JPH0718798B2 - High frequency inductively coupled plasma optical emission spectrometer - Google Patents

Description

Detailed Description of the Invention a. BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high frequency inductively coupled plasma (abbreviated as ICP) optical emission spectroscopic analyzer, and more particularly to a display for displaying its analysis conditions.

B. In the prior art ICP emission spectroscopic analysis, there are many items of analysis conditions to be set and confirmed by the operator, and it is not easy for the operator to set the analysis conditions or confirm the present conditions of the analysis conditions during the analysis.

The items of analysis conditions in the ICP emission spectrometer are the cooling gas flow rate, plasma gas flow rate, and carrier gas flow rate for the plasma torch, the sample suction amount for the sample introduction system, and the observation height of the plasma flame for the spectroscopic optical system. There are indeed many items such as the slit widths of the entrance and exit, the flow rate of the purge gas for keeping the atmospheric conditions between the spectroscope and the plasma flame constant, and the high frequency output and the reflected wave power regarding the electric system.

Conventionally, in ICP emission spectroscopic analysis, the following method has been used for the operator to set and confirm the conditions of the above-mentioned multiple items. That is, there are meters and adjustment knobs that detect and display the controlled variable of each item, and the operator operates the adjustment knobs while watching the meter display to set the
The display of each meter is monitored during the analysis. In this case, the adjusting knob is mechanically connected to the place where the controlled variable is controlled, and is provided at a structurally convenient place. Familiar with the configuration and function of the analyzer as a whole, since the adjustment knobs and the meters are arranged separately without any functional interrelation,
Only an operator who was skilled in operation could perform smooth setting operation and status monitoring during analysis.

C. The present invention aims to improve the relationship between the ICP emission spectroscopic analyzer and the operator so that the setting operation of the analysis conditions and the condition monitoring during the analysis can be easily performed, and even a beginner unfamiliar with the device can use it with confidence. To aim.

D. Configuration The ICP emission spectroscopic analyzer of the present invention is such that each adjusting mechanism is coupled to a control circuit via an interface, and each analysis condition is input via a keyboard, whereby each control mechanism is controlled via the interface. Intuitively, by driving the adjustment mechanism and combining each analysis condition and each sensor output with a pictorial pattern imitating the shape of the part related to the analysis condition, a graph, an index or a numerical display. Comprehensive CRT for status recognition
It is characterized in that it is adapted to display on a display device.

E. Embodiment FIG. 1 shows an analysis condition display pattern on a CRT display surface in an embodiment of the present invention. In reality, the background is black and each pattern is displayed in an appropriate color. Patterns 1 to 4 imitate the shape of a flowmeter by showing a gas flow rate, and a circular pattern a corresponds to an indicator of the flowmeter, showing the flow rate according to its height position, and a scale is displayed on the side. Has been done. 1 is the cooling gas flow rate,
The item Coo-lnt is displayed above. 2 is the plasma gas flow rate, and the item is displayed as Plasma. 3 is the carrier gas flow rate, which is indicated as Carrier above. 4 is the purge gas flow rate, which is indicated as Purge above. The approximate value of each flow rate can be seen at a glance by the height of the circular pattern, and it can be understood more concretely by reading the scale, and each flow rate is displayed numerically under each pattern so that it is not necessary to read the scale one by one. Has been done. 5 is a pattern expressing a plasma flame, and 6 is a high frequency coil. A dimension line 7 is displayed and an eye shape 8 is displayed to the right of the upper line. This indicates the observation height of the plasma flame, and indicates that the light at the line-of-sight height of the eye 8 in the pattern is incident on the spectroscope. In the device configuration, the plasma torch can be moved up and down,
The height indicated by the dimension line according to the vertical movement amount is displayed numerically on the right side of the eye shape 8 (which is 15 mm in the figure). Pattern 9 on the arcuate scale shows high frequency output,
The isomorphic pattern 10 shows the reflected power. The reflected power indicates the reflected power due to the impedance mismatch between the high frequency coil and the power source side viewed from the same coil, and indicates the quality of the matching. The numbers below each pattern 9 and 10 are the numbers displayed on the arc scale. Below the pattern 5 of the plasma flame, the Entrance Slit is the incident slit of the spectroscope, and the numbers to the right of it indicate the height and width of the slit. The Exit Slit below that is the exit slit of the spectroscope, and the numbers to the right indicate the height and width of the slit. The pattern 11 in the lower right shows the sample atomizer, and the displayed number is the sample suction amount, and the item "Sampl Uptake" is displayed.

Figure 2 shows the outline of the overall structure of the ICP emission spectrophotometer. P is a plasma torch consisting of a triple tube, with the cooling gas in the outermost tube, the plasma gas in the middle tube, and the sample in the central tube. Gas is supplied. H is a high frequency power supply device and L is a high frequency coil. The plasma torch P and the high frequency coil are integrally attached to the vertical movement device Y. A spectroscope M is provided with a tube T protruding from the incident slit side of the spectroscope toward the plasma torch, and a purge gas is flown toward the plasma torch. With this configuration, absorption of light by air or components in the air can be prevented. By moving the plasma torch P up and down with respect to the spectroscope M, the measurement height in the plasma flame is selected. N is a sample atomizer and S is a sample solution. When this configuration is compared with the entire pattern of FIG. 1, it will be understood that the display pattern and the respective portions of the analyzer are in a positional correspondence and are intuitively easy to understand. Further, in the pattern of FIG. 1, the shape of the plasma torch is simplified and displayed below the display 5 of the plasma flame, and the pattern 1 to show the gas flow rate
It will be easier to understand if a line connecting the lines 4 and 4 is displayed.

FIG. 3 shows a device configuration of an embodiment of the present invention. C is a control circuit, K is a keyboard, I1 and I2 are interfaces connecting the ICP analyzer and the control circuit C, and B is a display CRT. When setting analysis conditions, control circuit C displays CR
The pattern shown in FIG. 1 is displayed on T, and the items to be set are sequentially displayed at appropriate places. In this display, when the setting of one item is completed, the next item is displayed. Therefore, the operator may perform the setting operation guided by the instruction of the control circuit C. When one item is displayed, if an up, down, or numerical value is input on the keyboard K, the setting for that item is automatically performed. That is, the control circuit C sends a signal to the interface I1 based on the input data to drive one of the adjusting mechanisms A1 to An. D1 to Dn are sensors for each condition item, the output of which is input to the control circuit C through the interface I2, and the control circuit C displays the output data on the pattern of FIG. For example, if you are adjusting the cooling gas flow rate, the message "Please set the cooling gas flow rate" is displayed on the display CRT, and if you press the up key on the keyboard, the cooling gas flow rate will increase by one step, and The gas flow rate thus detected is displayed at position 1 in the display pattern. The operator may repeatedly press the up key until the displayed gas flow rate reaches the desired value. Further, even during the analysis, the pattern display of FIG. 1 can be displayed at any time by operating the key of the condition display.

F. Effect The ICP emission spectroscopic analyzer of the present invention has the configuration as described above,
The display of the analysis conditions is displayed on the CRT as a group with intuitive patterns and numbers, so you can grasp the entire analysis conditions with a single eye, unlike reading the meters distributed at various places one by one. Since it is possible to know what is currently set in the setting operation, erroneous operation can be prevented and even beginners can operate with confidence.

[Brief description of drawings]

FIG. 1 is a diagram of a display pattern in one embodiment of the present invention,
FIG. 2 is a schematic diagram of the overall configuration of the ICP emission spectroscopic analyzer, and FIG. 3 is a block diagram of an embodiment of the present invention. 1-4: Gas flow rate display pattern, 5 ... Plasma flame display pattern, 9 ... High frequency output display pattern, 10 ... Reflected wave power display pattern, 11 ... Sample atomizer display pattern, H ... High frequency power supply Device, L ... High frequency coil, P ...
... Plasma torch, Y ... Vertical moving device, N ... Sample atomizer, M ... Spectrometer, T ... Protective tube.

Claims (1)

[Claims] 1. A control circuit for driving an adjusting mechanism for giving each analysis condition and simultaneously displaying the output of a sensor for detecting the value of each analysis condition on one CRT, and inputting each analysis condition to the control circuit. A keyboard is provided, and each analysis condition and each sensor output are comprehensively displayed by combining a pictorial pattern that imitates the shape of the part related to the analysis condition with a graph, an index, or a numerical display. A high-frequency inductively coupled plasma optical emission spectroscopic analyzer characterized by the above.