JPH07109016B2 - Copper alloy for flexible printing - Google Patents
Copper alloy for flexible printingInfo
- Publication number
- JPH07109016B2 JPH07109016B2 JP14459987A JP14459987A JPH07109016B2 JP H07109016 B2 JPH07109016 B2 JP H07109016B2 JP 14459987 A JP14459987 A JP 14459987A JP 14459987 A JP14459987 A JP 14459987A JP H07109016 B2 JPH07109016 B2 JP H07109016B2
- Authority
- JP
- Japan
- Prior art keywords
- flexibility
- flexible printing
- copper alloy
- conductivity
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
Landscapes
- Parts Printed On Printed Circuit Boards (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明はフレキシブルプリント用銅合金に関し、さらに
詳しくは抗張力や可撓性に優れ、導電率も良好なフレキ
シブルプリント用およびICテープキャリア用などに好適
な銅合金に係るものである。Description: TECHNICAL FIELD The present invention relates to a copper alloy for flexible printing, more specifically, for flexible printing and IC tape carrier having excellent tensile strength and flexibility and good conductivity. It relates to a suitable copper alloy.
フレキシブルプリント配線板は、プリント配線板におい
て比較的新しい部品であって、その大きな特色は可撓性
を利用することである。このフレキシブルプリント配線
板は、初めは電線、ケーブルにおける可撓性が必要な場
合の代替品として使用されたもので、現在でも主として
電線、ケーブルの代替品として使用されている。フレキ
シブルプリント配線板は可撓性を利用し、曲げたり、捩
じったりしてカメラ、電卓および電話機等の機器内立体
配線材料として、また可撓性の優れていることからプリ
ンタヘッド等の電子機器の可動部への配線にも使用され
ている。Flexible printed wiring boards are relatively new components in printed wiring boards, and their major feature is to utilize flexibility. This flexible printed wiring board was originally used as a substitute for a wire or cable that requires flexibility, and is still mainly used as a substitute for electric wires and cables. A flexible printed wiring board uses flexibility and bends or twists to be used as a three-dimensional wiring material in devices such as cameras, calculators and telephones, and because of its excellent flexibility, it can be used in electronic devices such as printer heads. It is also used for wiring to moving parts of equipment.
さらに集積回路の分野では、最近の軽薄短小化に伴い、
ICのパッケージも種々変化しつつあるが、その中で今後
需要が増えると考えられるTAB方式(Tape Automated Bo
nding)のパッケージに的した材料が望まれている。Furthermore, in the field of integrated circuits, with the recent miniaturization of light, thin, short,
IC packages are also undergoing various changes, but the TAB method (Tape Automated Bo
A material suitable for the packaging of nding) is desired.
従来、これらの用途には主にタフピッチ銅が使用されて
いたが、導電率は約100%IACSと良好であるものの抗張
力や可撓性が不充分である問題があった。Conventionally, tough pitch copper has been mainly used for these applications, but there is a problem that tensile strength and flexibility are insufficient although the conductivity is good at about 100% IACS.
本発明は上記の問題について検討の結果、導電率がタフ
ピッチ銅と略同等であり、抗張力および可撓性がタフピ
ッチ銅より格段に優れたフレキシブルプリント用銅合金
を開発したものである。As a result of studying the above problems, the present invention has developed a copper alloy for flexible printing, which has substantially the same conductivity as that of tough pitch copper and has significantly higher tensile strength and flexibility than tough pitch copper.
本発明は、Cr0.0001〜0.5wt%、Sn0.0001〜0.5wt%を含
み、さらにZn、Mn、Mg、Fe、Ni、Al、Si、Co、Ca、Ti、
Zr、V、Ag、Cd、Ga、Ge、In、As、Sb、Bi、Be、P、
Y、Nb、B、Teなどの1種または2種以上を単独で0.00
01〜0.3wt%、総計で0.0001〜0.3wt%、総計で0.0001〜
0.5wt%含み、残部がCuと不可避不純物とからなり、不
可避不純物中O2量が500ppm以下、S量が10ppm以下であ
ることを特徴とするフレキシブルプリント用銅合金であ
る。The present invention includes Cr 0.0001 to 0.5 wt%, Sn 0.0001 to 0.5 wt%, further Zn, Mn, Mg, Fe, Ni, Al, Si, Co, Ca, Ti,
Zr, V, Ag, Cd, Ga, Ge, In, As, Sb, Bi, Be, P,
One or two or more of Y, Nb, B, Te, etc., alone is 0.00
01-0.3wt%, total 0.0001-0.3wt%, total 0.0001-
It is a copper alloy for flexible printing, characterized in that it contains 0.5 wt% and the balance is Cu and unavoidable impurities, and the O 2 content in the unavoidable impurities is 500 ppm or less and the S content is 10 ppm or less.
すなわち本発明はCuに微量のCrおよびSnを添加し、さら
に副成分として、Zn、Mn、Mg、Fe、Ni、Al、Si、Co、C
a、Ti、Zr、V、Ag、Cd、Ga、Ge、In、As、Sb、Bi、B
e、P、Y、Nb、B、Teなどの1種または2種以上を添
加することにより導電率をあまり低下させずに抵抗力お
よび可撓性を格段に向上せしめたものである。本発明に
おいて合金組成を上記のように限定した理由について述
べると、Crを0.0001〜0.5wt%としたのはCrはCr単体と
して道マトリックス中に微細に介在させることにより合
金の可撓性、抗張力を向上させる元素であるが0.0001wt
%未満ではその効果が小さく、また0.5wt%を越えると
粗大なCr析出物を形成し易くなり、上記の特性を低下さ
せるからである。Snを0.0001〜0.5wt%としたのは、こ
の元素は可撓性を向上させるものであるが0.0001wt%未
満ではその効果が少なく、0.5wt%を越えると導電性を
低下させるからである。That is, the present invention adds a small amount of Cr and Sn to Cu, as a sub-component, Zn, Mn, Mg, Fe, Ni, Al, Si, Co, C
a, Ti, Zr, V, Ag, Cd, Ga, Ge, In, As, Sb, Bi, B
By adding one kind or two kinds or more of e, P, Y, Nb, B, Te, etc., the resistance and flexibility are remarkably improved without significantly lowering the conductivity. In the present invention, the reason why the alloy composition is limited as described above is as follows. Cr is 0.0001 to 0.5 wt% because Cr is a Cr simple substance and is finely intervened in the matrix of the alloy. Is an element that improves
If it is less than 0.5%, the effect is small, and if it exceeds 0.5% by weight, coarse Cr precipitates are likely to be formed, and the above properties are deteriorated. The reason why Sn is 0.0001 to 0.5 wt% is that this element improves the flexibility, but if it is less than 0.0001 wt%, its effect is small, and if it exceeds 0.5 wt%, the conductivity is lowered.
また副成分としてのZn、Mn、Mg、Fe、Ni、Al、Si、Co、
Ca、Ti、Zr、V、Ag、Cd、Ga、Ge、In、As、Sb、Bi、B
e、P、Y、Nb、B、Teなどは脱酸、脱硫元素として働
くばかりでなく、抗張力および可撓性をより一層向上さ
せる作用がある0.0001wt%未満ではその効果がなく、単
独で0.3wt%、総計で0.5wt%を越えると導電率を低下さ
せる。In addition, Zn, Mn, Mg, Fe, Ni, Al, Si, Co as auxiliary components,
Ca, Ti, Zr, V, Ag, Cd, Ga, Ge, In, As, Sb, Bi, B
e, P, Y, Nb, B, Te, etc. not only act as deoxidizing and desulfurizing elements, but also have the effect of further improving tensile strength and flexibility. If the total amount exceeds 0.5 wt%, the conductivity will decrease.
また本発明における不可避不純物とは、通常の地金中に
含まれるもの或いは製造工程中に入る不純物を云うもの
で例えばAs、Sb、Bi、PbS、Fe、O2などであるが、この
中特にO2量とS量について規定したもので、O2を500ppm
以下としたのは、これを越えるとCrの粗大酸化物が生成
し易くなり、抗張力および可撓性を低下させ、また表面
粗化処理後の樹脂との密着性を悪くするからである。S
量を10ppm以下としたのは、これを越えるとSは結晶粒
界に濃化し易く、熱間圧延性を害し生産性を低下させ、
またCrとも粗大化合物を形成し易く特性が悪くなるため
である。なおO2、S以外の不純物については通常含まれ
る程度であれば何等差支えなく、As、Sb、Bi、Feなどの
本発明の副成分と重複するものは、上記の組成範囲で合
せて含有しせめれば副成分としての効果を発揮するもの
である。Further, the unavoidable impurities in the present invention refer to impurities contained in ordinary metal or impurities that enter into the manufacturing process, such as As, Sb, Bi, PbS, Fe, O 2 and the like. It specifies the amount of O 2 and S, and O 2 is 500ppm.
The reason for the above is that if it exceeds this value, a coarse Cr oxide is likely to be formed, the tensile strength and flexibility are lowered, and the adhesion to the resin after the surface roughening treatment is deteriorated. S
The amount is set to 10 ppm or less because if it exceeds this, S is likely to be concentrated in the crystal grain boundaries, impairing the hot rolling property and decreasing the productivity.
In addition, Cr is also likely to form a coarse compound, resulting in poor properties. It should be noted that impurities other than O 2 and S may be contained in any amount as long as they are usually contained, and those which overlap with the subordinate components of the present invention such as As, Sb, Bi and Fe are contained together in the above composition range. If it does, it will exert the effect as an accessory ingredient.
以下に本発明の一実施例について説明する。 An embodiment of the present invention will be described below.
第1表に示す本発明合金を溶解鋳造し、巾480mm、厚さ1
30mm、長さ2200mmの鋳塊を得た後850〜930℃の温度で熱
間圧延し厚さ12mmとし、冷却水により室温付近まで直ち
に冷却し、その後上下面を0.5mm面削後、0.5mm厚さまで
冷間圧延を行ない、非酸化性雰囲気中において480℃3
時間焼鈍し、さらに厚さ0.035mmに冷間圧延して供試材
とした。The alloys of the present invention shown in Table 1 were melt-cast to have a width of 480 mm and a thickness of 1
After obtaining an ingot with a length of 30 mm and a length of 2200 mm, it is hot rolled at a temperature of 850 to 930 ° C to a thickness of 12 mm and immediately cooled to around room temperature with cooling water. Cold rolled to the thickness of 480 ℃ 3 in non-oxidizing atmosphere
It was annealed for a period of time and cold-rolled to a thickness of 0.035 mm to obtain a test material.
また比較合金としてタフピッチ銅の巾480mm、厚さ130m
m、長さ2200の鋳塊を860℃の温度で熱間圧延し、その後
上下面を0.5m面削し、0.5mmまで冷間圧延を行ない非酸
化性雰囲気中で420℃3時間焼鈍し、0.0035mmまで冷間
圧延して供試材とした。As a comparative alloy, tough pitch copper has a width of 480 mm and a thickness of 130 m.
m, length 2200 ingots are hot-rolled at a temperature of 860 ° C, then the upper and lower surfaces are chamfered by 0.5m, cold-rolled to 0.5mm, and annealed at 420 ° C for 3 hours in a non-oxidizing atmosphere, It was cold-rolled to 0.0035 mm to obtain a test material.
上記の各供試材を本発明合金では500℃で、比較材は270
℃で焼鈍して焼鈍材とし、可撓性、抗張力、伸び、導電
率、密着性などの特性について測定した。可撓性につい
ては耐折強さ試験を、JIS P8115の方法により巾15mmの
供試材を用い500gfの荷重、曲率半径r=0.38mm、n=1
0として行ないその平均値を採用した。抗張力、導電率
については巾10mmの短冊状サンプルにより引張試験と電
気抵抗を測定して求めた。また樹脂との密着性について
は供試材表面をエッチングにより粗化した後、フェノー
ル基材と接着したものの、引き剥し強さを求めた。これ
らの結果を第2表−1および第2表−2に示した。なお
第2表−1は試験片の採取方向を圧延方向に平行に採取
したものであり、第2表−2は試験片の採取方向を圧延
方向に直角に採取したものである。 Each of the above-mentioned test materials was 500 ° C. for the alloy of the present invention, and 270 for the comparative material.
Annealing was performed at 0 ° C. to obtain an annealed material, and the characteristics such as flexibility, tensile strength, elongation, conductivity, and adhesion were measured. For flexibility, a folding endurance test was carried out according to JIS P8115 using a test material with a width of 15 mm, a load of 500 gf, a radius of curvature r = 0.38 mm, n = 1.
It was set as 0 and the average value was adopted. The tensile strength and the electrical conductivity were obtained by measuring the tensile test and the electrical resistance using a strip sample having a width of 10 mm. Regarding the adhesiveness to the resin, the peel strength was determined after the test material surface was roughened by etching and then adhered to the phenol substrate. The results are shown in Table 2 and Table 2. In addition, Table 2 shows the test pieces taken in the direction parallel to the rolling direction, and Table 2 shows the test pieces taken in the direction perpendicular to the rolling direction.
第1表および第2表から明らかなように本発明合金No.1
〜5は従来のタフピッチ銅No.6,7に比較して、導電率が
僅かに低下するが、抗張力、可撓性において格段に優
れ、引き剥し強さも著しく大きく、フレキシブルプリン
ト用として適していることが判る。それに対し比較材N
o.8はO2量が多いため特性が低下している。なお試料の
採取方向は圧延方向に直角方向が平行方向に比べ若干低
目であるが上記特性の傾向は全く同じである。 As is clear from Tables 1 and 2, the alloy No. 1 of the present invention
Compared to the conventional tough pitch copper Nos. 6 and 7, Nos. 5 to 5 have a slightly lower conductivity, but are significantly superior in tensile strength and flexibility, and also have significantly high peel strength, making them suitable for flexible printing. I understand. On the other hand, comparative material N
The characteristics of o.8 are degraded due to the large amount of O 2 . Although the direction of sampling the sample is slightly lower in the direction perpendicular to the rolling direction than in the parallel direction, the tendency of the above characteristics is exactly the same.
以上に説明したように本発明によれば、可撓性、導電
性、抗張力、密着性などに優れ、フレキシブルプリント
用として、またICテープキャリヤー用の基材としても適
するなど可撓性が要求される用途に適するもので、また
リジットプリント用としても有効であり、工業上顕著な
効果を発揮するものである。As described above, according to the present invention, flexibility is required, which is excellent in flexibility, conductivity, tensile strength, adhesion, etc. and is suitable for flexible printing and also as a base material for an IC tape carrier. It is also suitable for rigid printing and is also effective for rigid printing, and exhibits remarkable industrial effects.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭61−64837(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-61-64837 (JP, A)
Claims (1)
さらにZn、Mn、Mg、Fe、Ni、Al、Si、Co、Ca、Ti、Zr、
V、Ag、Cd、Ga、Ge、In、As、Sb、Bi、Be、P、Y、N
b、B、Teなどの1種または2種以上を単独で0.0001〜
0.3wt%、総計で0.0001〜0.5wt%含み、残部がCuと不可
避不純物とからなり、不可避不純物中O2量が500ppm以
下、S量が10ppm以下であることを特徴とするフレキシ
ブルプリント用銅合金。1. Cr 0.0001 to 0.5 wt%, Sn 0.0001 to 0.5 wt%,
Furthermore, Zn, Mn, Mg, Fe, Ni, Al, Si, Co, Ca, Ti, Zr,
V, Ag, Cd, Ga, Ge, In, As, Sb, Bi, Be, P, Y, N
b, B, Te and the like alone or in combination of two or more 0.0001 ~
Copper alloy for flexible printing characterized by containing 0.3 wt%, 0.0001 to 0.5 wt% in total, the balance consisting of Cu and inevitable impurities, O 2 content of 500 ppm or less and S content of 10 ppm or less in the unavoidable impurities. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14459987A JPH07109016B2 (en) | 1987-06-10 | 1987-06-10 | Copper alloy for flexible printing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14459987A JPH07109016B2 (en) | 1987-06-10 | 1987-06-10 | Copper alloy for flexible printing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63310930A JPS63310930A (en) | 1988-12-19 |
| JPH07109016B2 true JPH07109016B2 (en) | 1995-11-22 |
Family
ID=15365792
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14459987A Expired - Fee Related JPH07109016B2 (en) | 1987-06-10 | 1987-06-10 | Copper alloy for flexible printing |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07109016B2 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3856582B2 (en) * | 1998-11-17 | 2006-12-13 | 日鉱金属株式会社 | Rolled copper foil for flexible printed circuit board and method for producing the same |
| US6749699B2 (en) | 2000-08-09 | 2004-06-15 | Olin Corporation | Silver containing copper alloy |
| JP2003013156A (en) * | 2001-07-04 | 2003-01-15 | Nippon Mining & Metals Co Ltd | Copper alloy foil for laminates |
| KR100631041B1 (en) * | 2005-03-04 | 2006-10-04 | 주식회사 풍산 | Free cutting brass alloy with excellent machinability and machinability |
| EP2808419B1 (en) * | 2012-01-23 | 2016-08-31 | JX Nippon Mining & Metals Corporation | High-purity copper-manganese alloy sputtering target |
| CN105063413A (en) * | 2015-07-29 | 2015-11-18 | 温州银泰合金材料有限公司 | Copper-based electric contact material and manufacturing technology thereof |
-
1987
- 1987-06-10 JP JP14459987A patent/JPH07109016B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63310930A (en) | 1988-12-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |