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JPH07113549B2 - 3D optical distance sensor - Google Patents
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JPH07113549B2 - 3D optical distance sensor - Google Patents

3D optical distance sensor

Info

Publication number
JPH07113549B2
JPH07113549B2 JP5517488A JP5517488A JPH07113549B2 JP H07113549 B2 JPH07113549 B2 JP H07113549B2 JP 5517488 A JP5517488 A JP 5517488A JP 5517488 A JP5517488 A JP 5517488A JP H07113549 B2 JPH07113549 B2 JP H07113549B2
Authority
JP
Japan
Prior art keywords
semiconductor laser
light
wavelength
emission
distance sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP5517488A
Other languages
Japanese (ja)
Other versions
JPH01227916A (en
Inventor
完治 西井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP5517488A priority Critical patent/JPH07113549B2/en
Publication of JPH01227916A publication Critical patent/JPH01227916A/en
Publication of JPH07113549B2 publication Critical patent/JPH07113549B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Length Measuring Devices By Optical Means (AREA)
  • Measurement Of Optical Distance (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、光を用いて物体表面の段差を非接触で測定す
る三次元光距離センサに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a three-dimensional optical distance sensor that uses light to measure a step on an object surface in a non-contact manner.

従来の技術 従来の光距離センサの構成を図面に基づいて以下に説明
する。第5図は従来の光距離センサの構成図である。1
はレーザ、2は図中のX方向にビームを走査する第一の
偏向ミラー、3は図中のY方向にビームを走査する第二
の偏向ミラー、4は被測定物体、5は被測定物体4から
の反射光を集光する集光レンズ、6は集光レンズの後方
に配置された二次元アレイ光検出器である。
2. Description of the Related Art The configuration of a conventional optical distance sensor will be described below with reference to the drawings. FIG. 5 is a block diagram of a conventional optical distance sensor. 1
Is a laser, 2 is a first deflection mirror for scanning a beam in the X direction in the figure, 3 is a second deflection mirror for scanning a beam in the Y direction in the figure, 4 is an object to be measured, 5 is an object to be measured A condenser lens for condensing the reflected light from 4 and a two-dimensional array photodetector 6 arranged behind the condenser lens.

次にこの従来例の光距離センサの原理を第6図を用いて
説明する。第6図でSを集光レンズ5の中心、Lをレー
ザ1からの出射ビームの中心、Oを被測定物体4上の
点、Θ及びΦを各々点Oからの反射ビーム、レーザ1か
らの出射ビームが基線LSと成す角度とし、点Oから基線
に下ろした垂線をPとし、さらに、SP間の距離をa、LP
間の距離をbと置き(a+b)=Dを基線LSの長さとす
ると、 a=h/tanΘ、b=h/tanΦ という関係から、 D=a+b=h(1/tanΘ+1/tanΦ) が成り立つので点Oまでの距離hは式(1)で表わされ
る。
Next, the principle of the conventional optical distance sensor will be described with reference to FIG. In FIG. 6, S is the center of the condenser lens 5, L is the center of the emitted beam from the laser 1, O is a point on the object to be measured 4, Θ and Φ are reflected beams from the point O, and laser from the laser 1 is shown. The angle between the outgoing beam and the base line LS is defined as P, the perpendicular line from the point O to the base line is defined as P, and the distance between SP is a, LP.
If the distance between them is b and (a + b) = D is the length of the base line LS, D = a + b = h (1 / tanΘ + 1 / tanΦ) holds from the relationship of a = h / tanΘ and b = h / tanΦ. The distance h to the point O is expressed by equation (1).

h=DtanΘtanΦ/(tanΘ+tanΦ) ・・・式(1) ここで角度Θは集光レンズ5の光軸の向きであり式
(2)で与えられる tanΘ=f/d ・・式(2) f:集光レンズ5の焦点距離 d:集光レンズ5の中心と、二次元アレイ光検出器上のビ
ーム検出点の距離 従って、第一及び第二の偏向ミラー2、3によりX方向
及びY方向にレーザビームを走査し、二次元アレイ光検
出器6上に集光させ二次元アレイ光検出器上のビーム検
出点Sと出射ビームの中心L及び被測定物体4上の点O
の間で式(1)、式(2)を三次元に拡張する事で被測
定物体4との三次元的距離計測が可能となる。
h = D tan Θ tan Φ / (tan Θ + tan Φ) Equation (1) where angle Θ is the direction of the optical axis of the condenser lens 5 and is given by Equation (2) tan Θ = f / d ··· Equation (2) f: Focal length of the condenser lens 5: Distance between the center of the condenser lens 5 and the beam detection point on the two-dimensional array photodetector Therefore, the first and second deflecting mirrors 2 and 3 are used to move in the X and Y directions. The laser beam is scanned and focused on the two-dimensional array photodetector 6, and the beam detection point S on the two-dimensional array photodetector, the center L of the outgoing beam and the point O on the measured object 4 are detected.
By expanding the equations (1) and (2) in three dimensions, the three-dimensional distance measurement with the measured object 4 becomes possible.

発明が解決しようとする課題 しかしながら上記の様な構成では、レーザビームをX、
Y方向に走査するのに偏向ミラーを用いる必要が有り、
これらの偏向ミラーの回転制御のための角度検出を行う
検出器としてロータリエンコーダが用いられているが、
このようなロータリエンコーダでは分解能が0.01度程度
のオーダにすぎずまた、偏向ミラーの応答周波数も数KH
zのオーダにすぎない。従って、被測定物体の表面を高
速にしかも微小ステップで測定することは困難であっ
た。
However, in the above configuration, the laser beam is
It is necessary to use a deflecting mirror to scan in the Y direction,
A rotary encoder is used as a detector that detects an angle for controlling the rotation of these deflection mirrors.
In such a rotary encoder, the resolution is only on the order of 0.01 degree, and the response frequency of the deflection mirror is several KH.
Only the order of z. Therefore, it is difficult to measure the surface of the object to be measured at high speed and in minute steps.

本発明は、かかる問題点に鑑み光学素子の波長分散性を
利用し、半導体レーザの発光波長を変化する手段を用い
ることで、被測定物体の表面を高速にかつ微小ステップ
で測定可能な三次元光距離センサを提供することを目的
とする。
In view of such a problem, the present invention utilizes the wavelength dispersibility of an optical element and uses a means for changing the emission wavelength of a semiconductor laser, so that the surface of an object to be measured can be measured at high speed and in small steps. An object is to provide an optical distance sensor.

課題を解決するための手段 本発明は、半導体レーザと、この半導体レーザからの光
を集光し平行光とする集光手段と、この集光されたレー
ザ光をスリット状光束にビーム形状を変換するビーム整
形手段と、このビーム整形手段を経た光を反射または透
過する波長分散性を有する光学素子と、この波長分散性
を有する光学素子と略同一平面内に配された二次元光検
出器と、半導体レーザの発光波長可変手段とを備えたこ
とを特徴とする三次元光距離センサである。
Means for Solving the Problems The present invention is directed to a semiconductor laser, a condensing means for condensing light from the semiconductor laser into parallel light, and a beam shape of the condensed laser light converted into a slit light beam. Beam shaping means, an optical element having a wavelength dispersive property that reflects or transmits light that has passed through the beam shaping means, and a two-dimensional photodetector arranged substantially in the same plane as the optical element having the wavelength dispersive property. A three-dimensional optical distance sensor, comprising: a semiconductor laser emitting wavelength varying means.

作用 本発明は、上記した構成によりまずビーム整形手段によ
り半導体レーザの楕円発光ビーム細長いスリット状と
し、さらに半導体レーザの発光波長を可変化させ波長分
散性を有する光学素子への入射光の波長を変化させ波長
分散によりスリット状出射光の出射角度を変化させるこ
とで被測定物体の表面を面として走査可能となり微小ス
テップ送り、高速走査型の三次元光距離センサを提供で
きる。
According to the present invention, the elliptic emission beam elongated slit shape of the semiconductor laser is first formed by the beam shaping means by the above-described configuration, and the emission wavelength of the semiconductor laser is tuned to change the wavelength of the incident light to the optical element having wavelength dispersion. By changing the emission angle of the slit-shaped emission light by wavelength dispersion, it becomes possible to scan the surface of the object to be measured as a surface, and it is possible to provide a high-speed scanning type three-dimensional optical distance sensor.

実施例 第1図は本発明の第一の実施例の平面図である。11は半
導体レーザ、12は半導体レーザからの出射光を集光して
平行光とするコリメータレンズ、13はコリメータレンズ
から出射した楕円ビームの短軸方向を縮小し細長いスリ
ット状光にビーム整形する整形プリズム、14は整形プリ
ズムからの出射光が投射される被測定物体、15は被測定
物体14からの反射光を集光する集光レンズ、16は整形プ
リズムの出射面と略同一平面内に配されかつ、集光レン
ズ15により集光されたビームを検出する二次元アレイ光
検出器、17は半導体レーザ11の発光パワーを半導体レー
ザ11の裏面から検出する発光パワー検出器、18は発光パ
ワー検出の出力すなわち半導体レーザ11の発光パワー
を、可変基準電圧発生手段19により一定に制御するAPC
(Automatic Power Control)回路である。発光波長
可変手段20は、上記の発光パワー検出器17、APC回路1
8、可変基準電圧発生手段19からなる。
Embodiment 1 FIG. 1 is a plan view of a first embodiment of the present invention. 11 is a semiconductor laser, 12 is a collimator lens that collects the light emitted from the semiconductor laser into parallel light, and 13 is a shaping that reduces the short-axis direction of the elliptical beam emitted from the collimator lens to shape the light into elongated slit light. A prism, 14 is an object to be measured on which the light emitted from the shaping prism is projected, 15 is a condenser lens that collects the reflected light from the object to be measured 14, and 16 is arranged in substantially the same plane as the exit surface of the shaping prism. And a two-dimensional array photodetector that detects the beam condensed by the condenser lens 15, 17 is an emission power detector that detects the emission power of the semiconductor laser 11 from the back surface of the semiconductor laser 11, and 18 is emission power detection Output of the semiconductor laser 11, that is, the emission power of the semiconductor laser 11 is controlled by the variable reference voltage generating means 19 to be constant
(Automatic Power Control) circuit. The emission wavelength varying means 20 is composed of the emission power detector 17 and the APC circuit 1 described above.
8 and variable reference voltage generating means 19.

以上のように、構成された本発明の第一の実施例につい
て、第1図および第2図を用いてその動作を以下に説明
する。可変基準電圧発生手段19により、APC回路18の基
準電圧を変化させると、発光パワー検出器17の出力電圧
がこの基準電圧に等しくなるまで、APC回路18の出力す
なわち半導体レーザ11への注入電流が変化し、半導体レ
ーザ11の発光パワーが変化する。半導体レーザ11の発光
波長は発光パワー依存性を持っているので、発光パワー
も変化する。
The operation of the first embodiment of the present invention configured as described above will be described below with reference to FIGS. 1 and 2. When the reference voltage of the APC circuit 18 is changed by the variable reference voltage generating means 19, the output of the APC circuit 18, that is, the injection current to the semiconductor laser 11, is maintained until the output voltage of the emission power detector 17 becomes equal to this reference voltage. As a result, the emission power of the semiconductor laser 11 changes. Since the emission wavelength of the semiconductor laser 11 has emission power dependency, the emission power also changes.

次に、この発光波長の変化による整形プリズム13からの
出射光の出射角度変化を第2図を用いて説明する。整形
プリズム13の頂角をα、プリズム入射面への入射角を
β、そこでの屈折角をγ、プリズムからの出射角をδ、
プリズム硝子材の屈折率をnとする。入射面、出射面の
おのおのでスネルの法則が成り立つ 入射面:sinβ=nsinγ ・・・式(3) 出射面:nsin(γ+α)=sinδ ・・・式(4) ここで、硝材の屈折率の波長分散性、つまり屈折率nの
入射光波長依存性を考え以下の微分演算を行なう。すな
わち、波長に依存しない頂角αと入射角βを定数として
式(3)と式(4)の微分を取ると、式(3)より 0=dnsinγ+ncosγdγ ・・・式(5) 式(4)より dnsin(γ+α)+ncos(γ+α)dγ=cosδdδ・・
・式(6) 式(5)、(6)より dδ=(dnsin(γ+α)−ncos(γ+α)dnsinγ/nco
sγ)/cosδ =dn(sin(γ+α)−cos(γ+α)tanγ)/cosδ ・
・・式(7) と書けるので結局、半導体レーザ11の発光波長変化とプ
リズム硝材の波長分散による出射角の変化率dδは式
(7)で表現できる。
Next, the change in the emission angle of the light emitted from the shaping prism 13 due to the change in the emission wavelength will be described with reference to FIG. The apex angle of the shaping prism 13 is α, the incident angle to the prism entrance surface is β, the refraction angle there is γ, the exit angle from the prism is δ,
The refractive index of the prism glass material is n. Snell's law holds for each of the entrance and exit surfaces. Entrance surface: sinβ = nsinγ ・ ・ ・ Equation (3) Exit surface: nsin (γ + α) = sinδ ・ ・ ・ Equation (4) where the refractive index of the glass material is Considering wavelength dispersion, that is, dependency of refractive index n on wavelength of incident light, the following differential operation is performed. That is, when the apex angle α and the incident angle β, which do not depend on the wavelength, are taken as constants and the differentiation of the formulas (3) and (4) is taken, 0 = dnsinγ + ncosγdγ (Formula (5) Formula (4) From dnsin (γ + α) + ncos (γ + α) dγ = cosδdδ ...
-Equation (6) From equations (5) and (6), dδ = (dnsin (γ + α) -ncos (γ + α) dnsinγ / nco
sγ) / cosδ = dn (sin (γ + α) -cos (γ + α) tanγ) / cosδ
.. can be written as equation (7), so the change rate d? Of the emission angle due to the wavelength variation of the semiconductor laser 11 and the wavelength dispersion of the prism glass material can be expressed by equation (7).

一方、整形プリズムの縮小率Mを、第2図(b)を用い
て説明する。図中の点aと点cは、abの距離で表わされ
る光線束径W1を持った入射光線がプリズムに入射する点
を示している。また、入射面での屈折光線の光線束径W2
はcdで表わされる。
On the other hand, the reduction ratio M of the shaping prism will be described with reference to FIG. Points a and c in the figure indicate points where an incident ray having a ray bundle diameter W1 represented by the distance ab is incident on the prism. Also, the ray bundle diameter W2 of the refracted rays at the incident surface
Is represented by cd.

この図より、距離ac=W1/cosβ=W2/cosγの関係が成り
立つので、入射面での縮小率はW2/W1=cosγ/cosβで表
わされる。同様に出射面での縮小率はcosδ/cos(γ+
α)で与えられる。
From this figure, the relationship of distance ac = W1 / cosβ = W2 / cosγ is established, and therefore the reduction ratio on the incident surface is expressed by W2 / W1 = cosγ / cosβ. Similarly, the reduction rate at the exit surface is cosδ / cos (γ +
given in α).

従って、整形プリズム全体での縮小率Mは、 M=cosδcosγ/(cosβcos(γ+α)) ・・・式
(8) で与えられる。
Therefore, the reduction ratio M of the entire shaping prism is given by M = cosδcosγ / (cosβcos (γ + α)) (Equation (8)).

例えばここで、整形プリズム13の硝子材としてSF11を選
ぶと なので 整形プリズム13の頂角α=20度、 入射角β=25度とすると、 γ=14.77度 M≒0.4倍 δ=72.02度 また、出射角δの波長変化に対する変化率dδは式
(7)と上記の数値からdδ≒0.002(λ:800nm−→830
nm)となる。
For example, if you select SF11 as the glass material for the shaping prism 13, Therefore, assuming that the apex angle α of the shaping prism 13 is 20 degrees and the incident angle β is 25 degrees, γ = 14.77 degrees M ≈ 0.4 times δ = 72.02 degrees Also, the change rate dδ of the exit angle δ with respect to the wavelength change is given by the formula (7). From the above values and dδ ≈ 0.002 (λ: 800 nm- → 830
nm).

従って、実際の出射角の変化は Δδ=dδ×δ =0.002×72.02 ≒0.14度 で与えられる。Therefore, the actual change of the output angle is given by Δδ = dδ × δ = 0.002 × 72.02 ≈0.14 degrees.

一般に半導体レーザの遠視野像の楕円率は2〜3程度な
ので、整形プリズム出射光の楕円率は5〜7.5となり、
スリット状の光束とする事が可能となる。
Generally, the ellipticity of the far-field image of the semiconductor laser is about 2 to 3, so the ellipticity of the light emitted from the shaping prism is 5 to 7.5.
It becomes possible to form a slit-shaped light beam.

また、発光波長可変手段20により半導体レーザ11の発光
波長を30nm変化させれば、プリズム硝材の波長分散によ
る出射角δの変化は、Δδ≒0.14度となる。
Further, when the emission wavelength of the semiconductor laser 11 is changed by 30 nm by the emission wavelength changing means 20, the change of the emission angle δ due to the wavelength dispersion of the prism glass material is Δδ≈0.14 degrees.

従って、例えば、整形プリズム13の出射面と被測定物体
面との距離を1000mmとすると、ΔY=1000×tan0.14=
2.44mmの範囲でスリット状の光束をY方向に走査でき
る。すなわち半導体レーザ11の発光波長の変化1nm当た
り0.001度程度の微小ステップ送りが可能でかつ、数mm
程度の走査範囲が容易に得られることになる。
Therefore, for example, if the distance between the exit surface of the shaping prism 13 and the object surface to be measured is 1000 mm, then ΔY = 1000 × tan0.14 =
A slit-shaped light beam can be scanned in the Y direction within a range of 2.44 mm. That is, a change in the emission wavelength of the semiconductor laser 11 can be made in small step feeds of about 0.001 degree per 1 nm, and a few mm
A scan range of a degree can be easily obtained.

従って、上記の様な構成の発光波長可変手段20、整形プ
リズム13を用いれば、X、Y二方向に光ビームを偏向す
るための偏向ミラー、その回転角を検出するためのロー
タリーエンコダーを用いること無く、スリット状の光束
を0.001度程度の微小ステップで、高速に走査すること
が可能となる。
Therefore, if the light emission wavelength varying means 20 and the shaping prism 13 having the above-mentioned configurations are used, a deflection mirror for deflecting the light beam in two directions of X and Y and a rotary encoder for detecting the rotation angle thereof are used. Without this, it becomes possible to scan the slit-shaped light beam at a high speed in a minute step of about 0.001 degree.

次に本発明の第二の実施例を第3図を用いて説明する。
図中の番号11〜16は、第1図のものと同じものを示して
いる。21は電流によって冷却あるいは加熱を行うペルチ
ェ素子であり半導体レーザ11に固着されている。22は温
度検出器であり半導体レーザ11の温度を検出する。23は
ATC(Automatic Tempreture Control)回路で有り可変
基準電圧発生手段24から供給される電圧により、温度検
出器22の出力すなち半導体レーザ11の温度が一定波長と
なるようペルチェ素子駆動電流を制御する。発光波長可
変手段20は、温度検出器22、ペルチェ素子21、ATC回路2
3及び可変可変基準電圧発生手段24により構成されてい
る。
Next, a second embodiment of the present invention will be described with reference to FIG.
The numbers 11 to 16 in the figure indicate the same as those in FIG. Reference numeral 21 denotes a Peltier element that cools or heats with an electric current and is fixed to the semiconductor laser 11. A temperature detector 22 detects the temperature of the semiconductor laser 11. 23 is
The Peltier device drive current is controlled so that the output of the temperature detector 22, that is, the temperature of the semiconductor laser 11 has a constant wavelength by the voltage supplied from the variable reference voltage generating means 24 which is an ATC (Automatic Tempreture Control) circuit. The light emission wavelength varying means 20 includes a temperature detector 22, a Peltier element 21, and an ATC circuit 2.
3 and variable variable reference voltage generating means 24.

次に、本発明の第二の実施例の動作を第3図を用いて説
明する。半導体レーザの発光波長は温度により変化す
る。従って、可変基準電圧発生手段24によりATC回路23
の基準電圧を設定して、ペルチェ素子21の駆動電流を制
御すれば半導体レーザ11の温度を任意に設定し、発光波
長を可変化できる。
Next, the operation of the second embodiment of the present invention will be described with reference to FIG. The emission wavelength of the semiconductor laser changes with temperature. Therefore, the ATC circuit 23 is controlled by the variable reference voltage generating means 24.
If the drive voltage of the Peltier device 21 is controlled by setting the reference voltage of, the temperature of the semiconductor laser 11 can be arbitrarily set and the emission wavelength can be made variable.

従って、前述の本発明の第一の実施例と同様に、整形プ
リズム13の波長分散性を利用して、出射光の出射角を、
微小ステップで走査でき、本発明の第一の実施例と同様
の効果を得ることができ、さらに本発明の第一の実施例
とは異なり、半導体レーザ11の発光パワーを一定にでき
るので発光パワーに伴う光量変化補正手段を要さないと
いう利点も有している。
Therefore, similarly to the first embodiment of the present invention described above, by utilizing the wavelength dispersion of the shaping prism 13, the emission angle of the emitted light,
Scanning can be performed in minute steps, the same effect as that of the first embodiment of the present invention can be obtained, and unlike the first embodiment of the present invention, since the emission power of the semiconductor laser 11 can be made constant, the emission power There is also an advantage that a light amount change correction means associated with is not required.

次に、本発明の第三の実施例を第4図を用いて説明す
る。第4図は分布反射型レーザ(DBRレーザ)と呼ばれ
る、半導体レーザ内部に回折格子を有する光導波路型レ
ーザの構成図である。
Next, a third embodiment of the present invention will be described with reference to FIG. FIG. 4 is a block diagram of an optical waveguide type laser called a distributed reflection laser (DBR laser) having a diffraction grating inside a semiconductor laser.

DBR領域の反射率rと位相Φ1は r=−jκsinhγL/(γcoshγL+(α+jΛB)sanh
γL) =|γ|exp(jΦ1) ・・・式(10) ここで γ=κ+(α+jΔβ) Δβ=(2π/λ)n eq−π/Λ n eq:DBR領域等価屈折率 Λ:回折格子の周期 κ:光と回折格子の結合定数 α:DBR領域の損失 β:伝搬定数 一方発光領域の位相Φ2は Φ2=βaLa ・・・式(11) βa:発光領域の伝搬定数 La:発光領域の長さ この様な光導波路型レーザは、レーザ発振の位相整合条
件 Φ1=Φ2+2mπ ・・・式(12) を満足する必要が有る。すなわちこの条件を満足する波
長で発光する。
The reflectance r and the phase Φ1 in the DBR region are r = −jκsinhγL / (γcoshγL + (α + jΛB) sanh
γL) = | γ | exp (jΦ1) ・ ・ ・ Equation (10) where γ 2 = κ 2 + (α + jΔβ) 2 Δβ = (2π / λ) n eq−π / Λ n eq: DBR region equivalent refractive index Λ: Period of diffraction grating κ: Coupling constant of light and diffraction grating α: Loss of DBR region β: Propagation constant On the other hand, phase Φ2 of emission region is Φ2 = βaLa ・ ・ ・ Equation (11) βa: Propagation constant La of emission region La : Length of light emitting region Such an optical waveguide type laser needs to satisfy the phase matching condition Φ1 = Φ2 + 2mπ of laser oscillation (12). That is, light is emitted at a wavelength that satisfies this condition.

ところが、DBR領域に電流を注入すると、電子やキャリ
ヤが光導波層に蓄えられる。キャリヤが蓄積されるとプ
ラズマ効果により等価屈折率n eqが減少する。従って、
式(10)でΔβ=(2π/λ)n eq−π/Λが変化し、
Φ1も変化する。よって式(12)の位相整合条件から、
発光波長が変わる。
However, when current is injected into the DBR region, electrons and carriers are stored in the optical waveguide layer. When the carriers are accumulated, the plasma effect reduces the equivalent refractive index n eq. Therefore,
In equation (10), Δβ = (2π / λ) n eq−π / Λ changes,
Φ1 also changes. Therefore, from the phase matching condition of equation (12),
The emission wavelength changes.

従って、発光波長可変手段20を、その内部に回折格子を
有する光導波路型半導体レーザと、内部回折格子領域へ
の注入電流制御手段とにより構成すれば、前述の本発明
の第一および第二の実施例と同様の効果をうることがで
きる。
Therefore, if the emission wavelength varying means 20 is constituted by an optical waveguide type semiconductor laser having a diffraction grating inside thereof and an injection current control means for the internal diffraction grating region, the first and second aspects of the present invention described above can be obtained. The same effect as the embodiment can be obtained.

また本実施例によれば、半導体レーザの発光パワーを一
体化できかつ、ペルチェ素子21、温度検出器22が不要と
なるばかりで無くペルチェ素子21駆動のための電力と比
較して、大幅な低消費電力化が可能となるといった利点
を有している。
Further, according to the present embodiment, the emission power of the semiconductor laser can be integrated, and not only the Peltier device 21 and the temperature detector 22 are not required, but also the power for driving the Peltier device 21 is significantly reduced. It has an advantage that power consumption can be reduced.

上記の実施例においては、スリット状ビームに変換する
手段として三角プリズムを使用したが、これに限定され
ることなく例えばスリット状の開口を用いてもよい、ま
た波長分散性を持つ光学素子として反射型あるいは透過
型の回折格子を用いても同様の効果がえられる。
In the above embodiments, the triangular prism is used as the means for converting into a slit-shaped beam, but it is not limited to this, for example, a slit-shaped aperture may be used, and a reflection is performed as an optical element having wavelength dispersion property. The same effect can be obtained by using a diffraction grating of a transmission type or a transmission type.

発明の効果 本発明の三次元光距離センサは、半導体レーザと、半導
体レーザの楕円状遠視野像の短軸方向のビーム幅を縮小
するビーム整形プリズムと、この整形プリズムの出射面
と略同一平面内に配された二次元光検出器と、半導体レ
ーザの発光波長可変手段とを設けることにより、偏向ミ
ラー等を用いずにスリット状の光束を微小ステップで、
高速に被測定物体の表面を高速に走査する三次元光距離
センサを提供できる。
Advantageous Effects of Invention The three-dimensional optical distance sensor of the present invention includes a semiconductor laser, a beam shaping prism that reduces the beam width in the short axis direction of an elliptical far-field image of the semiconductor laser, and a plane substantially flush with the exit surface of the shaping prism. By providing a two-dimensional photodetector arranged in the inside and an emission wavelength changing means of the semiconductor laser, a slit-shaped light beam can be formed in minute steps without using a deflection mirror or the like.
It is possible to provide a three-dimensional optical distance sensor that scans the surface of an object to be measured at high speed.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の第一の実施例の平面図、第2図は本発
明の第一の実施例の動作説明図、第3図は本発明の第二
の実施例の平面図、第4図は本発明の第三の実施例の光
導波路型レーザの構成図、第5図は従来例の構成図、第
6図は従来例の動作説明図である。 11……半導体レーザ、12……コリメートレンズ、13……
整形プリズム、14……被測定物体、15……集光レンズ、
16……二次元アレイ光検出器、20……半導体レーザの発
光波長可変手段。
FIG. 1 is a plan view of the first embodiment of the present invention, FIG. 2 is an operation explanatory view of the first embodiment of the present invention, and FIG. 3 is a plan view of the second embodiment of the present invention. 4 is a configuration diagram of an optical waveguide type laser according to a third embodiment of the present invention, FIG. 5 is a configuration diagram of a conventional example, and FIG. 6 is an operation explanatory diagram of the conventional example. 11 …… Semiconductor laser, 12 …… Collimating lens, 13 ……
Shaping prism, 14 ... Object to be measured, 15 ... Condensing lens,
16 …… two-dimensional array photodetector, 20 …… semiconductor laser emission wavelength variable means.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】半導体レーザと、この半導体レーザからの
光を集光し平行光とする集光手段と、この集光されたレ
ーザ光をスリット状光束にビーム形状を変換するビーム
整形手段と、このビーム整形手段を経た光を反射または
透過する波長分散性を有する光学素子と、この波長分散
性を有する光学素子と、略同一平面内に配された二次元
光検出器と、前記半導体レーザの発光波長可変手段とを
備えたことを特徴とする三次元光距離センサ。
1. A semiconductor laser, a condensing means for condensing light from the semiconductor laser into parallel light, and a beam shaping means for converting the condensed laser light into a slit-shaped light beam. An optical element having a wavelength dispersive property that reflects or transmits light that has passed through the beam shaping means, an optical element having the wavelength dispersive property, a two-dimensional photodetector arranged in substantially the same plane, and the semiconductor laser A three-dimensional optical distance sensor, comprising: an emission wavelength varying means.
【請求項2】ビーム整形手段と、波長分散性を有する光
学素子とを、レーザ光の楕円状遠視野像の短軸方向のビ
ーム幅を縮小するビーム整形プリズムにより構成したこ
とを特徴とする請求項1に記載の三次元光距離センサ。
2. The beam shaping means and the optical element having a wavelength dispersion property are constituted by a beam shaping prism for reducing the beam width in the short axis direction of the elliptical far-field pattern of the laser light. Item 3. The three-dimensional optical distance sensor according to Item 1.
JP5517488A 1988-03-09 1988-03-09 3D optical distance sensor Expired - Fee Related JPH07113549B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5517488A JPH07113549B2 (en) 1988-03-09 1988-03-09 3D optical distance sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5517488A JPH07113549B2 (en) 1988-03-09 1988-03-09 3D optical distance sensor

Publications (2)

Publication Number Publication Date
JPH01227916A JPH01227916A (en) 1989-09-12
JPH07113549B2 true JPH07113549B2 (en) 1995-12-06

Family

ID=12991361

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5517488A Expired - Fee Related JPH07113549B2 (en) 1988-03-09 1988-03-09 3D optical distance sensor

Country Status (1)

Country Link
JP (1) JPH07113549B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02171609A (en) * 1988-12-26 1990-07-03 Tsuguo Kono Optical type displacement measurement using laser beam
JPH09113753A (en) * 1995-10-20 1997-05-02 Fujikura Ltd Multi-fiber optical fiber observation device
JP2002243409A (en) * 2001-02-22 2002-08-28 Yokogawa Electric Corp Laser interferometer
JP5417723B2 (en) * 2008-03-18 2014-02-19 株式会社豊田中央研究所 Direction measuring method and direction measuring apparatus
CN102313866B (en) * 2011-07-29 2013-12-18 杰群电子科技(东莞)有限公司 Two-step scanning test method for minimum output voltage drop
JP6265325B2 (en) * 2013-06-28 2018-01-24 三菱重工業株式会社 Laser scanning device, laser scanning system, and laser scanning method
JP6793033B2 (en) * 2016-12-26 2020-12-02 浜松ホトニクス株式会社 Distance measuring device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110411336A (en) * 2018-04-27 2019-11-05 昆山汉鼎精密金属有限公司 Multi-angle dimension measurement device

Also Published As

Publication number Publication date
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