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JPH0712706B2 - Method for manufacturing electrostatic latent image forming apparatus - Google Patents
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JPH0712706B2 - Method for manufacturing electrostatic latent image forming apparatus - Google Patents

Method for manufacturing electrostatic latent image forming apparatus

Info

Publication number
JPH0712706B2
JPH0712706B2 JP62106583A JP10658387A JPH0712706B2 JP H0712706 B2 JPH0712706 B2 JP H0712706B2 JP 62106583 A JP62106583 A JP 62106583A JP 10658387 A JP10658387 A JP 10658387A JP H0712706 B2 JPH0712706 B2 JP H0712706B2
Authority
JP
Japan
Prior art keywords
electrode
latent image
image forming
electrostatic latent
insulating layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62106583A
Other languages
Japanese (ja)
Other versions
JPS63270157A (en
Inventor
裕治 末光
晃二 増田
和夫 浅野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Business Innovation Corp
Original Assignee
Fuji Xerox Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Xerox Co Ltd filed Critical Fuji Xerox Co Ltd
Priority to JP62106583A priority Critical patent/JPH0712706B2/en
Publication of JPS63270157A publication Critical patent/JPS63270157A/en
Publication of JPH0712706B2 publication Critical patent/JPH0712706B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/385Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective supply of electric current or selective application of magnetism to a printing or impression-transfer material
    • B41J2/39Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective supply of electric current or selective application of magnetism to a printing or impression-transfer material using multi-stylus heads
    • B41J2/395Structure of multi-stylus heads

Landscapes

  • Dot-Matrix Printers And Others (AREA)
  • Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、イオン流を変調し誘電体上に静電潜像を形成
する静電潜像形成装置の製造方法に関する。
The present invention relates to a method of manufacturing an electrostatic latent image forming device that modulates an ion current to form an electrostatic latent image on a dielectric.

〔従来の技術〕[Conventional technology]

一般に、イオン流を用いた静電記録の原理を第8図によ
り説明すると、静電記録ヘッド11において発生したイオ
ンは、回転ドラム12面の記録媒体上に静電潜像13を形成
し、該静電潜像13には現像器14によりトナー等の現像剤
を付着させてトナー像15を形成し、転写部16においてト
ナー像15が記録用紙17に転写されることにより静電記録
が行われる。そして、記録媒体は除電部18において除電
された後、残った現像剤をトナー除去部19で除去し、次
回の記録に備えている。
Generally, the principle of electrostatic recording using an ion stream will be described with reference to FIG. 8. Ions generated in the electrostatic recording head 11 form an electrostatic latent image 13 on the recording medium on the surface of the rotating drum 12, A developer such as toner is attached to the electrostatic latent image 13 by the developing device 14 to form a toner image 15, and the toner image 15 is transferred to the recording sheet 17 at the transfer section 16 to perform electrostatic recording. . Then, after the charge of the recording medium is removed by the charge removing unit 18, the remaining developer is removed by the toner removing unit 19 to prepare for the next recording.

従来、上記静電潜像形成装置におけるイオン流発生方式
としては、ピン状電極を一列に並べ誘電体と接触させ、
誘電体との間で直接放電を起こさせる直接静電記録方式
が知られているが、電極と誘電体間のギャップを高精度
に維持しなければならず、また、放電を安定させること
ができないとか、電極が磨耗するとかの欠点があった。
Conventionally, as the ion flow generation method in the electrostatic latent image forming apparatus, the pin-shaped electrodes are arranged in a line and brought into contact with the dielectric,
A direct electrostatic recording method is known in which a direct discharge is generated between the dielectric and the dielectric, but the gap between the electrode and the dielectric must be maintained with high accuracy, and the discharge cannot be stabilized. There was a defect that the electrodes were worn out.

上記欠点を除去するために、種々の間接静電記録方式が
知られている。例えば、第9図は特開昭57−101863号公
報に提案されている方式であり、コロナイオン発生器11
はシールド20内にコロナワイヤ21を内蔵しており、該イ
オン発生器11の下部には、絶縁層23を挟んで共通電極22
aと制御電極22bが設けられ、イオン発生器11において発
生したイオンを、共通電極22aと制御電極22bとの間の電
界強度に応じて、イオン通過孔24から導出し誘電体25を
帯電させるものである。
Various indirect electrostatic recording methods are known to eliminate the above-mentioned drawbacks. For example, FIG. 9 shows a system proposed in Japanese Patent Application Laid-Open No. 57-101863, in which a corona ion generator 11 is used.
Has a corona wire 21 built in a shield 20, and a common electrode 22 is provided below the ion generator 11 with an insulating layer 23 interposed therebetween.
a and a control electrode 22b are provided, and ions generated in the ion generator 11 are led out from the ion passage hole 24 to charge the dielectric 25 in accordance with the electric field strength between the common electrode 22a and the control electrode 22b. Is.

また、第10図は特開昭58−132571号公報に提案されてい
る方式であり、絶縁性基板26の一面に放電電極27a、27b
を対向して配列させると共に、絶縁性基板26の他面には
加速用電極28を設け、放電電極27a、27b間に極性の異な
る電圧パルスを印加することにより、放電を起こさせて
正、負のイオンを発生させ、加速用電極28への電圧パル
スに応じてイオンを導出し、誘電体25を正または負のイ
オンで帯電させるものである。
FIG. 10 shows a method proposed in Japanese Patent Laid-Open No. 132571/1983, in which the discharge electrodes 27a and 27b are formed on one surface of the insulating substrate 26.
Are arranged to face each other, and an accelerating electrode 28 is provided on the other surface of the insulating substrate 26, and voltage pulses having different polarities are applied between the discharge electrodes 27a and 27b, thereby causing discharge to generate positive and negative. Are generated, the ions are derived in response to a voltage pulse to the acceleration electrode 28, and the dielectric 25 is charged with positive or negative ions.

また、第11図は米国特許第4,160,257号に提案されてい
る方式であり、誘電体30を挟んで駆動電極31と制御電極
32が形成され、さらに、絶縁層33を介して共通電極34が
形成されている。駆動電極31と制御電極32は互いに方向
が異なるようにマトリックス状に配設され、絶縁層33お
よび共通電極34には、該マトリックスに対応して複数の
開口35および36が形成される。そして、複数の駆動電極
31と制御電極32間に選択的に交流電圧を印加することに
より、マトリックスの選択された部分に対応する制御電
極32近傍に正、負のイオンが発生し、制御電極32と共通
電極34間のバイアス電圧の極性に応じた正または負のイ
オンが、開口35および36より導出されて静電記録が行わ
れる。
Further, FIG. 11 shows a method proposed in U.S. Pat. No. 4,160,257, in which a drive electrode 31 and a control electrode are sandwiched with a dielectric material 30 in between.
32 is formed, and further, the common electrode 34 is formed via the insulating layer 33. The drive electrode 31 and the control electrode 32 are arranged in a matrix so that the directions thereof are different from each other, and the insulating layer 33 and the common electrode 34 are provided with a plurality of openings 35 and 36 corresponding to the matrix. And a plurality of drive electrodes
By selectively applying an AC voltage between the control electrode 32 and the control electrode 32, positive and negative ions are generated in the vicinity of the control electrode 32 corresponding to the selected portion of the matrix, and between the control electrode 32 and the common electrode 34. Positive or negative ions depending on the polarity of the bias voltage are extracted from the openings 35 and 36 to perform electrostatic recording.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

しかしながら、前述した第9図で示したワイヤにより放
電させる方式においては、コロナ放電により発生したイ
オンが開口域まで遠いために、シールド20に殆ど吸収さ
れてしまい、アパーチャ電極22a、22bを通過するイオン
流が少なく、イオンの利用効率が悪いという問題を有し
ている。
However, in the method of discharging with the wire shown in FIG. 9 described above, since the ions generated by the corona discharge are far to the opening area, they are almost absorbed by the shield 20, and the ions passing through the aperture electrodes 22a and 22b are absorbed. There is a problem that the flow is small and the utilization efficiency of ions is poor.

また、第10図で示した電極により放電させる方式におい
ては、電極が露出しているためリークし易いと共に、電
極同士の直接放電であるために電極がダメージを受け易
く、また、電極数が多く高密度化或いは配線が困難であ
るという問題を有している。
Further, in the method of discharging by the electrode shown in FIG. 10, since the electrode is exposed, it is easy to leak, and because the electrode is directly discharged, the electrode is easily damaged, and the number of electrodes is large. There is a problem that it is difficult to achieve high density or wiring.

また、第11図における例においては、比較的前述した問
題は少ないが、マトリックス駆動が不可欠であるため、
1ライン上に潜像を形成する場合にデータの並び変えや
位置合わせが必要であり、また、高速化が困難であり、
その結果、複雑な制御回路を必要とし装置が大型化する
という問題を有している。
Further, in the example in FIG. 11, although the above-mentioned problems are relatively small, matrix driving is indispensable,
When a latent image is formed on one line, data rearrangement and alignment are required, and it is difficult to increase the speed.
As a result, there is a problem that a complicated control circuit is required and the device becomes large.

本出願人は、上記した問題を解決するために、基体上に
互いに独立して配列された電極群と、該電極群と絶縁層
を挟んで対向させた共通電極とを有し、該共通電極と絶
縁層とに開口部を有する静電潜像形成装置を別途出願し
ており、これにより、イオンの利用効率が高く、安定し
た放電が可能であり、高速化および高密度化を可能にし
ている。
In order to solve the above-mentioned problems, the applicant has a group of electrodes arranged independently of each other on a base body, and a common electrode opposed to the group of electrodes with an insulating layer interposed therebetween. We have separately applied for an electrostatic latent image forming device having an opening in the insulating layer, and this makes it possible to achieve high ion utilization efficiency, stable discharge, high speed and high density. There is.

しかしながら、該静電潜像形成装置においては、開口部
と放電領域および独立電極の位置精度に高精度が要求さ
れると共に、開口を予め形成した共通電極や絶縁層を貼
り合わせて作る場合にも高精度の位置合わせが要求さ
れ、また、貼り合わせの際に接着剤がはみだして開口を
塞ぐ恐れがあるという問題を生じている。
However, in the electrostatic latent image forming apparatus, high precision is required for the positional accuracy of the opening, the discharge region and the independent electrode, and even when the common electrode or the insulating layer in which the opening is formed in advance is bonded together. High-precision alignment is required, and there is a problem in that the adhesive may stick out and block the opening during bonding.

本発明はこの問題を解決するものであって、電極と開口
部との高精度の位置合わせが不要であり、かつ、確実に
開口部を形成することができる静電潜像形成装置の製造
方法を提供することを目的とする。
The present invention solves this problem and does not require highly precise alignment between the electrode and the opening, and is capable of reliably forming the opening. The purpose is to provide.

〔問題点を解決するための手段〕[Means for solving problems]

そのために本発明の静電潜像形成装置の製造方法は、基
体上に互いに独立して配列された電極群と、該電極群と
絶縁層を挟んで対向させた共通電極とを有すると共に、
該共通電極と絶縁層に開口部を有する静電潜像形成装置
において、基体上に独立した電極群を形成し、該電極群
と基体上を絶縁層で被覆した後、該絶縁層上に共通電極
層を形成し、しかる後に穿孔工程を行って前記開口部を
形成することを特徴とするものである。
Therefore, the method of manufacturing an electrostatic latent image forming apparatus of the present invention has a group of electrodes arranged independently of each other on the substrate, and a common electrode facing the group of electrodes with an insulating layer interposed therebetween,
In an electrostatic latent image forming apparatus having an opening in the common electrode and an insulating layer, an independent electrode group is formed on a base, and the electrode group and the base are covered with an insulating layer, and then common on the insulating layer. It is characterized in that an electrode layer is formed, and then a perforation step is performed to form the opening.

〔作用〕[Action]

本発明においては、例えば第5図に示すように、先ず、
(a)図に示すように、基体1上に電極層2を形成し、
次にレジスト層を塗布し(b)、所望のパターンのフォ
トマスクにより露光し(c)た後、露光部分のレジスト
層を除去し(d)、しかる後にエッチングを行い独立し
た電極2a、2b、…を形成し(e)、次いで、絶縁層3を
形成し(f)、次に、絶縁層3上に共通電極層4を形成
し(g)、さらに、この上にレジスト層を塗布し
(h)、マスクにより露光を行い(i)、不要なレジス
ト材を除去し(j)、しかる後、エッチング工程を行っ
て共通電極層4および絶縁層3に穿孔を行い開口5を形
成し(k)、最後にレジスト材を除去して静電潜像形成
装置を得るものである。
In the present invention, for example, as shown in FIG.
(A) As shown in the figure, the electrode layer 2 is formed on the substrate 1,
Next, a resist layer is applied (b), exposed with a photomask having a desired pattern (c), the resist layer in the exposed portion is removed (d), and then etching is performed to form independent electrodes 2a, 2b, Are formed (e), then the insulating layer 3 is formed (f), then the common electrode layer 4 is formed on the insulating layer 3 (g), and a resist layer is further applied on this (g). h), exposing with a mask (i), removing unnecessary resist material (j), and then performing an etching process to perforate the common electrode layer 4 and the insulating layer 3 to form an opening 5 (k). ), And finally, the resist material is removed to obtain an electrostatic latent image forming device.

〔実施例〕〔Example〕

以下本発明の実施例を図面を参照しつつ説明する。第1
図は本発明が適用される静電潜像形成装置の1実施例を
示す断面図、第2図は第1図における電極部の斜視図、
第3図および第4図は本発明が適用される静電潜像形成
装置の他の実施例を示す断面図、第5図は本発明の静電
潜像形成装置の製造方法の1実施例を説明するための
図、第6図および第7図は本発明の静電潜像形成装置の
製造方法の他の実施例を説明するための図である。図
中、1は基体、2は電極層、2a〜2dは電極、3は絶縁
層、4は共通電極、5は開口、6は基層、7は誘電体
層、8、9は直流電源、10は交流電源を示す。
Embodiments of the present invention will be described below with reference to the drawings. First
1 is a sectional view showing an embodiment of an electrostatic latent image forming apparatus to which the present invention is applied, FIG. 2 is a perspective view of an electrode portion in FIG. 1,
3 and 4 are sectional views showing another embodiment of the electrostatic latent image forming apparatus to which the present invention is applied, and FIG. 5 is one embodiment of the method for manufacturing the electrostatic latent image forming apparatus of the present invention. FIGS. 6 and 7 are views for explaining another embodiment of the method for manufacturing an electrostatic latent image forming apparatus according to the present invention. In the figure, 1 is a substrate, 2 is an electrode layer, 2a to 2d are electrodes, 3 is an insulating layer, 4 is a common electrode, 5 is an opening, 6 is a base layer, 7 is a dielectric layer, 8 and 9 are DC power supplies, 10 Indicates an AC power supply.

第1図において、基体1上には互いに独立した電極2a、
2b、2c、2d、…が並列に配列されており、該電極2a〜2d
の各々には絶縁層3が被覆されると共に、該絶縁層3上
には共通電極4が配置され、また、共通電極4には各電
極2a〜2d間に対向して開口5が形成されている。また、
基層6上には誘電体層7が形成され、該誘電体層7が前
記共通電極4に対向して配置されると共に、前記基層6
は接地されている。一方、共通電極4には直流電源8に
よりバイアス電圧が印加されると共に、例えば、電極2a
には直流電源9により直流電圧が印加され、電極2bには
直流電圧が重乗された交流電圧が交流電源10により印加
されている。
In FIG. 1, electrodes 2a independent from each other are formed on the substrate 1.
2b, 2c, 2d, ... Are arranged in parallel, and the electrodes 2a to 2d
Is covered with an insulating layer 3, a common electrode 4 is arranged on the insulating layer 3, and an opening 5 is formed in the common electrode 4 so as to face each other between the electrodes 2a to 2d. There is. Also,
A dielectric layer 7 is formed on the base layer 6, the dielectric layer 7 is disposed to face the common electrode 4, and the base layer 6 is formed.
Is grounded. On the other hand, a bias voltage is applied to the common electrode 4 from the DC power source 8 and, for example, the electrode 2a
A DC voltage is applied to the electrode 2b by the DC power supply 9, and an AC voltage multiplied by the DC voltage is applied to the electrode 2b by the AC power supply 10.

第3図は静電潜像形成装置の他の例を示している。
(a)図は、隣接する電極2a〜2dのうち、1つおきに電
極を絶縁層3で被覆し、他の電極は隣接する電極に対向
する部分の絶縁層を省略している。(b)図は、隣接す
る電極2a〜2dの片側のみに絶縁層を被覆し、他側は電極
を露出させている。いずれにしても、隣接する電極の1
組の内の少なくとも片方が絶縁被覆されていればよい。
FIG. 3 shows another example of the electrostatic latent image forming apparatus.
In the drawing (a), of the adjacent electrodes 2a to 2d, every other electrode is covered with the insulating layer 3, and the other electrodes omit the insulating layer in the portion facing the adjacent electrode. In the diagram (b), the insulating layer is coated only on one side of the adjacent electrodes 2a to 2d, and the electrodes are exposed on the other side. In any case, one of the adjacent electrodes
It suffices if at least one of the sets is insulation-coated.

第4図はさらに他の例を示し、電極2bの近傍部分を耐イ
オン性、耐オゾン性の優れた絶縁層3aで被覆し、共通電
極4との間は通常の絶縁層3bとしている。すなわち、絶
縁層としての機能を分けて用いることにより、製造コス
トを低減させることができる。
FIG. 4 shows still another example, in which a portion near the electrode 2b is covered with an insulating layer 3a having excellent ion resistance and ozone resistance, and a common insulating layer 3b is provided between the electrode 2b and the common electrode 4. That is, by separately using the function as the insulating layer, the manufacturing cost can be reduced.

上記構成からなる静電潜像形成装置の動作について説明
すると、第1図の電圧印加状態においては、電極2aと電
極2bとの間の放電領域Aにおいては、交番電界が形成さ
れエアブレークダウンあるいは沿面放電が発生し、イオ
ンが生成される。該生成イオンは、共通電極4と独立し
た電極2a、2b間に形成された電界により、放電領域Aか
ら出て共通電極4の開口5より外へ導出され、導出され
たイオンは、共通電極4と誘電体層7および基層6との
間に形成された電界によって加速され、誘電体層7表面
に到達し静電潜像を形成する。
The operation of the electrostatic latent image forming apparatus having the above structure will be described. In the voltage application state of FIG. 1, an alternating electric field is formed in the discharge region A between the electrodes 2a and 2b, and air breakdown or A creeping discharge is generated and ions are generated. The generated ions are discharged from the discharge region A to the outside through the opening 5 of the common electrode 4 by the electric field formed between the electrodes 2a and 2b independent of the common electrode 4, and the extracted ions are collected. Is accelerated by an electric field formed between the dielectric layer 7 and the base layer 6 and reaches the surface of the dielectric layer 7 to form an electrostatic latent image.

上述した静電潜像形成装置によれば、絶縁層を介して電
極間で放電させるため、イオンの利用効率が良いと共
に、電極間同士のリーク等異常放電が防止され、安定し
た放電を得ることができる。また、印字にマトリックス
を組む必要がなく、1ライン一括印字ができプリント速
度を高速化することができる。また、電極群を並列に配
置させるため、製造が簡単であり、電極数も少なく配線
が容易であり、また、高密度化が可能となる。さらに、
直接静電記録方式と比較して、電極と誘電体間の狭いギ
ャップ維持が不要となり、電極の磨耗も少ない。
According to the above-mentioned electrostatic latent image forming apparatus, since the discharge is performed between the electrodes through the insulating layer, the utilization efficiency of the ions is high, and abnormal discharge such as leakage between the electrodes is prevented, and stable discharge is obtained. You can Further, it is not necessary to form a matrix for printing, and one-line printing can be performed at a high speed. Further, since the electrode groups are arranged in parallel, the manufacturing is simple, the number of electrodes is small, the wiring is easy, and the density can be increased. further,
Compared to the direct electrostatic recording method, there is no need to maintain a narrow gap between the electrode and the dielectric, and there is less wear of the electrode.

次に、上記静電潜像形成装置の製造方法を第5図により
説明すると、先ず、(a)図に示すように、基体1上に
電極層2を形成する。これは導電体箔を貼り合わせても
よいし、スクリーン印刷、蒸着、スパッタ等の方法によ
ってもよい。次にレジスト層を塗布し(b)、所望のパ
ターンのフォトマスクにより露光し(c)た後、露光部
分のレジスト層を除去する(d)。この例においてはポ
ジ型の例を示しているが、ネガ型であってもよい。しか
る後にエッチングを行い独立した電極2a、2b、…を形成
し(e)、次いで、絶縁層3を形成する(f)。これ
は、スクリーン印刷、蒸着、スパッタ等形成方法は特に
問わないが、アルミナ、無機材料等の放電に耐えられる
材料を選択して形成する。次に、絶縁層3上に共通電極
層4を前述した方法と同様にして形成し(g)、さら
に、この上にレジスト層を塗布し(h)、マスクにより
露光を行い(i)、不要なレジスト材を除去する
(j)。しかる後、エッチング工程を行って共通電極層
4および絶縁層3に穿孔を行い開口5を形成する
(k)。このエッチング工程においては、共通電極層4
のエッチングと絶縁層3のエッチングは、エッチング液
を変えて別々に行った方が望ましい。最後にレジスト材
を除去して静電潜像形成装置を得るものである。
Next, the manufacturing method of the electrostatic latent image forming apparatus will be described with reference to FIG. 5. First, as shown in FIG. 5A, the electrode layer 2 is formed on the substrate 1. This may be done by sticking a conductor foil or by a method such as screen printing, vapor deposition, sputtering or the like. Next, a resist layer is applied (b), exposed with a photomask having a desired pattern (c), and then the resist layer in the exposed portion is removed (d). In this example, a positive type is shown, but a negative type may be used. Then, etching is performed to form the independent electrodes 2a, 2b, ... (E), and then the insulating layer 3 is formed (F). This may be formed by screen printing, vapor deposition, sputtering or the like, but a material that can withstand discharge, such as alumina or an inorganic material, is selected and formed. Next, the common electrode layer 4 is formed on the insulating layer 3 in the same manner as described above (g), and a resist layer is further applied on this (h), and exposure is performed with a mask (i). The resist material is removed (j). Then, an etching process is performed to perforate the common electrode layer 4 and the insulating layer 3 to form an opening 5 (k). In this etching process, the common electrode layer 4
It is desirable to separately perform the etching of 1 and the etching of the insulating layer 3 by changing the etching solution. Finally, the resist material is removed to obtain an electrostatic latent image forming device.

第6図は本発明の他の実施れいを示し、第5図の(j)
の工程までは同じであり、その後、共通電極4のみをエ
ッチングし(a)、次にその共通電極4をレジスト代わ
りに利用して絶縁層3をエッチングして開口部5を形成
する(b)。
FIG. 6 shows another embodiment of the present invention, (j) of FIG.
The steps up to are the same, and thereafter, only the common electrode 4 is etched (a), and then the common electrode 4 is used as a resist to etch the insulating layer 3 to form the opening 5 (b). .

次に、第7図により本発明の他の実施例を説明すると、
第5図の(a)〜(g)の工程により、基体1上に電極
2a、2b、絶縁層3および共通電極4を形成(a)した
後、レーザー光により所望の開口5を穿孔し(b)、
(c)図に示すような静電潜像形成装置を得る。
Next, another embodiment of the present invention will be described with reference to FIG.
An electrode is formed on the substrate 1 by the steps (a) to (g) of FIG.
After forming 2a, 2b, the insulating layer 3 and the common electrode 4 (a), a desired opening 5 is perforated by laser light (b),
(C) An electrostatic latent image forming device as shown in the figure is obtained.

なお、上記製造方法においては、電極2a、2bの両側が絶
縁被覆されている静電潜像形成装置を製造しているが、
第3図で示したような電極の絶縁被覆を形成するように
してもよい。また、第4図で示した静電潜像形成装置も
同様の製造方法により製造できる。
In the above manufacturing method, an electrostatic latent image forming device in which both sides of the electrodes 2a and 2b are insulation-coated is manufactured,
You may make it form the insulating coating of the electrode as shown in FIG. Further, the electrostatic latent image forming device shown in FIG. 4 can be manufactured by the same manufacturing method.

〔発明の効果〕〔The invention's effect〕

以上説明したように本発明によれば、基体上に独立した
電極群を形成し、該電極群と基体上を絶縁層で被覆した
後、該絶縁層上に共通電極層を形成し、しかる後に共通
電極と絶縁層の開口部をほぼ同時に穿孔するため、電極
と開口部との位置合わせが高精度できるようになり、か
つ、接着材のはみ出しによる開口部の塞ぎがないため、
確実に開口部を形成することができるものである。
As described above, according to the present invention, an independent electrode group is formed on a substrate, the electrode group and the substrate are covered with an insulating layer, and then a common electrode layer is formed on the insulating layer. Since the common electrode and the opening of the insulating layer are perforated almost at the same time, the alignment of the electrode and the opening can be performed with high accuracy, and since the opening of the opening is not blocked by the protruding adhesive,
The opening can be surely formed.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明が適用される静電潜像形成装置の1実施
例を示す断面図、第2図は第1図における電極部の斜視
図、第3図および第4図は本発明が適用される静電潜像
形成装置の他の実施例を示す断面図、第5図は本発明の
静電潜像形成装置の製造方法の1実施例を説明するため
の図、第6図および第7図は本発明の静電潜像形成装置
の製造方法の他の実施例を説明するための図、第8図は
静電潜像形成装置の原理を説明するための図、第9図、
第10図および第11図は従来の静電潜像形成装置を説明す
るための図である。 1……基体、2……電極層、2a〜2d……電極、3……絶
縁層、4……共通電極、5……開口、6……基層、7…
…誘電体層、8、9……直流電源、10……交流電源。
1 is a sectional view showing an embodiment of an electrostatic latent image forming apparatus to which the present invention is applied, FIG. 2 is a perspective view of an electrode portion in FIG. 1, and FIGS. 3 and 4 show the present invention. FIG. 5 is a cross-sectional view showing another embodiment of the electrostatic latent image forming apparatus applied, FIG. 5 is a view for explaining one embodiment of the method for manufacturing the electrostatic latent image forming apparatus of the present invention, FIG. 6 and FIG. 7 is a diagram for explaining another embodiment of the method for manufacturing an electrostatic latent image forming device of the present invention, FIG. 8 is a diagram for explaining the principle of the electrostatic latent image forming device, and FIG. ,
10 and 11 are diagrams for explaining a conventional electrostatic latent image forming device. 1 ... Substrate, 2 ... Electrode layer, 2a-2d ... Electrode, 3 ... Insulating layer, 4 ... Common electrode, 5 ... Opening, 6 ... Base layer, 7 ...
… Dielectric layer, 8, 9… DC power supply, 10… AC power supply.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】基体上に互いに独立して配列された電極群
と、該電極群と絶縁層を挟んで対向させた共通電極とを
有すると共に、該共通電極と絶縁層に開口部を有する静
電潜像形成装置において、基体上に独立した電極群を形
成し、該電極群と基体上を絶縁層で被覆した後、該絶縁
層上に共通電極層を形成し、しかる後に穿孔工程を行っ
て前記開口部を形成することを特徴とする静電潜像形成
装置の製造方法。
1. A static electrode having an electrode group arranged independently of each other on a substrate, a common electrode facing the electrode group with an insulating layer interposed therebetween, and having an opening in the common electrode and the insulating layer. In the latent electrostatic image forming apparatus, an independent electrode group is formed on a substrate, the electrode group and the substrate are covered with an insulating layer, a common electrode layer is formed on the insulating layer, and then a perforation step is performed. And forming the opening by using the above method.
【請求項2】上記独立した電極群はエッチングにより形
成することを特徴とする特許請求の範囲第1項記載の静
電潜像形成装置の製造方法。
2. The method of manufacturing an electrostatic latent image forming apparatus according to claim 1, wherein the independent electrode group is formed by etching.
【請求項3】上記穿孔工程はエッチングにより穿孔する
ことを特徴とする特許請求の範囲第1項または第2項記
載の静電潜像形成装置の製造方法。
3. The method of manufacturing an electrostatic latent image forming device according to claim 1, wherein the punching step is performed by etching.
【請求項4】上記穿孔工程はレーザー光により穿孔する
ことを特徴とする特許請求の範囲第1項または第2項記
載の静電潜像形成装置の製造方法。
4. The method of manufacturing an electrostatic latent image forming device according to claim 1, wherein the perforation step is perforation with a laser beam.
JP62106583A 1987-04-30 1987-04-30 Method for manufacturing electrostatic latent image forming apparatus Expired - Lifetime JPH0712706B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62106583A JPH0712706B2 (en) 1987-04-30 1987-04-30 Method for manufacturing electrostatic latent image forming apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62106583A JPH0712706B2 (en) 1987-04-30 1987-04-30 Method for manufacturing electrostatic latent image forming apparatus

Publications (2)

Publication Number Publication Date
JPS63270157A JPS63270157A (en) 1988-11-08
JPH0712706B2 true JPH0712706B2 (en) 1995-02-15

Family

ID=14437230

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62106583A Expired - Lifetime JPH0712706B2 (en) 1987-04-30 1987-04-30 Method for manufacturing electrostatic latent image forming apparatus

Country Status (1)

Country Link
JP (1) JPH0712706B2 (en)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56142551A (en) * 1980-04-09 1981-11-06 Konishiroku Photo Ind Co Ltd Production of ion modulating electrode
JPS60196363A (en) * 1984-03-19 1985-10-04 Canon Inc Ion generator and manufacture thereof

Also Published As

Publication number Publication date
JPS63270157A (en) 1988-11-08

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