JPH0727089B2 - Method for manufacturing optical waveguide lens - Google Patents
Method for manufacturing optical waveguide lensInfo
- Publication number
- JPH0727089B2 JPH0727089B2 JP60029597A JP2959785A JPH0727089B2 JP H0727089 B2 JPH0727089 B2 JP H0727089B2 JP 60029597 A JP60029597 A JP 60029597A JP 2959785 A JP2959785 A JP 2959785A JP H0727089 B2 JPH0727089 B2 JP H0727089B2
- Authority
- JP
- Japan
- Prior art keywords
- optical waveguide
- waveguide lens
- layer
- lens
- refractive index
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 title claims description 35
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 238000000034 method Methods 0.000 title claims description 8
- 239000000758 substrate Substances 0.000 claims description 9
- 238000009826 distribution Methods 0.000 claims description 6
- 238000005229 chemical vapour deposition Methods 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000011521 glass Substances 0.000 description 12
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 238000007740 vapor deposition Methods 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/124—Geodesic lenses or integrated gratings
- G02B6/1245—Geodesic lenses
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Integrated Circuits (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は光通信または光情報処理などに用いる光導波路
レンズの製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an optical waveguide lens used for optical communication or optical information processing.
従来の技術 集積光学系において光導波路レンズは集束光と平行光と
の変換またはフーリエ変換などの機能を持ち必要不可欠
な構成要素となっている。第３図に光導波路レンズの一
種であるルネブルクレンズの構成を示す（レーザ研究、
昭和55年７月号P636参照）。ここで１はSi基板、２はバ
ッファであるSiO2層、３は光導波層となるガラス層、
５′はSi3N4などで形成されている光導波路レンズであ
る。ガラス層３の屈折率はSiO2層２よりも大きく、さら
に光導波路レンズ５′の屈折率はガラス層３よりも大き
い。このため光導波路レンズ５′の中心軸近傍の波面の
伝達速度は周辺部に比べて遅くなり集束作用が生じる。2. Description of the Related Art In an integrated optical system, an optical waveguide lens has a function such as conversion of focused light and parallel light or Fourier transform and is an essential component. Figure 3 shows the structure of a Luneburg lens, which is a type of optical waveguide lens (laser research,
See P636, July 1980). Here, 1 is a Si substrate, 2 is a SiO 2 layer which is a buffer, 3 is a glass layer which is an optical waveguide layer,
Reference numeral 5'denotes an optical waveguide lens made of Si 3 N 4 . The refractive index of the glass layer 3 is larger than that of the SiO 2 layer 2, and the refractive index of the optical waveguide lens 5 ′ is larger than that of the glass layer 3. Therefore, the transmission speed of the wavefront in the vicinity of the central axis of the optical waveguide lens 5'is slower than that in the peripheral portion, and a focusing action occurs.
次に上述のルネブルクレンズによる光導波路レンズの製
造方法について図面を用いて説明を行う。第４図はその
製造方法を示した斜視図である。中心部分が盛り上った
おわん状の高屈折率部である光導波路レンズ５′を蒸着
により形成する。蒸発源と基板との距離が充分であれば
蒸発分子は基板に垂直に飛来する。この際、変形マスク
７を回転させながら蒸発することにより、中心部分が盛
り上ったおわん状の高屈折率部である光導波路レンズ
５′がガラス層３上に形成される。Next, a method of manufacturing the optical waveguide lens by the above-mentioned Luneburg lens will be described with reference to the drawings. FIG. 4 is a perspective view showing the manufacturing method. An optical waveguide lens 5'which is a bowl-shaped high refractive index portion having a raised central portion is formed by vapor deposition. If the distance between the evaporation source and the substrate is sufficient, evaporated molecules fly vertically to the substrate. At this time, by evaporating the deformable mask 7 while rotating it, an optical waveguide lens 5 ′ which is a bowl-shaped high refractive index portion having a raised central portion is formed on the glass layer 3.
発明が解決しようとする問題点 以上のように蒸着時にマスクを回転させることにより作
製される光導波路レンズは１回の蒸着により個の光導波
路レンズしか作成できなかった。さらに、蒸着では質の
良い膜の形成が困難で光導波路レンズ部で伝搬ロスを生
じていた。Problems to be Solved by the Invention As described above, the optical waveguide lens produced by rotating the mask during vapor deposition can produce only one optical waveguide lens by one vapor deposition. Further, it is difficult to form a high-quality film by vapor deposition, which causes a propagation loss in the optical waveguide lens portion.
問題点を解決するための手段 本発明の光導波路レンズの製造方法は以上の問題点を解
決するためになされたものであり、レーザ光を用いた光
CVD法により、前記レーザ光を基板に照射し、前記レー
ザ光のガウス分布形状に従って、前記基板上におわん状
の高屈折率部を形成するものである。Means for Solving the Problems The method for manufacturing an optical waveguide lens of the present invention is made to solve the above problems, and an optical method using a laser beam is used.
The substrate is irradiated with the laser light by the CVD method, and a bowl-shaped high refractive index portion is formed on the substrate according to the Gaussian distribution shape of the laser light.
作用 光強度がガウス分布を持つレーザ光を用いて、このレー
ザによるCVD法で膜の堆積をガウス分布にし光導波路レ
ンズが簡単に製造できる。An optical waveguide lens can be easily manufactured by using a laser beam having a Gaussian distribution of the working light intensity to change the film deposition to a Gaussian distribution by the CVD method using this laser.
実 施 例 本発明の光導波路レンズの製造方法の一実施例を第１図
に示す。第１図（ａ）で１はSi基板、２は熱酸化により
形成されたSiO2層、３はスパッタ蒸着により形成された
多成分を含んだガラス層、４はArFエキシマレーザ光で
あり、これらはNH3,SiH4ガス中に置かれている。NH3,Si
H4の各反応ガスはArFエキシマレーザ光４により光励起
されて 4NH3＋3SiH4→Si3N4＋12H2↑ という反応により第１図（ｂ）のようにSi3N4層５が、
ガラス層３上に堆積されていく。この際ArFエキシマレ
ーザ４はガウス分布しているため堆積されるSi3N4層５
の膜厚もガウス分布を持つこととなる。Example FIG. 1 shows an example of a method of manufacturing the optical waveguide lens of the present invention. In FIG. 1 (a), 1 is a Si substrate, 2 is a SiO 2 layer formed by thermal oxidation, 3 is a glass layer containing multiple components formed by sputter deposition, and 4 is ArF excimer laser light. Is placed in NH 3 and SiH 4 gas. NH 3 , Si
Each reaction gas of H 4 is photoexcited by the ArF excimer laser light 4 and the reaction 4NH 3 + 3SiH 4 → Si 3 N 4 + 12H 2 ↑ causes the Si 3 N 4 layer 5 as shown in FIG. 1 (b).
It is deposited on the glass layer 3. At this time, since the ArF excimer laser 4 has a Gaussian distribution, the deposited Si 3 N 4 layer 5
The film thickness of will also have a Gaussian distribution.
第２図は本発明の光導波路レンズの製造方法により製造
された光導波路レンズの斜視図である。ガラス層３の屈
折率は1.52,これに対してSiO2層の屈折率は1.47である
ので光はガラス層３中を伝搬可能となる。He−Neレーザ
光６（波長0.63μｍ）を平行光にしガラス層３中を伝搬
させた。このHe−Neレーザ光６のビーム幅は1mmであ
り、中心部厚み0.8μm,屈折率1.92のSi3N4層５を通過後
10μｍまで集光された。光導波層であるガラス層３に対
して高屈折率部となっているSi3N4層５は光導波路レン
ズとして作用したのである。FIG. 2 is a perspective view of an optical waveguide lens manufactured by the method for manufacturing an optical waveguide lens of the present invention. Since the refractive index of the glass layer 3 is 1.52, while the refractive index of the SiO 2 layer is 1.47, light can propagate in the glass layer 3. He-Ne laser light 6 (wavelength 0.63 μm) was made into parallel light and propagated in the glass layer 3. The beam width of this He-Ne laser beam 6 is 1 mm, and after passing through the Si 3 N 4 layer 5 having a central thickness of 0.8 μm and a refractive index of 1.92.
It was focused to 10 μm. The Si 3 N 4 layer 5 which is a high refractive index portion with respect to the glass layer 3 which is an optical waveguide layer worked as an optical waveguide lens.
なお本実施例では光導波層としてガラス，高屈折率部と
してSi3N4を使用したが、高屈折率部が光導波層よりも
高い屈折率を有する組み合せであれば良い。Although glass is used as the optical waveguide layer and Si 3 N 4 is used as the high refractive index portion in this embodiment, any combination may be used as long as the high refractive index portion has a higher refractive index than the optical waveguide layer.
発明の効果 以上述べたように本発明の光導波路レンズによれば、レ
ーザ光によるCVD法で簡単に光導波路レンズが製造可能
であり、量産性大である。さらにCVD法により膜が形成
されるため良質の伝搬ロスの少ない光導波路レンズが得
られる。EFFECTS OF THE INVENTION As described above, according to the optical waveguide lens of the present invention, the optical waveguide lens can be easily manufactured by the CVD method using laser light, and mass productivity is high. Further, since the film is formed by the CVD method, a good quality optical waveguide lens with less propagation loss can be obtained.
第１図は本発明の光導波路レンズの製造方法の一実施例
を示す工程図、第２図は本発明の光導波路レンズの一実
施例の斜視図、第３図は従来のルネブルクレンズによる
光導波路レンズの斜視図、第４図は従来の光導波路レン
ズの製造方法を示す斜視図である。 １……Si基板、２……SiO2層、３……ガラス層、４……
ArFエキシマレーザ光、５……Si3N4層。FIG. 1 is a process diagram showing an embodiment of a method for manufacturing an optical waveguide lens of the present invention, FIG. 2 is a perspective view of an embodiment of an optical waveguide lens of the present invention, and FIG. 3 is a conventional Reneburg lens. FIG. 4 is a perspective view of an optical waveguide lens, and FIG. 4 is a perspective view showing a conventional method of manufacturing an optical waveguide lens. 1 ... Si substrate, 2 ... SiO 2 layer, 3 ... glass layer, 4 ...
ArF excimer laser light, 5 ... Si 3 N 4 layer.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 久保 実 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 石川 澄江 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 古賀 啓介 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (56)参考文献 特開 昭56−113107（ＪＰ，Ａ) 特開 昭57−132103（ＪＰ，Ａ) 特開 昭57−163204（ＪＰ，Ａ) ─────────────────────────────────────────────────── ─── Continuation of front page (72) Minor Kubo, 1006 Kadoma, Kadoma, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (72) Sumie Ishikawa, 1006, Kadoma, Kadoma City, Osaka Matsushita Electric Industrial Co., Ltd. 72) Inventor Keisuke Koga 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (56) Reference JP 56-113107 (JP, A) JP 57-132103 (JP, A) JP Sho A 57-163204 (JP, A)
Claims (1)
ーザ光を基板に照射し、前記レーザ光のガウス分布形状
に従って、前記基板上におわん状の高屈折率部を形成す
ることを特徴とする光導波路レンズの製造方法。1. A photo-CVD method using laser light, irradiating the substrate with the laser light, and forming a bowl-shaped high refractive index portion on the substrate according to the Gaussian distribution shape of the laser light. And a method for manufacturing an optical waveguide lens.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60029597A JPH0727089B2 (en) | 1985-02-18 | 1985-02-18 | Method for manufacturing optical waveguide lens |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60029597A JPH0727089B2 (en) | 1985-02-18 | 1985-02-18 | Method for manufacturing optical waveguide lens |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61188504A JPS61188504A (en) | 1986-08-22 |
| JPH0727089B2 true JPH0727089B2 (en) | 1995-03-29 |
Family
ID=12280482
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60029597A Expired - Lifetime JPH0727089B2 (en) | 1985-02-18 | 1985-02-18 | Method for manufacturing optical waveguide lens |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0727089B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6271802B1 (en) * | 1997-04-14 | 2001-08-07 | Mems Optical, Inc. | Three dimensional micromachined electromagnetic device and associated methods |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56113107A (en) * | 1980-02-12 | 1981-09-05 | Toshiba Corp | Preparation for plane waveguide lens |
| JPS57132103A (en) * | 1981-02-09 | 1982-08-16 | Nec Corp | Production of optical waveguide path on glass substrate |
| JPS57163204A (en) * | 1981-04-02 | 1982-10-07 | Nec Corp | Production of optical waveguide on glass substrate |
-
1985
- 1985-02-18 JP JP60029597A patent/JPH0727089B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61188504A (en) | 1986-08-22 |
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