JPH0710732B2 - Superconductor manufacturing method - Google Patents
Superconductor manufacturing methodInfo
- Publication number
- JPH0710732B2 JPH0710732B2 JP3185213A JP18521391A JPH0710732B2 JP H0710732 B2 JPH0710732 B2 JP H0710732B2 JP 3185213 A JP3185213 A JP 3185213A JP 18521391 A JP18521391 A JP 18521391A JP H0710732 B2 JPH0710732 B2 JP H0710732B2
- Authority
- JP
- Japan
- Prior art keywords
- metal
- film
- oxide
- acid
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000002887 superconductor Substances 0.000 title claims description 19
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 229910000510 noble metal Inorganic materials 0.000 claims description 31
- 229910044991 metal oxide Inorganic materials 0.000 claims description 29
- 150000004706 metal oxides Chemical class 0.000 claims description 28
- 239000002131 composite material Substances 0.000 claims description 25
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 19
- 239000010949 copper Substances 0.000 claims description 17
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 claims description 16
- 239000001301 oxygen Substances 0.000 claims description 15
- 229910052760 oxygen Inorganic materials 0.000 claims description 15
- 238000006243 chemical reaction Methods 0.000 claims description 12
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 10
- 229910052788 barium Inorganic materials 0.000 claims description 10
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 claims description 10
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 9
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims description 8
- 239000005751 Copper oxide Substances 0.000 claims description 8
- 229910052802 copper Inorganic materials 0.000 claims description 8
- 229910000431 copper oxide Inorganic materials 0.000 claims description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 7
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims description 7
- 239000007789 gas Substances 0.000 claims description 7
- 229910001882 dioxygen Inorganic materials 0.000 claims description 6
- 229910001404 rare earth metal oxide Inorganic materials 0.000 claims description 6
- 150000002910 rare earth metals Chemical class 0.000 claims description 6
- 239000001569 carbon dioxide Substances 0.000 claims description 5
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 5
- 239000011261 inert gas Substances 0.000 claims description 3
- 230000001590 oxidative effect Effects 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 229910052751 metal Inorganic materials 0.000 description 40
- 239000002184 metal Substances 0.000 description 40
- 238000000576 coating method Methods 0.000 description 36
- 239000011248 coating agent Substances 0.000 description 32
- 150000001875 compounds Chemical class 0.000 description 21
- 238000010304 firing Methods 0.000 description 16
- 239000000463 material Substances 0.000 description 16
- 239000002904 solvent Substances 0.000 description 16
- 238000000034 method Methods 0.000 description 14
- 239000007788 liquid Substances 0.000 description 13
- -1 organic acid salts Chemical class 0.000 description 13
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
- 239000000203 mixture Substances 0.000 description 12
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- 238000001354 calcination Methods 0.000 description 9
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 8
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 8
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 229910052709 silver Inorganic materials 0.000 description 8
- 239000004332 silver Substances 0.000 description 8
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 150000004703 alkoxides Chemical class 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- 150000007524 organic acids Chemical class 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical class OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- 150000001298 alcohols Chemical class 0.000 description 4
- 239000013522 chelant Substances 0.000 description 4
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical class OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 4
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 150000002576 ketones Chemical class 0.000 description 4
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical class CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 150000002894 organic compounds Chemical class 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 235000019260 propionic acid Nutrition 0.000 description 4
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 4
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 4
- 229910052727 yttrium Inorganic materials 0.000 description 4
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 235000011054 acetic acid Nutrition 0.000 description 3
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 229940120693 copper naphthenate Drugs 0.000 description 3
- SEVNKWFHTNVOLD-UHFFFAOYSA-L copper;3-(4-ethylcyclohexyl)propanoate;3-(3-ethylcyclopentyl)propanoate Chemical compound [Cu+2].CCC1CCC(CCC([O-])=O)C1.CCC1CCC(CCC([O-])=O)CC1 SEVNKWFHTNVOLD-UHFFFAOYSA-L 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229960002446 octanoic acid Drugs 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 150000003222 pyridines Chemical class 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 description 3
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 2
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 2
- HNNQYHFROJDYHQ-UHFFFAOYSA-N 3-(4-ethylcyclohexyl)propanoic acid 3-(3-ethylcyclopentyl)propanoic acid Chemical compound CCC1CCC(CCC(O)=O)C1.CCC1CCC(CCC(O)=O)CC1 HNNQYHFROJDYHQ-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000005635 Caprylic acid (CAS 124-07-2) Substances 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 229910052691 Erbium Inorganic materials 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- 229910052689 Holmium Inorganic materials 0.000 description 2
- 239000005639 Lauric acid Substances 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910002367 SrTiO Inorganic materials 0.000 description 2
- 235000021355 Stearic acid Nutrition 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- OBETXYAYXDNJHR-UHFFFAOYSA-N alpha-ethylcaproic acid Natural products CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical class OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical class OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 239000004310 lactic acid Chemical class 0.000 description 2
- 235000014655 lactic acid Nutrition 0.000 description 2
- 239000002905 metal composite material Substances 0.000 description 2
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 2
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 2
- 235000005985 organic acids Nutrition 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- LPNBBFKOUUSUDB-UHFFFAOYSA-N p-toluic acid Chemical compound CC1=CC=C(C(O)=O)C=C1 LPNBBFKOUUSUDB-UHFFFAOYSA-N 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical class OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
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- 238000004528 spin coating Methods 0.000 description 2
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- 239000000126 substance Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 2
- OBETXYAYXDNJHR-SSDOTTSWSA-M (2r)-2-ethylhexanoate Chemical compound CCCC[C@@H](CC)C([O-])=O OBETXYAYXDNJHR-SSDOTTSWSA-M 0.000 description 1
- OYHQOLUKZRVURQ-NTGFUMLPSA-N (9Z,12Z)-9,10,12,13-tetratritiooctadeca-9,12-dienoic acid Chemical compound C(CCCCCCC\C(=C(/C\C(=C(/CCCCC)\[3H])\[3H])\[3H])\[3H])(=O)O OYHQOLUKZRVURQ-NTGFUMLPSA-N 0.000 description 1
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- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- RPXFDOOFVNTCQA-UHFFFAOYSA-N 2-cyclohexylbutanoic acid Chemical compound CCC(C(O)=O)C1CCCCC1 RPXFDOOFVNTCQA-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- AWQSAIIDOMEEOD-UHFFFAOYSA-N 5,5-Dimethyl-4-(3-oxobutyl)dihydro-2(3H)-furanone Chemical compound CC(=O)CCC1CC(=O)OC1(C)C AWQSAIIDOMEEOD-UHFFFAOYSA-N 0.000 description 1
- YPIFGDQKSSMYHQ-UHFFFAOYSA-N 7,7-dimethyloctanoic acid Chemical compound CC(C)(C)CCCCCC(O)=O YPIFGDQKSSMYHQ-UHFFFAOYSA-N 0.000 description 1
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- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical class OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- 229910001111 Fine metal Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
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- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 1
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
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- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Chemical class [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 125000005595 acetylacetonate group Chemical group 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
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- 238000005452 bending Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- GONOPSZTUGRENK-UHFFFAOYSA-N benzyl(trichloro)silane Chemical compound Cl[Si](Cl)(Cl)CC1=CC=CC=C1 GONOPSZTUGRENK-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
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- 230000000536 complexating effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- KENFWULSTODHHA-UHFFFAOYSA-N cyclohexyl butanoate;silver Chemical compound [Ag].CCCC(=O)OC1CCCCC1 KENFWULSTODHHA-UHFFFAOYSA-N 0.000 description 1
- 238000006114 decarboxylation reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
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- 238000001704 evaporation Methods 0.000 description 1
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- 239000004744 fabric Substances 0.000 description 1
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- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
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- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910003455 mixed metal oxide Inorganic materials 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N n-hexanoic acid Natural products CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000005609 naphthenate group Chemical group 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 235000021313 oleic acid Nutrition 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Chemical class OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- CQLFBEKRDQMJLZ-UHFFFAOYSA-M silver acetate Chemical compound [Ag+].CC([O-])=O CQLFBEKRDQMJLZ-UHFFFAOYSA-M 0.000 description 1
- 229940071536 silver acetate Drugs 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000011975 tartaric acid Chemical class 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E40/00—Technologies for an efficient electrical power generation, transmission or distribution
- Y02E40/60—Superconducting electric elements or equipment; Power systems integrating superconducting elements or equipment
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
Description
【発明の詳細な説明】Detailed Description of the Invention
【0001】[0001]
【産業上の利用分野】本発明は、バリウム、希土類金属
及び銅からなる超電導性複合金属酸化物と貴金属とから
構成される超電導体の製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a superconductor composed of a noble metal and a superconducting composite metal oxide composed of barium, a rare earth metal and copper.
【0002】[0002]
【従来技術及びその問題点】超電導性複合金属酸化物膜
(以下、超電導体膜とも言う)を得るために、バリウ
ム、希土類元素及び銅の各有機酸塩、アルコキシド又は
キレート化合物を含む溶液を作り、この溶液を支持体表
面に塗布し、空気中において約500℃で仮焼して、基材
表面に炭酸バリウムと希土類元素酸化物と銅酸化物から
なる無機質膜をあらかじめ形成し、次いで空気又は酸素
中で900℃より高い温度で本焼成する方法は知られてい
る。また、基材表面に、複合金属酸化物の超電導性の安
定化及び/又は超電導性複合金属酸化物と基材との反応
の抑制のためにあらかじめ貴金属膜を形成した後前記の
方法で超電導性複合金属酸化物膜を製造する方法も知ら
れている。このようにして基材表面に形成された複合金
属酸化物膜は比較的高い臨界温度で超電導を示すが、本
焼成に900℃より高い温度を用いるため、複合金属酸化
物膜と基材及び/又は貴金属膜との反応によりその超電
導体膜の劣化が起り、超電導を与える複合金属酸化物膜
の正味量が減少し、超電導状態における電流密度(J
c)が低下するという問題があった。一方、本焼成温度
を下げて超電導体膜と基材及び/又は貴金属との反応を
防止しようとすると、この場合には炭酸バリウムの熱分
解が進行しにくく、基材上に形成される複合金属酸化物
の超電導特性が著しく損われるという問題を生じる。2. Description of the Related Art In order to obtain a superconducting composite metal oxide film (hereinafter also referred to as a superconducting film), a solution containing organic acid salts of barium, a rare earth element and copper, an alkoxide or a chelate compound is prepared. , This solution is applied to the surface of a support and calcined in air at about 500 ° C. to preliminarily form an inorganic film composed of barium carbonate, a rare earth element oxide and a copper oxide on the surface of a substrate, and then air or A method of performing main firing at a temperature higher than 900 ° C. in oxygen is known. In addition, after forming a noble metal film in advance on the surface of the base material in order to stabilize the superconductivity of the composite metal oxide and / or suppress the reaction between the superconducting composite metal oxide and the base material, the superconductivity is increased by the above method. A method of manufacturing a composite metal oxide film is also known. The composite metal oxide film thus formed on the surface of the substrate exhibits superconductivity at a relatively high critical temperature, but since the temperature higher than 900 ° C. is used for the main firing, the composite metal oxide film and the substrate and / or Alternatively, the reaction with the noble metal film causes deterioration of the superconductor film, and the net amount of the composite metal oxide film that gives superconductivity decreases, and the current density (J
There is a problem that c) is lowered. On the other hand, if the main firing temperature is lowered to prevent the reaction between the superconductor film and the base material and / or the noble metal, in this case, the thermal decomposition of barium carbonate is difficult to proceed, and the composite metal formed on the base material This causes a problem that the superconducting property of the oxide is significantly impaired.
【0003】さらに、超電導体の高Jc化や機械的性質
(引張り応力、曲げ応力)の改善及び耐環境性(H2O
やCO2に対する耐久性)の改善のために、超電導体に
対して貴金属を複合化させることも行われている。この
貴金属の複合化は、超電導体粉末に貴金属粉末を混合
し、この混合物を基材に塗布し、900℃以上に加熱し
て焼結することによって行うことができるが、この場
合、その粉体混合と均一に行うことが困難である上、加
熱温度が900℃以上であるため、超電導体を基材との
反応による超電導体の劣化が起り、超電導特性が低下す
るという問題を生じる。Further, the high Jc of superconductors, improvement of mechanical properties (tensile stress, bending stress) and environmental resistance (H 2 O
In order to improve (durability against CO 2 and CO 2 ), a noble metal is compounded with a superconductor. The complexing of the noble metal can be performed by mixing the noble metal powder with the superconductor powder, applying the mixture to the base material, and heating the mixture to 900 ° C. or more to sinter the powder. It is difficult to mix and uniformly perform the heating, and since the heating temperature is 900 ° C. or higher, the superconductor is deteriorated due to the reaction of the superconductor with the base material, which causes a problem that the superconducting property is deteriorated.
【0004】[0004]
【発明の課題】本発明は、従来技術に見られる前記問題
点を解決し、超電導を示す臨界温度が高く、かつ超電導
状態における電流密度の高い貴金属複合化超電導体の製
造方法を提供するものである。SUMMARY OF THE INVENTION The present invention solves the above problems found in the prior art and provides a method for producing a noble metal composite superconductor having a high critical temperature indicating superconductivity and a high current density in the superconducting state. is there.
【0005】[0005]
【課題を解決するための手段】本発明者らは、前記課題
を解決すべく鋭意研究を重ねた結果、本発明を完成する
に至った。The present inventors have completed the present invention as a result of intensive studies to solve the above problems.
【0006】即ち、本発明によれば、基材に形成された
(1)炭酸バリウム、(2)希土類金属酸化物、(3)銅酸化
物及び(4)貴金属及び/又はその酸化物からなる無機
質膜を、酸素濃度が1vol%以下の不活性ガス雰囲気下又
は酸素分圧が0.01atm(絶対圧)以下の減圧下において該
膜と基材との間の反応を実質的に生じさせない温度で焼
成して該膜中に含まれる炭酸バリウムから炭酸ガスを除
去しつつ炭酸バリウムと希土類金属酸化物と銅酸化物を
反応させた後、さらに、該膜と基材との間の反応を実質
的に生じさせない温度で分子状酸素により酸化してバリ
ウム、希土類金属及び銅からなる超電導性複合金属酸化
物と貴金属とから構成される超電導体膜を形成させるこ
とを特徴とする超電導体の製造方法が提供される。That is, according to the present invention,
An inorganic film composed of (1) barium carbonate, (2) rare earth metal oxide, (3) copper oxide, and (4) noble metal and / or its oxide in an inert gas atmosphere with an oxygen concentration of 1 vol% or less, or Carbon dioxide gas is removed from barium carbonate contained in the film by baking at a temperature at which the partial pressure of oxygen is 0.01 atm (absolute pressure) or less and the reaction between the film and the base material is not substantially caused. While reacting barium carbonate, a rare earth metal oxide and a copper oxide, barium, a rare earth metal and a metal oxide are further oxidized by molecular oxygen at a temperature that does not substantially cause a reaction between the film and the substrate. There is provided a method for producing a superconductor, which comprises forming a superconductor film composed of a superconducting composite metal oxide made of copper and a noble metal.
【0007】本発明の方法を実施するにあたっては、先
ず、バリウム、希土類金属及び銅からなる超電導性複合
金属酸化物形成用金属(以下、単にSEC金属とも言
う)と、貴金属を含む塗布液を調製する。貴金属として
は、銀、金、白金、パラジウム又はそれらの合金が挙げ
られる。SEC金属は、塗布液中に溶解した状態で存在
するのが好ましいので、通常、SEC金属を含む可溶性
有機化合物として用いられる。一方、貴金属は、塗布液
中に溶解するように貴金属を含む可溶性有機化合物であ
ることが好ましいが、塗布液中には必ずしも溶解状態で
存在する必要はなく、不溶性化合物や金属微粒子として
存在することもできる。貴金属の不溶性化合物として
は、酸化物を、金属微粒子として、金、銀、白金、パラ
ジウムのコロイド粒子を挙げることができる。In carrying out the method of the present invention, first, a coating liquid containing a noble metal and a metal for forming a superconducting complex metal oxide composed of barium, a rare earth metal and copper (hereinafter, also simply referred to as SEC metal) is prepared. To do. Examples of the noble metal include silver, gold, platinum, palladium and alloys thereof. Since the SEC metal is preferably present in a state of being dissolved in the coating liquid, it is usually used as a soluble organic compound containing the SEC metal. On the other hand, the noble metal is preferably a soluble organic compound containing a noble metal so as to be dissolved in the coating liquid, but it does not necessarily have to exist in a dissolved state in the coating liquid, and it exists as an insoluble compound or metal fine particles. You can also Examples of the insoluble compound of a noble metal include oxides, and metal fine particles include colloidal particles of gold, silver, platinum, and palladium.
【0008】SEC金属の可溶性有機化合物としては、
有機酸塩、アルコキシド、有機キレート化合物等が挙げ
られる。貴金属の可溶性有機化合物としては、有機酸
塩、有機キレート化合物等が挙げられる。前記有機酸塩
としては、例えば、ナフテン酸、2−エチルヘキサン
酸、カプリル酸、ステアリン酸、ラウリン酸、酪酸、プ
ロピオン酸、ネオデカン酸、シクロヘキシル酪酸、酢
酸、トリフルオロ酢酸、トリクロロ酢酸、シュウ酸、ク
エン酸、酒石酸、乳酸、フェノール、カテコール、安息
香酸、サリチル酸等の塩が挙げられる。アルコキシドと
しては、例えば、エタノール、プロパノール、ブタノー
ル、エチレングリコール、グリセリン等のアルコールの
アルコキシドが挙げられる。有機キレート化合物として
は、アセチルアセトナート、EDTA等が挙げられる。
塗布液に貴金属を不溶性化合物又は金属微粒子として分
散させる場合、その粒径は5μm以下、好ましくは1μ
m以下にするのがよい。As the soluble organic compound of SEC metal,
Examples thereof include organic acid salts, alkoxides and organic chelate compounds. Examples of soluble organic compounds of noble metals include organic acid salts and organic chelate compounds. Examples of the organic acid salt include naphthenic acid, 2-ethylhexanoic acid, caprylic acid, stearic acid, lauric acid, butyric acid, propionic acid, neodecanoic acid, cyclohexylbutyric acid, acetic acid, trifluoroacetic acid, trichloroacetic acid, oxalic acid, Examples thereof include salts of citric acid, tartaric acid, lactic acid, phenol, catechol, benzoic acid, salicylic acid and the like. Examples of the alkoxide include alcohol alkoxides such as ethanol, propanol, butanol, ethylene glycol and glycerin. Examples of the organic chelate compound include acetylacetonate and EDTA.
When a noble metal is dispersed in the coating solution as an insoluble compound or fine metal particles, the particle size is 5 μm or less, preferably 1 μm.
It is better to be m or less.
【0009】塗布液は、有機溶媒中にSEC金属を溶解
させるとともに、貴金属化合物又は貴金属を溶解又は分
散させることによって製造される。塗布液中のSEC金
属濃度は特に制約されず、その上限はSEC金属含有化
合物の溶解度等によって決められるが、一般には、SE
C金属含有化合物換算で3〜40重量%である。さらに、こ
の溶液には、補助成分として、高分子物質等を適量添加
することもできる。The coating solution is produced by dissolving the SEC metal in an organic solvent and dissolving or dispersing the noble metal compound or the noble metal. The SEC metal concentration in the coating solution is not particularly limited, and its upper limit is determined by the solubility of the SEC metal-containing compound, etc.
It is 3 to 40% by weight in terms of C metal-containing compound. Further, a suitable amount of a polymeric substance or the like can be added to this solution as an auxiliary component.
【0010】溶媒としては、前記したSEC金属含有化
合物を溶解し得るものであればよく、各種のものが単独
又は混合物の形で使用される。このような溶媒として
は、例えば、ヘキサン、オクタン、ベンゼン、トルエ
ン、テトラリン等の炭化水素類、メタノール、エタノー
ル、プロパノール、ブタノール、アミルアルコール、エ
チレングリコール、グリセリン等のアルコール類、アセ
トン、メチルエチルケトン、アセチルアセトン等のケト
ン類、ジブチルエーテル等のエーテル類、アセトアルデ
ヒド、ベンズアルデヒド等のアルデヒド類、ギ酸、酢
酸、プロピオン酸、酪酸、カプリル酸、ラウリン酸、ス
テアリン酸、ナフテン酸、リノール酸、オレイン酸、シ
ュウ酸、クエン酸、乳酸、フェノール、p-トルイル酸等
の有機酸類、ブチルブチレート等のエステル類、ジメチ
ルアミン、アニリン等のアミン類、N-メチルアセトアミ
ド、ホルムアミド、ジメチルホルムアミド等のホルムア
ミド誘導体等のアミド類、ジメチルスルホキシド等の硫
黄含有化合物、クロロホルム、四塩化炭素等の塩素含有
化合物、ピリジン、メチルピリジン、ビニルピリジン等
のピリジン誘導体、フルフラール等の複素環物質類等を
挙げることができる。これらの溶媒は、具体的に用いる
SEC金属含有化合物の種類に応じて1種又は2種以上の
組合せで適当に選定される。これらの溶媒は必要に応じ
て、高温下でまたは溶媒置換して用いることもできる。Any solvent can be used as long as it can dissolve the above-mentioned SEC metal-containing compound, and various solvents can be used alone or in the form of a mixture. Examples of such a solvent include hydrocarbons such as hexane, octane, benzene, toluene and tetralin, alcohols such as methanol, ethanol, propanol, butanol, amyl alcohol, ethylene glycol and glycerin, acetone, methyl ethyl ketone and acetylacetone. Ketones, ethers such as dibutyl ether, aldehydes such as acetaldehyde and benzaldehyde, formic acid, acetic acid, propionic acid, butyric acid, caprylic acid, lauric acid, stearic acid, naphthenic acid, linoleic acid, oleic acid, oxalic acid, citric acid Acids, lactic acid, organic acids such as phenol and p-toluic acid, esters such as butyl butyrate, amines such as dimethylamine and aniline, formami such as N-methylacetamide, formamide and dimethylformamide. Examples include amides such as amide derivatives, sulfur-containing compounds such as dimethyl sulfoxide, chlorine-containing compounds such as chloroform and carbon tetrachloride, pyridine derivatives such as pyridine, methylpyridine, vinylpyridine, and heterocyclic substances such as furfural. it can. These solvents are appropriately selected as one kind or a combination of two or more kinds according to the kind of the SEC metal-containing compound used specifically. These solvents can be used at high temperature or after solvent substitution, if necessary.
【0011】本発明による好ましい塗布液をSEC金属
含有化合物との関連で例示すると次の通りである。 (1) SEC金属アルコキシド含有溶液 この溶液の場合、SEC金属アルコキシドが安定的に溶
解するように、有機酸又はピリジンもしくはその誘導
体、あるいはそれらの混合物を含む溶媒を用いるのが好
ましい。溶媒は、それらの化合物のみから形成し得る
他、それらの化合物と他の溶媒、例えば、エタノール、
ブタノール、アセトン等のアルコールやケトンとの混合
物から形成することができる。この場合、有機酸として
は、ギ酸、酢酸、プロピオン酸、酪酸、ペンタン酸、ヘ
キサン酸、ヘプタン酸、オクタン酸等が挙げられ、ピリ
ジン誘導体としては、メチルピリジン、ビニルピリジン
等が挙げられる。The preferred coating liquid according to the present invention is exemplified below in connection with the SEC metal-containing compound. (1) SEC Metal Alkoxide-Containing Solution In the case of this solution, it is preferable to use a solvent containing an organic acid, pyridine or a derivative thereof, or a mixture thereof so that the SEC metal alkoxide can be stably dissolved. The solvent may be formed only from those compounds, or the compounds and other solvents such as ethanol,
It can be formed from a mixture with alcohols and ketones such as butanol, acetone and the like. In this case, examples of the organic acid include formic acid, acetic acid, propionic acid, butyric acid, pentanoic acid, hexanoic acid, heptanoic acid, octanoic acid, and the like, and examples of the pyridine derivative include methylpyridine, vinylpyridine, and the like.
【0012】(2) SEC金属アセチルアセトナート又は
その誘導体含有溶液 この溶液の場合、SEC金属アセチルアセトナート又は
アセチルアセトン誘導体〔CH3COCH2COR(R:有機基)〕の
SEC金属塩が安定的に溶解するように、前記SEC金
属アルコキシド含有溶液の場合と同様に、有機酸又はピ
リジンもしくはその誘導体あるいはそれらの混合物を含
む溶媒を用いるのが好ましい。これらの溶媒は、必要に
応じ、他の溶媒、例えば、メタノール、エタノール、ブ
タノール、アセトン等のアルコールやケトンとの混合溶
媒であることができるし、これら溶媒を用いた溶媒置換
により形成した溶媒であることができる。この場合、有
機酸及びピリジン誘導体としては、SEC金属アルコキ
シド溶液に関して示したものが挙げられる。 (3) SEC金属有機酸塩 この溶液の場合、溶媒としては、各種のもの、例えば、
有機酸、アルコール、ケトン類、炭化水素類等が用いら
れる。(2) Solution containing SEC metal acetylacetonate or its derivative In the case of this solution, the SEC metal salt of SEC metal acetylacetonate or acetylacetone derivative [CH 3 COCH 2 COR (R: organic group)] is stable. As in the case of the SEC metal alkoxide-containing solution, it is preferable to use a solvent containing an organic acid or pyridine or a derivative thereof or a mixture thereof so as to be dissolved. These solvents may be mixed solvents with other solvents, for example, alcohols and ketones such as methanol, ethanol, butanol, and acetone, if necessary, and solvents formed by solvent substitution using these solvents. Can be In this case, examples of the organic acid and the pyridine derivative include those shown for the SEC metal alkoxide solution. (3) SEC metal organic acid salt In the case of this solution, various solvents are used, for example,
Organic acids, alcohols, ketones, hydrocarbons and the like are used.
【0013】本発明で用いる塗布液中のSEC金属種の
組成は、前記したように、超電導性を示すSEC金属複
合酸化物に対応するように選べばよい。例えば、次の組
成式(I)で表わされる超電導複合金属酸化物に対応する
ように選ぶことができる。 ABa2Cu3Oy (I) (式中、Aは希土類金属であり、例えば、Y,La,Nd,Sm,E
u,Gd,Dy,Ho,Er,Yb,Lu又はこれらの2種以上の混合物が用
いられる。yは7-xであり、xは-1<x<1の範囲の数であ
る)As described above, the composition of the SEC metal species in the coating solution used in the present invention may be selected so as to correspond to the SEC metal composite oxide exhibiting superconductivity. For example, it can be selected so as to correspond to the superconducting composite metal oxide represented by the following composition formula (I). ABa 2 Cu 3 Oy (I) (In the formula, A is a rare earth metal, for example, Y, La, Nd, Sm, E
u, Gd, Dy, Ho, Er, Yb, Lu or a mixture of two or more thereof is used. (y is 7-x, and x is a number in the range -1 <x <1)
【0014】さらに、SEC原料金属含有化合物が昇華
又は蒸発等により組成変化を起こす場合には、超電導性
複合金属酸化物が形成されるように補正したSEC金属
種の組成を選ぶことができる。塗布液中の貴金属量は、
塗布液中に含まれる希土類金属に対する原子比M/A
(M:貴金属の原子数、A:希土類金属の原子数)で、
0.05〜1、好ましくは0.1〜0.5である。Further, in the case where the SEC source metal-containing compound causes a composition change due to sublimation or evaporation, the composition of the SEC metal species corrected so that a superconducting composite metal oxide is formed can be selected. The amount of precious metal in the coating liquid is
Atomic ratio M / A to rare earth metal contained in coating liquid
(M: number of noble metal atoms, A: number of rare earth metal atoms)
It is 0.05 to 1, preferably 0.1 to 0.5.
【0015】本発明により超電導体膜を得るには、塗布
液を基材上に塗布して塗膜を形成した後、乾燥し、仮焼
成し、本焼した後、酸化処理する。次に、これらの各工
程について詳述する。In order to obtain a superconductor film according to the present invention, a coating solution is applied on a substrate to form a coating film, which is then dried, calcined, calcined and then oxidized. Next, each of these steps will be described in detail.
【0016】〔塗布液の塗布工程〕この工程は、塗布液
を、基材上に塗布して、SEC金属と貴金属を含む塗膜
を形成する工程である。この場合、その塗布法として
は、従来公知の方法、例えば、浸漬法、スピンコート
法、スプレー法、ハケ塗り法等の各種の方法を用いるこ
とができる。基材としては、各種の材料及び形状のもの
を用いることができる。この場合、材料としては、例え
ば、銅、チタン、ニッケル、金、銀等の金属や、シリ
カ、アルミナ、イットリア安定化ジルコニア(YS
Z)、チタニア、LaAlO3、SrTiO3、サファイ
ア等の金属酸化物/複合金属酸化物、炭化ケイ素、黒鉛
等のセラミックスが用いられ、またその形状としては、
曲面及び平面を問わず採用され、例えば、板状、線状、
コイル状、繊維状、編織布状、管状等任意の形状が採用
される。支持体は、多孔質のものであってもよい。基材
がセラミックスの場合、その表面には金属膜、特に貴金
属膜をあらかじめ形成することができる。[Coating Process of Coating Liquid] This process is a process of coating the coating liquid on a substrate to form a coating film containing a SEC metal and a noble metal. In this case, as the coating method, conventionally known methods, for example, various methods such as a dipping method, a spin coating method, a spraying method and a brush coating method can be used. As the base material, various materials and shapes can be used. In this case, examples of the material include metals such as copper, titanium, nickel, gold, and silver, silica, alumina, and yttria-stabilized zirconia (YS).
Z), titania, LaAlO 3 , SrTiO 3 , metal oxides / complex metal oxides such as sapphire, ceramics such as silicon carbide and graphite, and their shapes are
It can be used regardless of whether it is a curved surface or a flat surface.
Any shape such as a coil shape, a fibrous shape, a knitted or woven cloth shape, or a tubular shape is adopted. The support may be porous. When the base material is ceramics, a metal film, particularly a noble metal film, can be previously formed on the surface thereof.
【0017】〔乾燥工程〕前記のようにして基材上に形
成された塗膜を室温又は加温下で常圧又は減圧下で乾燥
させる。この乾燥工程後に続く仮焼工程の初期において
乾燥を完結することができるため、この乾燥工程におい
ては塗膜を完全に乾燥させなくとも良い。また、後続の
仮焼成工程を乾燥工程として兼用させ得ることから、こ
の乾燥工程は省略することもできる。[Drying Step] The coating film formed on the substrate as described above is dried at room temperature or under heating under atmospheric pressure or reduced pressure. Since the drying can be completed in the initial stage of the calcination step that follows this drying step, it is not necessary to completely dry the coating film in this drying step. Further, since the subsequent calcination step can also be used as a drying step, this drying step can be omitted.
【0018】〔仮焼工程〕この工程は、前記のようにし
て基材上に形成された塗膜を加熱焼成し、その塗膜を、
(1)炭酸バリウム、(2)希土類金属酸化物、(3)
銅酸化物及び(4)貴金属及び/又はその酸化物からな
る膜に変換させる工程である。焼成温度としては、400
〜700℃、好ましくは500〜600℃の温度が採用される。
焼成雰囲気としては、空気、酸素、窒素、アルゴン等の
雰囲気が採用される。また、この焼成工程は、真空中や
減圧中で実施することもできる。さらに、この焼成工程
は、あらかじめ加熱した基材に塗布液を吹き付けること
によっても行うことができる。この場合には、前記した
塗布液の塗布工程は省略される。[Calcination step] In this step, the coating film formed on the substrate as described above is heated and baked, and the coating film is
(1) barium carbonate, (2) rare earth metal oxide, (3)
It is a step of converting into a film made of copper oxide and (4) noble metal and / or its oxide. The firing temperature is 400
Temperatures of ~ 700 ° C, preferably 500-600 ° C are employed.
As the firing atmosphere, an atmosphere of air, oxygen, nitrogen, argon or the like is adopted. In addition, this firing step can also be performed in vacuum or reduced pressure. Furthermore, this baking step can also be performed by spraying the coating liquid on a substrate that has been heated in advance. In this case, the coating process of the coating liquid described above is omitted.
【0019】〔本焼工程〕この工程は、前記仮焼工程で
形成された無機質膜を焼成して炭酸バリウムから炭酸ガ
スを除去しつつ、炭酸バリウムと希土類金属酸化物と銅
酸化物を反応させる工程である。本発明においては、こ
の焼成工程は、雰囲気中の酸素濃度が1%(Vol%)以下、好
ましくは0.005-1%の条件下で行う。酸素濃度1%以下の条
件は、不活性ガスを用いることによって形成することが
できる。また、この焼成工程は、酸素分圧0.01atm(絶
対圧)以下、好ましくは0.00005-0.01atmの減圧下(真空
下)において実施することもできる。このような焼成条
件の採用により、前記仮焼工程で形成された膜中の炭酸
バリウムの分解が促進されるとともに、複合金属酸化物
が形成される。また、この焼成工程では、前記のように
低酸素濃度又は低酸素分圧の条件を採用することから、
炭酸バリウムの分解は低められた温度で円滑に実施する
ことができるため、基材と複合金属酸化物との間の反応
を実質的に回避させることができる。この工程における
一般的な焼成温度は700〜900℃である。本発明における
前記のような焼成条件により、従来見られたような基材
と複合金属酸化物との間の反応を実質的に防止すること
ができる。[Main firing step] In this step, the inorganic film formed in the calcination step is fired to remove carbon dioxide gas from barium carbonate, and at the same time, the barium carbonate is allowed to react with the rare earth metal oxide and the copper oxide. It is a process. In the present invention, this firing step is performed under the condition that the oxygen concentration in the atmosphere is 1% (Vol%) or less, preferably 0.005-1%. The oxygen concentration of 1% or less can be formed by using an inert gas. The firing step can also be performed under a reduced pressure (under vacuum) of oxygen partial pressure of 0.01 atm (absolute pressure) or less, preferably 0.00005-0.01 atm. By adopting such firing conditions, decomposition of barium carbonate in the film formed in the calcination step is promoted and a composite metal oxide is formed. Further, in this firing step, since the conditions of low oxygen concentration or low oxygen partial pressure are adopted as described above,
Since the decomposition of barium carbonate can be carried out smoothly at a lowered temperature, the reaction between the base material and the composite metal oxide can be substantially avoided. A general firing temperature in this step is 700 to 900 ° C. The above-mentioned firing conditions in the present invention can substantially prevent the reaction between the base material and the composite metal oxide, which has been conventionally observed.
【0020】〔酸化工程〕この工程は、前記本焼工程で
形成された複合金属酸化物を分子状酸素を用いて酸化処
理し、超電導性を有する複合金属酸化物とする工程であ
る。前記本焼工程では、雰囲気中の酸素濃度を1%以下又
は酸素分圧を0.01atm以下に保持したため、得られる複
合金属酸化物の超電導特性は不満足のものであるが、こ
の酸化工程により超電導特性にすぐれた複合金属酸化物
に変換することができる。分子状酸素としては、純酸素
又は空気が用いられる。酸化剤として空気を用いる場
合、その中に含まれる炭酸ガスによって膜の超電導特性
が悪影響を受けることから、空気中の炭酸ガス濃度は、
脱炭酸により、10ppm以下、好ましくは5ppm以下に調整
するのがよい。この酸化工程は、中高温で行われ、基材
と複合金属酸化物との間の反応を実質的に回避させるこ
とができる。この酸化工程の温度は、一般には、400
〜900℃である。本発明の方法を実施する場合、前記
仮焼工程、本焼工程及び酸化工程は、同一装置内で連続
的に実施することができる。本発明の方法により、基材
表面上に、膜厚が約100Å〜20μm、特に1000Å〜10μ
mの超電導性複合金属酸化物と貴金属からなる超電導体
膜を形成させることができる。この場合、膜厚は、塗布
液中の金属濃度を調節することにより制御し得る他、前
記した塗布・仮焼工程を繰返すことによって制御するこ
とができる。本発明で用いた貴金属は、金属及び/又は
その酸化物として超電導体膜を形成する複合金属酸化物
微粒子間に分散状態で存在する。[Oxidation Step] This step is a step of oxidizing the composite metal oxide formed in the main firing step using molecular oxygen to obtain a superconducting composite metal oxide. In the main firing step, since the oxygen concentration in the atmosphere was kept at 1% or less or the oxygen partial pressure was kept at 0.01 atm or less, the superconducting characteristics of the obtained composite metal oxide are unsatisfactory, but the superconducting characteristics due to this oxidation step It can be converted into excellent mixed metal oxides. Pure oxygen or air is used as the molecular oxygen. When air is used as the oxidizer, carbon dioxide contained therein adversely affects the superconducting properties of the film, so the concentration of carbon dioxide in the air is
It is preferable to adjust to 10 ppm or less, preferably 5 ppm or less by decarboxylation. This oxidation step can be carried out at moderately high temperatures to substantially avoid the reaction between the substrate and the composite metal oxide. The temperature of this oxidation step is generally 400
~ 900 ° C. When carrying out the method of the present invention, the calcination step, the main firing step and the oxidation step can be continuously performed in the same apparatus. According to the method of the present invention, the film thickness is about 100Å to 20 μm, especially 1000Å to 10 μm on the surface of the substrate.
It is possible to form a superconductor film composed of a superconducting composite metal oxide of m and a noble metal. In this case, the film thickness can be controlled by adjusting the metal concentration in the coating liquid, or can be controlled by repeating the above-mentioned coating / calcining process. The noble metal used in the present invention is present as a metal and / or oxide thereof in a dispersed state between the composite metal oxide fine particles forming the superconductor film.
【0021】[0021]
【発明の効果】本発明においては、その仮焼工程、本焼
工程及び酸化工程はいずれも基材と複合金属酸化物との
間の反応を実質的に回避させながら実施されるため、基
材上に形成される複合金属酸化物は、超電導特性にすぐ
れたものであり、超電導を示す臨界温度(Tc)が高い上
に、その超電導状態における電流密度(Jc)も大きいとい
う特性を有する。In the present invention, the calcination step, the main calcination step and the oxidation step are all carried out while substantially avoiding the reaction between the base material and the composite metal oxide. The composite metal oxide formed above has excellent superconducting properties, and has a high critical temperature (Tc) indicating superconductivity and a large current density (Jc) in the superconducting state.
【0022】また、本発明においては、超電導膜は均一
に分散した貴金属を含むことから、超電導体が磁束逃躍
によって常電導化した時にその貴金属を介して電流のバ
イパスが起るという利点がある。しかも、この貴金属の
使用により、炭酸バリウムの熱分解によって無機質膜の
体積収縮が起るときに発生する応力や、超電導性複合金
属酸化物と基材との間の熱膨張係数の差により生じる応
力が緩衝され、品質の良い超電導体を得ることができ
る。Further, in the present invention, since the superconducting film contains the evenly dispersed noble metal, there is an advantage that when the superconductor becomes a normal conductor due to magnetic flux escape, current bypass occurs through the noble metal. . Moreover, by using this noble metal, the stress generated when the volumetric shrinkage of the inorganic film occurs due to the thermal decomposition of barium carbonate and the stress caused by the difference in the coefficient of thermal expansion between the superconducting composite metal oxide and the substrate. Is buffered, and a high-quality superconductor can be obtained.
【0023】[0023]
【実施例】次に本発明を実施例によりさらに詳細に説明
する。 実施例1 ナフテン酸バリウム、ナフテン酸イットリウム、ナフテ
ン酸銅及びナフテン酸銀を、その金属原子比Ba:Y:Cu:Ag
が2.0:1.0:3.0:X(X=0.05〜1.0)になるように、トルエン
に溶解して塗布液を得た(SEC金属含有化合物の濃
度:8重量%)。次に、この塗布液を、基材としてのイ
ットリア安定化ジルコニアからなる板状体にスピンコー
ト法で塗布した後、空気中において、昇温速度20℃/
分で室温から500℃に加熱昇温させ、この温度で30分間
保持した後冷却した。この塗布液の塗布と加熱昇温を1
5回繰返して、基材上に炭酸バリウム、酸化イットリウ
ム、酸化銅及び銀からなる無機質膜(膜厚:2μm)を形
成した。次に、このようにして基材上に形成した無機質
膜(仮焼膜)を、酸素濃度が0.01%に調節されたア
ルゴンガス雰囲気下において、750℃の焼成温度(本
焼温度)に加熱昇温し、この温度で2時間保持した後、
雰囲気ガスを酸素濃度が1%に調節されたアルゴンガス
に変え、同一温度において0.5時間保持し、次いでこの
雰囲気下で450℃まで徐冷し、再度雰囲気ガスを酸素
ガスに変え、この温度で2時間保持したのち、酸素ガス
雰囲気下のまま室温まで徐冷して製品を得た。このよう
にして基材上に形成された膜は、X線回折の結果、YBa2C
u3Oyが主成分であり、Agの添加量Xが0.5以上では
Agが混在していることが確認された。次に、その膜上
に、約2mmの間隔で4ケ所に銀を蒸着して電極を形成し、
四端子法で室温から77Kまでの温度における電気抵抗を
測定した。膜の電気抵抗は室温から徐々に減少し、表1
に示した臨界温度(Tc)で電気抵抗がゼロになり、完全超
電導の状態が観測された。また、その膜の77Kにおける
臨界電流密度(Jc)を求め、その結果を表1に示した。EXAMPLES Next, the present invention will be described in more detail by way of examples. Example 1 Barium naphthenate, yttrium naphthenate, copper naphthenate and silver naphthenate were used in a metal atomic ratio of Ba: Y: Cu: Ag.
To 2.0: 1.0: 3.0: X (X = 0.05 to 1.0) to obtain a coating solution (concentration of SEC metal-containing compound: 8% by weight). Next, this coating solution was applied to a plate-like body made of yttria-stabilized zirconia as a base material by spin coating, and then heated in air at a heating rate of 20 ° C. /
The temperature was raised from room temperature to 500 ° C. in minutes, and the temperature was maintained for 30 minutes and then cooled. Applying this coating solution and heating up to 1
Repeated 5 times, an inorganic film (film thickness: 2 μm) made of barium carbonate, yttrium oxide, copper oxide and silver was formed on the substrate. Next, the inorganic film (calcined film) thus formed on the substrate was heated to a baking temperature (main baking temperature) of 750 ° C. in an argon gas atmosphere in which the oxygen concentration was adjusted to 0.01%. After heating up and holding at this temperature for 2 hours,
The atmosphere gas was changed to argon gas in which the oxygen concentration was adjusted to 1%, kept at the same temperature for 0.5 hours, then gradually cooled to 450 ° C. in this atmosphere, the atmosphere gas was changed to oxygen gas again, and at this temperature 2 After holding for a period of time, the product was obtained by gradually cooling to room temperature in an oxygen gas atmosphere. The film formed on the base material in this manner showed that YBa 2 C
It was confirmed that u 3 Oy was the main component and Ag was mixed when the added amount X of Ag was 0.5 or more. Next, on the film, silver was vapor-deposited at four places at intervals of about 2 mm to form electrodes,
The electrical resistance was measured by the four probe method from room temperature to 77K. The electrical resistance of the film gradually decreases from room temperature, and
At the critical temperature (Tc) shown in, the electric resistance became zero, and the state of complete superconductivity was observed. The critical current density (Jc) of the film at 77K was determined, and the results are shown in Table 1.
【0024】[0024]
【表1】 [Table 1]
【0025】実施例2 実施例1においてXを0.2とし、基材をSrTiO3
からなる板状体とした以外は同様にして得られた膜は、
Tc:89K、Jc:800A/cm2を示した。 実施例3 実施例1において、バリウム、イットリウム、銅の各ア
セチルアセトナート及び酢酸銀を、その金属原子比B
a:Y:Cu:Agが2.0:1.0:3.0:0.2
となるようにピリジンとプロピオン酸の混合物(容量比
5:3)に溶解して塗布液を得(SEC金属含有化合物
の濃度:10重量%)、基材への塗布を滴下法により行
い、塗布液の塗布と加熱工程を8回繰り返した以外は同
様にして得られた膜は、Tc:89K、Jc:520A
/cm2を示した。 実施例4 実施例3において、バリウム、イットリウム、銅の各ア
セチルアセトナート及びシクロヘキシル酪酸銀を用いた
以外は同様にして得られた膜は、Tc:88K、Jc:
420A/cm2を示した。Example 2 In Example 1, X was 0.2 and the substrate was SrTiO 3.
A film obtained in the same manner except that a plate-shaped body consisting of
It showed Tc: 89K and Jc: 800A / cm 2 . Example 3 In Example 1, barium, yttrium, copper acetylacetonates, and silver acetate were used, with the metal atomic ratio B thereof.
a: Y: Cu: Ag is 2.0: 1.0: 3.0: 0.2
To obtain a coating solution (concentration of SEC metal-containing compound: 10% by weight), which is dissolved in a mixture of pyridine and propionic acid (volume ratio 5: 3), and applied to a substrate by a dropping method. A film obtained in the same manner except that the liquid coating and heating steps were repeated 8 times had Tc: 89K and Jc: 520A.
/ Cm 2 was shown. Example 4 A film obtained in the same manner as in Example 3 except that each of acetylacetonates of barium, yttrium, and copper and silver cyclohexylbutyrate was used had Tc: 88K, Jc:
It showed 420 A / cm 2 .
【0026】実施例5 実施例1において、不溶性貴金属として金微粒子(粒
径:約0.1μm)をSEC金属のナフテン酸塩のトル
エン溶液に分散させ、その金属原子比Ba:Y:Cu:
Auが2.0:1.0:3.0:0.5となるようにし
た以外は同様にして得られたYBa2Cu3OvとAuか
らなる膜は、Tc:88K、Jc:460A/cm2を
示した。 実施例6 実施例1において、ナフテン酸バリウム、ナフテン酸ホ
ルミウム、ナフテン酸銅及びナフテン酸銀を、その金属
原子比Ba:Ho:Cu:Agが2.0:1.0:3.
0:0.2となるようにトルエンに溶解して塗布液(S
EC金属含有化合物の濃度:8重量%)を得た以外は同
様にして得られたHoBa2Cu3OvとAgからなる膜
は、Tc:89K、Jc:530A/cm2を示した。 実施例7 実施例1において、ナフテン酸バリウム、ナフテン酸エ
ルビウム、ナフテン酸銅及びナフテン酸銀を、その金属
原子比Ba:Er:Cu:Agが2.0:1.0:3.
0:0.2となるようにトルエンに溶解して塗布液(S
EC金属含有化合物の濃度:8重量%)を得た以外は同
様にして得られたErBa2Cu3OvとAgからなる膜
は、Tc:88K、Jc:460A/cm2を示した。Example 5 In Example 1, fine gold particles (particle size: about 0.1 μm) as an insoluble noble metal were dispersed in a toluene solution of SEC metal naphthenate, and the metal atomic ratio Ba: Y: Cu:
A film composed of YBa 2 Cu 3 Ov and Au obtained in the same manner except that Au was adjusted to 2.0: 1.0: 3.0: 0.5 was Tc: 88K, Jc: 460A / It showed cm 2 . Example 6 In Example 1, barium naphthenate, holmium naphthenate, copper naphthenate, and silver naphthenate were added at a metal atomic ratio of Ba: Ho: Cu: Ag of 2.0: 1.0: 3.
The coating solution (S
A film composed of HoBa 2 Cu 3 Ov and Ag obtained in the same manner except that the concentration of EC metal-containing compound: 8% by weight) was Tc: 89K, Jc: 530A / cm 2 . Example 7 In Example 1, barium naphthenate, erbium naphthenate, copper naphthenate and silver naphthenate were added at a metal atomic ratio of Ba: Er: Cu: Ag of 2.0: 1.0: 3.
The coating solution (S
A film composed of ErBa 2 Cu 3 Ov and Ag obtained in the same manner except that the concentration of the EC metal-containing compound was 8% by weight, showed Tc: 88K and Jc: 460A / cm 2 .
───────────────────────────────────────────────────── フロントページの続き (72)発明者 近藤 和吉 茨城県つくば市東1丁目1番地 工業技術 院化学技術研究所内 (72)発明者 水田 進 茨城県つくば市東1丁目1番地 工業技術 院化学技術研究所内 (72)発明者 浜岡 明 東京都台東区下谷2丁目20番5号 日本化 学産業株式会社内 審査官 平塚 政宏 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Kazuyoshi Kondo 1-1 Higashi, Tsukuba-shi, Ibaraki Industrial Technology Institute, Institute of Chemical Technology (72) Inventor Susumu Mizuta 1-1-chome, Tsukuba, Ibaraki Industrial Technology In-house (72) Inventor Akira Hamaoka 2-20-5 Shimotani, Taito-ku, Tokyo Masahiro Hiratsuka Examiner, Nippon Kagaku Sangyo Co., Ltd.
Claims (1)
ム、(2)希土類金属酸化物、(3)銅酸化物及び
(4)貴金属及び/又はその酸化物からなる無機質膜
を、酸素濃度が1vol%以下の不活性ガス雰囲気下又
は酸素分圧が0.01atm(絶対圧)以下の減圧下に
おいて該膜と基材との間の反応を実質的に生じさせない
温度で焼成して該膜中に含まれる炭酸バリウムから炭酸
ガスを除去しつつ炭酸バリウムと希土類酸化物と銅酸化
物を反応させた後、次いで得られた金属酸化物膜と基材
との間の反応を実質的に生じさせない温度で分子状酸素
により酸化してバリウム、希土類金属及び銅からなる超
電導性複合金属酸化物と貴金属から構成される超電導体
膜を形成させることを特徴とする超電導体の製造方法。1. An inorganic film formed of (1) barium carbonate, (2) rare earth metal oxide, (3) copper oxide and (4) noble metal and / or its oxide formed on a substrate is treated with oxygen. In an inert gas atmosphere having a concentration of 1 vol% or less, or under a reduced pressure having an oxygen partial pressure of 0.01 atm (absolute pressure) or less, baking is performed at a temperature at which a reaction between the film and the substrate does not substantially occur, After removing carbon dioxide gas from the barium carbonate contained in the film, the barium carbonate was reacted with the rare earth oxide and the copper oxide, and then the reaction between the obtained metal oxide film and the substrate was substantially carried out. A method for producing a superconductor, which comprises forming a superconductor film composed of a noble metal and a superconducting composite metal oxide composed of barium, a rare earth metal and copper by oxidizing with molecular oxygen at a temperature at which it does not occur.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3185213A JPH0710732B2 (en) | 1991-06-28 | 1991-06-28 | Superconductor manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3185213A JPH0710732B2 (en) | 1991-06-28 | 1991-06-28 | Superconductor manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH059022A JPH059022A (en) | 1993-01-19 |
| JPH0710732B2 true JPH0710732B2 (en) | 1995-02-08 |
Family
ID=16166856
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3185213A Expired - Lifetime JPH0710732B2 (en) | 1991-06-28 | 1991-06-28 | Superconductor manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0710732B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011230946A (en) * | 2010-04-26 | 2011-11-17 | National Institute Of Advanced Industrial Science & Technology | Method for producing oxide superconductive thin film |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3556586B2 (en) | 2000-09-05 | 2004-08-18 | 株式会社東芝 | Method for producing oxide superconductor, raw material for oxide superconductor, and method for producing raw material for oxide superconductor |
| US20020056401A1 (en) | 2000-10-23 | 2002-05-16 | Rupich Martin W. | Precursor solutions and methods of using same |
| JP5445982B2 (en) | 2009-12-09 | 2014-03-19 | 独立行政法人産業技術総合研究所 | Rare earth superconducting film forming solution and method for producing the same |
| JP5505867B2 (en) * | 2010-06-17 | 2014-05-28 | 住友電気工業株式会社 | Method for manufacturing oxide superconducting thin film |
| JP2012146418A (en) * | 2011-01-07 | 2012-08-02 | Sumitomo Electric Ind Ltd | Oxide superconducting wire material and manufacturing method of the same |
| KR101456152B1 (en) * | 2012-08-06 | 2014-11-03 | 서울대학교산학협력단 | Superconductor and method of forming the same |
| KR20240051943A (en) * | 2021-09-06 | 2024-04-22 | 스미토모 덴키 고교 가부시키가이샤 | Raw material solution for producing oxide superconducting materials and method for producing oxide superconducting materials |
-
1991
- 1991-06-28 JP JP3185213A patent/JPH0710732B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011230946A (en) * | 2010-04-26 | 2011-11-17 | National Institute Of Advanced Industrial Science & Technology | Method for producing oxide superconductive thin film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH059022A (en) | 1993-01-19 |
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