JPH0715515B2 - Off-gas processing device - Google Patents
Off-gas processing deviceInfo
- Publication number
- JPH0715515B2 JPH0715515B2 JP60269798A JP26979885A JPH0715515B2 JP H0715515 B2 JPH0715515 B2 JP H0715515B2 JP 60269798 A JP60269798 A JP 60269798A JP 26979885 A JP26979885 A JP 26979885A JP H0715515 B2 JPH0715515 B2 JP H0715515B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- ruthenium
- silica gel
- scrubber
- gel layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001179 sorption measurement Methods 0.000 claims description 32
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 31
- 229910052707 ruthenium Inorganic materials 0.000 claims description 31
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 22
- 239000000741 silica gel Substances 0.000 claims description 22
- 229910002027 silica gel Inorganic materials 0.000 claims description 22
- 238000004140 cleaning Methods 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- 239000003595 mist Substances 0.000 claims description 4
- 239000007789 gas Substances 0.000 description 40
- 239000000126 substance Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 7
- 238000009826 distribution Methods 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 3
- 238000005202 decontamination Methods 0.000 description 2
- 230000003588 decontaminative effect Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000002203 pretreatment Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005251 gamma ray Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000003758 nuclear fuel Substances 0.000 description 1
- 239000012857 radioactive material Substances 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
- Separation Of Gases By Adsorption (AREA)
- Medicines Containing Material From Animals Or Micro-Organisms (AREA)
- Input Circuits Of Receivers And Coupling Of Receivers And Audio Equipment (AREA)
- Amplifiers (AREA)
Description
【発明の詳細な説明】 「産業上の利用分野」 本発明はオフガス処理装置に係り、特に、揮発性ルテニ
ウムをシリカゲルにより吸着させる場合の効率を向上さ
せたオフガス処理装置に関する。TECHNICAL FIELD The present invention relates to an offgas treatment apparatus, and more particularly to an offgas treatment apparatus having improved efficiency in adsorbing volatile ruthenium by silica gel.
「従来の技術及びその問題点」 核燃料サイクル施設において発生するオフガスの中に
は、放射性物質の一つであるガス状の揮発性ルテニウム
（RuO4）が含まれている。“Conventional technology and its problems” Offgas generated in nuclear fuel cycle facilities contains gaseous volatile ruthenium (RuO 4 ) which is one of the radioactive materials.
従来、オフガス中に含まれている揮発性ルテニウムの除
去処理を行なう場合、吸着塔内のシリカゲル層にオフガ
スを通して、揮発性ルテニウムをシリカゲル層に吸着さ
せるようにしている。Conventionally, when the volatile ruthenium contained in the off gas is removed, the off gas is passed through the silica gel layer in the adsorption tower so that the volatile ruthenium is adsorbed on the silica gel layer.
しかしながら、オフガスの中には揮発性ルテニウム以外
にも各種の成分が混在しているために、吸着塔を通過す
る間に、揮発性ルテニウム以外の物質がシリカゲル層に
吸着されて、揮発性ルテニウムが吸着されにくくなる傾
向が生じる。このため、吸着性能の低下に対して十分な
余裕を有するように長い吸着塔を使用する、あるいは吸
着塔の交換を頻繁に行なうなどの必要があった。However, since various components other than volatile ruthenium are mixed in the offgas, substances other than volatile ruthenium are adsorbed on the silica gel layer while passing through the adsorption tower, and volatile ruthenium is generated. It tends to be less likely to be adsorbed. For this reason, it has been necessary to use a long adsorption tower so as to have a sufficient margin for deterioration of the adsorption performance, or to frequently replace the adsorption tower.
「本発明の目的とその達成手段」 本発明は揮発性ルテニウムをシリカゲル層に効率よく吸
着させて、除染効率の向上を図ることを目的としてお
り、その達成手段として、オフガス中に含有する不純成
分やガス状をなす揮発性ルテニウムをオフガスから吸着
除去する装置において、オフガスを洗浄することにより
洗浄水に対して親和性を有する不純成分を除去するスク
ラバと、該スクラバに接続されスクラバを経由したオフ
ガス中のミスト分を除去するデミスタと、該デミスタに
接続されデミスタを経由したオフガスをシリカゲル層に
通して前記ガス状をなす揮発性ルテニウムをシリカゲル
層に吸着させる吸着塔とを具備する構成を採用してい
る。"Purpose of the present invention and means for achieving the same" The present invention aims to improve the decontamination efficiency by efficiently adsorbing volatile ruthenium on the silica gel layer. As a means for achieving this, the impurities contained in the offgas are impure. In a device for adsorbing and removing components and gaseous volatile ruthenium from offgas, a scrubber for removing impure components having an affinity for cleaning water by cleaning the offgas, and a scrubber connected to the scrubber via the scrubber A structure is provided that includes a demister that removes the mist component in the offgas, and an adsorption tower that is connected to the demister and passes the offgas that has passed through the demister through the silica gel layer to adsorb the gaseous volatile ruthenium to the silica gel layer. is doing.
これらの構成とすることにより、オフガス中に、NOx等
のガス状物質、固体状物質及び液状物質等の不純成分に
加えて、ガス状をなす揮発性ルテニウムが含有している
場合、スクラバを経由させることにより、まず不純成分
の大部分を除去し、次いで、オフガスをデミスタに送り
込んでミスト分を除去し、残されたガス状をなす揮発性
ルテニウムをシリカゲル層に吸着させるようにしたもの
である。With these configurations, if the off gas contains volatile ruthenium in the form of gas in addition to impure components such as NOx and other gaseous substances, solid substances and liquid substances, it will pass through the scrubber. By doing so, first, most of the impure components are removed, then the off gas is sent to the demister to remove the mist, and the remaining gaseous volatile ruthenium is adsorbed on the silica gel layer. .
「実施例」 以下、本発明のオフガス処理装置の一実施例について図
面を参照して説明する。[Embodiment] An embodiment of the offgas treatment apparatus of the present invention will be described below with reference to the drawings.
該一実施例のオフガス処理装置は、オフガス処理系１の
途中に、前処理塔２と、シリカゲル層３を有する吸着塔
４とを連設したものである。前処理塔２は、オフガスが
下部から上方に流通させられる縦長の容器５の中に、ス
クラバ６、冷却器７、デミスタ８、加熱器９がオフガス
の流通方向に沿って順次連設状態で収納されたもので、
前記スクラバ６には、その上部から洗浄液を供給する洗
浄液供給ノズル10と、前記流通方向に対して多段構造を
なす複数の棚段11とが配設されている。なお、スクラバ
６の底部には洗浄液排出系12が連設されるとともに、洗
浄液を前記供給ノズル10に送る洗浄液循環系13が設けら
れる。The off-gas treatment apparatus of the one example comprises a pre-treatment tower 2 and an adsorption tower 4 having a silica gel layer 3 connected in series in the middle of an off-gas treatment system 1. The pretreatment tower 2 accommodates a scrubber 6, a cooler 7, a demister 8 and a heater 9 in a vertically long container 5 in which off gas is allowed to flow upward from a lower portion in a sequentially connected state along the flow direction of off gas. It was done,
The scrubber 6 is provided with a cleaning liquid supply nozzle 10 for supplying a cleaning liquid from its upper part, and a plurality of shelves 11 having a multi-stage structure in the flow direction. A cleaning liquid discharge system 12 is connected to the bottom of the scrubber 6, and a cleaning liquid circulation system 13 for supplying the cleaning liquid to the supply nozzle 10 is provided.
このように構成したオフガス処理装置は、前処理塔２に
おいて、まず、スクラバ６によりオフガスを洗浄するこ
とによって、スクラバ６の水と親和性の強いNOx等のガ
ス状物質、固体状物質及び液状物質等の不純成分の大部
分を除去し、これにより、オフガス中の不純成分に対す
る揮発性ルテニウムの相対比率を大きくする。次いで、
冷却器７により一旦20℃程度に冷却凝縮して、デミスタ
８によりミスト分を除去し、さらに加熱器９で70〜80℃
に加熱することによりオフガス中の水分濃度を約４％以
下とする。つまり、冷却器７から加熱器９までの一連の
処理によって、オフガス中の水分の大部分を除去して乾
燥状態とするものである。そして、このような前処理を
施した後に、吸着塔４を経由させることにより、前記し
たようにNOxや水分等のシリカゲル層３に対する有害物
質の大部分が除去されているので、該吸着塔４において
は、揮発性ルテニウムを中心に吸着することができるも
のである。In the off-gas treatment apparatus configured as described above, in the pre-treatment tower 2, first, the off-gas is washed by the scrubber 6, so that a gaseous substance such as NOx having a strong affinity with the water of the scrubber 6, a solid substance and a liquid substance. Etc. removes most of the impure components, etc., thereby increasing the relative ratio of volatile ruthenium to the impure components in the offgas. Then
The condenser 7 once cools and condenses the temperature to about 20 ° C., the demister 8 removes the mist, and the heater 9 cools it to 70-80 °
The water concentration in the off-gas is reduced to about 4% or less by heating to off. That is, a series of processes from the cooler 7 to the heater 9 removes most of the water content in the offgas and brings it to a dry state. After performing such pretreatment, most of the harmful substances such as NOx and moisture to the silica gel layer 3 are removed by passing through the adsorption tower 4, so that the adsorption tower 4 is removed. In the above, volatile ruthenium can be mainly adsorbed.
『実験例』 次に、このオフガス処理装置の性能を確認するために行
なった実験例について説明する。"Experimental Example" Next, an experimental example performed for confirming the performance of the off-gas processing apparatus will be described.
この実験においては、次のような試験ガスを使用した。The following test gases were used in this experiment.
オフガス類似のガスとして、ルテニウム（Ru）濃度が
2.3×10-8mol/Nm3、NOx濃度が0.1％、H2O濃度が４％の
試験ガス ルテニウム吸着を阻害する成分を含むオフガスを模擬
するために、硝酸を仮焼することにより得た試験ガス
（ルテニウムは含まれない。この場合、NOx濃度を変え
た数種類のガスを生成した） そして、第１図例の処理装置と等価の試験装置のの試
験ガスを予め通しておいたものと、の試験ガスを通し
ていないものとに、それぞれの試験ガスを通して、こ
れらの吸着塔におけるルテニウムの吸着分布を測定し
た。その結果を第２図の○、△、□、◇で示す。該第２
図において、○はの試験ガスを通していない試験装置
にの試験ガスを３時間通したもの、△、□、◇はの
試験ガスを予め６時間通した後にの試験ガスを３時間
通したもので、この場合のの試験ガスにおけるNOx濃
度は、△が0.2％、□が0.7％、◇が1.0％であった。Ruthenium (Ru) concentration is similar to that of off gas.
2.3 × 10 -8 mol / Nm 3 , test gas with NOx concentration of 0.1% and H 2 O concentration of 4% Obtained by calcination of nitric acid to simulate an offgas containing a component that inhibits ruthenium adsorption. Test gas (ruthenium is not included. In this case, several kinds of gases with different NOx concentrations were generated), and the test gas of the test device equivalent to the treatment device of the example in FIG. 1 was passed in advance. The adsorption distributions of ruthenium in these adsorption towers were measured by passing the test gas through the test gas and the test gas through which the test gas did not pass. The results are shown by ○, △, □, and ◇ in FIG. The second
In the figure, ○ indicates that the test gas through which the test gas is not passed for 3 hours, △, □, and ◇ indicates that the test gas after passing the test gas for 6 hours in advance is passed for 3 hours. The NOx concentrations in the test gas in this case were 0.2% for △, 0.7% for □, and 1.0% for ◇.
また、第１図例の処理装置からスクラバ６を除いた状態
とした試験装置にの試験ガスを６時間通した後、の
試験ガスを３時間通してルテニウムの吸着分布を測定し
た。その結果を第２図の▲、■、◆で示す。この場合の
の試験ガスのNOx濃度は、▲が0.05％、■が0.05％、
◆は0.2％であった。Further, after passing the test gas through the test apparatus in the state where the scrubber 6 was removed from the treatment apparatus of FIG. 1 for 6 hours, the test gas was passed for 3 hours to measure the adsorption distribution of ruthenium. The results are shown by ▲, ■, ◆ in FIG. The NOx concentration of the test gas in this case is 0.05% for ▲, 0.05% for ■,
◆ was 0.2%.
なお、各試験において、吸着塔のシリカゲル層の高さは
35cm、シリカゲル層の温度は70℃、各ガスのシリカゲル
層通過時における流速は22cm/secである。In addition, in each test, the height of the silica gel layer of the adsorption tower is
The temperature is 35 cm, the temperature of the silica gel layer is 70 ° C., and the flow velocity of each gas when passing through the silica gel layer is 22 cm / sec.
第２図から明らかなように、○、△、□、◇で示す各条
件においては、いずれもほぼ同様なルテニウム吸着分布
を示しており、の試験ガスを予め通しておいた吸着塔
も、該試験ガスを通していない吸着塔もほぼ同様なルテ
ニウム吸着性能を有するということが確認された。つま
り、吸着塔を長時間オフガス処理に使用しても、オフガ
スを吸着塔に通す前にスクラバに経由させておくことに
より、シリカゲル層の吸着性能の低下を抑制し得るとい
うことがいえるものである。As is clear from FIG. 2, under each of the conditions indicated by ◯, Δ, □, and ◇, the ruthenium adsorption distributions were almost the same, and the adsorption tower in which the test gas had previously passed was also It was confirmed that the adsorption tower not passing the test gas has almost the same ruthenium adsorption performance. In other words, it can be said that even if the adsorption tower is used for off-gas treatment for a long time, the off-gas is allowed to pass through the scrubber before passing through the adsorption tower, whereby the deterioration of the adsorption performance of the silica gel layer can be suppressed. .
また、△、□、◇と▲、■、◆とを比較すると、△、
□、◇の条件下では、▲、■、◆の条件下よりも吸着塔
の入口付近で多くのルテニウムが吸着されている。例え
ば、△と◆とであると、吸着塔において102cpmのγ線強
度となる位置は、◆ではＡで示すように吸着塔入口から
シリカゲル層の20cm以上の長さを要するのに対し、△で
はＢで示すように12cm程度の長さで足りている。したが
って、この結果から、オフガスを吸着塔に通す前に少な
くともスクラバを経由させることにより、吸着塔の入口
からシリカゲル層の短い距離の間で集中的に多くのルテ
ニウムを吸着し得ること、言い替えれば、ルテニウム吸
着量の少ない残りの層によりさらにルテニウムを吸着し
得る余裕を多く有しているといえるものである。Also, comparing △, □, ◇ with ▲, ■, ◆, △, □
Under the conditions of □ and ◇, more ruthenium is adsorbed near the inlet of the adsorption tower than under the conditions of ▲, ■, and ◆. For example, if Δ and ◆ are, the position where the γ-ray intensity is 10 2 cpm in the adsorption tower is that, in ◆, the silica gel layer length of 20 cm or more from the adsorption tower inlet is required as shown by A. In B, as shown by B, a length of about 12 cm is sufficient. Therefore, from this result, by passing at least off-gas through the scrubber before passing through the adsorption tower, it is possible to intensively adsorb a large amount of ruthenium during a short distance of the silica gel layer from the inlet of the adsorption tower, in other words, It can be said that the remaining layer having a small amount of adsorbed ruthenium has more room for adsorbing ruthenium.
「発明の効果」 以上説明したように、本発明のオフガス処理装置によれ
ば、オフガスを吸着塔に通す前に、スクラバによりオフ
ガス中のNOx等の不純成分の大部分を除去して該不純成
分に対する揮発性ルテニウムの相対比率を大きくしてお
くようにしたから、吸着塔においては揮発性ルテニウム
を中心に吸着し得るので、シリカゲル層の短い距離の間
で集中的に多くのルテニウムを吸着し得るとともに、長
時間の処理によるシリカゲル層の吸着性能の低下を抑制
し得て、除染効率を高めることができるという効果を奏
する。"Effects of the Invention" As described above, according to the offgas treatment apparatus of the present invention, most of the impure components such as NOx in the offgas are removed by the scrubber before passing the offgas through the adsorption tower. Since the relative ratio of volatile ruthenium to the volatile ruthenium is increased, the volatile ruthenium can be adsorbed mainly in the adsorption tower, so that a large amount of ruthenium can be adsorbed intensively during a short distance of the silica gel layer. At the same time, it is possible to suppress the deterioration of the adsorption performance of the silica gel layer due to the treatment for a long time, and it is possible to enhance the decontamination efficiency.
第１図は本発明におけるオフガス処理装置の一実施例を
示す概略図、第２図は第１図の処理装置の性能を立証す
るために被試験ガスにより実験して得たシリカゲル層の
Ru吸着分布図である。 １……オフガス処理系、２……前処理塔、３……シリカ
ゲル層、４……吸着塔、５……容器、６……スクラバ、
７……冷却器、８……デミスタ、９……加熱器。FIG. 1 is a schematic diagram showing an embodiment of an off-gas treatment apparatus according to the present invention, and FIG. 2 shows a silica gel layer obtained by an experiment with a gas to be tested to prove the performance of the treatment apparatus of FIG.
It is a Ru adsorption distribution map. 1 ... Off-gas treatment system, 2 ... Pretreatment tower, 3 ... Silica gel layer, 4 ... Adsorption tower, 5 ... Vessel, 6 ... Scrubber,
7 ... cooler, 8 ... demister, 9 ... heater.
Claims (1)
なす揮発性ルテニウムをオフガスから吸着除去する装置
であって、オフガスを洗浄することにより洗浄水に対し
て親和性を有する不純成分を除去するスクラバ（６）
と、該スクラバに接続されスクラバを経由したオフガス
中のミスト分を除去するデミスタ（８）と、該デミスタ
に接続されデミスタを経由したオフガスをシリカゲル層
（３）に通して前記ガス状をなす揮発性ルテニウムをシ
リカゲル層に吸着させる吸着塔（４）とを具備するオフ
ガス処理装置。1. A device for adsorbing and removing impure components contained in off-gas and gaseous volatile ruthenium from off-gas, wherein impure components having an affinity for cleaning water are removed by cleaning off-gas. Scrubber (6)
And a demister (8) connected to the scrubber for removing mist in the offgas passing through the scrubber, and an offgas connected to the demister and passing through the demister through the silica gel layer (3) to form the gaseous volatilization. Off gas treatment apparatus comprising: an adsorption tower (4) for adsorbing ruthenium in a silica gel layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60269798A JPH0715515B2 (en) | 1985-11-30 | 1985-11-30 | Off-gas processing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60269798A JPH0715515B2 (en) | 1985-11-30 | 1985-11-30 | Off-gas processing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62129798A JPS62129798A (en) | 1987-06-12 |
| JPH0715515B2 true JPH0715515B2 (en) | 1995-02-22 |
Family
ID=17477311
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60269798A Expired - Lifetime JPH0715515B2 (en) | 1985-11-30 | 1985-11-30 | Off-gas processing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0715515B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2814500B2 (en) * | 1988-10-06 | 1998-10-22 | 石川島播磨重工業株式会社 | Ruthenium removal equipment |
| FR2688335B1 (en) * | 1992-03-03 | 1994-05-27 | Cogema | PROCESS FOR TRAPPING RUTHENIUM GAS ON POLYVINYLPYRIDINE, IN PARTICULAR FOR RECOVERING RADIOACTIVE RUTHENIUM FROM IRRADIATED NUCLEAR FUELS. |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6042695A (en) * | 1983-08-18 | 1985-03-06 | 東洋エンジニアリング株式会社 | Radioactive gas treatment method |
-
1985
- 1985-11-30 JP JP60269798A patent/JPH0715515B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62129798A (en) | 1987-06-12 |
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