JPH0710795B2 - Acrylic acid or methacrylic acid ester of 2,2-dimethylolcarboxylic acid - Google Patents
Acrylic acid or methacrylic acid ester of 2,2-dimethylolcarboxylic acidInfo
- Publication number
- JPH0710795B2 JPH0710795B2 JP565487A JP565487A JPH0710795B2 JP H0710795 B2 JPH0710795 B2 JP H0710795B2 JP 565487 A JP565487 A JP 565487A JP 565487 A JP565487 A JP 565487A JP H0710795 B2 JPH0710795 B2 JP H0710795B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- compound
- ester
- dimethylolcarboxylic
- methacrylic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 title description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 title description 5
- 239000002253 acid Substances 0.000 title description 5
- 125000005397 methacrylic acid ester group Chemical group 0.000 title description 5
- -1 methacryloyl Chemical group 0.000 claims description 6
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 description 21
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 18
- 238000000034 method Methods 0.000 description 16
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 14
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 239000003054 catalyst Substances 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000003431 cross linking reagent Substances 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 5
- 238000000921 elemental analysis Methods 0.000 description 5
- BMLZXWMOVNVCAS-UHFFFAOYSA-N 2-methyl-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propanoic acid Chemical compound C=CC(=O)OCC(C)(COC(=O)C=C)C(O)=O BMLZXWMOVNVCAS-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- PTBDIHRZYDMNKB-UHFFFAOYSA-N 2,2-Bis(hydroxymethyl)propionic acid Chemical compound OCC(C)(CO)C(O)=O PTBDIHRZYDMNKB-UHFFFAOYSA-N 0.000 description 3
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 125000005396 acrylic acid ester group Chemical group 0.000 description 3
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- VHRYZQNGTZXDNX-UHFFFAOYSA-N methacryloyl chloride Chemical compound CC(=C)C(Cl)=O VHRYZQNGTZXDNX-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 238000005809 transesterification reaction Methods 0.000 description 3
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- 125000005907 alkyl ester group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 238000004440 column chromatography Methods 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 230000032050 esterification Effects 0.000 description 2
- 238000005886 esterification reaction Methods 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 239000012442 inert solvent Substances 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000004702 methyl esters Chemical class 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 239000002808 molecular sieve Substances 0.000 description 2
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 2
- 229950000688 phenothiazine Drugs 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- IMWBCGGMTSYUSG-UHFFFAOYSA-N 2-methyl-3-(2-methylprop-2-enoyloxy)-2-(2-methylprop-2-enoyloxymethyl)propanoic acid Chemical compound CC(=C)C(=O)OCC(C)(C(O)=O)COC(=O)C(C)=C IMWBCGGMTSYUSG-UHFFFAOYSA-N 0.000 description 1
- 239000004971 Cross linker Substances 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000010898 silica gel chromatography Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229940096522 trimethylolpropane triacrylate Drugs 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明はUVレジスト用の架橋剤として有用な化合物に関
する。FIELD OF THE INVENTION This invention relates to compounds useful as crosslinkers for UV resists.
従来の技術 近年UVレジストの分野では作業性、作業環境の改善のた
めに、有機溶剤類を用いない現像方式、すなわち水はア
ルカリ水による現像方式が望まれている。水又はアルカ
リ水で現像可能なUVレジスト用架橋剤としてはネオペン
チルグリコールジアクリレート、トリメチロールプロパ
ントリアクリレート、ペンタエリスリトールのトリもし
くはテトラアクリレート等が用いられている。2. Description of the Related Art In recent years, in the field of UV resists, a developing method that does not use organic solvents, that is, a developing method using alkaline water as water is desired in order to improve workability and working environment. Neopentyl glycol diacrylate, trimethylol propane triacrylate, pentaerythritol tri- or tetra-acrylate and the like are used as a UV resist cross-linking agent which can be developed with water or alkaline water.
発明が解決しようとする問題点 従来用いられている化合物はいずれも疎水性が高くUVレ
ジストの主成分であるベースレジンと混合して使用する
場合にベースレジンの疎水性部分に偏存し、必ずしも効
果的な架橋反応が起こらないことがある。又、これらの
化合物は水溶性に乏しいので水現象、アルカリ水現像用
には必ずしも好ましいものではない。DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention All of the conventionally used compounds have high hydrophobicity, and when used as a mixture with a base resin which is a main component of UV resist, they are ubiquitously distributed in the hydrophobic portion of the base resin, The effective crosslinking reaction may not occur. Further, since these compounds have poor water solubility, they are not necessarily preferable for the water phenomenon and alkaline water development.
本発明はベースレジンに対する均一な分散性を奏し得る
UVレジスト用架橋剤として有用な化合物を提供するもの
である。The present invention can exhibit uniform dispersibility in the base resin
The present invention provides a compound useful as a crosslinking agent for UV resist.
問題点を解決するための手段 本発明はUVレジスト用架橋剤として用いられる式(I) (式中、Rは炭素数1〜3のアルキル、Yはアクリロイ
ルもしくはメタクリロイルである)で表される化合物
〔以下、化合物(I)という。他の式番号の化合物につ
いても同様〕に関する。Means for Solving the Problems The present invention relates to the formula (I) used as a crosslinking agent for UV resists. (In the formula, R is alkyl having 1 to 3 carbons and Y is acryloyl or methacryloyl) [hereinafter referred to as compound (I). The same applies to compounds of other formula numbers].
化合物(I)は以下のごとき種々の方法で得ることがで
きる。すなわち、式(II) (式中、Rは前記と同義である)で表される化合物と、
必要に応じ不活性溶媒中、 1)必要に応じエステル化触媒の存在下にアクリル酸も
しくはメタクリル酸とを反応させる方法、 2)必要に応じ塩基の存在下に塩化アクリロイルもしく
は塩化メタクリロイルとを反応させる方法、 3)適当な触媒の存在下にアクリル酸エステルもしくは
メタクリル酸エステルとを反応させる方法(エステル交
換反応)などである。Compound (I) can be obtained by various methods as described below. That is, the formula (II) (Wherein R has the same meaning as defined above),
If necessary, in an inert solvent, 1) reacting with acrylic acid or methacrylic acid in the presence of an esterification catalyst if necessary, 2) reacting with acryloyl chloride or methacryloyl chloride in the presence of a base if necessary Method 3) A method of reacting an acrylic acid ester or a methacrylic acid ester in the presence of a suitable catalyst (transesterification reaction).
不活性溶媒はベンゼン、トルエン、キシレン等のベンゼ
ン系溶媒、塩化メチレン、クロロホルム、四塩化炭素等
のハロゲン化低級アルカン、酢酸エチル等の低級アルカ
ン酸の低級アルキルエステル、ジメチルホルムアミド等
の酸アミド類、エチルエーテル、テトラヒドロフラン等
のエーテル類等一般的溶媒を包含するが、ベンゼン系溶
媒、ジメチルホルムアミド、酢酸エチル等が特に好適で
ある。Inert solvents include benzene-based solvents such as benzene, toluene and xylene, halogenated lower alkanes such as methylene chloride, chloroform and carbon tetrachloride, lower alkyl esters of lower alkanoic acids such as ethyl acetate, acid amides such as dimethylformamide, Common solvents such as ethers such as ethyl ether and tetrahydrofuran are included, but benzene solvents, dimethylformamide, ethyl acetate and the like are particularly preferable.
方法1)ではアクリル酸もしくはメタクリル酸に、方法
3)ではアクリル酸エステルもしくはメタクリル酸エス
テルに方法2)では塩基に溶媒をかねさせることができ
る。Acrylic acid or methacrylic acid can be used as the solvent in the method 1), and an acrylic ester or methacrylic acid ester can be used as the solvent in the method 3) and a base as the method 2).
次に方法1)についてさらに詳しく述べるとエステル化
触媒は硫酸、塩酸、リン酸等の鉱酸、パラトルエンスル
ホン酸等のスルホン酸等を包含する。化合物(II)に対
し、アクリル酸もしくはメタクリル酸を1〜20当量、特
に2〜5当量用いるのが好ましい。もっとも後者に溶媒
をかねさせる場合はこの限りでない。Next, the method 1) will be described in more detail. The esterification catalyst includes a mineral acid such as sulfuric acid, hydrochloric acid and phosphoric acid, and a sulfonic acid such as paratoluenesulfonic acid. It is preferable to use acrylic acid or methacrylic acid in an amount of 1 to 20 equivalents, particularly 2 to 5 equivalents, relative to compound (II). However, this is not the case when the latter is also used as a solvent.
反応液中の触媒濃度は0.1〜10重量%、特に0.1〜2重量
%とするのが好ましい。反応は通常50〜100℃で行い、
5〜24時間で終了する。The catalyst concentration in the reaction solution is preferably 0.1 to 10% by weight, more preferably 0.1 to 2% by weight. The reaction is usually carried out at 50-100 ° C,
Finish in 5 to 24 hours.
反応終了後触媒を中和し、未反応のアクリル酸もしくは
メタクリル酸を留去してから再結晶又はカラムクロマト
グラフィーにより化合物(I)を得る。After completion of the reaction, the catalyst is neutralized, unreacted acrylic acid or methacrylic acid is distilled off, and then the compound (I) is obtained by recrystallization or column chromatography.
方法2)についてさらに詳しく述べると塩基はピリジ
ン、トリエチルアミン等を包含する。塩基は化合物(I
I)に対し1〜30当量特に1〜5当量でかつ酸クロリド
より過剰に使用するのが好ましい。もっともピリジン等
の塩基に溶媒をかねさせる場合はこの限りでない。塩化
アクリロイルもしくは塩化メタクリロイルは化合物(I
I)に対し1〜5当量、特に1〜1.5当量用いるのが好ま
しい。反応は通常0〜20℃で行い、3〜24時間で終了す
る。In more detail about method 2), the base includes pyridine, triethylamine and the like. The base is a compound (I
It is preferable to use 1 to 30 equivalents, particularly 1 to 5 equivalents, and an excess of the acid chloride with respect to I). However, this does not apply when a solvent such as pyridine is used as the solvent. Acryloyl chloride or methacryloyl chloride is a compound (I
It is preferable to use 1 to 5 equivalents, especially 1 to 1.5 equivalents, relative to I). The reaction is usually performed at 0 to 20 ° C for 3 to 24 hours.
反応終了後溶媒を留去し、酸処理により化合物(I)の
塩基付加塩から化合物(I)を遊離させ、ジエチルエー
テル等で抽出し濃縮、結晶化させることにより化合物
(I)を得る。After completion of the reaction, the solvent is distilled off, the compound (I) is released from the base addition salt of the compound (I) by acid treatment, extracted with diethyl ether or the like, concentrated and crystallized to obtain the compound (I).
方法3)についてさらに詳しく述べるとエステル交換触
媒は硫酸等の鉱酸、パラトルエンスルホン酸等のスルホ
ン酸、テトラn−ブトキシ錫、テトラn−ブトキシチタ
ン等の金属アルコキシド等を包含する。反応液中の触媒
濃度は0.5〜5重量%が適当である。アクリル酸エステ
ル、メタクリル酸エステルは低級アルキルエステル、例
えばメチルエステル、エチルエステル、n−ブチルエス
テル等を包含する。メチルエステルを使用する場合には
生成するメタノールを留去することにより平衡をずらせ
ることができるので特に好ましい。これらのエステルの
使用量は化合物(II)に対し1〜10当量が適当である。
反応は通常70〜120℃で行い、5〜24時間が適当であ
る。The method 3) will be described in more detail. The transesterification catalyst includes a mineral acid such as sulfuric acid, a sulfonic acid such as paratoluenesulfonic acid, a metal alkoxide such as tetra-n-butoxytin and tetra-n-butoxytitanium. The catalyst concentration in the reaction solution is preferably 0.5 to 5% by weight. Acrylic acid esters and methacrylic acid esters include lower alkyl esters such as methyl ester, ethyl ester, n-butyl ester and the like. The use of methyl ester is particularly preferable because the equilibrium can be shifted by distilling off the produced methanol. The amount of these esters used is appropriately 1 to 10 equivalents relative to compound (II).
The reaction is usually carried out at 70 to 120 ° C. for 5 to 24 hours.
酸触媒の場合には中和後又は金属アルコキシドの場合は
水を加えて分解した後、ジエチルエーテル等で抽出し濃
縮した後再結晶又はカラムクロマトグラフィーに付して
化合物(I)得る。In the case of an acid catalyst, after neutralization or in the case of a metal alkoxide, it is decomposed by adding water, extracted with diethyl ether or the like, concentrated, and then recrystallized or subjected to column chromatography to obtain a compound (I).
以上いずれの方法においても反応中又は精製中に化合物
(I)が重合するのをさけるため重合禁止剤を系に添加
しておくことが望ましい。かかる重合禁止剤はヒドロキ
ノン、シドロキノンモノメチルエーテル、フェノチアジ
ン等の一般的重合禁止剤を包含し、反応液及び又は精製
液中100ppm〜5重量%存在させる。In any of the above methods, it is desirable to add a polymerization inhibitor to the system in order to prevent the compound (I) from polymerizing during the reaction or purification. Such polymerization inhibitors include general polymerization inhibitors such as hydroquinone, cidroquinone monomethyl ether and phenothiazine, and are present in the reaction solution and / or the purified solution in an amount of 100 ppm to 5% by weight.
化合物(I)はネガ型のUVレジスト用の架橋剤として用
いることができる。ベースレジンとしてはUVレジストに
常用される反応性二重結合を有するアクリル酸エステ
ル、メタクリル酸エステル、ポリエステル、エポキシ樹
脂、ポリウレタン等のホモポリマー、コポリマーのプレ
ポリマーが用いられる。かかるベースレジンに化合物
(I)を混合し、紫外線を照射する場合には二重結合同
士の結合により架橋剤がプレポリマーをつなぎ高分子化
して不溶化する。The compound (I) can be used as a crosslinking agent for a negative type UV resist. As the base resin, a homopolymer or copolymer prepolymer such as acrylic acid ester, methacrylic acid ester, polyester, epoxy resin or polyurethane having a reactive double bond, which is commonly used for UV resists, is used. When compound (I) is mixed with such a base resin and irradiated with ultraviolet rays, the cross-linking agent connects the prepolymers with each other by the bonds between the double bonds to make them prepolymerized and insolubilized.
化合物(I)は同一分子内に疎水性部分と親水性部分
(カルボキシル基)を有するのでベースレジンに対し一
般に十分良好な分散性を保つことができる。さらにカル
ボキシル基遊離の形から例えば有機アミン(トリエチル
アミン等)で部分中和〜完全中和して水に対する溶解性
を向上させたり、有機アミンの種類を変えたりすること
によりベースレジン中での分散性をさらに向上させるこ
とができる。Since the compound (I) has a hydrophobic part and a hydrophilic part (carboxyl group) in the same molecule, it can generally maintain sufficiently good dispersibility in the base resin. In addition, the carboxyl group-free form is partially neutralized or fully neutralized with, for example, an organic amine (triethylamine, etc.) to improve the solubility in water, or by changing the type of organic amine, the dispersibility in the base resin is improved. Can be further improved.
次に本発明の実施例を示す。Next, examples of the present invention will be described.
実施例1 2,2−ジアクリロイルオキシメチルプロピオン酸の製法
<酸塩化物を用いる方法> 予めモレキュラーシーブ4Aで脱水処理したN,N−ジメチ
ルホルムアミド950mlに2,2−ジメチロールプロピオン酸
80.5g(0.60モル)を加え、溶解の後、0〜5℃に冷却
する。この液にトリエチルアミン194g(1.92モル)を加
え、攪拌下、1〜5℃に温度を保ちながら、塩化アクロ
イル119g(1.32モル)を約2時間で滴下する。得られた
黄色懸濁液にハイドロキノンモノメチルエーテル10mgを
加え、減圧下にてN,N−ジメチルホルムアミドを留去
し、残渣に冷水750mlを加えた後、濃塩酸でpH1に調整
し、ジエチルエーテル400mlで2回抽出した。抽出油層
を無水MgSO4で乾燥の後、減圧濃縮して粗2,2−ジアクリ
ロイルオキシメチルプロピオン酸118.7gを得た(収率82
%)。Example 1 Method for Producing 2,2-Diacryloyloxymethylpropionic Acid <Method Using Acid Chloride> 2,2-Dimethylolpropionic acid was added to 950 ml of N, N-dimethylformamide dehydrated in advance with molecular sieve 4A.
80.5 g (0.60 mol) is added and, after dissolution, cooled to 0-5 ° C. To this liquid, 194 g (1.92 mol) of triethylamine was added, and 119 g (1.32 mol) of acroyl chloride was added dropwise over about 2 hours while stirring and maintaining the temperature at 1 to 5 ° C. 10 mg of hydroquinone monomethyl ether was added to the obtained yellow suspension, N, N-dimethylformamide was distilled off under reduced pressure, 750 ml of cold water was added to the residue, and the pH was adjusted to 1 with concentrated hydrochloric acid, and 400 ml of diethyl ether was added. It was extracted twice with. The extracted oil layer was dried over anhydrous MgSO 4 and then concentrated under reduced pressure to obtain 118.7 g of crude 2,2-diacryloyloxymethylpropionic acid (yield 82
%).
n−ヘキサン/クロロホルムで再結晶精製することによ
り、白色針状昌74.8gを得(収率63%)、NMR,IR,元素分
析より2,2−ジアクリロイルメチルプロピオン酸である
ことを確認した。By recrystallizing and refining with n-hexane / chloroform, 74.8 g of white needles was obtained (yield 63%), and it was confirmed from NMR, IR and elemental analysis that it was 2,2-diacryloylmethylpropionic acid. .
形状 白色結晶 m.p61〜62℃ 水への溶解度 1.18g/100g、(20℃) 分析値 IR 1720cm-1、1690cm-1 νC=O 1070cm-1、1280cm-1 νC-O 1620cm-1、νC=C 2700cm-1、νO-H NMR 1.38ppm(3H,s) 4.40ppm(4H,s) 5.7〜6.8ppm(6H,m) 11.47ppm(1H,s) 元素分析 C% H% O% 理論値 54.54 5.83 39.63 実測値 54.18 5.90 39.92 実施例2 2,2−ジアクリロイルオキシメチルプロピオン酸の製法
<エステル交換による方法> 2,2−ジメチロールプロピオン酸13.4g (0.10モル)、アクリル酸メチル86.1g (1.0モル)、濃硫酸0.40g(4ミリモル)、 フェノチアジン20mgを混合の後、還流下8時間反応し
た。反応液を減圧濃縮の後、残渣に水500mlを加え、ジ
エチルエーテル500mlで2回抽出し、以後実施例1と同
様の操作で無色の油状物18.2gを得た。この1.82gをシリ
カゲルクロマトグラフィーで単離、精製して、0.50gの
白色結晶を得た。Shape white crystals m.p61~62 solubility 1.18 g / 100 g to ° C. water, (20 ° C.) analysis IR 1720cm -1, 1690cm -1 ν C = O 1070cm -1, 1280cm -1 ν CO 1620cm -1, ν C = C 2700 cm -1 , ν OH NMR 1.38 ppm (3H, s) 4.40 ppm (4H, s) 5.7 to 6.8 ppm (6H, m) 11.47 ppm (1H, s) Elemental analysis C% H% O% Theoretical value 54.54 5.83 39.63 Actual value 54.18 5.90 39.92 Example 2 Method for producing 2,2-diacryloyloxymethylpropionic acid <Method by transesterification> 2,2-Dimethylolpropionic acid 13.4 g (0.10 mol), methyl acrylate 86.1 g ( 1.0 mol), concentrated sulfuric acid 0.40 g (4 mmol) and phenothiazine 20 mg were mixed and reacted under reflux for 8 hours. The reaction mixture was concentrated under reduced pressure, 500 ml of water was added to the residue, and the mixture was extracted twice with 500 ml of diethyl ether, and 18.2 g of a colorless oily substance was obtained by the same procedure as in Example 1. This 1.82 g was isolated and purified by silica gel chromatography to obtain 0.50 g of white crystals.
NMR,IR,元素分析で、実施例1に示した2,2−ジアクリロ
イルオキシメチルプロピオン酸であることを確認した
(収率20%)。By NMR, IR, and elemental analysis, it was confirmed to be 2,2-diacryloyloxymethylpropionic acid shown in Example 1 (yield 20%).
実施例3 2−2−ジメタクリロイルオキシメチルプロピオン酸の
製法<酸塩化物を用いる方法> 予めモレキュラーシーブ4Aで脱水処理したN,N−ジメチ
ルホルムアミド470mlに2,2−ジメチロールプロピオン酸
40.2g(0.30モル)を加え、溶解の後、0〜5℃に冷却
する。この液にトリエチルアミン97g(0.68モル)を加
え、攪拌下、0〜5℃に温度を保ちながら、塩化メタク
リロイル69g(0.66モル)を約2時間で滴下する。この
後、同一温度で1時間熟成して得られる黄色懸濁液にハ
イドロキノンモノメチルエーテル50mgを加え、減圧下に
てN,N−ジメチルホルムアミドを留去し、残渣に冷水375
mlを加えた後、濃塩酸でpH1に調整し、ジイソプロピル
エーテル200mlで2回抽出した。抽出油層を無水MgSO4で
乾燥の後減圧濃縮して粗2,2−ジメタクリロイルオキシ
メチルプロピオン酸70gを得た。(収率86%) 上記粗生成物をn−ヘキサン200mlで2回溶解、抽出の
後、n−ヘキサンを濃縮除去してから、トルエンにて再
結晶精製して、白色針状昌42gを得(収率52%)、NMR,I
R,元素分析より2,2−ジメタクロイルオキシプロピオン
酸である事を確認した。Example 3 Method for producing 2-2-dimethacryloyloxymethylpropionic acid <Method using acid chloride> 2,2-Dimethylolpropionic acid was added to 470 ml of N, N-dimethylformamide which had been dehydrated with molecular sieve 4A in advance.
40.2 g (0.30 mol) is added and, after dissolution, cooled to 0-5 ° C. To this solution, 97 g (0.68 mol) of triethylamine was added, and 69 g (0.66 mol) of methacryloyl chloride was added dropwise over about 2 hours while stirring and maintaining the temperature at 0 to 5 ° C. After that, 50 mg of hydroquinone monomethyl ether was added to the yellow suspension obtained by aging at the same temperature for 1 hour, and N, N-dimethylformamide was distilled off under reduced pressure.
After adding ml, the mixture was adjusted to pH 1 with concentrated hydrochloric acid and extracted twice with 200 ml of diisopropyl ether. The extracted oil layer was dried over anhydrous MgSO 4 and concentrated under reduced pressure to obtain 70 g of crude 2,2-dimethacryloyloxymethylpropionic acid. (Yield 86%) The above crude product was dissolved twice in 200 ml of n-hexane, extracted, and then n-hexane was concentrated and removed, followed by recrystallization and purification with toluene to obtain 42 g of white needles. (Yield 52%), NMR, I
From R and elemental analysis, it was confirmed to be 2,2-dimethacryloyloxypropionic acid.
形状 白色結晶 m.p92〜94℃ 分析値 IR 1720、1690cm-1 νC=O 1630cm-1 νC=C 2700cm-1 νO-H NMR 1.38ppm(3H,s) 5.6〜6.2ppm (4H,m) 1.98ppm(6H,s) 9.0ppm(1H,s) 4.18ppm(4H,s) 元素分析 C% H% O% 理論値 57.77 6.71 35.52 実測値 57.38 6.80 35.91 発明の効果 ベースレジンに対する均一な分散性を奏し得るUVレジス
ト用架橋剤として有用な化合物が提供される。Shape white crystals M.P92~94 ° C. analysis IR 1720,1690cm -1 ν C = O 1630cm -1 ν C = C 2700cm -1 ν OH NMR 1.38ppm (3H, s) 5.6~6.2ppm (4H, m) 1.98ppm (6H, s) 9.0ppm (1H, s) 4.18ppm (4H, s) Elemental analysis C% H% O% Theoretical value 57.77 6.71 35.52 Actual value 57.38 6.80 35.91 Effect of the invention Uniform dispersibility to base resin A compound useful as a cross-linking agent for a UV resist that can be provided is provided.
Claims (1)
ルもしくはメタクリロイルである)で表される化合物。1. A formula (In the formula, R is alkyl having 1 to 3 carbon atoms, and Y is acryloyl or methacryloyl).
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61-127718 | 1986-06-02 | ||
| JP12771886 | 1986-06-02 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6399038A JPS6399038A (en) | 1988-04-30 |
| JPH0710795B2 true JPH0710795B2 (en) | 1995-02-08 |
Family
ID=14966988
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP565487A Expired - Fee Related JPH0710795B2 (en) | 1986-06-02 | 1987-01-13 | Acrylic acid or methacrylic acid ester of 2,2-dimethylolcarboxylic acid |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0710795B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7504531B2 (en) * | 2006-04-28 | 2009-03-17 | Xerox Corporation | Processes for preparing difunctional compounds |
| JP5610470B2 (en) * | 2010-04-19 | 2014-10-22 | 日本化薬株式会社 | Polyfunctional monomer and resin composition using the same |
-
1987
- 1987-01-13 JP JP565487A patent/JPH0710795B2/en not_active Expired - Fee Related
Non-Patent Citations (1)
| Title |
|---|
| ChemicalAbstracts,54,4491c. |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6399038A (en) | 1988-04-30 |
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