Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPH07120695B2 - Semiconductor integrated circuit inspection device and inspection method - Google Patents
[go: Go Back, main page]

JPH07120695B2 - Semiconductor integrated circuit inspection device and inspection method - Google Patents

Semiconductor integrated circuit inspection device and inspection method

Info

Publication number
JPH07120695B2
JPH07120695B2 JP1213849A JP21384989A JPH07120695B2 JP H07120695 B2 JPH07120695 B2 JP H07120695B2 JP 1213849 A JP1213849 A JP 1213849A JP 21384989 A JP21384989 A JP 21384989A JP H07120695 B2 JPH07120695 B2 JP H07120695B2
Authority
JP
Japan
Prior art keywords
chips
chip
inspection machine
inspection
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1213849A
Other languages
Japanese (ja)
Other versions
JPH0377342A (en
Inventor
克彦 津浦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP1213849A priority Critical patent/JPH07120695B2/en
Publication of JPH0377342A publication Critical patent/JPH0377342A/en
Publication of JPH07120695B2 publication Critical patent/JPH07120695B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明は半導体集積回路のウエハ段階で複数チップを同
時に並列して検査する検査装置および検査方法に関する
ものである。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an inspection apparatus and an inspection method for inspecting a plurality of chips simultaneously in parallel at the wafer stage of a semiconductor integrated circuit.

従来の技術 半導体集積回路は、年々、集積度が増大し、この機能検
査に長時間が必要となってきている。また機能も複雑な
ものとなり、機能検査を行う検査機も高価になってきて
いる。このため、半導体集積回路の機能検査に要するコ
ストは、年々増大してきている。このような検査コスト
を下げる方法に、複数デバイスを1つのデバイスとみた
て、検査機で発生した種々の検査条件を複数デバイスに
同時に印加して検査する同時並列検査技術がある。
2. Description of the Related Art The degree of integration of semiconductor integrated circuits is increasing year by year, and it takes a long time for this functional test. In addition, the function becomes complicated, and the inspection machine for performing the function inspection is becoming expensive. Therefore, the cost required for functional inspection of semiconductor integrated circuits is increasing year by year. As a method of reducing the inspection cost, there is a simultaneous parallel inspection technique in which a plurality of devices are regarded as one device and various inspection conditions generated by an inspection machine are simultaneously applied to the plurality of devices for inspection.

第2図はこのような従来の検査機を用いた検査方法を示
すものである。第2図において、ウエハ8上の半導体集
積回路チップ1とチップ2の電極上に同時に、プローブ
を立て、チップ1の電極上に立てられたプローブは検査
機の電圧源3と接続され、チップ2の電極上に立てられ
たプローブは検査機の電源源4と接続され、チップ1,2
の良接地電極は、検査機の接地点5に接続される。検査
機の電圧源3と電圧源4からチップ1,2に対し同時に電
圧を印加し、2つのチップの電流を同時に測定すること
ができる。
FIG. 2 shows an inspection method using such a conventional inspection machine. In FIG. 2, a probe is erected simultaneously on the electrodes of the semiconductor integrated circuit chip 1 and the chip 2 on the wafer 8, and the probe erected on the electrode of the chip 1 is connected to the voltage source 3 of the inspection machine. The probe set up on the electrode of is connected to the power source 4 of the inspection machine,
The good ground electrode of is connected to the ground point 5 of the inspection machine. Voltages can be simultaneously applied to the chips 1 and 2 from the voltage source 3 and the voltage source 4 of the inspection machine, and the currents of the two chips can be simultaneously measured.

発明が解決しようとする課題 しかしながら、同時に測定するチップは必ずしもすべて
が良品チップでなく、不良チップがある場合がある。
又、電気特性を良好にするため半導体集積回路の基板電
位を、接地レベルよりも負にする基板電位発生回路6,7
が半導体集積回路チップ1,2に組込まれている。この基
板電位発生回路6,7の出力端子は、基板上の不純物拡散
層に直接コンタクトがとられており、基板に電位を印加
している。ところが、同時に測定するチップの基板電位
発生回路6,7の1つが不良で、基板電位発生回路の出力
部がチップの接地点とリークやショートしていた場合、
基板電位発生回路が正常動作しているチップも、基板が
つながっているため、基板電位を正常な電位に保つこと
が困難で、正しい機能検査ができなくなるという問題が
あった。
However, not all chips to be measured at the same time are non-defective chips, and there may be defective chips.
Further, in order to improve the electric characteristics, the substrate potential of the semiconductor integrated circuit is set to be more negative than the ground level.
Are incorporated in the semiconductor integrated circuit chips 1 and 2. The output terminals of the substrate potential generation circuits 6 and 7 are in direct contact with the impurity diffusion layer on the substrate and apply a potential to the substrate. However, if one of the substrate potential generation circuits 6 and 7 of the chip to be measured at the same time is defective and the output part of the substrate potential generation circuit leaks or shorts to the ground point of the chip,
There is a problem in that it is difficult to maintain the substrate potential at a normal potential because a substrate is connected to a chip in which the substrate potential generation circuit operates normally, and a correct function test cannot be performed.

課題を解決するための手段 以上のような問題点を解決するため、本発明は、半導体
集積回路のウエハ段階での検査において、複数チップに
同時にプローブを立て、前記複数チップの接地端子に立
てられたプローブと検査機の接地点との間にそれぞれ電
気的接続を切りはなしができるリレー等のスイッチを入
れた検査機を用いて同時並列検査を行うようにしたもの
である。
Means for Solving the Problems In order to solve the problems as described above, the present invention provides a method in which a probe is set on a plurality of chips at the same time in a semiconductor integrated circuit wafer stage inspection, and the probe is set on a ground terminal of the plurality of chips. In addition, simultaneous parallel inspection is performed using an inspection machine in which a switch such as a relay capable of disconnecting electrical connection between the probe and the grounding point of the inspection machine is turned on.

作用 上記構成により、基板電位発生回路の出力部と接地点と
がチップ内でショートしている不良チップが同時並列検
査時に含まれていても、不良チップの接地点を検査機の
接地点から切りはなすことによって基板電位を正常に基
板に印加することが可能となる。
Operation With the above configuration, even if a defective chip in which the output part of the substrate potential generation circuit and the ground point are short-circuited within the chip is included in the simultaneous parallel inspection, the ground point of the defective chip is cut from the ground point of the inspection machine. By releasing, the substrate potential can be normally applied to the substrate.

実施例 本発明の一実施例を第1図を用いて説明する。第1図に
おいて、ウエハ10上の半導体集積回路チップ11と、チッ
プ12の電極に、同時に、プローブを立てる。チップ11の
電極上に立てられたプローブは検査機の電圧源13と接続
され、チップ12の電極上に立てられたプローブは検査機
の電圧源14と接続されている。チップ11の接地電極上に
立てられたプローブと検査機の接地点15との間にリレー
18が接続されており、チップ12の接地電極上に立てられ
たプローブと検査機の接地点15との間にリレー19が接続
された検査機にしてある。チップ11とチップ12の同時並
列検査時には、リレー18,19は閉じられている。チップ1
1とチップ12には、それぞれ基板電位発生回路16,17があ
り、同時並列検査をする前にチップ単独での基板電位発
生回路の検査をする。つまり、リレー19を開放してチッ
プ11の基板電位発生回路16を検査し、次にリレー18を開
放し、リレー19を閉じて、チップ12の基板電位発生回路
17を検査する。チップ11,チップ12の両方の基板電位発
生回路16,17が良好な時、この後、リレー18,19を閉じて
続けてチップ11とチップ12の同時並列の種々の特性検査
ができる。ここでチップ12の基板電位発生回路17が不良
であった場合、チップ11の基板電位に悪影響を与えない
ように、リレー19を開放して、チップ12の接地電極を検
査機から切りはなすことが可能となり、続けてチップ11
は正確に種々の特性検査をすることができる。
Embodiment An embodiment of the present invention will be described with reference to FIG. In FIG. 1, a probe is simultaneously set up on the electrodes of the semiconductor integrated circuit chip 11 and the chip 12 on the wafer 10. The probe set up on the electrode of the chip 11 is connected to the voltage source 13 of the inspection machine, and the probe set up on the electrode of the chip 12 is connected to the voltage source 14 of the inspection machine. A relay between the probe set up on the ground electrode of the chip 11 and the grounding point 15 of the inspection machine.
18 is connected, and a relay 19 is connected between the probe set up on the ground electrode of the chip 12 and the grounding point 15 of the inspection machine. During the simultaneous parallel inspection of the chip 11 and the chip 12, the relays 18 and 19 are closed. Chip 1
Substrate potential generation circuits 16 and 17 are provided in 1 and the chip 12, respectively, and the substrate potential generation circuits of the chips are inspected before the simultaneous parallel inspection. That is, the relay 19 is opened to inspect the substrate potential generation circuit 16 of the chip 11, then the relay 18 is opened, the relay 19 is closed, and the substrate potential generation circuit of the chip 12 is closed.
Inspect 17 When the substrate potential generating circuits 16 and 17 of both the chip 11 and the chip 12 are good, thereafter, the relays 18 and 19 are closed and various characteristic tests of the chip 11 and the chip 12 can be performed simultaneously in parallel. If the substrate potential generation circuit 17 of the chip 12 is defective, the relay 19 may be opened and the ground electrode of the chip 12 may be disconnected from the inspection machine so as not to adversely affect the substrate potential of the chip 11. Yes, chip 11
Can accurately perform various characteristic tests.

発明の効果 以上のように本発明によれば、ウエハ上で隣接するチッ
プが不良であっても、複数チップの正確な同時並列検査
を実施することが可能となる。
EFFECTS OF THE INVENTION As described above, according to the present invention, it is possible to perform accurate simultaneous parallel inspection of a plurality of chips even if the adjacent chips on the wafer are defective.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の一実施例を説明する概略図、第2図は
従来例を説明するための概略図である。 1,2,11,12……半導体集積回路チップ、8,10……ウエ
ハ、3,4,13,14……検査機の電圧源、5,15……検査機の
接地点、6,7,16,17……基板電位発生回路、18,19……リ
レー。
FIG. 1 is a schematic diagram for explaining an embodiment of the present invention, and FIG. 2 is a schematic diagram for explaining a conventional example. 1,2,11,12 …… Semiconductor integrated circuit chip, 8,10 …… Wafer, 3,4,13,14 …… Inspector voltage source, 5,15 …… Inspector ground point, 6,7 , 16,17 …… Substrate potential generation circuit, 18,19 …… Relay.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】ウエハ上に構成された複数チップの各被検
査電極に同時に立てられた複数のプローブに検査機の電
圧源をそれぞれ接続するとともに、前記複数チップの各
接地電極に立てられた複数のプローブと前記検査機の接
地点の間にそれぞれ電気的接続の切りはなしができる複
数のスイッチを挿入したことを特徴とする半導体集積回
路の検査装置。
1. A voltage source of an inspection machine is respectively connected to a plurality of probes simultaneously set up on respective electrodes to be inspected of a plurality of chips formed on a wafer, and a plurality of sets are formed on respective ground electrodes of said plurality of chips. 2. A semiconductor integrated circuit inspection device, wherein a plurality of switches capable of disconnecting electrical connection are respectively inserted between the probe and the ground point of the inspection machine.
【請求項2】ウエハ上に構成された複数チップの各被検
査電極に同時に立てられた複数のプローブに検査機の電
圧源をそれぞれ接続するとともに、前記複数チップの各
接地電極に立てられた複数のプローブと前記検査機の接
地点の間にそれぞれ電気的接続の切りはなしができる複
数のスイッチを挿入した検査機を用い、まず前記複数の
スイッチを順次1つずつ閉じて各チップ単独でそれぞれ
のチップ上に組込まれた基板電位発生回路の良,不良を
検査し、前記複数チップのすべての基板電位発生回路が
良品の場合は、その後前記複数のスイッチをすべて閉
じ、前記複数チップの各被検査電極に前記電圧源からの
電圧を同時に印加して前記複数チップを同時並列検査
し、いずれかのチップの基板電位発生回路が不良の場合
は、不良チップに対応する前記スイッチのみを開き、そ
れ以外のスイッチを閉じて良品チップのみを同時並列検
査することを特徴とする半導体集積回路の検査方法。
2. A voltage source of an inspection machine is connected to a plurality of probes simultaneously set up on respective electrodes to be inspected of a plurality of chips formed on a wafer, and a plurality of grounding electrodes are set up on respective ground electrodes of said plurality of chips. Using an inspection machine in which a plurality of switches capable of disconnecting electrical connection are inserted between the probe and the grounding point of the inspection machine, first, the plurality of switches are sequentially closed one by one, and each chip alone Inspecting the substrate potential generation circuit incorporated on the chip for good or bad, and if all the substrate potential generation circuits of the plurality of chips are good products, then close all of the plurality of switches and inspect each of the plurality of chips. Simultaneous parallel testing of multiple chips by applying voltage from the voltage source to the electrodes at the same time, and if the substrate potential generation circuit of any of the chips is defective, respond to the defective chip Said switch opening only, method of inspecting a semiconductor integrated circuit, characterized in that close to the other switches are concurrently examined only good chips that.
JP1213849A 1989-08-18 1989-08-18 Semiconductor integrated circuit inspection device and inspection method Expired - Lifetime JPH07120695B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1213849A JPH07120695B2 (en) 1989-08-18 1989-08-18 Semiconductor integrated circuit inspection device and inspection method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1213849A JPH07120695B2 (en) 1989-08-18 1989-08-18 Semiconductor integrated circuit inspection device and inspection method

Publications (2)

Publication Number Publication Date
JPH0377342A JPH0377342A (en) 1991-04-02
JPH07120695B2 true JPH07120695B2 (en) 1995-12-20

Family

ID=16646036

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1213849A Expired - Lifetime JPH07120695B2 (en) 1989-08-18 1989-08-18 Semiconductor integrated circuit inspection device and inspection method

Country Status (1)

Country Link
JP (1) JPH07120695B2 (en)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57128938A (en) * 1981-02-04 1982-08-10 Yamagata Nippon Denki Kk Device for measuring characteristic of semiconductor
JPS6118144A (en) * 1984-07-04 1986-01-27 Mitsubishi Electric Corp Semiconductor device measuring apparatus

Also Published As

Publication number Publication date
JPH0377342A (en) 1991-04-02

Similar Documents

Publication Publication Date Title
CN100432687C (en) Inspection method and inspection apparatus
CN115236483B (en) A testing device, a failure analysis method, and a testing system
JP2005005331A (en) Inspection method and inspection apparatus
JPH0285772A (en) Method and device for inspecting semiconductor element
JPH07120695B2 (en) Semiconductor integrated circuit inspection device and inspection method
JPS6348185B2 (en)
JP3495835B2 (en) Semiconductor integrated circuit device and inspection method thereof
US7535243B2 (en) Method and program for controlling an apparatus for measurement of characteristics of a semiconductor device under test
JPH0689932A (en) Power MOSFET burn-in device
Zulkifli et al. Defect Finding for Power-Related Failure Due to Internal Circuitry Issue
CN223229702U (en) Test structure and integrated circuit for electrical property detection
JPH0541419A (en) Estimation method of test equipment
JP2003232833A (en) Test method
TW563220B (en) Method for picking defected dielectric in semiconductor device
JPH07321174A (en) Semiconductor inspection device
Kodali et al. Application of EBAC on Small Nets
KR100934793B1 (en) Semiconductor device test method and apparatus and proper stress voltage detection method
JPS6371669A (en) Inspecting method for electronic circuit device
Alag et al. Utilizing Voltage Sensing as an Aid in Static Fault Isolation
JP2963234B2 (en) High-speed device test method
JPS587573A (en) Testing method of ic
JP2004170126A (en) Node logic fixing circuit and IDDQ test method
Kodali et al. Gate leakage characterization and fail mode analysis on 20 nm technology Parametric Test Structures
CN118655437A (en) A high voltage switch matrix and wafer testing system suitable for wafer testing
JP2591453B2 (en) Burn-in board inspection apparatus and burn-in board inspection method

Legal Events

Date Code Title Description
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20071220

Year of fee payment: 12

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081220

Year of fee payment: 13

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20091220

Year of fee payment: 14

EXPY Cancellation because of completion of term
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20091220

Year of fee payment: 14