JPH0712468B2 - Substrate cleaning equipment - Google Patents
Substrate cleaning equipmentInfo
- Publication number
- JPH0712468B2 JPH0712468B2 JP8621790A JP8621790A JPH0712468B2 JP H0712468 B2 JPH0712468 B2 JP H0712468B2 JP 8621790 A JP8621790 A JP 8621790A JP 8621790 A JP8621790 A JP 8621790A JP H0712468 B2 JPH0712468 B2 JP H0712468B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- cleaning
- cassette case
- reversing
- reciprocating means
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Manufacturing Of Printed Wiring (AREA)
- Cleaning In General (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は、フォトマスク基板、ガラス基板などの工程前
処理として行なう基板洗浄装置に関して、基板表裏を全
面的に洗浄するための基板洗浄装置に関する。Description: TECHNICAL FIELD The present invention relates to a substrate cleaning apparatus for performing pretreatment of a photomask substrate, a glass substrate and the like, and a substrate cleaning apparatus for cleaning the entire front and back surfaces of the substrate. .
(従来の技術) 従来、基板洗浄においては、ロール状洗浄ブラシを用い
て、洗浄ブラシを基板面に接触させながら回転させ、基
板とブラシを相対的に移動させながら洗浄するものであ
る。従来は、この場合は基板に対して一方向への洗浄ブ
ラシ移動となるため、洗浄ブラシ圧の不均一、該ブラシ
の磨耗によるブラシ圧の不均一、洗浄ブラシと併用する
洗浄液の流れなどにより、一方向(ブラシの移動方向)
に洗浄不均一、洗浄跡が発生し易い。又、このような場
合の対応として、洗浄ブラシをブラシ移動方向に対して
直角方向(基板の移動流れ方向に対して直角方向)に一
定幅で揺動させる方法が考えられるが、この場合も、斜
め方向に同様の洗浄不均一、ブラシ洗浄跡などが発生す
る。さらに、揺動によって洗浄ブラシと基板端面との擦
れが大となり、ブラシの磨耗が大になり、破損が発生し
易い。(Prior Art) Conventionally, in cleaning a substrate, a roll-shaped cleaning brush is used to rotate the cleaning brush while contacting the surface of the substrate, and to relatively clean the substrate and the brush. Conventionally, in this case, since the cleaning brush moves in one direction with respect to the substrate, uneven cleaning brush pressure, uneven brush pressure due to abrasion of the brush, flow of cleaning liquid used in combination with the cleaning brush, etc. One direction (movement direction of brush)
Uneven cleaning and easy to generate cleaning marks. Further, as a countermeasure against such a case, a method of swinging the cleaning brush in a direction perpendicular to the brush moving direction (direction perpendicular to the moving direction of the substrate) with a constant width is conceivable. Similar cleaning unevenness, brush cleaning marks, etc. occur diagonally. Further, the rocking causes a large amount of friction between the cleaning brush and the end surface of the substrate, resulting in large abrasion of the brush, which easily causes damage.
又、垂直回転軸に取り付けた水平回転する円盤状の洗浄
ブラシの場合は、該円盤状洗浄ブラシは、基板面とブラ
シ面とが平行に接触して回転するため、洗浄不均一や洗
浄跡は発生し難いが、基板全面を均一に洗浄するために
は洗浄ブラシを基板より大きい径のものにするか、洗浄
ブラシが基板全面に均一に当接するように移動させなけ
ればならない。Further, in the case of a horizontally rotating disc-shaped cleaning brush attached to a vertical rotation shaft, since the disc-shaped cleaning brush rotates while the substrate surface and the brush surface are in contact with each other in parallel, cleaning unevenness and cleaning marks are not generated. Although it is unlikely to occur, in order to uniformly clean the entire surface of the substrate, it is necessary to make the cleaning brush have a diameter larger than that of the substrate, or move the cleaning brush so as to uniformly contact the entire surface of the substrate.
又、従来は、前記ロール状洗浄ブラシの場合も、円盤状
洗浄ブラシの場合も、洗浄ブラシに対する被洗浄基板の
設定は、一枚毎、基板をマニュアル操作で設定している
ため、非能率的であった。Further, conventionally, in the case of both the roll-shaped cleaning brush and the disc-shaped cleaning brush, the setting of the substrate to be cleaned with respect to the cleaning brush is inefficient because the substrate is manually set for each one. Met.
(発明の目的) 本発明は、ガラス基板などのフォトマスク製造工程、カ
ラーフィルター製造工程などの工程前処理として行なう
基板洗浄装置に関し、洗浄不均一や洗浄跡の発生を解消
するための装置であって、被洗浄基板に対する洗浄手段
の洗浄方向を相対的に変換できるようにするとともに、
被洗浄基板を基板収納カセットケースより自動的に取り
出し、洗浄手段に自動的に位置決めできるようにするこ
とを目的とするものである。(Object of the Invention) The present invention relates to a substrate cleaning apparatus that is performed as a pretreatment process such as a photomask manufacturing process for a glass substrate or a color filter manufacturing process, and is an apparatus for eliminating uneven cleaning and generation of cleaning marks. The cleaning direction of the cleaning means relative to the substrate to be cleaned can be relatively changed,
It is an object of the present invention to automatically take out a substrate to be cleaned from a substrate storage cassette case and automatically position it on a cleaning means.
(発明の構成) 本発明、基板収納カセットケース1を直線的に搬送する
カセットケース搬送手段2と、該カセットケース搬送手
段2によるカセットケース移動搬送路一方側より該搬送
路他方側に突出及び後退動作する一側往復手段3と、該
一側往復手段3と対峙し且つ前記基板収納カセットケー
ス1内の基板aを挟み付ける他側往復手段4と、前記カ
セットケース搬送路と直交する方向に順次配設する基板
保持可能な保持部9,10を備える基板反転手段5と洗浄ブ
ラシなどの洗浄手段6とを設け、前記カセットケース搬
送手段2に対する前記基板反転手段5と洗浄手段6とを
相対的に移動可能に設けたことを特徴とする基板洗浄装
置である。(Structure of the Invention) According to the present invention, a cassette case transporting means 2 for linearly transporting a substrate storing cassette case 1, and a cassette case moving transport path by the cassette case transporting means 2 protruding and retracting from one side of the transport path to the other side of the transport path. One side reciprocating means 3 that operates, another side reciprocating means 4 that faces the one side reciprocating means 3 and sandwiches the substrate a in the substrate storage cassette case 1, and sequentially in a direction orthogonal to the cassette case transport path. A substrate reversing unit 5 having holding units 9 and 10 capable of holding the substrate and a cleaning unit 6 such as a cleaning brush are provided, and the substrate reversing unit 5 and the cleaning unit 6 are relatively arranged with respect to the cassette case transporting unit 2. The substrate cleaning apparatus is characterized in that it is provided so as to be movable.
(発明の作用) 本発明装置は、基板収納カセットケースを直線的に搬送
するカセットケース搬送手段と、該カセットケース搬送
手段によるカセットケース搬送路一方側より該搬送路他
方側に突出及び後退動作する一方側往復手段と、該一方
側往復手段と対峙し且つ前記基板収納カセットケース内
の基板を挟み付ける他側往復手段とをもうけたので、前
記カセットケース内に前記一方側往復手段と他方往復手
段を嵌挿して、該両側の往復手段によってカセットケー
ス内の被洗浄基板をその対向辺より挟み付ることがで
き、挟み付けた後は、前記両側の昇降手段を同一方向に
同一速度にてカセットケースの一方側に移動動作させる
ことによって、挟み付けられている前記被洗浄基板を前
記カセットケース外方に一枚づつ自動的に引き出すこと
ができる。そして、本発明装置は、前記搬送手段の一方
側にて前記基板収納カセットケース搬送方向と直交する
方向に順次配設する基板反転手段と洗浄ブラシなどの洗
浄手段とを設け、前記カセットケース搬送手段に対して
前記基板反転手段と洗浄手段とを相対的に移動可能に設
けたので、前記両側往復手段によって挟み付けられてカ
セットケースより引き出された被洗浄基板は、その位置
に設置されている前記反転手段、あるいはその位置に相
対的に移動させてその位置に位置決めされた前記反転手
段の基板保持部に、一旦、受け渡し保持することがてき
る。前記基板が該基板保持部に受け渡され保持されてい
る間は、前記両側往復手段は、被洗浄基板の挟み付動作
を解除してカセットケースの搬送路外方に退避させるこ
とが可能であり、したがってその間に、基板収納カセッ
トケースを搬送手段によって移動させ、前記両側の往復
手段より遠ざけた後、再度両側往復手段によって、前記
反転手段に受け渡され保持されている前記基板を挟み付
けることができる。(Advantageous Effects of the Invention) The apparatus of the present invention linearly conveys the substrate storage cassette case, and the cassette case conveying means projects and retracts from one side of the cassette case conveying path to the other side of the conveying path. Since one side reciprocating means and the other side reciprocating means facing the one side reciprocating means and sandwiching the substrate in the substrate storing cassette case are provided, the one side reciprocating means and the other reciprocating means in the cassette case. The substrate to be cleaned in the cassette case can be sandwiched from the opposite sides by the reciprocating means on both sides, and after the sandwiching, the elevating means on both sides in the same direction at the same speed at the cassette. By moving to one side of the case, it is possible to automatically pull out the sandwiched substrates to be cleaned one by one outside the cassette case. Wear. The apparatus of the present invention is provided with substrate reversing means and cleaning means such as a cleaning brush which are sequentially arranged on one side of the conveying means in a direction orthogonal to the substrate storage cassette case conveying direction. Since the substrate reversing means and the cleaning means are provided so as to be movable relative to each other, the substrate to be cleaned which is sandwiched by the both-side reciprocating means and pulled out from the cassette case is installed at that position. The reversing means or the substrate holding part of the reversing means which is moved relative to the position and is positioned at the position can be temporarily transferred and held. While the substrate is being transferred to and held by the substrate holder, the double-sided reciprocating means can release the substrate to be cleaned from the clamping operation and retract it to the outside of the transport path of the cassette case. Therefore, in the meantime, after the substrate storage cassette case is moved by the transporting means and is moved away from the reciprocating means on both sides, the reciprocating means on both sides can again sandwich the substrate transferred to and held by the reversing means. it can.
そして、前記両側往復手段に対して反転手段を相対的に
移動させて遠ざけ、前記両側往復手段によって挟みつけ
られている被洗浄基板に対して相対的に洗浄ブラシなど
の前記洗浄手段を対向位置決めして、該洗浄手段に取り
付けられた洗浄用部材(ブラシ、スポンジ、不織布な
ど)を前記基板の表裏に対向させて、該両側往復手段に
よって挟み付けた状態で基板を一方向に往復動作させな
がら一方向に沿って洗浄操作することができる。Then, the reversing means is moved relative to the both-sided reciprocating means to move away from it, and the cleaning means such as a cleaning brush is positioned so as to face the substrate to be cleaned sandwiched by the both-sided reciprocating means. Then, the cleaning member (brush, sponge, nonwoven fabric, etc.) attached to the cleaning means is made to face the front and back of the substrate, and the substrate is reciprocated in one direction while being sandwiched by the both-side reciprocating means. A washing operation can be performed along the direction.
また、一方向洗浄操作後の基板は、前記反転手段の基板
支持部に再び受け渡されて、90°あるいは適宜角度だけ
回転させ、再度両側往復手段に挟み付けて、直交する方
向あるいは適宜方向に基板の洗浄送風操作を行なうこと
ができる。また、直交方向など適宜二方向の洗浄を終了
した基板は、反転手段に挟み付けて前記基板収納カセッ
トケース及び両側往復手段位置に移動させて位置決めし
て両側往復手段に受け渡し、元のカセットケース内に収
納することができる。In addition, the substrate after the one-way cleaning operation is again transferred to the substrate supporting portion of the reversing means, rotated by 90 ° or an appropriate angle, and again sandwiched by the both-side reciprocating means, in the orthogonal direction or the appropriate direction. The substrate can be washed and blown. In addition, the substrate that has been washed in two directions such as the orthogonal direction is sandwiched by the reversing means, moved to the substrate storage cassette case and the both-side reciprocating means position, and positioned and passed to the both-side reciprocating means. Can be stored in.
(実施例) 本発明装置の一実施例を第1図側面図、及び第2図平面
図に従って詳細に説明する。(Embodiment) An embodiment of the device of the present invention will be described in detail with reference to the side view of FIG. 1 and the plan view of FIG.
本発明装置は、第1図、基板aを各々縦の姿勢にして、
横方向に複数枚収納できる収納カセットケース1を直線
的に搬送するカセットケース搬送手段2と、該カセット
ケース搬送手段2によるカセットケース搬送路一方側
(上側)より該搬送路他方側(下側)に突出及び後退動
作する一方側往復手段3(実施例図面における上側の往
復手段)と、該一方側往復手段3と対峙し且つ前記基板
収納カセットケース1内の基板aを挟み付ける他側往復
手段4(実施例図面における下側の往復手段)とを設け
る。第3図は、本発明装置の動作説明図であり、第3図
(a)前記カセットケース1内に前記一方側(図面上
側)往復手段3と他方側(図面下側)往復手段4を嵌挿
して、該両側の往復手段3,4によってカセットケース1
内の被洗浄基板aの1枚をその対向辺より挟み付ける。
挟み付けた後は、第3図(b)前記両側の往復手段3,4
を同一方向(いずれも上側)に同一速度にて該カセット
ケース1の一方側(図面上側)に移動動作させることに
よって、挟み付けられている前記被洗浄基板aを前記カ
セットケース1の一方側(該カセットケース1の上側)
外方に一枚づつ自動的に引き出すことができる。The device of the present invention is configured such that the substrate a in FIG.
A cassette case conveying means 2 for linearly conveying a storage cassette case 1 capable of accommodating a plurality of sheets in the lateral direction, and a cassette case conveying path by the cassette case conveying means 2 from one side (upper side) to the other side (lower side) of the conveying path. One side reciprocating means 3 (upper side reciprocating means in the embodiment drawings) that protrudes and retracts to the other side, and the other side reciprocating means that faces the one side reciprocating means 3 and that sandwiches the substrate a in the substrate storage cassette case 1. 4 (lower reciprocating means in the embodiment drawings). FIG. 3 is a diagram for explaining the operation of the device of the present invention, and FIG. 3 (a) fits the one side (upper side of the drawing) reciprocating means 3 and the other side (lower side of the drawing) reciprocating means 4 in the cassette case 1. Insert the cassette case 1 by the reciprocating means 3 and 4 on both sides.
One of the to-be-cleaned substrates a is sandwiched between the opposite sides thereof.
After sandwiching, the reciprocating means 3, 4 on both sides of FIG.
Is moved to one side (upper side in the drawing) of the cassette case 1 at the same speed in the same direction (all above), so that the substrate to be cleaned a sandwiched is moved to one side of the cassette case 1 ( (Upper side of the cassette case 1)
It can be automatically pulled out one by one.
前記基板収納カセットケース1を搬送するための搬送手
段2は、第1図カセットケース1の搬送方向両側をクラ
ンプ突起2cによってクランプして、レール2aに沿って移
動可能な移動クランプ台2bを備えるものである。クラン
プ台2bはサーボモーターにより送行駆動するベルト、あ
るいは多段式のエアーシリンダーなどによって所定距離
の移動動作をさせるようにする。あるいは、レール2aに
設けたラックギアとクランプ台2bに設けた駆動ピニオン
ギアとの噛合によって搬送移動するようにしてもよい。The transport means 2 for transporting the substrate storage cassette case 1 is provided with a movable clamp base 2b which is movable along the rail 2a by clamping both sides of the cassette case 1 in the transport direction by the clamp protrusions 2c. Is. The clamp base 2b is designed to be moved by a predetermined distance by a belt driven by a servo motor or a multi-stage air cylinder. Alternatively, the rack gear provided on the rail 2a and the drive pinion gear provided on the clamp base 2b may be meshed to carry and move.
また、本発明装置は、第1図前記搬送手段2の一方側に
て前記基板収納カセットケース1の搬送方向と直交する
方向に、順次、基板反転手段5と、ローラー状のブラシ
6bなどを備える洗浄手段6(6aは洗浄ブラシの回転軸を
軸支するアーム)と、必要に応じて、不織布、スポン
ジ、布帛などのローラー状の拭取部材7bを備える拭取手
段7(7aは拭い取り部材の支軸を支持するアーム)とを
配置し、前記カセットケース搬送手段2の配置されてい
る定位置に対して前記基板反転手段5と洗浄手段6と拭
取手段7とをガイドレール8に沿って相対的に移動可能
に設けてある。前記レール8に沿って移動位置決めする
前記反転手段5、洗浄手段6、拭取手段7は各手段に備
えるサーボモーター、ステップモーターなどにより駆動
する駆動ピニオンギア5c,6c,7cをレール8上面に備える
ラックギア8aに噛合させることによって移動、位置決め
することができる。そして、第3図(b)に示すよう
に、前記両側往復手段3,4によって挟み付けられてカセ
ットケース1より一方側(図面のカセットケース1上
側)に引き出された前記被洗浄基板aに対して正対する
位置に、前記反転手段5、あるいは洗浄手段6、あるい
は必要に応じて設置する拭取手段7のいずれか所望の手
段一つを位置決めできるようになっている。例えば第3
図(c)に示すように、該引き出された基板aに正対す
るように位置決めされた前記反転手段5、あるいは相対
的に移動させて正対位置に位置決めされた前記反転手段
5の回転中心から両側に直線的に延びる反転アーム9の
端部に対向して備える基板保持部10,10(チャック機
構)に基板aは両側より挟み付けられ、一旦、反転アー
ム9に保持することができる。前記基板aが該基板保持
部10,10に受け渡され保持されている間は、第3図
(d)に示すように、前記両側往復手段3,4は、被洗浄
基板aの挟み付け動作を解除してカセットケース1より
排除され、該カセットケース1の搬送路外方に退避させ
ることが可能である。したがってその間、前記基板収納
カセットケース1を搬送手段2によって一旦移動させて
おき、前記両側の往復手段3,4より遠ざけた後、第3図
(e)再度両側往復手段3,4によって、前記反転手段5
に受け渡され保持されている前記基板aを挟み付け保持
することができる。そして、前記両側往復手段3,4に対
して反転手段5を相対的に移動させて遠ざける一方、挟
みつけられている被洗浄基板aに対して相対的に洗浄ブ
ラシ6bなどの駆動回転する洗浄用部材(ブラシ、スポン
ジ、不織布など)からなるローラー状の前記洗浄手段6
を対向位置決めして、前記基板aの表裏に対向させて、
該両側往復手段3,4によって挟み付けた状態で基板aを
上下方向に揺動動作させながら、洗浄液ノズル6dより洗
浄液噴射させ、且つ洗浄ブラシ6bを駆動回転させなが
ら、一方向に沿って洗浄操作することができる。洗浄手
段6による洗浄は、片面のみの洗浄をすることは可能で
ある。また、必要に応じて洗浄操作後に基板a面に残留
する洗浄液を拭い取る場合は、洗浄手段6を基板aと正
対する位置より遠ざける一方、不織布、スポンジ、布帛
などの拭取手段7(第1図、第2図)を基板aの表裏よ
り相対接触させ、基板aを前記往復手段3,4によって上
下に揺動動作させて基板a面の残留洗浄液を拭い取るも
のである。In addition, the apparatus of the present invention includes a substrate reversing means 5 and a roller-shaped brush in the direction orthogonal to the carrying direction of the substrate storage cassette case 1 on one side of the carrying means 2 in FIG.
A wiping means 7 (7a including a cleaning means 6 including 6b and the like (6a is an arm that pivotally supports the rotating shaft of the cleaning brush) and, if necessary, a roller-shaped wiping member 7b such as a nonwoven fabric, sponge, or cloth. And an arm supporting a spindle of the wiping member) and guides the substrate reversing means 5, the cleaning means 6 and the wiping means 7 to a fixed position where the cassette case transporting means 2 is arranged. It is provided so as to be relatively movable along the rail 8. The reversing means 5, the cleaning means 6, and the wiping means 7 which move and position along the rail 8 are provided with drive pinion gears 5c, 6c, 7c driven by servo motors, step motors, etc. provided on each means on the upper surface of the rail 8. It can be moved and positioned by engaging with the rack gear 8a. Then, as shown in FIG. 3 (b), with respect to the substrate to be cleaned a which is sandwiched by the both-sides reciprocating means 3 and 4 and pulled out to one side (upper side of the cassette case 1 in the drawing) from the cassette case 1. One of the desired one of the reversing means 5, the cleaning means 6, or the wiping means 7 installed as necessary can be positioned at a position facing directly. For example, the third
As shown in FIG. 3C, from the reversing means 5 positioned so as to face the drawn-out substrate a, or the rotation center of the reversing means 5 positioned at the facing position by relatively moving. The substrate a is sandwiched from both sides by the substrate holding portions 10 and 10 (chuck mechanism) provided so as to face the ends of the reversing arm 9 that linearly extends on both sides, and can be temporarily held by the reversing arm 9. While the substrate a is being transferred to and held by the substrate holders 10, 10, as shown in FIG. 3 (d), the double-sided reciprocating means 3, 4 are used to sandwich the substrate a to be cleaned. Is released from the cassette case 1, and the cassette case 1 can be withdrawn to the outside of the transport path. Therefore, during that time, the substrate storage cassette case 1 is once moved by the transfer means 2 and is moved away from the reciprocating means 3 and 4 on both sides, and then the reversing means 3 and 4 on both sides of FIG. Means 5
It is possible to sandwich and hold the substrate a transferred and held by the substrate. Then, the reversing means 5 is moved relatively away from the both-side reciprocating means 3 and 4, while the reversing means 5 is moved away from the reversing means 5, and the cleaning brush 6b and the like are driven to rotate relative to the sandwiched substrate a to be cleaned. The roller-like cleaning means 6 made of a member (brush, sponge, non-woven fabric, etc.)
To face the front and back of the substrate a,
A cleaning operation is performed along one direction while the substrate a is vertically swung while sandwiched by the both-side reciprocating means 3 and 4, while the cleaning solution is ejected from the cleaning solution nozzle 6d and the cleaning brush 6b is driven and rotated. can do. The cleaning by the cleaning means 6 can be performed on only one side. When the cleaning liquid remaining on the surface of the substrate a after the cleaning operation is wiped off as needed, the cleaning means 6 is moved away from the position directly facing the substrate a, while the wiping means 7 (first cloth, sponge, cloth, etc.) is used. (FIG. 2, FIG. 2) are brought into relative contact from the front and back of the substrate a, and the substrate a is swung up and down by the reciprocating means 3 and 4 to wipe off the residual cleaning liquid on the surface of the substrate a.
このようにして基板aを一方向洗浄操作後は、基板aと
正対する位置から前記洗浄手段6を前記両側往復手段3,
4に対して相対的に移動させる一方、第3図(f)前記
両側往復手段3,4に保持されている基板aに対し正対す
るように前記反転手段5を相対移動させて該往復手段3,
4によって挟み付けられている洗浄終了後の基板aを、
前記反転手段5の基板a挟み付け保持部10,10に受け渡
して保持し、第3図(g)両側往復手段3,4は挟み付け
動作を解除して基板aを開放し、該反転手段5によって
保持されている基板aを90°反転させる。続いて、第3
図(h)に示すように、該基板aを前記両側往復手段3,
4によって再度挟み付け、反転手段5を該両側往復手段
3,4の位置より相対的に離脱させ、再度洗浄手段6を該
両側往復手段3,4に挟み付けられている基板aの位置に
対向位置決めした後、前記両側往復手段3,4を一方向に
往復揺動動作させながら、洗浄液供給ノズルより洗浄液
を噴出させ、前記一方向に対して直交する方向に基板a
の洗浄操作を行なう。After the unidirectional cleaning operation of the substrate a in this manner, the cleaning means 6 is moved from the position directly facing the substrate a to the both side reciprocating means 3,
3 (f), the reversing means 5 is moved relative to the substrate a held by the double-sided reciprocating means 3 and 4 so as to face it. ,
The substrate a after cleaning, which is sandwiched by 4, is
The board a is sandwiched and held by the reversing means 5 and held by the board holding means 10, and both side reciprocating means 3 and 4 in FIG. 3 (g) release the board a to release the board a. The substrate a held by is turned over by 90 °. Then, the third
As shown in FIG. 3H, the substrate a is reciprocally moved to the both side reciprocating means 3,
It is sandwiched again by 4, and the reversing means 5 is reciprocating means on both sides.
After being relatively separated from the positions 3 and 4, the cleaning means 6 is again positioned to face the position of the substrate a sandwiched between the both side reciprocating means 3 and 4, and then the both side reciprocating means 3 and 4 are moved in one direction. The cleaning liquid is ejected from the cleaning liquid supply nozzle while reciprocally swinging to and from the substrate a in a direction orthogonal to the one direction.
Perform the washing operation of.
このようにして直交方向の洗浄を終了した基板aの対向
位置より洗浄手段6を相対移動させて離脱させ、続い
て、第3図(i)に示すように、該基板aの位置に対し
て反転手段5を正対するように相対移動させて該基板a
の位置に該反転手段5を対向位置決めして、前記両側往
復手段3,4に挟み付けられている前記基板aを前記反転
手段5の基板保持部10,10に受け渡す。続いて、第3図
(j)両側往復手段3,4は基板aの挟み付け動作を解除
して、一方側往復手段3は一方側に、他方側往復手段4
は他方側にそれぞれ離反し、続いて、第3図(k)前記
収納カセットケース1が搬送手段2によって移動して前
記一方側往復手段3と他方側往復手段4との対峙する空
間内に再度位置決めされ、第3図(l)前記他方側往復
手段4(実施例図面において下側の往復手段)が一方側
(実施例図面において下側)に移動動作して前記被洗浄
基板aが位置決めされている収納カセットケース1内に
進入し、前記反転手段5によって保持されている直交洗
浄後の前記基板を前記一方側往復手段と前記他方側往復
手段とにより挟み付け、前記基板は前記反転手段から両
側往復手段手段に受け渡される。そして、第3図(m)
該両側往復手段3,4は、前記基板aを挟んだ状態で、基
板収納カセットケース1方向に移動し、直交洗浄後の前
記基板aを該カセットケース1内に収納するものであ
る。該基板aを収納した後の両側往復手段3,4(上側の
往復手段3と下側の往復手段4)は、第3図(n)それ
ぞれ上側、下側に離反動作して、カセットケース1搬送
手段2のケース搬送路外に退避し、続いて前記カセット
ケース1は、搬送手段2によってを移動し、次に収納さ
れている基板aを前記両側往復手段3,4の相対移動さ
せ、1サイクル動作を終了するものである。上記動作を
1サイクル動作として繰り返し動作して、基板カセット
ケース内の複数枚の基板を洗浄操作するものであり、順
次基板収納カセットケース内の被洗浄基板を取り出し、
続いて直交洗浄動作し、続いて直交洗浄後の基板を再び
基板収納カセットケース内に収納することができるもの
である。In this way, the cleaning means 6 is relatively moved from the facing position of the substrate a for which the cleaning in the orthogonal direction has been completed, and then the cleaning means 6 is separated from the position of the substrate a as shown in FIG. 3 (i). The reversing means 5 is relatively moved so as to directly face the substrate a.
The reversing means 5 is positioned to face the reversing means 5, and the substrate a sandwiched between the both-side reciprocating means 3 and 4 is transferred to the substrate holding portions 10 and 10 of the reversing means 5. Subsequently, the double-sided reciprocating means 3 and 4 in FIG. 3 (j) release the pinching operation of the substrate a, and the one-sided reciprocating means 3 is moved to one side and the other-side reciprocating means 4 is moved.
Are separated from each other on the other side, and then the storage cassette case 1 is moved by the conveying means 2 in FIG. 3 (k) to be re-entered in the space where the one-side reciprocating means 3 and the other-side reciprocating means 4 face each other. 3 (l), the other side reciprocating means 4 (lower reciprocating means in the embodiment drawings) moves to one side (lower side in the embodiment drawings) to position the substrate a to be cleaned. The substrate after the orthogonal cleaning held in the storage cassette case 1 held by the reversing means 5 is sandwiched by the one side reciprocating means and the other side reciprocating means, and the substrate is removed from the reversing means. It is delivered to both-sides reciprocating means. And FIG. 3 (m)
The both-sides reciprocating means 3 and 4 move in the direction of the substrate storing cassette case 1 while sandwiching the substrate a, and store the substrate a after orthogonal cleaning in the cassette case 1. The two-sided reciprocating means 3 and 4 (the upper reciprocating means 3 and the lower reciprocating means 4) after accommodating the substrate a are moved upward and downward respectively in FIG. The cassette case 1 is evacuated to the outside of the case transport path of the transport means 2, and then the cassette case 1 is moved by the transport means 2 to relatively move the substrate a stored therein to the both side reciprocating means 3 and 4. The cycle operation is ended. The above operation is repeated as one cycle operation to wash a plurality of substrates in the substrate cassette case, and the substrates to be cleaned in the substrate storage cassette case are sequentially taken out,
Then, the orthogonal cleaning operation is performed, and then the substrate after the orthogonal cleaning can be stored again in the substrate storage cassette case.
第4図、本発明装置における反転手段5の部分拡大側面
図であり、反転手段5に備える反転アーム9の回転及び
基板aへの前後移動機構の一例を示すものである。レー
ル8に沿って図面手前より向こう側に往復移動可能な支
持台12を設け、該支持台12上側にブラケット13を備え
る。該ブラケット13にはロータリーエアーシリンダー14
をそのロータリー軸14aの方向がスライド方向に平行に
なるように取付ける。該ロータリー軸14a内には、該軸1
4aの内周のみとスプライン嵌合するリニアーエアーシリ
ンダー15のロッド15aを装填してあり、該ロッド15aの末
端部に前記リニアーエアーシリンダー15をブラケット13
に一体に取り付けてある。13aはロータリー軸14aの軸受
部、13bはリニアーエアーシリンダーロッド15aの軸受部
である。該ロッド15aの先端部に、反転アーム9をその
回転中心部にて取付ける。該反転アーム9の両端部には
その回転中心に向かう方向にスライド可能な保持部10,1
0を取り付ける。該保持部10,10は、反転アーム9に内装
するマイクエアーシリンダー9a,9aによってスライド可
能である。該保持部10,10は、第3図(c)に示すよう
に、基板aのコーナー部分と嵌合する切欠部10a,10aを
設けるものである。上記反転手段5は、ロータリーエア
ーシリンダー14を動作させることによってロータリー軸
14aを回転させ、該軸14aの回転とともにスプライン嵌合
しているリニアーエアーシリンダーロッド15aを回転さ
せることがてき、該ロッド15a先端部に取り付けられた
反転アーム9を回転させることができる。また、リニア
ーエアーシリンダー15を動作させることによってシリン
ダーロッド15aを往復動作させることによって、該ロッ
ド15a先端に取り付けられた反転アーム9を支持台12の
移動方向に対して直交方向(図面左右方向)に出し入れ
することができ、前記両側往復手段3,4に対して交差、
復帰できるものである。FIG. 4 is a partially enlarged side view of the reversing means 5 in the device of the present invention, showing an example of a mechanism for rotating the reversing arm 9 provided in the reversing means 5 and moving back and forth to the substrate a. A support base 12 is provided which can reciprocate along the rail 8 toward the front side of the drawing, and a bracket 13 is provided above the support base 12. The bracket 13 has a rotary air cylinder 14
Is mounted so that the direction of the rotary shaft 14a is parallel to the sliding direction. In the rotary shaft 14a, the shaft 1
A rod 15a of a linear air cylinder 15 that fits only in the inner periphery of 4a by a spline is loaded, and the linear air cylinder 15 is attached to a bracket 13 at the end of the rod 15a.
It is attached integrally to. Reference numeral 13a is a bearing portion of the rotary shaft 14a, and 13b is a bearing portion of the linear air cylinder rod 15a. The reversing arm 9 is attached to the tip of the rod 15a at the center of rotation thereof. At both ends of the reversing arm 9, there are holding portions 10, 1 slidable in the direction toward the center of rotation.
Install 0. The holding portions 10 and 10 can be slid by microphone air cylinders 9a and 9a installed in the reversing arm 9. As shown in FIG. 3 (c), the holding portions 10 and 10 are provided with cutout portions 10a and 10a which fit with the corner portions of the substrate a. The reversing means 5 operates the rotary air cylinder 14 to operate the rotary shaft.
By rotating the shaft 14a, the linear air cylinder rod 15a fitted in the spline can be rotated together with the rotation of the shaft 14a, and the reversing arm 9 attached to the tip of the rod 15a can be rotated. In addition, by operating the linear air cylinder 15 to reciprocate the cylinder rod 15a, the reversing arm 9 attached to the tip of the rod 15a is moved in the direction orthogonal to the moving direction of the support base 12 (the horizontal direction in the drawing). It can be put in and out, intersects with both side reciprocating means 3, 4,
It can be restored.
本発明においては、上記反転手段5の他に、前記洗浄手
段6の洗浄ブラシ6a、拭取手段7の拭取部材7aの同様に
基板aに接触、離間させる必要があるが、上記同様の機
構を採用することが可能である。In the present invention, in addition to the reversing means 5, the cleaning brush 6a of the cleaning means 6 and the wiping member 7a of the wiping means 7 need to come into contact with and separate from the substrate a, but the same mechanism as above. Can be adopted.
第5図は、拭取手段7の拭取部材7bの形体の一例を示す
斜視図であり、円柱軸部7dの周囲に、該軸部の直径より
も十分大きい直径になるように、円筒状のあるいはシー
トを円筒状にした不織布、スポンジなど多孔性部材7fを
配置し、該不織布7f外周より等間隔に複数本の押え板7e
を配置して不織布7fを軸部7dに押し付け、ネジ7gなどに
より固定するものである。押え板7gにより押し付けられ
た部分以外の多孔性部材7fにより突出部によって、基板
aを洗浄して後の基板a面の残留洗浄液を拭取ることが
できる。FIG. 5 is a perspective view showing an example of the shape of the wiping member 7b of the wiping means 7, which has a cylindrical shape around the cylindrical shaft portion 7d so that the diameter is sufficiently larger than the diameter of the shaft portion. Or a porous member 7f such as a sponge in which the sheet is made into a cylindrical shape is arranged, and a plurality of holding plates 7e are arranged at equal intervals from the outer periphery of the nonwoven fabric 7f.
Is arranged and the non-woven fabric 7f is pressed against the shaft portion 7d, and is fixed by a screw 7g or the like. The porous member 7f other than the portion pressed by the holding plate 7g can wash the substrate a by the protruding portion and wipe the residual cleaning liquid on the surface of the substrate a afterwards.
(発明の効果) 本発明は、基板収納カセットケース内に収納されている
被洗浄基板の表面あるいは表裏両面の洗浄を自動的に実
施でき、また、基板の一方向のみではなく、直交する方
向、あるいは、反転手段による反転角度の適宜設定によ
って直交方向以外の適宜角度の方向に対して洗浄操作す
ることができ、また、洗浄操作終了後の基板は、再度、
元の収納カセットケース内に自動的に収納でき、基板材
料の洗浄操作の能率向上にぼ顕著な効果を発揮するもの
である。(Advantages of the Invention) The present invention can automatically clean the front surface or both front and back surfaces of a substrate to be cleaned housed in a substrate housing cassette case, and can be used not only in one direction of the substrate but also in an orthogonal direction, Alternatively, the cleaning operation can be performed in an appropriate angle direction other than the orthogonal direction by appropriately setting the inversion angle by the inversion means, and the substrate after the cleaning operation is again
It can be automatically stored in the original storage cassette case and has a remarkable effect in improving the efficiency of the substrate material cleaning operation.
第1図は本発明装置の一実施例の側面図、第2図は本発
明装置の一実施例の平面図、第3図は本発明装置による
洗浄動作説明図、第4図は本発明装置における反転手段
の一実施例の側面図、第5図は本発明装置の拭取手段に
用いる拭取部材の一実施例の斜視図である。 1……基板収納カセットケース、2……ケース搬送手
段、3……一方側往復手段、4……他方側往復手段、5
……反転手段、6……洗浄手段、7……拭取手段、8…
…ガイドレール、9……反転アーム、10……保持部(チ
ャック)11……カセット上部カバー、12……支持台、13
……ブラケット、14……ロータリーエアーシリンダー、
15……リニアーエアーシリンダー、a……基板FIG. 1 is a side view of an embodiment of the apparatus of the present invention, FIG. 2 is a plan view of an embodiment of the apparatus of the present invention, FIG. 3 is a diagram for explaining a cleaning operation by the apparatus of the present invention, and FIG. 4 is an apparatus of the present invention. FIG. 5 is a side view of an embodiment of the inverting means in FIG. 5, and FIG. 5 is a perspective view of an embodiment of the wiping member used in the wiping means of the device of the present invention. 1 ... Substrate storage cassette case, 2 ... Case transfer means, 3 ... One side reciprocating means, 4 ... Other side reciprocating means, 5
…… Inversion means, 6 …… Cleaning means, 7 …… Wipe means, 8 ・ ・ ・
… Guide rails, 9 …… Reversing arms, 10 …… Holding part (chuck) 11 …… Cassette top cover, 12 …… Supporting base, 13
…… Bracket, 14 …… Rotary air cylinder,
15: Linear air cylinder, a: Substrate
Claims (1)
するカセットケース搬送手段2と、該カセットケース搬
送手段2によるカセットケース移動搬送路一方側より該
搬送路他方側に突出及び後退動作する一側往復往復手段
3と、該一側往復手段3と対峙し且つ前記基板収納カセ
ットケース1内に収納された基板aを挟み付ける他側往
復手段4と、前記カセットケース搬送路と直交する方向
に順次配設する基板保持可能な保持部9,10を備える基板
反転手段5と洗浄ブラシなどの洗浄手段6とを設け、前
記カセットケース搬送手段2に対する前記基板反転手段
5と洗浄手段6とを相対的に移動可能に設けたことを特
徴とする基板洗浄装置。1. A cassette case transporting means 2 for linearly transporting a substrate storing cassette case 1, and a cassette case moving means 2 for projecting and retracting from one side of the cassette case moving transport path to the other side of the transport path. The side reciprocating means 3, the other side reciprocating means 4 facing the one side reciprocating means 3 and sandwiching the substrate a accommodated in the substrate accommodating cassette case 1, in a direction orthogonal to the cassette case transport path. A substrate reversing means 5 including holding portions 9 and 10 capable of holding substrates arranged in sequence and a cleaning means 6 such as a cleaning brush are provided, and the substrate reversing means 5 and the cleaning means 6 are opposed to the cassette case carrying means 2. A substrate cleaning apparatus characterized in that it is provided so as to be movable.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8621790A JPH0712468B2 (en) | 1990-03-31 | 1990-03-31 | Substrate cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8621790A JPH0712468B2 (en) | 1990-03-31 | 1990-03-31 | Substrate cleaning equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03288584A JPH03288584A (en) | 1991-12-18 |
| JPH0712468B2 true JPH0712468B2 (en) | 1995-02-15 |
Family
ID=13880614
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8621790A Expired - Lifetime JPH0712468B2 (en) | 1990-03-31 | 1990-03-31 | Substrate cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0712468B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100675732B1 (en) * | 1999-12-16 | 2007-01-29 | 엘지.필립스 엘시디 주식회사 | Liquid crystal panel polishing apparatus and its polishing method |
| JP7120749B2 (en) * | 2017-10-25 | 2022-08-17 | 株式会社Subaru | Cleaning equipment and cleaning method |
| CN108580488A (en) * | 2018-05-23 | 2018-09-28 | 河海大学文天学院 | A kind of cleaning equipment and its working method |
| CN110605263B (en) * | 2019-10-31 | 2024-08-27 | 宁波三星智能电气有限公司 | Cleaning equipment |
-
1990
- 1990-03-31 JP JP8621790A patent/JPH0712468B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03288584A (en) | 1991-12-18 |
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