Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPH0720039B2 - High frequency impedance matching circuit - Google Patents
[go: Go Back, main page]

JPH0720039B2 - High frequency impedance matching circuit - Google Patents

High frequency impedance matching circuit

Info

Publication number
JPH0720039B2
JPH0720039B2 JP9009291A JP9009291A JPH0720039B2 JP H0720039 B2 JPH0720039 B2 JP H0720039B2 JP 9009291 A JP9009291 A JP 9009291A JP 9009291 A JP9009291 A JP 9009291A JP H0720039 B2 JPH0720039 B2 JP H0720039B2
Authority
JP
Japan
Prior art keywords
high frequency
impedance matching
matching circuit
water supply
coil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP9009291A
Other languages
Japanese (ja)
Other versions
JPH04301908A (en
Inventor
昇 栗山
昭彦 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Mechatronics Corp
Original Assignee
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Priority to JP9009291A priority Critical patent/JPH0720039B2/en
Publication of JPH04301908A publication Critical patent/JPH04301908A/en
Publication of JPH0720039B2 publication Critical patent/JPH0720039B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Plasma Technology (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

[発明の目的] [Object of the Invention]

【0001】[0001]

【産業上の利用分野】この発明は、エッチング装置等に
使用される高周波インピーダンス整合回路の改良に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to improvement of a high frequency impedance matching circuit used in an etching apparatus or the like.

【0002】[0002]

【従来の技術】従来のエッチング装置等では、効果的に
エッチングを行わせるために、真空槽内にプラズマ形成
用の高周波電圧が接続される。即ち、図5に示すよう
に、例えば13.5MHzの高周波を出力する高周波源
1は、同軸ケーブル2,インピーダンス整合回路3を経
て負荷4に供給される。負荷4では、真空槽を形成する
容器41と、その容器41内でターゲットを支持するバ
ッキングプレート42との間に高周波が供給される。
2. Description of the Related Art In a conventional etching apparatus or the like, a high frequency voltage for plasma formation is connected in a vacuum chamber in order to effectively perform etching. That is, as shown in FIG. 5, a high frequency source 1 that outputs a high frequency of 13.5 MHz, for example, is supplied to a load 4 via a coaxial cable 2 and an impedance matching circuit 3. In the load 4, a high frequency is supplied between the container 41 that forms the vacuum chamber and the backing plate 42 that supports the target in the container 41.

【0003】通常、同軸ケーブル2は50Ωの特性イン
ピーダンスを有して高周波源1と整合するのに対し、負
荷4は、その形状や大きさ等の種類によって50Ω以外
の例えば200Ω等所定の抵抗値を示す。整合回路3は
コイル31と直並列コンデンサ32,33とのLC回路
で構成されるが、コイル31での高周波の伝送損失が大
きく、発熱による温度上昇は避けられない。そこで、コ
イル31は管状体をコイル状に巻回して形成され、両端
部に接続された給排水管31a,31bからポンプ5に
より冷却水6の供給を受け冷却される。なお、バッキン
グプレート42も温度上昇等による変形を防止するた
め、内部に冷却水6の給水路42aが形成され、給排水
パイプ43a,43bを介して冷却される。
Normally, the coaxial cable 2 has a characteristic impedance of 50Ω and matches with the high frequency source 1, while the load 4 has a predetermined resistance value such as 200Ω other than 50Ω depending on the shape and size thereof. Indicates. The matching circuit 3 is composed of an LC circuit including a coil 31 and series-parallel capacitors 32 and 33, but a high frequency transmission loss in the coil 31 is large, and a temperature rise due to heat generation cannot be avoided. Therefore, the coil 31 is formed by winding a tubular body in a coil shape, and is supplied with cooling water 6 by the pump 5 from the water supply / drainage pipes 31a and 31b connected to both ends and is cooled. In addition, the backing plate 42 is also provided with a water supply passage 42a for the cooling water 6 inside and is cooled via the water supply / drainage pipes 43a and 43b in order to prevent deformation due to temperature rise and the like.

【0004】ところで、高周波源1の出力を一定とした
とき、負荷4に実際に供給される高周波電力量は、途中
の高周波インピーダンス整合回路3等での伝送損失量に
よって左右される。高周波源1からの高周波が効率的に
負荷4に供給されるには、コイル31等で消費される電
力量を最小に押えることが必要とされるが、現実には単
にコイル31での伝送損失量を超えた漏洩電力量が存在
し、実際に負荷4に供給される電力量が設計値よりもか
なり低くなる場合があることに気がついた。その原因を
探って見ると、インピーダンス整合回路3での伝送損失
の中に、実は冷却水6を介して漏洩する高周波電力が相
当あること、またバッキングプレート42についても同
様に冷却水6を介して漏洩する高周波電力も無視できな
いことがわかった。つまり、給排水管31a,31b内
を流れる冷却水6は誘電率を有する一種の導電体であっ
て、図示しないが先端の水源地付近での接地電位レベル
とコイル端部即ち給排水管との接続点A,Bとの間の電
位差によって、冷却水6を高周波が消流れること、また
冷却水6による導電体路と真空槽の容器41との間に形
成される浮遊容量31a′,31b′を介して、高周波
が相当量漏洩することも初めて分った。これらの漏洩
(電力)量は電位差即ち電圧の二乗に比例するから、前
記接続点A,Bが高電位となればなるほど漏洩量は二乗
倍で増加する。この現象はバッキングプレート41側の
冷却水6についても同様である。しかし、従来の高周波
インピーダンス整合回路では、上記のように冷却水6を
介して高周波が漏洩することについてはこれまで予測さ
れてなく、またそれを低減させる手段も考えられてなか
った。
By the way, when the output of the high-frequency source 1 is constant, the amount of high-frequency power actually supplied to the load 4 depends on the amount of transmission loss in the high-frequency impedance matching circuit 3 and the like on the way. In order for the high frequency from the high frequency source 1 to be efficiently supplied to the load 4, it is necessary to suppress the amount of power consumed by the coil 31 or the like to a minimum, but in reality, the transmission loss in the coil 31 is simply generated. It has been noticed that there is an amount of leakage power that exceeds the amount, and the amount of power actually supplied to the load 4 may be considerably lower than the design value. Looking into the cause, the fact that the transmission loss in the impedance matching circuit 3 actually includes high-frequency power that leaks through the cooling water 6, and the backing plate 42 similarly passes through the cooling water 6. It turns out that the leaking high-frequency power cannot be ignored. That is, the cooling water 6 flowing in the water supply / drainage pipes 31a and 31b is a kind of conductor having a dielectric constant, and although not shown, the ground potential level near the water source at the tip and the connection point between the coil end, that is, the water supply / drainage pipe. Due to the potential difference between A and B, the high frequency of the cooling water 6 disappears, and the stray capacitances 31a ′ and 31b ′ formed between the conductor path of the cooling water 6 and the container 41 of the vacuum chamber are used. For the first time, I also learned that a large amount of high frequency leaked. Since the amount of leakage (electric power) is proportional to the potential difference, that is, the square of the voltage, the higher the potential of the connection points A and B, the more the amount of leakage increases by the square. This phenomenon also applies to the cooling water 6 on the backing plate 41 side. However, in the conventional high frequency impedance matching circuit, it has not been predicted so far that the high frequency leaks through the cooling water 6 as described above, and a means for reducing the leakage has not been considered.

【0005】この発明は、漏洩電力は給排水管31a,
31bとコイル31との接続点A,Bと接地電位との電
位差の高さに依存することに着目してなされたもので、
前記接続点A,Bが低電位点に位置するように構成する
ことによって、高周波伝送損失の低減をはかるものであ
る。
In the present invention, the leakage power is supplied to the water supply / drain pipe 31a,
It was made paying attention to the fact that it depends on the height of the potential difference between the connection points A and B between 31b and the coil 31 and the ground potential.
By arranging the connection points A and B to be located at low potential points, high frequency transmission loss can be reduced.

【0006】[0006]

【発明が解決しようとする課題】従来の高周波インピー
ダンス整合回路は、整合回路での水冷却系で漏洩する電
力量が大きく、高周波電力が効率的に負荷に供給されな
いという欠点があった。
The conventional high-frequency impedance matching circuit has a drawback in that the amount of power leaked in the water cooling system in the matching circuit is large and the high-frequency power cannot be efficiently supplied to the load.

【0007】この発明は、上記従来の欠点を解消し、電
力の供給効率を改善した高周波インピーダンス整合回路
を提供することを目的とする。
An object of the present invention is to provide a high frequency impedance matching circuit which solves the above-mentioned conventional drawbacks and improves the power supply efficiency.

【0008】[発明の構成][Structure of Invention]

【0009】[0009]

【課題を解決するための手段】第1の発明は、給排水管
が接続され冷却水を通す管状体で形成されたコイルと、
可変コンデンサとの組合わせ接続からなる高周波インピ
ーダンス整合回路において、前記コイルは管状体が相互
に連通するように並列接続された一対のコイルで構成
し、この一対のコイルを伝搬する高周波の電圧レベルが
最小となる位置の近傍に前記給排水管を接続構成したこ
とを特徴とする。
A first invention is a coil formed of a tubular body to which a water supply / drainage pipe is connected and through which cooling water passes,
In a high frequency impedance matching circuit consisting of a combination connection with a variable capacitor, the coil is composed of a pair of coils connected in parallel so that tubular bodies communicate with each other, and the high frequency voltage level propagating through the pair of coils is high. It is characterized in that the water supply / drainage pipe is connected in the vicinity of the minimum position.

【0010】第2の発明は、前記第1の発明の高周波イ
ンピーダンス整合回路において、一対のコイルは前記負
荷冷却用の給排水パイプに連通するように接続させたこ
とを特徴とする。
A second invention is characterized in that, in the high-frequency impedance matching circuit of the first invention, a pair of coils are connected so as to communicate with the water supply / drainage pipe for cooling the load.

【0011】[0011]

【作用】この発明による高周波インピーダンス整合回路
は、伝送される高周波信号が管状冷却コイル上の電位
が、そのコイル上の位置によって異なることに着目し、
電位が最も小さくなる位置の近傍に冷却用の給排水管を
接続するように構成した。その結果、その接続点と接地
電位との間の電位差は小さくなるので、冷却水を介して
漏洩する電力量は少なく押えることができる。このよう
にコイル上での高周波電位が最も小さくなる位置の近傍
で冷却水を給水循環させるために、この発明ではコイル
を並列構成で互いに連通させ、接続させた給排水管の
内、一方を給水管,他方を排水管として構成できるか
ら、冷却水を効果的に循環させることができる。
In the high frequency impedance matching circuit according to the present invention, attention is paid to the fact that the potential of the transmitted high frequency signal on the tubular cooling coil varies depending on the position on the coil.
A cooling water supply / drainage pipe is connected near the position where the electric potential is the smallest. As a result, the potential difference between the connection point and the ground potential becomes small, so that the amount of electric power leaking through the cooling water can be suppressed. In order to circulate the cooling water in the vicinity of the position where the high-frequency potential is minimized on the coil, in the present invention, the coils are connected to each other in a parallel configuration, and one of the connected water supply / drain pipes is connected to the water supply pipe. Since the other can be configured as a drain pipe, cooling water can be effectively circulated.

【0012】また、コイルを負荷冷却用給排水パイプと
連通して、給電線路と冷却水路とを共用させたことによ
って、負荷側での電力漏洩を低減させ、効率の良い電力
供給が可能となる。
Further, the coil is connected to the water supply / drain pipe for cooling the load so that the power feeding line and the cooling water channel are shared, so that the power leakage on the load side can be reduced and the power can be efficiently supplied.

【0013】[0013]

【実施例】以下、この発明による高周波インピーダンス
整合回路の一実施例を図1ないし図4を参照し、詳細に
説明する。なお、図5に示した従来の構成と同一構成に
は、同一符号を付して詳細な説明は省略する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a high frequency impedance matching circuit according to the present invention will be described in detail below with reference to FIGS. The same components as those of the conventional configuration shown in FIG. 5 are designated by the same reference numerals, and detailed description thereof will be omitted.

【0014】即ち、図1において、高周波源1には同軸
ケーブル2,インピーダンス整合回路3を介して負荷4
が接続される。インピーダンス整合回路3は直列可変コ
ンデンサ32と並列可変コンデンサ33、及び前記直列
可変コンデンサ32に並列コイル34が縦属接続されて
構成される。この並列コイル34は従来と同様に管状体
からなり、一方は直接共通接続され、他方ではバッキン
グプレート42の冷却用の給排水パイプ43a,43b
を介して互いに共通接続されて環状に構成される。ま
た、冷却用の給排水管34a,34bは並列コイル34
の途中の接続点C,C′に接続され、ポンプ5からの冷
却水6を矢印方向に循環させることができる。なお、3
4cは必要に応じここを流れる冷却水6量を調整するバ
ルブである。
That is, in FIG. 1, the high frequency source 1 has a load 4 via a coaxial cable 2 and an impedance matching circuit 3.
Are connected. The impedance matching circuit 3 is composed of a series variable capacitor 32, a parallel variable capacitor 33, and a parallel coil 34 connected in cascade to the series variable capacitor 32. The parallel coil 34 is formed of a tubular body as in the conventional case, one of which is directly connected in common and the other of which is a water supply / drainage pipe 43a, 43b for cooling the backing plate 42.
They are commonly connected to each other through a ring shape. Further, the water supply / drainage pipes 34a and 34b for cooling are connected to the parallel coil 34.
The cooling water 6 from the pump 5 can be circulated in the direction of the arrow by being connected to the connection points C and C'in the middle. 3
Reference numeral 4c is a valve for adjusting the amount of cooling water 6 flowing therethrough as necessary.

【0015】そこで、この発明は、並列コイル34と給
排水管34a,34bとの接続点C,C′は、いずれも
伝送される高周波電位が最も小さくなる位置、またはそ
の近傍に取付けたことを特徴とする。接続点C,C′の
位置で、伝送高周波の電位が低くなっているので、たと
え給排水管34a,34b内を流れる(導電性を有す
る)冷却水6がその先端で接地電位につながっていると
しても、接続点C,C′の電位が十分低いので、高周波
電力の漏洩量は少なく押えられる。このことは、負荷4
冷却水路についても同様であり、冷却水路を給電線路を
兼ねたことによって、漏洩電力を著しく低減させること
ができる。また、その結果、仮に給排水管34a,34
bと接地電位との間に浮遊容量34a′等が存在したと
しても、電位差が小さいので、それによる高周波損失は
小さなものとなり、負荷4への電力供給効率の大幅な向
上改善が図られる。
Therefore, the present invention is characterized in that the connection points C and C'between the parallel coil 34 and the water supply / drainage pipes 34a and 34b are mounted at or near the position where the high-frequency potential transmitted is minimized. And Since the transmission high frequency potential is low at the positions of the connection points C and C ′, it is assumed that the cooling water 6 (having conductivity) flowing in the water supply / drainage pipes 34a and 34b is connected to the ground potential at its tip. However, since the potentials at the connection points C and C'are sufficiently low, the leakage amount of high frequency power can be suppressed. This means that load 4
The same applies to the cooling water channel, and by using the cooling water channel also as the power feeding line, the leakage power can be significantly reduced. Further, as a result, it is assumed that the water supply / drainage pipes 34a, 34
Even if there is a stray capacitance 34a 'or the like between b and the ground potential, since the potential difference is small, the high frequency loss due to it is small, and the power supply efficiency to the load 4 is greatly improved.

【0016】次に、この発明の理解のために、並列コイ
ル34と給排水管34a,34bの接続点C,C′の位
置での高周波電位が最小となる点であり、あるいはその
最小となる位置の近傍に設定することを図2ないし図4
を参照して説明する。図2は図1の等価回路を示したも
ので、負荷4は抵抗分Xと容器41との間の容量分Cs
との並列回路として表わされるから、夫々を流れる高周
波電流をIx,Ics,また負荷4への供給電圧をV
x,並列コイル34に流れる高周波電流ILとすれば、
これらIx,Vx,Ics及びILのベクトル関係は図
3のように表される。
Next, for the understanding of the present invention, the point at which the high-frequency potential is minimized at the position of the connection points C, C'of the parallel coil 34 and the water supply / drainage pipes 34a, 34b, or the position at which it is minimized. 2 to FIG.
Will be described with reference to. FIG. 2 shows an equivalent circuit of FIG. 1, in which the load 4 has a capacitance Cs between the resistance X and the container 41.
And a high-frequency current flowing through each of them, and a supply voltage to the load 4 is Vx.
If x is the high frequency current IL flowing in the parallel coil 34,
The vector relationship of these Ix, Vx, Ics and IL is expressed as shown in FIG.

【0017】また、並列コイル34における電流ILと
この並列コイル34にかかる高周波電圧VLとは位相が
90度(直交して)異なり、直列コンデンサ32に掛か
る高周波電圧Vccはその電圧VLを逆位相(180
度)補正して、高周波源1の出力電圧Viと整合するよ
うに調整するので、これらIL,VL,Icc及びVi
のベクトル関係も図3のように表される。
Further, the current IL in the parallel coil 34 and the high-frequency voltage VL applied to the parallel coil 34 have a phase difference of 90 degrees (perpendicular to each other), and the high-frequency voltage Vcc applied to the series capacitor 32 has a phase opposite to that of the voltage VL. 180
Degree) correction and adjustment to match the output voltage Vi of the high frequency source 1, these IL, VL, Icc and Vi are adjusted.
The vector relation of is also expressed as shown in FIG.

【0018】そこで、高周波源1から負荷側を見たイン
ピーダンスは、インピーダンス整合状態では50Ωの純
抵抗と見なされるから、出力電圧Viと出力電流Iとは
同相となり、図3に示すようにベクトル方向は一致す
る。しかも出力電流Iは並列可変コンデンサ33を流れ
る高周波電流Iciと直列可変コンデンサ32(並列コ
イル34)を流れる電流ILとの和であって、インピー
ダンス整合状態での電流Iciは出力電流Iに対して9
0度位相進みとなる。換言すれば、直並列可変コンデン
サ32,33の容量値を調整し、VccとIciの値を
変化させインピーダンス整合された状態では、IとVi
とのベクトル方向が一致し、かつIciがViに対して
90度位相進みとなる。
Therefore, the impedance seen from the high-frequency source 1 toward the load side is regarded as a pure resistance of 50Ω in the impedance matching state, so that the output voltage Vi and the output current I are in phase, and as shown in FIG. Match. Moreover, the output current I is the sum of the high frequency current Ici flowing through the parallel variable capacitor 33 and the current IL flowing through the series variable capacitor 32 (parallel coil 34), and the current Ici in the impedance matching state is 9 with respect to the output current I.
The phase is advanced by 0 degree. In other words, when the capacitance values of the series-parallel variable capacitors 32 and 33 are adjusted and the values of Vcc and Ici are changed to achieve impedance matching, I and Vi are changed.
The vector directions of and coincide with each other, and Ici leads the phase by 90 degrees with respect to Vi.

【0019】この図3のベクトル図から分るように、並
列コイル34の電圧VLを考えると、接地電位Oを起点
とした電流ILのベクトル上でかつ直交しており、接地
電位Oから並列コイル34上のいくつかの地点までの電
位差を例示すれば、図4に示すように負荷4側から順次
Vx,V1,V2,V3,V4となり、電流IL方向に
一致したコイル上の接続点C,C′が最小の電位差V2
となることがわかる。
As can be seen from the vector diagram of FIG. 3, when the voltage VL of the parallel coil 34 is considered, it is on the vector of the current IL starting from the ground potential O and orthogonal to each other. As an example of the potential difference up to some points on 34, as shown in FIG. 4, Vx, V1, V2, V3, and V4 are sequentially applied from the load 4 side, and the connection point C on the coil that coincides with the direction of the current IL, C'is the minimum potential difference V2
It turns out that

【0020】従って、この発明によれば、並列コイル3
4上において、接地電位Oとの電位差が少なくとも最小
となる位置C,C′近傍に、冷却水の一対の配管取付け
口を選定することができるから、取付け口までの冷却水
による高周波電力の伝送損失を最も少なく押えることが
できる。勿論、冷却水の水質によって、誘電率が異なる
としても、接続点C,C′は常に最小の高周波電位であ
ることから、常に伝送電力損失を最小に押えることがで
きる。
Therefore, according to the present invention, the parallel coil 3
4, a pair of pipe mounting ports for cooling water can be selected in the vicinity of positions C and C'where the potential difference from the ground potential O is at least minimum. Therefore, high-frequency power transmission by the cooling water to the mounting ports is possible. The loss can be minimized. Of course, even if the permittivity differs depending on the quality of the cooling water, the connection points C and C ′ are always at the minimum high-frequency potential, so that the transmission power loss can always be minimized.

【0021】[0021]

【発明の効果】以上のように、この発明による高周波イ
ンピーダンス整合回路は、整合用コイル上での電圧レベ
ルが最も小さい位置近傍に冷却水取出し口を設けたの
で、冷却水路系における高周波損失を少なく押えること
ができるものであり、エッチング装置等に採用して顕著
な効果が得られる。
As described above, in the high frequency impedance matching circuit according to the present invention, since the cooling water outlet is provided in the vicinity of the position where the voltage level is the smallest on the matching coil, the high frequency loss in the cooling water channel system is reduced. It can be held down, and it can be used in an etching device or the like to obtain a remarkable effect.

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明による高周波インピーダンス整合回路
の一実施例を示す構成図である。
FIG. 1 is a configuration diagram showing an embodiment of a high frequency impedance matching circuit according to the present invention.

【図2】図1に示す高周波インピーダンス整合回路の等
価回路図である。
FIG. 2 is an equivalent circuit diagram of the high frequency impedance matching circuit shown in FIG.

【図3】図1に示す高周波インピーダンス整合回路の動
作を説明するベクトル図である。
FIG. 3 is a vector diagram for explaining the operation of the high frequency impedance matching circuit shown in FIG.

【図4】図3に示すベクトル図の一部を取出して示した
ベクトル図である。
FIG. 4 is a vector diagram showing a part of the vector diagram shown in FIG.

【図5】従来の高周波インピーダンス整合回路を示す構
成図である。
FIG. 5 is a configuration diagram showing a conventional high frequency impedance matching circuit.

【符号の説明】[Explanation of symbols]

1…高周波源 2…同軸ケーブル 3…整合回路 31,34…コイル 32,33…可変コンデンサ 34a,34b…給排水管 4…負荷 43a,43b…給排水パイプ 6…冷却水 1 ... High frequency source 2 ... Coaxial cable 3 ... Matching circuit 31, 34 ... Coil 32, 33 ... Variable condenser 34a, 34b ... Water supply / drainage pipe 4 ... Load 43a, 43b ... Water supply / drainage pipe 6 ... Cooling water

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 給排水管が接続され冷却水を通す管状体
で形成されたコイルと、可変コンデンサとの組合わせ接
続からなる高周波インピーダンス整合回路において、前
記コイルは管状体が相互に連通するように並列接続され
た一対のコイルで構成し、この一対のコイルを伝搬する
高周波の電圧レベルが最小となる位置の近傍に前記給排
水管を接続構成したことを特徴とした高周波インピーダ
ンス整合回路。
1. A high-frequency impedance matching circuit comprising a combination of a coil formed of a tubular body, to which a water supply / drainage pipe is connected, for passing cooling water, and a variable capacitor, wherein the coils are arranged so that the tubular bodies communicate with each other. A high frequency impedance matching circuit comprising a pair of coils connected in parallel, wherein the water supply / drainage pipe is connected near a position where a high frequency voltage level propagating through the pair of coils is minimized.
【請求項2】 前記一対のコイルは前記負荷冷却用の給
排水パイプに連通するように接続させたことを特徴とす
る前記請求項1記載の高周波インピーダンス整合回路。
2. The high-frequency impedance matching circuit according to claim 1, wherein the pair of coils are connected so as to communicate with the water supply / drainage pipe for cooling the load.
JP9009291A 1991-03-28 1991-03-28 High frequency impedance matching circuit Expired - Lifetime JPH0720039B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9009291A JPH0720039B2 (en) 1991-03-28 1991-03-28 High frequency impedance matching circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9009291A JPH0720039B2 (en) 1991-03-28 1991-03-28 High frequency impedance matching circuit

Publications (2)

Publication Number Publication Date
JPH04301908A JPH04301908A (en) 1992-10-26
JPH0720039B2 true JPH0720039B2 (en) 1995-03-06

Family

ID=13988876

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9009291A Expired - Lifetime JPH0720039B2 (en) 1991-03-28 1991-03-28 High frequency impedance matching circuit

Country Status (1)

Country Link
JP (1) JPH0720039B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7518466B2 (en) * 2005-08-29 2009-04-14 Applied Materials, Inc. Methods and apparatus for symmetrical and/or concentric radio frequency matching networks
WO2016170985A1 (en) * 2015-04-23 2016-10-27 株式会社クレハ Impedance matching circuit, high-frequency welding device, and continuous filling device
US11380520B2 (en) * 2017-11-17 2022-07-05 Evatec Ag RF power delivery to vacuum plasma processing

Also Published As

Publication number Publication date
JPH04301908A (en) 1992-10-26

Similar Documents

Publication Publication Date Title
JP7482879B2 (en) Plasma delivery system for a modulated plasma system - Patents.com
US20230170190A1 (en) Rf grounding configuration for pedestals
US5572170A (en) Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits
JP2011103346A (en) Plasma processing apparatus
US5065118A (en) Electronically tuned VHF/UHF matching network
JPH0720039B2 (en) High frequency impedance matching circuit
JP3762650B2 (en) Power supply system for plasma processing equipment
US7132040B2 (en) Matching unit for semiconductor plasma processing apparatus
USRE22993E (en) alford
US5049840A (en) Cooling device for electrical circuit configurations
KR101918357B1 (en) Inductively Coupled Plasma System By Using Radio-Frequency Power
WO2011158808A1 (en) Inductively coupled plasma generation device
US3679571A (en) R-f sputtering apparatus
KR20010110759A (en) Method and apparatus for radio frequency isolation of liquid heat transfer medium supply and discharge lines
JP2576026B2 (en) Plasma processing equipment
JP2530560B2 (en) Impedance matching device for high frequency plasma
US2125900A (en) Ultrahigh frequency apparatus
KR20190091425A (en) Adjustable inductor, impedance matching apparatus and substrate treaing apparatus with the same
WO2019177038A1 (en) Plasma processing device, plasma processing method, and program for plasma processing device
US20260074148A1 (en) Solid state variable impedance device and rf source system
US3648191A (en) Radiofrequency generator circuits and components therefor
US12518954B2 (en) High-voltage module and mass spectrometer using the same
US20260074508A1 (en) High power switched shunt capacitor architectures
WO2019172252A1 (en) Plasma processing device
KR20050113797A (en) Impedance matching system