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JPH0719969B2 - Method for manufacturing multilayer circuit board - Google Patents
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JPH0719969B2 - Method for manufacturing multilayer circuit board - Google Patents

Method for manufacturing multilayer circuit board

Info

Publication number
JPH0719969B2
JPH0719969B2 JP62242045A JP24204587A JPH0719969B2 JP H0719969 B2 JPH0719969 B2 JP H0719969B2 JP 62242045 A JP62242045 A JP 62242045A JP 24204587 A JP24204587 A JP 24204587A JP H0719969 B2 JPH0719969 B2 JP H0719969B2
Authority
JP
Japan
Prior art keywords
circuit board
circuit pattern
semiconductor mounting
circuit
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62242045A
Other languages
Japanese (ja)
Other versions
JPS6484697A (en
Inventor
武司 加納
徹 樋口
宗勇 山田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP62242045A priority Critical patent/JPH0719969B2/en
Publication of JPS6484697A publication Critical patent/JPS6484697A/en
Publication of JPH0719969B2 publication Critical patent/JPH0719969B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention 【技術分野】【Technical field】

本発明は、半導体実装用回路パターンが形成された半導
体実装用凹部を有してチップキャリア、ピングリッドア
レイなどのパッケージ用基板として好適に採用される多
層回路基板の製造方法に関するものである。
The present invention relates to a method for manufacturing a multi-layer circuit board which has a semiconductor mounting recess in which a semiconductor mounting circuit pattern is formed and is suitably adopted as a package substrate for a chip carrier, a pin grid array, or the like.

【背景技術】[Background technology]

従来にあっては、この種の多層回路基板は、例えばプラ
スチック基板や金属基板に回路パターンを形成した後、
基板を加熱・加圧により変形させ半導体実装用凹部を形
成して製造されている。この方法では回路パターンを半
導体実装用凹部にも形成できるが、単に凹部を形成した
だけであり、表面回路と凹部の回路とを分離して、配線
密度を向上させることなどが到底できないものであっ
た。 このため、第3図に示すように(実開昭61-75596号公
報)、マトリックス回路基板2に貫通部4を有する回路
基板5を積層一体化させることによって(第3図
(a))、半導体実装用回路パターン1が底部に設けら
れた半導体実装用凹部10を貫通部4によって形成し(第
3図(b))、次いでマトリックス回路基板2と回路基
板5に貫通してスルホール6を形成すると共にスルホー
ルめっき12を施し(第3図(c))、スルホール6の部
分にレジストを施してエッチングすることによって、ス
ルホール6でマトリックス回路基板2と回路基板5の回
路パターン1,8を電気的に接続した多層回路基板A′を
製造するようにしている(第3図(d))。 しかしこのものでは、回路基板2,5として両面に回路形
成した両面プリント配線板が使用されており、マトリッ
クス回路基板2と回路基板5を積層一体化するときの回
路パターン1,8の位置合わせが難しく、スルホール加工
の歩留りが悪いという欠点があった。またこの従来例で
は回路パターン1,8の表面に異種金属の金属層14が設け
られており、第3図(d)にみられるように最外層回路
パターン7が回路パターン8と金属層14とスルホールめ
っき12の3層からなり、導体厚みが大きくなって高密度
配線が難しいものであった。
Conventionally, this kind of multilayer circuit board, for example, after forming a circuit pattern on a plastic substrate or a metal substrate,
It is manufactured by deforming a substrate by heating and pressing to form a semiconductor mounting recess. With this method, the circuit pattern can be formed in the semiconductor mounting recess, but the recess is simply formed and it is impossible to improve the wiring density by separating the surface circuit from the circuit in the recess. It was Therefore, as shown in FIG. 3 (Japanese Utility Model Laid-Open No. 61-75596), the circuit board 5 having the through portions 4 is laminated and integrated on the matrix circuit board 2 (FIG. 3 (a)). A semiconductor mounting recess 10 provided with a semiconductor mounting circuit pattern 1 on the bottom is formed by a penetrating portion 4 (FIG. 3B), and then a through hole 6 is formed penetrating the matrix circuit board 2 and the circuit board 5. At the same time, the through hole plating 12 is applied (FIG. 3 (c)), the resist is applied to the through hole 6 and etching is performed to electrically connect the circuit patterns 1 and 8 of the matrix circuit board 2 and the circuit board 5 to the through hole 6. A multilayer circuit board A'connected to the above is manufactured (FIG. 3 (d)). However, in this one, a double-sided printed wiring board having circuits formed on both sides is used as the circuit boards 2 and 5, and the alignment of the circuit patterns 1 and 8 when the matrix circuit board 2 and the circuit board 5 are laminated and integrated. It was difficult and the yield of through hole processing was poor. Further, in this conventional example, a metal layer 14 of a dissimilar metal is provided on the surface of the circuit patterns 1 and 8, and the outermost layer circuit pattern 7 is composed of the circuit pattern 8 and the metal layer 14 as shown in FIG. 3 (d). It consisted of three layers of through-hole plating 12, and the conductor thickness became large, making high-density wiring difficult.

【発明の目的】[Object of the Invention]

本発明は上記事情に鑑みて為されたものであり、その目
的とするところは、半導体実装用回路パターンが形成さ
れた半導体実装用凹部を有してチップキャリア、ピング
リッドアレイなどのパッケージ用基板として好適に採用
される多層回路板の製造方法において、層間回路パター
ンの位置合わせ精度を高めることにある。
The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a package substrate for a chip carrier, a pin grid array, or the like having a semiconductor mounting recess in which a semiconductor mounting circuit pattern is formed. In the method for manufacturing a multilayer circuit board that is preferably used as, the accuracy of alignment of the interlayer circuit pattern is increased.

【発明の開示】DISCLOSURE OF THE INVENTION

本発明の多層回路基板の製造方法は、半導体実装用のマ
トリックス回路基板2の一方の片面に半導体実装用回路
パターン1を形成すると共に他方の片面に金属箔9を設
け、回路基板5の貫通部4に対応する箇所を除いて半導
体実装用回路パターン1に回路間凹凸吸収層13を設ける
と共に回路間凹凸吸収層13で覆われない半導体実装用回
路パターン1の露出する回路パターン部分1aにエッチン
グレジスト層3を形成し、貫通部4を設けた回路基板5
の一方の片面に内層回路パターン8を形成すると共に他
方の片面に金属箔9を設け、次いで、マトリックス回路
基板2の半導体実装用回路パターン形成面2aに、回路基
板5に設けた貫通部4と同径の貫通孔11aを有する接着
シート11を介在させて回路基板5をその金属箔9が最外
面となるように積層一体化し、この後マトリックス回路
基板2と回路基板5を貫通してスルホール6を設けると
共にスルホール6の内周及びマトリックス回路基板2や
回路基板5の外面にスルホールめっき12を施し、次いで
スルホールめっき12及び金属箔9をエッチングして最外
層回路パターン7を形成することを特徴とするものであ
り、この構成により上記目的が達成されたものである。 以下本発明を添付の図面に基づいて説明する。 半導体実装用のマトリックス回路基板2は、アルミナ、
シリコンカーバイドなどのセラミック、ガラスエポキシ
樹脂基板、ガラスポリイミド樹脂基板、紙エポキシ樹脂
基板、ガラストリアジン樹脂基板などの無機質系基板あ
るいは有機質系基板に感光性樹脂を用いたフォトエッチ
ング方法や導電ペーストをスクリーン印刷するといった
通常の方法により半導体実装用回路パターン1が形成さ
れたものである。実施例ではマトリックス回路基板2の
片面に凹所15を凹設してこの凹所15内にも半導体実装用
回路パターン1が形成してある。この凹所15内の半導体
実装用回路パターン1は導電ペーストの塗布や無電解め
っきなど従来から周知の任意の方法で形成することがで
きる。半導体実装用回路パターン1はマトリックス回路
基板2の一方の片面にのみ形成してあり、マトリックス
回路基板2の他方の片面には回路パターンは形成してい
なく後の工程で最外層回路パターン7を形成するために
金属箔9のままである。尚、マトリックス回路基板2を
複数のプリント配線基板で形成してもよい。 このマトリックス回路基板2の半導体実装用回路パター
ン形成面2aには回路間凹凸吸収層13が設けられている。
この回路間凹凸吸収層13としてはめっきレジストが採用
される。このめっきレジストの表面をサンドブラストな
どの物理的手段又は化学的処理により粗化させておくの
が好ましい。回路間凹凸吸収層13は後述の回路基板5の
貫通部4と対応する箇所を除いて部分的に、つまり回路
基板5が積層される箇所に設けられるものであり、半導
体実装用回路パターン1のうち回路間凹凸吸収層13で覆
われず露出する回路パターン部分1aにはエッチングレジ
スト層3が形成してある。このエッチングレジスト層3
は金、ニッケル、半田等の金属あるいは電着塗装が可能
な樹脂により形成されている(第1図(a)参照)。 マトリックス回路基板2に積層一体化させる回路基板5
はプリント配線基板であり、一方の片面に内層回路パタ
ーン8が形成され、他方の片面は銅箔のような金属箔9
のままの回路未形成面5aとなったものであり、後述のよ
うに半導体実装用凹部10を形成するための貫通部4が穿
孔されている(第1図(a)参照)。 マトリックス回路基板2の半導体実装用回路パターン形
成面2aに、貫通部4と同径の貫通孔11aを有する接着シ
ート11を介在させて回路基板5をその回路パターン未形
成面5aが最外面となるように、例えば通常の成形条件で
積層一体化する。このようにマトリックス回路基板2と
回路基板5とを積層一体化するにあたって、マトリック
ス回路基板2の回路間凹凸吸収層13を設けた部分に回路
基板5が積層され、エッチングレジスト層3を設けた回
路パターン部分1aは貫通部4の内方に位置するようにし
てある(第1図(b)参照)。 次に、内層回路パターン8に合わせてスルホール6をド
リル加工した後、スルホール6の内周及びマトリックス
基板2や回路基板5の外面にスルホールめっき12を施す
(第1図(c)参照)。この後、第1図(c)に想像線
で示すようにスルホール6の部分にレジスト層16を設
け、レジスト層16で被覆されないスルホールめっき12及
びマトリックス基板2や回路基板5の金属層9をエッチ
ング加工することによって最外層回路パターン7を形成
する。ここで、半導体実装用回路パターン1の露出する
回路パターン部分1aにはエッチングレジスト層3が形成
してあるために、この露出する回路パターン部分1aはエ
ッチングレジスト層3で保護されてエッチングされるこ
とを防ぐことができる。そして、必要に応じてエッチン
グレジスト13を除去して、貫通部4によって形成される
半導体実装用凹部10を有する多層回路基板Aを製造する
ことができる(図1(d)参照)。 尚、第2図に示すように複数の回路基板8を採用しても
よいものである。この場合は内層の回路基板8の上面に
も回路間凹凸吸収層13が設けられている。 この多層回路基板Aの半導体実装用凹部10にはワイヤー
ボンディング、ダイボンディングにより半導体が実装さ
れたチップキャリア、ピングリッドアレイとして実用に
供される。
According to the method for manufacturing a multilayer circuit board of the present invention, the semiconductor mounting circuit pattern 1 is formed on one surface of the matrix circuit board 2 for mounting the semiconductor, and the metal foil 9 is provided on the other surface of the matrix circuit board 2, and the penetrating portion of the circuit board 5 is formed. 4 is provided with an inter-circuit unevenness absorption layer 13 on the semiconductor mounting circuit pattern 1 except for a portion corresponding to 4, and an etching resist is applied to the exposed circuit pattern portion 1a of the semiconductor mounting circuit pattern 1 which is not covered with the inter-circuit unevenness absorption layer 13. Circuit board 5 on which layer 3 is formed and through-holes 4 are provided
The inner layer circuit pattern 8 is formed on one surface of the one side and the metal foil 9 is provided on the other side of the other side, and then the penetrating portion 4 formed on the circuit board 5 is formed on the semiconductor mounting circuit pattern forming surface 2a of the matrix circuit board 2. The circuit board 5 is laminated and integrated so that the metal foil 9 becomes the outermost surface with the adhesive sheet 11 having the through holes 11a of the same diameter interposed, and then the matrix circuit board 2 and the circuit board 5 are penetrated to form the through holes 6 In addition, the through hole 6 is formed on the inner circumference of the through hole 6 and the outer surface of the matrix circuit board 2 or the circuit board 5, and then the through hole plating 12 and the metal foil 9 are etched to form the outermost layer circuit pattern 7. The above-described object is achieved by this configuration. Hereinafter, the present invention will be described with reference to the accompanying drawings. The matrix circuit board 2 for semiconductor mounting is made of alumina,
Photo-etching method using conductive resin or screen printing of conductive paste on inorganic or organic substrates such as ceramics such as silicon carbide, glass epoxy resin substrates, glass polyimide resin substrates, paper epoxy resin substrates, glass triazine resin substrates. The semiconductor mounting circuit pattern 1 is formed by a normal method such as. In the embodiment, a recess 15 is provided on one surface of the matrix circuit board 2 and the semiconductor mounting circuit pattern 1 is also formed in the recess 15. The semiconductor mounting circuit pattern 1 in the recess 15 can be formed by any conventionally known method such as application of a conductive paste or electroless plating. The semiconductor mounting circuit pattern 1 is formed only on one side of the matrix circuit board 2, and the circuit pattern is not formed on the other side of the matrix circuit board 2 and the outermost layer circuit pattern 7 is formed in a later step. The metal foil 9 remains as it is. The matrix circuit board 2 may be formed of a plurality of printed wiring boards. An inter-circuit irregularity absorption layer 13 is provided on the semiconductor mounting circuit pattern forming surface 2a of the matrix circuit board 2.
A plating resist is used for the inter-circuit unevenness absorption layer 13. The surface of this plating resist is preferably roughened by a physical means such as sandblasting or a chemical treatment. The inter-circuit unevenness absorption layer 13 is provided partially except for a portion corresponding to a through portion 4 of the circuit board 5 described later, that is, in a portion where the circuit board 5 is laminated. An etching resist layer 3 is formed on the exposed circuit pattern portion 1a which is not covered with the inter-circuit unevenness absorption layer 13. This etching resist layer 3
Is formed of a metal such as gold, nickel, solder or a resin that can be electrodeposited (see FIG. 1 (a)). Circuit board 5 laminated and integrated on the matrix circuit board 2
Is a printed wiring board, the inner layer circuit pattern 8 is formed on one side, and the other side is a metal foil 9 such as a copper foil.
The circuit-unformed surface 5a is left as it is, and the through-hole 4 for forming the semiconductor mounting recess 10 is punched as described later (see FIG. 1 (a)). An adhesive sheet 11 having a through hole 11a having the same diameter as that of the through portion 4 is interposed on the semiconductor mounting circuit pattern forming surface 2a of the matrix circuit board 2 to form the circuit board 5 on which the circuit pattern unformed surface 5a is the outermost surface. Thus, for example, they are laminated and integrated under normal molding conditions. When the matrix circuit board 2 and the circuit board 5 are laminated and integrated as described above, the circuit board 5 is laminated on the portion of the matrix circuit board 2 where the inter-circuit unevenness absorption layer 13 is provided, and the etching resist layer 3 is provided. The pattern portion 1a is located inside the penetrating portion 4 (see FIG. 1 (b)). Next, after the through hole 6 is drilled according to the inner layer circuit pattern 8, through hole plating 12 is applied to the inner periphery of the through hole 6 and the outer surface of the matrix substrate 2 or the circuit substrate 5 (see FIG. 1 (c)). Thereafter, as shown by an imaginary line in FIG. 1 (c), a resist layer 16 is provided on the through hole 6, and the through hole plating 12 not covered with the resist layer 16 and the metal layer 9 of the matrix substrate 2 or the circuit substrate 5 are etched. The outermost layer circuit pattern 7 is formed by processing. Here, since the etching resist layer 3 is formed on the exposed circuit pattern portion 1a of the semiconductor mounting circuit pattern 1, the exposed circuit pattern portion 1a is protected by the etching resist layer 3 and etched. Can be prevented. Then, if necessary, the etching resist 13 is removed to manufacture the multilayer circuit board A having the semiconductor mounting recess 10 formed by the penetrating portion 4 (see FIG. 1D). Incidentally, as shown in FIG. 2, a plurality of circuit boards 8 may be adopted. In this case, the inter-circuit irregularity absorption layer 13 is also provided on the upper surface of the inner circuit board 8. In the semiconductor mounting recess 10 of the multilayer circuit board A, a chip carrier on which a semiconductor is mounted by wire bonding or die bonding, and a pin grid array are practically used.

【発明の効果】【The invention's effect】

本発明にあっては、半導体実装用のマトリックス回路基
板の一方の片面に半導体実装用回路パターンを形成する
と共に他方の片面に金属箔を設け、回路基板の貫通部に
対応する箇所を除いて半導体実装用回路パターンに回路
間凹凸吸収層を設けると共に回路間凹凸吸収層で覆われ
ない半導体実装用回路パターンの露出する回路パターン
部分にエッチングレジスト層を形成し、貫通部を設けた
回路基板の一方の片面に内層回路パターンを形成すると
共に他方の片面に金属箔を設け、次いで、マトリックス
回路基板の半導体実装用回路パターン形成面に、回路基
板に設けた貫通部と同径の貫通孔を有する接着シートを
介在させて回路基板をその金属箔が最外面となるように
積層一体化し、この後マトリックス回路基板と回路基板
を貫通してスルホールを設けると共にスルホールの内周
及びマトリックス回路基板や回路基板の外面にスルホー
ルめっきを施し、次いでスルホールめっき及び金属箔を
エッチングして最外層回路パターンを形成するので、内
層回路パターンに合わせてスルホールを穿孔できると共
にこのスルホールに合わせて最外層回路パターンを形成
することができ、位置合わせ精度を向上させることがで
きるものであり、このように半導体実装用回路パターン
が形成された半導体実装用凹部を有する信頼性の高い多
層回路基板を安価に製造できるものである。また最外層
回路パターンは金属箔とスルーホールめっきの2層から
なるので薄く形成でき、高密度配線が容易となるもので
あり、もちろん、この多層回路基板の半導体実装用凹部
に半導体を搭載することにより半導体実装用凹部で半導
体と回路パターンを電気的に接続できるので、製品の厚
みを大幅に薄くできるものである。
According to the present invention, a semiconductor mounting circuit pattern is formed on one side of a matrix circuit board for semiconductor mounting, and a metal foil is provided on the other side of the matrix circuit board for semiconductor mounting, except for a portion corresponding to a penetrating portion of the circuit board. One of the circuit boards provided with an inter-circuit unevenness absorption layer on the mounting circuit pattern and an etching resist layer formed on the exposed circuit pattern portion of the semiconductor mounting circuit pattern not covered by the inter-circuit unevenness absorption layer to provide a through portion The inner layer circuit pattern is formed on one surface and the metal foil is provided on the other surface, and then the surface of the matrix circuit board on which the semiconductor mounting circuit pattern is formed has a through hole having the same diameter as the through hole provided on the circuit board. The circuit board is laminated and integrated so that the metal foil is the outermost surface with the sheet interposed, and then the matrix circuit board and the circuit board are pierced and the The inner periphery of the through hole and the outer surface of the matrix circuit board or the circuit board are plated with the through hole, and then the through hole plating and the metal foil are etched to form the outermost layer circuit pattern. The outermost layer circuit pattern can be formed in accordance with this through hole and the positioning accuracy can be improved, and the semiconductor mounting concave portion having the semiconductor mounting circuit pattern thus formed is provided. A highly reliable multilayer circuit board can be manufactured at low cost. In addition, the outermost layer circuit pattern consists of two layers of metal foil and through-hole plating, so it can be made thin and facilitates high-density wiring. Of course, mounting the semiconductor in the semiconductor mounting recess of this multilayer circuit board With this, the semiconductor and the circuit pattern can be electrically connected to each other in the semiconductor mounting recess, so that the thickness of the product can be significantly reduced.

【図面の簡単な説明】[Brief description of drawings]

第1図(a)(b)(c)(d)は本発明の一実施例の
各工程を示す説明図、第2図は本発明の他の実施例にお
ける一工程を示す説明図、第3図(a)(b)(c)
(d)は従来例の各工程を示す説明図であって、1は半
導体実装用回路パターン、2はマトリックス回路基板、
3はエッチングレジスト層、4は貫通部、5は回路基
板、6はスルホール、7は最外層回路パターン、8は内
層回路、9は金属箔、11は接着シート、13は回路間凹凸
吸収層である。
1 (a), (b), (c), and (d) are explanatory views showing each step of one embodiment of the present invention, and FIG. 2 is an explanatory view showing one step in another embodiment of the present invention. Figure 3 (a) (b) (c)
(D) is explanatory drawing which shows each process of a prior art example, 1 is a semiconductor mounting circuit pattern, 2 is a matrix circuit board,
3 is an etching resist layer, 4 is a penetrating portion, 5 is a circuit board, 6 is a through hole, 7 is an outermost layer circuit pattern, 8 is an inner layer circuit, 9 is a metal foil, 11 is an adhesive sheet, and 13 is an unevenness absorbing layer between circuits. is there.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H05K 3/46 L 6921−4E ─────────────────────────────────────────────────── ───Continued from the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical indication H05K 3/46 L 6921-4E

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】半導体実装用のマトリックス回路基板の一
方の片面に半導体実装用回路パターンを形成すると共に
他方の片面に金属箔を設け、回路基板の貫通部に対応す
る箇所を除いて半導体実装用回路パターンに回路間凹凸
吸収層を設けると共に回路間凹凸吸収層で覆われない半
導体実装用回路パターンの露出する回路パターン部分に
エッチングレジスト層を形成し、貫通部を設けた回路基
板の一方の片面に内層回路パターンを形成すると共に他
方の片面に金属箔を設け、次いで、マトリックス回路基
板の半導体実装用回路パターン形成面に、回路基板に設
けた貫通部と同径の貫通孔を有する接着シートを介在さ
せて回路基板をその金属箔が最外面となるように積層一
体化し、この後マトリックス回路基板と回路基板を貫通
してスルホールを設けると共にスルホールの内周及びマ
トリックス回路基板や回路基板の外面にスルホールめっ
きを施し、次いでスルーホールめっき及び金属箔をエッ
チングして最外層回路パターンを形成することを特徴と
する多層回路板の製造方法。
1. A semiconductor mounting matrix circuit board having a semiconductor mounting circuit pattern formed on one surface thereof and a metal foil provided on the other surface thereof for semiconductor mounting except a portion corresponding to a penetrating portion of the circuit board. One side of the circuit board where the circuit pattern is provided with the unevenness absorption layer between circuits and the etching resist layer is formed on the exposed circuit pattern part of the circuit pattern for semiconductor mounting that is not covered by the unevenness absorption layer between circuits Forming an inner layer circuit pattern on the other side and providing a metal foil on the other side, and then, on the surface of the matrix circuit board on which the semiconductor mounting circuit pattern is formed, an adhesive sheet having a through hole having the same diameter as the through portion provided on the circuit board. The circuit board is laminated and integrated so that the metal foil is the outermost surface, and then the matrix circuit board and the circuit board are penetrated to form through holes. In addition, the inner circumference of the through hole and the through hole plating are applied to the matrix circuit board and the outer surface of the circuit board, and then the through hole plating and the metal foil are etched to form the outermost layer circuit pattern. .
【請求項2】回路間凹凸吸収層がめっきレジストである
ことを特徴とする特許請求の範囲第1項記載の多層回路
基板の製造方法。
2. The method for manufacturing a multilayer circuit board according to claim 1, wherein the unevenness absorbing layer between circuits is a plating resist.
【請求項3】めっきレジストを粗化させることを特徴と
する特許請求の範囲第2項記載の多層回路基板の製造方
法。
3. The method for manufacturing a multilayer circuit board according to claim 2, wherein the plating resist is roughened.
JP62242045A 1987-09-26 1987-09-26 Method for manufacturing multilayer circuit board Expired - Lifetime JPH0719969B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62242045A JPH0719969B2 (en) 1987-09-26 1987-09-26 Method for manufacturing multilayer circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62242045A JPH0719969B2 (en) 1987-09-26 1987-09-26 Method for manufacturing multilayer circuit board

Publications (2)

Publication Number Publication Date
JPS6484697A JPS6484697A (en) 1989-03-29
JPH0719969B2 true JPH0719969B2 (en) 1995-03-06

Family

ID=17083448

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62242045A Expired - Lifetime JPH0719969B2 (en) 1987-09-26 1987-09-26 Method for manufacturing multilayer circuit board

Country Status (1)

Country Link
JP (1) JPH0719969B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006093493A (en) * 2004-09-27 2006-04-06 Cmk Corp Component built-in type printed wiring board and manufacturing method thereof

Also Published As

Publication number Publication date
JPS6484697A (en) 1989-03-29

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