JPH07114178B2 - Method for manufacturing electrode foil for aluminum electrolytic capacitor - Google Patents
Method for manufacturing electrode foil for aluminum electrolytic capacitorInfo
- Publication number
- JPH07114178B2 JPH07114178B2 JP3067868A JP6786891A JPH07114178B2 JP H07114178 B2 JPH07114178 B2 JP H07114178B2 JP 3067868 A JP3067868 A JP 3067868A JP 6786891 A JP6786891 A JP 6786891A JP H07114178 B2 JPH07114178 B2 JP H07114178B2
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- heat treatment
- electrolytic capacitor
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Description
【０００１】[0001]
【産業上の利用分野】本発明はアルミニウム電解コンデ
ンサ用電極箔の製造方法に関し、さらに詳しく言えば、
エッチング箔に良質な酸化皮膜を形成し、コンデンサの
陽極箔の単位面積当りの静電容量を増加させるようにし
たもので、特に低圧用に好適なアルミニウム電解コンデ
ンサ用電極箔の製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an electrode foil for an aluminum electrolytic capacitor, and more specifically,
A high-quality oxide film is formed on the etching foil to increase the capacitance per unit area of the capacitor's anode foil, and particularly relates to a method for manufacturing an electrode foil for an aluminum electrolytic capacitor suitable for low voltage. is there.
【０００２】[0002]
【従来の技術】一般に、アルミニウム電解コンデンサ
は、アルミニウム箔からなる陽極用電極箔と陰極用電極
箔とをセパレータを介して巻回してなるコンデンサ素子
を有し、同コンデンサ素子に電解液を含浸させ、外装ケ
ース内に封入した構造とされている。2. Description of the Related Art Generally, an aluminum electrolytic capacitor has a capacitor element formed by winding an electrode foil for an anode and an electrode foil for a cathode, which are made of aluminum foil, with a separator interposed therebetween. The capacitor element is impregnated with an electrolytic solution. The structure is enclosed in an outer case.
【０００３】ところで、陽極用電極箔はアルミニウム箔
の表面を粗面化して表面積を拡大するエッチング工程
と、同工程により得られたエッチング箔の表面に酸化皮
膜を形成する化成工程とを経て製造される。By the way, the anode electrode foil is manufactured through an etching step of roughening the surface of the aluminum foil to increase the surface area and a chemical conversion step of forming an oxide film on the surface of the etching foil obtained by the same step. It
【０００４】上記エッチング工程において、アルミニウ
ム箔は塩化物を含む水溶液中でその表面が電気化学的に
溶解されて粗面化され、しかる後、硝酸、蓚酸、燐酸な
どにて脱塩素処理され、水洗後乾燥して巻き取られて次
の化成工程に移される。In the above etching step, the surface of the aluminum foil is electrochemically dissolved and roughened in an aqueous solution containing chloride, and then dechlorinated with nitric acid, oxalic acid, phosphoric acid, etc., and washed with water. After that, it is dried, rolled up, and transferred to the next chemical conversion step.
【０００５】[0005]
【発明が解決しようとする課題】陽極用電極箔の単位面
積当りの静電容量は、その値が大きい程、コンデンサ自
体を小型化することができるため、単位面積当りの静電
容量を増大させるための研究が種々行なわれている。As the capacitance per unit area of the anode electrode foil is larger, the capacitor itself can be downsized, so that the capacitance per unit area is increased. Various studies have been carried out.
【０００６】その方法としては、おおよそ次の２法が知
られている。すなわち、第１の方法はエッチング箔の表
面積の拡大率を大きくする方法であり、第２の方法は化
成によりエッチング箔上にムラのない均一な酸化アルミ
ニウム（Ａｌ２Ｏ３）の皮膜を形成させる方法である。As the method, the following two methods are known. That is, the first method is to increase the surface area expansion rate of the etching foil, and the second method is to form a uniform aluminum oxide (Al 2 O 3 ) film on the etching foil by chemical conversion. Is the way.
【０００７】ここで、後者である第２の方法をさらに展
開すると、同法は（ａ）酸化アルミニウムの皮膜を効率
よく化成させることを目的とする方法と、（ｂ）もっぱ
ら化成後の漏れ電流特性の向上を図ることを目的とする
方法とに分けられる。Here, when the second method, which is the latter method, is further developed, the same method (a) is a method for efficiently forming a film of aluminum oxide, and (b) is a leakage current after the formation. It is divided into a method for improving characteristics.
【０００８】上記（ａ）においては、１００Ｖ以下の低
圧用電極の場合、エッチングの後処理もしくは化成の前
処理として、４００〜６００℃の大気中で数分間熱処理
してエッチング箔上に酸化皮膜を形成する熱酸化を行な
ってから、本化成するようにしている。In the above (a), in the case of an electrode for low voltage of 100 V or less, as a post-treatment for etching or a pretreatment for chemical conversion, a heat treatment is performed for several minutes in the atmosphere at 400 to 600 ° C. to form an oxide film on the etching foil. The thermal oxidation to form is performed before the main chemical conversion.
【０００９】これに対して、上記（ｂ）では例えば特開
昭６２−１７１８５号公報で説明されているように、エ
ッチング箔を燐酸を含む水溶液で処理し、次に高温にて
箔表面に熱酸化皮膜を形成した後、酸またはアルカリ溶
液にて処理し、その熱酸化皮膜の一部を残留させてから
化成するようにしている。On the other hand, in (b) above, the etching foil is treated with an aqueous solution containing phosphoric acid, and then the foil surface is heated at a high temperature as described in, for example, JP-A-62-17185. After the oxide film is formed, it is treated with an acid or alkali solution, and a part of the thermal oxide film is allowed to remain before the chemical conversion.
【００１０】しかしながら、上記（ａ）（ｂ）の方法で
は、ともに単位面積当りの静電容量をアップさせるこ
と、および化成電力の低減化が未だ不十分である。However, in the above methods (a) and (b), it is still insufficient to increase the capacitance per unit area and to reduce the formation electric power.
【００１１】また、酸化アルミニウムの皮膜を均一に形
成するための他の方法として、中高圧用箔については化
成前に熱水処理することが行なわれているが、水和処理
の皮膜は一般に厚いため、同方法を低圧用箔に適用して
も静電容量が増大しないばかりか、却って箔強度の低下
が起こり好ましい結果が得られない。As another method for uniformly forming a film of aluminum oxide, medium- and high-pressure foils are subjected to hot water treatment before chemical conversion, but hydration-treated films are generally thick. Therefore, even if the same method is applied to the foil for low voltage, not only the capacitance does not increase, but also the foil strength is rather decreased and a desirable result cannot be obtained.
【００１２】[0012]
【課題を解決するための手段】本発明は上記従来の欠点
を解消するためになされたもので、その構成上の特徴
は、アルミニウム箔の表面を粗面化し、脱塩素処理を行
なったエッチング箔を、乾燥せずにそのままもしくは乾
燥させた後に、温水中に浸漬して水和処理を行ない、次
に予備加熱処理を行ない、引き続き熱処理して水和アル
ミナを熱分解させた後、上記エッチング箔の表面に酸化
皮膜を形成する化成処理を行なうことにある。The present invention has been made in order to solve the above-mentioned conventional drawbacks, and its structural feature is that an etching foil obtained by roughening the surface of an aluminum foil and subjecting it to dechlorination treatment. , Without being dried, or after being dried, immersed in warm water for hydration treatment, then subjected to preliminary heat treatment, followed by heat treatment to thermally decompose hydrated alumina, and then the above etching foil The purpose is to perform a chemical conversion treatment to form an oxide film on the surface of.
【００１３】この場合、上記水和処理における温水温度
は４０〜９８℃、好ましくは６０〜９０℃であり、か
つ、その処理時間は０．３〜３０分、好ましくは０．５
〜５分である。In this case, the hot water temperature in the hydration treatment is 40 to 98 ° C., preferably 60 to 90 ° C., and the treatment time is 0.3 to 30 minutes, preferably 0.5.
~ 5 minutes.
【００１４】また、上記予備加熱処理の加熱温度は５０
〜２５０℃、好ましくは８０〜２３０℃であり、かつ、
その処理時間は０．３〜５分、好ましくは０．５〜３分
である。The heating temperature of the preheating treatment is 50.
~ 250 ° C, preferably 80-230 ° C, and
The processing time is 0.3 to 5 minutes, preferably 0.5 to 3 minutes.
【００１５】さらに、上記熱処理の温度は２３０〜５５
０℃、好ましくは３５０〜５００℃であり、かつ、その
処理時間は０．０３〜２０時間、好ましくは０．５〜１
５時間である。Further, the temperature of the heat treatment is 230 to 55.
0 ° C., preferably 350 to 500 ° C., and the treatment time is 0.03 to 20 hours, preferably 0.5 to 1
5 hours.
【００１６】[0016]
【作用】温水中に浸漬させる水和処理により、アルミニ
ウム表面に水和アルミナ（水酸化アルミニウム）が形成
される。次の予備加熱乾燥処理により吸着水が除去され
るとともに、その後の熱処理により水酸化アルミニウム
が熱分解され、表面に良質の酸化アルミニウムを有する
エッチング箔が得られる。The hydrated alumina (aluminum hydroxide) is formed on the aluminum surface by the hydration treatment in which it is immersed in warm water. Adsorbed water is removed by the subsequent preliminary heating and drying treatment, and aluminum hydroxide is thermally decomposed by the subsequent heat treatment, and an etching foil having good quality aluminum oxide on the surface is obtained.
【００１７】そして、以後の通常の化成処理により、良
質な皮膜を有する複合酸化皮膜が形成される。Then, by the subsequent ordinary chemical conversion treatment, a composite oxide film having a good quality film is formed.
【００１８】このように本発明によれば、予めエッチン
グ箔表面に良質な酸化アルミニウムが形成されているた
め、化成皮膜形成時の電力消費が低減される。As described above, according to the present invention, since the high-quality aluminum oxide is formed on the surface of the etching foil in advance, the power consumption at the time of forming the chemical conversion film is reduced.
【００１９】また、薄くて耐電圧を有する緻密な複合酸
化皮膜が形成されるため、単位面積当りの静電容量が増
大するとともに、コンデンサの駆動用電解液との反応が
非常に少なくなり、特に漏れ電流の安定したコンデンサ
が得られる。Further, since a thin and dense composite oxide film having a withstand voltage is formed, the capacitance per unit area is increased and the reaction with the driving electrolyte of the capacitor is extremely reduced. A capacitor with stable leakage current can be obtained.
【００２０】[0020]
【実施例】以下、本発明の実施例およびそれと比較する
上での比較例について説明する。 《実施例１》 （Ａ）エッチング工程；純度９９．９％、厚み９０μｍ
のアルミニウム箔を塩酸９％、燐酸０．５％および硝酸
０．５％の水溶液からなる温度３０℃のエッチング液中
に浸漬し、正弦波交流電流で電流密度０．３Ａ／平方ｃ
ｍ、電気量１２０Ｃ／平方ｃｍのエッチングを行なっ
た。 （Ｂ）脱塩素処理；５％硝酸水溶液（液温４０℃）中に
１分間浸漬した。 （Ｃ）温水処理；４０℃の温水中に３０分間浸漬した。 （Ｄ）予備加熱処理；５０℃の大気中に５分間放置し
た。 （Ｅ）熱処理；５２０℃の窒素ガス中で２時間熱処理し
た。 《実施例２》 （Ａ）エッチング工程；実施例１に同じ。 （Ｂ）脱塩素処理；実施例１に同じ。 （Ｃ）温水処理；５０℃の温水中に１５分間浸漬した。 （Ｄ）予備加熱処理；１５０℃の大気中に３分間放置し
た。 （Ｅ）熱処理；２５０℃の窒素ガス中で２０時間熱処理
した。 《実施例３》 （Ａ）エッチング工程；実施例１に同じ。 （Ｂ）脱塩素処理；実施例１に同じ。 （Ｃ）温水処理；６０℃の温水中に７分間浸漬した。 （Ｄ）予備加熱処理；１５０℃の大気中に２分間放置し
た。 （Ｅ）熱処理；５００℃の大気中で４時間熱処理した。 《実施例４》 （Ａ）エッチング工程；実施例１に同じ。 （Ｂ）脱塩素処理；実施例１に同じ。 （Ｃ）温水処理；７０℃の温水中に３分間浸漬した。 （Ｄ）予備加熱処理；２００℃の大気中に２分間放置し
た。 （Ｅ）熱処理；３５０℃の水素ガスと窒素ガスの混合ガ
ス中で１５時間熱処理した。 《実施例５》 （Ａ）エッチング工程；実施例１に同じ。 （Ｂ）脱塩素処理；実施例１に同じ。 （Ｃ）温水処理；８０℃の温水中に２分間浸漬した。 （Ｄ）予備加熱処理；２００℃の大気中に１分間放置し
た。 （Ｅ）熱処理；５００℃の窒素ガスと酸素ガスの混合ガ
ス中で４時間熱処理した。 《実施例６》 （Ａ）エッチング工程；実施例１に同じ。 （Ｂ）脱塩素処理；実施例１に同じ。 （Ｃ）温水処理；８０℃の温水中に２分間浸漬した。 （Ｄ）予備加熱処理；２００℃の大気中に１分間放置し
た。 （Ｅ）熱処理；５００℃の窒素ガスと酸素ガスの混合ガ
ス中で０．５時間熱処理した。 《実施例７》 （Ａ）エッチング工程；実施例１に同じ。 （Ｂ）脱塩素処理；実施例１に同じ。 （Ｃ）温水処理；８０℃の温水中に２分間浸漬した。 （Ｄ）予備加熱処理；２００℃の大気中に１分間放置し
た。 （Ｅ）熱処理；５００℃の窒素ガスと酸素ガスの混合ガ
ス中で０．０３時間熱処理した。 《実施例８》 （Ａ）エッチング工程；実施例１に同じ。 （Ｂ）脱塩素処理；実施例１に同じ。 （Ｃ）温水処理；９０℃の温水中に１分間浸漬した。 （Ｄ）予備加熱処理；２５０℃の大気中に１分間放置し
た。 （Ｅ）熱処理；４００℃のアルゴンガス中で１２時間熱
処理した。 《実施例９》 （Ａ）エッチング工程；実施例１に同じ。 （Ｂ）脱塩素処理；実施例１に同じ。 （Ｃ）温水処理；９８℃の温水中に０．５分間浸漬し
た。 （Ｄ）予備加熱処理；２５０℃の大気中に０．５分間放
置した。 （Ｅ）熱処理；４００℃の大気中で１２時間熱処理し
た。 〈比較例１〉 （Ａ）エッチング工程；実施例１に同じ。 （Ｂ）脱塩素処理；実施例１に同じ。 （Ｃ）温水処理；９８℃の温水中に２分間浸漬した。 （Ｄ）予備加熱処理；なし。 （Ｅ）熱処理；なし。 〈比較例２〉 （Ａ）エッチング工程；実施例１に同じ。 （Ｂ）脱塩素処理；実施例１に同じ。 （Ｃ）温水処理；なし。 （Ｄ）予備加熱処理；なし。 （Ｅ）熱処理；なし。 〈比較例３〉 （Ａ）エッチング工程；実施例１に同じ。 （Ｂ）脱塩素処理；実施例１に同じ。 （Ｃ）温水処理；なし。 （Ｄ）予備加熱処理；なし。 （Ｅ）熱処理；５００℃の窒素ガス中で４時間熱処理し
た。 〈比較例４〉 （Ａ）エッチング工程；実施例１に同じ。 （Ｂ）脱塩素処理；実施例１に同じ。 （Ｃ）燐酸処理；０．１％燐酸水溶液（液温４０℃）に
１分間浸漬した。 （Ｄ）熱処理；５００℃の大気中で１分間熱処理した。 （Ｅ）溶解処理；５％クエン酸水溶液（液温４０℃）に
２分間浸漬した。EXAMPLES Examples of the present invention and comparative examples for comparison therewith will be described below. Example 1 (A) Etching step; purity 99.9%, thickness 90 μm
Of aluminum foil was immersed in an etching solution composed of an aqueous solution of hydrochloric acid 9%, phosphoric acid 0.5% and nitric acid 0.5% at a temperature of 30 ° C., and a current density of 0.3 A / square c was obtained with a sinusoidal alternating current.
Etching was performed at m and an electric quantity of 120 C / square cm. (B) Dechlorination treatment: Immersed in a 5% nitric acid aqueous solution (liquid temperature 40 ° C.) for 1 minute. (C) Hot water treatment: Immersed in 40 ° C. hot water for 30 minutes. (D) Preliminary heat treatment: left in the atmosphere at 50 ° C. for 5 minutes. (E) Heat treatment: Heat treatment was performed in nitrogen gas at 520 ° C. for 2 hours. << Example 2 >> (A) Etching step: Same as Example 1. (B) Dechlorination treatment: Same as in Example 1. (C) Hot water treatment: Immersed in hot water at 50 ° C. for 15 minutes. (D) Preliminary heat treatment: left in the air at 150 ° C. for 3 minutes. (E) Heat treatment: Heat treatment was performed in nitrogen gas at 250 ° C. for 20 hours. << Example 3 >> (A) Etching step: Same as Example 1. (B) Dechlorination treatment: Same as in Example 1. (C) Hot water treatment: Immersed in hot water at 60 ° C. for 7 minutes. (D) Preliminary heat treatment: left in the air at 150 ° C. for 2 minutes. (E) Heat treatment: Heat treatment was performed in the atmosphere at 500 ° C. for 4 hours. << Example 4 >> (A) Etching step: Same as Example 1. (B) Dechlorination treatment: Same as in Example 1. (C) Hot water treatment: Immersed in hot water at 70 ° C. for 3 minutes. (D) Preliminary heat treatment: left in the air at 200 ° C. for 2 minutes. (E) Heat treatment: Heat treatment was performed in a mixed gas of hydrogen gas and nitrogen gas at 350 ° C. for 15 hours. << Example 5 >> (A) Etching step: Same as Example 1. (B) Dechlorination treatment: Same as in Example 1. (C) Hot water treatment: Immersed in warm water of 80 ° C. for 2 minutes. (D) Preliminary heat treatment: left in the atmosphere at 200 ° C. for 1 minute. (E) Heat treatment: Heat treatment was performed in a mixed gas of nitrogen gas and oxygen gas at 500 ° C. for 4 hours. << Example 6 >> (A) Etching step: Same as Example 1. (B) Dechlorination treatment: Same as in Example 1. (C) Hot water treatment: Immersed in warm water of 80 ° C. for 2 minutes. (D) Preliminary heat treatment: left in the atmosphere at 200 ° C. for 1 minute. (E) Heat treatment: Heat treatment was performed in a mixed gas of nitrogen gas and oxygen gas at 500 ° C. for 0.5 hour. << Embodiment 7 >> (A) Etching step: Same as Embodiment 1. (B) Dechlorination treatment: Same as in Example 1. (C) Hot water treatment: Immersed in warm water of 80 ° C. for 2 minutes. (D) Preliminary heat treatment: left in the atmosphere at 200 ° C. for 1 minute. (E) Heat treatment: Heat treatment was performed for 0.03 hours in a mixed gas of nitrogen gas and oxygen gas at 500 ° C. << Embodiment 8 >> (A) Etching step: Same as Embodiment 1. (B) Dechlorination treatment: Same as in Example 1. (C) Hot water treatment: Immersed in warm water of 90 ° C. for 1 minute. (D) Preliminary heat treatment: left in the air at 250 ° C. for 1 minute. (E) Heat treatment: Heat treatment was performed in an argon gas at 400 ° C. for 12 hours. << Example 9 >> (A) Etching step: Same as Example 1. (B) Dechlorination treatment: Same as in Example 1. (C) Hot water treatment: Immersed in hot water of 98 ° C. for 0.5 minutes. (D) Preliminary heat treatment: left in the air at 250 ° C. for 0.5 minutes. (E) Heat treatment: Heat treatment was performed in the atmosphere at 400 ° C. for 12 hours. Comparative Example 1 (A) Etching Step: Same as Example 1. (B) Dechlorination treatment: Same as in Example 1. (C) Hot water treatment: Immersed in hot water of 98 ° C. for 2 minutes. (D) Preheat treatment; none. (E) Heat treatment; none. Comparative Example 2 (A) Etching Step: Same as Example 1. (B) Dechlorination treatment: Same as in Example 1. (C) Hot water treatment; none. (D) Preheat treatment; none. (E) Heat treatment; none. Comparative Example 3 (A) Etching Step: Same as Example 1. (B) Dechlorination treatment: Same as in Example 1. (C) Hot water treatment; none. (D) Preheat treatment; none. (E) Heat treatment: Heat treatment was performed in a nitrogen gas at 500 ° C. for 4 hours. Comparative Example 4 (A) Etching Step: Same as Example 1. (B) Dechlorination treatment: Same as in Example 1. (C) Phosphoric acid treatment: Immersed in 0.1% phosphoric acid aqueous solution (solution temperature 40 ° C.) for 1 minute. (D) Heat treatment: Heat treatment was performed in the air at 500 ° C. for 1 minute. (E) Dissolution treatment: Immersed in a 5% citric acid aqueous solution (liquid temperature 40 ° C.) for 2 minutes.
【００２１】上記実施例１〜９および比較例１〜４で得
られた各エッチング箔を５％アジピン酸水溶液（液温８
５℃）中で３５Ｖの化成電圧を印加して化成を行ない、
それらの単位面積当りの静電容量（μＦ／平方ｃｍ）
と、化成に要した電気量（クーロン／平方ｃｍ）を測定
した結果を表１に示す。Each of the etching foils obtained in Examples 1 to 9 and Comparative Examples 1 to 4 was treated with a 5% adipic acid aqueous solution (liquid temperature: 8).
At 5 ° C), a formation voltage of 35 V is applied to perform formation,
Capacitance per unit area (μF / square cm)
Table 1 shows the results of measuring the amount of electricity required for chemical formation (coulomb / square cm).
【００２２】次に、これらの各エッチング箔を陽極箔に
用い、セパレータを介して陰極箔とともに巻回した後、
電解液を含浸させ外装ケース内に封入して、定格２５Ｖ
・１０００μＦのアルミニウム電解コンデンサを製作し
た。なお、電解液にはアジピン酸アンモニウム１０％、
水１０％、そしてエチレングリコール８０％のものを用
いた。Next, after using each of these etching foils as an anode foil and winding the foil together with a cathode foil through a separator,
It is impregnated with electrolytic solution and enclosed in an outer case, rated at 25V.
A 1000 μF aluminum electrolytic capacitor was manufactured. In addition, 10% ammonium adipate was added to the electrolyte,
Water 10% and ethylene glycol 80% were used.
【００２３】このようにして製作した各コンデンサにつ
いて、８５℃の高温貯蔵試験を１０００時間行なった後
に漏れ電流（μＡ）を測定した。その結果を表１に併せ
て示す。Each capacitor thus manufactured was subjected to a high temperature storage test at 85 ° C. for 1000 hours, and then the leakage current (μA) was measured. The results are also shown in Table 1.
【００２４】[0024]
【表１】 [Table 1]
【００２５】[0025]
【発明の効果】以上説明したように、本発明によれば、
従来に比べて静電容量が約６〜２３％高められる。ま
た、化成電力が低減できるとともに、漏れ電流が少な
く、しかもその特性の安定した電極箔が製造される。As described above, according to the present invention,
The capacitance is increased by about 6 to 23% as compared with the conventional one. Further, the formation electric power can be reduced, the leakage current is small, and the electrode foil having stable characteristics can be manufactured.
【００２６】したがって、アルミニウム電解コンデンサ
の小型化およびコストダウン、さらには長寿命化に寄与
するところ大である。Therefore, it greatly contributes to downsizing and cost reduction of the aluminum electrolytic capacitor, and further to prolonging its life.
フロントページの続き (72)発明者 安達 和幸 神奈川県藤沢市辻堂新町２丁目２番１号 エルナ−株式会社内 (72)発明者 神保 晴男 神奈川県藤沢市辻堂新町２丁目２番１号 エルナ−株式会社内 (72)発明者 遠藤 栄治 東京都千代田区丸の内２丁目１番２号 旭 硝子株式会社内Front page continuation (72) Inventor Kazuyuki Adachi 2-2-1 Tsujido Shinmachi, Fujisawa-shi, Kanagawa Elna Co., Ltd. (72) Inventor Haruo Jimbo 2-2-1 Tsujido Shinmachi, Fujisawa, Kanagawa Elna-Share In-house (72) Inventor Eiji Endo 2-1-2 Marunouchi, Chiyoda-ku, Tokyo Asahi Glass Co., Ltd.
Claims (4)
処理を行なったエッチング箔を、温水中に浸漬して水和
処理を行ない、次に予備加熱処理を行ない、引き続き熱
処理して水和アルミナを熱分解させた後、上記エッチン
グ箔の表面に酸化皮膜を形成する化成処理を行なうこと
を特徴とするアルミニウム電解コンデンサ用電極箔の製
造方法。1. An aluminum foil foil having a roughened surface and dechlorinated etching foil is immersed in warm water for hydration treatment, followed by preliminary heating treatment and subsequent heat treatment for hydration. A method for producing an electrode foil for an aluminum electrolytic capacitor, which comprises thermally decomposing alumina and then performing a chemical conversion treatment for forming an oxide film on the surface of the etching foil.
８℃であり、かつ、その処理時間は０．３〜３０分であ
る請求項１に記載のアルミニウム電解コンデンサ用電極
箔の製造方法。2. The hot water temperature in the hydration treatment is 40-9.
The method for producing an electrode foil for an aluminum electrolytic capacitor according to claim 1, wherein the temperature is 8 ° C. and the treatment time is 0.3 to 30 minutes.
０℃であり、かつ、その処理時間は０．３〜５分である
請求項１に記載のアルミニウム電解コンデンサ用電極箔
の製造方法。3. The heating temperature of the preheating treatment is 50 to 25.
The method for producing an electrode foil for an aluminum electrolytic capacitor according to claim 1, wherein the treatment time is 0 ° C. and the treatment time is 0.3 to 5 minutes.
り、かつ、その処理時間は０．０３〜２０時間である請
求項１に記載のアルミニウム電解コンデンサ用電極箔の
製造方法。4. The method for producing an electrode foil for an aluminum electrolytic capacitor according to claim 1, wherein the temperature of the heat treatment is 230 to 550 ° C., and the treatment time is 0.03 to 20 hours.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3067868A JPH07114178B2 (en) | 1991-03-07 | 1991-03-07 | Method for manufacturing electrode foil for aluminum electrolytic capacitor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3067868A JPH07114178B2 (en) | 1991-03-07 | 1991-03-07 | Method for manufacturing electrode foil for aluminum electrolytic capacitor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04279017A JPH04279017A (en) | 1992-10-05 |
| JPH07114178B2 true JPH07114178B2 (en) | 1995-12-06 |
Family
ID=13357338
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3067868A Expired - Fee Related JPH07114178B2 (en) | 1991-03-07 | 1991-03-07 | Method for manufacturing electrode foil for aluminum electrolytic capacitor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07114178B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005347681A (en) * | 2004-06-07 | 2005-12-15 | Nichicon Corp | Method of manufacturing anode foil for aluminum electrolytic capacitor |
| JP4576192B2 (en) * | 2004-10-06 | 2010-11-04 | ニチコン株式会社 | Method for producing electrode foil for aluminum electrolytic capacitor |
| JP7227870B2 (en) * | 2019-08-02 | 2023-02-22 | ニチコン株式会社 | Manufacturing method of electrode foil for aluminum electrolytic capacitor |
| CN117079979A (en) * | 2022-05-09 | 2023-11-17 | 四川万邦电子科技有限公司 | A heat treatment method for improving the specific volume of formed foil |
-
1991
- 1991-03-07 JP JP3067868A patent/JPH07114178B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04279017A (en) | 1992-10-05 |
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