95:20 to 5 by weight. Is a good mixture. Further, this mixing ratio is more preferably used in the range of 30 to 50:70:50.
また遮光性層(23)に遮光性を付与するのに着色剤が用
いられるが、染料または顔料及び染料と顔料との混合物
を用いることができ、遮光性マスキングフイルムとして
の遮光性を満たし、樹脂と相溶性が有るものであれば特
にその種類や添加量に制限はない。Further, a colorant is used to impart a light-shielding property to the light-shielding layer (23), but it is possible to use a dye or a pigment and a mixture of a dye and a pigment, and to satisfy the light-shielding property as a light-shielding masking film, a resin There is no particular limitation on the type and the addition amount as long as they are compatible with.
本発明の遮光性マスキングフイルムの再粘着性剥離層
(21)および中間層(22)の形成は、前記再粘着性剥離
層(21)および中間層(22)を形成するための樹脂を通
常の溶融共押出法により形成積層される。The re-adhesive release layer (21) and the intermediate layer (22) of the light-shielding masking film of the present invention are formed by using a resin for forming the re-adhesive release layer (21) and the intermediate layer (22) in a usual manner. Formed and laminated by the melt co-extrusion method.
本発明の遮光性マスキングフイルムの遮光性層(23)の
形成は、前記遮光性層(23)を形成するための混合物の
溶剤溶液を通常のロールコーター法またはグラビアコー
ター法等により前記再粘着性剥離層(21)および中間層
(22)からなる積層物の中間層(22)の上に塗布乾燥し
て形成積層され、再粘着性剥離層(21)、中間層(22)
および遮光性層(23)からなる再粘着性遮光性剥離層
(20)とされる。The light-shielding layer (23) of the light-shielding masking film of the present invention is formed by re-adhering the solvent solution of the mixture for forming the light-shielding layer (23) by a usual roll coater method or a gravure coater method. A re-adhesive release layer (21) and an intermediate layer (22) which are formed by coating and drying on the intermediate layer (22) of a laminate comprising the release layer (21) and the intermediate layer (22)
And a re-adhesive light-shielding release layer (20) comprising the light-shielding layer (23).
かくして得られた再粘着性遮光性剥離層(20)は、前記
ベースフイルム(10)と再粘着性遮光性剥離層(20)の
再粘着性剥離層(21)(エチレン−酢酸ビニル共重合
体)側とを向かい合わせて一対のニップロールで挟みな
がら積層して本発明の遮光性マスキングフイルムとされ
る。The re-adhesive light-shielding release layer (20) thus obtained is a re-adhesive release layer (21) (ethylene-vinyl acetate copolymer) of the base film (10) and the re-adhesive light-shielding release layer (20). ) Side to face and are sandwiched by a pair of nip rolls to form a light-shielding masking film of the present invention.
つぎに実施例をあげて本発明を説明する。尚、実施例中
の%はいずれも重量%である。Next, the present invention will be described with reference to examples. All% in the examples are% by weight.
[実施例] 実施例1 エチレン−酢酸ビニル共重合体(酢酸ビニル20%) ポリエチレン およびの2種類の樹脂を夫々押出機より供給し、T
ダイにて夫々10μm、5μmの厚さに共押出法により総
厚が15μmの再粘着性剥離層(21)と中間層(22)の二
層からなる積層物を得た。[Example] Example 1 Ethylene-vinyl acetate copolymer (20% vinyl acetate) Polyethylene and two kinds of resins were fed from an extruder, respectively, and T
A die having a total thickness of 15 μm and comprising a re-adhesive release layer (21) and an intermediate layer (22) having a total thickness of 15 μm was obtained by a die with a thickness of 10 μm and 5 μm, respectively.
次いで厚さ100μmの二軸延伸ポリエチレンテレフタレ
ートフイルム(ベースフイルム(10))と前記再粘着性
剥離層(21)と中間層(22)の二層からなる積層物のエ
チレン−酢酸ビニル共重合体側面を合うように1対のニ
ップロールで挟みながら積層し、総厚115μmの三層か
らなる積層物を得た。Next, the side surface of the ethylene-vinyl acetate copolymer of a laminate comprising a biaxially stretched polyethylene terephthalate film (base film (10)) having a thickness of 100 μm, the re-adhesive release layer (21) and an intermediate layer (22). Were laminated so as to be sandwiched by a pair of nip rolls so as to match each other to obtain a laminate composed of three layers having a total thickness of 115 μm.
更にアクリルニトリル含有量が33重量%のアクリルニト
リル−ブタジエンラバーと塩化ビニル90%と酢酸ビニル
10%の混合物をメチルエチルケトン対トルエンの混合比
が2対1の混合溶剤に溶解し、遮光性染料(ネオザポン
オレンジRE、BASF社製)2%を混合した溶液を、先にえ
た前記三層からなる積層物のポリエチレン面をコロナ放
電処理した後、この処理面に塗布乾燥して、厚さ10μm
の遮光性層(23)を形成し、総厚125μmの本発明の遮
光性マスキングフイルムを得た。Furthermore, acrylonitrile-butadiene rubber with an acrylonitrile content of 33% by weight, vinyl chloride 90% and vinyl acetate
The 10% mixture was dissolved in a mixed solvent of a mixture ratio of methyl ethyl ketone to toluene of 2: 1 and 2% of a light-shielding dye (Neozapon Orange RE, manufactured by BASF) was mixed, and the above three layers were obtained. After the polyethylene surface of the laminate made of is treated by corona discharge, the coated surface is dried and the thickness is 10 μm.
The light-shielding layer (23) was formed to obtain a light-shielding masking film of the present invention having a total thickness of 125 μm.
二軸延伸ポリエチレンテレフタレートフイルム(10)と
再粘着性剥離層(21)との接着強度は25mm幅の試験片で
15g/25mm(180度剥離)、また再粘着性剥離層(21)と
中間層(22)との接着強度および中間層(22)と遮光性
層(23)との接着強度はいずれも2.4kg/25mmまたはそれ
以上であった。また再粘着性剥離層(21)と中間層(2
2)と遮光性層(23)とからなる再粘着性遮光性剥離層
(20)の伸度は120%であった。且つ、二軸延伸ポリエ
チレンテレフタレートフイルム(10)と再粘着性遮光性
剥離層(20)のエチレン−酢酸ビニル共重合体面とは適
切な再粘着性を有していた。The adhesive strength between the biaxially stretched polyethylene terephthalate film (10) and the re-adhesive release layer (21) is a 25 mm wide test piece.
15g / 25mm (180 degree peeling), the adhesive strength between the re-adhesive peeling layer (21) and the intermediate layer (22) and the adhesive strength between the intermediate layer (22) and the light-shielding layer (23) are both 2.4kg. It was / 25mm or more. The re-adhesive release layer (21) and the intermediate layer (2
The re-adhesive light-shielding release layer (20) comprising 2) and the light-shielding layer (23) had an elongation of 120%. Moreover, the biaxially stretched polyethylene terephthalate film (10) and the re-adhesive light-shielding release layer (20) had an appropriate re-adhesive property on the ethylene-vinyl acetate copolymer surface.
[発明の効果] 実施例1で得られた遮光性マスキングフイルムを用い
て、写真製版用に用いると同様に任意の図柄等に遮光性
の剥離層を裁断し一度剥離したものを再粘着してもとに
復元し、再度別の図柄に裁断し所望の図柄通りの写真製
版用マスクをつくることができた。この効果は従来品に
は全く期待できない効果である。[Effects of the Invention] Using the light-shielding masking film obtained in Example 1, a light-shielding release layer was cut into an arbitrary pattern or the like as in the case of use for photoengraving, and once peeled, it was re-adhered. It was restored to its original shape and then cut again into another pattern to make a mask for photoengraving according to the desired pattern. This effect is an effect that cannot be expected from conventional products.
第1図は本願発明の遮光性マスキングフイルムの構成を
示す断面図である。 (図面の符号) (10):ベースフイルム (20):再粘着性遮光性剥離層 (21):再粘着性剥離層 (22):中間層 (23):遮光性層FIG. 1 is a sectional view showing the structure of the light-shielding masking film of the present invention. (Reference numeral in the drawing) (10): Base film (20): Re-adhesive light-shielding release layer (21): Re-adhesive release layer (22): Intermediate layer (23): Light-shielding layer
Claims (1)
性剥離層(20)を設けた遮光性マスキングフイルムにお
いて、ベースフイルム(10)がポリエチレンテレフタレ
ートフイルムであり、再粘着性遮光性剥離層(20)が再
粘着性を有するエチレン−酢酸ビニル共重合体からなる
再粘着性剥離層(21)とポリエチレンからなる中間層
(22)とが共押出し法により形成され、さらのその中間
層(22)上にゴム状物質とこのゴム状物質と相溶性があ
る物質および遮光性着色剤との混合物からなる遮光性層
(23)が塗布形成されてなることを特徴とする遮光性マ
スキングフイルム。1. A light-shielding masking film comprising a re-adhesive light-shielding release layer (20) provided on a base film (10), wherein the base film (10) is a polyethylene terephthalate film, and the re-adhesive light-shielding release is provided. The layer (20) is a re-adhesive release layer (21) made of an ethylene-vinyl acetate copolymer having re-tackiness and an intermediate layer (22) made of polyethylene are formed by a co-extrusion method, and the intermediate layer is further formed. (22) A light-shielding masking film, characterized in that a light-shielding layer (23) made of a mixture of a rubber-like substance, a substance compatible with the rubber-like substance and a light-shielding colorant is applied and formed thereon. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30997886A JPH07104593B2 (en) | 1986-12-25 | 1986-12-25 | Light-shielding masking film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30997886A JPH07104593B2 (en) | 1986-12-25 | 1986-12-25 | Light-shielding masking film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63163355A JPS63163355A (en) | 1988-07-06 |
| JPH07104593B2 true JPH07104593B2 (en) | 1995-11-13 |
Family
ID=17999661
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30997886A Expired - Lifetime JPH07104593B2 (en) | 1986-12-25 | 1986-12-25 | Light-shielding masking film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07104593B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01292344A (en) * | 1988-05-20 | 1989-11-24 | Sanyo Kokusaku Pulp Co Ltd | Peel off film and its production |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5846011B2 (en) * | 1978-02-01 | 1983-10-13 | ダイセル化学工業株式会社 | Light-shielding masking film |
| JPS5819552Y2 (en) * | 1979-03-13 | 1983-04-22 | 株式会社きもと | Masking film for plate making |
| JPS61110141A (en) * | 1984-11-05 | 1986-05-28 | Shinko Kagaku Kogyo Kk | Light shieldable masking film |
| JPS61143758A (en) * | 1984-12-17 | 1986-07-01 | Kimoto & Co Ltd | Light interrupting masking film |
| JPS61166549A (en) * | 1985-01-18 | 1986-07-28 | Somar Corp | Light shieldable masking film |
-
1986
- 1986-12-25 JP JP30997886A patent/JPH07104593B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63163355A (en) | 1988-07-06 |
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