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JPH0711608B2 - How to create an optical waveguide - Google Patents
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JPH0711608B2 - How to create an optical waveguide - Google Patents

How to create an optical waveguide

Info

Publication number
JPH0711608B2
JPH0711608B2 JP57182646A JP18264682A JPH0711608B2 JP H0711608 B2 JPH0711608 B2 JP H0711608B2 JP 57182646 A JP57182646 A JP 57182646A JP 18264682 A JP18264682 A JP 18264682A JP H0711608 B2 JPH0711608 B2 JP H0711608B2
Authority
JP
Japan
Prior art keywords
substrate
waveguide
light
optical waveguide
solid material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57182646A
Other languages
Japanese (ja)
Other versions
JPS5971005A (en
Inventor
守 宮脇
繁太郎 小倉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP57182646A priority Critical patent/JPH0711608B2/en
Publication of JPS5971005A publication Critical patent/JPS5971005A/en
Publication of JPH0711608B2 publication Critical patent/JPH0711608B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13Integrated optical circuits characterised by the manufacturing method
    • G02B6/134Integrated optical circuits characterised by the manufacturing method by substitution by dopant atoms
    • G02B6/1342Integrated optical circuits characterised by the manufacturing method by substitution by dopant atoms using diffusion

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Integrated Circuits (AREA)

Description

【発明の詳細な説明】 本発明は光合成、光分波および光偏向等の機能を有する
光回路用の導波路の作成方法に関するものである。
The present invention relates to a method for producing a waveguide for an optical circuit having functions such as photosynthesis, light demultiplexing and light deflection.

従来、圧電性のすぐれた導波路基板として、強誘電体の
LiNbO3単結晶を用いる場合、以下に示す方法により光導
波路を作成してきた。上記基板上にTi膜を電子銃又はス
パツタリング等の方法で形成し、さらに熱炉中で1000℃
近辺で数時間処理し、Tiを結晶中に熱拡散することによ
り、1〜2μm厚の導波炉を形成する。しかし、上記導
波炉作成にあたつては、1000℃近辺の高温処理工程が含
まれていること、又、上記導波路に対する入力光強度が
1〜2mW(波長0.6328μmの時)を越えると、導波路に
光学損傷が生じる〔R.L.Holman,Appl.Phys.Letl,32,280
(1978)〕という欠点を有していた。
Conventionally, a ferroelectric substrate has been used as a waveguide substrate with excellent piezoelectricity.
When using a LiNbO 3 single crystal, an optical waveguide has been produced by the method shown below. A Ti film is formed on the above-mentioned substrate by a method such as an electron gun or sputtering, and then 1000 ° C in a heating furnace.
A waveguide furnace having a thickness of 1 to 2 μm is formed by performing heat treatment in the vicinity for several hours and thermally diffusing Ti into the crystal. However, when the above-mentioned waveguide furnace is made, a high-temperature treatment step at around 1000 ° C. is included, and when the input light intensity to the waveguide exceeds 1 to 2 mW (at a wavelength of 0.6328 μm). , Optical damage to the waveguide [RL Holman, Appl. Phys. Letl, 32 , 280
(1978)].

一方、上記導波路の光学損傷を低減させる方法として、
200℃〜400℃程度に加熱した強酸もしくは、水酸化物も
しくは、溶融塩中に基板を浸すものがある。〔J.Jacke
l,Appl.Phys.Letl,37,739(1980)〕 例えば溶融塩としては、TlNO3,AgNO3等があげられる
が、基板を溶融塩に完全に浸す必要のため、加熱により
有害性ガスNO2等が大量に発生するという問題点を有し
ていた。
On the other hand, as a method of reducing the optical damage of the waveguide,
In some cases, the substrate is immersed in a strong acid, hydroxide, or molten salt heated to about 200 ° C to 400 ° C. 〔J.Jacke
l, Appl.Phys.Letl, 37 , 739 (1980)] For example, molten salts include TlNO 3 and AgNO 3, but since it is necessary to completely immerse the substrate in the molten salt, the harmful gas NO There was a problem that a large amount of 2nd grade occurred.

本発明の目的は、上述した従来の光導波路の作成方法に
伴う欠点を除去した、新たなる光導波路の作成方法を提
供することにある。
An object of the present invention is to provide a new method for producing an optical waveguide, which eliminates the drawbacks associated with the conventional method for producing an optical waveguide described above.

本発明の上記目的は、基板の表面上にイオン種を含む固
体材料を上積し、この固体材料に光を照射することによ
って固体材料を加熱して融解せしめ、融解された固体材
料に含まれるイオン種を基板内に拡散させ、前記照射す
る光の基板表面での反射率もしくは透過率もしくはその
両方の変化を観測することによって基板表面の屈折率の
変化をモニターすることを特徴とする光導波路を作成す
る方法によって達成される。更に固体材料を溶かせる為
の熱を与える前に、基板全体を予備的に加熱して、或る
一定の温度、もちろんイオン種が溶解しない温度まで上
昇させておくと、効率良く光導波路が作成できる。
The above-mentioned object of the present invention is to include a solid material containing an ionic species on the surface of a substrate, and heat the solid material by irradiating the solid material with light to melt the solid material. An optical waveguide characterized by monitoring a change in the refractive index of the substrate surface by diffusing ion species into the substrate and observing a change in reflectance or transmittance or both of the irradiation light on the substrate surface. Achieved by the method of creating. Furthermore, before applying heat to melt the solid material, preheating the entire substrate to raise it to a certain temperature, of course, to a temperature at which the ionic species do not dissolve, creates an optical waveguide efficiently. it can.

本発明の導波路作成方法においては、作成過程の低温化
が図れ且つ有害性ガスの発生を低減させるとともに、光
学損傷の少ない且つ光伝搬損失の少ない光導波路を形成
の進捗の程度をモニターしながら形成することが可能で
ある。
In the method for producing a waveguide of the present invention, while lowering the temperature of the production process and reducing the generation of harmful gas, while monitoring the progress of the formation of an optical waveguide with less optical damage and less optical propagation loss. It is possible to form.

以下、本発明に関して詳述する。Hereinafter, the present invention will be described in detail.

第1図において、1はその表面に光導波路が形成される
基板、2はイオン種を形成する固体材料で、前記基板1
の上に設けられる。基板1としては、圧電性のすぐれた
強誘電体結晶であるLiNbO3,LiTaO3結晶やBK7等のガラス
でも良い。2としてはMg(NO326H2O,C6H5COOH,TlNO3,
AgNO3,KNO3,NaNO3等があげられる。
In FIG. 1, reference numeral 1 is a substrate on which an optical waveguide is formed, and 2 is a solid material for forming ionic species.
Provided on top of. The substrate 1 may be a ferroelectric crystal such as LiNbO 3 or LiTaO 3 crystal having excellent piezoelectricity, or glass such as BK7. 2 is Mg (NO 3 ) 2 6H 2 O, C 6 H 5 COOH, TlNO 3 ,
Examples include AgNO 3 , KNO 3 , NaNO 3 .

第2図は本発明に係る方式の一実施例を示す図で、3は
レーザー光源、4及び5はレンズ、6はビームスプリツ
ター、7及び8は光検出器、9は加熱炉、10は炉9にあ
けられた光に対する窓である。前記光源としては、基板
材料に対して吸収性の高い波長のレーザーが望ましく、
例えばAr,He−Ne,YAG,CO2レーザー等があげられる。レ
ーザー光源3から出射した光線11は、ビームスプリツタ
ー6を通り、レンズ4により一様な強度をもつ光束12に
拡大される。光束12は、拡散種を含む固体2を上積した
基板1の表面全体に照射され、固体2が融解すると、光
束12の一部は反射し又、その一部は透過する。反射光は
レンズ4の方へ戻り、ビームスプリツター6で検出器7
へ導かれる。一方、基板を透過した光束はレンズ5でし
ぼられ検出器8へ入射する。
FIG. 2 is a diagram showing an embodiment of the method according to the present invention, 3 is a laser light source, 4 and 5 are lenses, 6 is a beam splitter, 7 and 8 are photodetectors, 9 is a heating furnace, and 10 is It is a window for the light opened in the furnace 9. As the light source, it is desirable to use a laser having a wavelength with high absorption for the substrate material,
For example, Ar, He-Ne, YAG, CO 2 laser and the like can be mentioned. The light beam 11 emitted from the laser light source 3 passes through the beam splitter 6 and is expanded by the lens 4 into a light beam 12 having uniform intensity. The light flux 12 is applied to the entire surface of the substrate 1 on which the solid 2 containing diffused species is stacked. When the solid 2 melts, a part of the light flux 12 is reflected and a part thereof is transmitted. The reflected light returns to the lens 4 and the beam splitter 6 causes the detector 7
Be led to. On the other hand, the light flux that has passed through the substrate is squeezed by the lens 5 and enters the detector 8.

基板1の表面は、光束12により局所的に加熱され、イオ
ン交換が進み、表面近傍の屈折率が増大して導波路が形
成される。有害性ガスの発生率は、基板全体を加熱する
場合に比べて低くおさえられる。又、熱バイアスとし
て、炉9によりあらかじめ適度に熱することを併用して
も差しつかえない。前記原理により表面の屈折率が変化
すると、光束12の基板表面上での反射率および透過率が
変化するので、検出器7もしくは8で光強度の変動を観
測すれば、その時点での導波路の状態がモニターでき
る。
The surface of the substrate 1 is locally heated by the light flux 12, ion exchange proceeds, the refractive index near the surface increases, and a waveguide is formed. The generation rate of harmful gas is suppressed as compared with the case where the entire substrate is heated. Further, as the heat bias, appropriate heating in advance by the furnace 9 may be used together. When the refractive index of the surface changes according to the above-mentioned principle, the reflectance and the transmittance of the light flux 12 on the substrate surface also change. Therefore, if the fluctuation of the light intensity is observed by the detector 7 or 8, the waveguide at that time is observed. The state of can be monitored.

以上の方法により所定の導波路厚のプラナー型の導波路
が作製できる。
A planar waveguide having a predetermined waveguide thickness can be manufactured by the above method.

次に本発明を実施例により詳細に説明するが、本発明は
この実施例に限定されるものではない。
Next, the present invention will be described in detail with reference to examples, but the present invention is not limited to these examples.

実施例1 第2図を参照し、X−cut LiNbO3単結晶のy−z面を面
精度がニユートリング数本以内に収まるよう両面研摩し
た。基板の寸法はy,z方向でそれぞれ1インチ,1/2イン
チで厚さは1mmtであった。研摩後基板を超音波洗浄した
後にエタノール蒸気中で充分乾燥し、この上にTlNO3
粉体を約2g基板上面に一様にドクターブレードにより上
積した。この上積した基板を低温加熱炉中にセットし約
100℃の温度に上温し炉の窓からCO2レーザー光(出力20
watt)をSiレンズにより基板全面に光が当るように調整
したところ数分以内で基板上に上積したTlNO3が融け、
この状態でCO2レーザー光を約60分間照射することによ
りTlイオンの内部拡散により基板上にTE0モードの導波
路が形成できた。プリズムカツプリング法により作製し
た導波路の伝播損失を測定したところ、1.0db/cmの値を
得た。又光学損傷の閾値向上に関しても50%の向上が観
測され、本発明による導波路作成が従来法により優れて
いることが判明した。
Example 1 Referring to FIG. 2, the yz plane of an X-cut LiNbO 3 single crystal was double-sided polished so that the surface precision was within a few Neutring rings. The dimensions of the substrate were 1 inch and 1/2 inch in the y and z directions, respectively, and the thickness was 1 mmt. After polishing, the substrate was ultrasonically cleaned and then thoroughly dried in ethanol vapor, and about 2 g of TlNO 3 powder was uniformly deposited on the upper surface of the substrate by a doctor blade. Place this stacked substrate in a low temperature heating furnace and
CO 2 laser light (output 20
watt) was adjusted by a Si lens so that the entire surface of the substrate was exposed to light, and within a few minutes the TlNO 3 deposited on the substrate melted,
By irradiating CO 2 laser light for about 60 minutes in this state, a TE 0 mode waveguide could be formed on the substrate by the internal diffusion of Tl ions. When the propagation loss of the waveguide fabricated by the prism coupling method was measured, a value of 1.0 db / cm was obtained. Further, an improvement of 50% was also observed with respect to the improvement of the threshold value of optical damage, and it was found that the waveguide fabrication according to the present invention was superior to the conventional method.

以上説明したように、本発明による光導波路作製方法に
より光学損傷の少ないかつ光伝播損失の低い光導波路が
可能になるばかりでなく、従来の高温に熱した融液中に
基板を浸たし作製する方法に較べて、低温処理が可能に
なり、有害性ガスの発生率も抑制できる。
As described above, the optical waveguide manufacturing method according to the present invention not only enables an optical waveguide with less optical damage and low light propagation loss, but is also manufactured by immersing a substrate in a conventional melt heated to a high temperature. Compared with the method described above, low-temperature treatment becomes possible and the generation rate of harmful gas can be suppressed.

又、導波路作成時に導波路の状態を加熱用の光を観測す
ることによりモニターできる為、加熱用の光とは別のモ
ニター用の光を照射する必要がない。作成時の状態をモ
ニターできることから、励起するモードの数を制御する
ことや弾性表面波との相互作用を強くする導波路厚に制
御することも可能である。
Further, since the state of the waveguide can be monitored by observing the heating light when the waveguide is formed, it is not necessary to irradiate the monitoring light different from the heating light. Since the state at the time of fabrication can be monitored, it is also possible to control the number of excited modes and control the thickness of the waveguide to enhance the interaction with the surface acoustic wave.

【図面の簡単な説明】[Brief description of drawings]

第1図及び第2図は、本発明に係る光導波路の作成方法
の一実施例を示す為の図。 1……基板、2……拡散イオン種を含む固体、3……光
源、4,5……レンズ、6……ビームスプリツター、7,8…
…光検出器、9……加熱炉、10……窓、11,12……光
束。
FIG. 1 and FIG. 2 are views for showing an embodiment of a method for producing an optical waveguide according to the present invention. 1 ... Substrate, 2 ... Solid containing diffused ion species, 3 ... Light source, 4,5 ... Lens, 6 ... Beam splitter, 7,8 ...
… Photodetector, 9 …… Heating furnace, 10 …… Window, 11,12 …… Luminous flux.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】基板の表面からの拡散により光導波路を作
成する方法において、 前記基板の表面上にイオン種を含む固体材料を上積し、
該固体材料に光を照射することによって固体材料を加熱
して融解せしめ、融解された固体材料に含まれるイオン
種をイオン交換によって基板内に拡散させ、前記照射す
る光の基板表面上での反射率もしくは透過率もしくはそ
の両方の変化を観測することによって基板表面の屈折率
の変化をモニターすることを特徴とする光導波路の作成
方法。
1. A method for producing an optical waveguide by diffusion from the surface of a substrate, wherein a solid material containing ionic species is deposited on the surface of the substrate,
The solid material is heated and melted by irradiating the solid material with light, and the ionic species contained in the melted solid material are diffused into the substrate by ion exchange, and the irradiation light is reflected on the substrate surface. A method for producing an optical waveguide, characterized in that a change in the refractive index of the substrate surface is monitored by observing a change in the refractive index, the transmittance, or both.
JP57182646A 1982-10-18 1982-10-18 How to create an optical waveguide Expired - Lifetime JPH0711608B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57182646A JPH0711608B2 (en) 1982-10-18 1982-10-18 How to create an optical waveguide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57182646A JPH0711608B2 (en) 1982-10-18 1982-10-18 How to create an optical waveguide

Publications (2)

Publication Number Publication Date
JPS5971005A JPS5971005A (en) 1984-04-21
JPH0711608B2 true JPH0711608B2 (en) 1995-02-08

Family

ID=16121940

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57182646A Expired - Lifetime JPH0711608B2 (en) 1982-10-18 1982-10-18 How to create an optical waveguide

Country Status (1)

Country Link
JP (1) JPH0711608B2 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4894447A (en) * 1972-03-13 1973-12-05
JPS5810721B2 (en) * 1978-06-10 1983-02-26 日本電信電話株式会社 Manufacturing method of thin film optical device
JPS5627848A (en) * 1979-08-10 1981-03-18 Mitsubishi Electric Corp Balanced air circulator

Also Published As

Publication number Publication date
JPS5971005A (en) 1984-04-21

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