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JPH0714657B2 - Optical information recording member - Google Patents
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JPH0714657B2 - Optical information recording member - Google Patents

Optical information recording member

Info

Publication number
JPH0714657B2
JPH0714657B2 JP60169608A JP16960885A JPH0714657B2 JP H0714657 B2 JPH0714657 B2 JP H0714657B2 JP 60169608 A JP60169608 A JP 60169608A JP 16960885 A JP16960885 A JP 16960885A JP H0714657 B2 JPH0714657 B2 JP H0714657B2
Authority
JP
Japan
Prior art keywords
recording
recording film
amorphous
crystalline
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60169608A
Other languages
Japanese (ja)
Other versions
JPS6230087A (en
Inventor
邦夫 木村
登 山田
進 佐内
鋭二 大野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP60169608A priority Critical patent/JPH0714657B2/en
Publication of JPS6230087A publication Critical patent/JPS6230087A/en
Publication of JPH0714657B2 publication Critical patent/JPH0714657B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/243Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/243Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
    • G11B2007/24302Metals or metalloids
    • G11B2007/24312Metals or metalloids group 14 elements (e.g. Si, Ge, Sn)
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/243Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
    • G11B2007/24302Metals or metalloids
    • G11B2007/24316Metals or metalloids group 16 elements (i.e. chalcogenides, Se, Te)

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)

Description

【発明の詳細な説明】 〔発明の目的〕本発明は光、熱等を利用する光学的情報
の記録再生を行なう光学情報記録部材に関するものであ
って、その目的とするところは光学的情報の記録および
消去の繰り返し特性がすぐれ、かつ消去率の経時変動も
少く、情報信号を高速度かつ高密度に記録、再生するこ
とのできる光学情報記録部材を提供することにある。
DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] The present invention relates to an optical information recording member for recording / reproducing optical information utilizing light, heat, etc. An object of the present invention is to provide an optical information recording member that has excellent repetitive characteristics of recording and erasing, has a small erasing rate variation with time, and can record and reproduce information signals at high speed and high density.

レーザ光を利用する光ディスクには記録再生が1回のみ
の追記型と、記録した信号を消去して繰返して使用する
ことの可能な書き換え可能型とがあるが本発明は後者の
書き換え可能型に属する。本発明者らは先にTe−TeO2
非晶質状態と結晶質状態との間の相転移による反射率の
変化を信号とする方式を提案した。また、相転移を利用
した書き換え可能な記録膜としてのTe−TeO2に対し、各
種の添加物(Sn、Ge、Bi、In、Pd、Tl、Seなど)を添加
することも行なわれており、これらはC/Nが高く耐湿性
のすぐれた記録膜がえられることを明らかにしている。
Optical disks using laser light include a write-once type in which recording and reproduction are performed only once and a rewritable type in which a recorded signal can be erased and repeatedly used. The present invention is the rewritable type of the latter. Belong to The present inventors have previously proposed a method in which a change in reflectance due to a phase transition between an amorphous state and a crystalline state of Te-TeO 2 is used as a signal. In addition, various additives (Sn, Ge, Bi, In, Pd, Tl, Se, etc.) are also added to Te-TeO 2 as a rewritable recording film utilizing phase transition. , It has been clarified that a recording film having high C / N and excellent moisture resistance can be obtained.

ところで酸化物を含む上記記録膜には以下述べるような
欠点がある。書き換え可能な光ディスクにおいてはTe−
TeO2の結晶質状態で消去が行なわれ、非晶質状態で記録
が行なわれる。この結晶質と非晶質との間の相転移はレ
ーザ光による除冷と急冷の条件変化によって行なわれ
る。すなわち、レーザ光による加熱後、除冷によって結
晶質になり、急冷によって非晶質となる。したがって、
記録、消去の繰返しによって記録膜は結晶質状態と非晶
質状態の相転移が繰返される。この場合、記録膜に酸化
物が存在すると、膜の粘性が高いためにカルコゲン化物
の泳動性が少なくなり、膜組成の偏析が生じ易くなる。
さらに、酸化物は熱伝導率が低いのでレーザ光の入射側
と反対側との間で温度分布差を生じ、これがまた膜組成
の偏析の原因になる。以上の理由によって酸化物を含む
記録膜は記録、消去の繰返しによって特性が次第に変化
する欠点がある。本発明はこの欠点を解消すると共に、
カルコゲン化合物よりなる従来の記録膜のC/N、消去
率、耐湿性および耐熱性などの諸特性を改善することを
目的とするものである。
By the way, the above recording film containing an oxide has the following drawbacks. For rewritable optical disks, Te-
Erase is performed in the crystalline state of TeO 2 , and recording is performed in the amorphous state. The phase transition between crystalline and amorphous is carried out by changing the conditions of cooling by laser light and rapid cooling. That is, after heating with laser light, it becomes crystalline by cooling and becomes amorphous by quenching. Therefore,
By repeating recording and erasing, the recording film repeats a phase transition between a crystalline state and an amorphous state. In this case, if an oxide is present in the recording film, the mobility of the chalcogenide is reduced due to the high viscosity of the film, and segregation of the film composition is likely to occur.
Furthermore, since the oxide has a low thermal conductivity, a difference in temperature distribution is generated between the incident side and the opposite side of the laser beam, which also causes segregation of the film composition. For the above reasons, the recording film containing an oxide has a drawback that the characteristics gradually change due to repeated recording and erasing. The present invention eliminates this drawback,
It is intended to improve various properties such as C / N, erasure rate, moisture resistance and heat resistance of a conventional recording film made of a chalcogen compound.

〔発明の構成〕本発明の光学情報記録部材は、テルル
(Te)、ゲルマニウム(Ge)およびスズ(Sn)を主成分
として含み、これらの元素の割合がTe、Ge、Snをそれぞ
れ100at%の頂点とする3角座標図において座標(at
%)が、A(Te93Ge5Sn2)、B(Te93Ge2Sn5)、C(Te
68Ge2Sn30)、D(Te52Ge18Sn30)、E(Te52Ge46Sn2
の5点で囲まれた範囲内にある組成を主成分として有
し、これに副成分として添加されるインジウム(In)の
量は前記主成分を形成するTe−Ge−Sn系の量をm、副成
分Inの量をn(m+n=100)とするとき、nの値が1
〜40at%である記録膜を有することを特徴とする。
[Structure of the Invention] The optical information recording member of the present invention contains tellurium (Te), germanium (Ge) and tin (Sn) as main components, and the proportions of these elements are Te, Ge and Sn of 100 at% respectively. The coordinates (at
%) Is A (Te 93 Ge 5 Sn 2 ), B (Te 93 Ge 2 Sn 5 ), C (Te
68 Ge 2 Sn 30 ), D (Te 52 Ge 18 Sn 30 ), E (Te 52 Ge 46 Sn 2 ).
The amount of indium (In) added as a subcomponent to the main component has a composition within the range surrounded by 5 points, and the amount of the Te-Ge-Sn system forming the main component is m. , And the value of the sub-component In is n (m + n = 100), the value of n is 1
It is characterized by having a recording film of -40 at%.

記録膜にカルコゲン化合物を用いる試みは古く、Te−Ge
をはじめとして、これに、As、S、Si、Se、Sb、Biなど
を添加して特性を改良した例がある。これらカルコゲン
化物よりなる書き換え可能な記録膜は、一般に、記録、
消去の繰り返しに対する安定性が悪い特徴がある。その
理由はTe、Geとその他の添加成分が数度の繰り返しによ
って記録膜の相分離を生じ、初期と繰り返し後では記録
膜の構成成分が異なるからである。消去可能な記録膜で
相転移を利用する場合、通常、未記録、消去状態を結晶
質とし、記録状態を非晶質とする方法がとられる。この
場合、記録はレーザ光で、記録膜を溶融させ急冷によっ
て非晶質にするのであるが、現在の半導体レーザはパワ
ーに限界があるので融点の低い記録膜が、記録感度が高
いことになる。そのために上述のカルコゲン化物よりな
る記録膜は記録感度を向上させるために、できるだけ融
点の低い組成、すなわち、Teの多い膜組成となってい
る。Teが他の添加成分よりも多いことは繰り返し特性に
おいてそれだけ相分離が起こり易いことを意味する。し
たがって融点を下げるために添加した過剰のTeをいかに
固定して動きにくい組成にするかが、繰り返し特性や、
CNR、消去率の経時変動に大きな影響を及ぼすことにな
る。
Attempts to use chalcogen compounds for recording films are old, and Te-Ge
In addition to the above, there are examples in which As, S, Si, Se, Sb, Bi and the like are added to improve the characteristics. Rewritable recording films made of these chalcogenides are generally used for recording,
It is characterized by poor stability against repeated erasing. The reason is that Te, Ge and other added components cause phase separation of the recording film by repeating several times, and the constituent components of the recording film are different at the initial stage and after the repeating. When the phase transition is utilized in an erasable recording film, a method is usually used in which the unrecorded and erased states are crystalline and the recorded state is amorphous. In this case, recording is performed with a laser beam, and the recording film is melted and quenched to be amorphous. However, since the current semiconductor laser has a limited power, a recording film having a low melting point has high recording sensitivity. . Therefore, in order to improve the recording sensitivity, the recording film made of the above chalcogenide has a composition having a melting point as low as possible, that is, a film composition containing a large amount of Te. The fact that the content of Te is larger than that of the other additive components means that phase separation is likely to occur in the repeating characteristics. Therefore, how to fix the excess Te added to lower the melting point to make the composition difficult to move is a repeating characteristic and
This will have a great influence on the change over time of the CNR and erase rate.

本発明の特徴は上述の従来の組成Te−Ge−SnにInを添加
して過剰のTeを固定することにある。過剰のTeを固定す
る方法として、Ge、Snの濃度を増加させ、量論的なGeT
e、SnTeとすることも可能ではあるが、Geの場合は添加
量が多くなると非晶質から結晶質への転移温度が高くな
り、記録、消去に大きなレーザパワーが必要となり、実
用的でない。またSnの場合は、量論に近いSnTe近傍組成
では、蒸着後は結晶質であり安定な非晶質状態がえられ
ない。したがって本発明のように、Inを添加してTeを固
定することが有益である。
A feature of the present invention is that In is added to the above-described conventional composition Te-Ge-Sn to fix excess Te. As a method of fixing excess Te, the concentration of Ge and Sn is increased and stoichiometric GeT
Although it is possible to use e or SnTe, when Ge is added, the transition temperature from amorphous to crystalline becomes high and a large laser power is required for recording and erasing, which is not practical. Further, in the case of Sn, if the composition near SnTe is close to the stoichiometry, it is crystalline after vapor deposition and a stable amorphous state cannot be obtained. Therefore, it is beneficial to add In to fix Te as in the present invention.

次に本発明の作用を説明する。本発明においてTeは他の
元素を結合した状態で記録前後によって光学的濃度変化
を呈する母材である。GeはTeとの濃度比によって非晶
質、結晶質間の転移速度を支配する。すなわち、Geの濃
度が低い領域では(TeとGeのみの場合は、Geが50at
%)、非晶質として安定に存在するが濃度が高くなると
結晶質が安定となるため、一旦結晶質となったものを非
晶質化させることが困難となる。本発明のge濃度は50at
%以下であるからgeは膜の非晶質性を増大させることに
寄与する。Snの作用はGeと同様であるがSnがTeとで非晶
質性を増大させる領域は狭く、本発明の範囲ではむしろ
結晶化を促進する。すなわち、GeとSnはTeに対する作用
は似ているが、Teとの濃度比によって、非晶質性が増大
したり、結晶質性が増大したりする。GeとSnの濃度が高
くなると記録膜は結晶質として安定するため、非晶質か
ら結晶質への転移は容易になるがその逆は困難となる。
したがって、このような材料は追記型材料(W/O材料)
に適している。しかし、このようなW/O材料でもレーザ
パワーが強く、記録膜を充分に溶融させることが可能で
あれば、消去可能なディスクとして使用することが可能
である。現在、我々が実用上入手できる半導体レーザは
波長が830mmでパワーは30mω程度であり、Te、Ge、Snの
量論に近い組成(TeGe、TeSn)を溶融させることは困難
である。(融点が800℃程度)Te−Ge−Snで記録、消去
可能な領域は、Teが非常に多い領域(80at%以上)にあ
るが、この領域の組成は転移温度が低く、熱的に不安定
であること、Teが過剰なため、繰り返しによって、Teと
TeGeあるいはTeSnに記録膜が相分離を起こしやすいこと
などの欠点を有している。本発明のInは、この過剰のTe
をInTe、In2TeIn2IIe3、として安定化させる作用を有す
る。InはTeと上記合金系においてTeが50at%以上の場合
は融点がそれぞれ696℃667℃、455℃で、Inを添加して
もTeの融点(451℃)を上昇させることはない。そのた
め、Inを添加した記録膜は現行の半導体レーザーパワー
で十分に溶融させることが可能である。しかも熱的に不
安定な過剰のTeをInTexとして結合させているため、熱
的に安定で、かつ、記録、消去の繰り返しによって相分
離を生ずることなく、長期に亘って安定な記録膜を形成
する。Inの添加量は、Ge、Snと結合した残りの過剰Teを
固定するのに必要な量であって、Teの濃度の高い領域で
はInの濃度も高い。
Next, the operation of the present invention will be described. In the present invention, Te is a base material that exhibits an optical density change before and after recording in a state where other elements are bonded. Ge controls the transition rate between amorphous and crystalline depending on the concentration ratio with Te. That is, in the region where the Ge concentration is low (when only Te and Ge are used, Ge is 50 at
%), It exists stably as an amorphous substance, but when the concentration becomes high, the crystalline substance becomes stable, so that it becomes difficult to amorphize the crystalline substance. The ge concentration of the present invention is 50 at
% Or less, ge contributes to increase the amorphousness of the film. The action of Sn is similar to that of Ge, but the region where Sn and Te increase the amorphousness is narrow, and rather promotes crystallization within the scope of the present invention. That is, Ge and Sn have similar effects on Te, but depending on the concentration ratio with Te, the amorphousness or the crystallinity increases. When the Ge and Sn concentrations are high, the recording film is stable as a crystalline state, so that the transition from the amorphous state to the crystalline state is facilitated, but the reverse is difficult.
Therefore, such materials are write-once materials (W / O materials).
Suitable for However, even such a W / O material can be used as an erasable disc if the laser power is strong and the recording film can be sufficiently melted. Currently, the practically available semiconductor laser has a wavelength of 830 mm and a power of about 30 mΩ, and it is difficult to melt a composition (TeGe, TeSn) close to the stoichiometry of Te, Ge, and Sn. (Melting point is about 800 ° C) The area where Te-Ge-Sn can be recorded and erased is in a very large area of Te (80 at% or more), but the composition of this area has a low transition temperature and is not thermally stable. It is stable, and Te is excessive.
TeGe or TeSn have drawbacks such that the recording film is likely to undergo phase separation. In of the present invention, this excess Te
Has a stabilizing effect as InTe and In 2 TeIn 2 IIe 3 . In and Te in the above alloys, when Te is 50 at% or more, the melting points are 696 ° C. 667 ° C. and 455 ° C., respectively, and the addition of In does not raise the melting point of Te (451 ° C.). Therefore, the recording film added with In can be sufficiently melted with the current semiconductor laser power. In addition, because the excessively thermally unstable Te is bonded as InTex, it forms a thermally stable recording film that is stable over a long period without causing phase separation due to repeated recording and erasing. To do. The amount of In added is the amount necessary to fix the remaining excess Te bonded to Ge and Sn, and the In concentration is also high in the region where the Te concentration is high.

〔第1図の説明〕第1図は本発明の記録膜の主成分Te−
Ge−Snの濃度を3角座標図で表している。同図において
本発明の組成の範囲を規定するA、B、C、D、Eの各
点の座標は、A(Te93Ge5Sn2)、B(Te93Ge2Sn5)、C
(Te68Ge2Sn30)、D(Te52Ge18Sn30)、E(Te52Ge46S
n2)であって、本発明の記録膜はこのABCDEによって囲
まれた範囲内にあるTe−Ge−Sn系を主成分とし、これに
Inを副成分として1〜40at%添加することによって形成
される。したがって本発明の記録膜の構成は次の一般式
で表わすことができる。
[Explanation of FIG. 1] FIG. 1 shows the main component Te− of the recording film of the present invention.
The Ge-Sn concentration is shown in a triangular coordinate diagram. In the figure, the coordinates of points A, B, C, D and E that define the composition range of the present invention are A (Te 93 Ge 5 Sn 2 ), B (Te 93 Ge 2 Sn 5 ), C
(Te 68 Ge 2 Sn 30 ), D (Te 52 Ge 18 Sn 30 ), E (Te 52 Ge 46 S
n 2 ), the recording film of the present invention is mainly composed of the Te-Ge-Sn system within the range surrounded by this ABCDE.
It is formed by adding 1 to 40 at% of In as a subcomponent. Therefore, the constitution of the recording film of the present invention can be expressed by the following general formula.

(Te・x Ge・y Sn・z)mIn・n ただし、x+y+z=100、m+n=100 線ABよりTeが多い場合は必然的にGe濃度が少なくなり、
非晶質化が困難となる。またGeSn濃度が低いため、非晶
質から結晶質への転移温度も低い。線BCより、Geが低い
場合も、線ABよりTeが多い場合と同様に転移温度が低
い。また、結晶質から非晶質への変態に対する傾向は、
Teが多い場合よりも良好である。しかし、実用的な観点
からは、充分な、結晶から非晶質への相転移が得られな
い。線CDよりSn濃度が多い場合、Snの添加は結晶質化を
促進するので、非晶質化が困難となる。また、非晶質か
ら結晶質への転移温度も低く、熱的な安定性に乏しい。
線DEよりTeが少ない場合、この領域は、TeとGe、Snが化
学的量論に近い結晶として安定なGeTe、SnTeを形成する
ので、非晶質化が困難となる。また、この領域は過剰な
Teがほとんどないので、添加するIn濃度も少ない。すな
わち、Inの添加効果も少ない。したがって、この領域
は、膜の融点よりも高く、非晶質化が困難となる。Snが
線EAより少ない領域では、非晶質として安定であるた
め、結晶化が困難である。ただし、この傾向はEA線上の
TeとGeの比によって支配され、Teが多い程結晶化が、よ
り容易で、Te濃度が70at%付近が、最も結晶化が困難と
なり、Teが50at%付近で、再び、結晶化が容易となる。
その理由は、TeとGeが、非晶質としてより安定な化合物
GeTe2を形成するためで、Te濃度が70%付近では、全体
的に結晶質化が困難である。
(Te ・ xGe ・ ySn ・ z) mIn ・ n However, when Te is more than x + y + z = 100, m + n = 100 line AB, the Ge concentration inevitably decreases,
Amorphization becomes difficult. Also, since the GeSn concentration is low, the transition temperature from amorphous to crystalline is low. When Ge is lower than line BC, the transition temperature is lower as when Te is higher than line AB. Also, the tendency for transformation from crystalline to amorphous is
Better than with more Te. However, from a practical point of view, sufficient phase transition from crystalline to amorphous cannot be obtained. When the Sn concentration is higher than that of the line CD, the addition of Sn promotes crystallization, so that amorphization becomes difficult. Also, the transition temperature from amorphous to crystalline is low, and thermal stability is poor.
When the amount of Te is less than that of the line DE, Te, Ge, and Sn form stable GeTe and SnTe in this region as crystals with a stoichiometry, and thus it is difficult to amorphize. Also, this area is excessive
Since there is almost no Te, the added In concentration is also small. That is, the effect of adding In is small. Therefore, this region is higher than the melting point of the film, making it difficult to amorphize. In a region where Sn is less than the line EA, it is difficult to crystallize because it is amorphous and stable. However, this tendency is on the EA line
It is dominated by the ratio of Te and Ge. The more Te, the easier the crystallization is. The Te concentration around 70at% makes the crystallization the most difficult, and when Te is around 50at%, the crystallization becomes easy again. Become.
The reason is that Te and Ge are more stable compounds as amorphous.
Because it forms GeTe 2 , it is difficult to crystallize at a Te concentration of around 70%.

以上述べた理由により、本発明の主成分を構成するTe−
Ge−Sn系は第1図においてA、B、C、D、Eの5点で
囲まれた範囲内に限定される。すなわち、この領域内の
Te−Ge−SnにInを副成分として1〜40at%添加すると実
用上、結晶質と非晶質との可逆性を利用して情報の記
録、消去が可能となる。
For the reasons described above, Te-, which constitutes the main component of the present invention,
The Ge-Sn system is limited to the range surrounded by five points A, B, C, D and E in FIG. That is, within this area
When In is added to Te-Ge-Sn as an auxiliary component in an amount of 1 to 40 at%, information can be recorded and erased practically by utilizing the reversibility between crystalline and amorphous.

〔第2図の説明〕第2図は第1図と同様に本発明の記録
膜の主成分Te−Gu−Snの濃度を3角座標図で表わしてい
る。F、G、H、Iの4点で囲まれた部分は特許請求の
範囲(2)の領域であって、副成分として10〜30at%の
Inが添加される。また、H、J、K、L、Mの5点で囲
まれた部分は特許請求の範囲(3)の領域であって1〜
15at%のInが副成分として添加される。なお、Fないし
Mの各点は第4図に示すように、A、B、C、D、Eで
囲まれた特許請求の範囲(1)の領域内にあって各点の
座標は次のとおりである。
[Explanation of FIG. 2] Similar to FIG. 1, FIG. 2 shows the concentration of the main component Te—Gu—Sn of the recording film of the present invention in a triangular coordinate diagram. The portion surrounded by the four points F, G, H, and I is the region defined in claim (2) and contains 10 to 30 at% as a subcomponent.
In is added. Further, the part surrounded by the five points H, J, K, L, and M is the region of claim (3)
15 at% In is added as a subcomponent. As shown in FIG. 4, each point of F to M is within the area of claim (1) surrounded by A, B, C, D and E, and the coordinates of each point are as follows. It is as follows.

F(Te92Ge5Sn3)、G(Te92Ge3Sn5) H(Te68Ge3Sn29)、I(Te74Ge23Sn3) J(Te70Ge10Sn20)、K(Te62Ge29Sn3) L(Te52Ge45Sn3)、M(Te52Ge19Sn29) FGHIの4点で囲まれた領域の非晶質から結晶質への転移
温度は90〜160℃以内で、HJKLMの5点で囲まれた領域の
転移温度(150〜220℃程度)よりも低い。Inの添加はTe
−Ge−Snだけの場合よりも結晶転移温度を10〜30℃高め
る作用を有する。それ故Inの添加は熱的安定性を示す転
移温度を上昇させる効果と、記録膜の融点をそれほど上
昇させないで非晶質化を容易にする利点を有する。
F (Te 92 Ge 5 Sn 3 ), G (Te 92 Ge 3 Sn 5 ) H (Te 68 Ge 3 Sn 29 ), I (Te 74 Ge 23 Sn 3 ) J (Te 70 Ge 10 Sn 20 ), K ( Te 62 Ge 29 Sn 3 ) L (Te 52 Ge 45 Sn 3 ), M (Te 52 Ge 19 Sn 29 ) FGHI The amorphous to crystalline transition temperature in the region surrounded by four points is 90 to 160. Within ℃, it is lower than the transition temperature (150-220 ℃) of the area surrounded by 5 points of HJKLM. In addition is Te
It has the effect of increasing the crystal transition temperature by 10 to 30 ° C as compared with the case of only -Ge-Sn. Therefore, the addition of In has an effect of increasing the transition temperature showing thermal stability and an advantage of facilitating the amorphization without increasing the melting point of the recording film so much.

HJKLMの5点で囲まれた領域は過剰のTeが少いのでInの
添加効果は、FGHIの場合に比べて小さい。しかしInを添
加しないTe−Ge−Sn系よりも非晶質化は容易である。HJ
KLMの領域は転移温度が高く熱的に安定であること、GeT
e、SnTeの量論に近い組成なので結晶化は容易で非晶質
化は困難であるが、半導体レーザを高出力にすれば非晶
質化は容易になる。点IJKで囲まれた部分は安定な悲晶
質状態のGeTe2が存在する領域で結晶化は困難である。
以上述べた理由によって、本発明の主成分Te−Ge−Sn系
および副成分Inの最適の組成が限定される。
In the region surrounded by 5 points of HJKLM, the excess Te is small, so the effect of adding In is smaller than that in the case of FGHI. However, amorphization is easier than that of the Te-Ge-Sn system in which In is not added. HJ
The KLM region has a high transition temperature and is thermally stable.
Since the composition is close to the stoichiometry of e and SnTe, crystallization is easy and amorphization is difficult. However, if the semiconductor laser is made to have high output, amorphization becomes easy. The part surrounded by the point IJK is a region where GeTe 2 in a stable crysotropic state exists, and crystallization is difficult.
For the reasons described above, the optimum compositions of the main component Te-Ge-Sn system and the subcomponent In of the present invention are limited.

〔第3図の説明〕第3図は本発明の記録膜を用いた光デ
ィスクの断面を示している。1、5はポリカーボネイ
ト、アクリル樹脂、ガラス、ポリエステル等、透明な材
料よりなる基板、2、4は種々の酸化物、硫化物、炭化
物等よりなる保護層、3は本発明の記録膜である。保護
層2、4は記録膜3の記録、消去の繰返しによる基板
1、5の熱劣化を防止すると共に、記録膜3の防湿の作
用をする。記録膜3は蒸着、スパッタリング等によって
形成される。記録膜3の膜厚は、保護層2、4の光学特
性とマッチング(記録部と未記録部との反射率の差を大
きくとることができる)する値とする。
[Explanation of FIG. 3] FIG. 3 shows a cross section of an optical disk using the recording film of the present invention. 1, 5 are substrates made of transparent materials such as polycarbonate, acrylic resin, glass and polyester, 2 and 4 are protective layers made of various oxides, sulfides and carbides, and 3 is a recording film of the present invention. The protective layers 2 and 4 prevent the heat deterioration of the substrates 1 and 5 due to repeated recording and erasing of the recording film 3 and prevent moisture of the recording film 3. The recording film 3 is formed by vapor deposition, sputtering or the like. The film thickness of the recording film 3 is set to a value that matches the optical characteristics of the protective layers 2 and 4 (a large difference in reflectance between the recorded portion and the unrecorded portion can be obtained).

〔実施例1〕4源蒸着の電子ビーム蒸着機により、Te、
Ge、Sn、Inをそれぞれのソースから蒸着した。基板はψ
8mmのガラス板で、真空度1×10-5Torr、回転速度150rp
mの下で蒸着し、膜厚を1000Åとした。各ソースからの
蒸着速度は記録膜中のTe、Ge、Sn、Inの原子数の割合を
調整するために変化させた。第1表の組成はこの蒸着速
度から換算した値である。なお、代表的な組成をX線マ
イクロアナライザ(XMA)で測定したところ、仕込値と
ほゞ同様の定量結果がえられた。上記の製法で作成した
試験片A〜Mおよび1〜16につき転移温度並びに黒化特
性および白化特性を評価した。結果は第1表に示すとお
りである。第4図は試験片A〜Mおよび1〜16の3角座
標図における位置を示している。
[Example 1] Te,
Ge, Sn, and In were evaporated from their respective sources. Substrate is ψ
8mm glass plate, vacuum degree 1 × 10 -5 Torr, rotation speed 150rp
It was vapor-deposited under m to have a film thickness of 1000Å. The deposition rate from each source was changed to adjust the ratio of the number of Te, Ge, Sn, and In atoms in the recording film. The composition in Table 1 is a value converted from this vapor deposition rate. In addition, when a typical composition was measured by an X-ray microanalyzer (XMA), almost the same quantitative result as the charged value was obtained. With respect to the test pieces A to M and 1 to 16 prepared by the above-mentioned manufacturing method, the transition temperature, the blackening characteristic and the whitening characteristic were evaluated. The results are shown in Table 1. FIG. 4 shows the positions of the test pieces A to M and 1 to 16 in the triangular coordinate diagram.

(転移温度)転移温度は蒸着直後の非晶質状態の膜が熱
によって結晶状態になる開始温度である。その測定には
膜の透過率を測定する装置を用い、ヒータにより試験片
の温度を昇温速度1℃/secで上昇させたとき、透過率が
減少を開始する温度を転移温度とした。転移温度が高い
ことは記録膜が熱的に安定であることを意味する。
(Transition temperature) The transition temperature is a starting temperature at which a film in an amorphous state immediately after vapor deposition becomes crystalline due to heat. A device for measuring the transmittance of the film was used for the measurement, and the temperature at which the transmittance started to decrease when the temperature of the test piece was increased by a heater at a temperature rising rate of 1 ° C./sec was taken as the transition temperature. A high transition temperature means that the recording film is thermally stable.

(黒化特性および白化特性)黒化特性は非晶質から結晶
質へ転移する転移速度を示し、白化特性は結晶質から非
晶質へ転移する転移速度を示すものである。測定は試験
片上の記録膜に、レンズによりレーザ光を集光させ、試
験片を上下、左右に移動して行なった。レーザ光のスポ
ットは45×0.4μm、パルス巾は400ns、パワー密度は1
0.6mω/μm2波長は900mmとした。黒化特性は、試験片
を比較的、緩かに移動させた場合の変態(非晶質→結晶
質)の速度を観察し、速度が充分早く、かつ未記録部分
と記録部分のコントラスト比が充分大きいものを◎とし
た。×は緩やかに移動させても、黒化しないもの、ある
いはコントラスト比が小さいものを示す。○、△は◎と
×の中間に位置する。この定性的な表現において、実用
可能な黒化特性は○以上である。白化特性は、黒化した
試験片を速やかに、移動させて急冷状態を作り、白化
(結晶質→非晶質)させる。白化状態が◎のものは、移
動速度が比較的緩やかでも、白化し、しかも非晶質部分
と結晶質部分のコントラスト比が大きいものを示し、×
は、全く、白化しないものを示している。○と△は、◎
と×との中間に位置する。
(Blackening characteristics and whitening characteristics) The blackening characteristics indicate the transition rate of transition from amorphous to crystalline, and the whitening characteristics indicate the transition rate of transition from crystalline to amorphous. The measurement was performed by focusing laser light on a recording film on the test piece with a lens and moving the test piece up, down, left and right. Laser beam spot is 45 × 0.4μm, pulse width is 400ns, power density is 1
The wavelength of 0.6 mΩ / μm 2 was 900 mm. As for the blackening characteristic, the speed of transformation (amorphous → crystalline) when the test piece is moved relatively slowly is observed, and the speed is sufficiently fast, and the contrast ratio between the unrecorded part and the recorded part is A sufficiently large one was marked with ◎. “X” indicates that the image is not blackened even if it is moved slowly, or that the contrast ratio is small. ○ and △ are located between ◎ and ×. In this qualitative expression, the practical blackening characteristic is ◯ or higher. As for the whitening property, the blackened test piece is quickly moved to make a rapidly cooled state and whitened (crystalline → amorphous). When the whitening state is ◎, the whitening occurs even when the moving speed is relatively slow, and the contrast ratio between the amorphous part and the crystalline part is large.
Indicates that no whitening occurs. ○ and △ are ◎
It is located between x and x.

上述した表現によれば、黒化特性および白化特性がとも
にすぐれている場合は、◎、◎となるが、実際問題とし
ては同じ移動速度で、どちらも◎となることはあり得
ず、望ましい材料としては、◎、○あるいは◎、△のよ
うに、黒化特性が多少すぐれているものが好ましい。第
1表に示すように、第1図のABCDEの5点で囲まれた本
発明の領域内にある組成A〜Mおよび1〜16には黒化特
性および白化特性に×はなく、光学的に情報の書き込み
および消去が可能である。
According to the above-mentioned expression, when both the blackening property and the whitening property are excellent, the results are ◎ and ◎, but as a practical matter, at the same moving speed, neither can be ◎. It is preferable that the blackening characteristics are somewhat excellent, such as ⊚, ◯ or ⊚, Δ. As shown in Table 1, the compositions A to M and 1 to 16 within the region of the present invention surrounded by five points of ABCDE in FIG. It is possible to write and erase information.

〔実施例2〕この実施例は第2図のFGHIで囲まれた領域
からはTe50Ge10Sn10(第4図の点4)を、HJKLMで囲ま
れた領域からはTe60Ge25Sn15(第4図の点12)をそれぞ
れ選択し、実施例1と同様な製法および評価法により、
Te−Ge−Sn系にInを添加した場合、Inの濃度の特性に及
ぼす影響を試験した。結果は第2表に示すように、FGHI
の領域ではInの濃度は10at%から35at%の間が良好な特
性を示しており、HJKLMの領域ではInの濃度は1〜15at
%が使用可能であることを示している。No.24(Pd1at%
以下)は本発明の範囲外で、白化せず、書き換え可能な
記録膜にならない。No.30は黒化特性は×〜△の黒化は
一応可能ではあるが実用的には使用が困難である。
Example 2 In this example, Te 50 Ge 10 Sn 10 (point 4 in FIG. 4) is drawn from the region surrounded by FGHI in FIG. 2 and Te 60 Ge 25 Sn is drawn from the region surrounded by HJKLM. 15 (point 12 in FIG. 4) was selected, and the same manufacturing method and evaluation method as in Example 1 were used.
When In was added to the Te-Ge-Sn system, the effect of In concentration on the characteristics was tested. The results are as shown in Table 2, FGHI
In the range of 10 to 35 at%, the In concentration shows good characteristics, and in the HJKLM region, the concentration of In is 1 to 15 at%.
% Indicates that it is usable. No.24 (Pd1at%
The following) are outside the scope of the present invention and do not whiten and do not become a rewritable recording film. No. 30 has a blackening characteristic of X to Δ, but blackening is possible, but practically it is difficult to use.

〔光ディスクによる特性試験No.1〕第3図の基板1に厚
さ1.2mm直径200mmのポリカードネート樹脂板を使用し、
保護層2としてZnSの耐熱層を900Åの厚さに蒸着し、そ
の上に厚さ1000Åの記録膜3を実施例1の方法で蒸着
し、さらにその上の厚さ1800ÅのZnSの保護層4を蒸着
して基板5を密着配置した、なお、記録膜3には第2表
のNo.21およびNo.26を使用して2種類の光ディスクを作
成した。この2種類の光ディスクにつき、記録パワーお
よび消去パワーは8mωおよび15mω、記録ビームはψ1
μm(半値巾)、消去レーザビーム長は約15μm(半値
巾)として、白化状態および黒化状態での記録、消去試
験を行なった。なお、記録周波数はZMHZ、ディスク周速
は5m/sである。結果は次のとおりである。
[Characteristic test No. 1 with optical disk] Polycarbonate resin plate having a thickness of 1.2 mm and a diameter of 200 mm is used for the substrate 1 of FIG.
A ZnS heat-resistant layer is vapor-deposited as a protective layer 2 to a thickness of 900Å, a recording film 3 having a thickness of 1000Å is vapor-deposited thereon by the method of Example 1, and a protective layer 4 of ZnS having a thickness of 1800Å is further deposited thereon. Then, the substrate 5 was disposed in close contact with the substrate 5 and two kinds of optical disks were prepared by using No. 21 and No. 26 in Table 2 for the recording film 3. The recording power and the erasing power are 8 mω and 15 mω and the recording beam is ψ1 for these two types of optical disks.
Recording and erasing tests were carried out in a whitened state and a blackened state, with the erasing laser beam length being about 15 μm (half-value width) and about 15 μm (half-value width). The recording frequency is ZMHZ and the disk peripheral speed is 5 m / s. The results are as follows.

(1)No.21ディスクのC/Nは53bB、消去率は−53dBであ
り、No.26ディスクのC/Nは49dB、消去率は−46dBであっ
た。(2)10万回の記録、消去を繰返した後のC/Nの低
下は、No.21ディスクは−3dB、No.26ディスクは−2dB、
消去率の低下はそれぞれ1dBおよび0.5dBであった。
(3)80℃、60%RHの下に1ケ月放置した後のNo.21デ
ィスクのC/Nの低下は−1dB、消去率の低下は1dBであっ
た。
(1) The C / N of the No. 21 disc was 53 bB and the erasing rate was −53 dB, and the C / N of the No. 26 disc was 49 dB and the erasing rate was −46 dB. (2) The decrease in C / N after recording and erasing 100,000 times is -3 dB for No. 21 disc and -2 dB for No. 26 disc.
The reductions in erasure rate were 1 dB and 0.5 dB, respectively.
(3) The No. 21 disc had a C / N decrease of -1 dB and an erasure rate decrease of 1 dB after being left at 80 ° C and 60% RH for 1 month.

〔光ディスクによる特性試験No.2〕No.21光ディスクに
つき、耐熱保護層としてGeO2およびSiCを用い、その特
性を試験した。保護層(2)の膜厚は800Å、保護層
(4)の膜厚は1900Åである。その他は特性試験No.1の
場合と同じである。結果は、(1)C/Nは、GeO2の場合
は52dB、SiCの場合は50dBであった。また、消去率は、
それぞれ−47dBおよび−48dBであった。(2)寿命試験
(1ケ月放置した後の特性低下)は、GeO2の場合のC/N
の低下は−3dB、SiCの場合は−0.8dBであった。
[Characteristic Test No. 2 by Optical Disc] With respect to the No. 21 optical disc, GeO 2 and SiC were used as the heat-resistant protective layer, and the characteristic was tested. The film thickness of the protective layer (2) is 800Å, and the film thickness of the protective layer (4) is 1900Å. Others are the same as those in the characteristic test No.1. As a result, (1) C / N was 52 dB for GeO 2 and 50 dB for SiC. Also, the erase rate is
They were −47 dB and −48 dB, respectively. (2) Life test (deterioration of characteristics after left for 1 month) is C / N for GeO 2.
Was -3 dB, and that of SiC was -0.8 dB.

〔光ディスクによる特性試験No.3〕記録膜を実施例1の
No.5とする光ディスクを特性試験1と同じ基板および方
法によって作成した。なお、耐熱保護層2は860Å、記
録層3は300Å、保護層4は1950Åである。この光ディ
スクのC/Nは54dB、消去率は−52dBであり、10万回の記
録、消去を繰返した後のC/Nの低下は−2dBであった。
[Characteristic test No. 3 by optical disk] The recording film of Example 1 was used.
The optical disk No. 5 was prepared by using the same substrate and method as those used in the characteristic test 1. The heat-resistant protective layer 2 is 860 Å, the recording layer 3 is 300 Å, and the protective layer 4 is 1950 Å. The C / N of this optical disc was 54 dB, the erasing rate was -52 dB, and the C / N reduction after repeating recording and erasing 100,000 times was -2 dB.

〔発明の効果〕以上述べたように本発明の光学情報記録
部材は、Te−Ge−Sn系にInを添加して記録消去を繰返し
特性を改善するに当って、数多くの実験によって各成分
の有効な配合範囲を定め、現行の半導体レーザパワーで
十分に黒化(消去)および白化(記録)することを可能
にすると共に、温度および湿度に安全で従来のこの種の
記録膜のもつ欠点を解消するすぐれた効果を有する。
[Advantages of the Invention] As described above, the optical information recording member of the present invention, by adding In to the Te-Ge-Sn system and repeating recording and erasing to improve the characteristics, was subjected to a number of experiments to test each component. By defining an effective compounding range, it is possible to sufficiently blacken (erase) and whiten (record) with the current semiconductor laser power, and it is safe against temperature and humidity, and the disadvantages of this type of conventional recording film are eliminated. Has an excellent effect of eliminating.

【図面の簡単な説明】[Brief description of drawings]

第1図:本発明の光学情報記録部材の記録膜の主成分の
組成を示す3角座標図 第2図:特許請求の範囲(2)および(3)の記録膜の
主成分の組成を示す3角座標図 第3図:本発明の光学情報記録部材の断面図 第4図:本発明の実施例1の試験片A〜Mおよび1〜16
の3角座標図における位置を示す図
1 is a triangular coordinate diagram showing the composition of the main component of the recording film of the optical information recording member of the present invention. FIG. 2 is the composition of the main component of the recording film of claims (2) and (3). Triangular coordinate diagram FIG. 3: Cross-sectional view of optical information recording member of the present invention FIG. 4: Test pieces A to M and 1 to 16 of Example 1 of the present invention
Diagram showing the position on the triangular coordinate diagram of

───────────────────────────────────────────────────── フロントページの続き (72)発明者 大野 鋭二 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (56)参考文献 特開 昭61−31291(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Shinji Ohno 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (56) References JP-A-61-31291 (JP, A)

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】テルル(Te)、ゲルマニウム(Ge)および
スズ(Sn)を主成分として含み、これらの元素の割合が
Te、Ge、Snをそれぞれ100at%の頂点とする3角座標図
において座標(at%)が、A(Te93Ge5Sn2)、B(Te93
Ge2Sn5)、C(Te68Ge2Sn30)、D(Te52Ge18Sn30)、
E(Te52Ge46Sn2)の5点で囲まれた範囲内にある組成
を主成分として有し、これに副成分として添加されるイ
ンジウム(In)の量は前記主成分を形成するTe−Ge−Sn
系の量をm、副成分Inの量をn(m+n=100)とする
とき、nの値が1〜40at%である記録膜を有することを
特徴とする光学情報記録部材。
1. Tellurium (Te), germanium (Ge) and tin (Sn) are contained as main components, and the proportion of these elements is
In the triangular coordinate diagram in which Te, Ge, and Sn are 100 at% vertices, the coordinates (at%) are A (Te 93 Ge 5 Sn 2 ), B (Te 93
Ge 2 Sn 5 ), C (Te 68 Ge 2 Sn 30 ), D (Te 52 Ge 18 Sn 30 ),
E (Te 52 Ge 46 Sn 2 ) has a composition within the range surrounded by the five points as a main component, and the amount of indium (In) added as a sub component to the composition is Te which forms the main component. −Ge−Sn
An optical information recording member having a recording film in which the value of n is 1 to 40 at%, where m is the amount of the system and n (m + n = 100) is the amount of the subcomponent In.
【請求項2】前期主成分を構成するTe、Ge、Snの座標が
前記3角座標図のF(Te92Ge5Sn3)、G(Te92Ge3S
n5)、H(Te68Ge3Sn23)、I(Te74Ge23Sn3)の4点で
囲まれた範囲内にあって、前記副成分として添加される
Inの添加量は、前記nの値が10〜35at%であることを特
徴とする特許請求の範囲(1)の光学情報記録部材。
2. The coordinates of Te, Ge, and Sn which are the main components of the first term are F (Te 92 Ge 5 Sn 3 ), G (Te 92 Ge 3 S) in the triangular coordinate diagram.
n 5 ), H (Te 68 Ge 3 Sn 23 ), and I (Te 74 Ge 23 Sn 3 ), within the range surrounded by four points and added as the accessory component.
The amount of In added is such that the value of n is 10 to 35 at%, The optical information recording member according to claim (1).
【請求項3】前期主成分を構成するTe、Ge、Snの座標が
前記3角座標図のH(Te68Ge3Sn23)、J(Te70Ge10Sn
20)、K(Te65Ge23Sn3)、L(Te52Ge45Sn3)、M(Te
52Ge19Sn29)の5点で囲まれた範囲内にあって、前記副
成分として添加されるInの添加量は、前記nの値が1〜
15at%であることを特徴とする特許請求の範囲(1)の
光学情報記録部材。
3. The coordinates of Te, Ge, and Sn which are the main components of the first term are H (Te 68 Ge 3 Sn 23 ), J (Te 70 Ge 10 Sn) in the triangular coordinate diagram.
20 ), K (Te 65 Ge 23 Sn 3 ), L (Te 52 Ge 45 Sn 3 ), M (Te
52 Ge 19 Sn 29 ) within the range surrounded by 5 points, and the value of n is 1 to
The optical information recording member according to claim (1), characterized in that the content is 15 at%.
JP60169608A 1985-07-31 1985-07-31 Optical information recording member Expired - Lifetime JPH0714657B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60169608A JPH0714657B2 (en) 1985-07-31 1985-07-31 Optical information recording member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60169608A JPH0714657B2 (en) 1985-07-31 1985-07-31 Optical information recording member

Publications (2)

Publication Number Publication Date
JPS6230087A JPS6230087A (en) 1987-02-09
JPH0714657B2 true JPH0714657B2 (en) 1995-02-22

Family

ID=15889651

Family Applications (1)

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JP60169608A Expired - Lifetime JPH0714657B2 (en) 1985-07-31 1985-07-31 Optical information recording member

Country Status (1)

Country Link
JP (1) JPH0714657B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3675845D1 (en) * 1985-08-15 1991-01-10 Ibm OPTICAL RECORDING PROCEDURE.
JPS6276035A (en) * 1985-09-30 1987-04-08 Tdk Corp Information recording medium and recording method
JPH01162247A (en) * 1987-12-18 1989-06-26 Nippon Telegr & Teleph Corp <Ntt> Rewriting type phase transfer optical recording medium
US8598563B2 (en) * 2009-09-11 2013-12-03 Tohoku University Phase-change material and phase-change type memory device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6131291A (en) * 1984-07-24 1986-02-13 Daicel Chem Ind Ltd Optical information-recording medium

Also Published As

Publication number Publication date
JPS6230087A (en) 1987-02-09

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