JPH0724116B2 - Light disk - Google Patents
Light diskInfo
- Publication number
- JPH0724116B2 JPH0724116B2 JP61141942A JP14194286A JPH0724116B2 JP H0724116 B2 JPH0724116 B2 JP H0724116B2 JP 61141942 A JP61141942 A JP 61141942A JP 14194286 A JP14194286 A JP 14194286A JP H0724116 B2 JPH0724116 B2 JP H0724116B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- layer
- peripheral portion
- reflective layer
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 20
- 230000002093 peripheral effect Effects 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 14
- 239000010408 film Substances 0.000 claims description 11
- 239000010409 thin film Substances 0.000 claims description 8
- 239000000956 alloy Substances 0.000 claims description 7
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 230000031700 light absorption Effects 0.000 claims description 5
- 230000002441 reversible effect Effects 0.000 claims description 5
- 230000007423 decrease Effects 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims 1
- 230000009466 transformation Effects 0.000 claims 1
- 239000012780 transparent material Substances 0.000 claims 1
- 239000000203 mixture Substances 0.000 description 7
- 230000035945 sensitivity Effects 0.000 description 7
- 229910052737 gold Inorganic materials 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000007740 vapor deposition Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 101100353137 Homo sapiens PRCC gene Proteins 0.000 description 2
- 102100040829 Proline-rich protein PRCC Human genes 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000005387 chalcogenide glass Substances 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- -1 C- (H) Chemical class 0.000 description 1
- 101710178035 Chorismate synthase 2 Proteins 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 101710152694 Cysteine synthase 2 Proteins 0.000 description 1
- 229910005900 GeTe Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000010549 co-Evaporation Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 150000004763 sulfides Chemical class 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は、光ディスクとりわけ書き換え可能な光ディス
クに関する。Description: FIELD OF THE INVENTION The present invention relates to an optical disc, in particular a rewritable optical disc.
従来の技術 記録信号のS/Nを高めるために記録層を多層化する試み
がある。その狙いは光の干渉効果を最大限に利用するこ
とであって、第1図(b)に示すように、基板の上に透
明体層,光吸収層,透明体層,光反射層を順次積層した
構成あるいは、逆に光反射層,透明体層,光吸収層,透
明体層の順に積層した構成が用いられる。各層の膜厚
は、その光学定数に基づき記録前後の反射率変化を最大
にするように設計される。第1図(b)の構造の場合に
は、光は基板側から入射させる。また逆構造の場合に
は、光は保護材側から入射させる。2. Description of the Related Art There have been attempts to increase the number of recording layers to increase the S / N ratio of recorded signals. The aim is to make maximum use of the interference effect of light. As shown in FIG. 1 (b), a transparent layer, a light absorbing layer, a transparent layer, and a light reflecting layer are sequentially formed on the substrate. A laminated structure or, conversely, a laminated structure of a light reflecting layer, a transparent layer, a light absorbing layer, and a transparent layer is used. The film thickness of each layer is designed to maximize the change in reflectance before and after recording based on the optical constants. In the case of the structure of FIG. 1 (b), light is incident from the substrate side. In the case of the reverse structure, light is incident from the protective material side.
この構成において反射層は、光の吸収効果を高くするこ
とを主目的として用いられるもので一般にAl,Au等光反
射係数の高い金属薄膜を一様に形成する。In this structure, the reflection layer is used mainly for the purpose of increasing the light absorption effect, and generally a metal thin film having a high light reflection coefficient such as Al and Au is uniformly formed.
発明が解決しようとする問題点 ところで、一定の回転数で回っているディスク上にレー
ザー光線を照射して信号を記録しようとする場合、当然
ディスクの外周部では内周部に比べて回転速度(周速)
が大きく、従って同じパルス幅の光を照射してもディス
ク外周部では内周部に比べて単位面積あたりの受光量が
減少し昇温しにくくなる。DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention By the way, when an attempt is made to record a signal by irradiating a laser beam on a disc rotating at a constant number of rotations, the outer peripheral portion of the disc is naturally rotated at a higher rotational speed (peripheral speed) than the inner peripheral portion. Speed)
Therefore, even if light with the same pulse width is irradiated, the amount of light received per unit area in the outer peripheral portion of the disc is smaller than that in the inner peripheral portion, and it is difficult to raise the temperature.
このことは、ディスクの外周部は内周部に比べて記録感
度の低下することを意味する。これを克服する手段とし
ては、内周と外周とで照射するレーザーパワーを変え外
周に行くほど照射パワーを高くするというのが通常であ
るが、例えば光吸収層としてGeTe等のカルコゲナイドガ
ラス薄膜を用い、アモルファス相と結晶相との間で可逆
的相変化を利用した書き換え可能な光ディスクを構成す
る場合は、この方法だけでは十分対応しきれない。This means that the outer peripheral portion of the disc has a lower recording sensitivity than the inner peripheral portion. As a means to overcome this, it is usual to change the laser power applied to the inner circumference and the outer circumference to increase the irradiation power toward the outer circumference, but for example, a chalcogenide glass thin film such as GeTe is used as the light absorption layer. In the case of constructing a rewritable optical disk that utilizes a reversible phase change between an amorphous phase and a crystalline phase, this method alone is not sufficient.
つまり、アモルファス相を結晶相に変化させるためには
原子の配列が整い、結晶性が回復するまで、漸時ガラス
転移温度以上に保持することが必要であるが、外周部で
は相対的な照射時間が短かくなるため、この結晶化に必
要な時間が、同時に不足してしまう傾向になり内周に比
べてはるかに結晶化がおこりにくくなる。照射する時間
を長くするには、結晶化する場合にはディスクの回転方
向に細長い形状の光スポットを用い、相対的な照射時間
を長くする等の方法があるが、トラッキングサーボ,光
伝送効率等の観点で光スポットの長さには、制限が有
り、むやみに長くすることができないため、これによっ
ても内外周の相対的な照射時間の差は無くならない。In other words, in order to change the amorphous phase to the crystalline phase, it is necessary to gradually hold the temperature above the glass transition temperature until the atomic arrangement is adjusted and the crystallinity is restored. Is shorter, the time required for this crystallization tends to be short at the same time, and crystallization is much less likely to occur than in the inner circumference. In order to lengthen the irradiation time, when crystallizing, a long and narrow light spot is used in the rotation direction of the disk and the relative irradiation time is lengthened, but tracking servo, optical transmission efficiency, etc. From the viewpoint of the above, since the length of the light spot is limited and cannot be unnecessarily lengthened, the relative irradiation time difference between the inner and outer peripheries cannot be eliminated even by this.
問題点を解決するための手段 本発明は上記問題を解決するために光反射層の熱拡散率
に注目し、その熱拡散係数がディスク内周から外周にか
けて連続的に小さくなってゆくように反射層の膜厚,材
料組成を形成する。Means for Solving the Problems The present invention focuses on the thermal diffusivity of the light reflecting layer in order to solve the above problems, and the thermal diffusivity is reflected so that the thermal diffusivity continuously decreases from the inner circumference to the outer circumference of the disc. The layer thickness and material composition are formed.
作 用 これによって、外周部においては内周部におけるよりも
熱が逃げにくくなり同じ光を吸収しても相対的により長
い間高温に保つことが可能になる。つまり、内外周にお
ける感度差を低減することができる。Operation As a result, heat is less likely to escape in the outer peripheral portion than in the inner peripheral portion, and even if the same light is absorbed, it is possible to keep the temperature relatively high for a longer period of time. That is, the difference in sensitivity between the inner and outer circumferences can be reduced.
実 施 例 第1図に本発明の光ディスクの一実施例における構成を
示す。光ディスクは円盤状の基板1上に、透明体層2,光
吸収層4,透明体層2,反射層の順に積層して構成しさらに
その上に基板と同様の保護材5を接着剤を用いて、はり
合わせる。積層する順は、上記の全く逆の順であっても
良い。ただし、その場合はレーザー光線の入射方向が保
護基材側となる。Practical Example FIG. 1 shows the configuration of an embodiment of the optical disc of the present invention. An optical disc is constructed by laminating a transparent body layer 2, a light absorbing layer 4, a transparent body layer 2 and a reflective layer in this order on a disc-shaped substrate 1, and a protective material 5 similar to that of the substrate is used on it with an adhesive. And fit them together. The order of stacking may be the reverse of the above. However, in that case, the incident direction of the laser beam is on the protective substrate side.
基材としては第1図の構成の場合は透明であることが必
要であり、ガラス,PMMA,ポリカーボネイト等通常光ディ
スクに用いるもので良い。透明体層の働きは光吸収層を
はさみ込んで、蒸発等の破壊を抑制すること並びに適当
な膜厚を選んで光の吸収効率を上げ、同時にS/Nを高く
することであるが、この働きに見合う特性を持つものと
して、酸化物,硫化物等の無機化合物膜、例えばSiO2,A
l2O3,ZnS等が用いられる。In the case of the structure shown in FIG. 1, the substrate needs to be transparent, and may be a glass, PMMA, polycarbonate or the like used for a normal optical disk. The function of the transparent layer is to sandwich the light absorbing layer, suppress destruction such as evaporation, and increase the light absorption efficiency by selecting an appropriate film thickness, and at the same time increase the S / N. Inorganic compound films such as oxides and sulfides, such as SiO 2 and A
l 2 O 3 , ZnS or the like is used.
反射層は、前述したように光の吸収効率を上げる役割並
びに、内外周の感度差を低減する働きをする。The reflective layer has a function of increasing the light absorption efficiency and a function of reducing the sensitivity difference between the inner and outer circumferences as described above.
反射層で内外周の感度差を低減する方法としては、次の
2つがある。There are the following two methods for reducing the sensitivity difference between the inner and outer circumferences of the reflective layer.
1つは、内外周で反射層の熱拡散率K K=λ/ρC(λ:熱伝導率,ρ:密度,C:比熱)を連
続的に変化させる方法である。これは内周から外周にか
けて比較的熱の逃げやすい組成から逃げにくい組成に連
続的に変化させることで容易に達成される。材料として
は組成の変化に伴なって連続的にその熱拡散率を変えう
るもの、例えばAuとCrの合金薄膜を用い、外周では内周
に比べてCr濃度を高くすることで上記効果を得ることが
できる。One is a method of continuously changing the thermal diffusivity K K = λ / ρC (λ: thermal conductivity, ρ: density, C: specific heat) of the reflective layer on the inner and outer circumferences. This is easily achieved by continuously changing from a composition in which heat easily escapes to a composition in which heat does not easily escape from the inner circumference to the outer circumference. As the material, one that can change its thermal diffusivity continuously with the change in composition, for example, an alloy thin film of Au and Cr is used, and the above effect can be obtained by increasing the Cr concentration in the outer circumference compared to the inner circumference. be able to.
「反射膜の組成の違いによる熱拡散率の変化は例えば、
1970年に米国PLENUM社から刊行されたY.S.Touloukian e
t.al著の「THERMOPHYSICAL PROPERTIES OF MATTER/THE
TPRC DATA SERIES VOLUME 1/THERMAL CONDUCTIVITY/MET
ALLIC ELEMENTS AND ALLOYS」や、同じくY.S.Touloukia
nとE.H.Buyce共著の「THERMOPHYSICAL PROPERTIES OF M
ATTER/THE TPRC DATA SERIES VOLUME4/SPECIFIC HEAT/M
ETALLIC ELEMENTS AND ALLOYS」より簡単に計算するこ
とができる。"For example, the change in the thermal diffusivity due to the difference in the composition of the reflective film is
YS Touloukian e published by PLENUM in the United States in 1970
t.al's THERMOPHYSICAL PROPERTIES OF MATTER / THE
TPRC DATA SERIES VOLUME 1 / THERMAL CONDUCTIVITY / MET
ALLIC ELEMENTS AND ALLOYS "and YS Touloukia
n and EH Buyce co-authored “THERMOPHYSICAL PROPERTIES OF M
ATTER / THE TPRC DATA SERIES VOLUME4 / SPECIFIC HEAT / M
ETALLIC ELEMENTS AND ALLOYS ”can be calculated more easily.
もう1つは、内外周で反射層の熱容量を連続的に変化さ
せる方法である。光が照射された際の熱が周囲へ拡散し
てゆく速度は上述の熱拡散率で決定されるわけである
が、反射層の熱容量が小さければ、熱的に定常状態に近
づき、徐々に熱の拡散が減少する。この場合は、材料と
しては合金を用いる必要は無く、通常、反射層に用いら
れる金属材料として、Au,Al,Ni,Cr,Fe,Co,Pt等を用いる
ことができる。もちろんこれらの合金であってもさしつ
かえない。The other is a method of continuously changing the heat capacity of the reflective layer on the inner and outer circumferences. The rate at which heat is diffused to the surroundings when irradiated with light is determined by the above-mentioned thermal diffusivity, but if the heat capacity of the reflective layer is small, it approaches a steady state thermally, and the heat gradually increases. The spread of is reduced. In this case, it is not necessary to use an alloy as the material, and Au, Al, Ni, Cr, Fe, Co, Pt or the like can be usually used as the metal material used for the reflective layer. Of course, these alloys can be used.
光吸収層としては、追記型材料(非可逆性材料),書き
換え型材料(可逆性材料)のどちらも有効であるが、書
き換え型においてより効果的である。追記型材料として
は、TeOx,TeOx−Pd,TeOx−Au,Se−Te−Pb,CS2−Te,Te−
C−(H)等のTe系の化合物の他に染料系材料、Bi,Au
等の金属薄膜が用いられる。書き換え型材料としてはT
e,Teをベースとするカルコゲナイドガラス薄膜、希土類
元素と遷移金属元素を組み合わせた磁性薄膜等を用いる
ことができる。As the light absorbing layer, both a write-once type material (irreversible material) and a rewritable material (reversible material) are effective, but a rewritable type is more effective. The write-once materials, TeOx, TeOx-Pd, TeOx -Au, Se-Te-Pb, CS 2 -Te, Te-
In addition to Te-based compounds such as C- (H), dye-based materials, Bi, Au
A metal thin film such as is used. T as a rewritable material
A chalcogenide glass thin film based on e, Te, a magnetic thin film in which a rare earth element and a transition metal element are combined, and the like can be used.
本発明の光ディスクを構成する反射層を除く各層は、そ
れぞれ真空蒸着,スパッタリング,CVD,プラズマ重合
等、組成に応じてそれに適する方法でディスク面上に一
様に形成する。Each layer other than the reflective layer constituting the optical disk of the present invention is uniformly formed on the disk surface by a method suitable for the composition such as vacuum deposition, sputtering, CVD, and plasma polymerization.
回転するディスク基板上に、ポイントソースから蒸着に
よって一様な膜を形成する場合、その内外周の回転速度
の差を考慮して一般には第2図に示すような形の外周で
広く内周で狭いマスクを用いるが、反射層を形成する場
合は、次に述べるように意図的に膜厚を変化させるよう
な形のマスクを用いる。When a uniform film is formed by vapor deposition from a point source on a rotating disk substrate, the difference in rotational speed between the inner and outer circumferences is taken into consideration, and generally, the outer circumference has a shape as shown in FIG. A narrow mask is used, but when forming the reflective layer, a mask having a shape in which the film thickness is intentionally changed is used as described below.
実施例1 基材としてφ200mm,厚さ1.2mmのPMMA樹脂基材を用い、
これを回転しながらその上にZnSを約850Å,Te45Ge15Sb
30Se10の4元系膜を約400Å,ZnSを1700Åと次々と蒸着
して形成した。真空度は〜10-5Torrである。Example 1 A PMMA resin substrate having a diameter of 200 mm and a thickness of 1.2 mm was used as a substrate,
While rotating it, ZnS was deposited on it about 850Å, Te 45 Ge 15 Sb
A 30 Se 10 quaternary film was formed by depositing approximately 400 Å and ZnS at 1700 Å one after another. The degree of vacuum is ~ 10 -5 Torr.
次に反射層としてAuを第3図(a)に示すマスクを通じ
て蒸着した。ソース,基板及びマスクの位置関係は第3
図(b)に示すとおりである。この時、反射層の膜厚
は、ほぼ周速に逆比例して連続的に変化しφ100の位置
を1とする時、φ200の位置では1/2とすることができ
た。Next, Au was evaporated as a reflective layer through the mask shown in FIG. The positional relationship between the source, substrate and mask is the third
This is as shown in FIG. At this time, the film thickness of the reflective layer continuously changed in inverse proportion to the peripheral speed, and when the position of φ100 was set to 1, it could be halved at the position of φ200.
実施例2 反射層の組成そのものを連続的に変化させる場合、例え
ば、AuCr合金を用いる場合には、AuとCrの2つのケース
から共蒸着する。Example 2 When the composition itself of the reflective layer is continuously changed, for example, when an AuCr alloy is used, co-evaporation is performed from two cases of Au and Cr.
実施例1におけると同様にZnS,Te45Ge15Sb30Se10,ZnSと
順次、積重ねたディスク上に、第5図に示す位置関係
で、Au−Cr合金層を形成した。この際、Au側のマスク
は、第2図に示すように全面が均一な膜厚に蒸着される
ようなものを選び、Cr側のマスクは第4図に示すように
外周側は内周側に比してAu側のマスクよりも相対的に更
に大きく開いた形のものを用いることで、内周部から外
周部にかけて連続的にCr濃度が増大するようなAu−Cr反
射層が得られる。As in Example 1, an Au—Cr alloy layer was formed in the positional relationship shown in FIG. 5 on the sequentially stacked discs of ZnS, Te 45 Ge 15 Sb 30 Se 10 , and ZnS. At this time, the Au side mask is selected such that the entire surface is vapor-deposited with a uniform film thickness as shown in FIG. 2, and the Cr side mask is the outer peripheral side as the inner peripheral side as shown in FIG. By using a mask that is relatively wider than the mask on the Au side compared to the above, an Au-Cr reflective layer in which the Cr concentration continuously increases from the inner peripheral portion to the outer peripheral portion can be obtained. .
Crの濃度勾配は、マスクの開き具合を調整して自由に選
ぶことができる。内周で、Crの濃度が5at%となるよう
に蒸着速度制御を行ない、外周部ではCrの濃度が15at%
となるように設計した。The Cr concentration gradient can be freely selected by adjusting the opening degree of the mask. The vapor deposition rate is controlled so that the Cr concentration is 5 at% at the inner circumference, and the Cr concentration is 15 at% at the outer circumference.
Designed to be.
実施例3 実施例1,2のディスクに基材と同じPMMA樹脂板をエポキ
シ系の接着剤を用いて張り合わせ密着構造のディスクを
完成した。第1表に、感度比較を行なった結果を示す。
表中No.1は従来構造のもの、ディスクNo.2,3は実施例1,
2に対応するものである。Example 3 The disks of Examples 1 and 2 were laminated with the same PMMA resin plate as the substrate using an epoxy adhesive to complete a disk having a close contact structure. Table 1 shows the results of sensitivity comparison.
No. 1 in the table is of the conventional structure, and disc Nos. 2 and 3 are of Example 1
It corresponds to 2.
評価方法は、900rpmで回転させた場合の最低記録パワー
(記録スポットは0.9μmφ)の高低、ならびに最底消
去パワー(消去スポットは8μm×1μmの長円形)の
高底である。記録,消去の両スポット共、ガウス型のパ
ワー強度分布を持っている。The evaluation methods are the minimum recording power (recording spot is 0.9 μmφ) and the lowest bottom erasing power (erasing spot is 8 μm × 1 μm oval) when rotating at 900 rpm. Both the recording and erasing spots have a Gaussian power intensity distribution.
第1表から、実施例1,2によって、内外周の感度差が大
幅に低減化されることが分かった。 From Table 1, it was found that Examples 1 and 2 significantly reduced the difference in sensitivity between the inner and outer circumferences.
発明の効果 以上のように本発明は内外周の感度差の小さい光ディス
クの構成が可能となった。EFFECTS OF THE INVENTION As described above, the present invention enables the construction of an optical disc having a small difference in sensitivity between the inner and outer circumferences.
第1図(a),(b)は本発明の光ディスクの一実施例
の平面図および断面図、第2図は反射層を内外周とも均
一に形成する際に用いる蒸着用マスクの平面図、第3図
(a),(b)は反射層の膜厚を内周から外周にかけて
連続的に薄く形成するための蒸着用マスクの平面図、同
図(c)はそのソースおよびディスク基板に対する位置
関係を示す図、第4図は本発明の光ディスクの反射層を
形成する際に、内周から外周にかけて連続的に厚く形成
するための蒸着用マスクの形状を示す平面図、第5図
(a)は本発明の一実施例における光ディスクのマスク
の平面図、同図(b)はマスクと基板の位置関係を示す
図である。1 (a) and 1 (b) are a plan view and a cross-sectional view of an embodiment of an optical disc of the present invention, and FIG. 2 is a plan view of a vapor deposition mask used for uniformly forming a reflection layer on both the inner and outer circumferences, 3 (a) and 3 (b) are plan views of a vapor deposition mask for continuously thinning the film thickness of the reflection layer from the inner circumference to the outer circumference, and FIG. 3 (c) is the position with respect to the source and the disk substrate. FIG. 4 is a plan view showing the shape of a vapor deposition mask for forming a reflective layer of an optical disk of the present invention continuously and thickly from the inner circumference to the outer circumference, FIG. 4B is a plan view of the mask of the optical disc in the embodiment of the present invention, and FIG. 8B is a diagram showing the positional relationship between the mask and the substrate.
Claims (4)
化学的変化を生ずる光吸収層と上記光吸収層への光吸収
効率を高めるための光反射層と、これら2つの層の中間
に有って光の光路長を調節し、記録前後の反射光量の変
化を大きくするための透明体層とをディスク基板上に備
えた構成を有する光ディスクにおいて、上記反射層の熱
拡散率または熱容量がディスクの最内周部から最外周部
に向かって連続的に減少するように形成したことを特徴
とする光ディスク。1. A light-absorbing layer which absorbs light, resulting in a physical or chemical change, a light-reflecting layer for increasing the light-absorbing efficiency of the light-absorbing layer, and an intermediate layer between these two layers. In an optical disc having a structure in which a transparent material layer for adjusting the optical path length of light and increasing the amount of reflected light before and after recording is provided on a disc substrate, the thermal diffusivity or heat capacity of the reflective layer is An optical disc, wherein the optical disc is formed so as to decrease continuously from the innermost peripheral portion to the outermost peripheral portion.
0at%)合金薄膜を用い、ディスク最内周部から最外周
部に向かってCr濃度xを連続的に大きくしたことを特徴
とする特許請求の範囲第1項記載の光ディスク。2. A reflective layer material of Au 100- xCrx (0 <x <10
The optical disk according to claim 1, wherein an alloy thin film is used and the Cr concentration x is continuously increased from the innermost peripheral portion of the disk toward the outermost peripheral portion thereof.
最外周部に向かって薄くなるように形成したことを特徴
とする特許請求の範囲第1項記載の光ディスク。3. The optical disk according to claim 1, wherein the reflective layer material is formed so that the film thickness becomes thinner from the innermost peripheral portion of the disk toward the outermost peripheral portion thereof.
の可逆的相変態に基づく材料薄膜で構成したことを特徴
とする特許請求の範囲第1項記載の光ディスク。4. The optical disk according to claim 1, wherein the light absorption layer is composed of a material thin film based on a reversible phase transformation between a crystalline phase and an amorphous phase.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61141942A JPH0724116B2 (en) | 1986-06-18 | 1986-06-18 | Light disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61141942A JPH0724116B2 (en) | 1986-06-18 | 1986-06-18 | Light disk |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62298943A JPS62298943A (en) | 1987-12-26 |
| JPH0724116B2 true JPH0724116B2 (en) | 1995-03-15 |
Family
ID=15303721
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61141942A Expired - Lifetime JPH0724116B2 (en) | 1986-06-18 | 1986-06-18 | Light disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0724116B2 (en) |
-
1986
- 1986-06-18 JP JP61141942A patent/JPH0724116B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62298943A (en) | 1987-12-26 |
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| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |