JPH07121951B2 - Purification method of cephalosporin antibiotics - Google Patents
Purification method of cephalosporin antibioticsInfo
- Publication number
- JPH07121951B2 JPH07121951B2 JP62085949A JP8594987A JPH07121951B2 JP H07121951 B2 JPH07121951 B2 JP H07121951B2 JP 62085949 A JP62085949 A JP 62085949A JP 8594987 A JP8594987 A JP 8594987A JP H07121951 B2 JPH07121951 B2 JP H07121951B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- methyl
- acid
- desolvation
- carbon dioxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229930186147 Cephalosporin Natural products 0.000 title claims description 54
- 229940124587 cephalosporin Drugs 0.000 title claims description 54
- 238000000034 method Methods 0.000 title claims description 50
- 150000001780 cephalosporins Chemical class 0.000 title description 4
- 239000003242 anti bacterial agent Substances 0.000 title description 2
- 229940088710 antibiotic agent Drugs 0.000 title 1
- 238000000746 purification Methods 0.000 title 1
- -1 cephalosporin compound Chemical class 0.000 claims description 146
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 68
- 239000001569 carbon dioxide Substances 0.000 claims description 34
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 34
- 239000007787 solid Substances 0.000 claims description 27
- 239000003960 organic solvent Substances 0.000 claims description 11
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 54
- 238000004807 desolvation Methods 0.000 description 33
- 125000004432 carbon atom Chemical group C* 0.000 description 29
- 125000000217 alkyl group Chemical group 0.000 description 28
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 21
- 125000002252 acyl group Chemical group 0.000 description 21
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 21
- 125000000623 heterocyclic group Chemical group 0.000 description 19
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 18
- 239000002904 solvent Substances 0.000 description 17
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 14
- 125000003118 aryl group Chemical group 0.000 description 13
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 12
- 125000001424 substituent group Chemical group 0.000 description 12
- 125000003545 alkoxy group Chemical group 0.000 description 11
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 11
- 125000003006 2-dimethylaminoethyl group Chemical group [H]C([H])([H])N(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
- 125000004423 acyloxy group Chemical group 0.000 description 9
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 8
- 229910052717 sulfur Inorganic materials 0.000 description 8
- 125000004434 sulfur atom Chemical group 0.000 description 8
- 125000003277 amino group Chemical group 0.000 description 7
- 238000001035 drying Methods 0.000 description 7
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 7
- 125000004433 nitrogen atom Chemical group N* 0.000 description 7
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 235000019441 ethanol Nutrition 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 6
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 125000004430 oxygen atom Chemical group O* 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 125000006239 protecting group Chemical group 0.000 description 6
- VMHPUGMXEREVFV-UHFFFAOYSA-N 2-(2-amino-1,3-thiazol-4-yl)acetamide Chemical compound NC(=O)CC1=CSC(N)=N1 VMHPUGMXEREVFV-UHFFFAOYSA-N 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 5
- 229940125904 compound 1 Drugs 0.000 description 5
- 238000004817 gas chromatography Methods 0.000 description 5
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 125000003542 3-methylbutan-2-yl group Chemical group [H]C([H])([H])C([H])(*)C([H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 125000004849 alkoxymethyl group Chemical group 0.000 description 4
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 4
- 150000001735 carboxylic acids Chemical class 0.000 description 4
- 230000003247 decreasing effect Effects 0.000 description 4
- 230000018044 dehydration Effects 0.000 description 4
- 238000006297 dehydration reaction Methods 0.000 description 4
- 150000002148 esters Chemical group 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 230000007062 hydrolysis Effects 0.000 description 4
- 238000006460 hydrolysis reaction Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 4
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- 125000006569 (C5-C6) heterocyclic group Chemical group 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 125000002723 alicyclic group Chemical group 0.000 description 3
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 125000003342 alkenyl group Chemical group 0.000 description 3
- 125000003302 alkenyloxy group Chemical group 0.000 description 3
- 125000003282 alkyl amino group Chemical group 0.000 description 3
- 125000004414 alkyl thio group Chemical group 0.000 description 3
- 125000002947 alkylene group Chemical group 0.000 description 3
- XSCHRSMBECNVNS-UHFFFAOYSA-N benzopyrazine Chemical group N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 235000009508 confectionery Nutrition 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 239000003814 drug Substances 0.000 description 3
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000004128 high performance liquid chromatography Methods 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 3
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 3
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical compound C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 2
- UQRONKZLYKUEMO-UHFFFAOYSA-N 4-methyl-1-(2,4,6-trimethylphenyl)pent-4-en-2-one Chemical group CC(=C)CC(=O)Cc1c(C)cc(C)cc1C UQRONKZLYKUEMO-UHFFFAOYSA-N 0.000 description 2
- KDCGOANMDULRCW-UHFFFAOYSA-N 7H-purine Chemical compound N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- YVHAIVPPUIZFBA-UHFFFAOYSA-N Cyclopentylacetic acid Chemical compound OC(=O)CC1CCCC1 YVHAIVPPUIZFBA-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- 229930182555 Penicillin Natural products 0.000 description 2
- JGSARLDLIJGVTE-MBNYWOFBSA-N Penicillin G Chemical compound N([C@H]1[C@H]2SC([C@@H](N2C1=O)C(O)=O)(C)C)C(=O)CC1=CC=CC=C1 JGSARLDLIJGVTE-MBNYWOFBSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- 125000000738 acetamido group Chemical group [H]C([H])([H])C(=O)N([H])[*] 0.000 description 2
- 235000011054 acetic acid Nutrition 0.000 description 2
- 125000005042 acyloxymethyl group Chemical group 0.000 description 2
- 125000000676 alkoxyimino group Chemical class 0.000 description 2
- 125000004656 alkyl sulfonylamino group Chemical group 0.000 description 2
- 125000005129 aryl carbonyl group Chemical group 0.000 description 2
- 125000005199 aryl carbonyloxy group Chemical class 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- GWYFCOCPABKNJV-UHFFFAOYSA-N beta-methyl-butyric acid Natural products CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- LJOODBDWMQKMFB-UHFFFAOYSA-N cyclohexylacetic acid Chemical compound OC(=O)CC1CCCCC1 LJOODBDWMQKMFB-UHFFFAOYSA-N 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 125000004663 dialkyl amino group Chemical group 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 125000005745 ethoxymethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])* 0.000 description 2
- 125000006351 ethylthiomethyl group Chemical group [H]C([H])([H])C([H])([H])SC([H])([H])* 0.000 description 2
- 239000000284 extract Substances 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 2
- 125000004092 methylthiomethyl group Chemical group [H]C([H])([H])SC([H])([H])* 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 229940049954 penicillin Drugs 0.000 description 2
- 239000003208 petroleum Substances 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 108090000765 processed proteins & peptides Proteins 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 238000004445 quantitative analysis Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- 125000004055 thiomethyl group Chemical group [H]SC([H])([H])* 0.000 description 2
- 125000003944 tolyl group Chemical group 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- 125000005023 xylyl group Chemical group 0.000 description 2
- QBYIENPQHBMVBV-HFEGYEGKSA-N (2R)-2-hydroxy-2-phenylacetic acid Chemical compound O[C@@H](C(O)=O)c1ccccc1.O[C@@H](C(O)=O)c1ccccc1 QBYIENPQHBMVBV-HFEGYEGKSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- 125000005919 1,2,2-trimethylpropyl group Chemical group 0.000 description 1
- FNQJDLTXOVEEFB-UHFFFAOYSA-N 1,2,3-benzothiadiazole Chemical compound C1=CC=C2SN=NC2=C1 FNQJDLTXOVEEFB-UHFFFAOYSA-N 0.000 description 1
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- FLBAYUMRQUHISI-UHFFFAOYSA-N 1,8-naphthyridine Chemical group N1=CC=CC2=CC=CN=C21 FLBAYUMRQUHISI-UHFFFAOYSA-N 0.000 description 1
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 1
- ONZWFHWHTYZZLM-UHFFFAOYSA-N 1-chloroethyl cyclohexyl carbonate Chemical compound CC(Cl)OC(=O)OC1CCCCC1 ONZWFHWHTYZZLM-UHFFFAOYSA-N 0.000 description 1
- JQCSUVJDBHJKNG-UHFFFAOYSA-N 1-methoxy-ethyl Chemical group C[CH]OC JQCSUVJDBHJKNG-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
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- UYWQUFXKFGHYNT-UHFFFAOYSA-N phenylmethyl ester of formic acid Natural products O=COCC1=CC=CC=C1 UYWQUFXKFGHYNT-UHFFFAOYSA-N 0.000 description 1
- LFSXCDWNBUNEEM-UHFFFAOYSA-N phthalazine Chemical group C1=NN=CC2=CC=CC=C21 LFSXCDWNBUNEEM-UHFFFAOYSA-N 0.000 description 1
- 125000005633 phthalidyl group Chemical group 0.000 description 1
- IUGYQRQAERSCNH-UHFFFAOYSA-N pivalic acid Chemical compound CC(C)(C)C(O)=O IUGYQRQAERSCNH-UHFFFAOYSA-N 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- KOODSCBKXPPKHE-UHFFFAOYSA-N propanethioic s-acid Chemical compound CCC(S)=O KOODSCBKXPPKHE-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005767 propoxymethyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])[#8]C([H])([H])* 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004742 propyloxycarbonyl group Chemical group 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
- 125000002098 pyridazinyl group Chemical group 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 235000009518 sodium iodide Nutrition 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- KQNIHGRLKDHWJB-UHFFFAOYSA-N tert-butyl n-[4-(bromomethyl)phenyl]-n-[(2-methylpropan-2-yl)oxycarbonyl]carbamate Chemical compound CC(C)(C)OC(=O)N(C(=O)OC(C)(C)C)C1=CC=C(CBr)C=C1 KQNIHGRLKDHWJB-UHFFFAOYSA-N 0.000 description 1
- 125000005931 tert-butyloxycarbonyl group Chemical group [H]C([H])([H])C(OC(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- 125000003831 tetrazolyl group Chemical group 0.000 description 1
- VLLMWSRANPNYQX-UHFFFAOYSA-N thiadiazole Chemical compound C1=CSN=N1.C1=CSN=N1 VLLMWSRANPNYQX-UHFFFAOYSA-N 0.000 description 1
- 125000001113 thiadiazolyl group Chemical group 0.000 description 1
- YGNGABUJMXJPIJ-UHFFFAOYSA-N thiatriazole Chemical compound C1=NN=NS1 YGNGABUJMXJPIJ-UHFFFAOYSA-N 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 125000000464 thioxo group Chemical group S=* 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/54—Improvements relating to the production of bulk chemicals using solvents, e.g. supercritical solvents or ionic liquids
Landscapes
- Cephalosporin Compounds (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は、セファロスポリン化合物の精製法、殊に溶媒
を含有する固状のセファロスポリン化合物の脱溶媒化法
に関する。TECHNICAL FIELD The present invention relates to a method for purifying a cephalosporin compound, and more particularly to a method for desolvating a solid cephalosporin compound containing a solvent.
従来技術及び発明が解決しようとする問題点 セファロスポリン化合物の製造過程においてはしばしば
各種の有機溶媒(例えばテトラヒドロフラン,アセトニ
トリル,アセトン等)が使用されるが、医薬品の特性
上、製品として仕上げるまでに残存する有機溶媒をほぼ
完全に除去しなければならない。Problems to be Solved by the Prior Art and Invention Various organic solvents (eg, tetrahydrofuran, acetonitrile, acetone, etc.) are often used in the manufacturing process of cephalosporin compounds, but due to the characteristics of pharmaceuticals, it is necessary to prepare them as products. The remaining organic solvent should be removed almost completely.
医薬品の工業的脱溶媒法としては医薬品が通常熱的に不
安定なことから比較的低温(通常20から50℃)下での真
空脱溶媒法や乾燥気体による気流脱溶媒法が一般的に用
いられている。As the industrial desolvation method for pharmaceuticals, the vacuum desolvation method at a relatively low temperature (usually 20 to 50 ° C) and the stream desolvation method using a dry gas are generally used because the pharmaceuticals are usually thermally unstable. Has been.
しかしながらセファロスポリン化合物は一般に有機溶媒
と強い親和性を示すため、これらの方法は脱溶媒化が不
十分となる、あるいはセファロスポリン化合物の分解が
生ずるなどの欠点を有している。However, since cephalosporin compounds generally have strong affinity with organic solvents, these methods have drawbacks such as insufficient desolvation or decomposition of the cephalosporin compound.
又減圧下に水蒸気流と接触させる方法(特開昭55-10258
5)や常圧下適当な温度および湿度に調整された加湿気
体と接触させる方法など、有機溶媒を水と置換すること
により脱溶媒する方法(以後加湿脱溶媒法と称する)が
知られている。In addition, a method of contacting with a steam flow under reduced pressure (JP-A-55-10258)
There are known methods for desolvation by substituting water for the organic solvent (hereinafter referred to as humidification desolvation method), such as 5) and a method of contacting with a humidified body adjusted to an appropriate temperature and humidity under normal pressure.
しかしながらセファロスポリン化合物に加湿脱溶媒法を
適用する場合、長時間高湿度の雰囲気に放置するために
吸湿して飴状化したり、比較的低温下でも一部分解を生
ずることがある。即ち加湿脱溶媒法において脱溶媒を効
率よく進めるためには脱溶媒操作中セファロスポリン化
合物の含水率をかなり高く維持する必要があり、また操
作時間も多くの場合必要になる脱溶媒後の乾燥を含める
とかなりの長時間にならざるを得ず(一般的にはセファ
ロスポリン化合物の含水率が5から15%に達するのを許
容し、温度20から40℃,操作時間10から30時間の条件で
脱溶媒,乾燥を連続して行なう)、このような条件の下
ではセファロスポリン化合物は飴状化したり、許容限度
を越える分解が起るなど著しい品質劣化を来たす。特に
工業的規模で加湿脱溶媒を実施する場合、粉体層内の含
水率や温度にばらつきを生じ易く、部分的に含水率や温
度が高くなった所で飴状化などの変質が起りがちであ
る。このため湿潤状態で不安定な物質に対して加湿脱溶
媒法を適用するのは困難である。However, when the humidification desolvation method is applied to the cephalosporin compound, it may be absorbed into moisture to form a candy because it is left in a high-humidity atmosphere for a long time, or partially decomposed even at a relatively low temperature. That is, in the humidification desolvation method, in order to efficiently proceed with desolvation, it is necessary to maintain the water content of the cephalosporin compound considerably high during desolvation operation, and also the operation time is often required drying after desolvation. If you include the above, it will take a considerably long time (generally, the water content of the cephalosporin compound is allowed to reach 5 to 15%, the temperature is 20 to 40 ° C, and the operation time is 10 to 30 hours. Desolvation and drying are carried out continuously under the conditions), and under such conditions, the cephalosporin compound becomes a candy-like substance, and its quality is remarkably deteriorated by decomposition exceeding an allowable limit. In particular, when carrying out humidification desolvation on an industrial scale, variations in water content and temperature in the powder layer are likely to occur, and alteration such as candy formation tends to occur partially where the water content or temperature rises. Is. Therefore, it is difficult to apply the humidification desolvation method to a substance that is unstable in a wet state.
問題点を解決するための手段 本発明者らはこのような問題を克服すべくセファロスポ
リン化合物の精製法,殊に脱溶媒法に関し種々検討の結
果、意外にも温度および圧力に関し超臨界状態にある二
酸化炭素を固状(例えば結晶または粉末状)のセファロ
スポリン化合物に通すことにより乾燥状態で効率よく有
機溶媒を抽出除去し得ることを見い出し本発明を完成す
るに至った。Means for Solving the Problems The inventors of the present invention have made various investigations on a method for purifying a cephalosporin compound, particularly a desolvation method, in order to overcome such a problem. It was found that the organic solvent can be efficiently extracted and removed in a dry state by passing the carbon dioxide present in 1) through a solid (for example, crystalline or powdery) cephalosporin compound, and completed the present invention.
即ち、本発明は有機溶媒を含有する固状のセファロスポ
リン化合物を超臨界二酸化炭素で脱溶媒することを特徴
とするセファロスポリン化合物の精製法に関する。That is, the present invention relates to a method for purifying a cephalosporin compound, which comprises desolvating a solid cephalosporin compound containing an organic solvent with supercritical carbon dioxide.
本発明の方法によれば有機溶媒と親和性の強いセファロ
スポリン化合物に対して加湿することなく脱溶媒が可能
であり、又水による分解を受け易い、或いは吸湿して容
易に飴状化するようなセファロスポリン化合物に対して
も何ら問題なく本法を適用することができる。According to the method of the present invention, a cephalosporin compound having a strong affinity with an organic solvent can be desolvated without being humidified, and is easily decomposed by water, or easily absorbs moisture to form a candy form. The method can be applied to such a cephalosporin compound without any problem.
本発明方法は加湿脱溶媒法で必要とする脱溶媒後の乾燥
工程を行わないので乾燥期間中の品質劣化を防止し得る
とともに生産性を向上させることができる。以上の説明
のように本発明の方法は加湿脱溶媒法の適用が困難な場
合に最も効果的に適用される。Since the method of the present invention does not perform the drying step after desolvation which is required in the humidification desolvation method, it is possible to prevent quality deterioration during the drying period and improve productivity. As described above, the method of the present invention is most effectively applied when it is difficult to apply the humidification desolvation method.
本発明方法は抽出器に固状のセファロスポリン化合物を
充填しこれに超臨界二酸化炭素を連続的にまたは断続的
に通過させ、超臨界二酸化炭素で固状のセファロスポリ
ン化合物に含まれる溶媒を抽出することにより行なわれ
る。本発明に用いられる抽出器は耐圧容器であり通常温
度調節機構を有する。耐圧性能としては二酸化炭素の臨
界圧力75.3kg/cm2(絶対圧力)以上の圧力に耐えること
が必要であるが通常約100から500kg/cm2である。抽出器
の形状は特に限定されないがガス出入口ノズル,固状の
セファロスポリン化合物を充填取り出しのためのノズル
または蓋を有する竪型円筒槽が好ましい。また抽出器内
には固状のセファロスポリン化合物を保持する機構が必
要であるが固状のセファロスポリン化合物の粒度,腐蝕
性,仕込み,取り出しの操作性,設備の経済性の観点か
ら種々の型式のものを選定しうる。例えば槽底部に目皿
を設け、ろ布や金属網(例、ステンレス製)を張って保
持する方法,多孔性焼結金属(例、ステンレス)やセラ
ミック製フィルターを設置する方法,底部に金属網
(例、ステンレス製)やろ布を張った円筒容器に固状の
セファロスポリン化合物を充填しこれを抽出器内に装着
する方法などから目的に応じて最適な方式を選定し得
る。In the method of the present invention, a solid cephalosporin compound is packed in an extractor and supercritical carbon dioxide is continuously or intermittently passed through the extractor, and the solvent contained in the solid cephalosporin compound is supercritical carbon dioxide. Is extracted. The extractor used in the present invention is a pressure resistant container and usually has a temperature control mechanism. For pressure resistance, it is necessary to withstand pressures above the critical pressure of carbon dioxide of 75.3 kg / cm 2 (absolute pressure), but it is usually about 100 to 500 kg / cm 2 . The shape of the extractor is not particularly limited, but a vertical cylindrical tank having a gas inlet / outlet nozzle, a nozzle for filling and discharging a solid cephalosporin compound, or a lid is preferable. In addition, a mechanism for holding solid cephalosporin compounds is required in the extractor, but various types of solid cephalosporin compounds are required from the viewpoints of particle size, corrosivity, operability for charging and discharging, and facility economics. You can select the type of For example, a method of installing a perforated plate on the bottom of the tank and stretching and holding a filter cloth or a metal net (eg, stainless steel), a method of installing a porous sintered metal (eg, stainless steel) or a ceramic filter, a metal net on the bottom The optimum method can be selected according to the purpose, for example, by filling a solid cephalosporin compound in a cylindrical container covered with a filter cloth (for example, made of stainless steel) and mounting it in the extractor.
本発明の方法で用いられる装置の内最も簡単な装置の例
を第1図及び第2図に示す。An example of the simplest device used in the method of the present invention is shown in FIGS.
第1図は、二酸化炭素ボンベの上部からガス状の二酸化
炭素を供給する例、第2図は、二酸化炭素ボンベの底部
から直接液化二酸化炭素を供給する例を示す。FIG. 1 shows an example in which gaseous carbon dioxide is supplied from the upper part of the carbon dioxide cylinder, and FIG. 2 shows an example in which liquefied carbon dioxide is directly supplied from the bottom part of the carbon dioxide cylinder.
第1図,第2図においては超臨界二酸化炭素を抽出器1
上部から下方へ流しているがこの逆でも構わない。この
場合は粉末状のセファロスポリン化合物のロスをなくし
また排気系の配管や弁の閉塞を防止するために容器内上
部または容器出口真近にフィルターを設置するのが好ま
しい。In FIG. 1 and FIG. 2, the supercritical carbon dioxide extractor 1
It flows from the upper part to the lower part, but the reverse is also possible. In this case, it is preferable to install a filter in the upper part of the container or in the vicinity of the container outlet in order to prevent loss of the powdery cephalosporin compound and prevent clogging of the exhaust system piping and valves.
本発明方法で用いられる超臨界二酸化炭素とは、臨界温
度31.1℃及び臨界圧力75.3kg/cm2(絶対圧力)以上の状
態にある二酸化炭素を意味する。The supercritical carbon dioxide used in the method of the present invention means carbon dioxide in a state of a critical temperature of 31.1 ° C. and a critical pressure of 75.3 kg / cm 2 (absolute pressure) or more.
本発明方法で用いられる超臨界二酸化炭素は、二酸化炭
素の臨界温度31.1℃以上であればよいが、温度の制御
性,セファロスポリン化合物の熱安定性などの点から35
から50℃程度が好ましい。又超臨界二酸化炭素の圧力は
二酸化炭素の臨界圧力75.3kg/cm2(絶対圧力)以上であ
ればよいが、圧力の制御性,経済性などの観点から80か
ら300kg/cm2(絶対圧力)程度が好ましい。また超臨界
二酸化炭素の流量は、特に制限はないが、通常固状のセ
ファロスポリン化合物1kg当り0.5から50kg/時間程度が
適当である。The supercritical carbon dioxide used in the method of the present invention may have a critical temperature of carbon dioxide of 31.1 ° C. or higher, but from the viewpoint of temperature controllability, thermal stability of the cephalosporin compound, etc.
It is preferably about 50 ° C. The supercritical carbon dioxide pressure may be at least 75.3 kg / cm 2 (absolute pressure) of carbon dioxide, but 80 to 300 kg / cm 2 (absolute pressure) from the viewpoint of pressure controllability and economy. A degree is preferable. The flow rate of supercritical carbon dioxide is not particularly limited, but is usually 0.5 to 50 kg / hour per 1 kg of solid cephalosporin compound.
また超臨界二酸化炭素を加湿して使用したり、あらかじ
め固状のセファロスポリン化合物の含湿度を調整した上
で脱溶媒を行なうなど従来の加湿脱溶媒法と同様の条件
をとることも出来る。例えば超臨界二酸化炭素に対して
約0.1から5%(W/W%)の水蒸気を含有させたり、固状
のセファロスポリン化合物に乾燥後のセファロスポリン
化合物得量の5から50%(W/W%)の水分を含湿させ超
臨界二酸化炭素で脱溶媒化を行なってもよい。It is also possible to use the same conditions as in the conventional humidification desolvation method, such as using humidified supercritical carbon dioxide, or performing desolvation after adjusting the moisture content of the solid cephalosporin compound in advance. For example, about 0.1 to 5% (W / W%) of water vapor is added to supercritical carbon dioxide, or solid cephalosporin compound is dried at 5 to 50% (W / W%) of water may be included for desolvation with supercritical carbon dioxide.
本発明方法で用いられる固状のセファロスポリン化合物
とは、溶媒を含有する固状(結晶状,粉末状)のセファ
ロスポリン化合物を意味する。ここにおいて固状のセフ
ァロスポリン化合物に含有される溶媒としては、セファ
ロスポリン化合物製造に際し一般的に使用される有機溶
媒,例えばメチルアルコール,エチルアルコール,n−プ
ロピルアルコール,イソプロピルアルコールなどの低級
アルコール類、ジエチルエーテル,イソプロピルエーテ
ル,ジオキサン,テトラヒドロフランなどのエーテル
類、酢酸メチル,酢酸エチルなどの炭素数1から3の脂
肪酸エステル類、アセトン,メチルエチルケトン,メチ
ルイソブチルケトンなどのケトン類、ジクロルメタン,
ジクロルエタン,クロロホルム,四塩化炭素などのハロ
ゲン化炭化水素類、石油ベンジン,石油エーテル,n−ヘ
キサン,シクロヘキサンなどの脂肪族炭化水素類、ベン
ゼン,トルエン,キシレンなどの芳香族炭化水素類、ア
セトニトリル,プロピオニトリルなどのニトリル類があ
げられる。The solid cephalosporin compound used in the method of the present invention means a solid (crystalline or powdery) cephalosporin compound containing a solvent. Here, the solvent contained in the solid cephalosporin compound is an organic solvent generally used in the production of cephalosporin compounds, for example, a lower alcohol such as methyl alcohol, ethyl alcohol, n-propyl alcohol or isopropyl alcohol. Ethers such as diethyl ether, isopropyl ether, dioxane and tetrahydrofuran, fatty acid esters having 1 to 3 carbon atoms such as methyl acetate and ethyl acetate, ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, dichloromethane,
Halogenated hydrocarbons such as dichloroethane, chloroform and carbon tetrachloride, petroleum benzines, petroleum ethers, aliphatic hydrocarbons such as n-hexane and cyclohexane, aromatic hydrocarbons such as benzene, toluene and xylene, acetonitrile and propylene. Examples include nitriles such as pionitrile.
本発明方法によれば、固状のセファロスポリン化合物か
ら上記の溶媒を容易にかつ効率良く脱溶媒化することが
でき、又固状のセファロスポリン化合物が複数の溶媒を
含有する場合、これらの溶媒は同時に脱溶媒することが
できる。固状のセファロスポリン化合物は、あらかじめ
粉砕して粉末状とした後用いるのが好ましい。According to the method of the present invention, the solvent can be easily and efficiently desolvated from a solid cephalosporin compound, and when the solid cephalosporin compound contains a plurality of solvents, these The solvent can be desolvated at the same time. The solid cephalosporin compound is preferably used after being pulverized into a powder form in advance.
本方法で用いられる固状のセファロスポリン化合物は第
1世代〜第4世代のセファロスポリン化合物のいずれで
あってもよい。好ましいセファロスポリン化合物を具体
的に示せば、例えば一般式 [式中、R1はアシル基、R2は水素原子,アルコキシメチ
ル基,アルキルチオメチル基,アシルオキシメチル基,
カルバモイルオキシメチル基,アルケニル基,複素環メ
チル基または複素環チオメチル基、R3は水素原子又はエ
ステル残基、R4は水素原子またはメチル基、Zは酸素原
子または硫黄原子を示す]で表わされる化合物またはそ
の塩である。The solid cephalosporin compound used in the present method may be any of the first to fourth generation cephalosporin compounds. Specific examples of preferred cephalosporin compounds include those represented by the general formula: [Wherein R 1 is an acyl group, R 2 is a hydrogen atom, an alkoxymethyl group, an alkylthiomethyl group, an acyloxymethyl group,
A carbamoyloxymethyl group, an alkenyl group, a heterocyclic methyl group or a heterocyclic thiomethyl group, R 3 is a hydrogen atom or an ester residue, R 4 is a hydrogen atom or a methyl group, and Z is an oxygen atom or a sulfur atom] The compound or a salt thereof.
上記においてR1で示されるアシル基としては、有機カル
ボン酸から誘導されるアシル基で、例えば一般にペニシ
リン誘導体の6位及びセファロスポリン誘導体の7位に
置換されているアシルアミノ基を構成するアシル基が用
いられる。In the above, the acyl group represented by R 1 is an acyl group derived from an organic carboxylic acid, for example, an acyl group constituting an acylamino group generally substituted at the 6-position of a penicillin derivative and the 7-position of a cephalosporin derivative. Is used.
上記の有機カルボン酸としては、例えば直鎖,分枝状も
しくは環状の、飽和もしくは不飽和の炭素鎖中に酸素原
子もしくは硫黄原子が介在し又は介在しない脂肪族カル
ボン酸;及びこれらの脂肪族カルボン酸が酸素原子もし
くは硫黄原子を介して、または介さずに芳香族炭素水素
残基もしくは複素環基と結合した芳香脂肪族カルボン
酸,芳香族オキシ脂肪族カルボン酸,芳香族チオ脂肪族
カルボン酸,複素環置換脂肪族カルボン酸,複素環オキ
シ脂肪族カルボン酸,複素環チオ脂肪族カルボン酸;な
らびに芳香族カルボン酸;複素環カルボン酸等の有機カ
ルボン酸が用いられる。Examples of the above-mentioned organic carboxylic acid include, for example, linear, branched or cyclic, saturated or unsaturated carbon chains in which an oxygen atom or a sulfur atom is present or not, and these aliphatic carboxylic acids. An aromatic aliphatic carboxylic acid, an aromatic oxyaliphatic carboxylic acid, an aromatic thioaliphatic carboxylic acid in which an acid is bonded to an aromatic carbon hydrogen residue or a heterocyclic group through an oxygen atom or a sulfur atom or not Heterocyclic-substituted aliphatic carboxylic acids, heterocyclic oxyaliphatic carboxylic acids, heterocyclic thioaliphatic carboxylic acids; and aromatic carboxylic acids; organic carboxylic acids such as heterocyclic carboxylic acids are used.
ここで脂肪族カルボン酸としては、ぎ酸,酢酸,プロピ
オン酸,ブタン酸,イソブタン酸,ペンタン酸,イソペ
ンタン酸,ピバリン酸,ヘキサン酸,シクロヘキサン
酸,アクリル酸,クロトン酸,シクロペンタン酢酸,シ
クロヘキサン酢酸,シクロヘプタン酢酸,シクロヘキサ
ンプロピオン酸,シクロヘキセン酢酸,シクロヘキサジ
エン酢酸,メトキシ酢酸,シクロヘキシルオキシ酢酸,
メチルチオ酢酸等が用いられる。Here, as the aliphatic carboxylic acid, formic acid, acetic acid, propionic acid, butanoic acid, isobutanoic acid, pentanoic acid, isopentanoic acid, pivalic acid, hexanoic acid, cyclohexanoic acid, acrylic acid, crotonic acid, cyclopentane acetic acid, cyclohexane acetic acid , Cycloheptane acetic acid, cyclohexane propionic acid, cyclohexene acetic acid, cyclohexadiene acetic acid, methoxyacetic acid, cyclohexyloxyacetic acid,
Methylthioacetic acid or the like is used.
また上記の有機カルボン酸における芳香族炭化水素残基
及び芳香族基としてはフェニル,ナフチル,トリル,キ
シリル,メシチル,クメニル等が用いられ、さらに上記
の有機カルボン酸における複素環基としては、例えばフ
ラン,チオフェン,ピロール,ピラゾール,イミダゾー
ル,トリアゾール,チアゾール,イソチアゾール,2−イ
ミノチアゾリン,2−オキソチアゾリン,メチレン−1,3
−ジチエタン,2,3−ジヒドロ−1,4−オキサチイイン,1,
4−ジチアンナフタレン,ジヒドロ−1,3−ジチイン,オ
キサゾール,イソオキサゾール,チアジアゾール,オキ
サジアゾール,チアトリアゾール,オキサトリアゾー
ル,テトラゾール,ピリジン,ピラジン,ピリミジン,
ピリダジン,ベンゾチオフェン,ベンゾフラン,インド
ール,イミダゾール,ベンズイミダゾール,ベンゾチア
ジアゾール,ベンズオキサゾール,プリン,キノリン,
イソキノリン,フタラジン,ナフチリジン,キノキサリ
ン,シナゾリン,ピロリジン,イミダゾリジン,ピペリ
ジン,ピペラジン等のヘテロ原子を環中に1個以上含
む、飽和もしくは不飽和の単環もしくは多環の複素環化
合物の残基が用いられる。Further, phenyl, naphthyl, tolyl, xylyl, mesityl, cumenyl and the like are used as the aromatic hydrocarbon residue and aromatic group in the above organic carboxylic acid, and the heterocyclic group in the above organic carboxylic acid is, for example, furan. , Thiophene, pyrrole, pyrazole, imidazole, triazole, thiazole, isothiazole, 2-iminothiazoline, 2-oxothiazoline, methylene-1,3
-Dithietane, 2,3-dihydro-1,4-oxathiiin, 1,
4-dithiannaphthalene, dihydro-1,3-dithiin, oxazole, isoxazole, thiadiazole, oxadiazole, thiatriazole, oxatriazole, tetrazole, pyridine, pyrazine, pyrimidine,
Pyridazine, benzothiophene, benzofuran, indole, imidazole, benzimidazole, benzothiadiazole, benzoxazole, purine, quinoline,
Used as a residue of a saturated or unsaturated monocyclic or polycyclic heterocyclic compound containing one or more heteroatoms such as isoquinoline, phthalazine, naphthyridine, quinoxaline, cinazoline, pyrrolidine, imidazolidine, piperidine and piperazine in the ring. To be
これらの有機カルボン酸を構成する脂肪族基、芳香族炭
化水素残基及び複素環基は例えばハロゲン,ヒドロキシ
ル基,スルホ基,メルカプト基,カルボキシル基,アル
キル基,アルコキシ基,アルキルチオ基,アミノ基,ア
ルキルアミノ基,ジアルキルアミノ基,シアノ基,アル
カノイル基,アリール置換アルカノイル基,アリールカ
ルボニル基,アルキルスルホニルアミノ基,アルカノイ
ルオキシ基,アリール基置換アルカノイルオキシ基,ア
リールカルボニルオキシ基,ヒドロキシイミノ基,アル
コキシイミノ基,アルカノイルオキシイミノ基,オキソ
基,チオキソ基,ウレイド基,カルバモイル基,アミジ
ノ基,ホルミル基等の適当な置換基を任意の位置に1個
以上有していてもよく、これらの置換分のうちカルボキ
シル基及びアミノ基は後記する通常セファロスポリン,
ペニシリン及びペプチドの化学の分野で用いられる適当
な保護基でそれぞれ保護されていてもよい。Examples of the aliphatic group, aromatic hydrocarbon residue and heterocyclic group constituting these organic carboxylic acids include halogen, hydroxyl group, sulfo group, mercapto group, carboxyl group, alkyl group, alkoxy group, alkylthio group, amino group, Alkylamino group, dialkylamino group, cyano group, alkanoyl group, aryl-substituted alkanoyl group, arylcarbonyl group, alkylsulfonylamino group, alkanoyloxy group, aryl group-substituted alkanoyloxy group, arylcarbonyloxy group, hydroxyimino group, alkoxyimino Group, alkanoyloxyimino group, oxo group, thioxo group, ureido group, carbamoyl group, amidino group, formyl group and the like may have one or more suitable substituents at any position, Of which, carboxyl groups and amino Normal cephalosporins, which will be described later is,
Each may be protected with an appropriate protecting group used in the field of penicillin and peptide chemistry.
上記において、アルキル基、アルキルチオ基におけるア
ルキル基、アルキルアミノ基におけるアルキル基、ジア
ルキルアミノ基におけるアルキル基、アルキルスルホニ
ルアミノ基におけるアルキル基としては、例えばメチ
ル,エチル,n−プロピル,イソプロピル,n−ブチル,イ
ソブチル,sec−ブチル,t−ブチル,1−エチルプロピル,2
−エチルプロピル,n−ペンチル,1,1−ジメチルプロピ
ル,1,2−ジメチルプロピル,2,2−ジメチルプロピルなど
の炭素数1から6の直鎖もしくは分枝状のアルキル基が
用いられ、アルコキシ基、アルコキシイミノ基における
アルコキシ基としては、例えばメトキシ,エトキシ,n−
プロポキシ,イソプロポキシ,n−ブトキシ,イソブトキ
シ,t−ブトキシ,n−ペンチルオキシ,イソペンチルオキ
シ,ネオペンチルオキシ,n−ヘキシルオキシ等の炭素数
1から6の直鎖もしくは分枝状のアルコキシ基が用いら
れ、アルカノイル基、アリール基置換アルカノイル基に
おけるアルカノイル基、アルカノイルオキシ基における
アルカノイル基、アリール基置換アルカノイルオキシ基
におけるアルカノイル基、アルカノイルオキシイミノ基
におけるアルカノイル基としては、例えば、アセチル,
プロピオニル,ブチリル,n−ペンタノイル,n−ヘキサノ
イル,n−ヘプタノイル等の炭素数2から7のアルカノイ
ル基が用いられ、アリール基置換アルカノイル基におけ
るアリール基、アリールカルボニル基におけるアリール
基、アリール基置換アルカノイルオキシ基におけるアリ
ール基、アリールカルボニルオキシ基におけるアリール
基としては、例えばフェニル,ナフチル,トリル,キシ
リル,メシチル等が用いられる。In the above, the alkyl group, the alkyl group in the alkylthio group, the alkyl group in the alkylamino group, the alkyl group in the dialkylamino group, and the alkyl group in the alkylsulfonylamino group include, for example, methyl, ethyl, n-propyl, isopropyl, n-butyl. , Isobutyl, sec-butyl, t-butyl, 1-ethylpropyl, 2
A linear or branched alkyl group having 1 to 6 carbon atoms such as -ethylpropyl, n-pentyl, 1,1-dimethylpropyl, 1,2-dimethylpropyl, 2,2-dimethylpropyl is used, and an alkoxy group is used. And alkoxy groups in the alkoxyimino group include, for example, methoxy, ethoxy, n-
Propoxy, isopropoxy, n-butoxy, isobutoxy, t-butoxy, n-pentyloxy, isopentyloxy, neopentyloxy, n-hexyloxy and other straight-chain or branched alkoxy groups having 1 to 6 carbon atoms Used alkanoyl group, alkanoyl group in aryl group-substituted alkanoyl group, alkanoyl group in alkanoyloxy group, alkanoyl group in aryl group-substituted alkanoyloxy group, alkanoyl group in alkanoyloxyimino group, for example, acetyl,
An alkanoyl group having 2 to 7 carbon atoms such as propionyl, butyryl, n-pentanoyl, n-hexanoyl, n-heptanoyl is used. The aryl group in the aryl group-substituted alkanoyl group, the aryl group in the arylcarbonyl group, and the aryl group-substituted alkanoyloxy group are used. Examples of the aryl group in the group and the aryl group in the arylcarbonyloxy group include phenyl, naphthyl, tolyl, xylyl, mesityl and the like.
さらに上記のR1で示されるアシル基としては、ペプチド
化学で使用される脱離容易なアミノ基の保護基、例えば
tert−ブトキシカルボニル,iso−ボルニルオキシカルボ
ニル等のアルコキシカルボニル基、例えばベンジルオキ
シカルボニル,p−ニトロベンジルオキシカルボニル,p−
メトキシベンジルオキシカルボニル等のアラルキルオキ
シカルボニル基等が用いられる他、ジェー・エフ・ダブ
リュー・マコミー(J.F.W.McOmie)編の刊行物[“プロ
テクティブ・グループス・イン・オーガニック・ケミス
トリー(Protective Groups in Organic Chemistry)";
プレヌム・プレス(Plenum Press),ニューヨーク(N.
Y.),1973年]の第2章にジェー・ダブリュー・バート
ン(J.W.Barton)によって記載されている脱離容易なア
ミノ基の保護基も上記のアシル基として用いることがで
きる。Further, the acyl group represented by R 1 is a protecting group for an amino group which is easily removed in peptide chemistry, for example,
alkoxycarbonyl groups such as tert-butoxycarbonyl, iso-bornyloxycarbonyl, etc., such as benzyloxycarbonyl, p-nitrobenzyloxycarbonyl, p-
In addition to the use of aralkyloxycarbonyl groups such as methoxybenzyloxycarbonyl, etc., a publication published by JFW McOmie ["Protective Groups in Organic Chemistry"] ;
Plenum Press, New York (N.
Y.), 1973], Chapter 2 of J. W. Burton (JW Barton), the protecting group for the easily leaving amino group can also be used as the acyl group.
上記アシル基のうち好ましくは、R1が式R5−R6−CO−
[式中、R5は置換基を有していてもよい複素環基,R6は
アルキレン基または式 (式中、R6′は水素原子,置換基を有していてもよいア
ルキル基を示す)で表わされる基を示す]で表わされる
基、または式 [式中、R7は置換基を有していてもよいアルカノイルオ
キシ基を示す]で表わされる基である。Of the above acyl groups, preferably R 1 is of the formula R 5 —R 6 —CO—
[In the formula, R 5 is a heterocyclic group which may have a substituent, R 6 is an alkylene group or a formula (In the formula, R 6 ′ represents a hydrogen atom or an alkyl group which may have a substituent), or a group represented by the formula: [In the formula, R 7 represents an alkanoyloxy group which may have a substituent].
R5で示される置換基を有していてもよい複素環基におけ
る複素環基としては1個の窒素原子,硫黄原子または酸
素原子を含む5員複素環基であってさらに1個の窒素原
子を含みあるいは含まないものが用いられる。この複素
環基の具体例としては、例えば、2−チアゾリル,4−チ
アゾリル,5−チアゾリル,2−チエニル,3−チエニル,2−
フリル,3−フリルなどが用いられる。この複素環基にお
ける置換基としては、前述のアシル基の定義における有
機カルボン酸を構成する脂肪族基、芳香族炭化水素残基
及複素環基上の置換基と同様のものが用いられ、このう
ちアミノ基が特に好ましい。The heterocyclic group in the optionally substituted heterocyclic group represented by R 5 is a 5-membered heterocyclic group containing one nitrogen atom, a sulfur atom or an oxygen atom and further one nitrogen atom. Those that include or do not include are used. Specific examples of this heterocyclic group include, for example, 2-thiazolyl, 4-thiazolyl, 5-thiazolyl, 2-thienyl, 3-thienyl, 2-
Furyl, 3-furyl and the like are used. As the substituent in this heterocyclic group, the same substituents as the aliphatic group, the aromatic hydrocarbon residue and the heterocyclic group constituting the organic carboxylic acid in the above definition of the acyl group are used. Of these, an amino group is particularly preferable.
R6で示されるアルキレン基としては、たとえばメチレ
ン,ジメチルメチレン,エチルメチレン,エチレン,メ
チルエチレンなどの炭素数1から3のアルキレン基が用
いられる。As the alkylene group represented by R 6 , for example, an alkylene group having 1 to 3 carbon atoms such as methylene, dimethylmethylene, ethylmethylene, ethylene and methylethylene is used.
R6′で示される置換基を有していてもよいアルキル基に
おけるアルキル基としては、例えばメチル,エチル,n−
プロピル,イソプロピル,n−ブチル,イソブチル,sec−
ブチル,t−ブチル,1−エチルプロピル,2−エチルプロピ
ル,n−ペンチル,1,1−ジメチルプロピル,1,2−ジメチル
プロピル,2,2−ジメチルプロピルなどの炭素数1から6
の直鎖もしくは分枝状のアルキル基が用いられ、これら
は例えばメトキシカルボニル,エトキシカルボニル,n−
プロポキシカルボニル,t−ブトキシカルボニル,n−ヘキ
シルオキシカルボニル等の炭素数1から6のアルコキシ
カルボニル基で1ないし2個置換されていてもよい。Examples of the alkyl group in the alkyl group which may have a substituent represented by R 6 ′ include, for example, methyl, ethyl, n-
Propyl, isopropyl, n-butyl, isobutyl, sec-
Butyl, t-butyl, 1-ethylpropyl, 2-ethylpropyl, n-pentyl, 1,1-dimethylpropyl, 1,2-dimethylpropyl, 2,2-dimethylpropyl and the like having 1 to 6 carbon atoms
The straight chain or branched alkyl group of is used, and these are, for example, methoxycarbonyl, ethoxycarbonyl, n-
It may be substituted with 1 or 2 alkoxycarbonyl groups having 1 to 6 carbon atoms such as propoxycarbonyl, t-butoxycarbonyl and n-hexyloxycarbonyl.
式 で表わされる基はシン−又はアンチ−配置のいずれの立
体配置もとることができるが、特にシン−配置が好まし
い。formula The group represented by can have any steric configuration of syn- or anti-configuration, but the syn-configuration is particularly preferred.
R7で示される置換基を有していてもよいアルカノイルオ
キシ基におけるアルカノイルオキシ基としては、例え
ば、アセトキシ,プロピオニルオキシ,n−ブチリルオキ
シ,n−ペンタノイルオキシ,イソペンタノイルオキシ,n
−ヘキサノイルオキシ,イソヘキサノイルオキシ,n−ヘ
プタノイルオキシ等の炭素数2から7のアルカノイルオ
キシ基が用いられ、これらは前述したアシル基の定義に
おける有機カルボン酸を構成する脂肪族基、芳香族炭化
水素残基及び複素環基上の置換基と同様の置換基を有し
ていてもよい。これらの置換基のうち、特にアミノ基が
好ましい。Examples of the alkanoyloxy group in the optionally substituted alkanoyloxy group represented by R 7 include acetoxy, propionyloxy, n-butyryloxy, n-pentanoyloxy, isopentanoyloxy, n
-Alkanoyloxy groups having 2 to 7 carbon atoms such as -hexanoyloxy, isohexanoyloxy, n-heptanoyloxy, etc. are used, and these are aliphatic groups and aromatic groups constituting the organic carboxylic acid in the above definition of the acyl group. It may have a substituent similar to the substituent on the group hydrocarbon residue and the heterocyclic group. Of these substituents, the amino group is particularly preferable.
特に好ましくはR1が式 [式中、Q1はアルキル基,式−CH2COOQ2で表わされる基
または式 で表わされる基(式中−COOQ2はエステル化されていて
もよいカルボキシル基を示す)を示す]で表わされる基
である。Particularly preferably R 1 is of the formula [In the formula, Q 1 is an alkyl group, a group represented by the formula —CH 2 COOQ 2 , or a formula Represents a group represented by the formula (wherein —COOQ 2 represents a carboxyl group which may be esterified).
Q1で示されるアルキル基は、例えばメチル,エチル,n−
プロピル,イソプロピル,n−ブチル,イソブチル,sec−
ブチル,t−ブチル等の直鎖もしくは分枝状の炭素数1か
ら4のアルキル基が用いられる。The alkyl group represented by Q 1 is, for example, methyl, ethyl, n-
Propyl, isopropyl, n-butyl, isobutyl, sec-
A linear or branched alkyl group having 1 to 4 carbon atoms such as butyl and t-butyl is used.
式−COOQ2で表わされる基、又は式 で表わされる基における −COOQ2はエステル化されていてもよいカルボキシル基
を示し、Q2で示されるエステル残基としては、例えばメ
チル,エチル,n−プロピル,イソプロピル,n−ブチル,
イソブチル,sec−ブチル,t−ブチル等の直鎖又は分枝状
の炭素数1から4のアルキル基、ベンジル,フェネチ
ル,トリチル等の炭素数7から19のアラルキル基が用い
られる。A group represented by the formula-COOQ 2 , or a formula -COOQ 2 in the group represented by represents an optionally esterified carboxyl group, and examples of the ester residue represented by Q 2 include methyl, ethyl, n-propyl, isopropyl, n-butyl,
A linear or branched alkyl group having 1 to 4 carbon atoms such as isobutyl, sec-butyl and t-butyl, and an aralkyl group having 7 to 19 carbon atoms such as benzyl, phenethyl and trityl are used.
R2で示されるアシルオキシメチル基のアシル基はR1で示
されるアシル基と同様のものが用いられる。The acyl group of the acyloxymethyl group represented by R 2 is the same as the acyl group represented by R 1 .
R2で示される複素環メチル基,複素環チオメチル基にお
ける複素環基としては、たとえば1個の硫黄原子,窒素
原子または酸素原子を含む5ないし6員複素環基,2から
4個の窒素原子を含む5ないし6員複素環基,1ないし2
個の窒素原子および1個の硫黄原子または酸素原子を含
む5ないし6員複素環基等が用いられる。Examples of the heterocyclic group in the heterocyclic methyl group or the heterocyclic thiomethyl group represented by R 2 include a 5- to 6-membered heterocyclic group containing one sulfur atom, a nitrogen atom or an oxygen atom, and 2 to 4 nitrogen atoms. A 5- to 6-membered heterocyclic group containing 1 to 2
A 5- to 6-membered heterocyclic group containing one nitrogen atom and one sulfur atom or oxygen atom and the like are used.
該複素環基をさらに具体的に示せば、たとえば1,3,4−
チアジアゾリル 1,2,4−チアジアゾリル 等のチアジアゾリル、1H−テトラゾール−5−イル 2H−テトラゾール−5−イル 等のテトラゾリル、1H−1,2,3−トリアゾリル 2H−1,2,3−トリアゾリル 1H−1,3,5−トリアゾリル 1H−1,2,4−トリアゾリル 等のトリアゾリル、1,3,4−オキサジアゾリル オキサゾリル チアゾリル チアゾリニル ピリジル ピリダジニル テトラゾロピリダジニル 等が用いられる。More specifically showing the heterocyclic group, for example, 1,3,4-
Thiadiazolyl 1,2,4-thiadiazolyl Etc. Thiadiazolyl, 1 H -tetrazol-5-yl 2 H -tetrazol-5-yl Such as tetrazolyl, 1 H -1,2,3-triazolyl 2 H -1,2,3-triazolyl 1 H -1,3,5-triazolyl 1 H -1,2,4-triazolyl Triazolyl such as 1,3,4-oxadiazolyl Oxazolyl Thiazolyl Thiazolinyl Pyridyl Pyridazinyl Tetrazolopyridazinyl Etc. are used.
これらの複素環基は2個以下の窒素原子を含む6員環
基,ベンゼン環または1個の硫黄原子を含む5員環基と
縮合していてもよく、又任意の置換基で1〜3個置換さ
れていてもよい。任意の置換基としては具体的には、例
えばメチル,エチル,n−プロピルなどの炭素数1から6
のアルキル基、例えばメトキシカルボニル,エトキシカ
ルボニル等のエステル化されたカルボキシ基、ヒドロキ
シ,カルボキシ,例えばジメチルアミノ等(炭素数1か
ら6)アルキルアミノ基,例えばピバロイルオキシメト
キシカルボニル等の炭素数2から7のアルカノイルオキ
シ置換炭素数1から6のアルコキシカルボニル,スルホ
等で置換された炭素数1から6のアルキル基、例えば塩
素,臭素等のハロゲン、メルカプト基、ヒドロキシ基、
アミノ基、例えばメチルチオ,エチルチオなどの炭素数
1から6のアルキルチオ基、例えばメトキシ,エトキシ
などの炭素数1から6のアルコキシ基等の置換基が用い
られる。またピリダジニル基,ピリジル基の窒素原子は
オキシド化されていてもよい。R2で示されるアルコキシ
メチル基としては、例えばメトキシメチル,エトキシメ
チル,プロポキシメチルなどの炭素数1から6のアルコ
キシメチル基が用いられ、アルキルチオメチル基として
は、例えばメチルチオメチル,エチルチオメチル,プロ
ピルチオメチルなどの炭素数1から6のアルキルチオメ
チル基が用いられ、アルケニル基としては、ビニル,ア
リル,1−ブテニル等の炭素数2から4のアルケニル基が
用いられる。These heterocyclic groups may be condensed with a 6-membered ring group containing 2 or less nitrogen atoms, a benzene ring or a 5-membered ring group containing 1 sulfur atom, and are optionally substituted with 1 to 3 groups. It may be replaced individually. Specific examples of the optional substituent include, for example, methyl, ethyl, n-propyl and the like having 1 to 6 carbon atoms.
Alkyl groups such as esterified carboxy groups such as methoxycarbonyl and ethoxycarbonyl, hydroxy and carboxy such as dimethylamino (having 1 to 6 carbon atoms) alkylamino groups such as pivaloyloxymethoxycarbonyl and the like having 2 carbon atoms To 7 alkanoyloxy substituted alkoxycarbonyl having 1 to 6 carbon atoms, alkyl group having 1 to 6 carbon atoms substituted with sulfo, etc., for example, halogen such as chlorine and bromine, mercapto group, hydroxy group,
Substituents such as amino groups, eg, alkylthio groups having 1 to 6 carbon atoms such as methylthio and ethylthio, and alkoxy groups having 1 to 6 carbon atoms such as methoxy and ethoxy are used. Further, the nitrogen atom of the pyridazinyl group and the pyridyl group may be oxidized. The alkoxymethyl group represented by R 2 is, for example, an alkoxymethyl group having 1 to 6 carbon atoms such as methoxymethyl, ethoxymethyl and propoxymethyl, and the alkylthiomethyl group is, for example, methylthiomethyl, ethylthiomethyl, propyl. An alkylthiomethyl group having 1 to 6 carbon atoms such as thiomethyl is used, and an alkenyl group having 2 to 4 carbon atoms such as vinyl, allyl and 1-butenyl is used as the alkenyl group.
R3で示されるエステル残基としては、例えば一般式 [式中、Xは水素原子またはアルキル基、Yは水素原
子、アルキル基、アルコキシ基、アルケニルオキシ基ま
たはフェニル基を示す]で表わされる基、さらに例えば
メトキシメチル,エトキシメチル,イソプロポキシメチ
ル等のアルコキシメチル基、例えば1−メトキシエチ
ル,1−エトキシエチル等の1−アルコキシエチル基、例
えばメチルチオメチル,エチルチオメチル,iso−プロピ
ルチオメチル等のアルキルチオメチル基、tert−ブチ
ル,2,2,2−トリクロロエチル,ベンジル,p−メトキシベ
ンジル,p−ニトロベンジル,トリチル,ベンズヒドリ
ル,ビス(p−メトキシフェニル)メチル,フェナシ
ル,2−メチルチオエチル,トリメチルシリル,ジメチル
シリル,フタリジル,(2−オキソ−5−メチル−1,3
−ジオキソレン−4−イル)メチル等が用いられる他、
ジェー・エフ・ダブリュー・マコミー(J.F.W.McOmie)
編の刊行物[“プロテクティブ・グループス・イン・オ
ーガニック・ケミストリー(Protective Groups in Org
anic Chemistry)”プレヌム・プレス(Plenum Pres
s)、ニューヨーク(N.Y.)(1973年)]の第5章にイ
・ハスラム(E.Haslam)によって記載されている上記以
外の脱離容易なカルボキシル基の保護基もエステル残基
として使用し得る。Xで示されるアルキル基としては、
例えばメチル,エチル,n−プロピル,イソプロピル,n−
ブチル,イソブチル,sec−ブチル,t−ブチル,1−エチル
プロピル,2−エチルプロピル,n−ペンチル,1,1−ジメチ
ルプロピル,1,2−ジメチルプロピルなどの炭素数1から
6の直鎖もしくは分枝状のアルキル基、シクロペンチ
ル,シクロヘキシル,シクロヘプチルなどの炭素数5か
ら7のシクロアルキル基が用いられる。Examples of the ester residue represented by R 3 include those represented by the general formula [Wherein X represents a hydrogen atom or an alkyl group, Y represents a hydrogen atom, an alkyl group, an alkoxy group, an alkenyloxy group or a phenyl group], and further, for example, methoxymethyl, ethoxymethyl, isopropoxymethyl and the like. Alkoxymethyl group such as 1-alkoxyethyl group such as 1-methoxyethyl, 1-ethoxyethyl, alkylthiomethyl group such as methylthiomethyl, ethylthiomethyl, iso-propylthiomethyl, tert-butyl, 2,2,2 -Trichloroethyl, benzyl, p-methoxybenzyl, p-nitrobenzyl, trityl, benzhydryl, bis (p-methoxyphenyl) methyl, phenacyl, 2-methylthioethyl, trimethylsilyl, dimethylsilyl, phthalidyl, (2-oxo-5- Methyl-1,3
-Dioxolen-4-yl) methyl and the like are used,
JF W McOmie (JFWMcOmie)
Publications ["Protective Groups in Org Chemistry
anic Chemistry) "Plenum Pres
s), New York (NY) (1973)], chapter 5 of E. Haslam describes other easily removable protecting groups for carboxyl groups as ester residues. . As the alkyl group represented by X,
For example, methyl, ethyl, n-propyl, isopropyl, n-
A straight chain having 1 to 6 carbon atoms such as butyl, isobutyl, sec-butyl, t-butyl, 1-ethylpropyl, 2-ethylpropyl, n-pentyl, 1,1-dimethylpropyl, 1,2-dimethylpropyl or A branched alkyl group and a cycloalkyl group having 5 to 7 carbon atoms such as cyclopentyl, cyclohexyl, and cycloheptyl are used.
Yによって示されるアルキル基としては、例えばメチ
ル,エチル,n−プロピル,イソプロピル,n−ブチル,イ
ソブチル,sec−ブチル,t−ブチル,1−エチルプロピル,2
−エチルプロピル,ペンチル,1,1−ジメチルプロピル,
1,2−ジメチルプロピル,2,2−ジメチルプロピル,1−ブ
チルプロピル,2−ブチルプロピル,3−メチルブチル,1,
1,2−トリメチルプロピル,1,2,2−トリメチルプロピル,
2−メチルブチル,1,1,2,2−テトラメチルプロピル,1,1
−ジエチルプロピル,ヘキシル,ヘプチル,1−プロピル
ブチル,オクチル,1,1−ジエチル−2−メチルプロピ
ル,ノニル,1−ブチルペンチル,1,1−ジエチル−2,2−
ジメチルプロピル,デシル,1−ヘキシルヘプチル等の炭
素数1から13の直鎖もしくは分枝状のアルキル基、例え
ばシクロプロピル,シクロブチル,シクロペンチル,シ
クロヘキシル,シクロヘプチル,シクロオクチル,シク
ロノニル,シクロデシル,シクロウンデシル,シクロド
デシル等の炭素数3から12の飽和単環状脂環式アルキル
基、例えば、ビシクロ[2.2.1]ヘプチル,ビシクロ
[3.2.1]オクチル,ビシクロ[3.3.1]ノニル,アダマ
ントル等の炭素数4から12の架橋構造を有する脂環式ア
ルキル基が用いられる。Examples of the alkyl group represented by Y include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, t-butyl, 1-ethylpropyl, 2
-Ethylpropyl, pentyl, 1,1-dimethylpropyl,
1,2-dimethylpropyl, 2,2-dimethylpropyl, 1-butylpropyl, 2-butylpropyl, 3-methylbutyl, 1,
1,2-trimethylpropyl, 1,2,2-trimethylpropyl,
2-methylbutyl, 1,1,2,2-tetramethylpropyl, 1,1
-Diethylpropyl, hexyl, heptyl, 1-propylbutyl, octyl, 1,1-diethyl-2-methylpropyl, nonyl, 1-butylpentyl, 1,1-diethyl-2,2-
A linear or branched alkyl group having 1 to 13 carbon atoms such as dimethylpropyl, decyl, 1-hexylheptyl, etc., such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclononyl, cyclodecyl, cycloundecyl. , Saturated cycloaliphatic alkyl groups having 3 to 12 carbon atoms such as cyclododecyl, for example, carbons such as bicyclo [2.2.1] heptyl, bicyclo [3.2.1] octyl, bicyclo [3.3.1] nonyl, adamantre An alicyclic alkyl group having a crosslinked structure represented by the formulas 4 to 12 is used.
さらにYで示される炭素数1から13の直鎖もしくは分枝
状のアルキル基は上記したシクロアルキル基、アルコキ
シカルボニル基(例えばメトキシカルボニル,エトキシ
カルボニル,n−プロポキシカルボニル,イソプロポキシ
カルボニル等の炭素数1から3の直鎖もしくは分枝状ア
ルコキシカルボニル基)またはフェニル基等で1ないし
3個置換されていてもよい。Further, a linear or branched alkyl group having 1 to 13 carbon atoms represented by Y is the above-mentioned cycloalkyl group or alkoxycarbonyl group (eg, methoxycarbonyl, ethoxycarbonyl, n-propoxycarbonyl, isopropoxycarbonyl, etc.). It may be substituted with 1 to 3 linear or branched alkoxycarbonyl groups (1 to 3) or phenyl groups.
Yで示されるアルコキシ基としては、例えばメトキシ,
エトキシ,n−プロポキシ,イソプロポキシ,n−ブトキ
シ,イソブトキシ,sec−ブトキシ,t−ブトキシ,n−ペン
チルオキシ,2,2−ジメチルプロポキシ,1−メチルブトキ
シ,2−メチルブトキシ,3−メチルブトキシ,1−エチルプ
ロポキシ,n−ヘキシルオキシ,1−メチルペンチルオキ
シ,2−メチルペンチルオキシ,3−メチルペンチルオキ
シ,4−メチルペンチルオキシ,1−エチルブトキシ,2−エ
チルブトキシ,3−エチルブトキシ,n−ヘプチルオキシ,1
−メチルヘキシルオキシ,2−メチルヘキシルオキシ,3−
メチルヘキシルオキシ,4−メチルヘキシルオキシ,5−メ
チルヘキシルオキシ,1−エチルペンチルオキシ,2−エチ
ルペンチルオキシ,3−エチルペンチルオキシ,4−エチル
ペンチルオキシ,1−プロピルブトキシ等の炭素数1から
7の直鎖もしくは分枝状のアルコキシ基、例えばシクロ
プロポキシ,シクロブトキシ,シクロペンチルオキシ,
シクロヘキシルオキシ,シクロヘプチルオキシ,シクロ
オクチルオキシ,シクロノニルオキシ,シクロデシルオ
キシ,シクロウンデシルオキシ,シクロドデシルオキシ
等の炭素数3から12の飽和単環状脂環式アルコキシ基、
例えばビシクロ[2.2.1]ヘプチルオキシ,ビシクロ
[3.2.1]オクチルオキシ,ビシクロ[3.3.1]ノニルオ
キシ,アダマンチルオキシ等の炭素数4から12の架橋構
造を有する脂環式アルコキシ基が用いられる。Examples of the alkoxy group represented by Y include methoxy,
Ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, sec-butoxy, t-butoxy, n-pentyloxy, 2,2-dimethylpropoxy, 1-methylbutoxy, 2-methylbutoxy, 3-methylbutoxy, 1-ethylpropoxy, n-hexyloxy, 1-methylpentyloxy, 2-methylpentyloxy, 3-methylpentyloxy, 4-methylpentyloxy, 1-ethylbutoxy, 2-ethylbutoxy, 3-ethylbutoxy, n -Heptyloxy, 1
-Methylhexyloxy, 2-methylhexyloxy, 3-
From carbon number 1 such as methylhexyloxy, 4-methylhexyloxy, 5-methylhexyloxy, 1-ethylpentyloxy, 2-ethylpentyloxy, 3-ethylpentyloxy, 4-ethylpentyloxy, 1-propylbutoxy 7 straight or branched alkoxy groups such as cyclopropoxy, cyclobutoxy, cyclopentyloxy,
A saturated monocyclic alicyclic alkoxy group having 3 to 12 carbon atoms such as cyclohexyloxy, cycloheptyloxy, cyclooctyloxy, cyclononyloxy, cyclodecyloxy, cycloundecyloxy, and cyclododecyloxy,
For example, an alicyclic alkoxy group having a cross-linking structure having 4 to 12 carbon atoms such as bicyclo [2.2.1] heptyloxy, bicyclo [3.2.1] octyloxy, bicyclo [3.3.1] nonyloxy, adamantyloxy and the like is used.
Yで示される環状(シクロ)アルコキシ基は上記した直
鎖もしくは分枝状アルキル基で置換されていてもよく、
又Yで示される直鎖もしくは分枝状アルコキシ基は上記
した脂環式アルキル基で置換されていてもよい。The cyclic (cyclo) alkoxy group represented by Y may be substituted with the above linear or branched alkyl group,
The linear or branched alkoxy group represented by Y may be substituted with the alicyclic alkyl group described above.
Yで示されるアルケニルオキシ基としては、例えばビニ
ルオキシ,アリルオキシ,1−プロペニルオキシ,1−メチ
ル−1−プロペニルオキシ,2−メチル−1−プロペニル
オキシ,1−ブテニルオキシ,2−ブテニルオキシ,3−ブテ
ニルオキシ,1−メチル−1−ブテニルオキシ,2−メチル
−1−ブテニルオキシ,3−メチル−1−ブテニルオキ
シ,1−メチル−2−ブテニルオキシ,2−メチル−2−ブ
テニルオキシ,3−メチル−2−ブテニルオキシ,1−メチ
ル−3−ブテニルオキシ,2−メチル−3−ブテニルオキ
シ,3−メチル−3−ブテニルオキシ,1−ペンテニルオキ
シ,2−ペンテニルオキシ,3−ペンテニルオキシ,4−ペン
テニルオキシ,1−メチル−1−ペンテニルオキシ,2−メ
チル−4−ヘキセニルオキシ,3−メチル−4−ヘキセニ
ルオキシ,4−メチル−4−ヘキセニルオキシ,5−メチル
−4−ヘキセニルオキシ,1,3−ブタンジエニルオキシ,
1,6−ヘプタンジエニルオキシ等の不飽和結合を1ない
し3個有していてもよい炭素数2から7の直鎖または分
枝状のアルケニルオキシ基が用いられる。Examples of the alkenyloxy group represented by Y include vinyloxy, allyloxy, 1-propenyloxy, 1-methyl-1-propenyloxy, 2-methyl-1-propenyloxy, 1-butenyloxy, 2-butenyloxy, 3-butenyloxy, 1-methyl-1-butenyloxy, 2-methyl-1-butenyloxy, 3-methyl-1-butenyloxy, 1-methyl-2-butenyloxy, 2-methyl-2-butenyloxy, 3-methyl-2-butenyloxy, 1- Methyl-3-butenyloxy, 2-methyl-3-butenyloxy, 3-methyl-3-butenyloxy, 1-pentenyloxy, 2-pentenyloxy, 3-pentenyloxy, 4-pentenyloxy, 1-methyl-1-pentenyloxy , 2-Methyl-4-hexenyloxy, 3-methyl-4-hexenyloxy, 4-methyl-4-hexenyl Oxy, 5-methyl-4-hexenyloxy, 1,3-butanedienyloxy,
A straight chain or branched alkenyloxy group having 2 to 7 carbon atoms which may have 1 to 3 unsaturated bonds such as 1,6-heptanedienyloxy is used.
上記一般式[I]のうち、最も好ましくは、R1が2−
(2−アミノチアゾール−4−イル)アセチル、R2が1
−(2−ジメチルアミノエチル)−1H−テトラゾール−
5−イルチオメチル基、R3が式 [式中の記号は前記と同意義を示す]で表わされる基、
R4が水素原子、Zが硫黄原子である。特に式 で示される基のうちXがメチル基,Yがシクロヘキシルオ
キシ基が好ましい。一般式[I]で表わされる化合物を
さらに具体的に示せば下記の通りである。Of the above general formula [I], most preferably, R 1 is 2-
(2-aminothiazol-4-yl) acetyl, R 2 is 1
-(2-Dimethylaminoethyl) -1H-tetrazole-
5-ylthiomethyl group, R 3 is a formula A group represented by [the symbols in the formula have the same meaning as defined above],
R 4 is a hydrogen atom and Z is a sulfur atom. Especially the formula Among the groups represented by, X is preferably a methyl group and Y is preferably a cyclohexyloxy group. The compound represented by the general formula [I] will be described in more detail below.
本発明に用いられるセファロスポリン化合物の分子中に
スルホ基,カルボキシル基等の酸性基が含まれている場
合、自体公知の方法により医薬上許容される塩の形にし
て用いてもよく、たとえばナトリウム,カリウム等のア
ルカリ金属、例えばマグネシウム,カルシウム等のアル
カリ土類金属等の無毒性カチオン,たとえばアルギニ
ン,オルニチン,リジン,ヒスチジン等の塩基性アミノ
酸、たとえばN−メチルグルカミン,ジエタノールアミ
ン,トリエタノールアミン,トリスヒドロキシメチルア
ミノメタンなどのポリヒドロキシアルキルアミン等との
塩基塩を形成させて用いてもよい。又セファロスポリン
化合物の分子中にアミノ基が含まれている場合には、例
えば塩酸,硫酸,リン酸などの無機酸、例えばマレイン
酸,酢酸,クエン酸,コハク酸、酒石酸,リンゴ酸,マ
ロン酸,フマル酸,安息香酸,マンデル酸,アスコルビ
ン酸,メタンスルホン酸等の有機酸等ペニシリンあるい
はセファロスポリンの分野で医薬的に許容しうる塩を形
成する酸として知られている酸との酸付加塩として用い
ても良い。 When the molecule of the cephalosporin compound used in the present invention contains an acidic group such as a sulfo group or a carboxyl group, it may be used in the form of a pharmaceutically acceptable salt by a method known per se, for example, Alkali metals such as sodium and potassium, non-toxic cations such as alkaline earth metals such as magnesium and calcium, basic amino acids such as arginine, ornithine, lysine and histidine, such as N-methylglucamine, diethanolamine and triethanolamine. It may be used by forming a basic salt with a polyhydroxyalkylamine such as trishydroxymethylaminomethane. When an amino group is contained in the molecule of the cephalosporin compound, for example, an inorganic acid such as hydrochloric acid, sulfuric acid or phosphoric acid, such as maleic acid, acetic acid, citric acid, succinic acid, tartaric acid, malic acid or malon. Acids, fumaric acid, benzoic acid, mandelic acid, ascorbic acid, organic acids such as methanesulfonic acid, etc. Acids with acids known to form pharmaceutically acceptable salts in the field of penicillin or cephalosporins You may use it as an addition salt.
固状のセファロスポリン化合物を脱溶媒化し、溶媒を含
有した超臨界二酸化炭素は、自体公知の方法、例えば活
性炭などの吸着剤で溶媒を吸着分離する方法等により超
臨界二酸化炭素から溶媒を分離したのち、再び本発明方
法の原料用二酸化炭素として用いることもできる。Desolvation of solid cephalosporin compounds, supercritical carbon dioxide containing the solvent, a method known per se, for example, the solvent is separated from the supercritical carbon dioxide by a method of adsorbing and separating the solvent with an adsorbent such as activated carbon. After that, it can be used again as carbon dioxide as a raw material in the method of the present invention.
本発明方法により脱溶媒化され精製されたセファロスポ
リン化合物は抗菌剤として自体公知の方法により人また
は哺乳動物の感染症の治療及び予防のために用いられ
る。The cephalosporin compound desolvated and purified by the method of the present invention is used as an antibacterial agent by a method known per se for treating and preventing infectious diseases of humans or mammals.
原料の固状のセファロスポリン化合物は自体公知の方法
で製造される。The solid cephalosporin compound as a raw material is produced by a method known per se.
例えば特開昭55-79393に記載の方法や特開昭53-21192,
特開昭57-77690,特開昭58-189186,特開59-89691,特開昭
59-190995,特開昭59-225191,特開昭59-225192,特開昭59
-225193,特開昭60-38387,特開昭59-190995,特開昭60-67
482,特開昭60-64987,特開昭60-218394,特開昭60-22469
3,特開昭60-239490等に記載の方法によりセファロスポ
リン化合物を得たのち、有機溶媒のガスを含有する不活
性ガス(例、空気,窒素)を通ずるか、有機溶媒で洗浄
することにより製造される。For example, the method described in JP-A-55-79393 and JP-A-53-21192,
JP 57-77690, JP 58-189186, JP 59-89691, JP
59-190995, JP-A-59-225191, JP-A-59-225192, JP-A-59
-225193, JP60-38387, JP59-190995, JP60-67
482, JP 60-64987, JP 60-218394, JP 60-22469
3. After obtaining the cephalosporin compound by the method described in JP-A-60-239490, etc., pass an inert gas containing an organic solvent gas (eg, air, nitrogen) or wash with an organic solvent. Manufactured by.
発明の効果 本発明方法は、固状のセファロスポリン化合物を分解,
重合させることなく安定に効率良く脱溶媒することがで
きる。脱溶媒化された固状のセファロスポリン化合物の
溶媒含有率は極めて低く(通常0.05W/W%以下にするこ
とができる)、しかも得られるセファロスポリン化合物
は力価の減少もなく、高純度、高品質であり、工業用脱
溶媒化法として極めて有用である。Effects of the Invention The method of the present invention decomposes a solid cephalosporin compound,
It is possible to desolvate stably and efficiently without polymerizing. The solvent content of the desolvated solid cephalosporin compound is extremely low (usually it can be 0.05 W / W% or less), and the cephalosporin compound obtained has a high titer without any decrease in potency. It has high purity and high quality and is extremely useful as an industrial desolvation method.
以下に参考例,実施例及び比較例をあげて本発明方法を
詳述する。なお参考例,実施例,比較例で用いられる%
は特記のない限り重量%を示す。Hereinafter, the method of the present invention will be described in detail with reference to Reference Examples, Examples and Comparative Examples. % Used in Reference Examples, Examples and Comparative Examples
Indicates% by weight unless otherwise specified.
参考例1 (a)1−クロロエチル シクロヘキシルカーボネート
の製造 シクロヘキサノール18.3g,ピリジン14.5g,塩化メチレン
300ml溶液を、−78℃に冷却し、撹拌下、これに1−ク
ロロエチルクロロホーメート20mlを10分で滴下した。滴
下後冷浴を外し、室温で16時間撹拌した後、飽和食塩水
300mlで3回洗浄した。ついで無水硫酸マグネシウムで
乾燥後、溶媒を減圧留去すると、無色油状物として表記
化合物33.1g(収率88%)が得られた。bp100〜113℃/5
〜6mmHg (b)1−ヨードエチル シクロヘキシルカーボネート
の製造 上記(a)で得られた1−クロロエチル シクロヘキシ
ルカーボネート16.5g,ヨウ化ナトリウム50gのアセトニ
トリル500ml溶液を70℃で45分間かきまぜた後、減圧濃
縮し、得られた残渣をエーテルで抽出した。抽出液を合
わせ溶媒を減圧留去すると表記化合物が淡黄色油状物と
して得られた。Reference Example 1 (a) Production of 1-chloroethyl cyclohexyl carbonate Cyclohexanol 18.3 g, pyridine 14.5 g, methylene chloride
The 300 ml solution was cooled to −78 ° C., and 20 ml of 1-chloroethyl chloroformate was added dropwise thereto over 10 minutes while stirring. After dropping, the cold bath was removed, and the mixture was stirred at room temperature for 16 hours, then saturated saline
It was washed 3 times with 300 ml. Then, after drying over anhydrous magnesium sulfate, the solvent was distilled off under reduced pressure to obtain 33.1 g (yield 88%) of the title compound as a colorless oily substance. bp100-113 ℃ / 5
~ 6mmHg (B) Preparation of 1-iodoethyl cyclohexyl carbonate 16.5 g of 1-chloroethyl cyclohexyl carbonate obtained in (a) above and 50 g of sodium iodide in 500 ml of acetonitrile were stirred at 70 ° C for 45 minutes and then concentrated under reduced pressure to obtain The residue was extracted with ether. The extracts were combined and the solvent was evaporated under reduced pressure to give the title compound as a pale-yellow oil.
NMR(CD3CN,TMS(外部標準))δ:0.7〜2.3(10H,m),
2.18(3H,d,J=6Hz),4.1〜4.9(1H,m),6.67(1H,q,J
=6Hz) (c)1−(シクロヘキシルオキシカルボニルオキシ)
エチル 7β−[2−(2−アミノチアゾール−4−イ
ル)アセトアミド]−3−[[[1−(2−ジメチルア
ミノエチル)−1H−テトラゾール−5−イル]チオ]メ
チル]セフ−3−エム−4−カルボキシレート・2塩酸
塩の製造 7β−[2−(2−アミノチアゾール−4−イル)アセ
トアミド]−3−[[[1−(2−ジメチルアミノエチ
ル)−1H−テトラゾール−5−イル]チオ]メチル]セ
フ−3−エム−4−カルボン酸カリウム36gをジメチル
ホルムアミド300mlに溶解し、氷冷撹拌下、この溶液に
上記(b)で得られた1−ヨードエチル シクロヘキシ
ルカーボネートのジメチルホルムアミド溶液50mlを一気
に加え、5分間撹拌した。反応液を氷で冷却した20%食
塩水1.5lと酢酸エチル1.5lの混液中に注いだ。有機層を
分取し、飽和食塩水1.5lで2回洗浄後、1N塩酸400mlで
抽出した。この抽出液をダイヤイオンMCI ゲルCHP20P
(75〜150μ,三菱化成工業製)を用いるカラムクロマ
トグラフィに付し、0.01N塩酸、ついで20V/V%アセトニ
トリル/0.01N塩酸で溶出した。目的化合物を含む溶出画
分を集め、減圧濃縮後、凍結乾燥すると無色粉末として
1−(シクロヘキシルオキシカルボニルオキシ)エチル
7β−[2−(2−アミノチアゾール−4−イル)ア
セトアミド]−3−[[[1−(2−ジメチルアミノエ
チル)−1H−テトラゾール−5−イル]チオ]メチル]
セフ−3−エム−4−カルボキシレート・2塩酸塩9.6g
が得られた。NMR (CD3CN, TMS (external standard)) δ: 0.7 to 2.3 (10H, m),
2.18 (3H, d, J = 6Hz), 4.1 to 4.9 (1H, m), 6.67 (1H, q, J
= 6Hz) (c) 1- (Cyclohexyloxycarbonyloxy)
Ethyl 7β- [2- (2-aminothiazol-4-i
Le) acetamide] -3-[[[1- (2-dimethyla
Minoethyl) -1H-tetrazol-5-yl] thio] meth
Chill] cef-3-em-4-carboxylate dihydrochloride
Preparation of salt 7β- [2- (2-aminothiazol-4-yl) acetate
Toamido] -3-[[[1- (2-dimethylaminoethyl
Ru) -1H-tetrazol-5-yl] thio] methyl] ce
36 g of potassium f-3-em-4-carboxylate in dimethyl
Dissolve in 300 ml of formamide and add to this solution while stirring with ice cooling.
1-iodoethyl cyclohexyl obtained in the above (b)
50 ml of dimethylformamide solution of carbonate
And stirred for 5 minutes. 20% food with the reaction mixture cooled with ice
It was poured into a mixed solution of 1.5 l of brine and 1.5 l of ethyl acetate. Organic layer
Separated, washed twice with 1.5 l of saturated saline solution, and with 400 ml of 1N hydrochloric acid.
Extracted. This extract is called Diaion MCI Gel CHP20P
(75-150μ, Mitsubishi Kasei Kogyo) column chroma
Topographies, 0.01N hydrochloric acid, then 20V / V% acetoni
Eluted with trill / 0.01N hydrochloric acid. Elution fraction containing the target compound
Collected, concentrated under reduced pressure, and lyophilized to give a colorless powder.
1- (cyclohexyloxycarbonyloxy) ethyl
7β- [2- (2-aminothiazol-4-yl) a
Cetamide] -3-[[[1- (2-dimethylaminoe
Tyl) -1H-tetrazol-5-yl] thio] methyl]
Cef-3-M-4-carboxylate dihydrochloride 9.6g
was gotten.
得られた化合物の4gを下部にろ過板を有するガラス容器
に入れ、アセトン30mlを加えて撹拌により十分懸濁させ
た後真空ろ過を行なって1−(シクロヘキシルオキシカ
ルボニルオキシ)エチル 7β−[2−(2−アミノチ
アゾール−4−イル)アセトアミド]−3−[[[1−
(2−ジメチルアミノエチル)−1H−テトラゾール−5
−イル]チオ]メチル]セフ−3−エム−4−カルボキ
シレート・2塩酸塩を分離した。引き続き乾燥空気(温
度25℃,相対湿度5.1%)を30分毎に撹拌を行ないなが
ら7時間通気し(空気流量100ml/分)脱溶媒を行なっ
た。アセトン含量:3.2%(ガスクロマトグラフィーによ
り測定),1−(シクロヘキシルオキシカルボニルオキ
シ)エチル 7β−[2−(2−アミノチアゾール−4
−イル)アセトアミド]−3−[[[1−(2−ジメチ
ルアミノエチル)−1H−テトラゾール−5−イル]チ
オ]メチル]セフ−3−エム−4−カルボキシレート・
2塩酸塩の含量99.3%(高速液体クロマトグラフィによ
り測定),1−(シクロヘキシルオキシカルボニルオキ
シ)エチル 7β−[2−(2−アミノチアゾール−4
−イル)アセトアミド]−3−[[[1−(2−ジメチ
ルアミノエチル)−1H−テトラゾール−5−イル]チ
オ]メチル]セフ−3−エム−4−カルボキシレート・
2塩酸塩の加水分解体 7β−[2−(2−アミノチア
ゾール−4−イル)アセトアミド]−3−[[[1−
(2−ジメチルアミノエチル)−1H−テトラゾール−5
−イル]チオ]メチル]セフ−3−エム−4−カルボン
酸・2塩酸塩(以下加水分解生成体と称することもあ
る)の含量:0.2%(脱水,脱溶媒物換算,高速液体クロ
マトグラフィーにより測定)であった。 4 g of the obtained compound was placed in a glass container having a filter plate at the bottom, 30 ml of acetone was added, and the mixture was sufficiently suspended by stirring and then vacuum filtered to give 1- (cyclohexyloxycarbonyloxy) ethyl 7β- [2- (2-Aminothiazol-4-yl) acetamide] -3-[[[1-
(2-Dimethylaminoethyl) -1H-tetrazole-5
-Yl] thio] methyl] cef-3-em-4-carboxylate dihydrochloride was isolated. Subsequently, dry air (temperature 25 ° C., relative humidity 5.1%) was aerated for 7 hours while stirring every 30 minutes (air flow rate 100 ml / min) to perform desolvation. Acetone content: 3.2% (determined by gas chromatography), 1- (cyclohexyloxycarbonyloxy) ethyl 7β- [2- (2-aminothiazole-4
-Yl) acetamido] -3-[[[1- (2-dimethylaminoethyl) -1H-tetrazol-5-yl] thio] methyl] cef-3-em-4-carboxylate.
Dihydrochloride content 99.3% (measured by high performance liquid chromatography), 1- (cyclohexyloxycarbonyloxy) ethyl 7β- [2- (2-aminothiazole-4)
-Yl) acetamido] -3-[[[1- (2-dimethylaminoethyl) -1H-tetrazol-5-yl] thio] methyl] cef-3-em-4-carboxylate.
Dihydrochloride hydrolyzate 7β- [2- (2-aminothiazol-4-yl) acetamide] -3-[[[1-
(2-Dimethylaminoethyl) -1H-tetrazole-5
-Yl] thio] methyl] cef-3-em-4-carboxylic acid dihydrochloride (hereinafter sometimes referred to as hydrolysis product) content: 0.2% (dehydration, desolvated substance conversion, high performance liquid chromatography) Was measured by).
参考例2 参考例1において得られたアセトン3.2%を含有する1
−(シクロヘキシルオキシカルボニルオキシ)エチル
7β−[2−(2−アミノチアゾール−4−イル)アセ
トアミド]−3−[[[1−(2−ジメチルアミノエチ
ル)−1H−テトラゾール−5−イル]チオ]メチル]セ
フ−3−エム−4−カルボキシレート・2塩酸塩 5gを
グラスフイルターに入れ、室温下イソプロピルアルコー
ル,n−ヘキサン 1:1混液中にバブリングさせた空気を
2時間通気してイソプロピルアルコールとn−ヘキサン
を吸着させた。Reference Example 2 1 containing 3.2% of acetone obtained in Reference Example 1
-(Cyclohexyloxycarbonyloxy) ethyl
7β- [2- (2-Aminothiazol-4-yl) acetamide] -3-[[[1- (2-dimethylaminoethyl) -1H-tetrazol-5-yl] thio] methyl] cef-3-em 5 g of -4-carboxylate dihydrochloride was placed in a glass filter, and bubbling air was bubbled through a 1: 1 mixture of isopropyl alcohol and n-hexane at room temperature for 2 hours to adsorb isopropyl alcohol and n-hexane. .
定量分析の結果、アセトン含量:3.2%,イソプロピルア
ルコール含量:0.6%,n−ヘキサン含量:0.05%(脱水,
脱溶媒物基準,ガスクロマトグラフィーにより測定)で
あった。As a result of quantitative analysis, acetone content: 3.2%, isopropyl alcohol content: 0.6%, n-hexane content: 0.05% (dehydration,
It was a solvent-removed substance standard and measured by gas chromatography).
参考例3 7β−[2−(2−アミノチアゾール−4−イル)アセ
トアミド]−3−[[[1−(2−ジメチルアミノエチ
ル)−1H−テトラゾール−5−イル]チオ]メチル]セ
フ−3−エム−4−カルボン酸・2塩酸塩 5gをグラス
フイルターに入れ室温下酢酸エチル中にバブリングさせ
た空気を1時間通気して酢酸エチルを吸着させた。定量
分析の結果、酢酸エチルの含量は0.12%(脱水,脱溶媒
物基準,ガスクロマトグラフィーにより測定)であっ
た。Reference Example 3 7β- [2- (2-aminothiazol-4-yl) acetamide] -3-[[[1- (2-dimethylaminoethyl) -1H-tetrazol-5-yl] thio] methyl] cef- 5 g of 3-M-4-carboxylic acid dihydrochloride was placed in a glass filter, and air bubbled in ethyl acetate was aerated for 1 hour at room temperature to adsorb ethyl acetate. As a result of the quantitative analysis, the content of ethyl acetate was 0.12% (dehydration, desolvated product standard, measured by gas chromatography).
参考例4 7β−[2−(2−アミノチアゾール−4−イル)−
(Z)−2−メトキシイミノアセトアミド]−3−[1,
2,3−チアジアゾール−5−イル−チオメチル]セフ−
3−エム−4−カルボン酸ナトリウム5gをエタノール20
mlに懸濁させた後グラスフイルターで真空ろ過し、次い
でこの結晶をメタノール20mlで洗浄した。洗浄後直ちに
結晶に乾燥空気を30分間通気後分析したところメタノー
ル含量:1.7%,エタノール含量:1.4%(脱水,脱溶媒物
基準,ガスクロマトグラフィーにより測定)であった。Reference Example 4 7β- [2- (2-aminothiazol-4-yl)-
(Z) -2-Methoxyiminoacetamide] -3- [1,
2,3-Thiadiazol-5-yl-thiomethyl] cef-
Ethanol 20 with 5 g of sodium 3-M-4-carboxylate
After suspending in ml, the mixture was vacuum filtered with a glass filter, and then the crystals were washed with 20 ml of methanol. Immediately after washing, the crystals were aerated with dry air for 30 minutes and analyzed to find that the methanol content was 1.7% and the ethanol content was 1.4% (dehydration, desolvation standard, measured by gas chromatography).
実施例 実施例1 アセトン3.2%を含有する粉末状の1−(シクロヘキシ
ルオキシカルボニルオキシ)エチル 7β−[2−(2
−アミノチアゾール−4−イル)アセトアミド]−3−
[[[1−(2−ジメチルアミノエチル)−1H−テトラ
ゾール−5−イル]チオ]メチル]セフ−3−エム−4
−カルボキシレート・2塩酸塩(以後化合物−1と称す
る)20gを直径14mm,高さ300mmの下部にろ過板を有する
竪型円筒容器に充填し、容器外温と流体入口温度を35℃
に、容器内圧力を150kg/cm2に調節しながら、二酸化炭
素を容器上部から下方へ粉体層を通して流し(流量:0.8
l/分,標準状態換算)アセトンの抽出除去を行なった。
5時間経過後二酸化炭素の流れを止め、装置の圧力を常
圧に戻して内容物を取り出し定量分析したところ残存ア
セトン含量は0.05%以下(ガスクロマトグラフィーによ
り測定、以下の実施例,比較例においても同じ)に減少
していた。また加水分解生成体の増加は認められず、化
合物−1の含量は99.2%であった(高速液体クロマトグ
ラフィーにより測定)。また飴状溶融体の生成も全く認
められなかった(目視観察)。Examples Example 1 Powdered 1- (cyclohexyloxycarbonyloxy) ethyl 7β- [2- (2
-Aminothiazol-4-yl) acetamide] -3-
[[[1- (2-Dimethylaminoethyl) -1H-tetrazol-5-yl] thio] methyl] cef-3-em-4
-Fill 20 g of carboxylate dihydrochloride (hereinafter referred to as compound-1) into a vertical cylindrical container having a diameter of 14 mm and a height of 300 mm and a filter plate at the bottom, and the outside temperature of the container and the fluid inlet temperature are 35 ° C.
In addition, while adjusting the pressure inside the container to 150 kg / cm 2 , carbon dioxide is made to flow through the powder layer from the upper part of the container to the lower part (flow rate: 0.8
Acetone was extracted and removed.
After 5 hours, the flow of carbon dioxide was stopped, the pressure of the apparatus was returned to normal pressure, and the contents were taken out and quantitatively analyzed. The residual acetone content was 0.05% or less (measured by gas chromatography, in the following Examples and Comparative Examples. The same). No increase in hydrolysis products was observed, and the content of compound-1 was 99.2% (measured by high performance liquid chromatography). Further, no formation of a candy-like melt was observed (visual observation).
実施例2 アセトン4.1%,イソプロピルアルコール0.6%,n−ヘキ
サン0.05%を含有する粉末状の化合物−1 5gを実施例
1の竪型円筒容器に充填し温度35℃,圧力150kg/cm2,二
酸化炭素流量0.7l/分(標準状態換算値)の条件下で5
時間溶媒の抽出除去を行なった後内容物を取り出し定量
分析したところアセトン0.005%以下,イソプロピルア
ルコール0.005%以下,n−ヘキサン0.0005%以下にそれ
ぞれ減少していた。Example 2 15 g of a powdered compound-15 containing 4.1% of acetone, 0.6% of isopropyl alcohol, and 0.05% of n-hexane was charged into the vertical cylindrical container of Example 1 and the temperature was 35 ° C., the pressure was 150 kg / cm 2 , and the dioxide was dioxide. 5 under the condition of carbon flow rate 0.7l / min (converted value in standard condition)
After the solvent had been extracted and removed for a period of time, the contents were taken out and quantitatively analyzed. As a result, acetone was reduced to 0.005% or less, isopropyl alcohol to 0.005% or less, and n-hexane to 0.0005% or less.
実施例3 酢酸エチル0.12%を含有する粉末状の7β−[2−(2
−アミノチアゾール−4−イル)アセトアミド]−3−
[[[1−(2−ジメチルアミノエチル)−1H−テトラ
ゾール−5−イル]チオ]メチル]セフ−3−エム−4
−カルボン酸・2塩酸塩5gを実施例1の竪型円筒容器に
充填し実施例2と同一の条件下で5時間溶媒の抽出除去
を行なった結果、酢酸エチルの含有量は0.0005%以下に
減少していた。Example 3 Powdered 7β- [2- (2 containing 0.12% of ethyl acetate
-Aminothiazol-4-yl) acetamide] -3-
[[[1- (2-Dimethylaminoethyl) -1H-tetrazol-5-yl] thio] methyl] cef-3-em-4
-5 g of carboxylic acid dihydrochloride was filled in the vertical cylindrical container of Example 1 and the solvent was extracted and removed for 5 hours under the same conditions as in Example 2, and as a result, the content of ethyl acetate was 0.0005% or less. It was decreasing.
実施例4 メタノール1.7%,エタノール1.4%を含有する粉末状の
7β−[2−(2−アミノチアゾール−4−イル)−
(Z)−2−メトキシイミノアセトアミド]−3−[1,
2,3−チアジアゾール−5−イル−チオメチル]セフ−
3−エム−4−カルボン酸ナトリウム5gを実施例1の竪
型円筒容器に充填し実施例2と同一の条件下で5時間溶
媒の抽出除去を行なった結果、メタノール,エタノール
ともに含有量は0.05%以下に減少していた。アセトン3.
2%を含有する粉末状の化合物−1について従来法によ
る脱溶媒を行ない以下の結果を得た。Example 4 Powdered 7β- [2- (2-aminothiazol-4-yl) -containing 1.7% methanol and 1.4% ethanol.
(Z) -2-Methoxyiminoacetamide] -3- [1,
2,3-Thiadiazol-5-yl-thiomethyl] cef-
The vertical cylindrical container of Example 1 was filled with 5 g of sodium 3-em-4-carboxylate, and the solvent was extracted and removed under the same conditions as in Example 2 for 5 hours. As a result, the content of both methanol and ethanol was 0.05. It has decreased to less than%. Acetone 3.
The powdery compound-1 containing 2% was desolvated by the conventional method and the following results were obtained.
比較例1 真空脱溶媒法 化合物−1を圧さ約5mmになるようにシャーレに入れ、
こりシャーレを実験用加熱真空乾燥器に納め60℃,2〜3T
orrの条件下で真空脱溶媒を行なった結果、2時間経過
後アセトン含量は1.2%に低下したがその後は脱溶媒は
進行せず6時間経過後も1.2%のままであった。Comparative Example 1 Vacuum Desolvation Method Compound-1 was placed in a petri dish so that the pressure was about 5 mm,
Place the petri dish in a laboratory heating vacuum dryer at 60 ℃, 2-3T
As a result of vacuum desolvation under the conditions of orr, the acetone content decreased to 1.2% after 2 hours, but desolvation did not proceed thereafter and remained at 1.2% after 6 hours.
比較例2 気流脱溶媒法 化合物−1 50gを直径70mmの下部ろ過板付容器に入れ
(粉末高さ約3cm),下部ろ過板を通して粉体層に乾燥
空気(相対湿度5.1%)を流し脱溶媒を行なった(流量
1.5l/min)。空気温度を25℃に調節しながら4時間脱溶
媒を行なったがアセトン含量は2.9%であり、更に空気
温度を60℃に上げ2時間脱溶媒したところアセトン含量
は1.2%に低下した。しかしながらその後は空気温度60
℃で6時間経過後もアセトン含量は1.2%のままであっ
た。Comparative Example 2 Airflow Desolvation Method Compound-1 50 g was placed in a container with a lower filter plate having a diameter of 70 mm (powder height of about 3 cm), and dry air (relative humidity 5.1%) was passed through the lower filter plate to pass the desolvent. Performed (flow rate
1.5l / min). Desolvation was carried out for 4 hours while adjusting the air temperature to 25 ° C, but the acetone content was 2.9%, and when the air temperature was further raised to 60 ° C and desolvation was carried out for 2 hours, the acetone content dropped to 1.2%. However, after that the air temperature is 60
The acetone content remained 1.2% after 6 hours at ℃.
比較例3 加湿脱溶媒法 化合物−1 35gを下部にろ過板を有する直径4cmの円筒
容器に充填し30分間毎に撹拌を行ないながら温度25℃,
相対湿度80℃の加湿空気を下部ろ過板を通して粉体層に
流し脱溶媒を行なった(流量1/分)。アセトン含量
は6時間経過後0.8%になり10時間後には0.05%以下に
減少した。しかし含水率が初期値0.9%から10時間後8.5
%に増加しており、部分的に飴状の溶融体の生成が観察
された。直に乾燥工程に入り、乾燥空気流量1/分,
温度25℃で5時間,次に温度を40℃まで上げ更に5時
間,合計10時間通気乾燥を行なった。乾燥後内容物を取
り出し、先の加湿脱溶媒で飴状化した部分より変化した
小塊を篩過により分離し重量を測定した結果、小塊の生
成率は6.2%であった。この小塊分部のアセトン含量は
0.05%以下になっていたが脱溶媒操作前0.2%であった
加水分解生成体が1.7%に増加しており品質劣化が顕著
であった。またその他の部分についてもアセトン含量は
0.05%以下であったが加水分解生成体が0.7%に増加し
ており品質劣化は明らかであった。Comparative Example 3 Humidification Desolvation Method Compound-1 (35 g) was charged into a cylindrical container having a diameter of 4 cm and a filter plate at the bottom, and the temperature was 25 ° C. while stirring every 30 minutes.
Humidified air having a relative humidity of 80 ° C. was passed through the lower filter plate to the powder layer for desolvation (flow rate 1 / min). The acetone content was 0.8% after 6 hours and decreased to 0.05% or less after 10 hours. However, the initial moisture content was 0.9% and 8.5 after 10 hours.
%, And formation of a partially candy-like melt was observed. Directly enter the drying process, dry air flow rate 1 / min,
Air-drying was carried out at a temperature of 25 ° C for 5 hours, then the temperature was raised to 40 ° C for another 5 hours, for a total of 10 hours. After drying, the contents were taken out, and the small lumps changed from the candy-shaped portion by the humidifying desolvent were separated by sieving and the weight was measured. As a result, the small lump production rate was 6.2%. The acetone content of this small blob is
Although it was less than 0.05%, the hydrolysis product, which was 0.2% before the solvent removal operation, increased to 1.7%, and the quality deterioration was remarkable. Also, the acetone content of other parts is
Although it was less than 0.05%, the hydrolysis product increased to 0.7%, and the quality deterioration was obvious.
第1図,第2図は本発明の固状のセファロスポリン化合
物の精製を行なう最も簡単な装置を示す。 1……抽出器、5……加熱器 2……二酸化炭素ボンベ、6……圧力調節弁 3……凝縮器 4……高圧定量ポンプ 第1図 二酸化炭素ボンベ2から供給される二酸化炭素は凝縮器
3で液化され、高圧定量ポンプ4で加圧液送される。さ
らに加熱器5で所定の温度まで加熱され超臨界二酸化炭
素にされた後、固状のセファロスポリン化合物があらか
じめ充填されている抽出器1に入る。超臨界二酸化炭素
は固状のセファロスポリン化合物と接触して残存溶媒を
抽出した後、圧力調節弁6を通して廃棄される。 第2図 二酸化炭素ボンベ2から直接液化二酸化炭素が供給さ
れ、高圧定量ポンプ4で加圧液送後加熱器5で超臨界二
酸化炭素にされる。以下、第1図と同様。1 and 2 show the simplest apparatus for purifying the solid cephalosporin compound of the present invention. 1 ... Extractor, 5 ... Heater 2 ... Carbon dioxide cylinder, 6 ... Pressure control valve 3 ... Condenser 4 ... High-pressure metering pump Fig. 1 Carbon dioxide supplied from carbon dioxide cylinder 2 is condensed It is liquefied in the vessel 3 and sent under pressure by the high-pressure metering pump 4. Further, after being heated to a predetermined temperature by the heater 5 to be converted into supercritical carbon dioxide, it enters the extractor 1 in which the solid cephalosporin compound is pre-filled. The supercritical carbon dioxide is contacted with the solid cephalosporin compound to extract the residual solvent, and then discarded through the pressure control valve 6. FIG. 2 Liquefied carbon dioxide is directly supplied from the carbon dioxide cylinder 2, and after the pressurized liquid is sent by the high-pressure metering pump 4, it is turned into supercritical carbon dioxide by the heater 5. Hereinafter, the same as FIG.
Claims (1)
ン化合物を超臨界二酸化炭素で脱溶媒することを特徴と
するセファロスポリン化合物の精製法。1. A method for purifying a cephalosporin compound, which comprises desolvating a solid cephalosporin compound containing an organic solvent with supercritical carbon dioxide.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8750486 | 1986-04-15 | ||
| JP61-87504 | 1986-04-15 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6345284A JPS6345284A (en) | 1988-02-26 |
| JPH07121951B2 true JPH07121951B2 (en) | 1995-12-25 |
Family
ID=13916812
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62085949A Expired - Lifetime JPH07121951B2 (en) | 1986-04-15 | 1987-04-08 | Purification method of cephalosporin antibiotics |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07121951B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ATE267831T1 (en) * | 1999-09-30 | 2004-06-15 | Otsuka Kagaku Kk | CRYSTALS OF CEPHEM DERIVATIVES AND METHOD FOR THE PRODUCTION THEREOF |
| EP1354581A4 (en) * | 2000-12-26 | 2007-07-04 | Takeda Pharmaceutical | POROUS SUBSTANCE AND PROCESS FOR PRODUCING THE SAME |
-
1987
- 1987-04-08 JP JP62085949A patent/JPH07121951B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6345284A (en) | 1988-02-26 |
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