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JPH07110974B2 - Method for producing directional silicon iron alloy ribbon - Google Patents
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JPH07110974B2 - Method for producing directional silicon iron alloy ribbon - Google Patents

Method for producing directional silicon iron alloy ribbon

Info

Publication number
JPH07110974B2
JPH07110974B2 JP62211997A JP21199787A JPH07110974B2 JP H07110974 B2 JPH07110974 B2 JP H07110974B2 JP 62211997 A JP62211997 A JP 62211997A JP 21199787 A JP21199787 A JP 21199787A JP H07110974 B2 JPH07110974 B2 JP H07110974B2
Authority
JP
Japan
Prior art keywords
rolling
heat treatment
cold rolling
iron alloy
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62211997A
Other languages
Japanese (ja)
Other versions
JPS6455339A (en
Inventor
清司 小嶋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
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Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP62211997A priority Critical patent/JPH07110974B2/en
Publication of JPS6455339A publication Critical patent/JPS6455339A/en
Publication of JPH07110974B2 publication Critical patent/JPH07110974B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Manufacturing Of Steel Electrode Plates (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、薄帯の圧延方向に磁化容易軸〔001〕を有す
る方向性珪素鉄合金薄帯の製造法に関するものである。
Description: TECHNICAL FIELD The present invention relates to a method for producing a directional silicon-iron alloy ribbon having an easy axis [001] in the rolling direction of the ribbon.

従来の技術 本発明に関わる薄帯は、炭素を必須元素とはしないの
で、鋼と称さずに鉄と称し、方向性珪素鉄合金薄帯とし
たが、本発明の従来技術分野にあって現在巾広く用いら
れているものは方向性珪素鋼帯と称されている。
2. Description of the Related Art Since the ribbon related to the present invention does not have carbon as an essential element, it is referred to as iron instead of steel, and is a directional silicon-iron alloy ribbon. The one widely used is called grain-oriented silicon steel strip.

方向性珪素鋼帯は、主として変圧器その他の電気器機の
鉄心として多量に使われているものである。
The grain-oriented silicon steel strip is mainly used in large amounts as an iron core for transformers and other electric appliances.

この方向性珪素鋼帯は、ゴス(Goss)方位、すなわち
(110)〔001〕方位の再結晶粒集合組織を有している。
すなわち、(110)結晶面が方向性珪素鋼板の板面に平
行で、かつ磁化容易軸〔001〕が圧延方向と一致してい
るので、圧延方向での励磁特性が極めて優秀でかつその
鉄損も少ない。
This grain-oriented silicon steel strip has a Goss orientation, that is, a (110) [001] orientation recrystallized grain texture.
That is, since the (110) crystal plane is parallel to the plate surface of the grain-oriented silicon steel sheet and the easy magnetization axis [001] coincides with the rolling direction, the excitation characteristics in the rolling direction are extremely excellent and the iron loss Also few.

現在、この方向性珪素鋼帯の製造法として用いられてい
る方法には、主として二回圧延法と一回圧延法とがあ
る。
At present, the methods currently used as the method for producing this grain-oriented silicon steel strip include mainly a double rolling method and a single rolling method.

二回圧延法は、方向性珪素鋼帯の製造法の基本方法であ
るGoss法を改良したもので、少し詳しくその製造法の概
略を述べる。まず製鋼により結晶粒成長抑制剤としてSb
とMnと、SまたはSeを添加し、分塊,熱間圧延によって
板厚2〜3mm程度まで薄くし、その後ノルマライジング
を行い、次いで圧下率約70%の一次冷間圧延し、850〜1
050℃で中間焼鈍し、圧下率60〜70%の二次冷間圧延を
行って最終板厚0.3mmにし、800〜850℃で脱炭焼鈍し、8
00〜920℃で5〜50時間処理して二次再結晶粒を発生、
成長させ、そののち1100℃以上で約20時間の長時間純化
焼鈍して圧延方向に(110)〔001〕結晶粒を成長させ
て、0.3mm程度の鋼帯を作る方法である(的場他;川崎
製鉄技報vol.7 No.2(1975)P175〜188、今中他;特公
昭51−13469号公報)。
The double rolling method is an improved version of the Goss method, which is the basic method for manufacturing grain-oriented silicon steel, and the manufacturing method will be outlined in some detail. First, Sb was used as a grain growth inhibitor in steelmaking.
And Mn and S or Se are added, the thickness is reduced to about 2 to 3 mm by slabbing and hot rolling, then normalizing is performed, then primary cold rolling is performed at a rolling reduction of about 70%, and 850-1
Intermediate annealing at 050 ℃, secondary cold rolling with a reduction of 60 to 70% to a final plate thickness of 0.3 mm, decarburization annealing at 800 to 850 ℃, 8
Generate secondary recrystallized grains by treating at 00-920 ℃ for 5-50 hours,
This is a method of growing and then purifying annealing at 1100 ° C or higher for about 20 hours for a long time to grow (110) [001] crystal grains in the rolling direction to make a steel strip of about 0.3 mm (Matoba et al. Kawasaki Steel Technical Report vol.7 No.2 (1975) P175-188, Nakanaka et al., Japanese Patent Publication No. 51-13469).

また、一回圧延方は、製鋼により結晶粒成長抑制剤とし
てAl,Nを添加し、分塊,熱間圧延によって約2.3mmの板
厚に薄くし、次いでAlN析出焼鈍をし、次に圧下率81〜9
5%の強冷間圧延を行って最終板厚約0.3mmにし、脱炭焼
鈍し、約1200℃で約20時間仕上焼鈍して、前記二回圧延
法と同様の鋼帯を作る方法である(電気学会技術報告
(II部)第85号(昭和54年)P.8〜10,田口他;特公昭40
−15644号公報)。
In the one-time rolling method, Al and N are added as grain growth inhibitors by steelmaking, thinned to a plate thickness of about 2.3 mm by slabbing and hot rolling, then AlN precipitation annealing, and then rolling. Rate 81-9
It is a method of making a steel strip similar to the double rolling method by performing 5% strong cold rolling to a final plate thickness of about 0.3 mm, decarburizing annealing, and finish annealing at about 1200 ° C for about 20 hours. (Technical Report of the Institute of Electrical Engineers of Japan (Part II) No. 85 (1979) P.8-10, Taguchi et al.
-15644 publication).

以上のように、上記の方法は共に結晶粒成長抑制剤を添
加し、固溶させて熱間圧延後においてMnSやAlN等として
析出分散させ最終の仕上焼鈍において一次再結晶粒の成
長を抑制してその間に二次再結晶粒(110)〔001〕の成
長を促進させて圧延方向に(110)〔001〕再結晶粒集合
組織を作る方法である。
As described above, both of the above methods add a crystal grain growth inhibitor, form a solid solution and precipitate and disperse as MnS or AlN after hot rolling to suppress the growth of primary recrystallized grains in the final finish annealing. In the meantime, the secondary recrystallized grains (110) [001] are promoted to grow to form a (110) [001] recrystallized grain texture in the rolling direction.

発明が解決しようとする問題点 上述のように従来の方法は、結晶粒成長抑制剤の添加を
基本とした方法であって、この結晶粒成長抑制剤の効果
を最大限引き出すために製造法の条件が決められてお
り、このため複雑で厳密な条件が製造に課せられてい
て、コスト高となっている。
Problems to be Solved by the Invention As described above, the conventional method is a method based on the addition of a crystal grain growth inhibitor, and the production method is used to maximize the effect of the crystal grain growth inhibitor. The conditions are fixed, and therefore complicated and strict conditions are imposed on the manufacturing, resulting in high cost.

また、ユーザから低鉄損化の強い要望が出されており、
これに対して板厚を薄くすると鉄損のうちの渦電流損を
下げることができることが明らかになっているが、しか
しながら、従来の方法では板厚を薄くしていくと(11
0)〔001〕方位の集積度を高めることが難しくなって、
これによってかえって鉄損が増大するという結果にな
り、このため0.2mm厚さ程度が従来法では工業的な限界
であるとされており、0.2mm以下の薄帯では、鉄損や磁
束密度において、十分満足される磁気特性を得ることが
できなかった。
In addition, there is a strong demand from the users to reduce iron loss,
On the other hand, it has been clarified that the eddy current loss of iron loss can be reduced by reducing the plate thickness. However, when the plate thickness is reduced by the conventional method (11
0) It becomes difficult to increase the degree of integration in the [001] direction,
This results in an increase in iron loss, and for this reason a thickness of about 0.2 mm is said to be the industrial limit in the conventional method, and in a ribbon of 0.2 mm or less, in iron loss and magnetic flux density, It was not possible to obtain sufficiently satisfactory magnetic properties.

最近、従来の珪素鋼帯とは異なった製造法,すなわち急
速冷却凝固法が開発されつつある。この方法は、回転し
ている冷たい双ロール又はは単ロールに溶湯を吹さつけ
て、極めて短時間に冷却凝固させて、無方向の結晶質や
非晶質の極薄帯(おおよそ0.03〜0.09mmの厚さ)を作る
方法である。
Recently, a manufacturing method different from the conventional silicon steel strip, that is, a rapid cooling solidification method is being developed. This method involves spraying the molten metal onto a rotating cold twin roll or single roll, cooling and solidifying in an extremely short time, and then producing an ultrathin ribbon (approximately 0.03 to 0.09 mm thickness).

しかしこの方法は、均一な品質を得るには極めて速い冷
却速度を制御する高度な技術と装置の開発が必要でその
ため生産コストが高くなるという欠点を有している。
However, this method has a drawback in that it requires a high technology and a device for controlling an extremely high cooling rate to obtain uniform quality, which results in a high production cost.

本発明の目的は、前述したような従来技術の問題点を解
消し、低コストで、かつ板厚を薄くして低鉄損の特性を
有する方向性珪素鉄合金薄帯の製造法を提供することに
ある。
An object of the present invention is to solve the above-mentioned problems of the prior art and to provide a method for producing a grain-oriented silicon-iron alloy ribbon which has low iron loss characteristics at low cost and thin plate thickness. Especially.

問題点を解決するための手段 前述の目的を達成するために、本発明は、2.5〜4重量
%の珪素と残部鉄よりなる珪素鉄合金の板材を冷間圧延
して中間材とする第一次冷間圧延工程と、前記中間材を
熱処理し再結晶組織を有する熱処理材とする第一次熱処
理工程と、前記熱処理材を第一次冷間圧延工程における
圧延方向と同じ方向に圧下率70〜80%の冷間圧延を行い
0.2mm以下の厚さの冷間圧延薄帯とする第二次冷間圧延
工程と、前記冷間圧延薄帯を1180℃以上で熱処理して圧
延方向に(110)〔001〕方位をとる結晶粒を主とする再
結晶粒集合組織を有する薄帯とする第二次熱処理工程と
を少なくとも経由することを特徴としている。
Means for Solving the Problems In order to achieve the above-mentioned object, the present invention provides a first method in which a plate material of a silicon-iron alloy composed of 2.5 to 4% by weight of silicon and the balance iron is cold-rolled into an intermediate material. Next cold rolling step, a primary heat treatment step of heat treating the intermediate material to a heat treated material having a recrystallized structure, and a reduction ratio of 70 in the same direction as the rolling direction in the primary cold rolling step. ~ 80% cold rolling
Secondary cold rolling step to make a cold-rolled ribbon having a thickness of 0.2 mm or less, and a crystal having a (110) [001] orientation in the rolling direction by heat-treating the cold-rolled ribbon at 1180 ° C or more. It is characterized in that at least the second heat treatment step of forming a ribbon having a recrystallized grain texture mainly composed of grains is performed.

作 用 上記方法とすることにより、簡単な工程でしかも短時間
に高特性な方向性珪素鉄合金薄帯を得ることができる。
Operation With the above method, it is possible to obtain a highly oriented grain-oriented silicon iron alloy ribbon in a simple process and in a short time.

実施例 本発明は、0.2mm以下の薄帯において、Goss方位の再結
晶粒集合組織を実現させようと試行錯誤を繰り返した中
から開発されたもので、特別に限定された作成条件にお
いてのみ可能なものである。すなわち、合金には結晶粒
成長抑制剤を添加せず、所定の厚さにまで薄くするため
に冷間圧延した板材(中間材)を熱処理(第一次)によ
って再結晶組織にしたあと、特別の狭い圧下率70〜80%
で冷間圧延を行って0.2mm以下の厚さの薄帯とし、これ
を1180℃以上で熱処理(第二次)することによって、
(110)〔001〕方位の再結晶粒集合組織を実現したもの
である。
Example The present invention was developed from repeated trial and error in order to realize a Goss-oriented recrystallized grain texture in a ribbon of 0.2 mm or less, and is possible only under specially limited production conditions. It is something. That is, the grain growth inhibitor was not added to the alloy, and the cold rolled sheet material (intermediate material) was made into a special recrystallized structure by heat treatment (primary) to reduce the thickness to a prescribed thickness. Narrow rolling reduction of 70-80%
By cold-rolling at 0.2mm or less to form a thin strip, and heat-treating this at 1180 ℃ or higher (secondary),
A recrystallized grain texture of (110) [001] orientation is realized.

組成及び各工程について以下にさらに詳しく述べる。The composition and each step will be described in more detail below.

本発明の第一の特徴は組成にある。従来の方向性珪素鋼
板は結晶粒成長抑制剤を添加し、その組成を細かく規定
しているが、本発明はこの結晶粒成長抑制剤を必要とし
ない。本発明に関わる珪素鉄合金の組成は2.5〜4重量
%の珪素と残部が鉄損と不可避な不純物とからなる。珪
素量は2.5重量%より少ない場合には電気抵抗が低く渦
電流損が大きくなって鉄損が増大して不利であり、また
4重量%を越すと冷間圧延の際に脆性割れが生じて不良
が多くなって不利である。また不純物は析出物や介在物
の状態になると第二次熱処理工程において(110)〔00
1〕結晶粒の成長を阻害するのでできるだけ少ない方が
好ましいが、現在の製鉄技術において不可避な不純物は
許容される。
The first characteristic of the present invention is the composition. The conventional grain-oriented silicon steel sheet has a grain growth inhibitor added thereto and its composition is finely regulated, but the present invention does not require this grain growth inhibitor. The composition of the silicon-iron alloy according to the present invention is composed of 2.5 to 4% by weight of silicon, the balance being iron loss and unavoidable impurities. When the amount of silicon is less than 2.5% by weight, the electric resistance is low and the eddy current loss is large, and the iron loss is increased, which is disadvantageous. When the amount of silicon exceeds 4% by weight, brittle cracking occurs during cold rolling. There are many defects, which is a disadvantage. When impurities become precipitates or inclusions, they are (110) [00
1) It is preferable that the amount is as small as possible because it inhibits the growth of crystal grains, but inevitable impurities are tolerated in the current ironmaking technology.

次に第一次冷間圧延工程は、次の第一次熱処理工程に供
する中間材としての所定の厚さにまで圧延するための工
程である。最終の薄帯の厚さを得るためには、第一次冷
間圧延工程では1.0mm以下にする必要がある。
Next, the primary cold rolling step is a step for rolling to a predetermined thickness as an intermediate material to be subjected to the next primary heat treatment step. In order to obtain the final thickness of the ribbon, it is necessary to make it 1.0 mm or less in the primary cold rolling process.

この第一次圧延工程に供する板材は、鋳塊から切り出さ
れた板材、又は分塊,熱間圧延された板材であるが、連
続鋳造熱間圧延により作られた板材や半溶融加工により
作られた板材などでも良い。
The plate material used in this primary rolling step is a plate material cut from an ingot, or a slab or a hot rolled plate material, but a plate material produced by continuous casting hot rolling or a semi-melting process. It may be a plate material.

次に第一次熱処理工程は、第一次冷間圧延工程で冷間圧
延された中間材を正常粒組織に再結晶化させることを目
的としており、その温度は再結晶化が始まる温度以上で
あれば良い。処理時間を考慮すると950℃以上であり、
短時間で、たとえば1時間で処理を終えようとする場合
は1100℃付近が好ましい。
Next, the primary heat treatment step is intended to recrystallize the intermediate material cold-rolled in the primary cold rolling step into a normal grain structure, and the temperature is higher than the temperature at which recrystallization starts. I wish I had it. Considering the processing time, it is 950 ℃ or higher,
When the treatment is to be completed in a short time, for example, 1 hour, the temperature is preferably around 1100 ° C.

次に第二次冷間圧延工程では、この工程での冷間圧延の
圧下率によって第二次熱処理工程で(110)〔001〕方位
の結晶粒が成長するか否かが決定される。従来から、結
晶粒成当抑制剤なしでは(110)〔001〕方位の結晶粒を
圧延方向に成長させるのは難しいとされてきた。本発明
者は板厚の薄い薄帯の分野において検討した結果、0.2m
m以下の場合に70〜80%の圧下率で冷間圧延して、次の
第二次熱処理工程の熱処理により(110)〔001〕方位の
結晶粒を圧延方向に成長させることができることを見い
出した。すなわち圧下率70〜80%の冷間圧延した場合に
は次の第二次熱処理工程の熱処理により、(110)〔00
1〕方位の結晶が成長し、(110)〔001〕方位の結晶粒
の全板面積を占める割合がほぼ100%近くなり、磁気特
性のB8(磁化力が800A/Tでの磁束密度)は1.8T以上とな
る。圧延率が70%に達しない場合、又は80%を越える場
合には、70〜80%の範囲から外れる度合が大きくなるに
従って(110)〔001〕方位結晶粒の全板面積に占める割
合が低下し、B8は低下して1.8T以下となる。
Next, in the secondary cold rolling step, it is determined whether or not crystal grains of (110) [001] orientation grow in the secondary heat treatment step depending on the reduction ratio of the cold rolling in this step. Conventionally, it has been considered difficult to grow crystal grains in the (110) [001] orientation in the rolling direction without a grain grain straightening inhibitor. The present inventor has studied in the field of thin strips, and as a result, 0.2 m
It was found that cold rolling with 70 to 80% rolling reduction in the case of m or less, and grain growth of (110) [001] orientation can be grown in the rolling direction by the heat treatment of the next secondary heat treatment step. It was That is, when cold rolling with a reduction rate of 70 to 80%, the following heat treatment in the second heat treatment step causes (110) [00
The crystal of 1] orientation grows, and the ratio of the crystal grains of (110) [001] orientation occupying almost 100% of the total plate area, and the magnetic property of B 8 (magnetic flux density at a magnetizing force of 800 A / T) Is over 1.8T. If the rolling rate does not reach 70% or exceeds 80%, the proportion of (110) [001] oriented crystal grains in the total plate area decreases as the degree of deviation from the range of 70-80% increases. However, B 8 drops to 1.8T or less.

又この第二次冷間圧延工程において重要なことは、その
圧延方向が、第一次冷間圧延工程での圧延方向と同一で
なければならないことである。ただし、ロール間をパス
させて圧延する際に初回のパスにおいて180゜逆方向に
してもかまわない。
What is important in this secondary cold rolling process is that the rolling direction must be the same as the rolling direction in the primary cold rolling process. However, when rolling between the rolls, the rolls may be rotated 180 ° in the first pass.

第一次での圧延方向から傾けて圧延することは、(11
0)〔001〕方位結晶粒の圧延方向に対する集積度を低下
させることになり好ましくない。
Rolling with an inclination from the rolling direction in the primary
0) The degree of integration of [001] oriented crystal grains in the rolling direction is reduced, which is not preferable.

又この工程における圧延は唯1回ロール間をパスさせて
一挙に70〜80%の圧下率を達成するのが磁気特性におい
て、又工程の簡素化において望ましいが、複数回のパス
により合計して70〜80%の圧下率に達しても良い。しか
しこの場合に途中において圧延方向を180゜逆にするこ
とは(110)〔001〕方位結晶粒の圧延方向に対する集積
度や全板面積に占める割合を低下させることになり好ま
しくない。又偏って圧延し、圧延薄帯が板面と同一面に
おいて左右に曲がることは集積度の低下を招くことにな
り好ましくない。
In addition, it is desirable for rolling in this process to pass between the rolls only once to achieve a reduction rate of 70 to 80% at once, in terms of magnetic characteristics and in the simplification of the process, but it is possible to make a total of multiple passes. The reduction rate of 70-80% may be reached. However, in this case, reversing the rolling direction by 180 ° is not preferable because it reduces the degree of integration of (110) [001] oriented crystal grains in the rolling direction and the ratio of the total plate area. Further, it is not preferable that the rolled strip is bent unevenly and the rolled strip bends leftward and rightward on the same plane as the plate surface, because it causes a decrease in the degree of integration.

圧延に供する第一次熱処理工程を経た熱処理材は、酸化
膜が付着している場合は酸洗いなどにより酸化膜を取り
除いておく方が好ましい。また圧延機のロール表面は脱
脂して清浄にし、無潤滑で圧延した場合に良い磁気特性
のものが得られる。
When the oxide film adheres to the heat-treated material that has been subjected to the first heat treatment step for rolling, it is preferable to remove the oxide film by pickling. Further, the roll surface of the rolling mill is degreased to be clean, and when it is rolled without lubrication, it has good magnetic properties.

次に第二次熱処理工程では、熱処理温度は1180℃以上
で、処理時間を考慮すると1250℃付近が好ましい。たと
えば真空中で1160℃の温度で6時間保持しても(110)
〔001〕方位の結晶粒の成長は起らず磁化力が800A/mで
の磁束密度B8は1.48Tであり、光学顕微鏡により組織を
観察したところ正常粒の再結晶組織であったが、真空中
で1250℃の温度で処理した場合には、保持時間2時間で
B8=1.85Tとなり、(110)〔001〕方位の結晶粒が冷間
圧延方向にほぼ揃っていた。
Next, in the second heat treatment step, the heat treatment temperature is preferably 1180 ° C. or higher, and considering treatment time, it is preferably around 1250 ° C. For example, even if held at a temperature of 1160 ℃ in vacuum for 6 hours (110)
The growth of crystal grains in the (001) orientation did not occur, and the magnetic flux density B 8 at a magnetic force of 800 A / m was 1.48 T, and when the structure was observed by an optical microscope, it was a recrystallized structure of normal grains, When treated in vacuum at a temperature of 1250 ° C, the holding time is 2 hours.
B 8 = 1.85T, and the crystal grains of (110) [001] orientation were almost aligned in the cold rolling direction.

また1180℃以上の処理温度にまで冷間圧延薄帯の温度を
上げる昇温時において、1100〜1150℃の温度区間を10〜
60分間かけて経由させるか、またはこの温度区間で10〜
60分間保持した後、1180℃以上の所定の温度に上げて熱
処理すると、(110)〔001〕方位の結晶粒の圧延方向に
対する集積度が向上した。
In addition, when the temperature of the cold-rolled ribbon is raised to a processing temperature of 1180 ° C or higher, the temperature range of 1100 to 1150 ° C is 10 to 10 ° C.
Over 60 minutes, or 10 ~ in this temperature range
After holding for 60 minutes, heat treatment at a predetermined temperature of 1180 ° C or higher improved the degree of integration of (110) [001] crystal grains in the rolling direction.

また熱処理時の雰囲気が真空中以外に、不活性ガス中、
または水素ガス中、または水素窒素混合ガス中の場合に
おいても(110)〔001〕方位の結晶粒成長が生じた。
Also, the atmosphere during heat treatment is not in vacuum, but in an inert gas,
Also, in the hydrogen gas or the hydrogen-nitrogen mixed gas, the grain growth in the (110) [001] orientation occurred.

以上のように、本発明は従来の製造法とは異なり、結晶
粒成長抑制剤を用いない方法であり、そのために、従来
の製造法では(110)〔001〕方位の再結晶粒集合組織を
作ることの難しかった0.2mm以下の厚さの薄帯の分野に
おいて、新しく見い出した冷間圧延条件と熱処理条件に
より(110)〔001〕方位の再結晶粒集合組織を作ること
ができるようになったものである。
As described above, the present invention is a method that does not use a grain growth inhibitor, unlike the conventional manufacturing method, and therefore, in the conventional manufacturing method, a recrystallized grain texture of (110) [001] orientation is obtained. In the field of ribbons with a thickness of 0.2 mm or less, which was difficult to make, the newly found cold rolling conditions and heat treatment conditions will allow the formation of a (110) [001] oriented recrystallized grain texture. It is a thing.

(110)〔001〕方位の結晶粒が既に記した条件の下にお
いて圧延方向に選択的に成長する原因は現在明らかでは
ないが、要因のひとつとして、結晶粒成長抑制剤を用い
ていないことが挙げられる。このため、介在物や析出物
がなくて比較的高温ではあるが短時間に(110)〔001〕
方位の結晶粒が成長することができるようになったと考
えられる。また要因のひとつとして薄帯の厚さが0.2mm
以下と薄いことが挙げられる。このために、再結晶粒成
長の駆動エネルギーが粒界エネルギーよりは表面エネル
ギーが支配的となり、表面エネルギーが一番低い(11
0)面が薄帯の板面に平行に現われて成長しやすくなっ
ていると考えられる。
The cause of selective growth of the (110) [001] crystal grains in the rolling direction under the conditions already described is not clear at present, but one of the factors is that the grain growth inhibitor is not used. Can be mentioned. For this reason, it is relatively hot without inclusions and precipitates, but (110) [001]
It is considered that the crystal grains in the orientation can grow. Also, as one of the factors, the thickness of the ribbon is 0.2 mm
The following are thin. For this reason, the driving energy for recrystallized grain growth is dominated by surface energy rather than grain boundary energy, and the surface energy is the lowest (11
It is considered that the (0) plane appears parallel to the plate surface of the ribbon and that it is easy to grow.

このように、本発明では結晶粒成長抑制剤を用いていな
いので製造条件、とくに熱処理条件が単純かつ短時間と
なって製造コストを引き下げることが可能となってい
る。また従来に比べて薄帯の板厚が薄いため、渦電流損
を下げることができ、低鉄損の優れた磁気特性を有する
薄帯を作ることができる。
As described above, in the present invention, since the grain growth inhibitor is not used, the manufacturing conditions, especially the heat treatment conditions are simple and short, and the manufacturing cost can be reduced. Further, since the thickness of the ribbon is smaller than that of the conventional one, the eddy current loss can be reduced, and the ribbon having excellent magnetic characteristics with low iron loss can be manufactured.

以下実施例にて具体的に説明する。Specific examples will be described below.

〔実施例1〕 99.9重量%の電解鉄と99.999重量%のシリコンを配合
し、高周波誘導加熱にて溶解鋳造して、3.5重量%の珪
素残部鉄と不可避な不純物の珪素鉄合金を作成した。こ
の鋳造体から厚さ1.9mmの板材を切り出し、冷間圧延に
より0.41mmの厚さにし、1100℃1時間の熱処理を真空中
にて行った。次いでこの熱処理を済ませた板材を、圧延
機のロール表面を脱脂して清浄にした後、潤滑剤なしで
前回の冷間圧延と同方向に圧下率80%の冷間圧延して82
μmの厚さの薄帯にし、真空中にて1220℃で4時間熱処
理した。この熱処理を終った薄帯をB−Hループトレー
サにて、圧延方向における磁気特性を測定したところ、
磁化力800A/mにおける磁束密度B8は1.88Tであった。又
周波数50Hzでの鉄損を測定したところ、最高磁束密度1.
7Tでの鉄損値W17/50は0.95w/kgであった。
[Example 1] 99.9% by weight of electrolytic iron and 99.999% by weight of silicon were blended and melt-cast by high frequency induction heating to prepare 3.5% by weight of silicon residual iron and unavoidable impurities of silicon-iron alloy. A plate material having a thickness of 1.9 mm was cut out from the cast body, cold rolled to a thickness of 0.41 mm, and heat-treated at 1100 ° C. for 1 hour in vacuum. Next, after degreasing the roll surface of the rolling mill to clean this heat-treated plate material, cold rolling with a rolling reduction of 80% in the same direction as the previous cold rolling without lubricant was performed.
A thin strip having a thickness of μm was formed and heat-treated in vacuum at 1220 ° C. for 4 hours. The magnetic properties in the rolling direction of the ribbon after the heat treatment were measured with a BH loop tracer.
The magnetic flux density B 8 at a magnetizing force of 800 A / m was 1.88T. The maximum magnetic flux density was 1.
The iron loss value W 17/50 at 7T was 0.95 w / kg.

〔実施例2〕 99.9重量%の電解鉄と99.999重量%のシリコンを配合
し、高周波誘導加熱にて溶解鋳造して、2.9重量%の珪
素残部鉄と不可避な不純物の珪素鉄合金を作成した。こ
の鋳造体から厚さ1.7mmの板材を切り出し、冷間圧延に
より0.63mmの厚さにし、1070℃にて1時間アルゴンガス
中にて熱処理した。板材の表面が酸化され変色していた
ので酸洗いをして酸化膜を除去し、圧延機のロール表面
をアセトンを含ませたガーゼにて拭き脱脂して清浄にし
た後、無潤滑で前回の冷間圧延と同方向に圧下率75%の
冷間圧延を行って148μmの薄帯とした。この薄帯を水
素40%窒素60%の混合ガス気流中で1380℃で3時間保持
して熱処理した。ただしこの場合の温度計測は、二重磁
性管の外側でかつヒータに近い場所で行った。試料の薄
帯は二重磁性管の内側に置いてあり、又水素窒素混合ガ
スを流しているため、正確な薄帯の温度は測定できてい
ないが、前記の炉の表示温度1380℃よりは低めの温度と
なっていると推定される。
[Example 2] 99.9% by weight of electrolytic iron and 99.999% by weight of silicon were blended and melt-cast by high frequency induction heating to prepare 2.9% by weight of silicon residual iron and unavoidable impurities of silicon-iron alloy. A plate material having a thickness of 1.7 mm was cut out from the cast body, cold rolled to a thickness of 0.63 mm, and heat-treated at 1070 ° C. for 1 hour in an argon gas. Since the surface of the plate material was oxidized and discolored, it was pickled to remove the oxide film, and the roll surface of the rolling mill was wiped with gauze containing acetone to clean it, and then it was cleaned without lubrication. Cold rolling was carried out in the same direction as cold rolling at a rolling reduction of 75% to obtain a strip of 148 μm. This ribbon was heat-treated by holding it at 1380 ° C. for 3 hours in a mixed gas stream of hydrogen 40% and nitrogen 60%. However, the temperature measurement in this case was performed outside the double magnetic tube and near the heater. Since the ribbon of the sample is placed inside the double magnetic tube and the hydrogen-nitrogen mixed gas is flowing, the temperature of the ribbon cannot be measured accurately, but the temperature indicated by the furnace is higher than 1380 ℃. It is estimated that the temperature is low.

熱処理後、圧延方向における磁気特性はB8=1.91T,W
17/50=0.92w/kgであった。
After heat treatment, the magnetic property in the rolling direction is B 8 = 1.91T, W
It was 17/50 = 0.92 w / kg.

〔実施例3〕 実施例2の珪素鉄合金の鋳造体から厚さ1.5mmの板材を
切り出し、冷間圧延により0.40mmの厚さにし、真空中に
て1100℃で1時間熱処理し、次いで圧延機のロール表面
を脱脂して清浄にしてから無潤滑で、前回の冷間圧延と
同方向に圧下率71%の冷間圧延をして116μmの薄帯と
した。次いで真空中にて熱処理した。昇温時に1100〜11
50℃の温度区間で30分間保持した後1250℃に上げて2時
間保持し、室温まで冷却した。この薄帯の圧延方向にお
ける磁気特性は、B8=1.92TでW17/50=0.84w/kgで優れ
た鉄損特性であった。
[Example 3] A plate material having a thickness of 1.5 mm was cut out from the cast body of the silicon-iron alloy of Example 2, cold-rolled to a thickness of 0.40 mm, heat-treated at 1100 ° C for 1 hour in vacuum, and then rolled. After degreasing the roll surface of the machine to clean it, it was unlubricated and then cold-rolled with a rolling reduction of 71% in the same direction as the previous cold-rolling to obtain a ribbon of 116 μm. Then, heat treatment was performed in vacuum. 1100 ~ 11 at temperature rise
The temperature was maintained at 50 ° C for 30 minutes, then raised to 1250 ° C, maintained for 2 hours, and cooled to room temperature. The magnetic properties of this ribbon in the rolling direction were B 8 = 1.92T and W 17/50 = 0.84w / kg, which were excellent iron loss properties.

〔実施例4〕 99.9重量%の電解鉄と99.999重量%のシリコンを配合し
て溶解し、3.3重量%珪素残部鉄と不可避な不純物の珪
素鉄合金を作成した。この鋳造体をアルゴンガス中にて
約1200℃に加熱した後、熱間圧延を行い、2.5mmの板厚
にした。熱間圧延後は室温まで徐冷した。酸洗いにより
酸化膜を除去して、冷間圧延により0.5mmにし、水素窒
素混合ガス中にて1100℃で1時間熱処理した。そのあ
と、圧延機のロール表面を清浄にしたのち、この熱処理
済の0.5mmの板材を前回と冷間圧延と同方向に圧下率76
%の冷間圧延を行い120μmの薄帯にした。この薄帯を
実施例2で使用した二重磁性管の炉において1360℃で4
時間の熱処理をした。雰囲気は水素窒素混合ガス気流中
で、特に昇温時には窒素量を多くし、1360℃一定温度に
おいては、水素量を多くした。この熱処理後の薄帯の磁
気特性はB8=1.90T,W17/50=0.96w/kgであった。
[Example 4] 99.9% by weight of electrolytic iron and 99.999% by weight of silicon were blended and melted to form a 3.3% by weight silicon balance iron and an unavoidable impurity silicon-iron alloy. This cast body was heated to about 1200 ° C. in argon gas and then hot-rolled to a plate thickness of 2.5 mm. After hot rolling, it was gradually cooled to room temperature. The oxide film was removed by pickling, the thickness was 0.5 mm by cold rolling, and heat treatment was performed at 1100 ° C. for 1 hour in a hydrogen-nitrogen mixed gas. After that, after cleaning the roll surface of the rolling mill, this heat-treated 0.5 mm plate material was rolled down in the same direction as the previous time and cold rolling by 76%.
% Cold-rolled into 120 μm thin strips. This ribbon was heated at 1360 ° C. in the double magnetic tube furnace used in Example 2
Heat treated for hours. In the atmosphere of hydrogen-nitrogen mixed gas, the amount of nitrogen was increased especially when the temperature was raised, and the amount of hydrogen was increased at a constant temperature of 1360 ° C. The magnetic properties of the ribbon after this heat treatment were B 8 = 1.90 T and W 17/50 = 0.96 w / kg.

発明の効果 以上のように、本発明は、2.5〜4重量%の珪素と残部
鉄からなる珪素鉄合金の板材を冷間圧延して所定の厚さ
の中間材とする第一次冷間圧延工程と、前記中間材を熱
処理して再結晶組織の熱処理材とする第一次熱処理工程
と、前記熱処理材を第一次冷間圧延工程における圧延方
向と同じ方向に圧下率70〜80%の冷間圧延を行い、0.2m
m以下の厚さの冷間圧延薄帯とする第二次冷間圧延工程
と、前記冷間圧延薄帯を1180℃以上で熱処理して、圧延
方向に(110)〔001〕方位をとる結晶粒を主とする再結
晶粒集合組織を有する薄帯とする第二次熱処理工程とを
少なくとも経由することを特徴とする方向性珪素鉄合金
薄帯の製造法で、従来の結晶粒成長抑制剤を用いた方法
と比較して、格段に簡単な工程で、たとえば仕上焼鈍す
なわち第二次熱処理工程の熱処理は、その処理時間が従
来のおおよそ20時間に対して約1/5〜1/10の2〜4時間
に短縮できる製造法であり、低コスト化のできる製造法
である。また、従来困難であった0.2mm以下の薄帯で磁
束密度を低下させることなく、鉄損値を表面コーティン
グなしでかつ磁区細分化技術を施こさない状態でW
17/50を1.0w/kg以下にすることができ、高特性で低コス
トの方向性珪素鉄合金薄帯を提供することのできる製造
方法である。
EFFECTS OF THE INVENTION As described above, the present invention is a primary cold rolling method in which a plate material of a silicon-iron alloy composed of 2.5 to 4% by weight of silicon and the balance iron is cold-rolled into an intermediate material having a predetermined thickness. Step, a primary heat treatment step of heat-treating the intermediate material to be a heat-treated material of a recrystallized structure, and a reduction ratio of 70 to 80% in the same direction as the rolling direction in the primary cold rolling step of the heat-treated material. Cold rolled to 0.2 m
A secondary cold rolling step to form a cold-rolled strip having a thickness of m or less, and a heat treatment of the cold-rolled strip at 1180 ° C. or higher, and a crystal having a (110) [001] orientation in the rolling direction. A method for producing a directional silicon-iron alloy ribbon, which comprises at least a second heat treatment step of forming a ribbon having a recrystallized grain texture mainly composed of grains, by using a conventional grain growth inhibitor. Compared with the method using, the heat treatment of, for example, finish annealing, i.e., the second heat treatment step, is a remarkably simple process, and the treatment time is about 1/5 to 1/10 of the conventional time of about 20 hours. It is a manufacturing method that can be shortened to 2 to 4 hours, and a manufacturing method that can reduce costs. In addition, it has been possible to reduce the magnetic flux density in a ribbon of 0.2 mm or less, which has been difficult in the past, to reduce the iron loss value without surface coating and without applying domain refinement technology.
17/50 can be 1.0 w / kg or less, and it is a manufacturing method capable of providing a high-performance, low-cost oriented silicon iron alloy ribbon.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】珪素2.5〜4重量%、残部鉄よりなる珪素
鉄合金の板材を冷間圧延して中間材とする第一次冷間圧
延工程と、前記中間材を熱処理し再結晶組織を有する熱
処理材とする第一次熱処理工程と、前記熱処理材を第一
次冷間圧延工程における圧延方向と同じ方向に圧下率70
〜80%の冷間圧延を行い、0.2mm以下の厚さの冷間圧延
薄帯とする第二次冷間圧延工程と、前記冷間圧延薄帯を
1180℃以上で熱処理して、圧延方向に(110)〔001〕方
位をとる結晶粒を主とする再結晶粒集合組織を有する薄
帯とする第二次熱処理工程とを少なくとも経由すること
を特徴とする方向性珪素鉄合金薄帯の製造法。
1. A primary cold rolling step of cold-rolling a sheet material of a silicon-iron alloy consisting of 2.5 to 4% by weight of silicon and the balance iron to form an intermediate material, and heat-treating the intermediate material to form a recrystallized structure. The first heat treatment step to be a heat treatment material having, and the reduction ratio 70 in the same direction as the rolling direction in the first cold rolling step of the heat treatment material.
~ 80% cold rolling, the secondary cold rolling step to make a cold rolling strip with a thickness of 0.2 mm or less, and the cold rolling strip
Characterized by at least passing through a second heat treatment step of heat treatment at 1180 ° C. or higher, and a ribbon having a recrystallized grain texture mainly composed of crystal grains having a (110) [001] orientation in the rolling direction. And a method for producing a directional silicon-iron alloy ribbon.
【請求項2】第一次及び第二次熱処理工程において、熱
処理を真空中、または不活性ガス中、または水素ガス
中、または水素と窒素の混合ガス中にて行うことを特徴
とする特許請求の範囲第1項記載の方向性珪素鉄合金薄
帯の製造法。
2. The first and second heat treatment steps, wherein the heat treatment is performed in a vacuum, an inert gas, a hydrogen gas, or a mixed gas of hydrogen and nitrogen. 2. A method for producing a directional silicon-iron alloy ribbon according to claim 1.
【請求項3】第二次冷間圧延工程において、圧延に用い
るロールの表面を脱脂した後、無潤滑にて圧延すること
を特徴とする特許請求の範囲第1項記載の方向性珪素鉄
合金薄帯の製造法。
3. The directional silicon-iron alloy according to claim 1, wherein in the secondary cold rolling step, the surface of the roll used for rolling is degreased and then rolled without lubrication. Thin strip manufacturing method.
【請求項4】第二次熱処理工程において、昇温時に1100
〜1150℃の温度区間を10〜60分間かけて保持または経由
することを特徴とする特許請求の範囲第1項記載の方向
性珪素鉄合金薄帯の製造法。
4. In the second heat treatment step, when the temperature is raised to 1100
The method for producing a directional silicon-iron alloy ribbon according to claim 1, characterized in that the temperature zone of 〜1150 ° C is held or passed over 10 to 60 minutes.
JP62211997A 1987-08-26 1987-08-26 Method for producing directional silicon iron alloy ribbon Expired - Lifetime JPH07110974B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62211997A JPH07110974B2 (en) 1987-08-26 1987-08-26 Method for producing directional silicon iron alloy ribbon

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62211997A JPH07110974B2 (en) 1987-08-26 1987-08-26 Method for producing directional silicon iron alloy ribbon

Publications (2)

Publication Number Publication Date
JPS6455339A JPS6455339A (en) 1989-03-02
JPH07110974B2 true JPH07110974B2 (en) 1995-11-29

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Country Link
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5065642A (en) * 1989-02-28 1991-11-19 Aisin Seiki Kabushiki Kaisha Kariya Apparatus for absorbing torque variation
US5354389A (en) * 1991-07-29 1994-10-11 Nkk Corporation Method of manufacturing silicon steel sheet having grains precisely arranged in Goss orientation
KR101223115B1 (en) 2010-12-23 2013-01-17 주식회사 포스코 Grain-oriented electrical steel sheet with extremely low iron loss and method for manufacturing the same
KR101647655B1 (en) 2014-12-15 2016-08-11 주식회사 포스코 Grain orientied electrical steel sheet and method for manufacturing the same

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